CN106756850B - Efficient compact magnetic control film coating device and method - Google Patents

Efficient compact magnetic control film coating device and method Download PDF

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Publication number
CN106756850B
CN106756850B CN201611216893.9A CN201611216893A CN106756850B CN 106756850 B CN106756850 B CN 106756850B CN 201611216893 A CN201611216893 A CN 201611216893A CN 106756850 B CN106756850 B CN 106756850B
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substrate
chamber
pumping chamber
ring magnet
coating
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CN106756850A (en
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朱建明
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ZHAOQING KERUN VACUUM EQUIPMENT CO Ltd
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ZHAOQING KERUN VACUUM EQUIPMENT CO Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Abstract

The invention discloses a high-efficiency compact magnetic control film coating device and a method thereof, wherein the device comprises a rough pumping chamber, a fine pumping chamber and at least one film coating chamber which are sequentially connected along the conveying direction of a substrate; the coating chamber is internally provided with an S-shaped plane target, the middle part of the target seat is provided with an inwards concave cavity, the magnetic conduction plate is arranged at the bottom of the inwards concave cavity, the outer ring magnet and the inner ring magnet are distributed on the magnetic conduction plate, the outer ring magnet surrounds the periphery of the inner ring magnet, and the outer ring magnet and the inner ring magnet are both S-shaped. After the substrate is placed on the substrate supporting plate, the substrate is conveyed from the substrate inlet and outlet platform to the rough pumping chamber, the fine pumping chamber and the film coating chamber in sequence by the substrate conveying mechanism, and the surface of the substrate is subjected to film coating treatment by an S-shaped plane target in the film coating chamber; after the film coating is finished, the film coating chamber, the fine pumping chamber and the rough pumping chamber are sequentially conveyed out by a substrate conveying mechanism and finally conveyed to a film inlet and outlet platform; the direction of feeding the substrate is opposite to the direction of feeding the substrate. The invention has the characteristics of compact equipment structure and high film coating efficiency.

Description

Efficient compact magnetic control film coating device and method
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a high-efficiency compact type magnetic control coating device and method.
Background
At present, linear vacuum coating equipment is generally adopted for coating processing of glass workpieces with large areas, namely a plurality of vacuum chambers, a workpiece feeding and discharging platform and a workpiece discharging platform are arranged in a straight line, a substrate is fed from one end of the vacuum chambers, and the substrate is fed from the other end of the vacuum chambers after coating; meanwhile, in such a coating apparatus, a workpiece is generally coated with a film using a flat target. In actual processing and production, the coating equipment with the structure often has the following defects:
(1) The traditional plane target is of a straight-line structure, the area of the traditional plane target is small, when the area of a substrate to be processed is large, a plurality of plane targets need to be spliced for use, but when the plane targets are spliced together, an electric field exists, magnetic control interferes with each other, and stable discharge of the plane targets is influenced, so that the phenomenon of uneven coating on the surface of the processed substrate is caused, and the processing quality of the processed substrate is influenced;
(2) In the traditional linear vacuum coating equipment, the substrate is fed in from one end of a plurality of vacuum chambers and is discharged from the other end, the production line of the structure is longer, the coating chambers except the coating chambers in the vacuum chambers are provided with a rough pumping chamber and a fine pumping chamber at two ends of each coating chamber for transition of the substrate in and out of the substrate, so that the coating equipment of the vacuum chambers occupies larger area and has high equipment cost; in addition, each vacuum chamber also needs to be provided with a corresponding vacuumizing unit, the number of the vacuum chambers is increased, the configuration number of the vacuumizing units is large, and the equipment cost is further increased; in addition, the equipment with the structure has long production cycle and low production efficiency due to the long production line, and is not beneficial to controlling the production cost.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides the efficient compact magnetic control film coating device which is compact in structure, low in equipment cost and high in production efficiency.
the invention also aims to provide an efficient and compact magnetic control film coating method realized by the device.
The technical scheme of the invention is as follows: a high-efficiency compact magnetic control film coating device comprises a plurality of vacuum chambers connected side by side, wherein the vacuum chambers comprise a rough pumping chamber, a fine pumping chamber and at least one film coating chamber which are sequentially connected along the conveying direction of a substrate; the coating chamber is internally provided with an S-shaped plane target which comprises a target seat, an outer ring magnet, an inner ring magnet and a magnetic conduction plate, the middle part of the target seat is provided with an inwards concave cavity, the magnetic conduction plate is arranged at the bottom of the inwards concave cavity, the outer ring magnet and the inner ring magnet are distributed on the magnetic conduction plate, the outer ring magnet surrounds the periphery of the inner ring magnet, and the outer ring magnet and the inner ring magnet are S-shaped. Compared with the traditional straight-line-shaped planar target, the S-shaped planar target can realize large-area planar coating, has good uniformity and stable coating quality on the surface of the substrate; meanwhile, the utilization rate of the target material is effectively improved.
