CN103147053A - Multi-functional continuous magneto-controlled sputter coating device - Google Patents
Multi-functional continuous magneto-controlled sputter coating device Download PDFInfo
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- CN103147053A CN103147053A CN201210543911XA CN201210543911A CN103147053A CN 103147053 A CN103147053 A CN 103147053A CN 201210543911X A CN201210543911X A CN 201210543911XA CN 201210543911 A CN201210543911 A CN 201210543911A CN 103147053 A CN103147053 A CN 103147053A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3417—Arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
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- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
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Abstract
The invention discloses a multi-functional continuous magneto-controlled sputter coating device which comprises at least one coating chamber, wherein vertical splashboards and inclined splashboards are installed on the inner wall of the coating chamber and can be alternatively used for magneto-controlled sputter coating, a moveable vertical base material bearing frame is installed inside the coating chamber corresponding to the vertical splashboards, and a moveable inclined base material bearing frame is installed inside the coating chamber corresponding to the inclined splashboards. The vertical splashboards and the inclined splashboards which can be used alternatively are installed at a splashboard position port of the coating chamber, and the vertical base material bearing frame and the inclined base material bearing frame are installed correspondingly, so that different splashboards can be chosen for coating of coating base material to meet different requirements; and the vertical splashboards and the inclined splashboards can be used alternatively, so that the coating chamber can be suitable for coating of more standards of products, and generality of the coating device is improved.
Description
Technical field
The present invention relates to the magnetron sputtering technology field, relate in particular to a kind of Multifunctional continuous magnetic control sputtering film plating device.
Background technology
Magnetron sputtering technology is the vacuum coating technology method of current widespread use, be widely used in the industrial fields such as optics, microelectronics, wear-resisting, anti-corrosion, decoration, in order to reliable and stable thin film coating to be provided, to can be by coated product certain aspect specified property is provided.Such as at glass surface plating one deck ito thin film, can form transparent conducting glass, in order to produce LCD display, touch-screen etc.
Magnetron sputtering technique mainly passes through at the activated plasma under the rarefied gas state of the electric field on sputtering target, make under jointly controlling by magnetic field and electric field positive ion bombardment be arranged on target by sputtering target material, target material is splashed on substrate with atom, molecularity, and then forms the function film that needs.
The continous way magnetic-controlled sputtering coating equipment is to be connected in series by a plurality of vacuum chambers, is divided into atmosphere to the black vacuum transition chamber, and black vacuum is to the high vacuum transition chamber, the difference in functionality such as coating chamber district, each district's vacuum system is independent, between the transmission that can seal.Can effectively reduce the pumpdown time by this design, can a slice connect a slice continuous carry out magnetron sputtering plating.It is mainly used in large-area flat panel substrates surface coating, as glass.
The angle that current continous way magnetic-controlled sputtering coating equipment is put by coating material mainly is divided three classes:
1, vertical: vertical equipment is vertical with horizontal plane, coating material is vertically to pass through equipment, coating process is also vertical, for example, Chinese patent literature CN 102181839A discloses a kind of " with the continuous sputtering coating equipment of end entrance and exit type ", it comprises vacuum cavity and vacuum suction device, described vacuum suction device is connected with vacuum cavity, it is characterized in that described vacuum cavity is made of pre-vacuum chamber and two vacuum chambers of sputtering chamber adjacent and that communicate, be provided with segregaion valve between two vacuum chambers, the end of cavity and front end are respectively equipped with blind flange and vacuum locking-valve, the described vacuum locking-valve outside is provided with a dress unloading platform, be provided with the work rest transmitting device in sputtering chamber, compound transmission device is housed in pre-vacuum chamber, the magnetron sputtering target of at least three pairs of positioned opposite is housed in described sputtering chamber, described work rest transmitting device can match with work rest, and work rest can be transported to pre-vacuum chamber successively from the dress unloading platform, sputtering chamber, and carry from former road and get back to loading and unloading sheet platform.For this filming equipment, its coating process is subjected to the pollution of the dirts such as particle that fall in vacuum cavity minimum, is most appropriate to the demanding coated product of cleanliness factor, as the ito glass plated film etc.When but this plated film mode has following defective: a, employing vertical equipment, the fixedly clamping of coating material is more difficult, adopt the fixing meeting of fixture stay the fixture seal at the place, fixed position, cause the marginal existence dead space, the more difficult control of coating process, the while also is not easy to plate the base material of multiple size specification; B, this plated film mode are to adopt with end turnover coating chamber plated film, and such plated film is auxiliary longer with the time, and production efficiency is not high, wastes energy.
