CN204644463U - Vacuum treatment device - Google Patents

Vacuum treatment device Download PDF

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Publication number
CN204644463U
CN204644463U CN201520295524.8U CN201520295524U CN204644463U CN 204644463 U CN204644463 U CN 204644463U CN 201520295524 U CN201520295524 U CN 201520295524U CN 204644463 U CN204644463 U CN 204644463U
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China
Prior art keywords
forvacuum
chamber cap
supply structure
vacuum
treatment device
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CN201520295524.8U
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Chinese (zh)
Inventor
约亨·克劳瑟
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Von Adena asset Limited by Share Ltd
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Von Ardenne GmbH
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/03Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Vacuum treatment device (100), can comprise: room housing (102), has the opening (111) in room housing (102) upside, for holding chamber cap (104); Chamber cap (104), for covering the opening (111) of room housing (102); The first forvacuum Supply Structure (108a) on room housing (102); The second forvacuum Supply Structure (108b) on chamber cap (104), wherein the first forvacuum Supply Structure (108a) and the second forvacuum Supply Structure (108b) are arranged in this wise, i.e. their automatically mutual couplings of vacuum-tight when chamber cap (104) is closed.

Description

Vacuum treatment device
Technical field
The present invention relates to a kind of vacuum treatment device.
Background technology
Usually, can use vacuum treatment device, process matrix, such as plate shape matrix, sheet glass, wafer or other carriers, such as vacuum treatment device can be set to Vacuum coating device, at vacuum treatment device floating coat matrix.At this, vacuum treatment device can have multiple room, portion (compartment) or treating chamber, and has delivery system, for matrix to be coated is carried through vacuum treatment device.The different room of vacuum treatment device can be separated from each other by means of so-called locular wall or next door, such as horizontal continuity coating apparatus (series connection-equipment) by means of vertical locular wall or vertical next door.At this, each locular wall (or partition wall) can have matrix-transhipment-opening (matrix-transhipment-gap) in the following manner, that is, matrix can be transported by locular wall, such as, enter the second Room of vacuum treatment device from the first Room of vacuum treatment device.
Summary of the invention
According to different embodiments, room (compartment) can be provided by means of room housing, or multiple room (compartment) can be provided in common room housing, wherein room housing such as can have multiple locular wall, and it limits described room or limits described multiple room and be separated from each other.
The room housing of vacuum treatment device can be such as the integral part (main body) of vacuum chamber, such as, be the integral part (main body) of gate chamber, surge chamber, transhipment room or treatment chamber (such as coating room).At this, each function or the driving type of vacuum chamber can limit according to the chamber cap used together with the housing of room.Such as, the room housing with a chamber cap can be used as gate chamber, and the room housing with another chamber cap can be used as surge chamber or transhipment room (or treatment chamber), and the room housing with a chamber cap again can be used as coating room.In order to room housing being vacuumized, room housing can connect with forevacuum pump assembly and/or high intermediate pump assembly lotus root.Thus, can produce or provide at least one forvacuum (Vorvakuum) (or also can be high vacuum) in the room housing sealed by means of chamber cap.
Significantly, room housing can have forvacuum supply department with the chamber cap associated, and the vacuum chamber of at least treatment facility or whole treatment facility is vacuumized for realizing.Such as chamber cap can have high-vacuum pump assembly, must supply forvacuum to it, can realize the operation of high-vacuum pump.Can be embodied as chamber cap supply forvacuum by means of forvacuum Supply Structure, described forvacuum Supply Structure can connect with forevacuum pump assembly lotus root.In addition, forevacuum pump assembly can connect, for providing forvacuum in the vacuum chamber for the treatment of facility by direct and room housing lotus root extraly.
In addition, vacuum treatment device can have delivery system for transporting matrix by vacuum treatment device, the driving part that such as delivery system can have multiple transport cylinder and correspondingly connect with transport cylinder lotus root.