The target seat is of a rectangular structure, the bottom of the concave cavity is a rectangular plane, the magnetic conduction plate is of a flat plate structure with the same shape as the rectangular plane, the bottom of the outer ring magnet and the bottom of the inner ring magnet are embedded in the magnetic conduction plate respectively, and the top surfaces of the outer ring magnet and the inner ring magnet are flush with the upper surface of the target seat.
the width of the cross section of the inner ring magnet is larger than that of the outer ring magnet.
And a substrate inlet and outlet platform is arranged in front of the vacuum chamber along the substrate conveying direction, a continuous substrate conveying mechanism is arranged among the substrate inlet and outlet platform, the rough pumping chamber, the fine pumping chamber and the coating chamber, and a substrate supporting plate for supporting the substrate is arranged on the substrate conveying mechanism.
The substrate conveying mechanism is of a double-layer structure and comprises an upper-layer transmission roller and a lower-layer transmission roller, a plurality of upper-layer transmission rollers are distributed side by side to form an upper-layer structure, and a plurality of lower-layer transmission rollers are distributed side by side to form a lower-layer structure; the upper layer driving roller is of a left-right opening-closing type structure, and the lower layer driving roller is of an up-down lifting type structure. In the structure, the substrate to be processed and the processed substrate can enter and exit simultaneously, so that the auxiliary time of transmission can be effectively shortened, and the film coating period of the substrate is further shortened.
in the substrate conveying mechanism, all upper-layer driving rollers positioned in the wafer inlet and outlet platform form a first wafer inlet transmission unit, all upper-layer driving rollers positioned in the rough pumping chamber form a second wafer inlet transmission unit, all upper-layer driving rollers positioned in the fine pumping chamber form a third wafer inlet transmission unit, and all upper-layer driving rollers positioned in the film coating chamber form a fourth wafer inlet transmission unit; the lower layer driving rollers positioned in the film inlet and outlet platform form a first film outlet driving unit, the lower layer driving rollers positioned in the rough pumping chamber form a second film outlet driving unit, the lower layer driving rollers positioned in the fine pumping chamber form a third film outlet driving unit, and the lower layer driving rollers positioned in the film coating chamber form a fourth film outlet driving unit;
the fourth film feeding transmission unit is provided with a film feeding mechanism, the fourth film discharging transmission unit is provided with a film discharging mechanism, the film feeding mechanism is arranged on the bottom of the film feeding transmission unit, the film discharging mechanism is arranged on the bottom of the film feeding transmission unit, the film feeding mechanism is arranged on the bottom of the film discharging transmission unit, the film discharging mechanism is arranged on the bottom of the film discharging transmission unit, and the film discharging mechanism is arranged.
In the fourth film feeding transmission unit, each upper transmission roller comprises a left transmission roller and a right transmission roller which are symmetrically arranged, the opening and closing mechanism comprises a left moving seat, a right moving seat, a left moving seat guide shaft and a right moving seat guide shaft, the left transmission roller is arranged on the left moving seat, the left moving seat is connected with the film coating chamber through the left moving seat guide shaft, the right transmission roller is arranged on the right moving seat, the right moving seat is connected with the film coating chamber through the right moving seat guide shaft, and the left moving seat and the right moving seat are respectively externally connected with a driving mechanism; wherein, actuating mechanism can adopt the cylinder, removes a guide shaft or removes a guide shaft along removing on the right side the seat through the corresponding left side of cylinder drive and remove on the right side along removing on the left side the seat guide shaft to drive left driving roller and right driving roller and open or draw close to the middle part to both sides.
In the fourth sheet discharging transmission unit, the lifting mechanism comprises a lifting cylinder, a lifting guide rod and a lifting support plate, the lifting support plate is arranged in a gap between two adjacent lower-layer transmission rollers, the bottom of the lifting support plate is provided with the lifting cylinder, and two sides of the lifting support plate are connected with the film coating chamber through the lifting guide rod; the lifting cylinder is used as a driving mechanism and can drive the lifting supporting plate to move up and down along the lifting guide rod.
