CN112708867A - Reciprocating film coating equipment and film coating method - Google Patents

Reciprocating film coating equipment and film coating method Download PDF

Info

Publication number
CN112708867A
CN112708867A CN202011622159.9A CN202011622159A CN112708867A CN 112708867 A CN112708867 A CN 112708867A CN 202011622159 A CN202011622159 A CN 202011622159A CN 112708867 A CN112708867 A CN 112708867A
Authority
CN
China
Prior art keywords
storage cavity
conveying
storage
cavity
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202011622159.9A
Other languages
Chinese (zh)
Inventor
邵海平
刘莉云
曹英朝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Tisnawell New Material Technology Co ltd
Original Assignee
Guangdong Tisnawell New Material Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Tisnawell New Material Technology Co ltd filed Critical Guangdong Tisnawell New Material Technology Co ltd
Priority to CN202011622159.9A priority Critical patent/CN112708867A/en
Publication of CN112708867A publication Critical patent/CN112708867A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations

Abstract

The invention provides a reciprocating film coating device and a film coating method, which comprise a first storage cavity, a film coating cavity, a second storage cavity, a vacuum pump set and a conveying mechanism, wherein the first storage cavity is communicated with the second storage cavity through the film coating cavity, the conveying mechanism sequentially penetrates through the first storage cavity, the film coating cavity and the second storage cavity, a first vacuum isolation valve is arranged at an inlet of the first storage cavity, and the vacuum pump set is respectively connected with the first storage cavity and the second storage cavity. The invention has the beneficial effects that: the film coating equipment is reasonable in structure and provided with the double storage cavities, multiple substrates can be conveyed back and forth through the two conveying mechanisms in the storage cavities, so that the reciprocating film coating of the substrates is realized, the film coating equipment is large in film loading amount, large in capacity and good in economic benefit, multiple times of vacuumizing is avoided in the film coating process, the time waste is caused, the production cost is effectively reduced, the production efficiency is improved, and the competitiveness of enterprises is increased.