For being brought in vacuum treatment device by matrix, or take matrix out of vacuum treatment device, such as, can use one or more gate chamber, one or more surge chamber, and/or one or more transhipment room.For at least one matrix is brought in vacuum treatment device, such as at least one matrix described can be placed in the gate chamber of ventilation, then, gate chamber with at least one matrix can be evacuated, and matrix can be transported in the adjacent vacuum chamber entering vacuum treatment device (such as in surge chamber) in batches from evacuated gate chamber.Such as, can matrix be maintained by means of surge chamber, and the pressure be less than in gate chamber can be provided.The matrix be in batches placed into can be gathered into so-called matrix band by means of transhipment room, makes only to retain little gap between matrix, and matrix processed (such as coated) in the respective handling room of vacuum treatment device.As an alternative, matrix also can directly be placed into transhipment room from gate chamber, and does not use surge chamber, and this such as can cause the cycle (matrix being inserted the necessary time in vacuum treatment device) extended.
The matrix process such as can will brought in the process chamber, wherein treatment chamber such as can have chamber lid, the respective compartment in the housing of room can be covered and vacuum-tight closing.Chamber lid such as can fix a magnetron or multiple magnetron, and such as chamber lid can have at least one tubular type magnetron or double hose magnetron or at least one planar magnetron or biplane magnetron.
According to different embodiments, room housing such as can be used as gate chamber by means of corresponding chamber cap, and wherein gate chamber such as (such as can be up to 10 in forvacuum scope -2mbar) operate.In addition, room housing such as can be used as treatment chamber or coating room by means of corresponding chamber cap, and wherein, treatment chamber or coating room such as can (such as in the scope of process vacuum, such as, roughly 10 in high vacuum scope -3mbar is to roughly 10 -7in the scope of mbar) driven.At this, described high vacuum scope such as can produce by means of at least one turbomolecular pump, and molecular pump can be integrated in chamber cap also can provide forvacuum by means of forvacuum Supply Structure.
Significantly, can see that an aspect of different embodiment is, can realize the forvacuum supply of chamber cap, wherein when chamber cap is closed, namely when chamber cap is placed on the housing of corresponding room or be at least placed on a room of room housing, this automatically provides.Significantly, the forvacuum supply department for vacuum chamber can be divided into two independent forvacuum Supply Structures, and when chamber cap is opened, they are automatically separated from each other, their automatic corresponding connections when chamber cap is closed.Therefore, the chamber cap with a part of forvacuum supply department can away from room housing.
According to different embodiments, vacuum treatment device can comprise: the room housing on the upside of the housing of room with opening, and for holding chamber cap, chamber cap is used for covering chamber's shell nozzle; First forvacuum Supply Structure, it is fixed on the housing of room or at least and arranges securely relative to room shell position, second forvacuum Supply Structure, it is fixed on chamber cap, wherein the first forvacuum Supply Structure and the second forvacuum Supply Structure are set up in this wise, namely they when chamber cap is closed automatically vacuum seal ground mutually lotus root connect.
According to different embodiments, vacuum treatment device can have at least one high-vacuum pump, its to be fixed on chamber cap and with the coupling of second forvacuum Supply Structure.Significantly, forvacuum can be provided for driving at least one high-vacuum pump by means of second forvacuum Supply Structure.At least one high-vacuum pump described can be such as turbomolecular pump or have turbomolecular pump.
According to different embodiments, first forvacuum Supply Structure can have the first tongued and grooved flanges, and the second forvacuum Supply Structure can have the second tongued and grooved flanges.At this, described two tongued and grooved flanges can be arranged in this wise, that is, its automatically vacuum-tight mutual lotus root connection when chamber cap is closed.Significantly, described two tongued and grooved flanges (two fronts of exposing of such as described two tongued and grooved flanges) are close to each other in this wise when chamber cap is closed, namely, a sealing off gap is extended between two tongued and grooved flanges, it can seal by means of sealed structure, such as, by means of lip seal portion.
According to different embodiments, the first tongued and grooved flanges and/or the second tongued and grooved flanges can have at least one sealing member, for being sealed in gap when chamber cap is closed between two tongued and grooved flanges.
According to different embodiments, at least one sealing member can be or have at least one lip seal portion.
According to different embodiments, the first forvacuum Supply Structure and the second forvacuum Supply Structure can be arranged to tubulose substantially.At this, forvacuum can be provided in the inside of tubulose forvacuum Supply Structure.
