CN104651799B - A kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line - Google Patents
A kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line Download PDFInfo
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- CN104651799B CN104651799B CN201510103282.2A CN201510103282A CN104651799B CN 104651799 B CN104651799 B CN 104651799B CN 201510103282 A CN201510103282 A CN 201510103282A CN 104651799 B CN104651799 B CN 104651799B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The invention discloses a kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line, belong to filming equipment field.The present invention includes uncoiling room, rolling room and plated film vacuum chamber, also be provided with between uncoiling room and plated film vacuum chamber and unreel storage compartment, rolling storage compartment is also provided with between rolling room and plated film vacuum chamber, the front unreeling material storage mechanism is provided with heat device, and the rear of rolling material storage mechanism is provided with shut off mechanism and base material side steering; The one end being wound in the wherein volume base material in two groups of pay-off roll successively through heat device, unreel material storage mechanism and pre-treatment mechanism after, after reversing roller commutation, reverse-winding is on two groups of cold rollers, and is wound in after rolling material storage mechanism, shut off mechanism and base material side steering successively wherein on one group of wind-up roll.The present invention utilizes the standby in advance roller of getting the raw materials ready in advance of uncoiling and rolling to realize being coated with continuously of multireel base material, substantially increases plated film efficiency, and utilizes base material reverse-winding on two groups of cold rollers to realize base material double-sided coating.
Description
Technical field
The present invention relates to a kind of plated film production unit, more particularly, relate to a kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line.
Background technology
Vacuum winding coating technique is exactly prepare at coiled strip substrate surface the technology that one deck or multilayer have the film of certain function by the method such as thermal evaporation or magnetron sputtering in vacuum chamber.Vacuum winding filming equipment mainly contains following characteristics: one, plated base material are flexible parent metal, and namely having can be windability; Two, coating process has continuity, and namely within a work period, plated film carries out continuously; Three, coating process carries out in high vacuum environment.Winding film coating machine is unreeling with in wrapup procedure, substrate surface is coated with film, the structure of plated film is exactly the operate portions of vacuum winding filming equipment, it is between the unwinding and rewinding of base material, and the principle of work of operate portions can be any one in thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or other vacuum coating method.The working process of magnetron sputtering is that electronics accelerates to fly in the process of base material film to collide with sputter gas argon gas under the effect of electric field, ionize out a large amount of argon ions and electronics, electronics flies to base material film, constantly collides with ar atmo in the process, produces more ar atmo and electronics; Argon ion accelerates to bombard target under the effect of electric field, sputters a large amount of target atom, is deposited on base material film surface filming in neutral target atom (or molecule).
Flexible parent metal is widely used in the middle of organic semiconductors technologies, transparency electrode and touch-screen.In recent years along with the develop rapidly to magnetron sputtering technique itself in the widespread demand of flexible substrates Coating Materials and flexible parent metal, various high-performance optical film is coated with successfully in large area flexible substrate.Due to the important directions that flexible parent metal has simple, the easy transport of continuous seepage, the advantage such as arbitrary shape, flexible parcel that can conveniently cut into is magnetron sputtering technique development always.
In anticathode spattering filming device, winding-type vacuum coater can continuous seepage and significantly improve the efficiency of film forming with it, but existing magnetic-control sputtering coiling film coating machine, after a plated film completes, needs again to change cathode target, and change target and all vacuum chamber is opened and carry out, like this before continuation plated film, need again again to build the processing condition such as vacuum, not only extend the process-cycle, and the resource such as electric power uses more, is unfavorable for the high-efficiency and low-cost realizing plated film.In addition; existing coating equipment is after a volume base material has been coated with; need to shut down and change base material; and the preparation of base material needs certain hour; and need base material to guide to wind-up roll by pay-off roll, destroy the process environments of vacuum film coating chamber, and each base material of changing needs waste one section for connecting the base material of pay-off roll and wind-up roll; and the base material of waste cannot repeat plated film use, base material is caused to waste serious, coating cost increase.
At present, due to the development of technology, increasing situation needs to use double-sided coating, structural arrangement traditionally, and the structure of coating equipment will be more too fat to move, and cause device structure huger, electric control system is more complicated.
Summary of the invention
1. invent the technical problem that will solve
The object of the invention is to the above-mentioned deficiency overcoming existing magnetron sputtering coil film coating equipment, a kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line is provided, adopt technical scheme of the present invention, utilize getting the raw materials ready in advance and the in advance standby roller of rolling of uncoiling, and realize being coated with continuously of multireel base material in conjunction with the material storage mechanism of uncoiling and rolling, the time eliminating middle change of lap and vacuumize, substantially increase plated film efficiency, and decrease the base material waste caused because of change of lap, reduce coating cost; Base material reverse-winding on two groups of cold rollers is utilized to realize base material double-sided coating; Adopt revolution to change simultaneously target assembly achieves when not opening plated film vacuum chamber can timely quick-replaceable cathode target, for being coated with continuously of multireel base material provides guarantee.