Description

Reciprocating film coating equipment and film coating method
Technical Field
The invention relates to the technical field of vacuum coating equipment, in particular to reciprocating coating equipment and a coating method.
Background
At present, most of large-size substrate (the length is more than 3 meters) coating equipment is divided into 3 types of horizontal continuous coating machines, vertical continuous coating machines and monomer coating machines, wherein the former two types are modes that one end of a product enters and the other end of the product exits, if the product needs to be repeatedly coated with films (such AS AF/AS evaporation process), the two types of equipment can be realized, but the coating method cannot be used due to extremely low production capacity and poor economical efficiency. The 3 rd monomer type film plating machine is a film plating device which is used in large quantity at present, and has the defects that each furnace can only plate 2-3 sheets, the use of manpower is more, the productivity is low, and the production cost is always high.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: aiming at the defects of the prior art, the equipment and the film coating method which have large chip loading quantity and can carry out film coating repeatedly are provided.
In order to solve the technical problems, the invention adopts the technical scheme that: a reciprocating coating device comprises a first storage cavity, a coating cavity, a second storage cavity, a vacuum pump set and a conveying mechanism, wherein the first storage cavity is communicated with the second storage cavity through the coating cavity, the conveying mechanism sequentially penetrates through the first storage cavity, the coating cavity and the second storage cavity, a first vacuum isolation valve is arranged at an inlet of the first storage cavity, the vacuum pump set is respectively connected with the first storage cavity and the second storage cavity,
the first storage cavity and the second storage cavity are used for temporarily storing substrates;
the vacuum pump set is used for converting the atmospheric environment where the substrate is located into a vacuum environment meeting the process requirements or reducing the vacuum environment where the substrate is located into the atmospheric environment;
the coating cavity is used for coating the substrate in a vacuum environment;
the conveying mechanism is used for conveying the substrates to be processed into the first storage cavity for storage, conveying the substrates in the first storage cavity one by one to the coating cavity for coating treatment, conveying the treated substrates into the second storage cavity for storage, and conveying the substrates in the second storage cavity back to the first storage cavity for storage.
Further, be equipped with first elevating system in the first storage chamber, first elevating system includes first ball screw, first elevator motor and first loading board support, first ball screw vertical set up in the first storage chamber, first elevator motor's drive shaft with first ball screw is connected, first loading board support is fixed with first slip subassembly, first slip subassembly cup joints in first ball screw, first loading board support can be followed first ball screw reciprocates, first loading board support is equipped with the multilayer loading board.
Further, linear bearings are respectively arranged on two sides of the first ball screw, linear bearing seats are correspondingly arranged on the first bearing plate support, and the linear bearing seats are sleeved on the linear bearings.
Furthermore, a second lifting mechanism is arranged in the second storage cavity and comprises a second ball screw, a second lifting motor and a second bearing plate support, the second ball screw is vertically arranged in the second storage cavity, a driving shaft of the second lifting motor is connected with the second ball screw, a second sliding assembly is fixed on the second bearing plate support and is sleeved on the second ball screw, the second bearing plate support can move up and down along the second ball screw, and a plurality of layers of bearing plates are arranged on the second bearing plate support.
Further, both sides of the second ball screw are provided with linear bearings, the second bearing plate support is correspondingly provided with linear bearing seats, and the linear bearing seats are sleeved on the linear bearings.
Furthermore, a pre-cleaning source, a sputtering cathode and an evaporation assembly are arranged in the coating cavity, the pre-cleaning source is arranged on one side close to the first storage cavity, the evaporation assembly is arranged on one side close to the second storage cavity, and the sputtering cathode is arranged between the pre-cleaning source and the evaporation assembly.
Furthermore, the vacuum pump group comprises a mechanical pump and a molecular pump, the first storage cavity is connected with the mechanical pump and the molecular pump, and the second storage cavity is connected with the mechanical pump and the molecular pump.
Further, the conveying mechanism comprises inline wheels and a conveying driving motor which are arranged in a row, the conveying driving motor drives the inline wheels through a conveying belt, and the conveying belt is a conveying belt or a conveying chain.
Furthermore, the second storage cavity is provided with a sheet outlet, and the sheet outlet is provided with a second cavity vacuum isolation valve.
The invention also relates to a coating method, which adopts the equipment as described in any one of the above items, and comprises the following steps:
s1, opening the first vacuum isolation valve, and conveying the substrates one by one to the first storage cavity for storage through the substrate feeding and conveying mechanism;
s2, converting the environment of the substrate into a vacuum environment meeting the process requirements;
s3, conveying the substrates to the film coating cavity one by one from the first storage cavity;
s4, pre-cleaning the substrates one by one to finish the pre-plating layer;
s5, carrying out evaporation coating on the substrate;
s6, conveying the substrates to the second storage cavity one by one for storage;
s7, judging whether the film coating is finished, if not, entering the step S8, and if so, entering the step S16;
s8, conveying the substrates to the film coating cavity one by one from the second storage cavity;
s9, carrying out evaporation coating on the substrate;
s10, conveying the substrates one by one to a first storage cavity for storage;
s11, judging whether the film coating is finished, if not, entering the step S12, and if so, entering the step S16;
s12, conveying the substrates to the film coating cavity one by one from the first storage cavity;
s13, carrying out evaporation coating on the substrate;
s14, conveying the substrates to the second storage cavity one by one for storage;
s15, returning to the step S7;
s16, the substrate is transported out of the first storage chamber or the second storage chamber in close proximity.