According to different embodiments, at least one lip seal portion described can have silica gel or be made up of silica gel.
According to different embodiments, chamber cap rotatably also can be arranged in this wise by supporting, and namely it can be opened by means of rotary motion and/or be closed.When chamber cap is opened and/or close (by means of rotary motion), the first tongued and grooved flanges of the first forvacuum Supply Structure and the second tongued and grooved flanges of the second forvacuum Supply Structure can relatively move mutually on circular orbit.When chamber cap is opened and/or close (by means of rotary motion), the second forvacuum Supply Structure at least piecewise is moved on circular orbit relative to the first forvacuum Supply Structure.
According to different embodiments, chamber cap can be rotated to support in the end of chamber cap on the housing of room.
According to different embodiments, chamber cap can be set in this wise, that is, its in closed state loosely be placed on the housing of room.In chamber cap placement and/or when taking off from room housing, the first tongued and grooved flanges of the first forvacuum Supply Structure and the second tongued and grooved flanges of the second forvacuum Supply Structure can relatively move mutually point-blank.In chamber cap placement and/or when taking off from room housing, the second forvacuum Supply Structure can at least be moved relative to the first forvacuum Supply Structure piecewise point-blank.
According to different embodiments, vacuum treatment device can have at least one forevacuum pump assembly, at least one forevacuum pump assembly wherein said is connected with the first forvacuum Supply Structure, for by means of the first forvacuum Supply Structure for room housing provides forvacuum.Therefore, when chamber cap is closed, the second forvacuum Supply Structure also can be connected with at least one forevacuum pump assembly described.
According to different embodiments, following for driving the method for vacuum treatment device to comprise: the chamber cap of close chamber's housing, wherein at least one opening of room housing is by means of chamber cap vacuum-tight closing; Wherein when chamber cap is closed, first forvacuum Supply Structure of room housing and the second forvacuum Supply Structure of room housing be mutually coupling automatically, and use first forvacuum Supply Structure and/or the second forvacuum Supply Structure vacuumize the room housing of closing.
Display in embodiments of the invention accompanying drawing below is also explained in more detail below.
Accompanying drawing explanation
In accompanying drawing
Figure 1A illustrates the vacuum treatment device under open state according to different embodiments with schematic cross-sectional view;
Figure 1B and 1C illustrates the vacuum treatment device with open or closed chamber cap according to different embodiment respectively with schematic cross-sectional view;
Fig. 2 is the exemplary schematic detail view of the forvacuum supply department according to different embodiments;
Fig. 3 illustrates the vacuum treatment device with folding chamber cap according to different embodiments with schematic cross-sectional view;
Fig. 4 illustrates the vacuum treatment device in closed state according to different embodiments with schematic cross-sectional view;
Embodiment
In the following detailed description with reference to accompanying drawing, these accompanying drawings form the part of this specification sheets and show wherein and can perform the specific embodiment of the present invention for being described.In this regard, employ time directed to described accompanying drawing directional terminology such as " on ", D score, "front", "rear", " above " and " below " etc.Because the assembly of each embodiment can with multiple different direction and location, directional terminology is for illustration of property and is construed as limiting never in any form.It is apparent that other embodiment can be utilized and carry out change in structure or in logic, and protection scope of the present invention can not be departed from.It is apparent that the feature of the exemplary embodiment of difference described herein can combine mutually, unless there are other explanation special.Therefore the detailed description below should not understood with restrictive, sense, and protection scope of the present invention is limited by appending claims.
In this specification sheets scope, use concept " connections ", " joints " and " coupling " with describe direct be indirectly connected, directly and indirectly joint and directly and indirectly coupling.In the accompanying drawings, if favourable, same or analogous element is with identical Reference numeral.
In traditional vacuum treatment device, discerptible forvacuum treatment system can power keep together by means of clip (such as by means of pliers etc.) ordinatedly.This can require the installation cost when chamber cap opens and closes.