2, horizontal: horizontal equipment is parallel with horizontal plane, and coating material is that level is passed through equipment, and coating process is also level, for horizontal equipment, its coating process does not need fixture, does not have the dead space, also can plate simultaneously all size specification base material, efficient is high, and it is convenient to use.But its main problem is, the dirts such as particle that cavity falls can fall on base material, and it can only be applied to the less demanding field of base material cleanliness factor.
3, tilting: angled tiltedly vertical the putting of tilting equipment and horizontal plane, coating material is tiltedly to stand to pass through equipment, coating process is also tiltedly vertical, for tilting equipment, combine the advantage of two kinds of equipment, but because Whole Equipment tilts, its installation processing is all more difficult.
Summary of the invention
One object of the present invention, be to provide a kind of Multifunctional continuous magnetic control sputtering film plating device, it both can vertical also tiltable install coating material, can not only satisfy the needs of different substrate materials plated film, can also prevent effectively that the dirts such as particle that fall in cavity from falling on base material, guarantee that base material is not contaminated, and then improve coating quality.
For reaching above-mentioned purpose, the present invention by the following technical solutions:
A kind of Multifunctional continuous magnetic control sputtering film plating device, comprise at least one coating chamber, it is characterized in that, have interchangeable vertical target and sloped target for magnetron sputtering plating on described coating chamber inwall, corresponding described vertical target arranges portable vertical substrate bears frame in described coating chamber, corresponding described sloped target arranges portable tilting substrate bears frame in described coating chamber.
A kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, the first side of described coating chamber has the target position mouth, one side of described target position mouth is rotated the first target position door-plate is set, the opposite side of described target position mouth rotates the second target position door-plate is set so that described the first target position door-plate and described the second target position door-plate can replace be closed in described target position mouth place.
A kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, on described the first target position door-plate, a vertical target stand is set at least, detachable is equipped with described vertical target on described vertical target stand, on described the second target position door-plate, an inclination target stand is set at least, detachable is equipped with described sloped target on described inclination target stand.
A kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, one end of described vertical substrate bears frame is provided with first and slides groove, the other end arranges the first gearing friction section, described coating chamber inside top corresponding described first slides groove upright guide deflection sheave is set, corresponding described the first gearing friction section of described coating chamber inside bottom arranges friction drive wheel, described friction drive wheel is connected with the power set of described coating chamber outside by drive shaft, the magnetic fluid seal that described drive shaft and described coating chamber contact position are provided for sealing;
A side at described upright guide deflection sheave arranges the oriented wheel, corresponding described oriented wheel arranges second in described tilting substrate bears frame end section and slides groove, at described tilting substrate bears frame away from the described second second gearing friction section of sliding that an end setting of groove and described friction drive wheel be complementary.
Preferably, described friction drive wheel is circular wheel, itself and gearing friction section contact position are provided with the annular recesses that holds described gearing friction section, so that described gearing friction section can just be embedded in the annular recesses of friction drive wheel, and can effectively realize guiding, guarantee that simultaneously the substrate bears frame can not vacillate now to the left, now to the right even partially to fall in moving process.
A kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, seat surface and the ground of described vertical target stand are vertical setting, the frame face of the target surface of corresponding vertical target, upright substrate bears frame also all is vertical setting with ground, the seat surface of described inclination target stand and ground are angle α and arrange, and the target surface of corresponding sloped target, the frame face of tilting substrate bears frame also all are angle α with ground and arrange.
