CN104674180B - A kind of two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of fast quick change target - Google Patents
A kind of two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of fast quick change target Download PDFInfo
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- CN104674180B CN104674180B CN201510068156.8A CN201510068156A CN104674180B CN 104674180 B CN104674180 B CN 104674180B CN 201510068156 A CN201510068156 A CN 201510068156A CN 104674180 B CN104674180 B CN 104674180B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The invention discloses a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target, belong to filming equipment field.The present invention includes that target assembly and deviation correcting device are changed in vacuum chamber, uncoiling mechanism, rolling-up mechanism, two groups of chilling rollers, revolutions, base band between uncoiling mechanism and rolling-up mechanism is wound in two groups of chilling rollers by after reversing roller commutation in serpentine, one group of deviation correcting device is respectively set at uncoiling mechanism and rolling-up mechanism, and uncoiling mechanism and rolling-up mechanism drive base band to realize moving back and forth；Two groups of chilling rollers are wound with the circumferential surface of base band the negative electrode cell for being respectively correspondingly arranged on one group of two sides opening, and two groups of negative electrode cells are respectively correspondingly arranged one group of revolution and change target assembly.It is of the invention rapidly to change cathode target in time by it open in the case of plated film vacuum chamber, and utilize double chilling rollers and the reciprocating motion design of base material to realize continuously being coated with for double-sided multi-layer functional membrane, improve plating membrane efficiency；Every layer function film on base material two sides is individually coated with, and is easy to parameters of film control.
Description
Technical field
The present invention relates to a kind of vacuum coating equipment, more specifically to a kind of fast two-sided reciprocal continuous coating of quick change target
Magnetic-control sputtering coiling film coating machine.
Background technology
Vacuum winding coating technique is exactly in coiled strip base material in vacuum chamber by methods such as thermal evaporation or magnetron sputterings
One layer of surface preparation or multilayer have the technology of the film of certain function.Vacuum winding filming equipment mainly has following characteristics：
One, plated base material are flexible parent metal, i.e., with can be windability；Secondly, coating process there is continuity, i.e., in a work week
Plated film is carried out continuously in phase；Thirdly, coating process carries out in high vacuum environment.Winding film coating machine is being unreeled and wound
Cheng Zhong, substrate surface is coated with film, and the structure of plated film is exactly the work department of vacuum winding filming equipment, and it is located at the receipts of base material
Between unreeling, the operation principle of work department can be thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or its
Any one in its vacuum coating method.The course of work of magnetron sputtering is that electronics accelerates to fly to base material in the presence of electric field
Collided with sputter gas argon gas during film, ionize out substantial amounts of argon ion and electronics, electronics flies to base film, herein
During constantly collided with ar atmo, produce more ar atmos and electronics；Argon ion accelerates bombardment in the presence of electric field
Target, sputters substantial amounts of target atom, and base film surface filming is deposited in neutral target atom (or molecule).
Flexible parent metal is widely used in the middle of organic semiconductors technologies, transparency electrode and touch-screen.Recently as to soft
Magnetron sputtering technique developing rapidly in itself, various high-performance opticals in the widespread demand and flexible parent metal of property base coated film material
Film is coated with successfully in large area flexible substrate.Continuously produce simple, easy transport because flexible parent metal has, can conveniently cut
It is always an important directions of magnetron sputtering technique development into advantages such as arbitrary shape, flexible parcels.Therefore, it is thin in plastics
Winding film plating mode being used plating functional membrane more, and plating the preferable functional membrane of function on a plastic film, on film such as in polyester film
The upper plating preferable low-reflection film of function (low-E films), minimum double silver structural membranes are also required to plate more than 9 layers of film layer, if plating can
See that light transmission rate is less than 1 Ω/m more than 85%, resistance2Electromagnetic shielding film (EMI films), then to plate four silver medal structural membranes, i.e., 17 layers
Film layer.Plating each layer will configure a set of negative electrode and target core, and traditional winding film coating machine is existed using single rolling monoblock type plated film
Lay a chilling roller in one plated film vacuum chamber, 2~3 negative electrodes, target core and releasing coil mechanism, rolling-up mechanism, due to structure
Limitation reason, it is impossible in up to more than 4 groups of negative electrode of circumference arrangement, it is impossible to which adapting to a coating can just plate more than 4 layers differences
The film layer of function, even if laying two chilling rollers, 4~6 negative electrodes and target core, 17 negative electrodes of also can not arranging any more in a coating chamber
And target position.The purpose of 17 tunics is plated to reach, design is, it is necessary at least 3 chilling rollers, water flowing, the pipeline being powered in a traditional way
Many, the gas discharge quantity of generation is big, is unfavorable for vavuum pump economical operation, therefore traditional coating machine does not adapt to a coating just
More than 4 layers of plated film can be plated, can not produce that film layer is more, better function functional plastic film layer.Generally multiple poles targets
Also exist between each negative electrode cell of machining state in the state of arrangement process gas each other seepage (5%~
20%) plated film for, obtaining processing does not reach the requirement of technique.