According to different embodiments, be provided for the discerptible backing system between chamber cap and room housing of vacuum treatment device, wherein when chamber cap lifts from room housing or move away (such as rotating) from room housing, backing system separates automatically, and wherein when chamber cap housing place, room install or when being placed on the housing of room, backing system automatic vacuum connects hermetically or engages.For this reason, backing system has at least one separation point position, this position backing system lid flange can with the shell flange coupling be associated of backing system, its middle cover flange can be fixed on chamber cap and wherein shell flange can be fixed on the housing of room.When vacuum-tight coupling, lid flange and/or shell flange can have sealing lip (lip seal portion).
When treatment facility operates (when producing vacuum), chamber cap to be firmly adsorbed on the housing of room and discerptible backing system due to sealing lip can vacuum-tight closing or due to the chamber cap closed vacuum-tight closing.
Significantly, only when ventilating to vacuum chamber (being made up of chamber cap and room housing), the backing system between chamber cap and room housing just separately.Therefore high workload security can be produced.In addition, the maintenance for the treatment of facility also can simple and fast more.
Figure 1A illustrates the vacuum treatment device 100 (or vacuum processing chamber of vacuum treatment device 100) perpendicular to the carriage direction 101 of the matrix in vacuum treatment device 100 with schematic cross-sectional view.Vacuum treatment device 100 can have room housing 102 (vacuum chamber housing 102) and chamber cap 104 (vacuum room cover 104).At this, room housing 102 can on the upside of the housing of room in there is opening, for holding chamber cap 104.Significantly, room housing 102 and chamber cap 104 can be arranged in this wise mutually matchingly, and namely the cover gab 111 of room housing 102 can be closed by means of chamber cap 104, such as vacuum-tight closing.For this reason, such as room housing 102 and chamber cap 104 can have at least one trim 102d, 104d, and wherein room housing 102 and chamber cap 104 are lower in off position can utilize them to provide the vacuum chamber of vacuum-pumping.In addition, room housing 102 with two trim 102d of chamber cap 104, can sealed structure be provided between 104d, such as flexible vacuum-sealing portion, such as sealing lip.According to different embodiments, the trim 102d of room housing 102 can provide at opening 111 edge around ground, and the trim 102d of chamber cap 104 can be arranged to match with the trim 102d of room housing 102.
According to different embodiments, chamber cap 104 can be placed on room housing 102 and the room housing 102 therefore realized sealing by means of chamber cap 104 vacuumizes.
According to different embodiments, room housing 102 can have at least one matrix-transhipment-opening 102, for being transported in vacuum treatment device 100 by one or more matrix.In addition, vacuum treatment device 100 can as continuous coated equipment (as so-called online equipment), and wherein matrix-transport can be transported face 101 along matrix and implemented, such as, by means of delivery system.The vacuum treatment device 100 being such as arranged to continuous coated equipment such as can have multiple rooms housing 102.In addition, the vacuum treatment device 100 being such as arranged to continuous coated equipment such as can have with multiple room (compartment) room housing 102 or have multiple respectively with the room housing 102 of multiple room.At this, each room of each room housing 102 or vacuum treatment device 100 can have two matrix-transhipment-openings 102, for transporting one or more matrix by vacuum treatment device 100.
According to different embodiments, room housing 102 can be arranged in this wise, that is, opening is provided in the upside of room housing, and chamber cap 104 can be placed on room housing 102.Significantly, the vacuum treatment device 100 of housing 102 of having family is with can be arranged to the vacuum treatment device 100 of level.
Figure 1B illustrates vacuum treatment device 100 with the cross sectional representation in the direction along carriage direction 101 or side-view.The delivery system entering transport face 101e for transporting matrix such as can be implemented by means of transport cylinder 113.
According to different embodiment, vacuum treatment device 100 can have forvacuum supply department.At this, room housing 102 can be arranged the first forvacuum Supply Structure 108a, such as, be fixed on room housing 102 or position is fixedly provided near room housing 102.In addition, chamber cap 104 can be arranged the second forvacuum Supply Structure 108b, to be such as fixed on chamber cap 104 or with chamber cap 104 coupling.According to different embodiments, the first forvacuum Supply Structure 108a and the second forvacuum Supply Structure 108b can be arranged in this wise, i.e. its automatically mutual coupling of vacuum-tight when chamber cap 104 is closed.