2. technical scheme
For achieving the above object, technical scheme provided by the invention is:
A kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, comprise uncoiling room, rolling room and plated film vacuum chamber, pre-treatment mechanism is provided with in described plated film vacuum chamber, two groups of cold rollers and be located at the one or more magnetron sputtering coater structure often organized on cold roller, described uncoiling room and rolling room are provided with two, also be provided with between uncoiling room and plated film vacuum chamber and unreel storage compartment, rolling storage compartment is also provided with between rolling room and plated film vacuum chamber, uncoiling room described in two all by slide valve with unreel storage compartment and be connected, rolling room described in two is all connected with rolling storage compartment by slide valve, described unreels between storage compartment and plated film vacuum chamber, slide valve is equipped with between rolling storage compartment and plated film vacuum chamber, uncoiling indoor described in two are respectively provided with one group of pay-off roll, and often organize below pay-off roll and be provided with one group of material loading saddle mechanism, the rolling indoor described in two are respectively provided with one group of wind-up roll, often organize below wind-up roll and are provided with one group of discharging saddle mechanism, described unreel in storage compartment to be provided with unreel material storage mechanism, rolling material storage mechanism is provided with in described rolling storage compartment, the described front unreeling material storage mechanism is provided with heat device, and the rear of described rolling material storage mechanism is provided with shut off mechanism and base material side steering successively, the one end being wound in the wherein volume base material in two groups of pay-off roll successively through heat device, unreel material storage mechanism and pre-treatment mechanism after, after reversing roller commutation, reverse-winding, on two groups of cold rollers, and is wound in wherein on one group of wind-up roll successively after rolling material storage mechanism, shut off mechanism and base material side steering successively, the deviation correction mechanism for base material correction is also equipped with after two groups of pay-off roll and before two groups of wind-up rolls, described uncoiling room, unreel storage compartment, rolling storage compartment and rolling room all be located at outside roughing vacuum pump and be connected, described plated film vacuum chamber be located at outside molecular pump group and be connected.
Further, the cold roller described in two groups is placed in two relatively independent plated film vacuum chambers, and two plated film vacuum chambers are connected by slide valve.
Further, described uncoiling room, unreel storage compartment, rolling storage compartment and rolling indoor and be equipped with camera, described camera is all connected with supervisory control computer.
Further, described base material side steering comprises penetrating mechanism and base material break-in supporting plate, described base material break-in supporting plate one end is hinged, one end is unsettled, described penetrating mechanism is located at the below of base material break-in supporting plate, described penetrating mechanism rising promotes base material break-in supporting plate and upwards overturns, then the base material that cut-off mechanism cuts off enters rolling indoor, and is wound on the wind-up roll of these rolling indoor; Described penetrating mechanism declines and makes base material break-in supporting plate recovery level, then the base material that cut-off mechanism cuts off enters another rolling indoor by base material break-in supporting plate, and is wound on the wind-up roll of these rolling indoor.
Further, described magnetron sputtering coater structure comprises revolution and changes target assembly, change the negative electrode cell of the corresponding two sides opening in target assembly position with revolution and be installed on the target core turning round and change on target assembly, described revolution is changed target assembly and is comprised support, rotary disk, drive the traversing mechanism that rotary disk rotates, drive the axial stretching mechanism that rotary disk stretches vertically, be installed on the two or more flexible axle sleeve on rotary disk, be installed on that telescopic shaft puts for the pole target stand plate of installing target core be installed on radial extension mechanism on support and relative with the opening direction of negative electrode cell, described rotary disk is the barrel-like structure being provided with inner chamber, described flexible axle sleeve is installed on the sidewall of rotary disk, after axial stretching mechanism shrinks, described radial extension mechanism is just corresponding with a flexible axle sleeve, for pole target stand plate outwards being ejected and embedding the little indoor of negative electrode.
Further, described flexible axle sleeve comprises interior axle, middle axle sleeve and outer shaft, be located in middle axle sleeve in described, and be provided with the first compression spring between interior axle and middle axle sleeve, described tunnel shaft is sheathed in outer shaft, and being provided with the second compression spring between middle axle sleeve and outer shaft, described outer shaft is fixedly installed on rotary disk.
Further, described axial stretching mechanism is also provided with three joint cartridge type guide rails.
Further, described material loading saddle mechanism is identical with discharging saddle mechanism structure, include saddle bracket, drive the up-and-down movement mechanism of saddle bracket lifting and drive the horicontal motion mechanism of saddle bracket translation, pay-off roll or wind-up roll material loading or discharging are lifted for driving saddle bracket by described up-and-down movement mechanism; Described horicontal motion mechanism is lifted pay-off roll or wind-up roll shift-in uncoiling room for driving saddle bracket or shifts out rolling room, realizes outdoor upper volume or rolling.
Further, it is described that to unreel material storage mechanism identical with rolling material storage mechanism structure, include reversing roller and lifting storing roller moving up and down, described base material is wound on reversing roller and lifting storing roller successively back and forth, and utilizes the rising of lifting storing roller or decline to realize storing and release base material.