In to cathodic sputtering film formation device, winding-type vacuum coater is significantly improved so that it can continuously be produced
The efficiency of film forming, however, being used for the peace of spatter film forming negative electrode cell in existing winding-type vacuum coater for each
Dress limited amount, the sputtering time and sputtering atmosphere of each negative electrode cell are difficult to accurate control, and the stability of film forming is poor, mostly only
One layer or two layer medium film can be produced, and cannot continuously sputter three layer dielectrics, because deielectric-coating in the middle of three layer dielectrics
The spatter film forming time is more long, and film forming atmosphere is different from the atmosphere of upper and lower two layer medium film, and existing take-up type vacuum plated film sets
Standby synchronous axial system, the spatter film forming time of single negative electrode cell is substantially inadequate, and the atmosphere of each negative electrode cell is also easily mutual
Interference；In addition, existing winding-type vacuum coater generally require with cleaning device, heater, unreel and rolling-up mechanism
Support the use to form production line, can so cause the problem that equipment is more, the occupancy place of production is big.In addition, needing in some cases soft
The two sides of property base material is coated with functional membrane, and the structure of coating machine will be more too fat to move in this case, causes device structure more
Huge, electric control system is more complicated.
Additionally, existing coating machine after the completion of a plated film, it is necessary to re-replace cathode target, and it is all by vacuum to change target
What chamber opening was carried out, so before plated film is continued, need to build the process conditions such as vacuum again again, not only extend processing week
Phase, and the resource such as electric power is unfavorable for realizing the high-efficiency and low-cost of plated film using more.In view of this, how one kind is designed
Only with single vacuum coating equipment just can base material two sides continuously sputter multilayer functional membrane turn into have technical problem to be solved.
The content of the invention
1. the invention technical problem to be solved
Above-mentioned deficiency it is an object of the invention to overcome existing coating machine, there is provided a kind of fast quick change target is two-sided reciprocal continuous
Plated film magnetic-control sputtering coiling film coating machine, using technical scheme, in the case where plated film vacuum chamber need not be opened
Cathode target is rapidly changed in time, tradition is saved and is changed after target the time for needing to vacuumize again, and using double chilling rollers and base material
Reciprocating motion design realize the continuous of double-sided multi-layer functional membrane and be coated with, simplify the electrical control gear and journey of coating machine
Sequence, improves plating membrane efficiency；Every layer function film on base material two sides is individually coated with, and is easy to parameters of film control, improves plated film
Precision；In addition, target assembly simple structure is changed, easy to control, flexible movements；The compact conformation of coating machine, floor space is small, can use
Used in Scientific Research in University Laboratory and its small lot batch manufacture.
2. technical scheme
To reach above-mentioned purpose, the technical scheme that the present invention is provided is：
A kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, including vacuum chamber, set
Uncoiling room and winding room in vacuum chamber both sides, the uncoiling mechanism in uncoiling room, located at the indoor rolling-up mechanism of winding and
Two groups of chilling rollers in vacuum chamber, also change target assembly and deviation correcting device, described uncoiling mechanism and rolling-up mechanism including revolution
Between base band by reversing roller commutation after be wound in serpentine in two groups of chilling rollers, at described uncoiling mechanism and rolling-up mechanism
One group of deviation correcting device is respectively set, and uncoiling mechanism and rolling-up mechanism drive base band to realize moving back and forth；Two groups of described chilling rollers are twined
It is wound with the circumferential surface of base band and is respectively correspondingly arranged on the negative electrode cell of one group of two sides opening, two groups of negative electrode cells is respectively correspondingly arranged
Target assembly is changed in one group of revolution, and every group of revolution is changed target assembly, negative electrode cell and chilling roller and be located on same axis；Described revolution is changed
Target assembly includes the axially retractable axial stretching of support, rotary disk, the slew gear for driving rotary disk rotation, driving rotary disk
Mechanism, the two or more flexible axle sleeve being installed on rotary disk, be installed on that telescopic shaft puts for installing target core
Pole target stand plate and be installed on radial expansion mechanism on support and relative with the opening direction of negative electrode cell, described rotary disk
To be provided with the barrel-like structure of inner chamber, described flexible axle sleeve is installed on the side wall of rotary disk, after axial stretching mechanism shrinks,
Described radial expansion mechanism is just corresponding with a flexible axle sleeve, for by the outwards ejection and embedded negative electrode is small of pole target stand plate
It is indoor.