Significantly, the coupling of two forvacuum Supply Structure 108a, 108b can be arranged like this, that is, when chamber cap 104 is placed on room housing 102, forvacuum Supply Structure 108a, 108b is interconnected.At this, two forvacuum Supply Structure 108a can be sealed, the gap between 108b by means of flexible seals such as lip seal portion.
Two forvacuum Supply Structure 108a, 108b can provide in the form of a ring, thus at ring-type forvacuum Supply Structure 108a, the forvacuum of vacuum treatment device 100 in 108b, can be provided for, such as, by means of the forevacuum pump assembly be coupled on the first forvacuum Supply Structure 108a.
According to different embodiments, can be provided in about 100mbar-about 10 -2the forvacuum of the pressure range of mbar, such as, by means of spiral pump, oilgear pump, rocking bar piston pump (Lodz pump) and/or other the forevacuum pump be applicable to, such as rotary slide valve pump.
In addition, high-vacuum pump 106 can be provided on chamber cap 104, its such as can with the second forvacuum Supply Structure 108b coupling, thus can such as to the room housing 102 sealed by means of chamber cap 104 in high vacuum scope (from about 10 -2mbar-about 10 -7mbar) vacuumize.
Fig. 1 C illustrates foregoing vacuum treatment device 100 in closed state, and namely with the chamber cap 104 closed, wherein chamber cap 104 is by the opening vacuum-tight closing in room housing 102.Apparently, under chamber cap 104 closes situation, second forvacuum Supply Structure 108b is connected with the first forvacuum Supply Structure 108a, such as two forvacuum Supply Structure 108a, 108b mutually extrudes in the coupling region 110 or separated region 110 of forvacuum supply department, mutual grafting or close to each other, make at two forvacuum Supply Structure 108a, the gap between 108b can by means of flexible vacuum both seals.As previously mentioned, can provide process range 102p in room housing 102, it can vacuumize by means of forvacuum Supply Structure 108a, 108b (with optionally at least one high-vacuum pump 106).
According to different embodiments, chamber cap 104 such as can open and close by means of indoor crane (Hallenkran).
According to different embodiments, room housing 102 can have at roughly 40cm to the length in the scope roughly between 1m along carriage direction.In addition, room housing 102 can in the scope of about 1m to 5m perpendicular to the width that carriage direction 101 has along width 103.
According to different embodiments, the width that opening in room housing 102 111 (with therefore correspondingly chamber cap 104) can have along width 103 is greater than about 70% of room housing 102 width.Significantly, chamber cap 104 can cover the major part of room housing 102, such as, exceed 50% on the upside of room housing 102.
According to different embodiments, chamber cap 102 can be the about 150cm of about 40cm-along short transverse 105 perpendicular to width with perpendicular to the height that carriage direction 101 has.
Hereinafter, describe the difference change of vacuum treatment device 100 and the details of setting and room housing 102 and chamber cap 104, wherein, the essential characteristic and function that describe in conjunction with Figure 1A to 1C can be comprised similarly.In addition, the Characteristic and function hereinafter described can be transferred to the vacuum treatment device 100 described in Figure 1A to 1C similarly, or can be combined with the true vacuum treatment device 100 described in Figure 1A to 1C.
Fig. 2 to schematically illustrate when two forvacuum Supply Structure 108a, 108b are interconnected 220 two forvacuum Supply Structure 108a in coupling region 110, the cross-sectional view of 108b.
According to different embodiments, the first forvacuum Supply Structure 108a has the first tubular vacuum guide portion 208a of band first tongued and grooved flanges 210a (shell flange).Similarly, the second forvacuum Supply Structure 108b has the second tubular vacuum guide portion 208b of band second tongued and grooved flanges 210b (lid flange).At two tongued and grooved flanges 210a, at least one of 210b can arrange sealing member 212a, 212b, such as at least one lip seal portion, thus when two tongued and grooved flanges 210a, 210b near time, such as, when chamber cap 104 closes, they can vacuum-tight coupling.Be understandable that, the requirement that forvacuum Supply Structure 108a, 108b can mate each vacuum treatment device 100 and meet on building technology.