Further, described deviation correction mechanism is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
3. beneficial effect
Adopt technical scheme provided by the invention, compared with existing known technology, there is following unusual effect:
(1) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its one end being wound in the wherein volume base material in two groups of pay-off roll is successively through heat device, after unreeling material storage mechanism and pre-treatment mechanism, through reversing roller commutation after successively reverse-winding on two groups of cold rollers, and successively through rolling material storage mechanism, be wound in wherein on one group of wind-up roll after shut off mechanism and base material side steering, utilize getting the raw materials ready in advance and the in advance standby roller of rolling of uncoiling, and realize being coated with continuously of multireel base material in conjunction with the material storage mechanism of uncoiling and rolling, the time eliminating middle change of lap and vacuumize, substantially increase plated film efficiency, and decrease the base material waste caused because of change of lap, reduce coating cost, base material reverse-winding on two groups of cold rollers is utilized to realize base material double-sided coating,
(2) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its two groups of cold rollers are placed in two relatively independent plated film vacuum chambers, two plated film vacuum chambers are connected by slide valve, reduce the power requirement to molecular pump group, be convenient to build technique for vacuum coating environment; And when two sides plating difference in functionality film, avoid the seepage producing process gas between two groups of cold rollers, cause coating quality to decline;
(3) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its uncoiling room, unreel storage compartment, rolling storage compartment and rolling indoor and be equipped with camera, camera is all connected with supervisory control computer, the working condition of remote monitoring coating film production line links is realized by camera, relating operation can be carried out in time, decrease the labor capacity of workman's field observation;
(4) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its base material side steering comprises penetrating mechanism and base material break-in supporting plate, base material break-in supporting plate one end is hinged, one end is unsettled, penetrating mechanism is located at the below of base material break-in supporting plate, penetrating mechanism rising promotes base material break-in supporting plate and upwards overturns, then the base material that cut-off mechanism cuts off enters rolling indoor, and is wound on the wind-up roll of these rolling indoor; Penetrating mechanism declines and makes base material break-in supporting plate recovery level, then the base material that cut-off mechanism cuts off enters another rolling indoor by base material break-in supporting plate, and is wound on the wind-up roll of these rolling indoor; Structure is simple, and it is convenient to control, and achieves accurate roll change rolling;
(5) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its magnetron sputtering coater structure comprises revolution and changes target assembly, changes the negative electrode cell of the corresponding two sides opening in target assembly position and be installed on the target core turning round and change on target assembly with revolution, adopt revolution to change target assembly achieves when not opening plated film vacuum chamber can timely quick-replaceable cathode target, for being coated with continuously of multireel base material provides guarantee;
(6) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its revolution is changed target assembly and is had axial stretching mechanism, cathode target after use can be moved to vacuum chamber outside, can carry out changing target in vacuum chamber outside after a plated film completes, be convenient to change target operation;
(7) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its flexible axle sleeve comprises interior axle, middle axle sleeve and outer shaft, inside be located in middle axle sleeve, and be provided with the first compression spring between interior axle and middle axle sleeve, tunnel shaft is sheathed in outer shaft, and be provided with the second compression spring between middle axle sleeve and outer shaft, outer shaft is fixedly installed on rotary disk, telescopic shaft nested structure is simple, design ingenious, only need to utilize one group of radial extension mechanism can realize stretching out of multiple poles target, and after the contraction of radial extension mechanism, target core can exit negative electrode cell automatically, facilitate Rotation With Changing target, adopt two-stage to stretch out structure simultaneously, ensure that target core has enough movement travels,
(8) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its axial stretching mechanism is also provided with three joint cartridge type guide rails, ensure that axial stretching mechanism has enough rigidity, can stretch out larger distance;
(9) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, its material loading saddle mechanism is identical with discharging saddle mechanism structure, include saddle bracket, drive the up-and-down movement mechanism of saddle bracket lifting and drive the horicontal motion mechanism of saddle bracket translation, pay-off roll or wind-up roll material loading or discharging are lifted for driving saddle bracket by up-and-down movement mechanism; Horicontal motion mechanism is lifted pay-off roll or wind-up roll shift-in uncoiling room for driving saddle bracket or shifts out rolling room, realizes outdoor upper volume or rolling; Utilize material loading saddle mechanism and discharging saddle mechanism facilitate the roll change of multireel base material and receive roller, it is convenient to control, and alleviates the labor capacity of change of lap and rolling;
(10) a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, it is identical with rolling material storage mechanism structure that it unreels material storage mechanism, include reversing roller and lifting storing roller moving up and down, base material is wound on reversing roller and lifting storing roller successively back and forth, and utilize the rising of lifting storing roller or the realization that declines to store and release base material, for change of lap roll change provides enough setup times, ensure that the continous-stable of multireel base material is coated with.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line;
Fig. 2 is the principle schematic unreeling material storage mechanism and rolling material storage mechanism in the present invention;
Fig. 3 is the structural representation of the magnetron sputtering coater structure in the present invention;
Fig. 4 is the structural representation that target assembly is changed in revolution in the present invention;
Fig. 5 is the partial enlargement structural representation in Fig. 4.
Label declaration in schematic diagram:
1, uncoiling room; 2, pay-off roll; 3, material loading saddle mechanism; 4, deviation correction mechanism; 5, camera; 6, storage compartment is unreeled; 7, heat device; 8, material storage mechanism is unreeled; 9, plated film vacuum chamber; 10, pre-treatment mechanism; 11, cold roller; 12, reversing roller; 13, magnetron sputtering coater structure; 14, slide valve; 15, rolling storage compartment; 16, rolling material storage mechanism; 17, pressure roller is carried; 18, shut off mechanism; 19, penetrating mechanism; 20, base material break-in supporting plate; 21, lead supporting plate; 22, rolling room; 23, wind-up roll; 24, discharging saddle mechanism; 25, roughing vacuum pump; 26, molecular pump; 27, forepump; 801, storing roller is elevated; 802, reversing roller; 131, negative electrode cell; 132, target core; 133, target assembly is changed in revolution; 134, gas isolating plate; 1331, support; 1332, axial stretching mechanism; 1333, three joint cartridge type guide rails; 1334, rotary disk; 1335, flexible axle sleeve; 1336, pole target stand plate; 1337, radial extension mechanism; 1338, interior axle; 1339, middle axle sleeve; 1340, outer shaft; 1341, the first compression spring; 1342, the second compression spring.