The invention has the beneficial effects that: the film coating equipment is reasonable in structure and provided with the double storage cavities, multiple substrates can be conveyed back and forth through the two conveying mechanisms in the storage cavities, so that the reciprocating film coating of the substrates is realized, the film coating equipment is large in film loading amount, large in capacity and good in economic benefit, multiple times of vacuumizing is avoided in the film coating process, the time waste is caused, the production cost is effectively reduced, the production efficiency is improved, and the competitiveness of enterprises is increased.
Drawings
The specific structure and process of the present invention are detailed below with reference to the accompanying drawings:
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic structural diagram of a coating chamber according to the present invention;
FIG. 3 is a schematic view of the first storage chamber of the present invention;
FIG. 4 is a schematic cross-sectional view taken along the line A-A in FIG. 3;
FIG. 5 is a schematic flow chart of a coating method according to the present invention;
1-a substrate;
100-a first storage chamber; 101-a first vacuum isolation valve; 110-a first carrier plate support; 111-a first ball screw; 112-a first slide assembly; 113-linear bearings; 114-linear bearing seats; 115-a carrier plate;
200-a coating cavity; 201-a pre-cleaning source; 202-a sputtering cathode; 203-an evaporation assembly;
300-a second storage chamber; 301-a second vacuum isolation valve; 310-a second carrier plate support;
401-a mechanical pump; 402-a molecular pump;
500-a transport mechanism; 510-a sheet feeding transport mechanism; 520-out-of-sheet transport mechanism.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be connected or detachably connected or integrated; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above should not be understood to necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples described in this specification can be combined and combined by those skilled in the art.
Examples
Referring to fig. 1 to 4, a reciprocating coating apparatus includes a first storage chamber 100, a coating chamber 200, a second storage chamber 300, a vacuum pump set and a conveying mechanism 500, wherein the first storage chamber 100 is communicated with the second storage chamber 300 through the coating chamber 200, the conveying mechanism 500 sequentially passes through the first storage chamber 100, the coating chamber 200 and the second storage chamber 300, an inlet of the first storage chamber 100 is provided with a first vacuum isolation valve 101, a wafer inlet conveying mechanism 510 is arranged outside a wafer inlet of the first storage chamber 100, the vacuum pump set is respectively connected with the first storage chamber 100 and the second storage chamber 300,
the first storage chamber 100 and the second storage chamber 300 are used for temporarily storing the substrate 1;
the vacuum pump set is used for converting the atmospheric environment of the substrate 1 into a vacuum environment meeting the process requirements or reducing the vacuum environment of the substrate 1 into the atmospheric environment;
the coating cavity 200 is used for coating the substrate 1 in a vacuum environment;
the conveying mechanism 500 is used for conveying the substrates 1 to be processed into the first storage cavity 100 for storage, conveying the substrates 1 in the first storage cavity 100 one by one into the coating cavity 200 for coating treatment, conveying the treated substrates 1 into the second storage cavity 300 for storage, and conveying the substrates 1 in the second storage cavity 300 back to the first storage cavity 100 for storage.
In order to realize the function of storing the substrate, a first lifting mechanism is disposed in the first storage cavity 100, preferably, the first lifting mechanism includes two first ball screws 111, a first lifting motor and two first supporting plate brackets 110, the two first ball screws 111 are respectively vertically disposed at two sides of the conveying mechanism 500 in the first storage cavity 100, a driving shaft of the first lifting motor can be respectively connected with the two first ball screws 111 through a transfer device, the two first supporting plate brackets 110 are respectively fixed with a first sliding assembly 112, the first sliding assemblies 112 are respectively sleeved on one first ball screw 111, the two first supporting plate brackets 110 can move up and down along the respective first ball screw 111, the two first supporting plate brackets 110 are respectively provided with a plurality of layers of supporting plates 115, the supporting plates 115 of the two first supporting plate brackets 110 are oppositely disposed, so as to conveniently lift the substrate from the conveying mechanism, the width of the substrate is greater than the width of the transport mechanism, the width between the two first carrier plate holders fits the substrate, and the distance between the two carrier plates 115 is less than the width of the substrate.
Two sides of the first ball screw 111 are respectively provided with a linear bearing 113, the first bearing plate support 110 is correspondingly provided with a linear bearing seat 114, the linear bearing seat 114 is sleeved on the linear bearing 113, and the linear bearing is matched with the ball screw, so that the first bearing plate support can be ensured to stably move along the first ball screw.
The second storage cavity is internally provided with a second lifting mechanism, preferably, the second lifting mechanism comprises two second ball screws, a second lifting motor and two second bearing plate brackets 310, the two second ball screws are respectively vertically arranged at two sides of the conveying mechanism in the second storage cavity, the driving shaft of the second lifting motor can be respectively connected with two second ball screws through a transfer device, a second sliding assembly is fixed on each of the two second bearing plate brackets, the second sliding assemblies are respectively sleeved on a second ball screw, the two second bearing plate brackets can move up and down along the respective second ball screws, the two second bearing plate brackets are respectively provided with a plurality of layers of bearing plates, the bearing plates of the two first bearing plate brackets are oppositely arranged, in order to facilitate the lifting of the substrate from the transport mechanism, the width of the substrate is greater than the width of the transport mechanism, and the width between the two second carrier plate supports is adapted to the substrate.
The two sides of the second ball screw are respectively provided with a linear bearing, the second bearing plate support is correspondingly provided with a linear bearing seat, the linear bearing seats are sleeved on the linear bearings, and the linear bearings are matched with the ball screw, so that the second bearing plate support can be guaranteed to stably move along the second ball screw.