According to different embodiments, the bore that tubular vacuum enforcement division 208a, 208b have can in the roughly 5cm scope to roughly 30cm.
As in Fig. 3 with shown in side schematic view or cross sectional representation, chamber cap 104 can by means of bearing 304 (or other holding device be applicable to) rotatably (pivotly) be fixed on room housing 102 in this wise, that is, chamber cap 104 can around axle pivotable 310 so that opening and closing.
As previously described, chamber cap 104 and room housing 102 can be arranged in this wise, i.e. the second forvacuum Supply Structure 108b and the first forvacuum Supply Structure 108a coupling when chamber cap 104 is closed.
As in Fig. 4 with shown in side schematic view or cross sectional representation, first forvacuum Supply Structure 108a can be fixed on room housing 102, second forvacuum Supply Structure 108b can be fixed on the chamber cap 104 that mates with room housing 102, thus when chamber cap 104 is closed two forvacuum Supply Structure 108a, the mutual coupling of 108b, wherein chamber cap 104 can be connected ordinatedly with room housing 102 shape.In coupling region 110 above, forvacuum Supply Structure 108a, 108b have tongued and grooved flanges 210a respectively, 210b (coupling flange), and at tongued and grooved flanges 210a, can provide lip seal portion 212 between 210b.
According to different embodiments, close encapsulation flange 210a, at forvacuum Supply Structure 108a, just understands when being vacuum in 108b, the gap between 210b in lip seal portion 212.For this reason, lip seal portion 212 can provide flexibly, and such as silica gel can be contained in lip seal portion 212.
As schematically shown in figure 4, multiple high-vacuum pump 106 can be arranged on chamber cap 104, it can be connected with the second forvacuum Supply Structure 108b at outlet side, and can be joined in the treatment zone 102p of room housing 102 by the pump opening provided respectively in chamber cap 104 at inlet side.
Alternatively, two forvacuum Supply Structure 108a, 108b can be arranged in this wise, i.e. two forvacuum Supply Structure 108a, and 108b automatically at least inserts by piecewise mutually when chamber cap 104 is closed.Such as, forvacuum Supply Structure 108a, 108b can be tubulose and have the different pipe diameter of at least segmentation, thus they can be plugged together mutually.At this, vacuum-sealing portion (such as viton (Viton) sealing or wear ring) can be arranged in grafting region.
According to different embodiments, vacuum chamber 100 can comprise: room housing 102, has the opening 111 on the upside of room housing 102, for holding chamber cap 104; Chamber cap 104, for covering the opening 111 in room housing 102; The first forvacuum Supply Structure 108a on room housing 102; Forvacuum Supply Structure 108b on chamber cap 104, wherein the first forvacuum Supply Structure 108a and the second forvacuum Supply Structure 108b is arranged in this wise, i.e. their (such as when chamber cap 104 to be placed on room housing 102 maybe when shutting chamber cap 104) automatically mutual couplings of vacuum-tight when chamber cap 104 is closed.
Such as can implement operation or the operation of vacuum treatment device 100 or vacuum chamber 100 in this wise, namely first close chamber cap 104, the opening 111 in room housing 102 is covered.At this, the opening 111 of room housing 102 can by means of chamber cap 104 vacuum-tight closing or sealing.When chamber cap 104 is closed, the first forvacuum Supply Structure 108a of room housing 102 and the second forvacuum Supply Structure 108b of chamber cap 104 can automatically coupling mutually.Subsequently, the room housing of closedown can vacuumize by means of the first forvacuum Supply Structure 108a and/or the second forvacuum Supply Structure 108b.
In addition, in order to open vacuum treatment device 100 or vacuum chamber 100, such as when safeguarding, first ventilation carried out to vacuum treatment device 100 and remove chamber cap 104 from room housing 102 subsequently, wherein the first forvacuum Supply Structure 108a and the second forvacuum Supply Structure 108b automatically (spontaneously) be separated from each other.
Significantly, two forvacuum Supply Structure 108a, 108b and especially two tongued and grooved flanges 210a, 210b can relatively move, so that their couplings, such as can along circular orbit (pivot moves) or mobile along straight line (translation).Significantly, two forvacuum Supply Structure 108a, 108b and outstanding two tongued and grooved flanges 210a, 210b can provide grafting.