Embodiment
For understanding content of the present invention further, the present invention is described in detail in conjunction with the accompanying drawings and embodiments.
Embodiment
Shown in composition graphs 1, a kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line of the present embodiment, comprise uncoiling room 1, rolling room 22 and plated film vacuum chamber 9, be provided with pre-treatment mechanism 10, two groups of cold rollers 11 in plated film vacuum chamber 9 and be located at the one or more magnetron sputtering coater structure 13 often organized on cold roller 11.Consider that traditional filming equipment only can be coated with a volume base material at every turn, need again to vacuumize to reach coating process condition before being coated with another volume base material, thus the time wasted a large amount of change of lap and vacuumize, and then reduce the problem of plated film efficiency, adopt in the present embodiment and prepare base material to be coated in advance and treat wind-up roll cylinder, and make base material to be coated in advance and treat that wind-up roll cylinder reaches vacuum condition, thus solve the problem that traditional filming equipment cannot be coated with multireel base material continuously.Concrete structure is described below:
Uncoiling room 1 and rolling room 22 are provided with two, one group of pay-off roll 2 is respectively provided with in two uncoiling rooms 1, one group of wind-up roll 23 is respectively provided with in two rolling rooms 22, one group in uncoiling room 1 and rolling room 22 is in machining state, another group utilizes prepare base material and rolling roller in advance first group of process period, and reach vacuum plating condition in advance, after first group of uncoiling room 1 and rolling room 22 complete plated film, second group of uncoiling room 1 and rolling room 22 can proceed plated film, and first group of uncoiling room 1 and rolling room 22 enter the plated film preparatory stage.In order to make in reel change, plated film vacuum chamber 9 does not stop plated film work, also be provided with between uncoiling room 1 and plated film vacuum chamber 9 and unreel storage compartment 6, rolling storage compartment 15 is also provided with between rolling room 22 and plated film vacuum chamber 9, in change of lap and roll change process, plated film vacuum chamber 9 still can utilize and unreel storing in storage compartment 6 and continue plated film, utilizes rolling storage compartment 15 to store the base material of part in roll change process plated film.Two uncoiling rooms 1 all by slide valve 14 with unreel storage compartment 6 and be connected, two rolling rooms 22 are all connected with rolling storage compartment 15 by slide valve 14, unreel between storage compartment 6 and plated film vacuum chamber 9, between rolling storage compartment 15 and plated film vacuum chamber 9 and be equipped with slide valve 14, above-mentioned slide valve 14 passes in each chamber for making base material, and keeps the atmosphere in each chamber relatively independent.Often organize below pay-off roll 2 and be provided with one group of material loading saddle mechanism 3, often organize below wind-up roll 23 and be provided with one group of discharging saddle mechanism 24, above-mentioned material loading saddle mechanism 3 is identical with discharging saddle mechanism 24 structure, include saddle bracket, drive the up-and-down movement mechanism of saddle bracket lifting and drive the horicontal motion mechanism of saddle bracket translation, pay-off roll 2 or wind-up roll 23 material loading or discharging are lifted for driving saddle bracket by up-and-down movement mechanism; Horicontal motion mechanism is lifted pay-off roll 2 or wind-up roll 23 shift-in uncoiling room 1 for driving saddle bracket or shifts out rolling room 22, realizes outdoor upper volume or rolling; Concrete course of action is, horicontal motion mechanism in material loading saddle mechanism 3 drives saddle bracket level to shift out uncoiling room 1, in outside, uncoiling room 1, pay-off roll 2 is installed on saddle bracket, then horicontal motion mechanism drives saddle bracket shift-in uncoiling room 1, and, up-and-down movement mechanism drive saddle bracket and on pay-off roll 2 rise to the installation jaw of pay-off roll 2, after installation, up-and-down movement mechanism drives saddle bracket to fall, and closes uncoiling room 1, and vacuumizes it; In like manner, up-and-down movement mechanism in discharging saddle mechanism 24 drives saddle bracket to rise to wind-up roll 23, the installation jaw of wind-up roll 23 decontrols wind-up roll 23, then up-and-down movement mechanism drive saddle bracket and on wind-up roll 23 decline, and it is outside to release rolling room 22 by horicontal motion mechanism, take off the wind-up roll 23 that rolling completes, change empty wind-up roll 23 and repeat above-mentioned installation steps.Unreel in storage compartment 6 to be provided with and unreel material storage mechanism 8, rolling material storage mechanism 16 is provided with in rolling storage compartment 15, it is identical with rolling material storage mechanism 16 structure that this unreels material storage mechanism 8, as shown in Figure 2, include reversing roller 802 and lifting storing roller 801 moving up and down, base material is wound on reversing roller 802 and lifting storing roller 801 successively back and forth, and utilizes the rising of lifting storing roller 801 or decline to realize storing and release