In the vacuum chambers, two substrate channels are arranged on the side wall between any two adjacent vacuum chambers, two substrate channels are also arranged on the side wall of the rough pumping chamber adjacent to the sheet inlet and outlet platform, and one side of each substrate channel is correspondingly provided with a vacuum lock. Wherein, the vacuum lock adopts a vacuum lock mechanism which is commonly used in the market.
A first vacuumizing unit is arranged outside the rough pumping chamber, and a second vacuumizing unit is arranged outside the fine pumping chamber and the coating chamber;
The first vacuumizing unit comprises a first roots pump and a first mechanical pump, and the rough pumping chamber, the first roots pump and the first mechanical pump are sequentially connected through pipelines;
The second vacuumizing unit comprises a second roots pump, a second mechanical pump, a first high vacuum pump and a second high vacuum pump, the first high vacuum pump is arranged outside the fine pumping chamber, the second high vacuum pump is arranged outside the coating chamber, and the first high vacuum pump and the second high vacuum pump are connected in parallel and then are sequentially connected with the second roots pump and the second mechanical pump.
Wherein, a first fine pumping valve is also arranged in the first high vacuum pump, and a second fine pumping valve is also arranged in the second high vacuum pump; the first high vacuum pump and the second high vacuum pump can adopt molecular pumps or diffusion pumps. The fine pumping chamber and the coating chamber share one set of vacuum pumping unit, and when the fine pumping chamber or the coating chamber needs to be vacuumized, the opening of the fine pumping chamber or the coating chamber to the fine pumping valve is controlled. In the magnetic control coating device, because the using number of the rough pumping chamber and the fine pumping chamber is reduced, the number of the vacuum pumping units is correspondingly reduced, the using number of the vacuum pumps is greatly reduced, and the equipment cost can be effectively reduced.
The invention realizes an efficient compact magnetic control film coating method through the device, which comprises the following steps:
(1) after the substrate is placed on the substrate supporting plate, the substrate is sequentially conveyed into a rough pumping chamber, a fine pumping chamber and a coating chamber from a substrate inlet and outlet platform by a substrate conveying mechanism, and the surface of the substrate is coated by an S-shaped plane target in the coating chamber;
(2) after the substrate is coated, the substrate is sequentially sent out of the coating chamber, the fine pumping chamber and the rough pumping chamber by a substrate conveying mechanism and finally sent to a substrate inlet and outlet platform; the direction of feeding the substrate is opposite to the direction of feeding the substrate.
when the high-efficiency compact magnetic control film coating device and the method are used, the principle is as follows:
When an upper vacuum lock of the rough pumping chamber and a lower vacuum lock of the rough pumping chamber are opened, a first wafer feeding transmission unit of the wafer feeding and discharging platform and a second wafer feeding transmission unit of the rough pumping chamber operate, and a substrate supporting plate with a substrate is fed into the rough pumping chamber from the wafer feeding and discharging platform; meanwhile, the second chip outlet transmission unit of the rough pumping chamber and the first chip outlet transmission unit of the chip inlet and outlet platform operate, and the substrate supporting plate with the coated substrate below the rough pumping chamber is conveyed out of the lower part of the chip inlet and outlet platform from the rough pumping chamber;
Closing an upper vacuum lock of the rough pumping chamber and a lower vacuum lock of the rough pumping chamber, then pumping air into the rough pumping chamber by a first vacuumizing unit outside the rough pumping chamber, and opening an upper vacuum inner lock of the fine pumping chamber and a lower vacuum inner lock of the fine pumping chamber when the vacuum pressure of the rough pumping chamber reaches 5 Pa; meanwhile, the third piece discharging transmission unit of the fine pumping chamber and the second piece discharging transmission unit of the rough pumping chamber operate to send the substrate and the substrate supporting plate which are placed at the lower part of the fine pumping chamber out of the rough pumping chamber from the fine pumping chamber.