As a kind of preferred version of Multifunctional continuous magnetic control sputtering film plating device, two the described vertical target stands that be arranged in parallel on described the first target position door-plate, two described inclination target stands be arranged in parallel on described the second target position door-plate.
a kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, also comprise the first filming surge chamber and the second plated film surge chamber that are separately positioned on described coating chamber both sides, described the first filming surge chamber arranges the First Transition chamber away from a side of coating chamber, described the second plated film surge chamber arranges the second transition chamber away from a side of coating chamber, the sheet chamber is entered away from a side setting of the first filming surge chamber in described First Transition chamber, described the second transition chamber arranges the slice chamber away from a side of the second plated film surge chamber, describedly advance between sheet chamber and First Transition chamber, between described First Transition chamber and the first filming surge chamber, between described the second plated film surge chamber and the second transition chamber, all be provided for the separation valve door of isolated each chamber between described the second transition chamber and slice chamber, described the first filming surge chamber, coating chamber, be between the second plated film surge chamber to connect and arrange.
By between each chamber, separation valve door being set, make each chamber in use keep separate state, and corresponding each chamber all arranges the vacuum pump unit, can independently carry out extracting vacuum to each chamber, can not destroy like this vacuum state in coating chamber in sending into continuously and sending product process, guarantee the normal operation of plated film work.
As a kind of preferred version of Multifunctional continuous magnetic control sputtering film plating device, the frame face of the seat surface of described inclination target stand, the target surface of sloped target, tilting substrate bears frame and the angle α on ground are acute angle.
Preferably, described angle α is 83 °.
A kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, describedly advance on sheet chamber, First Transition chamber, the first filming surge chamber, coating chamber, the second plated film surge chamber, the second transition chamber and slice chamber the vacuum pump unit independently is set respectively, make each chamber can the independent draws vacuum.
preferably, describedly enter the sheet chamber, the First Transition chamber, the first filming surge chamber, the second plated film surge chamber, the second transition chamber, slice is indoor is provided with upright guide deflection sheave with the inner identical setting of coating chamber, the oriented wheel, friction drive wheel, drive shaft, magnetic fluid seal, and all at the outside correspondence position of each chamber, the motor of controlling the friction drive wheel uniform rotation is set, make that the substrate bears frame can be continuous by entering the sheet chamber, the First Transition chamber, the first filming surge chamber enters the coating chamber plated film, after plated film is completed by the second plated film surge chamber, the second transition chamber, the slice chamber is sent, but make whole production continuity, enhance productivity, reduce and produce aided process.
A kind of preferred version as the Multifunctional continuous magnetic control sputtering film plating device, described the first target position door periphery is provided for the sealing-ring that is tightly connected with described target position mouth, and described the second target position door periphery is provided for the sealing-ring that is tightly connected with described target position mouth.
Preferably, described the first target position door periphery arranges a circle sealing-ring at least, and described the second target position door periphery arranges a circle sealing-ring at least.
Be more preferably, described the first target position door periphery arranges two circle sealing-rings, and described the second target position door periphery arranges two circle sealing-rings.
Preferably, offer at least the sealing groove of a ring shape at corresponding the first target position door-plate in described target position mouth place or the second target position door-plate, in described groove, sealing-ring is set.
Be more preferably, described target position mouth place offers the sealing groove of two ring shapes, in each described groove, sealing-ring is set all.
the contrast prior art, beneficial effect of the present invention is: by the target position mouth place at coating chamber, interchangeable vertical target and sloped target are set, and corresponding vertical target and sloped target arrange vertical substrate bears frame and tilting substrate bears frame in coating chamber, make product can use vertical target to carry out plated film when plated film is less demanding, can use sloped target to carry out plated film when the requirement of product plated film is high, and utilize tilting substrate bears frame assembled product, catcher mark in the time of can effectively avoiding clamping, prevent the dead space, and being used alternatingly of vertical target and sloped target, make coating chamber can adapt to the product plated film of more specifications, improve the versatility of film coating apparatus.