base material; When being elevated storing roller 801 and rising, base material can be stored between lifting storing roller 801 and reversing roller 802; When being elevated storing roller 801 and declining, the base material be stored between lifting storing roller 801 and reversing roller 802 is released, and for change of lap roll change provides enough setup times, ensure that the continous-stable of multireel base material is coated with.The front unreeling material storage mechanism 8 is provided with heat device 7, for the base material wound off on winding up roller 2 is connected by two, guarantees that plated film carries out continuously; The rear of rolling material storage mechanism 16 is provided with shut off mechanism 18 and base material side steering successively, shut off mechanism 18 is for cutting off base material in time, avoid the base material on wind-up roll 23 to be wrapped over many or very few, base material side steering is used for the direction of travel changing base material in time, realizes rolling roll change; As shown in Figure 1, base material side steering in the present embodiment comprises penetrating mechanism 19 and base material break-in supporting plate 20, base material break-in supporting plate 20 one end is hinged, one end is unsettled, penetrating mechanism 19 is located at the below of base material break-in supporting plate 20, penetrating mechanism 19 rising promotes base material break-in supporting plate 20 and upwards overturns, then the base material that cut-off mechanism 18 cuts off enters in a rolling room 22, and is wound on the wind-up roll 23 in this rolling room 22; Penetrating mechanism 19 declines and makes base material break-in supporting plate 20 recovery level, the base material that then cut-off mechanism 18 cuts off is entered in another rolling room 22 by base material break-in supporting plate 20, and is wound on the wind-up roll 23 in this rolling room 22, and structure is simple, it is convenient to control, and achieves accurate roll change rolling.Based on above structure, be wound in one end of the wherein volume base material in two groups of pay-off roll 2 successively through heat device 7, after unreeling material storage mechanism 8 and pre-treatment mechanism 10, through reversing roller 12 commutate after successively reverse-winding on two groups of cold rollers 11, and successively through rolling material storage mechanism 16, be wound in wherein on one group of wind-up roll 23 after shut off mechanism 18 and base material side steering, above-mentioned reverse-winding can be regarded as, base material is wrapped anti-clockwise on one group of cold roller 11 first, then after reversing roller 12 commutates, wound clockwise on cold roller 11 is organized at another, now, namely two groups of cold rollers 11 can carry out plated film to the two sides of base material, also be equipped with the deviation correction mechanism 4 for base material correction after two groups of pay-off roll 2 and before two groups of wind-up rolls 23, because production line is longer, therefore one or more groups deviation correction mechanism 4 can also be set at the middle part of coating film production line, guarantee that plated film is stablized, deviation correction mechanism 4 in the present embodiment is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, correction controls precisely, and error is little, particularly, for transparent base material, as polyester film etc., adopt ultrasonic wave deviation-rectifying system, for opaque base band, as metallic film etc., adopt the Photoelectric Error Correction System or ultrasonic wave deviation-rectifying system, above-mentioned ultrasonic wave deviation-rectifying system or the deviating correcting principle of the Photoelectric Error Correction System are prior art, just repeat no more at this, in addition, base material is also provided with many group bridle rollss and many group conveying pressure rollers 17, makes base material steady running.Uncoiling room 1, unreel storage compartment 6, rolling storage compartment 15 and rolling room 22 all be located at outside roughing vacuum pump 25 and be connected, for the air in chamber is extracted out fast; Plated film vacuum chamber 9 is connected with the molecular pump group being located at outside, and this molecular pump group comprises molecular pump 26 and forepump 27, is connected after molecular pump 26 is connected with forepump 27 with plated film vacuum chamber 9, for the vacuum state that reaches capacity fast, meets plated film requirement.In addition, in order to reduce the power requirement to molecular pump group, in the present embodiment, two groups of cold rollers 11 are placed in two relatively independent plated film vacuum chambers 9, two plated film vacuum chambers 9 are connected by slide valve 14, facilitate and build technique for vacuum coating environment, and when two-sided plating difference in functionality film, avoid the seepage producing process gas between two groups of cold rollers 11, cause coating quality to decline.
As shown in Figure 1, in order to reduce the labor capacity of workman's field observation plated film progress, uncoiling room 1 in the present embodiment, unreel in storage compartment 6, rolling storage compartment 15 and rolling room 22 and be equipped with camera 5, camera 5 is all connected with supervisory control computer, the working condition of remote monitoring coating film production line links is realized by camera 5, can carry out relating operation in time, monitoring is convenient.