Closing the upper vacuum inner lock of the fine pumping chamber and the lower vacuum inner lock of the fine pumping chamber, opening an air release valve after the locking plate is closed for about 1 second, putting atmosphere into the rough pumping chamber, and opening the upper vacuum lock of the fine pumping chamber and the lower vacuum lock of the fine pumping chamber after the pressure of the rough pumping chamber is balanced with the atmospheric pressure so as to repeat the actions;
The fine pumping chamber is vacuumized to 2 multiplied by 10-2after pa, opening an upper vacuum lock of the coating chamber and a lower vacuum lock of the coating chamber, and conveying the substrate and the substrate supporting plate on the upper part of the fine pumping chamber into the coating chamber after running through a third substrate feeding transmission unit of the fine pumping chamber and a fourth substrate feeding transmission unit of the coating chamber; meanwhile, the substrate and the substrate supporting plate at the lower part of the coating chamber are conveyed out of the coating chamber by the fourth wafer outlet conveying unit of the coating chamber and the third wafer outlet conveying unit of the fine pumping chamber.
Closing the upper vacuum lock and the lower vacuum lock of the coating chamber, and exhausting the coating chamber by a second vacuumizing unit outside the coating chamber until the vacuum degree reaches 8 × 10-2After pa, filling Ar gas into the film coating chamber to enable the vacuum pressure of the film coating chamber to reach 1-3 multiplied by 10-1and in pa, a magnetic control target power supply is started to coat the substrate, after the coating is finished, a lifting cylinder positioned at the lower part of the coating chamber sends the substrate at the upper part of the coating chamber and the substrate supporting plate to a fourth film discharging conveying unit of the coating chamber, and the operation is waited to be repeated.
compared with the prior art, the invention has the following beneficial effects:
In the high-efficiency compact magnetic control coating device, the coating chamber adopts the S-shaped plane target, compared with the traditional straight-line-shaped plane target, the large-area plane coating can be realized, the uniformity is good, and the coating quality of the surface of the substrate is stable; meanwhile, the utilization rate of the target material is effectively improved.
In the high-efficiency compact magnetic control film coating device, a double-layer substrate conveying mechanism is adopted, the film feeding and the film discharging are realized at the same end of a plurality of vacuum chambers, the film feeding and the film discharging are carried out simultaneously, and the same rough pumping chamber and the same fine pumping chamber are adopted for transition use, so that compared with the traditional film coating equipment, the use of the rough pumping chamber and the fine pumping chamber is reduced, the matched vacuumizing unit can be reduced, the length of a production line is shortened, the structure of the equipment is more compact, the occupied area is reduced, and the equipment cost is reduced; meanwhile, the film coating period of the substrate is shortened, and the film coating efficiency is improved.
Drawings
FIG. 1 is a schematic structural diagram of the high-efficiency compact magnetron coating device.
fig. 2 is a cross-sectional view a-a of fig. 1.
Fig. 3 is a schematic diagram of the substrate conveying mechanism in fig. 1 conveying the same substrate.
Fig. 4 is a schematic structural diagram of a fourth feeding transmission unit in the direction B in fig. 3.
FIG. 5 is a schematic structural diagram of an S-shaped planar target in the efficient compact magnetron coating device.
fig. 6 is a cross-sectional view C-C of fig. 5.
Detailed Description
The present invention will be described in further detail with reference to examples, but the embodiments of the present invention are not limited thereto.
Example 1
The embodiment is a high-efficiency compact magnetic control film coating device, which comprises a plurality of vacuum chambers connected side by side, as shown in fig. 1 or fig. 2, wherein the plurality of vacuum chambers comprise a rough pumping chamber 1, a fine pumping chamber 2 and a film coating chamber 3 which are sequentially connected along a substrate conveying direction; the coating chamber is internally provided with an S-shaped planar target 4, as shown in figure 5 or figure 6, the planar target comprises a target seat 5, an outer ring magnet 6, an inner ring magnet 7 and a magnetic conduction plate 8, the middle part of the target seat is provided with an inwards concave cavity, the magnetic conduction plate is arranged at the bottom of the inwards concave cavity, the outer ring magnet and the inner ring magnet are distributed on the magnetic conduction plate, the outer ring magnet surrounds the periphery of the inner ring magnet, and the outer ring magnet and the inner ring magnet are S-shaped. Compared with the traditional straight-line-shaped planar target, the S-shaped planar target can realize large-area planar coating, has good uniformity and stable coating quality on the surface of the substrate; meanwhile, the utilization rate of the target material is effectively improved. The target stand is rectangular structure, and indent cavity bottom is the rectangle plane, and the magnetic conduction plate is the flat structure that the shape is the same with the rectangle plane, and the bottom of outer lane magnet and the bottom of inner circle magnet inlay respectively on the magnetic conduction plate, and the top surface of outer lane magnet and the top surface of inner circle magnet all are parallel and level mutually with the upper surface of target stand. The width of the cross section of the inner ring magnet is larger than that of the outer ring magnet.