In the aforesaid, it is rotatory through elevator motor drive ball screw, make the slip subassembly that cup joints on ball screw drive the loading board support and reciprocate along ball screw, a substrate can all be placed to every layer of loading board, adopt ball screw can realize high accuracy displacement control, so can set up more loading boards on the loading board support, can place more substrates as far as possible in limited space, further promote the memory space of storage chamber.
Specifically, when the conveying mechanism transports the substrates in place, the lifting motor drives the ball screw to rotate, the sliding assembly sleeved on the ball screw drives the bearing plate support to move upwards along the ball screw, the bearing plate of the bearing plate support lifts the substrates away from the conveying mechanism, when the bearing plate of the bearing plate support moves upwards in place, the conveying mechanism conveys the next substrate in place, the next layer of bearing plate of the bearing plate support lifts the next substrate away from the conveying mechanism, and therefore in the past, a plurality of substrates can be stored above the conveying mechanism in the storage cavity.
Similarly, when the substrate needs to be taken out, the lifting motor drives the ball screw to rotate, the sliding assembly sleeved on the ball screw drives the bearing plate support to move downwards along the ball screw, the bearing plate of the bearing plate support puts the substrate on the conveying mechanism, the conveying mechanism conveys the substrate out of the storage area, the upper layer of bearing plate of the bearing plate support puts the next substrate on the conveying mechanism, and therefore in the past, the current storage cavity can be conveyed out of the substrates stored above the conveying mechanism in the storage cavity.
A pre-cleaning source 201, a sputtering cathode 202 and an evaporation assembly 203 are arranged in the film coating cavity 200, the pre-cleaning source 201 is arranged on one side close to the first storage cavity 100, the evaporation assembly 203 is arranged on one side close to the second storage cavity 300, the sputtering cathode 202 is arranged between the pre-cleaning source 201 and the evaporation assembly 203, and the pre-cleaning source 201, the sputtering cathode 202 and the evaporation assembly 203 are all arranged above the conveying mechanism 500.
When the substrate 1 passes through the coating cavity 200 at a uniform speed, the pre-cleaning source 201 and the sputtering cathode 202 work together to clean the substrate 1 to finish the pre-coating, then the evaporation assembly 203 performs further coating treatment on the substrate 1 passing through, and when the substrate 1 passes through the coating cavity 200, a coating process can be finished.
In order to quickly reach the vacuum degree required by the coating process, the vacuum pump group comprises a mechanical pump 401 and a molecular pump 402, the mechanical pump is high in power, the cavity can be quickly pumped to a low vacuum degree, the molecular pump is good in air pumping effect, the cavity can reach a higher vacuum degree, the first storage cavity is connected with the mechanical pump and the molecular pump, the second storage cavity is connected with the mechanical pump and the molecular pump, and the vacuum pumping efficiency can be effectively increased.
The air pressure of the first storage cavity, the second storage cavity and the coating cavity can be rapidly pumped to about 3Pa through the mechanical pump, and the air pressure of the first storage cavity, the second storage cavity and the coating cavity can be pumped to 2x10 through the molecular pump-3The vacuum degree of about Pa is in order to meet the requirements of the coating process.
The conveying mechanism comprises straight-row wheels and a conveying driving motor which are arranged in a row, the conveying driving motor drives the straight-row wheels through a conveying belt, and the conveying belt is a conveying belt or a conveying chain.
Specifically, connect through the conveyer belt between every row of inline, inline and transmission driving motor pass through the conveyer belt and connect, and conveyer belt or conveying chain can be selected as required to the conveyer belt, adopt inline to be used for the conveying, simple structure, and the reliability is high, can accomplish the conveying task well.
In order to improve the sheet discharging efficiency, the second storage chamber 300 is provided with a sheet outlet, the sheet outlet is provided with a second chamber vacuum isolation valve 301, and a sheet discharging conveying mechanism 520 is arranged outside the sheet outlet of the second storage chamber 300.
The equipment can be accessed from the same end, and can also be matched with the layout of a production line to realize one-end chip feeding and one-end chip discharging, so that the chip discharging efficiency can be effectively improved. After all the substrates are coated, the environment of the substrates can be reduced to the atmospheric environment, and then the substrates are conveyed out of the chamber through the delivery mechanism.
From the above description, the beneficial effects of the present invention are: the film coating equipment is reasonable in structure and provided with the double storage cavities, multiple substrates can be conveyed back and forth through the two conveying mechanisms in the storage cavities, so that the reciprocating film coating effect is realized, the film coating equipment is large in film loading capacity, large in capacity and good in economic benefit, multiple times of vacuumizing is avoided in the film coating process, the time waste is caused, the production cost is effectively reduced, the production efficiency is improved, and the competitiveness of enterprises is increased.
Referring to fig. 5, the present invention further relates to a coating method using the above reciprocating coating apparatus, comprising the steps of:
s1, opening the first vacuum isolation valve, and conveying the substrates one by one to the first storage cavity for storage through the substrate feeding and conveying mechanism;
the substrate is conveyed to the first storage cavity by the cooperation of the substrate feeding conveying mechanism and the conveying mechanism, the first lifting mechanism is lifted, the substrate is lifted away from the conveying mechanism by the first layer of bearing plate of the first lifting mechanism, at the moment, the next substrate is conveyed to the first storage cavity by the cooperation of the substrate feeding conveying mechanism and the conveying mechanism, the first lifting mechanism is lifted again, and the next substrate is lifted away from the conveying mechanism by the second layer of bearing plate of the first lifting mechanism.
S2, converting the environment of the substrate into a vacuum environment meeting the process requirements;
air in the first storage chamber in which the substrate is placed is pumped to a low vacuum of about 3Pa by a mechanical pump, and then air in the first storage chamber in which the substrate is placed is pumped to 2x10 by a molecular pump-3Vacuum degree of about Pa.