Further, described flexible axle sleeve includes interior axle, middle axle sleeve and outer shaft, it is described in be located in centre
The first compression spring is provided with axle sleeve, and between interior axle and middle axle sleeve, described jackshaft is sheathed in outer shaft, and middle
The second compression spring is provided between axle sleeve and outer shaft, described outer shaft is fixedly installed on rotary disk.
Further, three section cartridge type guide rails are additionally provided with described axial stretching mechanism.
Further, described axial stretching mechanism and radial expansion mechanism is electric pushrod, described turn-around machine
Structure is stepper motor.
Further, described deviation correcting device is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
Further, the pre-treatment near chilling roller is additionally provided between described uncoiling mechanism and adjacent chilling roller
Device, described pretreating device includes that ion gun pre-processes mechanism, the dirt for cleaning base band surface.
Further, also including cold well coil pipe deep cooling mechanism, described cold well coil pipe deep cooling mechanism is used to condense to base
A large amount of steam with being discharged in pretreatment process.
3. beneficial effect
The technical scheme provided using the present invention, compared with existing known technology, with following remarkable result：
(1) a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, its uncoiling mechanism
Base band and rolling-up mechanism between is wound in two groups of chilling rollers by after reversing roller commutation in serpentine, uncoiling mechanism and winder
One group of deviation correcting device is respectively set at structure, and uncoiling mechanism and rolling-up mechanism drive base band to realize moving back and forth, using base band two
Serpentine winding in group chilling roller realizes the double-sided coating of base band, rationally make use of the space of vacuum chamber；Filled using two groups of corrections
The reciprocal easy motion for realizing base band is put, makes the winding neat in edge of base band, reach the processing purpose of plating multilayer film；Exist simultaneously
One group of revolution is respectively provided with two groups of chill rolls and changes target assembly, negative electrode is changed in time by not opening in the case of plated film vacuum chamber
Target, saves after tradition changes target and vacuumizes the required time again, realizes the continuous of base band double-sided multi-layer film and is coated with, and simplifies
Electrical control gear and program, improve plating membrane efficiency；The compact conformation of coating machine, floor space is small, can be used for colleges and universities' experiment
Room and its small lot batch manufacture are used；In addition, every layer function film on base material two sides is individually coated with, it is easy to parameters of film control, carries
Plated film precision high；
(2) a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, its time conversion target
Device has axial stretching mechanism, for the cathode target after to be moved to outside vacuum chamber, after the completion of a plated film
Carry out changing target outside vacuum chamber, it is simple to operate；
(3) a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, its flexible axle sleeve
Including interior axle, middle axle sleeve and outer shaft, inside it is located in jackshaft set, and the first compression is provided between interior axle and middle axle sleeve
Spring, jackshaft is sheathed in outer shaft, and the second compression spring is provided between middle axle sleeve and outer shaft, and outer shaft fixes peace
Loaded on rotary disk, the axle sleeve structure that stretches is simple, design ingenious, it is only necessary to using one group of radial expansion mechanism be to be capable of achieving multiple poles
After target stretches out, and radial expansion mechanism shrinks, target core can automatically exit from negative electrode cell, facilitate Rotation With Changing target, while using two
Level stretches out structure, it is ensured that target core has enough movement travels；
(4) a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, its axial stretching
Three section cartridge type guide rails are additionally provided with mechanism, it is ensured that axial stretching mechanism has enough rigidity, it is ensured that can stretch out farther out
Distance；
(5) a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, its axial stretching
Mechanism and radial expansion mechanism are electric pushrod, and slew gear is stepper motor, easy to control, to the processing ring in vacuum chamber
Border does not result in influence；
(6) a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, its deviation correcting device
It is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, correction control is accurate, and error is small.
Brief description of the drawings
Fig. 1 is a kind of structural principle of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention
Figure；
Fig. 2 is the structural representation that target assembly is changed in revolution in the present invention；
Fig. 3 is the partial enlarged drawing of Fig. 2；
Fig. 4 is that the principle schematic that target assembly ejects pole target stand plate is changed in the revolution in the present invention.