As shown in figure 1 or figure 2, along the substrate conveying direction, the front of the vacuum chamber is provided with a substrate inlet and outlet platform 9, a continuous substrate conveying mechanism is arranged among the substrate inlet and outlet platform, the rough pumping chamber, the fine pumping chamber and the coating chamber, and a substrate supporting plate 10 for supporting the substrate is arranged on the substrate conveying mechanism. The substrate conveying mechanism is of a double-layer structure and comprises an upper-layer driving roller 11 and a lower-layer driving roller 12, a plurality of upper-layer driving rollers are distributed side by side to form an upper-layer structure, and a plurality of lower-layer driving rollers are distributed side by side to form a lower-layer structure; the upper layer driving roller is of a left-right opening-closing type structure, and the lower layer driving roller is of an up-down lifting type structure. In the structure, the substrate to be processed and the processed substrate can enter and exit simultaneously, so that the auxiliary time of transmission can be effectively shortened, and the film coating period of the substrate is further shortened.
In the substrate conveying mechanism, all upper-layer driving rollers positioned in the wafer inlet and outlet platform form a first wafer inlet transmission unit, all upper-layer driving rollers positioned in the rough pumping chamber form a second wafer inlet transmission unit, all upper-layer driving rollers positioned in the fine pumping chamber form a third wafer inlet transmission unit, and all upper-layer driving rollers positioned in the film coating chamber form a fourth wafer inlet transmission unit; the lower layer driving rollers positioned in the film inlet and outlet platform form a first film outlet driving unit, the lower layer driving rollers positioned in the rough pumping chamber form a second film outlet driving unit, the lower layer driving rollers positioned in the fine pumping chamber form a third film outlet driving unit, and the lower layer driving rollers positioned in the film coating chamber form a fourth film outlet driving unit;
The fourth film feeding transmission unit is provided with a film feeding mechanism, the fourth film discharging transmission unit is provided with a film discharging mechanism, the film feeding mechanism is arranged on the bottom of the film feeding transmission unit, the film discharging mechanism is arranged on the bottom of the film feeding transmission unit, the film feeding mechanism is arranged on the bottom of the film discharging transmission unit, the film discharging mechanism is arranged on the bottom of the film discharging transmission unit, and the film discharging mechanism is arranged.
As shown in fig. 4, in the fourth sheet feeding transmission unit, each upper transmission roller includes a left transmission roller 13 and a right transmission roller 14, which are symmetrically arranged, the opening and closing mechanism includes a left moving seat 15, a right moving seat 16, a left moving seat guide shaft 17 and a right moving seat guide shaft 18, the left transmission roller is arranged on the left moving seat, the left moving seat is connected with the film coating chamber through the left moving seat guide shaft, the right transmission roller is arranged on the right moving seat, the right moving seat is connected with the film coating chamber through the right moving seat guide shaft, and the left moving seat and the right moving seat are respectively externally connected with a driving mechanism (not shown in the figure); wherein, actuating mechanism can adopt the cylinder, removes a guide shaft or removes a guide shaft along removing on the right side the seat through the corresponding left side of cylinder drive and remove on the right side along removing on the left side the seat guide shaft to drive left driving roller and right driving roller and open or draw close to the middle part to both sides.
As shown in fig. 3, in the fourth discharging transmission unit, the lifting mechanism comprises a lifting cylinder 19, a lifting guide rod and a lifting support plate 21, the lifting support plate is arranged in a gap between two adjacent lower-layer transmission rollers, the bottom of the lifting support plate is provided with the lifting cylinder, and two sides of the lifting support plate are connected with the coating chamber through the lifting guide rod; the lifting cylinder is used as a driving mechanism and can drive the lifting supporting plate to move up and down along the lifting guide rod.
In the vacuum chambers, as shown in fig. 2 or fig. 3, two substrate passages 22 are provided on the sidewall between any two adjacent vacuum chambers, two substrate passages 22 are also provided on the sidewall of the rough pumping chamber adjacent to the sheet inlet and outlet platform, and a vacuum lock 23 is correspondingly provided on one side of each substrate passage. Wherein, the vacuum lock adopts a vacuum lock mechanism which is commonly used in the market.