Description of drawings
Fig. 1 is the structural representation of the described Multifunctional continuous magnetic control sputtering film plating device of invention;
Fig. 2 is the structural representation of coating chamber in Fig. 1;
Fig. 3 is the cross-sectional schematic when in Fig. 2, coating chamber uses vertical target;
Fig. 4 is the cross-sectional schematic when in Fig. 2, coating chamber uses sloped target.
In figure:
1, coating chamber; 101, Link Port; 102, target position mouth; 103, the first target position door-plate; 104, the second target position door-plate; 105, vertical target; 106, sloped target; 107, vertical target stand; 108, inclination target stand; 109, upright guide deflection sheave; 110, oriented wheel; 111, vertical substrate bears frame; 112, inclination substrate bears frame; 113, the first gearing friction section; 114, the second gearing friction section; 115, first slide groove; 116, second slide groove; 117, friction drive wheel; 118, drive shaft; 119, magnetic fluid seal;
2, enter the sheet chamber; 3, First Transition chamber; 4, the first filming surge chamber; 5, the second plated film surge chamber; 6, the second transition chamber; 7, slice chamber; 8, separation valve door; 9, feeding station; 10, blanking station; 11, vacuum pump unit.
Embodiment
as shown in Figure 1, Multifunctional continuous magnetic control sputtering film plating device described in this embodiment, comprise set gradually enter sheet chamber 2, First Transition chamber 3, the first filming surge chamber 4, coating chamber 1, the second plated film surge chamber 5, the second transition chamber 6, slice chamber 7, feeding station 9 is set advancing the side of sheet chamber 2 away from First Transition chamber 3, in slice chamber 7 sides away from the second transition chamber 6, blanking station 10 is set, advance between sheet chamber 2 and First Transition chamber 3 separation valve door 8 is set, between First Transition chamber 3 and the first filming surge chamber 4, separation valve door 8 is set, between the second plated film surge chamber 5 and the second transition chamber 6, separation valve door 8 is set, between the second transition chamber 6 and slice chamber 7, separation valve door 8 is set, and the first filming surge chamber 4, coating chamber 1, the second plated film surge chamber 5 is and is communicated with setting, its inner vacuum state is consistent.
Advancing all to arrange one on sheet chamber 2, First Transition chamber 3, the first filming surge chamber 4, coating chamber 1, the second plated film surge chamber 5, the second transition chamber 6, slice chamber 7 and overlap independently vacuum pump unit, be used for carrying out independently extracting vacuum work, can not destroy like this vacuum state in coating chamber 1 in sending into continuously and sending product process, guarantee the normal operation of plated film work.
as shown in Fig. 2～4, coating chamber 1 is the rectangular parallelepiped casing, it comprises four sides perpendicular to the ground, be respectively the first side, the second side, the 3rd side and the 4th side, target position mouth 102 is set on the first side, rotate in the left side of target position mouth 102 the first target position door-plate 103 is set, rotate on the right side of target position mouth 102 the second target position door-plate 104 is set, the physical dimension of the first target position door-plate 103 and the second target position door-plate 104 all is complementary with the size of target position mouth 102, what make that the first target position door-plate 103 and the second target position door-plate 104 all can replace is closed in target position mouth 102 places.
The first target position door-plate 103 peripheries arrange two ring shape sealing-rings, it can be tightly connected with target position mouth 102 when being closed to target position mouth 102 place, the second target position door-plate 104 peripheries arrange two ring shape sealing-rings, and it can be tightly connected with target position mouth 102 when being closed to target position mouth 102 place.
two vertical target stands 107 of rectangle be arranged in parallel on the first target position door-plate 103, on each vertical target stand 107, detachable arranges a vertical target 105, two rectangle inclination target stands 108 be arranged in parallel on the second target position door-plate 104, on each inclination target stand 108, detachable arranges a sloped target 106, the seat surface of vertical target stand 107 and ground are in vertical state, the vertical target 105 that is arranged on vertical target stand 107 seat surfaces is rectangular shape, therefore the target surface of vertical target 105 and ground are also in vertical state, and the seat surface of inclination target stand 108 and ground are 83 ° of angle settings, the sloped target 106 that is arranged on inclination target stand 108 seat surfaces is rectangular shape, therefore target surface and the ground of sloped target 106 also are 83 ° of angle settings.