Label declaration in schematic diagram：
1st, vacuum chamber；2nd, uncoiling room；201st, uncoiling mechanism；3rd, slide valve；4th, base band；5th, deviation correcting device；6th, pre-treatment dress
Put；7th, reversing roller；8th, chilling roller；9th, room is wound；901st, rolling-up mechanism；10th, target assembly is changed in revolution；1001st, support；1002nd, axially
Telescoping mechanism；1003rd, three section cartridge type guide rail；1004th, rotary disk；1005th, stretch axle sleeve；1006th, pole target stand plate；1007th, radially
Telescoping mechanism；1008th, interior axle；1009th, middle axle sleeve；1010th, outer shaft；1011st, the first compression spring；1012nd, the second compression
Spring；11st, negative electrode cell；12nd, target core；13rd, roughing vacuum pump group；14th, cyropump；15th, molecular pump extraction valve；16th, molecular pump；17、
Fore pump is evacuated magnetic valve；18th, fore pump；19th, idler roller.
Specific embodiment
To further appreciate that present disclosure, with reference to accompanying drawing, the present invention is described in detail.
With reference to Fig. 1, a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, including it is true
Empty room 1, the uncoiling room 2 located at the both sides of vacuum chamber 1 and winding room 9, the workpiece in vacuum chamber 1, and located at vacuum
The detecting and controlling system of the peripheral hardware pump group for providing coating process condition, detection and control plated film machining state outside room 1.
Wherein, uncoiling mechanism 201 is provided with uncoiling room 2, is provided with rolling-up mechanism 901, vacuum chamber 1 in winding room 9 and is provided with two groups of chilling rollers
8th, target assembly 10 and negative electrode cell 11 are changed in reversing roller 7, revolution, between uncoiling room 2 and vacuum chamber 1, winding room 9 and vacuum chamber 1 it
Between be equipped with slide valve 3, the base band 4 between uncoiling mechanism 201 and rolling-up mechanism 901 by reversing roller 7 commutation after twined in serpentine
It is around in two groups of chilling rollers 8, and idler roller 19 is additionally provided with base band 4, it is each at uncoiling mechanism 201 and rolling-up mechanism 901 to set one group
Deviation correcting device 5, and uncoiling mechanism 201 and rolling-up mechanism 901 can drive base band 4 to realize moving back and forth；Two groups of chilling rollers 8 are wound with
The negative electrode cell 11 of one group of two sides opening is respectively correspondingly arranged on the circumferential surface of base band 4, two groups of each correspondences in negative electrode cell 11 set
Put one group of revolution and change target assembly 10, and every group of revolution is changed target assembly 10, negative electrode cell 11 and chilling roller 8 and is located on same axis,
The pretreating device 6 near chilling roller 8 is additionally provided between uncoiling mechanism 201 and adjacent chilling roller 8.Peripheral hardware pump group includes thick
Take out pump group 13, cyropump 14 and molecule pump group, roughing vacuum pump group 13 by be evacuated magnetic valve according to attachment structure as shown in Figure 1 with
Vacuum chamber 1 is connected, and is mainly used in quickly extracting the gas in vacuum chamber 1 and uncoiling room 2 and winding room 9 out, reaches molecular pump
Condition of work；Cyropump 14 is connected with vacuum chamber 1, is mainly used in quick to generation in pretreatment process in vacuum chamber 1
Steam is cooled down, and coordinates roughing vacuum pump group 13 and the molecule pump group to make the vacuum state that reaches capacity in vacuum chamber 1；Molecule pump group bag
Include fore pump 18, fore pump pumping magnetic valve 17, molecular pump 16 and molecular pump extraction valve 15, fore pump 18, fore pump pumping electricity
Magnet valve 17, molecular pump 16 and molecular pump extraction valve 15 are connected after being sequentially connected with vacuum chamber 1, are mainly used in realization and are rapidly achieved
End vacuum state.Detecting and controlling system includes gas analyzer, vacuum meter, gas flowmeter, optical fiber inductive probe, tension force control
System processed and computer, gas analyzer for the gas componant analyzed in negative electrode cell 11 and contain in the negative electrode cell 11
Amount；Vacuum meter is located in vacuum chamber 1, for measuring the air pressure in vacuum chamber 1；Air inlet of the gas flowmeter located at negative electrode cell 11
On pipeline, the air inflow for controlling negative electrode cell 11；Optical fiber inductive probe is stretched into negative electrode cell 11, for target as sputter
Metal oxide gas out are collected and surveyed online；Tension control system is located at uncoiling mechanism 201, chilling roller 8, winder
On structure 901 and idler roller 19, the even running for controlling flexible base band 4；Gas analyzer, vacuum meter, gas flowmeter
It is connected respectively at computer with optical fiber inductive probe, for each technological parameter to be calculated and controlled.
A kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target of the invention, by performing plated film
The internal structure of vacuum chamber 1 of work is improved, and the serpentine winding using base band in two groups of chilling rollers 8 realizes the double of base band 4
Face plated film；The reciprocal easy motion of base band 4 is realized using two groups of deviation correcting devices 5；Target assembly 10 is changed using revolution, is not being opened
Cathode target can be in time changed in the case of plated film vacuum chamber, save after tradition changes target and vacuumize the required time again, it is real
Show the continuous of base band double-sided multi-layer film to be coated with, simplified electrical control gear and program, improve plating membrane efficiency；Coating machine
Compact conformation, floor space is small, can be used for Scientific Research in University Laboratory and its small lot batch manufacture is used；In addition, every layer of work(on base material two sides
Energy film is individually coated with, and is easy to parameters of film control, improves plated film precision.
With reference to embodiment, the invention will be further described.
Embodiment
As shown in figure 1, the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of a kind of fast quick change target of the present embodiment, bag
Include vacuum chamber 1, the uncoiling room 2 located at the both sides of vacuum chamber 1 and winding room 9, the uncoiling mechanism 201 in uncoiling room 2, located at receipts
Rolling-up mechanism 901 in volume room 9 and two groups of chilling rollers 8 in vacuum chamber 1, also including changing target assembly 10 and correction located at revolution
Device 5, is equipped with slide valve 3, for preventing uncoiling room 2 between uncoiling room 2 and vacuum chamber 1, between winding room 9 and vacuum chamber 1
Enter in vacuum chamber 1 with the gas in winding room 9, it is to avoid the vacuum of influence vacuum chamber 1；Uncoiling mechanism 201 and rolling-up mechanism
Base band 4 between 901 is wound in two groups of chilling rollers 8 by after the commutation of reversing roller 7 in serpentine, and is additionally provided with idler roller in base band 4
19, the idler roller 19 is connected with torque motor, for the tension force of real-time adjustment base band 4, uncoiling mechanism 201, chilling roller 8 and winder
The three's synchronous interaction of structure 901, in plated film process, is passed through -15~-20 DEG C of coolant, for reducing plated film in chilling roller 8
Produced high temperature, it is ensured that coating quality, after plated film terminates, can make chilling roller 8 be quickly returning to room temperature state again；Uncoiling mechanism
201 and rolling-up mechanism 901 at one group of deviation correcting device 5 is respectively set, uncoiling mechanism 201 and rolling-up mechanism 901 are respectively provided with winding and put
Volume function, and uncoiling mechanism 201 and rolling-up mechanism 901 drive base band 4 to realize moving back and forth, in the reciprocating motion for winding and unreel
In, two groups of deviation correcting devices 5 and uncoiling mechanism 201, rolling-up mechanism 901 constitute closed chain system of processing, it can be ensured that base band 4 winds side
Edge is neat, ensures that the reciprocating stability of base band 4；Two groups of chilling rollers 8 are wound with each correspondence on the circumferential surface of base band 4
The negative electrode cell 11 of one group of two sides opening is provided with, two groups of negative electrode cells 11 are respectively correspondingly arranged one group of revolution and change target assembly 10, and
Every group of revolution changes target assembly 10, negative electrode cell 11 and chilling roller 8 on same axis, be additionally provided with negative electrode cell 11 coldplate,
Air supply mechanism and atmosphere division board, gas isolating plate are arranged at the both sides of negative electrode cell 11, and coldplate is arranged at negative electrode cell 11
Outer wall on, and cooling water pipe is distributed with coldplate, air supply mechanism in negative electrode cell 11, and with outside tonifying Qi unit
It is connected, vacuum device is additionally provided with negative electrode cell 11, and the vacuum device is connected with the molecular pump of outside；In this reality
Apply in example, base band 4 is wound in two chilling rollers 8 by the way of serpentine, the front of base band 4 is wrapped in one of chilling roller 8
On, then the back side of base band 4 is wrapped in another chilling roller 8, i.e., the double-sided coating of base band 4 can be realized in less space,
Revolution simultaneously is changed target assembly 10 and can in time be changed by not opening in the case of plated film vacuum chamber 1 by way of revolution
Cathode target, realizes on the two sides of base band 4 function of continuous plating multilayer film, overcomes existing coating machine outside vacuum chamber 1
Need to vacuumize again when changing target, waste the deficiency of plenty of time and the energy.In addition, two groups in the present embodiment are returned conversion target dress
Put 10 and be respectively arranged on two left and right sides of chilling roller 8, it is apart from each other, even if plating the functional membrane of different materials on the two sides of base band 4
When, be also not in that process gas between two negative electrode cells 11 is interfered, it is ensured that coating quality.