In addition, as shown in Figure 3 and Figure 4, magnetron sputtering coater structure 13 in the present embodiment comprises revolution and changes target assembly 133, change the negative electrode cell 131 of the corresponding two sides opening in target assembly 133 position with revolution and be installed on the target core 132 turning round and change on target assembly 133, revolution is changed target assembly 133 and is comprised support 1331, rotary disk 1334, drive the traversing mechanism that rotary disk 1334 rotates, drive the axial stretching mechanism 1332 that rotary disk 1334 stretches vertically, be installed on the two or more flexible axle sleeve 1335 on rotary disk 1334, be installed on flexible axle sleeve 1335 for the pole target stand plate 1336 of installing target core 132 be installed on radial extension mechanism 1337 on support 1331 and relative with the opening direction of negative electrode cell 131, rotary disk 1334 is for being provided with the barrel-like structure of inner chamber, flexible axle sleeve 1335 is installed on the sidewall of rotary disk 1334, after axial stretching mechanism 1332 shrinks, radial extension mechanism 1337 just axle sleeve 1335 flexible with is corresponding, for pole target stand plate 1336 outwards being ejected and embedding in negative electrode cell 131.Adopt revolution to change target assembly 133 achieves when not opening plated film vacuum chamber 9 can timely quick-replaceable cathode target, for being coated with continuously of multireel base material provides guarantee, namely change target without the need to repeatedly opening plated film vacuum chamber 9.In addition, adopt axial stretching mechanism 1332 to achieve and target core 132 is released plated film vacuum chamber 9, without the need to carrying out the replacing of target core 132 in plated film vacuum chamber 9 inside, easy to operate; In order to make axial stretching mechanism 1332 have enough rigidity, making rotary disk 1334 stretch out larger distance, in the present embodiment, axial stretching mechanism 1332 being also provided with three joint cartridge type guide rails 1333.Above-mentioned axial stretching mechanism 1332 and radial extension mechanism 1337 are electric pushrod, and traversing mechanism is stepper-motor, and the control of electric pushrod and stepper-motor is convenient, accurate positioning, can not impact the processing environment in plated film vacuum chamber 9.As shown in Figure 5, flexible axle sleeve 1335 in the present embodiment comprises interior axle 1338, middle axle sleeve 1339 and outer shaft 1340, interior axle 1338 is located in middle axle sleeve 1339, and be provided with the first compression spring 1341 between interior axle 1338 and middle axle sleeve 1339, middle axle sleeve 1339 is located in outer shaft 1340, and be provided with the second compression spring 1342 between middle axle sleeve 1339 and outer shaft 1340, outer shaft 1340 is fixedly installed on rotary disk 1334, flexible axle sleeve 1335 structure is simple, design ingenious, only need to utilize one group of radial extension mechanism 1337 can realize stretching out of multiple poles target, and after radial extension mechanism 1337 contraction, target core 132 can exit negative electrode cell 131 automatically, facilitate Rotation With Changing target, adopt two-stage to stretch out structure simultaneously, ensure that target core 132 has enough movement travels.When the magnetron sputtering coater structure 13 in the present embodiment comprise organize more time, multilayer functional membrane can be coated with in a plated film stroke, good and stable in order to ensure the processing condition in negative electrode cell 131, between multiple negative electrode cell 131, be also provided with gas isolating plate 134 as shown in Figure 3.
A kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line of the present embodiment, also comprise the detecting and controlling system of magnetron sputtering plating, comprise gas analyzer, vacuumometer, gas meter, optical fiber inductive probe, tension control system and computer etc., gas analyzer is located in negative electrode cell 131, for analyzing gaseous constituent in negative electrode cell 131 and content; Vacuumometer is located in plated film vacuum chamber 9, for measuring the air pressure in plated film vacuum chamber 9; Gas meter is located on the intake ducting of negative electrode cell 131, for the air input of control cathode cell 131; Optical fiber inductive probe stretches in negative electrode cell 131, for carrying out online collection analysis to target as sputter metal oxide gas out; Tension control system is located at pay-off roll 2, cold roller 11, wind-up roll 23 and is located on the bridle rolls on base material, for controlling the smooth running of flexible parent metal; Gas analyzer, vacuumometer, gas meter are connected respectively at computer with optical fiber inductive probe, for calculating each processing parameter and controlling.This detecting and controlling system similarly to the prior art, is not innovative point place of the present invention, just no longer describes in detail at this.In addition, because base material is flexible, therefore, base material is equipped with guiding supporting plate 21 at heat device 7, shut off mechanism 18 and penetrating mechanism 19 place, make base material can arrive specified location smoothly.
A kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line of the present embodiment, add man-hour, first by wherein one wind off base material on winding up roller 2 successively through heat device 7, unreel material storage mechanism 8 and pre-treatment mechanism 10 after, through reversing roller 12 commutate after successively reverse-winding on two groups of cold rollers 11, and be wound in wherein on one group of wind-up roll 23 successively after rolling material storage mechanism 16, shut off mechanism 18 and base material side steering, wherein also through multiple bridle rolls and conveying pressure roller 17 etc., pay-off roll 2 unreels, wind-up roll 23 rolling, now, unreel the base material that material storage mechanism 8 stores certain length, when one winds off after winding up roller 2 unreeled, plated film vacuum chamber 9 is still carrying out plated film processing, namely base material is still in operation, now unreel the base material release that material storage mechanism 8 will store, make the end of this volume base material motionless, simultaneously, another winds off winding up roller 2 and starts to unreel, when this volume substrate transport is to heat device 7, heat device 7 works, by joining end to end of two volume base materials, the uncoiling room 1 unreeled prepares new pay-off roll 2, after base material is connected, pay-off roll 2 is accelerated to unreel, and be again stored in and unreel in material storage mechanism 8, after storing completes, pay-off roll 2 recovers normal processing velocity, when the rolling of a wind-up roll 23 completes, shut off mechanism 18 works, base material is cut off, and enter under the effect of base material side steering in next rolling room 22, rolling by the wind-up roll 23 in this rolling room 22, because the cut-out of base material and commutation need certain hour, therefore now the base material of plated film is temporarily stored in rolling material storage mechanism 16, after wind-up roll 23 has been changed, this wind-up roll 23 accelerates rolling, regained by the base material of release in rolling material storage mechanism 16, after the base material in rolling material storage mechanism 16 has discharged, wind-up roll 23 recovers normal processing velocity.In multireel base material continuous coating process, for avoiding target not enough, adopting revolution to change target assembly 133 and many group target cores 132 are provided, ensure that continuous coating, substantially increase plated film efficiency.