According to different embodiments, two forvacuum Supply Structure 108a, 108b and especially two tongued and grooved flanges 210a, 210b can relatively regulate mutually, thus they can the mutual coupling of vacuum-tight when chamber cap is closed.
Can regulate in this wise, i.e. when chamber cap is closed (when such as vacuumizing when vacuum treatment device) and therefore at forvacuum Supply Structure 108a, in the mutual coupling situation of 108b, (fixing) two forvacuum Supply Structure 108a can be determined, 108b and especially two tongued and grooved flanges 210a, the 210b corresponding position on chamber cap 104 and on room housing 102 (position or orientation).Significantly, in chamber cap 104 down periods, two forvacuum Supply Structure 108a can be set, between 108b and especially two tongued and grooved flanges 210a, the gap between 210b.
According to different embodiments, two forvacuum Supply Structure 108a, 108b and especially two tongued and grooved flanges 210a, 210b is removably mounted on chamber cap 104 respectively with on room housing 102, make two forvacuum Supply Structure 108a, 108b and especially two tongued and grooved flanges 210a, 210b can relatively regulate mutually.

Claims (9)

1. a vacuum treatment device (100), it comprises:
Room housing (102), has the opening (111) in room housing (102) upside, for holding chamber cap (104);
Chamber cap (104), for covering the opening (111) of room housing (102);
The first forvacuum Supply Structure (108a) on room housing (102);
The second forvacuum Supply Structure (108b) on chamber cap (104),
Wherein the first forvacuum Supply Structure (108a) and the second forvacuum Supply Structure (108b) are arranged in this wise, i.e. their automatically mutual couplings of vacuum-tight when chamber cap (104) is closed.
2. vacuum treatment device according to claim 1, also comprises:
At least one high-vacuum pump (106) on chamber cap (104), wherein said at least one high-vacuum pump (106) and the second forvacuum Supply Structure (108b) coupling.
3. vacuum treatment device according to claim 1,
Wherein the first forvacuum Supply Structure (108a) have the first tongued and grooved flanges (210a) and wherein the second forvacuum Supply Structure (108b) there is the second tongued and grooved flanges (210b), and wherein two tongued and grooved flanges (210a, 210b) arrange in this wise, i.e. their automatically mutual couplings of vacuum-tight when chamber cap (104) is closed.
4. vacuum treatment device according to claim 3,
Wherein the first tongued and grooved flanges (210a) and/or the second tongued and grooved flanges (210b) have at least one sealing member (212), for sealing the gap between two tongued and grooved flanges (210a, 210b) when chamber cap (104) is closed.
5. vacuum treatment device according to claim 4,
Wherein said at least one sealing member (212) has at least one lip seal portion.
6. vacuum treatment device according to claim 4,
At least one lip seal portion (212) wherein said is formed containing silica gel or by silica gel.
7. vacuum treatment device according to claim 1,
Wherein chamber cap (104) is rotatably also arranged in this wise by supporting, and namely it can be opened by means of (320) in rotary moving and/or be closed.
8. vacuum treatment device according to claim 1,
Wherein chamber cap (104) is arranged in this wise, and namely it descends loosely to be placed in room housing (102) in off position.
9. vacuum treatment device according to claim 1, also comprises:
At least one forevacuum pump assembly, it is connected with the first forvacuum Supply Structure (108a), for being that room housing (102) provides forvacuum by means of the first forvacuum Supply Structure.
CN201520295524.8U 2014-05-08 2015-05-08 Vacuum treatment device Active CN204644463U (en)

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DE102014106466.6A DE102014106466B4 (en) 2014-05-08 2014-05-08 vacuum processing plant

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10004786C2 (en) * 1999-09-14 2002-11-07 Ardenne Anlagentech Gmbh Vacuum coating system
DE202011002012U1 (en) * 2011-01-27 2011-04-07 Von Ardenne Anlagentechnik Gmbh Vacuum coating system with pump and magnetron arrangement

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DE102014106466A1 (en) 2015-11-12

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