As shown in Fig. 2 target assembly 10 is changed in the revolution in the present embodiment includes support 1001, rotary disk 1004, driving revolution
Slew gear that disk 1004 is rotated, drive the axially retractable axial stretching mechanism 1002 of rotary disk 1004, be installed on rotary disk
Two or more flexible axle sleeve 1005, the pole for installing target core 12 being installed on flexible axle sleeve 1005 on 1004
Target stand plate 1006 and radial expansion mechanism 1007 on support 1001 and relative with the opening direction of negative electrode cell 11 is installed on, returned
Rotating disk 1004 is the barrel-like structure for being provided with inner chamber, and axial stretching mechanism 1002 is connected with the bottom of rotary disk 1004, and ensures axle
Coaxial with rotary disk 1004 to telescoping mechanism 1002, flexible axle sleeve 1005 is installed on the side wall of rotary disk 1004, can be radially
It is protruding under the ejection effect of telescoping mechanism 1007；Specifically in the present embodiment, the rotary disk of target assembly 10 is changed in every group of revolution
4 target cores 12 are evenly arranged with 1004, after once changing target, target assembly 10 is changed in one group of revolution at least can continuously plate more than 4 layers
Target core 12 on functional membrane, and pole target stand plate 1006 uses flange connection, facilitates the disassembling, assembling and replacing of target core 12；Such as Fig. 4 institutes
Show, after axial stretching mechanism 1002 shrinks, radial expansion mechanism 1007 is just corresponding with a position of flexible axle sleeve 1005,
For by pole target stand plate 1006 outwards ejection and embedded negative electrode cell 11.Realized target core using axial stretching mechanism 1002
12 release vacuum chamber 1, and the replacing without carrying out target core 12 inside vacuum chamber 1 is simple to operate；In addition, in order that axially
Telescoping mechanism 1002 has enough rigidity, rotary disk 1004 is stretched out larger distance, in the present embodiment, axial stretching
Three section cartridge type guide rails 1003 are provided with mechanism 1002.In the present embodiment, above-mentioned axial stretching mechanism 1002 and radial direction stretches
Contracting mechanism 1007 is electric pushrod, and slew gear is stepper motor, and electric pushrod and the easy to control of stepper motor, positioning are accurate
Really, influence is not resulted on the processing environment in vacuum chamber.As shown in figure 3, the flexible axle sleeve 1005 in the present embodiment is including in
Axle 1008, middle axle sleeve 1009 and outer shaft 1010, interior axle 1008 is located in middle axle sleeve 1009, and interior axle 1008 and jackshaft
Be provided with the first compression spring 1011 between set 1009, middle axle sleeve 1009 in outer shaft 1010, and middle axle sleeve 1009 with
The second compression spring 1012 is provided between outer shaft 1010, outer shaft 1010 is fixedly installed on rotary disk 1004, stretch axle sleeve
1005 simple structures, design are ingenious, it is only necessary to be capable of achieving stretching out for multiple pole target, and footpath using one group of radial expansion mechanism 1007
After being shunk to telescoping mechanism 1007, target core 12 can automatically exit from negative electrode cell 11, facilitate Rotation With Changing target, while being stretched out using two-stage
Structure, it is ensured that target core 12 has enough movement travels.
The two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of a kind of fast quick change target of the present embodiment, deviation correcting device 5 is
Ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, correction control are accurate, and error is small, specifically, for transparent base band, such as
Polyester film etc., using ultrasonic wave deviation-rectifying system, for opaque base band, such as metallic film, using photoelectric error correction system
System or ultrasonic wave deviation-rectifying system.Above-mentioned ultrasonic wave deviation-rectifying system or the deviating correcting principle of the Photoelectric Error Correction System are prior art,
This is just repeated no more.Additionally, the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of a kind of fast quick change target of the present embodiment,
The pretreating device 6 near chilling roller 8 is additionally provided between uncoiling mechanism 201 and adjacent chilling roller 8, the pretreating device 6
Mechanism is pre-processed including ion gun, ion gun pretreatment mechanism is used to clean the dirt on the surface of base band 4；Pretreating device 6 is attached
Cold well coil pipe deep cooling mechanism is closely additionally provided with, the cold well coil pipe deep cooling mechanism, can be at 3~5 minutes by the use of liquid nitrogen as refrigerant
Environment temperature is dropped to subzero 120 DEG C or so, for condensing a large amount of steam to being discharged in base band pretreatment process, and coordinate
Pumped vacuum systems improves vacuum.In addition, for the ease of the working condition in observation vacuum chamber 1, being further opened with vacuum chamber 1
Watch window.