A kind of flexible parent metal of the present invention two-sided continuous reeling magnetron sputtering plating automatic production line, utilize getting the raw materials ready in advance and the in advance standby roller of rolling of uncoiling, and realize being coated with continuously of multireel base material in conjunction with the material storage mechanism of uncoiling and rolling, the time eliminating middle change of lap and vacuumize, substantially increase plated film efficiency, and decrease the base material waste caused because of change of lap, reduce coating cost; Base material reverse-winding on two groups of cold rollers is utilized to realize base material double-sided coating; Adopt revolution to change simultaneously target assembly achieves when not opening plated film vacuum chamber can timely quick-replaceable cathode target, for being coated with continuously of multireel base material provides guarantee.
Below be schematically described the present invention and embodiment thereof, this description does not have restricted, and shown in accompanying drawing is also one of embodiments of the present invention, and actual structure is not limited thereto.So, if those of ordinary skill in the art enlightens by it, when not departing from the invention aim, without creatively designing the frame mode similar to this technical scheme and embodiment, all should protection scope of the present invention be belonged to.
Claims (9)
1. a flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line, comprise uncoiling room (1), rolling room (22) and plated film vacuum chamber (9), it is characterized in that: in described plated film vacuum chamber (9), be provided with pre-treatment mechanism (10), two groups of cold rollers (11) and be located at the one or more magnetron sputtering coater structure (13) often organized on cold roller (11), described uncoiling room (1) and rolling room (22) are provided with two, also be provided with between uncoiling room (1) and plated film vacuum chamber (9) and unreel storage compartment (6), rolling storage compartment (15) is also provided with between rolling room (22) and plated film vacuum chamber (9), uncoiling room (1) described in two all by slide valve (14) with unreel storage compartment (6) and be connected, rolling room (22) described in two is all connected with rolling storage compartment (15) by slide valve (14), described unreels between storage compartment (6) and plated film vacuum chamber (9), slide valve (14) is equipped with between rolling storage compartment (15) and plated film vacuum chamber (9), one group of pay-off roll (2) is respectively provided with in uncoiling room (1) described in two, often organize pay-off roll (2) below and be provided with one group of material loading saddle mechanism (3), respectively be provided with one group of wind-up roll (23) in rolling room (22) described in two, often organize wind-up roll (23) below and be provided with one group of discharging saddle mechanism (24), described unreel in storage compartment (6) to be provided with unreel material storage mechanism (8), rolling material storage mechanism (16) is provided with in described rolling storage compartment (15), the described front unreeling material storage mechanism (8) is provided with heat device (7), and the rear of described rolling material storage mechanism (16) is provided with shut off mechanism (18) and base material side steering successively, the one end being wound in the wherein volume base material on two groups of pay-off roll (2) successively through heat device (7), unreel material storage mechanism (8) and pre-treatment mechanism (10) after, after reversing roller (12) commutation, reverse-winding, on two groups of cold rollers (11), and is wound in wherein on one group of wind-up roll (23) successively after rolling material storage mechanism (16), shut off mechanism (18) and base material side steering successively, the deviation correction mechanism (4) for base material correction is also equipped with after two groups of pay-off roll (2) and before two groups of wind-up rolls (23), described uncoiling room (1), unreel storage compartment (6), rolling storage compartment (15) and rolling room (22) all be located at outside roughing vacuum pump (25) and be connected, described plated film vacuum chamber (9) is connected with the molecular pump group being located at outside, described base material side steering comprises penetrating mechanism (19) and base material break-in supporting plate (20), described base material break-in supporting plate (20) one end is hinged, one end is unsettled, described penetrating mechanism (19) is located at the below of base material break-in supporting plate (20), described penetrating mechanism (19) rising promotes base material break-in supporting plate (20) and upwards overturns, the base material that then cut-off mechanism (18) cuts off enters in a rolling room (22), and is wound on the wind-up roll (23) in this rolling room (22), described penetrating mechanism (19) declines and makes base material break-in supporting plate (20) recover level, the base material that then cut-off mechanism (18) cuts off is entered in another rolling room (22) by base material break-in supporting plate (20), and is wound on the wind-up roll (23) in this rolling room (22).
2. a kind of flexible parent metal according to claim 1 two-sided continuous reeling magnetron sputtering plating automatic production line, it is characterized in that: the cold roller (11) described in two groups is placed in two relatively independent plated film vacuum chambers (9), and two plated film vacuum chambers (9) are connected by slide valve (14).
3. a kind of flexible parent metal according to claim 2 two-sided continuous reeling magnetron sputtering plating automatic production line, it is characterized in that: described uncoiling room (1), unreel in storage compartment (6), rolling storage compartment (15) and rolling room (22) and be equipped with camera (5), described camera (5) is all connected with supervisory control computer.