Can lay vertical substrate bears frame 111 between upright guide deflection sheave 109 and friction drive wheel 117, the target surface of the outside surface of this vertical substrate bears frame 111 and vertical target 105 is parastate, like this can be parallel with vertical target 105 so that be placed in the coating material on vertical substrate bears frame 111 surfaces, further make the coating material surface coating even, guarantee that rete is reliable and stable.
can lay tilting substrate bears frame 112 between oriented wheel 110 and friction drive wheel 117, the outside surface of this tilting substrate bears frame 112 and the target surface of sloped target 106 are parastate, and all be 83 ° of angle settings with ground, like this can be parallel with sloped target 106 so that be placed in the coating material on tilting substrate bears frame 112 surfaces, and then the coating material that guarantees to be placed in tilting substrate bears frame 112 surfaces is parallel with sloped target 106, make the coating material surface coating even, the assurance rete is reliable and stable, and when coating material is had relatively high expectations to film quality, can use this tilting substrate bears frame 112, because tilting substrate bears frame 112 is 83 degree angle settings with ground, therefore can inapplicable fixture when laying coating material, so just can avoid the plated film dead space.
The upper end of vertical substrate bears frame 111 is provided with upright guide deflection sheave 109 is complementary and first slides groove 115, the lower end of vertical substrate bears frame 111 is provided with the first gearing friction section 113 that is complementary with friction drive wheel 117, makes the vertical substrate bears frame 111 can be in the interior uniform movement of coating chamber 1.
The upper end of tilting substrate bears frame 112 is provided with oriented wheel 110 is complementary and second slides groove 116, the lower end of tilting substrate bears frame 112 is provided with the second gearing friction section 114 that is complementary with friction drive wheel 117, makes the tilting substrate bears frame 112 can be in the interior uniform movement of coating chamber 1.
In the second side, the 3rd side that are connected with the first side of coating chamber 1, the Link Port 101 that is communicated with the first filming surge chamber 4, the second plated film surge chamber 5 is set respectively, arrange film gate over against Link Port 101 advancing on sheet chamber 2, set out film gate over against Link Port 101 on slice chamber 7, advance film gate and go out the film gate place sealed structure all is set, make into the sheet chamber 2 and slice chamber 7 is interior can keep the vacuum-sealing state.
As shown in Figure 2, select to adopt vertical substrate bears frame 111 to load coating material:
The first step, the first target position door-plate 103 at target position mouth 102 places on coating chamber 1 cuts out and seals, then each separation valve door 8 is closed;
second step, due to the first filming surge chamber 4, coating chamber 1 and the second plated film surge chamber 5 are perforation setting, so the first filming surge chamber 4, coating chamber 1 and the second plated film surge chamber 5 are referred to as the coating chamber group, open the vacuum pump unit 11 on the coating chamber group, to extracting vacuum in the coating chamber group, until the air pressure that the air pressure in the coating chamber group needs when being plated film, vacuum pump unit on unlatching First Transition chamber 3 and the second transition chamber 6, respectively to First Transition chamber 3 and the second inner extracting vacuum of transition chamber 6, until its inner air pressure is the air pressure in 1/2 coating chamber group, entering sheet chamber 2 and slice chamber 7 wouldn't extracting vacuum,
The 3rd step, coating material is fixed on vertical substrate bears frame 111 at feeding station 9 places, open the film gate that advances of sheet chamber 2, to put between upright guide deflection sheave and friction drive wheel in the sheet chamber 2 with the vertical substrate bears frame 111 of coating material, then close into film gate, and by advancing to arrange on sheet chamber 2 11 groups, vacuum pump machine to advancing sheet chamber 2 extracting vacuum, make its inner vacuum pressure consistent with vacuum pressure value in First Transition chamber 3;
The 4th step, open into the separation valve door 8 between sheet chamber 2 and First Transition chamber 3 by the external control device, and utilize upright guide deflection sheave and friction drive wheel that vertical substrate bears frame 111 is sent in First Transition chamber 3, close into the separation valve door 8 between sheet chamber 2 and First Transition chamber 3;