As shown in fig. 1, a first vacuum pumping unit is arranged outside the rough pumping chamber, and a second vacuum pumping unit is arranged outside the fine pumping chamber and the coating chamber; the first vacuumizing unit comprises a first roots pump 24 and a first mechanical pump 25, and the rough pumping chamber, the first roots pump and the first mechanical pump are sequentially connected through pipelines; the second vacuumizing unit comprises a second roots pump 26, a second mechanical pump 27, a first high vacuum pump 28 and a second high vacuum pump 29, the first high vacuum pump is arranged outside the fine pumping chamber, the second high vacuum pump is arranged outside the coating chamber, and the first high vacuum pump and the second high vacuum pump are connected in parallel and then are sequentially connected with the second roots pump and the second mechanical pump. Wherein, a first fine pumping valve is also arranged in the first high vacuum pump, and a second fine pumping valve is also arranged in the second high vacuum pump; the first high vacuum pump and the second high vacuum pump can adopt molecular pumps or diffusion pumps. The fine pumping chamber and the coating chamber share one set of vacuum pumping unit, and when the fine pumping chamber or the coating chamber needs to be vacuumized, the opening of the fine pumping chamber or the coating chamber to the fine pumping valve is controlled. In the magnetic control coating device, because the using number of the rough pumping chamber and the fine pumping chamber is reduced, the number of the vacuum pumping units is correspondingly reduced, the using number of the vacuum pumps is greatly reduced, and the equipment cost can be effectively reduced.
the device can realize an efficient compact magnetic control film coating method, which comprises the following steps:
(1) After the substrate is placed on the substrate supporting plate, the substrate is sequentially conveyed into a rough pumping chamber, a fine pumping chamber and a coating chamber from a substrate inlet and outlet platform by a substrate conveying mechanism, and the surface of the substrate is coated by an S-shaped plane target in the coating chamber;
(2) After the substrate is coated, the substrate is sequentially sent out of the coating chamber, the fine pumping chamber and the rough pumping chamber by a substrate conveying mechanism and finally sent to a substrate inlet and outlet platform; the direction of feeding the substrate is opposite to the direction of feeding the substrate.
When the high-efficiency compact magnetic control film coating device and the method are used, the principle is as follows:
When an upper vacuum lock of the rough pumping chamber and a lower vacuum lock of the rough pumping chamber are opened, a first wafer feeding transmission unit of the wafer feeding and discharging platform and a second wafer feeding transmission unit of the rough pumping chamber operate, and a substrate supporting plate with a substrate is fed into the rough pumping chamber from the wafer feeding and discharging platform; meanwhile, the second chip outlet transmission unit of the rough pumping chamber and the first chip outlet transmission unit of the chip inlet and outlet platform operate, and the substrate supporting plate with the coated substrate below the rough pumping chamber is conveyed out of the lower part of the chip inlet and outlet platform from the rough pumping chamber;
Closing an upper vacuum lock of the rough pumping chamber and a lower vacuum lock of the rough pumping chamber, then pumping air into the rough pumping chamber by a first vacuumizing unit outside the rough pumping chamber, and opening an upper vacuum inner lock of the fine pumping chamber and a lower vacuum inner lock of the fine pumping chamber when the vacuum pressure of the rough pumping chamber reaches 5 Pa; meanwhile, the third piece discharging transmission unit of the fine pumping chamber and the second piece discharging transmission unit of the rough pumping chamber operate to send the substrate and the substrate supporting plate which are placed at the lower part of the fine pumping chamber out of the rough pumping chamber from the fine pumping chamber.
Closing the upper vacuum inner lock of the fine pumping chamber and the lower vacuum inner lock of the fine pumping chamber, opening an air release valve after the locking plate is closed for about 1 second, putting atmosphere into the rough pumping chamber, and opening the upper vacuum lock of the fine pumping chamber and the lower vacuum lock of the fine pumping chamber after the pressure of the rough pumping chamber is balanced with the atmospheric pressure so as to repeat the actions;
the fine pumping chamber is vacuumized to 2 multiplied by 10-2After pa, opening an upper vacuum lock of the coating chamber and a lower vacuum lock of the coating chamber, and conveying the substrate and the substrate supporting plate on the upper part of the fine pumping chamber into the coating chamber after running through a third substrate feeding transmission unit of the fine pumping chamber and a fourth substrate feeding transmission unit of the coating chamber; meanwhile, the substrate and the substrate supporting plate at the lower part of the coating chamber are conveyed out of the coating chamber by the fourth wafer outlet conveying unit of the coating chamber and the third wafer outlet conveying unit of the fine pumping chamber.