S3, conveying the substrates to the film coating cavity one by one from the first storage cavity;
the substrates are taken down one by one from the bearing plate through the matching of the conveying mechanism and the first lifting mechanism, and are conveyed to the coating cavity at a constant speed according with the process requirement by the conveying mechanism.
S4, pre-cleaning the substrates one by one to finish the pre-plating layer;
and when the substrate passes through the pre-cleaning source and the sputtering cathode at a constant speed, starting the pre-cleaning source and the sputtering cathode, and pre-cleaning the upper surface of the substrate to finish the pre-plating layer.
S5, carrying out evaporation coating on the substrate;
and when the substrate passes through the evaporation assembly at a constant speed, opening the evaporation assembly, and carrying out evaporation coating treatment on the upper surface of the substrate.
S6, conveying the substrates to the second storage cavity one by one for storage;
after the substrates are coated, the conveying mechanism conveys the substrates to the second storage cavity, the second lifting mechanism is lifted, the first layer of bearing plate of the second lifting mechanism lifts the substrates away from the conveying mechanism, at the moment, the next substrate after coating is finished is conveyed to the second storage cavity by the conveying mechanism, the second lifting mechanism is lifted again, the next substrate is lifted away from the conveying mechanism by the second layer of bearing plate of the second lifting mechanism, and therefore in the past, after the substrates are completely placed on the bearing plate of the second lifting mechanism, the storage work of the coated substrates is finished.
S7, judging whether the film coating is finished, otherwise, entering the step S8;
when the substrate needs to be coated for multiple times, the conveying mechanism is switched to a reverse transmission mode. It should be noted that the direction from the first storage chamber to the second storage chamber is a forward direction, and the direction from the second storage chamber to the first storage chamber is a reverse direction.
And when the film coating process is finished, the second vacuum isolation valve is opened, the conveying mechanism and the second lifting mechanism are matched with the film discharging conveying mechanism, and the substrates are conveyed out of the second storage cavity one by one from the film discharging port of the second storage cavity.
S8, conveying the substrates to the film coating cavity one by one from the second storage cavity;
the substrates are taken down one by one from the bearing plate through the matching of the conveying mechanism and the second lifting mechanism, and are reversely conveyed to the coating cavity at a constant speed according with the process requirement by the conveying mechanism.
S9, carrying out evaporation coating on the substrate;
and when the substrate passes through the evaporation assembly at a constant speed, opening the evaporation assembly, and carrying out evaporation coating treatment on the upper surface of the substrate.
S10, conveying the substrates one by one to a first storage cavity for storage;
after the substrates are coated, the conveying mechanism reversely conveys the substrates to the first storage cavity, the first lifting mechanism is lifted, the first layer bearing plate of the first lifting mechanism lifts the substrates away from the conveying mechanism, at the moment, the conveying mechanism conveys the next substrate which is coated into the first storage cavity, the first lifting mechanism is lifted again, the second layer bearing plate of the first lifting mechanism lifts the next substrate away from the conveying mechanism, and therefore in the past, after the substrates are completely placed on the bearing plates of the first lifting mechanism, the storage work of the substrates which are coated for the second time is completed.
S11, judging whether the film coating is finished, otherwise, entering the step S12;
when the substrate still needs to be coated, the conveying mechanism is switched to a forward transmission mode.
S12, conveying the substrates to the film coating cavity one by one from the first storage cavity;
the substrates are taken down one by one from the bearing plate through the matching of the conveying mechanism and the first lifting mechanism, and are conveyed to the coating cavity at a constant speed according with the process requirement by the conveying mechanism.
S13, carrying out evaporation coating on the substrate;
and when the substrate passes through the evaporation assembly at a constant speed, opening the evaporation assembly, and carrying out evaporation coating treatment on the upper surface of the substrate.
S14, conveying the substrates to the second storage cavity one by one for storage;
after the substrates are coated, the conveying mechanism conveys the substrates to the second storage cavity, the second lifting mechanism is lifted, the first layer bearing plate of the second lifting mechanism lifts the substrates away from the conveying mechanism, at the moment, the conveying mechanism conveys the next substrate which is coated into the second storage cavity, the second lifting mechanism is lifted again, the second layer bearing plate of the second lifting mechanism lifts the next substrate away from the conveying mechanism, and therefore in the past, after the substrates are completely placed on the bearing plate of the second lifting mechanism, the storage work of the substrates which are coated for three times is completed.
S15, returning to the step S7;
if the substrate still needs to be coated, the process returns to step S7 until the coating is finished.
S16, conveying the substrate out of the first storage cavity or the second storage cavity nearby;
when the film coating process is finished, judging that the current substrate is in a first storage cavity or a second storage cavity, if the current substrate is in the first storage cavity, starting a first vacuum isolation valve, matching a conveying mechanism and a first lifting mechanism with a film discharging conveying mechanism, and sending the substrates out of the first storage cavity from a film discharging port of the first storage cavity one by one; if the substrate is in the second storage cavity, the second vacuum isolation valve is opened, the conveying mechanism and the second lifting mechanism are matched with the substrate discharging conveying mechanism, and the substrates are conveyed out of the second storage cavity one by one from the substrate discharging port of the second storage cavity.
Similarly, the substrate after the film coating process can be sent out through the prepared opening according to the requirement.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes performed by the present specification and drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.