The two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of a kind of fast quick change target of the present embodiment, when plated film is processed,
Coiled base band 4 is set on uncoiling mechanism 201, the one end for drawing base band 4 bypasses reversing roller 7, tensioning as shown in Figure 1 respectively
Roller 19 and chilling roller 8, and be fixed on rolling-up mechanism 901；Target core 12 needed for film layer will be coated with is installed on corresponding pole target stand plate
On 1006；Closing vacuum chamber 1, is vacuumized using peripheral hardware pump group to vacuum chamber 1, realizes process conditions needed for plated film；Plated film
When, uncoiling mechanism 201 and rolling-up mechanism 901 are synchronously unreeled and wound, while the synchronous interaction of two groups of chilling rollers 8, realizes winding film plating；
After the completion of uncoiling mechanism 201 is unreeled (i.e. tunic layer has respectively been plated on the two sides of base band 4), radial expansion mechanism 1007 shrinks,
Pole target stand plate 1006 is exited from negative electrode cell 11, and slew gear is according to the rotation of programme-control rotary disk 1,004 one for setting in advance
Determine angle, change another target core 12, and pushed up using the pole target stand plate 1006 that the target core 12 will be fixed by radial expansion mechanism 1007
Go out in embedded negative electrode cell 11, target is once changed in completion；Change after the completion of target, uncoiling mechanism 201 and rolling-up mechanism 901 start reversely to turn
Dynamic, i.e. being coated with for the second tunic is realized in the exchange function of uncoiling mechanism 201 and rolling-up mechanism 901, the also synchronous interaction of chilling roller 8；Weight
Multiple above-mentioned steps, so that target assembly 10 is changed in the revolution with four groups of target cores 12 as an example, once changing target at least can be in the two-sided of base band 4
On be continuously coated with 4 tunics layer, substantially increase production efficiency；After the completion of the target that revolution is changed on target assembly 10 is all coated with,
Shut down, rotary disk 1004 is released into vacuum chamber 1 using axial stretching mechanism 1002, carry out changing target core 12 outside vacuum chamber 1.
Due to being respectively provided with one group of deviation correcting device 5 at uncoiling mechanism 201 and rolling-up mechanism 901, therefore the reciprocal continuous of base band 4 can be realized
Motion, reaches the processing purpose of plating multilayer film；Target assembly 10 is changed using revolution and realize the fast quick change target in vacuum chamber 1, save
Change the target time and eliminate the repetition vacuum pumping needed for changing target repeatedly, time-saving energy-saving；Due to the two sides of base band 4 in the present invention
On every layer of film layer be and be individually coated with, therefore can individually be controlled for every layer of technological parameter of plated film, the thickness per tunic
Can with precise control, and be not in process gas seepage interference of traditional multiple cathode target simultaneously produced by plated film, plated film
High precision；Additionally, using structure of the invention, the structure of magnetic-control sputtering coiling film coating machine is substantially simplified, without complexity
Electric control system and program, greatly reduce occupation area of equipment, reduce device fabrication cost, are particularly suitable for colleges and universities' reality
Test room or small lot batch manufacture.
Below schematically the present invention and embodiments thereof are described, the description does not have restricted, institute in accompanying drawing
What is shown is also one of embodiments of the present invention, and actual structure is not limited thereto.So, if the common skill of this area
Art personnel enlightened by it, in the case where the invention objective is not departed from, without creatively designing and the technical scheme
Similar frame mode and embodiment, all should belong to protection scope of the present invention.