Closing the upper vacuum lock and the lower vacuum lock of the coating chamber, and exhausting the coating chamber by a second vacuumizing unit outside the coating chamber until the vacuum degree reaches 8 × 10-2after pa, filling Ar gas into the film coating chamber to enable the vacuum pressure of the film coating chamber to reach 1-3 multiplied by 10-1And in pa, a magnetic control target power supply is started to coat the substrate, after the coating is finished, a lifting cylinder positioned at the lower part of the coating chamber sends the substrate at the upper part of the coating chamber and the substrate supporting plate to a fourth film discharging conveying unit of the coating chamber, and the operation is waited to be repeated.
example 2
compared with the embodiment 1, the high-efficiency compact magnetron coating device of the embodiment has the following differences: the coating device is provided with a plurality of coating chambers, and the rough pumping chamber, the fine pumping chamber and the coating chambers are sequentially connected in parallel along the conveying direction of the substrate. In the coating device with the structure, the surface of the substrate can be coated for many times through a plurality of coating chambers.
As mentioned above, the present invention can be better realized, and the above embodiments are only preferred embodiments of the present invention, and are not intended to limit the scope of the present invention; all equivalent changes and modifications made according to the present disclosure are intended to be covered by the scope of the claims of the present invention.

Claims (9)

1. A high-efficiency compact magnetic control film coating device is characterized by comprising a plurality of vacuum chambers connected side by side, wherein the vacuum chambers comprise a rough pumping chamber, a fine pumping chamber and at least one film coating chamber which are sequentially connected along the conveying direction of a substrate; the coating chamber is internally provided with an S-shaped plane target, the plane target comprises a target seat, an outer ring magnet, an inner ring magnet and a magnetic conduction plate, the middle part of the target seat is provided with an inwards concave cavity, the magnetic conduction plate is arranged at the bottom of the inwards concave cavity, the outer ring magnet and the inner ring magnet are distributed on the magnetic conduction plate, the outer ring magnet surrounds the periphery of the inner ring magnet, and the outer ring magnet and the inner ring magnet are S-shaped;
a continuous substrate conveying mechanism is arranged among the rough pumping chamber, the fine pumping chamber and the coating chamber, the substrate conveying mechanism is of a double-layer structure and comprises an upper-layer driving roller and a lower-layer driving roller, the upper-layer driving rollers are distributed side by side to form an upper-layer structure, and the lower-layer driving rollers are distributed side by side to form a lower-layer structure; the upper layer driving roller is of a left-right opening-closing type structure, and the lower layer driving roller is of an up-down lifting type structure.
2. The magnetron coating device of claim 1, wherein the target holder has a rectangular structure, the bottom of the concave cavity has a rectangular plane, the magnetic conductive plate has a flat plate structure with the same shape as the rectangular plane, the bottom of the outer ring magnet and the bottom of the inner ring magnet are respectively embedded in the magnetic conductive plate, and the top surface of the outer ring magnet and the top surface of the inner ring magnet are both flush with the upper surface of the target holder.
3. The efficient compact magnetron coating device of claim 1, wherein the cross-sectional width of the inner ring magnet is larger than that of the outer ring magnet.
4. The magnetron coating apparatus as claimed in claim 1, wherein a substrate inlet and outlet platform is provided in front of said vacuum chamber in the substrate conveying direction, and a continuous substrate conveying mechanism is provided between said substrate inlet and outlet platform, said roughing chamber, said finishing chamber and said coating chamber, said substrate conveying mechanism being provided with a substrate supporting plate for supporting the substrate.
5. the efficient compact type magnetron coating device according to claim 4, wherein in the substrate conveying mechanism, the upper driving rollers positioned in the sheet inlet and outlet platform form a first sheet inlet driving unit, the upper driving rollers positioned in the rough drawing chamber form a second sheet inlet driving unit, the upper driving rollers positioned in the fine drawing chamber form a third sheet inlet driving unit, and the upper driving rollers positioned in the coating chamber form a fourth sheet inlet driving unit; the lower layer driving rollers positioned in the film inlet and outlet platform form a first film outlet driving unit, the lower layer driving rollers positioned in the rough pumping chamber form a second film outlet driving unit, the lower layer driving rollers positioned in the fine pumping chamber form a third film outlet driving unit, and the lower layer driving rollers positioned in the film coating chamber form a fourth film outlet driving unit;
wherein, the fourth advances a piece transmission unit both sides and is equipped with the mechanism that opens and shuts, and fourth play piece transmission unit bottom is equipped with elevating system.