Claims (10)

1. A reciprocating coating equipment is characterized in that: comprises a first storage cavity, a coating cavity, a second storage cavity, a vacuum pump set and a conveying mechanism, wherein the first storage cavity is communicated with the second storage cavity through the coating cavity, the conveying mechanism sequentially penetrates through the first storage cavity, the coating cavity and the second storage cavity, a first vacuum isolation valve is arranged at an inlet of the first storage cavity, the vacuum pump set is respectively connected with the first storage cavity and the second storage cavity,
the first storage cavity and the second storage cavity are used for temporarily storing substrates;
the vacuum pump set is used for converting the atmospheric environment where the substrate is located into a vacuum environment meeting the process requirements or reducing the vacuum environment where the substrate is located into the atmospheric environment;
the coating cavity is used for coating the substrate in a vacuum environment;
the conveying mechanism is used for conveying the substrates to be processed into the first storage cavity for storage, conveying the substrates in the first storage cavity one by one to the coating cavity for coating treatment, conveying the treated substrates into the second storage cavity for storage, and conveying the substrates in the second storage cavity back to the first storage cavity for storage.
2. The reciprocating plating apparatus according to claim 1, wherein: the first storage cavity is internally provided with a first lifting mechanism, the first lifting mechanism comprises a first ball screw, a first lifting motor and a first bearing plate support, the first ball screw is vertically arranged in the first storage cavity, a driving shaft of the first lifting motor is connected with the first ball screw, the first bearing plate support is fixed with a first sliding assembly, the first sliding assembly is sleeved on the first ball screw, the first bearing plate support can be along the first ball screw to move up and down, and the first bearing plate support is provided with a plurality of layers of bearing plates.
3. The reciprocating plating apparatus according to claim 2, wherein: and linear bearings are respectively arranged on two sides of the first ball screw, linear bearing seats are correspondingly arranged on the first bearing plate support, and the linear bearing seats are sleeved on the linear bearings.
4. The reciprocating plating apparatus according to claim 3, wherein: the second storage cavity is internally provided with a second lifting mechanism, the second lifting mechanism comprises a second ball screw, a second lifting motor and a second bearing plate support, the second ball screw is vertically arranged in the second storage cavity, a driving shaft of the second lifting motor is connected with the second ball screw, a second sliding assembly is fixed on the second bearing plate support, the second sliding assembly is sleeved on the second ball screw, the second bearing plate support can be moved up and down along the second ball screw, and the second bearing plate support is provided with multiple layers of bearing plates.
5. The reciprocating plating apparatus according to claim 4, wherein: and linear bearings are arranged on two sides of the second ball screw, linear bearing seats are correspondingly arranged on the second bearing plate support, and the linear bearing seats are sleeved on the linear bearings.
6. The reciprocating plating apparatus according to any one of claims 1 to 5, wherein: the coating intracavity is equipped with in advance and washs source, sputter cathode and evaporation assembly, it sets up in advance to wash the source in advance in being close to one side of first storage chamber, evaporation assembly set up in being close to one side of second storage chamber, sputter cathode set up in advance wash the source with between the evaporation assembly.
7. The reciprocating plating apparatus according to claim 6, wherein: the vacuum pump group comprises a mechanical pump and a molecular pump, the first storage cavity is connected with the mechanical pump and the molecular pump, and the second storage cavity is connected with the mechanical pump and the molecular pump.
8. The reciprocating plating apparatus according to claim 7, wherein: the conveying mechanism comprises straight-row wheels and a conveying driving motor which are arranged in a row, the conveying driving motor drives the straight-row wheels through a conveying belt, and the conveying belt is a conveying belt or a conveying chain.
9. The reciprocating plating apparatus according to claim 8, wherein: the second storage cavity is provided with a film outlet, and the film outlet is provided with a second cavity vacuum isolation valve.
10. A plating method characterized by using the apparatus according to any one of claims 1 to 9, comprising:
s1, opening the first vacuum isolation valve, and conveying the substrates one by one to the first storage cavity for storage through the substrate feeding and conveying mechanism;
s2, converting the environment of the substrate into a vacuum environment meeting the process requirements;
s3, conveying the substrates to the film coating cavity one by one from the first storage cavity;
s4, pre-cleaning the substrates one by one to finish the pre-plating layer;
s5, carrying out evaporation coating on the substrate;
s6, conveying the substrates to the second storage cavity one by one for storage;
s7, judging whether the film coating is finished, if not, entering the step S8, and if so, entering the step S16;
s8, conveying the substrates to the film coating cavity one by one from the second storage cavity;
s9, carrying out evaporation coating on the substrate;
s10, conveying the substrates one by one to a first storage cavity for storage;
s11, judging whether the film coating is finished, if not, entering the step S12, and if so, entering the step S16;
s12, conveying the substrates to the film coating cavity one by one from the first storage cavity;
s13, carrying out evaporation coating on the substrate;
s14, conveying the substrates to the second storage cavity one by one for storage;
s15, returning to the step S7;
s16, the substrate is transported out of the first storage chamber or the second storage chamber in close proximity.
CN202011622159.9A 2020-12-31 2020-12-31 Reciprocating film coating equipment and film coating method Pending CN112708867A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202011622159.9A CN112708867A (en) 2020-12-31 2020-12-31 Reciprocating film coating equipment and film coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202011622159.9A CN112708867A (en) 2020-12-31 2020-12-31 Reciprocating film coating equipment and film coating method