4. a kind of flexible parent metal two-sided continuous reeling magnetron sputtering plating automatic production line according to claims 1 to 3 any one, it is characterized in that: described magnetron sputtering coater structure (13) comprises revolution and changes target assembly (133), change the negative electrode cell (131) of the corresponding two sides opening in target assembly (133) position with revolution and be installed on revolution and change target core (132) on target assembly (133), described revolution is changed target assembly (133) and is comprised support (1331), rotary disk (1334), drive the traversing mechanism that rotary disk (1334) rotates, drive the axial stretching mechanism (1332) that rotary disk (1334) is flexible vertically, be installed on the two or more flexible axle sleeve (1335) on rotary disk (1334), be installed on the radial extension mechanism (1337) upper and relative with the opening direction of negative electrode cell (131) with being installed on support (1331) for pole target stand plate (1336) of installing target core (132) on flexible axle sleeve (1335), described rotary disk (1334) is for being provided with the barrel-like structure of inner chamber, described flexible axle sleeve (1335) is installed on the sidewall of rotary disk (1334), after axial stretching mechanism (1332) shrinks, described radial extension mechanism (1337) is just corresponding with a flexible axle sleeve (1335), for pole target stand plate (1336) outwards being ejected and embedding in negative electrode cell (131).
5. a kind of flexible parent metal according to claim 4 two-sided continuous reeling magnetron sputtering plating automatic production line, it is characterized in that: described flexible axle sleeve (1335) comprises interior axle (1338), middle axle sleeve (1339) and outer shaft (1340), described interior axle (1338) is located in middle axle sleeve (1339), and be provided with the first compression spring (1341) between interior axle (1338) and middle axle sleeve (1339), described middle axle sleeve (1339) is located in outer shaft (1340), and be provided with the second compression spring (1342) between middle axle sleeve (1339) and outer shaft (1340), described outer shaft (1340) is fixedly installed on rotary disk (1334).
6. a kind of flexible parent metal according to claim 5 two-sided continuous reeling magnetron sputtering plating automatic production line, is characterized in that: described axial stretching mechanism (1332) is also provided with three joint cartridge type guide rails (1333).
7. a kind of flexible parent metal according to claim 6 two-sided continuous reeling magnetron sputtering plating automatic production line, it is characterized in that: described material loading saddle mechanism (3) is identical with discharging saddle mechanism (24) structure, include saddle bracket, drive the up-and-down movement mechanism of saddle bracket lifting and drive the horicontal motion mechanism of saddle bracket translation, pay-off roll (2) or wind-up roll (23) material loading or discharging are lifted for driving saddle bracket by described up-and-down movement mechanism; Described horicontal motion mechanism is lifted pay-off roll (2) or wind-up roll (23) shift-in uncoiling room (1) for driving saddle bracket or shifts out rolling room (22), realizes outdoor upper volume or rolling.
8. a kind of flexible parent metal according to claim 7 two-sided continuous reeling magnetron sputtering plating automatic production line, it is characterized in that: described to unreel material storage mechanism (8) identical with rolling material storage mechanism (16) structure, include reversing roller (802) and lifting storing roller moving up and down (801), described base material is wound in reversing roller (802) and lifting storing roller (801) successively back and forth, and utilizes the rising of lifting storing roller (801) or the realization that declines to store and release base material.
9. a kind of flexible parent metal according to claim 8 two-sided continuous reeling magnetron sputtering plating automatic production line, is characterized in that: described deviation correction mechanism (4) is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
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| CN107254672B (en) * | 2017-05-27 | 2019-05-21 | 深圳先进技术研究院 | The detection system of vacuum coating equipment |
| CN107513693A (en) * | 2017-08-07 | 2017-12-26 | 深圳市烯谷能源控股有限公司 | A kind of modular manufacturing multipurpose devices of coiled vacuum coating machine |
| CN109808167B (en) * | 2017-11-20 | 2021-01-26 | 中国科学院沈阳计算技术研究所有限公司 | Integrated automatic winding machine for auxiliary coiled material of marine oil hose |
| CN109930119A (en) * | 2018-01-22 | 2019-06-25 | 无锡光润真空科技有限公司 | Vacuum coater |
| CN110747445A (en) * | 2018-07-23 | 2020-02-04 | 北京铂阳顶荣光伏科技有限公司 | Film coating equipment and film coating method |
| CN109930110A (en) * | 2019-04-09 | 2019-06-25 | 哈尔滨商业大学 | A kind of high anti-reflection barrier composite membrane and its Preparation equipment and method |
| CN110734157A (en) * | 2019-11-29 | 2020-01-31 | 南京林业大学 | outdoor water purifier |
| CN110923652A (en) * | 2019-12-26 | 2020-03-27 | 北京大学深圳研究院 | Device for magnetron sputtering continuous deposition of wire surface coating |
| CN114351099B (en) * | 2021-04-26 | 2023-09-08 | 辽宁分子流科技有限公司 | Vacuum magnetron sputtering coating machine |
| CN113430496B (en) * | 2021-06-29 | 2023-03-14 | 辽宁分子流科技有限公司 | Intelligent winding coating production line |
| CN114635111A (en) * | 2022-02-12 | 2022-06-17 | 吴梦伟 | Automatic production line for double-sided winding coating of flexible base material |
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