6. The high-efficiency compact magnetic control film coating device according to claim 5, wherein in the fourth sheet feeding transmission unit, each upper transmission roller comprises a left transmission roller and a right transmission roller which are symmetrically arranged, the opening and closing mechanism comprises a left moving seat, a right moving seat, a left moving seat guide shaft and a right moving seat guide shaft, the left transmission roller is arranged on the left moving seat, the left moving seat is connected with the film coating chamber through the left moving seat guide shaft, the right transmission roller is arranged on the right moving seat, the right moving seat is connected with the film coating chamber through the right moving seat guide shaft, and the left moving seat and the right moving seat are respectively externally connected with a driving mechanism;
In the fourth piece-discharging transmission unit, the lifting mechanism comprises a lifting cylinder, a lifting guide rod and a lifting support plate, the lifting support plate is arranged in a gap between two adjacent lower-layer transmission rollers, the lifting cylinder is arranged at the bottom of the lifting support plate, and two sides of the lifting support plate are connected with the coating chamber through the lifting guide rod.
7. The magnetron coating apparatus of claim 1, wherein two substrate channels are disposed on a sidewall of any two adjacent vacuum chambers of the plurality of vacuum chambers, two substrate channels are disposed on a sidewall of the roughing chamber adjacent to the sheet feeding/discharging platform, and a vacuum lock is disposed on a side of each substrate channel.
8. The efficient compact magnetic control film coating device according to claim 1, wherein a first vacuum pumping unit is arranged outside the rough pumping chamber, and a second vacuum pumping unit is arranged outside the fine pumping chamber and the film coating chamber;
The first vacuumizing unit comprises a first roots pump and a first mechanical pump, and the rough pumping chamber, the first roots pump and the first mechanical pump are sequentially connected through pipelines;
The second vacuumizing unit comprises a second roots pump, a second mechanical pump, a first high vacuum pump and a second high vacuum pump, the first high vacuum pump is arranged outside the fine pumping chamber, the second high vacuum pump is arranged outside the coating chamber, and the first high vacuum pump and the second high vacuum pump are connected in parallel and then are sequentially connected with the second roots pump and the second mechanical pump.
9. The device according to any one of claims 4-8 realizes an efficient compact magnetron coating method, which is characterized by comprising the following steps:
(1) after the substrate is placed on the substrate supporting plate, the substrate is sequentially conveyed into a rough pumping chamber, a fine pumping chamber and a coating chamber from a substrate inlet and outlet platform by a substrate conveying mechanism, and the surface of the substrate is coated by an S-shaped plane target in the coating chamber;
(2) after the substrate is coated, the substrate is sequentially sent out of the coating chamber, the fine pumping chamber and the rough pumping chamber by a substrate conveying mechanism and finally sent to a substrate inlet and outlet platform; the direction of feeding the substrate is opposite to the direction of feeding the substrate.
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CN108842137A (en) * 2018-07-31 2018-11-20 湖南玉丰真空科学技术有限公司 Substrate frame transmission device in a kind of vacuum coating equipment vacuum chamber
CN109518153B (en) * 2018-12-07 2024-01-19 沈阳爱科斯科技有限公司 Continuous vacuum coating device and coating system

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CN1676662A (en) * 2004-01-07 2005-10-05 应用材料股份有限公司 Two dimensional magnetron scanning for planar sputtering
CN204022672U (en) * 2014-08-07 2014-12-17 肇庆市科润真空设备有限公司 The apparatus for conveying glass of continuous vacuum coating machine
CN105239051A (en) * 2015-11-17 2016-01-13 广东腾胜真空技术工程有限公司 Double-way in and out alternating film plating device and method
CN206308412U (en) * 2016-12-26 2017-07-07 肇庆市科润真空设备有限公司 A kind of efficiency compact high magnetic control film coating device

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Publication number Priority date Publication date Assignee Title
CN1676662A (en) * 2004-01-07 2005-10-05 应用材料股份有限公司 Two dimensional magnetron scanning for planar sputtering
CN204022672U (en) * 2014-08-07 2014-12-17 肇庆市科润真空设备有限公司 The apparatus for conveying glass of continuous vacuum coating machine
CN105239051A (en) * 2015-11-17 2016-01-13 广东腾胜真空技术工程有限公司 Double-way in and out alternating film plating device and method
CN206308412U (en) * 2016-12-26 2017-07-07 肇庆市科润真空设备有限公司 A kind of efficiency compact high magnetic control film coating device

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