Publications (1)

Publication Number Publication Date
CN112708867A true CN112708867A (en) 2021-04-27

Family

ID=75547569

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202011622159.9A Pending CN112708867A (en) 2020-12-31 2020-12-31 Reciprocating film coating equipment and film coating method

Country Status (1)

Country Link
CN (1) CN112708867A (en)

Citations (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006167639A (en) * 2004-12-17 2006-06-29 Tokyo Ohka Kogyo Co Ltd Coating device and coating method
CN1865497A (en) * 2006-06-10 2006-11-22 中国科学技术大学 Method for continuous chemical vapor deposition and device thereof
JP2007191278A (en) * 2006-01-20 2007-08-02 Tokyo Electron Ltd Substrate conveying device, substrate conveying method and storage medium
JP2007311724A (en) * 2006-05-22 2007-11-29 Sharp Corp Substrate transfer method, and substrate processing device
CN101270467A (en) * 2007-03-22 2008-09-24 深圳豪威真空光电子股份有限公司 Product line for producing AR film
CN201424503Y (en) * 2009-04-30 2010-03-17 常州博士新能源科技有限公司 Multi-functional magnetic control sputtering continuous coating machine
US20100080673A1 (en) * 2008-09-29 2010-04-01 Von Ardenne Anlagentechnik Gmbh Transporting device for a vacuum processing apparatus, drive device for a component of a vacuum processing apparatus, and a vacuum processing apparatus
JP2011040574A (en) * 2009-08-11 2011-02-24 Tokyo Electron Ltd Film forming device, film forming method and recording medium
WO2012053430A1 (en) * 2010-10-19 2012-04-26 株式会社アルバック Deposition apparatus and deposition method
WO2014024344A1 (en) * 2012-08-10 2014-02-13 キヤノンアネルバ株式会社 Sputtering device
WO2014089948A1 (en) * 2012-12-14 2014-06-19 广东志成冠军集团有限公司 Multi-functional continuous magneto-controlled sputter coating device
CN203668497U (en) * 2013-11-22 2014-06-25 上海嘉森真空科技有限公司 Evaporation coating machine for amorphous selenium film
CN104004999A (en) * 2013-12-16 2014-08-27 湘潭宏大真空技术股份有限公司 Vertical vacuum sputtering coating production line
CN104018130A (en) * 2013-12-16 2014-09-03 湘潭宏大真空技术股份有限公司 Vacuum coating production line
CN104611681A (en) * 2015-02-09 2015-05-13 常州工学院 Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner
US20150284842A1 (en) * 2012-10-23 2015-10-08 Shincron Co., Ltd. Thin film formation apparatus, sputtering cathode, and method of forming thin film
CN205024315U (en) * 2015-10-19 2016-02-10 上海光和光学制造大丰有限公司 Reciprocating type sputtering equipment of level
CN205741197U (en) * 2016-06-27 2016-11-30 哈尔滨理工大学 A kind of vacuum coating equipment
CN107099773A (en) * 2016-02-22 2017-08-29 蓝思科技(长沙)有限公司 A kind of multi-functional continuous sputter coating line and its film plating process and coating control method
CN107267951A (en) * 2017-07-21 2017-10-20 广东振华科技股份有限公司 A kind of horizontal continuous sputtering two-sided coating equipment
CN107365973A (en) * 2017-08-29 2017-11-21 肇庆市前沿真空设备有限公司 A kind of vacuum coating production line and film plating process
CN107723677A (en) * 2017-09-05 2018-02-23 汪会平 The film plating process and equipment of a kind of metallic plate
JP2018111852A (en) * 2017-01-11 2018-07-19 株式会社アルバック Film deposition method, and vacuum treatment apparatus
CN108774731A (en) * 2018-07-31 2018-11-09 湖南玉丰真空科学技术有限公司 A kind of vacuum coating equipment vacuum chamber substrate frame elevating mechanism
CN208570561U (en) * 2018-07-02 2019-03-01 北京铂阳顶荣光伏科技有限公司 A kind of alternate feed system
CN110088353A (en) * 2018-12-29 2019-08-02 三环瓦克华(北京)磁性器件有限公司 A kind of filming equipment and film plating process
CN110878409A (en) * 2018-09-05 2020-03-13 杭州纤纳光电科技有限公司 Magnetron sputtering coating production line and method for preparing back electrode of solar cell
CN111606025A (en) * 2020-04-22 2020-09-01 广东生波尔光电技术有限公司 Special workpiece coating equipment
CN214496467U (en) * 2020-12-31 2021-10-26 广东谛思纳为新材料科技有限公司 Reciprocating film coating equipment