Claims (7)
1. a kind of two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of fast quick change target, including vacuum chamber（1）, located at vacuum chamber
（1）The uncoiling room of both sides（2）With winding room（9）, located at uncoiling room（2）Interior uncoiling mechanism（201）, located at winding room（9）It is interior
Rolling-up mechanism（901）With located at vacuum chamber（1）Two groups of interior chilling rollers（8）, it is characterised in that：Also target assembly is changed including revolution
（10）And deviation correcting device（5）, described uncoiling mechanism（201）And rolling-up mechanism（901）Between base band（4）By reversing roller
（7）After commutation two groups of chilling rollers are wound in serpentine（8）On, described uncoiling mechanism（201）And rolling-up mechanism（901）Place respectively sets
Put one group of deviation correcting device（5）, and uncoiling mechanism（201）And rolling-up mechanism（901）Drive base band（4）Realize moving back and forth；It is described
Two groups of chilling rollers（8）It is wound with base band（4）Circumferential surface on be respectively correspondingly arranged on the negative electrode cell of one group of two sides opening（11）,
Two groups of negative electrode cells（11）Respectively it is correspondingly arranged one group of revolution and changes target assembly（10）, and target assembly is changed in every group of revolution（10）, negative electrode it is small
Room（11）And chilling roller（8）On same axis；Target assembly is changed in described revolution（10）Including support（1001）, rotary disk
（1004）, drive rotary disk（1004）The slew gear of rotation, driving rotary disk（1004）Axially retractable axial stretching machine
Structure（1002）, be installed on rotary disk（1004）On more than two flexible axle sleeve（1005）, be installed on flexible axle sleeve（1005）
On for installing target core（12）Pole target stand plate（1006）Be installed on support（1001）It is upper and with negative electrode cell（11）Open
The relative radial expansion mechanism in mouth direction（1007）, described rotary disk（1004）It is described to be provided with the barrel-like structure of inner chamber
Flexible axle sleeve（1005）It is installed on rotary disk（1004）Side wall on, when axial stretching mechanism（1002）After contraction, described footpath
To telescoping mechanism（1007）Just with a flexible axle sleeve（1005）It is corresponding, for by pole target stand plate（1006）Outwards eject simultaneously
Embedded negative electrode cell（11）It is interior.
2. a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target according to claim 1, it is special
Levy and be：Described flexible axle sleeve（1005）Including interior axle（1008）, middle axle sleeve（1009）And outer shaft（1010）, it is described
Interior axle（1008）Located at middle axle sleeve（1009）It is interior, and interior axle（1008）With middle axle sleeve（1009）Between be provided with the first compression bullet
Spring（1011）, described middle axle sleeve（1009）Located at outer shaft（1010）It is interior, and middle axle sleeve（1009）With outer shaft
（1010）Between be provided with the second compression spring（1012）, described outer shaft（1010）It is fixedly installed in rotary disk（1004）On.
3. a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target according to claim 2, it is special
Levy and be：Described axial stretching mechanism（1002）On be additionally provided with three section cartridge type guide rails（1003）.
4. a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target according to claim 3, it is special
Levy and be：Described axial stretching mechanism（1002）With radial expansion mechanism（1007）It is electric pushrod, described turn-around machine
Structure is stepper motor.
5. the two-sided reciprocal continuous coating magnetic-control sputtering coiling of a kind of fast quick change target according to Claims 1-4 any one
Coating machine, it is characterised in that：Described deviation correcting device（5）It is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
6. a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target according to claim 5, it is special
Levy and be：Described uncoiling mechanism（201）With adjacent chilling roller（8）Between be additionally provided with positioned at chilling roller（8）Neighbouring pre-treatment
Device（6）, described pretreating device（6）Mechanism is pre-processed including ion gun, for cleaning base band（4）The dirt on surface.
7. a kind of fast two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of quick change target according to claim 6, it is special
Levy and be：Also include cold well coil pipe deep cooling mechanism, described cold well coil pipe deep cooling mechanism is used to condense to base band（4）Pre-treatment
The a large amount of steam discharged in journey.
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| CN109518154A (en) * | 2019-01-16 | 2019-03-26 | 上海上创超导科技有限公司 | Superconducting strip cushion double-sided coating device |
| CN111235544B (en) * | 2020-01-17 | 2022-05-10 | 深圳市博能自动化设备有限公司 | Film coating machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN2433262Y (en) * | 2000-07-18 | 2001-06-06 | 湖南三才科技有限公司 | Multi-targat magnetic-control sputtering coiling film coating machine |
| CN101880862A (en) * | 2009-05-06 | 2010-11-10 | 中国科学院微电子研究所 | Multifunctional ion beam sputtering equipment |
| CN103741109A (en) * | 2013-12-31 | 2014-04-23 | 北京工业大学 | Device and method for continuously coating fiber with metallic conductive function film through magnetron sputtering |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2433262Y (en) * | 2000-07-18 | 2001-06-06 | 湖南三才科技有限公司 | Multi-targat magnetic-control sputtering coiling film coating machine |
| CN101880862A (en) * | 2009-05-06 | 2010-11-10 | 中国科学院微电子研究所 | Multifunctional ion beam sputtering equipment |
| CN103741109A (en) * | 2013-12-31 | 2014-04-23 | 北京工业大学 | Device and method for continuously coating fiber with metallic conductive function film through magnetron sputtering |
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