the 5th step, utilize 11 pairs of the vacuum pump units that arrange on First Transition chamber 3 First Transition chamber, 3 extracting vacuum, make its inner atmospheric pressure value consistent with the atmospheric pressure value in the coating chamber group, then open separation valve door 8 between First Transition chamber 3 and coating chamber group by the external control device, and utilize upright guide deflection sheave and friction drive wheel that vertical substrate bears frame 111 is sent between upright guide deflection sheave and friction drive wheel in the coating chamber group, close separation valve door 8, enter into from the first filming surge chamber 4 until vertical substrate bears frame 111 coating chamber 1 interior after, carry out again magnetron sputtering plating,
After the 6th step, plated film are completed, open the vacuum pump unit on the second transition chamber 6, to carrying out extracting vacuum in the second transition chamber 6, make being consistent of the interior force value of the second transition chamber 6 and coating chamber group, then the separation valve door 8 between coating chamber group and the second transition chamber 6 is opened, vertical substrate bears frame 111 is sent on the second transition chamber 6 interior upright guide deflection sheave and friction drive wheel;
The 7th step, open the separation valve door 8 between the second transition chamber 6 and slice chamber 7, vertical substrate bears frame 111 is sent in slice chamber 7, and close separation valve door 8 between the second transition chamber 6 and slice chamber 7;
The 8th step, open the atmosphere valve on slice chamber 7, air is entered in slice chamber 7, treats that the atmospheric pressure value in slice chamber 7 is consistent with normal atmosphere, unlatching slice chamber 7 go out the doorway, vertical substrate bears frame 111 7 is sent to blanking station 10 from the slice chamber, then carried out discharging;
The 9th step, eight steps of the repetition the first step to the, the filming process that carries out continuous repetition.
As shown in Figure 3, when selecting to adopt tilting substrate bears frame 112 to load coating material, operation steps and above-mentioned steps are in full accord, only tilting substrate bears frame 112 need to be placed between tilting guide deflection sheave and friction drive wheel 117, and the second target position door-plate 104 at target position mouth 102 places cuts out get final product.
Know-why of the present invention has below been described in conjunction with specific embodiments.These are described just in order to explain principle of the present invention, and can not be interpreted as by any way limiting the scope of the invention.Based on explanation herein, those skilled in the art does not need to pay performing creative labour can associate other embodiment of the present invention, within these modes all will fall into protection scope of the present invention.
Claims (10)
1. Multifunctional continuous magnetic control sputtering film plating device, comprise at least one coating chamber, it is characterized in that, have interchangeable vertical target and sloped target for magnetron sputtering plating on described coating chamber inwall, corresponding described vertical target arranges portable vertical substrate bears frame in described coating chamber, corresponding described sloped target arranges portable tilting substrate bears frame in described coating chamber.
2. Multifunctional continuous magnetic control sputtering film plating device according to claim 1, it is characterized in that, the first side of described coating chamber has the target position mouth, one side of described target position mouth is rotated the first target position door-plate is set, the opposite side of described target position mouth rotates the second target position door-plate is set so that described the first target position door-plate and described the second target position door-plate can replace be closed in described target position mouth place.
3. Multifunctional continuous magnetic control sputtering film plating device according to claim 2, it is characterized in that, on described the first target position door-plate, a vertical target stand is set at least, detachable is equipped with described vertical target on described vertical target stand, on described the second target position door-plate, an inclination target stand is set at least, detachable is equipped with described sloped target on described inclination target stand.
4. Multifunctional continuous magnetic control sputtering film plating device according to claim 2, it is characterized in that, one end of described vertical substrate bears frame is provided with first and slides groove, the other end arranges the first gearing friction section, described coating chamber inside top corresponding described first slides groove upright guide deflection sheave is set, corresponding described the first gearing friction section of described coating chamber inside bottom arranges friction drive wheel, described friction drive wheel is connected with the power set of described coating chamber outside by drive shaft, the magnetic fluid seal that described drive shaft and described coating chamber contact position are provided for sealing,
A side at described upright guide deflection sheave arranges the oriented wheel, corresponding described oriented wheel arranges second in described tilting substrate bears frame end section and slides groove, at described tilting substrate bears frame away from the described second second gearing friction section of sliding that an end setting of groove and described friction drive wheel be complementary.
5. Multifunctional continuous magnetic control sputtering film plating device according to claim 4, it is characterized in that, seat surface and the ground of described vertical target stand are vertical setting, the frame face of the target surface of corresponding vertical target, upright substrate bears frame also all is vertical setting with ground, the seat surface of described inclination target stand and ground are angle α and arrange, and the target surface of corresponding sloped target, the frame face of tilting substrate bears frame also all are angle α with ground and arrange.
6. Multifunctional continuous magnetic control sputtering film plating device according to claim 3, is characterized in that, two the described vertical target stands that be arranged in parallel on described the first target position door-plate, and two described inclination target stands be arranged in parallel on described the second target position door-plate.
7. Multifunctional continuous magnetic control sputtering film plating device according to claim 2, it is characterized in that, also comprise the first filming surge chamber and the second plated film surge chamber that are separately positioned on described coating chamber both sides, described the first filming surge chamber arranges the First Transition chamber away from a side of coating chamber, described the second plated film surge chamber arranges the second transition chamber away from a side of coating chamber, the sheet chamber is entered away from a side setting of the first filming surge chamber in described First Transition chamber, described the second transition chamber arranges the slice chamber away from a side of the second plated film surge chamber, describedly advance between sheet chamber and First Transition chamber, between described First Transition chamber and the first filming surge chamber, between described the second plated film surge chamber and the second transition chamber, all be provided for the separation valve door of isolated each chamber between described the second transition chamber and slice chamber, described the first filming surge chamber, coating chamber, be between the second plated film surge chamber to connect and arrange.
8. Multifunctional continuous magnetic control sputtering film plating device according to claim 5, is characterized in that, the frame face of the seat surface of described inclination target stand, the target surface of sloped target, tilting substrate bears frame and the angle α on ground are acute angle.
9. according to claim 1～8 arbitrary described Multifunctional continuous magnetic control sputtering film plating devices, it is characterized in that, describedly advance on sheet chamber, First Transition chamber, the first filming surge chamber, coating chamber, the second plated film surge chamber, the second transition chamber and slice chamber the vacuum pump unit independently is set respectively, make each chamber can the independent draws vacuum.
10. according to claim 2～8 arbitrary described Multifunctional continuous magnetic control sputtering film plating devices, it is characterized in that, described the first target position door periphery is provided for the sealing-ring that is tightly connected with described target position mouth, and described the second target position door periphery is provided for the sealing-ring that is tightly connected with described target position mouth.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210543911.XA CN103147053B (en) | 2012-12-14 | 2012-12-14 | Multi-functional continuous magneto-controlled sputter coating device |
| PCT/CN2013/074407 WO2014089948A1 (en) | 2012-12-14 | 2013-04-19 | Multi-functional continuous magneto-controlled sputter coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210543911.XA CN103147053B (en) | 2012-12-14 | 2012-12-14 | Multi-functional continuous magneto-controlled sputter coating device |
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| Publication Number | Publication Date |
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| CN103147053A true CN103147053A (en) | 2013-06-12 |
| CN103147053B CN103147053B (en) | 2015-04-22 |
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| CN201210543911.XA Active CN103147053B (en) | 2012-12-14 | 2012-12-14 | Multi-functional continuous magneto-controlled sputter coating device |
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| CN (1) | CN103147053B (en) |
| WO (1) | WO2014089948A1 (en) |
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| CN103147053B (en) | 2015-04-22 |
| WO2014089948A1 (en) | 2014-06-19 |
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