Patent Citations (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006167639A (en) * 2004-12-17 2006-06-29 Tokyo Ohka Kogyo Co Ltd Coating device and coating method
JP2007191278A (en) * 2006-01-20 2007-08-02 Tokyo Electron Ltd Substrate conveying device, substrate conveying method and storage medium
JP2007311724A (en) * 2006-05-22 2007-11-29 Sharp Corp Substrate transfer method, and substrate processing device
CN1865497A (en) * 2006-06-10 2006-11-22 中国科学技术大学 Method for continuous chemical vapor deposition and device thereof
CN101270467A (en) * 2007-03-22 2008-09-24 深圳豪威真空光电子股份有限公司 Product line for producing AR film
US20100080673A1 (en) * 2008-09-29 2010-04-01 Von Ardenne Anlagentechnik Gmbh Transporting device for a vacuum processing apparatus, drive device for a component of a vacuum processing apparatus, and a vacuum processing apparatus
CN201424503Y (en) * 2009-04-30 2010-03-17 常州博士新能源科技有限公司 Multi-functional magnetic control sputtering continuous coating machine
JP2011040574A (en) * 2009-08-11 2011-02-24 Tokyo Electron Ltd Film forming device, film forming method and recording medium
WO2012053430A1 (en) * 2010-10-19 2012-04-26 株式会社アルバック Deposition apparatus and deposition method
WO2014024344A1 (en) * 2012-08-10 2014-02-13 キヤノンアネルバ株式会社 Sputtering device
US20150284842A1 (en) * 2012-10-23 2015-10-08 Shincron Co., Ltd. Thin film formation apparatus, sputtering cathode, and method of forming thin film
WO2014089948A1 (en) * 2012-12-14 2014-06-19 广东志成冠军集团有限公司 Multi-functional continuous magneto-controlled sputter coating device
CN203668497U (en) * 2013-11-22 2014-06-25 上海嘉森真空科技有限公司 Evaporation coating machine for amorphous selenium film
CN104004999A (en) * 2013-12-16 2014-08-27 湘潭宏大真空技术股份有限公司 Vertical vacuum sputtering coating production line
CN104018130A (en) * 2013-12-16 2014-09-03 湘潭宏大真空技术股份有限公司 Vacuum coating production line
CN105543801A (en) * 2013-12-16 2016-05-04 湘潭宏大真空技术股份有限公司 Continuous coating production line used for mobile phone cover plate protection screens
CN104611681A (en) * 2015-02-09 2015-05-13 常州工学院 Magnetron-sputtering winding coating machine capable of rapidly changing target and continuously and efficiently coating film in single-surface reciprocating manner
CN205024315U (en) * 2015-10-19 2016-02-10 上海光和光学制造大丰有限公司 Reciprocating type sputtering equipment of level
CN107099773A (en) * 2016-02-22 2017-08-29 蓝思科技(长沙)有限公司 A kind of multi-functional continuous sputter coating line and its film plating process and coating control method
CN205741197U (en) * 2016-06-27 2016-11-30 哈尔滨理工大学 A kind of vacuum coating equipment
JP2018111852A (en) * 2017-01-11 2018-07-19 株式会社アルバック Film deposition method, and vacuum treatment apparatus
CN107267951A (en) * 2017-07-21 2017-10-20 广东振华科技股份有限公司 A kind of horizontal continuous sputtering two-sided coating equipment
CN107365973A (en) * 2017-08-29 2017-11-21 肇庆市前沿真空设备有限公司 A kind of vacuum coating production line and film plating process
CN107723677A (en) * 2017-09-05 2018-02-23 汪会平 The film plating process and equipment of a kind of metallic plate
CN208570561U (en) * 2018-07-02 2019-03-01 北京铂阳顶荣光伏科技有限公司 A kind of alternate feed system
CN108774731A (en) * 2018-07-31 2018-11-09 湖南玉丰真空科学技术有限公司 A kind of vacuum coating equipment vacuum chamber substrate frame elevating mechanism
CN110878409A (en) * 2018-09-05 2020-03-13 杭州纤纳光电科技有限公司 Magnetron sputtering coating production line and method for preparing back electrode of solar cell
CN110088353A (en) * 2018-12-29 2019-08-02 三环瓦克华(北京)磁性器件有限公司 A kind of filming equipment and film plating process
CN111606025A (en) * 2020-04-22 2020-09-01 广东生波尔光电技术有限公司 Special workpiece coating equipment
CN214496467U (en) * 2020-12-31 2021-10-26 广东谛思纳为新材料科技有限公司 Reciprocating film coating equipment

Similar Documents

Publication Publication Date Title
CN109834532B (en) Processing line for polishing and processing plates
JP5613302B2 (en) Work processing device
CN214496467U (en) Reciprocating film coating equipment
CN1810607A (en) Delivery system for glass substrates or articles like these
CN1702023A (en) Base plate carrying device and base plate processing device therewith
WO2007150039A2 (en) Method and apparatus for transporting substrates
WO2009119580A1 (en) Processing apparatus and processing method
TW201139246A (en) Goods transport device
CN111769064B (en) Loading and unloading device
CN112708867A (en) Reciprocating film coating equipment and film coating method
CN100399533C (en) Substrate processing system
JPH11349105A (en) Article process device
CN116759487A (en) Graphite boat loading and unloading machine and silicon wafer loading and unloading method
CN113198800B (en) Automatic feeding and storing machine and mobile phone middle frame cleaning system
CN113023328B (en) Automatic workpiece feeding assembly
CN212313042U (en) Rotary table four-position automatic feeding and discharging printing machine
TWM636484U (en) End return type double-sided vertical coating equipment
CN212370507U (en) Material conveying device and online glue dispensing robot with same
CN212291801U (en) Automatic feeding device for external wall panel tray
CN111845048A (en) Rotary table four-position automatic feeding and discharging printing machine
CN217322361U (en) Material tray transferring device
KR101064485B1 (en) Press processing line and lift and tray shuttle assembly used in the same
CN213736430U (en) Automatic plate feeding and hot-pressing device
CN212173571U (en) Sputtering coating production control track system
CN110065756B (en) Standard tray circulating system

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination