CN104611682A - Magnetron sputtering winding plating equipment capable of double-sided reciprocating continuous high-efficient plating - Google Patents
Magnetron sputtering winding plating equipment capable of double-sided reciprocating continuous high-efficient plating Download PDFInfo
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- CN104611682A CN104611682A CN201510066782.3A CN201510066782A CN104611682A CN 104611682 A CN104611682 A CN 104611682A CN 201510066782 A CN201510066782 A CN 201510066782A CN 104611682 A CN104611682 A CN 104611682A
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Abstract
The invention discloses magnetron sputtering winding plating equipment capable of double-sided reciprocating continuous high-efficient plating, belonging to the field of plating equipment. The winding plating equipment comprises a vacuum chamber, an unwinding mechanism, two sets of cold rollers, a winding mechanism, a reversing target changing device and error correcting devices, wherein a base band between the unwinding mechanism and the winding mechanism is reversed through a reversing roller arranged and is wound on the two sets of cold rollers in an S shape; the unwinding mechanism and the winding mechanism are respectively provided with a set of error correcting device, circumstantial surfaces, wound with the base band, of the two sets of cold rollers are respectively and correspondingly provided with a set of cathode chamber with two opening sides, and the two sets of cathode chambers are respectively and correspondingly provided with a set of reversing target changing device; the reciprocating movement of the base band is driven by the unwinding mechanism and the winding mechanism. According to the winding plating equipment, a cathode target can be changed timely without opening the plating vacuum chamber, continuous two-sided multi-film plating is realized by utilizing the reciprocating movement of the double-cold rollers and base material, the electrical control gear and procedure of the plating equipment are simplified, and the plating efficiency is improved; the structure is compact and the occupation area is small.
Description
Technical field
The present invention relates to a kind of vacuum plating unit, more particularly, relate to a kind of two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine.
Background technology
Vacuum winding coating technique is exactly prepare at coiled strip substrate surface the technology that one deck or multilayer have the film of certain function by the method such as thermal evaporation or magnetron sputtering in vacuum chamber.Vacuum winding filming equipment mainly contains following characteristics: one, plated base material are flexible parent metal, and namely having can be windability; Two, coating process has continuity, and namely within a work period, plated film carries out continuously; Three, coating process carries out in high vacuum environment.Winding film coating machine is unreeling with in wrapup procedure, substrate surface is coated with film, the structure of plated film is exactly the operate portions of vacuum winding filming equipment, it is between the unwinding and rewinding of base material, and the principle of work of operate portions can be any one in thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or other vacuum coating method.The working process of magnetron sputtering is that electronics accelerates to fly in the process of base material film to collide with sputter gas argon gas under the effect of electric field, ionize out a large amount of argon ions and electronics, electronics flies to base material film, constantly collides with ar atmo in the process, produces more ar atmo and electronics; Argon ion accelerates to bombard target under the effect of electric field, sputters a large amount of target atom, is deposited on base material film surface filming in neutral target atom (or molecule).
Flexible parent metal is widely used in the middle of organic semiconductors technologies, transparency electrode and touch-screen.In recent years along with the develop rapidly to magnetron sputtering technique itself in the widespread demand of flexible substrates Coating Materials and flexible parent metal, various high-performance optical film is coated with successfully in large area flexible substrate.Due to the important directions that flexible parent metal has simple, the easy transport of continuous seepage, the advantage such as arbitrary shape, flexible parcel that can conveniently cut into is magnetron sputtering technique development always.Therefore, plate functional membrane many employings winding film plating mode on a plastic film, and the good functional membrane of function will be plated on a plastic film, as plated the good low-reflection film of function (low-E film) on polyester film, minimum two silver-colored structural membrane also needs the rete of plating more than 9 layers, if plating visible light transmissivity is greater than 85%, resistance is less than 1 Ω/m
2electromagnetic shielding film (EMI film), then to plate four silver medal structural membrane, i.e. 17 tunic layers.Plate every one deck and all will configure a set of negative electrode and target core, and monoblock type plated film is singly rolled in traditional winding film coating machine employing, namely in a plated film vacuum chamber, a cold roller is laid, 2 ~ 3 negative electrodes, target core and releasing coil mechanism, rolling-up mechanism, due to structural limitations reason, can not to arrange at circumference the negative electrode of as many as more than 4 groups, the rete that a coating just can plate more than 4 layers difference in functionalitys can not be adapted to, even if lay two cold rollers in a coating chamber, 4 ~ 6 negative electrodes and target core, also can not arrange any more 17 negative electrodes and target position.For reaching the object of having plated 17 tunics, design in a traditional way, need at least 3 cold rollers, the pipeline of water flowing, energising is many, the gas discharge quantity produced is large, be unfavorable for vacuum pump economical operation, therefore traditional coating equipment can not adapt to the plated film that a coating just can plate more than 4 layers, can not produce that rete is many, the functional plastic rete of better function.Between each negative electrode cell of machining state, also there is the seepage (5% ~ 20%) of process gas each other under the state that generally multiple poles target is arranged, the plated film that processing is obtained does not reach the requirement of technique.
In anticathode spattering filming device, winding-type vacuum coater can continuous seepage and significantly improve the efficiency of film forming with it, but, in existing winding-type vacuum coater, each is used for the installation limited amount of spatter film forming negative electrode cell, the sputtering time of each negative electrode cell and sputtering atmosphere are difficult to accurate control, the poor stability of film forming, mostly can only produce one deck or two layer medium film, and three layer dielectrics cannot be sputtered continuously, because the spatter film forming time of the deielectric-coating in the middle of three layer dielectrics is longer, film forming atmosphere is all different from the atmosphere of upper and lower two layer medium film, existing winding-type vacuum coater synchronous axial system, the spatter film forming time of single negative electrode cell is obviously inadequate, the atmosphere of each negative electrode cell is also easily interfered mutually, in addition, existing winding-type vacuum coater often needs with cleaning device, heating unit, unreels and support the use formation production line with rolling-up mechanism, can cause like this equipment many, take the large problem in the place of production.In addition, need in some cases to be all coated with functional membrane on the two sides of flexible parent metal, the structure of coating equipment will be more too fat to move in this case, and cause device structure huger, electric control system is more complicated.
In view of this, how to design and a kind ofly only just can sputter multilayer functional membrane continuously on base material two sides with single vacuum coating film equipment and become and have technical problem to be solved.
Summary of the invention
1. invent the technical problem that will solve
The object of the invention is to the above-mentioned deficiency overcoming prior art, a kind of two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine is provided, adopt technical scheme of the present invention, cathode target can be changed in time when not opening plated film vacuum chamber, save after tradition changes target and again vacuumize the required time, and utilize the to-and-fro movement design of two cooling roller and base material to achieve being coated with continuously of double-sided multi-layer rete, simplify electrical control gear and the program of coating equipment, improve plated film efficiency; Every layer function film on base material two sides is coated with all separately, is convenient to parameters of film and controls, improve plated film precision; Meanwhile, the structure of coating equipment is compacter, and occupation of land space is little, can be used for Scientific Research in University Laboratory and small serial production use thereof.
2. technical scheme
For achieving the above object, technical scheme provided by the invention is:
The two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, comprise vacuum chamber, be located at the uncoiling mechanism in vacuum chamber, two groups of cooling rollers and rolling-up mechanism successively, also comprise revolution and change target assembly and deviation correcting device, base band between described uncoiling mechanism and rolling-up mechanism is wound on two groups of cooling rollers in serpentine after reversing roller commutation, and described uncoiling mechanism and rolling-up mechanism place respectively arrange one group of deviation correcting device; On the circumferential surface that two groups of described cooling rollers are wound with base band, each correspondence is provided with the negative electrode cell of one group of two sides opening, two groups of described each correspondences of negative electrode cell arrange one group of revolution and change target assembly, and often organize revolution and change target assembly, negative electrode cell and cooling roller and be positioned on same axis; Described revolution changes that target assembly comprises support, the rotary disk be connected to by traversing mechanism on support, the two or more pole target stand plates for installing target core be uniformly distributed in by radial extension mechanism on rotary disk; Described pole target stand plate rotates to the corresponding opening part of negative electrode cell, and protruding by the target core embedding little indoor of negative electrode; Described uncoiling mechanism and rolling-up mechanism drive base band to-and-fro movement.
Further, the support that target assembly is changed in described revolution is also provided with the axial stretching mechanism along rotary disk axial stretching, for rotary disk is moved to vacuum chamber outside.
Further, described axial stretching mechanism is provided with three joint cartridge type guide rails.
Further, described deviation correcting device is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
Further, described uncoiling mechanism place is also provided with pretreating device, and described pretreating device comprises ion source pre-treatment mechanism and cold well coil pipe deep cooling mechanism, and described ion source pre-treatment mechanism is for cleaning the dirt on base band surface; Described cold well coil pipe deep cooling mechanism is used for condensation to a large amount of steam discharged in base band pretreatment process.
Further, described negative electrode cell is provided with cooling plate, air supply mechanism and atmosphere division board, described gas isolating plate is arranged at the both sides of negative electrode cell, described cooling plate is located on the sidewall of negative electrode cell, and cooling plate is distributed with water-cooled tube, described air supply mechanism is located at the little indoor of negative electrode, and is connected with the tonifying Qi unit of vacuum chamber outside, the little indoor of described negative electrode are also provided with vacuum device, and this vacuum device is connected with the evacuator of vacuum chamber outside.
3. beneficial effect
Adopt technical scheme provided by the invention, compared with existing known technology, there is following unusual effect:
(1) the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, base band between its uncoiling mechanism and rolling-up mechanism is wound on two groups of cooling rollers in serpentine after reversing roller commutation, uncoiling mechanism and rolling-up mechanism place respectively arrange one group of deviation correcting device, the back and forth motion continuously of base band can be realized, make the rolling neat in edge of base band, reach the processing object of plating multilayer film; On two groups of cooling rollers, be respectively provided with one group of revolution changes target assembly simultaneously, cathode target can be changed in time when not opening plated film vacuum chamber, save after tradition changes target and again vacuumize the required time, achieve being coated with continuously of base band double-sided multi-layer film, simplify electrical control gear and program, improve plated film efficiency; Every tunic on base material two sides is coated with all separately, is convenient to parameters of film and controls, improve plated film precision;
(2) the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, the support that target assembly is changed in its revolution is also provided with the axial stretching mechanism along rotary disk axial stretching, for rotary disk is moved to vacuum chamber outside, can carry out changing target in vacuum chamber outside after a plated film completes, simple to operation;
(3) the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, its axial stretching mechanism is provided with three joint cartridge type guide rails, ensure that axial stretching mechanism has enough rigidity, guarantee to stretch out larger distance;
(4) the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, its deviation correcting device is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, and correction controls precisely, and error is little;
(5) the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, its pretreating device comprises ion source pre-treatment mechanism and cold well coil pipe deep cooling mechanism, and ion source pre-treatment mechanism is for cleaning the dirt on base band surface; Cold well coil pipe deep cooling mechanism is used for condensation to a large amount of steam discharged in base band pretreatment process; Pretreating device, to base band surface treatment neat and tidy, ensure that plated film processing quality.
Accompanying drawing explanation
Fig. 1 is the principle schematic of a kind of two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention;
Fig. 2 is the structural representation that target assembly is changed in revolution in the present invention;
Fig. 3 is the structural representation of the negative electrode cell in the present invention.
Label declaration in schematic diagram:
1, vacuum chamber; 2, uncoiling mechanism; 3, base band; 4, deviation correcting device; 5, pretreating device; 6, reversing roller; 7, cooling roller; 8, rolling-up mechanism; 9, negative electrode cell; 901, gas isolating plate; 902, air supply mechanism; 903, cooling plate; 904, water-cooled tube; 10, target core; 11, target assembly is changed in revolution; 1101, support; 1102, axial stretching mechanism; 1103, rotary disk; 1104, radial extension mechanism; 1105, pole target stand plate; 12, air inlet electromagnetic valve; 13, to bleed magnetic valve; 14, roughing vacuum pump; 15, cryopump; 16, forepump; 17, forepump is bled magnetic valve; 18, molecular pump; 19, molecular pump extraction valve.
Embodiment
For understanding content of the present invention further, the present invention is described in detail by reference to the accompanying drawings.
Composition graphs 1, the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, comprises the detecting and controlling system of the vacuum chamber 1 performing plated film work, the external pump group providing coating process condition, detection and control plated film machining state, wherein, uncoiling mechanism 2 is provided with in vacuum chamber 1, two cooling rollers 7 placed side by side, rolling-up mechanism 8, the negative electrode cell 9 of two sides opening, target assembly 11 and deviation correcting device 4 are changed in revolution, base band 3 between uncoiling mechanism 2 and rolling-up mechanism 8 is wound on two groups of cooling rollers 7 in serpentine after reversing roller 6 commutates, uncoiling mechanism 2 and rolling-up mechanism 8 place respectively arrange one group of deviation correcting device 4, on the circumferential surface that two groups of cooling rollers 7 are wound with base band 3, each correspondence is provided with the negative electrode cell 9 of one group of two sides opening, two groups of each correspondences of negative electrode cell 9 arrange one group of revolution and change target assembly 11, and often target assembly 11 is changed in group revolution, negative electrode cell 9 and cooling roller 7 are positioned on same axis, uncoiling mechanism 2 place is also provided with pretreating device 5.External pump group comprises roughing vacuum pump group, cryopump 15 and molecular pump group, and roughing vacuum pump group comprises air inlet electromagnetic valve 12, bleed magnetic valve 13 and roughing vacuum pump 14, and is connected in vacuum chamber 1 according to mode of connection shown in Fig. 1, for being extracted out fast by the gas in vacuum chamber 1; Cryopump 15, for lowering the temperature to vacuum chamber 1 fast, coordinates roughing vacuum pump group and molecular pump group to make to reach capacity in vacuum chamber 1 vacuum state; Molecular pump group comprises forepump 16, forepump is bled magnetic valve 17, molecular pump 18 and molecular pump extraction valve 19, forepump 16, forepump are bled after magnetic valve 17, molecular pump 18 and molecular pump extraction valve 19 are connected successively and are connected with vacuum chamber 1, for realizing reaching capacity fast vacuum state.Detecting and controlling system comprises gas analyzer, vacuumometer, gas meter, optical fiber inductive probe, tension control system and computer, and gas analyzer is located in negative electrode cell 9, for analyzing gaseous constituent in negative electrode cell 9 and content; Vacuumometer is located in vacuum chamber 1, for measuring the air pressure in vacuum chamber 1; Gas meter is located on the intake ducting of negative electrode cell 9, for the air input of control cathode cell 9; Optical fiber inductive probe stretches in negative electrode cell 9, for carrying out online collection analysis to target as sputter metal oxide gas out; Tension control system is located at uncoiling mechanism 2, cooling roller 7, rolling-up mechanism 8 and is located on the bridle rolls in base band 3, for controlling the smooth running of flexible base band 3; Gas analyzer, vacuumometer, gas meter are connected respectively at computer with optical fiber inductive probe, for calculating each processing parameter and controlling.
The two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present invention, aim to provide a kind of compact construction, it is convenient to control, the double-sided coating machine that working (machining) efficiency is high, revolution is utilized to change target assembly 11, cathode target can be changed in time when not opening plated film vacuum chamber, save after tradition changes target and again vacuumize the required time, and utilize rolling and unreel two groups of deviation correcting devices 4 and realize base band 3 to-and-fro movement, thus realize being coated with continuously of double-sided multi-layer rete, simplify electrical control gear and program, every tunic on base material two sides is coated with all separately, be convenient to parameters of film control, improve plated film precision, meanwhile, compact equipment, occupation of land space is little, is particularly suitable for Scientific Research in University Laboratory or small serial production.
Below in conjunction with embodiment, the invention will be further described.
Embodiment
As shown in Figure 1, the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present embodiment, comprise vacuum chamber 1, be located at uncoiling mechanism 2, two groups of cooling rollers 7 in vacuum chamber 1 successively, rolling-up mechanism 8, the negative electrode cell 9 of two sides opening, revolution change target assembly 11 and deviation correcting device 4, uncoiling mechanism 2 and rolling-up mechanism 8 are placed in the both sides of vacuum chamber 1, base band 3 between uncoiling mechanism 2 and rolling-up mechanism 8 is wound on two groups of cooling rollers 7 in serpentine after reversing roller 6 commutates, two groups of cooling rollers 7 are laterally arranged side by side, compact construction, takes up room little; Plated film adds man-hour, uncoiling mechanism 2, cooling roller 7 and rolling-up mechanism 8 synchronous interaction, simultaneously, also pass into the cooling fluid of-15 ~-20 DEG C in cooling roller 7, for reducing the high temperature that plated film produces, ensure coating quality, after plated film terminates, cooling roller 7 can be made again to get back to room temperature state fast.Uncoiling mechanism 2 and rolling-up mechanism 8 place respectively arrange one group of deviation correcting device 4; uncoiling mechanism 2 and rolling-up mechanism 8 all have rolling and unreel function; in rolling and the to-and-fro movement that unreels; two groups of deviation correcting devices 4 can guarantee base band 3 rolling neat in edge, thus ensure that the reciprocating stability of base band 3.On the circumferential surface that two groups of cooling rollers 7 are wound with base band 3, each correspondence is provided with one group of negative electrode cell 9, two groups of each correspondences of negative electrode cell 9 arrange one group of revolution and change target assembly 11, and often target assembly 11 is changed in group revolution, negative electrode cell 9 and cooling roller 7 are positioned on same axis, the mode of serpentine base band 3 is adopted to be wound on two cooling rollers 7, the front of base band 3 is wrapped on one of them cooling roller 7, then the back side of base band 3 is wrapped on another cooling roller 7, namely the double-sided coating of base band 3 can be realized in less space, target assembly 11 is changed in revolution simultaneously can by pivotal mode, cathode target can be changed in time when not opening plated film vacuum chamber 1, achieve the function of plating multilayer film continuously on the two sides of base band 3, overcome existing coating equipment to need again to vacuumize when target is changed in vacuum chamber 1 outside, the deficiency of waste plenty of time and the energy.In addition, the left and right sides that target assembly 11 is located at two cooling rollers 7 is respectively changed in two groups of revolutions in the present embodiment, apart from each other, even if when the functional membrane of the two sides of base band 3 plating differing materials, also there will not be the process gas between two negative electrode cells 9 mutually to disturb, ensure that coating quality.
Shown in Figure 2, this gives the structural representation that target assembly 11 is changed in a kind of revolution, this revolution change that target assembly 11 comprises the support 1101 be fixed in vacuum chamber 1, the rotary disk 1103 be connected to by traversing mechanism on support 1101, the two or more pole target stand plates 1105 for installing target core 10 be uniformly distributed in by radial extension mechanism 1104 on rotary disk 1103; In addition, in order to carry out the replacing of target core 10 after a plated film completes easily, the support 1101 that target assembly 11 is changed in revolution is also provided with the axial stretching mechanism 1102 along rotary disk 1103 axial stretching, by axial stretching mechanism 1102, rotary disk 1103 is released vacuum chamber 1 together with the pole target stand plate 1105 on it, the replacing of target core 10 just can be carried out without the need to entering vacuum chamber 1, simple to operation.Specifically in the present embodiment, pole target stand plate 1105 is evenly provided with 4, can respectively plate the functional membrane of more than 4 layers at least continuous two sides in base band 3 after once changing target, and the target core 10 on pole target stand plate 1105 adopts flange connection, facilitates the disassembling, assembling and replacing of target core 10; Above-mentioned traversing mechanism is stepper-motor, rotary disk 1103 can be driven to determine angle by setup program and rotate, control convenient, accurate positioning; Axial stretching mechanism 1102 comprises three joint cartridge type guide rail and electric pushrods, one end of three joint cartridge type guide rails is fixed on rotary disk 1103, the other end is located on support 1101, adopts three joint cartridge type guide rails to ensure that axial stretching mechanism 1102 has enough rigidity, guarantees to stretch out larger distance; Radial extension mechanism 1104 is electric pushrod, and each pole target stand plate 1105 controls flexible by an electric pushrod.In the present embodiment, pole target stand plate 1105 rotates to the corresponding opening part of negative electrode cell 9, and is protrudingly embedded in negative electrode cell 9 by target core 10, realizes technique plated film; Further, operate in conjunction with uncoiling mechanism 2 and the back and forth continuous of rolling-up mechanism 8, drive base band 3 to-and-fro movement, thus realize the two-sided continuous plating multilayer functional membrane of base band 3.
The two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present embodiment, deviation correcting device 4 is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System, particularly, for transparent base band 3, as polyester film etc., adopt ultrasonic wave deviation-rectifying system, for opaque base band 3, as metallic film etc., adopt the Photoelectric Error Correction System or ultrasonic wave deviation-rectifying system.Above-mentioned ultrasonic wave deviation-rectifying system or the deviating correcting principle of the Photoelectric Error Correction System are prior art, just repeat no more at this.As shown in Figure 3, negative electrode cell 9 is provided with cooling plate 903, air supply mechanism 902 and atmosphere division board 901, gas isolating plate 901 is arranged at the both sides of negative electrode cell 9, cooling plate 903 is located on the sidewall of negative electrode cell 9, and cooling plate 903 is distributed with water-cooled tube 904, air supply mechanism 902 is located in negative electrode cell 9, and is connected with the tonifying Qi unit of vacuum chamber 1 outside, also be provided with vacuum device in negative electrode cell 9, and this vacuum device is connected with the evacuator of vacuum chamber 1 outside.In addition, the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present embodiment, at uncoiling mechanism 2, place is also provided with pretreating device 5, this pretreating device 5 comprises ion source pre-treatment mechanism and cold well coil pipe deep cooling mechanism, and ion source pre-treatment mechanism is for cleaning the dirt on base band 3 surface; Cold well coil pipe deep cooling mechanism utilizes liquid nitrogen as refrigeration agent, surrounding temperature can be made to drop to subzero about 120 DEG C, for condensation to a large amount of steam discharged in base band 3 pretreatment process, and coordinate pumped vacuum systems gas clean-up in 3 ~ 5 minutes.In addition, for the ease of observing the working order in vacuum chamber 1, vacuum chamber 1 also offers view port.
The two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one of the present embodiment, plated film adds man-hour, be set on uncoiling mechanism 2 by the base band 3 of rolling, the one end of drawing base band 3 walks around reversing roller 6 and cooling roller 7 respectively as shown in Figure 1, and is fixed on rolling-up mechanism 8; The target core 10 be coated with needed for rete is installed on corresponding pole target stand plate 1105; Closing vacuum chamber 1, utilizes external pump group to vacuumize vacuum chamber 1, realizes processing condition needed for plated film; During plated film, uncoiling mechanism 2 and rolling-up mechanism 8 synchronously unreel and rolling, and the synchronous interaction of two groups of cooling rollers 7, realizes winding film plating simultaneously; After uncoiling mechanism 2 has unreeled (namely one deck rete has respectively been plated in the two sides of base band 3), radial extension mechanism 1104 shrinks, pole target stand plate 1105 exits in negative electrode cell 9, traversing mechanism turns an angle according to the time variable control rotary disk 1103 established in advance, change another target core 10, and utilize radial extension mechanism 1104 to be ejected by the pole target stand plate 1105 fixing this target core 10 in embedding negative electrode cell 9, complete and once change target; Change after target completes, uncoiling mechanism 2 and rolling-up mechanism 8 start to rotate backward, i.e. the exchange function of uncoiling mechanism 2 and rolling-up mechanism 8, and cooling roller 7 also synchronous interaction, realizes being coated with of the second tunic; Repeat above-mentioned steps, change target assembly 11 for the revolution with four groups of target cores 10, once change target at least can base band 3 two-sided on be coated with 4 tunic layers continuously, substantially increase production efficiency; After the revolution target changed on target assembly 11 has all been coated with, shuts down, utilized axial stretching mechanism 1102 that rotary disk 1103 is released vacuum chamber 1, carry out replacing target core 10 in vacuum chamber 1 outside.Because uncoiling mechanism 2 and rolling-up mechanism 8 place are respectively provided with one group of deviation correcting device 4, therefore can realize the back and forth motion continuously of base band 3, reach the processing object of plating multilayer film; Utilize revolution to change target assembly 11 and realize fast quick change target in vacuum chamber 1, save and change the target time and eliminate the repetition vacuum pumping of repeatedly changing needed for target, time-saving energy-saving; Be coated with separately because the rete every layer on base band 3 two sides in the present invention is, therefore the processing parameter for every layer of plated film all can control separately, the thickness of every tunic can accurately control, and there will not be traditional multiple cathode target process gas seepage that plated film produces simultaneously to interfere, the precision of plated film is high; In addition, adopt structure of the present invention, the structure of magnetic-control sputtering coiling film coating machine is obviously simplified, without the need to electric control system and the program of complexity, greatly reduce occupation area of equipment, reduce device fabrication cost, be particularly suitable for Scientific Research in University Laboratory or small serial production.
Below be schematically described the present invention and embodiment thereof, this description does not have restricted, and shown in accompanying drawing is also one of embodiments of the present invention, and actual structure is not limited thereto.So, if those of ordinary skill in the art enlightens by it, when not departing from the invention aim, without creatively designing the frame mode similar to this technical scheme and embodiment, all should protection scope of the present invention be belonged to.
Claims (6)
1. a two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine, comprise vacuum chamber (1), be located at the uncoiling mechanism (2) in vacuum chamber (1) successively, two groups of cooling rollers (7) and rolling-up mechanism (8), it is characterized in that: also comprise revolution and change target assembly (11) and deviation correcting device (4), base band (3) between described uncoiling mechanism (2) and rolling-up mechanism (8) is wound on two groups of cooling rollers (7) in serpentine after reversing roller (6) commutation, described uncoiling mechanism (2) and rolling-up mechanism (8) place respectively arrange one group of deviation correcting device (4), on the circumferential surface that two groups of described cooling rollers (7) are wound with base band (3), each correspondence is provided with the negative electrode cell (9) of one group of two sides opening, two groups of described each correspondences of negative electrode cell (9) arrange one group of revolution and change target assembly (11), and often organize revolution and change target assembly (11), negative electrode cell (9) and cooling roller (7) and be positioned on same axis, described revolution changes that target assembly (11) comprises support (1101), the rotary disk (1103) be connected to by traversing mechanism on support (1101), two or more poles target stand plate (1105) for installing target core (10) be uniformly distributed in by radial extension mechanism (1104) on rotary disk (1103), described pole target stand plate (1105) rotates to the corresponding opening part of negative electrode cell (9), and protruding by target core (10) embedding negative electrode cell (9), described uncoiling mechanism (2) and rolling-up mechanism (8) drive base band (3) to-and-fro movement.
2. the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one according to claim 1, it is characterized in that: the support (1101) that target assembly (11) are changed in described revolution is also provided with the axial stretching mechanism (1102) along rotary disk (1103) axial stretching, outside for rotary disk (1103) being moved to vacuum chamber (1).
3. the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one according to claim 2, is characterized in that: described axial stretching mechanism (1102) is provided with three joint cartridge type guide rails.
4. the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the one according to claim 1 or 2 or 3, is characterized in that: described deviation correcting device (4) is ultrasonic wave deviation-rectifying system or the Photoelectric Error Correction System.
5. the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one according to claim 4, it is characterized in that: described uncoiling mechanism (2) place is also provided with pretreating device (5), described pretreating device (5) comprises ion source pre-treatment mechanism and cold well coil pipe deep cooling mechanism, and described ion source pre-treatment mechanism is for cleaning the dirt on base band (3) surface; Described cold well coil pipe deep cooling mechanism is used for condensation to a large amount of steam discharged in base band (3) pretreatment process.
6. the two-sided reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one according to claim 5, it is characterized in that: described negative electrode cell (9) is provided with cooling plate (903), air supply mechanism (902) and atmosphere division board (901), described gas isolating plate (901) is arranged at the both sides of negative electrode cell (9), described cooling plate (903) is located on the sidewall of negative electrode cell (9), and cooling plate (903) is distributed with water-cooled tube (904), described air supply mechanism (902) is located in negative electrode cell (9), and the tonifying Qi unit outside with vacuum chamber (1) is connected, also vacuum device is provided with in described negative electrode cell (9), and this vacuum device is connected with the evacuator of vacuum chamber (1) outside.
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| CN109930110A (en) * | 2019-04-09 | 2019-06-25 | 哈尔滨商业大学 | A kind of high anti-reflection barrier composite membrane and its Preparation equipment and method |
| CN109930119A (en) * | 2018-01-22 | 2019-06-25 | 无锡光润真空科技有限公司 | Vacuum coater |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006249471A (en) * | 2005-03-09 | 2006-09-21 | Fuji Photo Film Co Ltd | Film deposition method |
| US20080029386A1 (en) * | 2006-08-01 | 2008-02-07 | Dorfman Benjamin F | Method and apparatus for trans-zone sputtering |
| CN101191195A (en) * | 2006-11-21 | 2008-06-04 | 甘国工 | Magnetic-control sputtering coiling film coating machine |
| WO2008065909A1 (en) * | 2006-11-28 | 2008-06-05 | Ulvac, Inc. | Winding vacuum film forming process and apparatus |
| CN102994963A (en) * | 2012-04-18 | 2013-03-27 | 深圳市金凯新瑞光电有限公司 | Continuous winding sputter coating machine |
| CN203653686U (en) * | 2014-01-20 | 2014-06-18 | 深圳市金凯新瑞光电有限公司 | Film-coating device used for winding-type sputtering three-layer medium film |
-
2015
- 2015-02-09 CN CN201510066782.3A patent/CN104611682B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006249471A (en) * | 2005-03-09 | 2006-09-21 | Fuji Photo Film Co Ltd | Film deposition method |
| US20080029386A1 (en) * | 2006-08-01 | 2008-02-07 | Dorfman Benjamin F | Method and apparatus for trans-zone sputtering |
| CN101191195A (en) * | 2006-11-21 | 2008-06-04 | 甘国工 | Magnetic-control sputtering coiling film coating machine |
| WO2008065909A1 (en) * | 2006-11-28 | 2008-06-05 | Ulvac, Inc. | Winding vacuum film forming process and apparatus |
| CN102994963A (en) * | 2012-04-18 | 2013-03-27 | 深圳市金凯新瑞光电有限公司 | Continuous winding sputter coating machine |
| CN203653686U (en) * | 2014-01-20 | 2014-06-18 | 深圳市金凯新瑞光电有限公司 | Film-coating device used for winding-type sputtering three-layer medium film |
Cited By (14)
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|---|---|---|---|---|
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| CN109536915A (en) * | 2018-09-30 | 2019-03-29 | 四川海格锐特科技有限公司 | Disposable round-trip two-sided evaporating coating equipment reel system structure |
| CN109536896A (en) * | 2018-09-30 | 2019-03-29 | 四川海格锐特科技有限公司 | A kind of coating machine nip rolls layout structure and the coating machine using the structure |
| CN109930110A (en) * | 2019-04-09 | 2019-06-25 | 哈尔滨商业大学 | A kind of high anti-reflection barrier composite membrane and its Preparation equipment and method |
| CN110846892A (en) * | 2019-12-05 | 2020-02-28 | 浙江工业大学 | Winding type fiber film coating device in magnetron sputtering |
| CN111235544B (en) * | 2020-01-17 | 2022-05-10 | 深圳市博能自动化设备有限公司 | Film coating machine |
| CN111235544A (en) * | 2020-01-17 | 2020-06-05 | 深圳市博能自动化设备有限公司 | Film coating machine |
| WO2021249216A1 (en) * | 2020-06-09 | 2021-12-16 | 江苏菲沃泰纳米科技股份有限公司 | Coating support, coating apparatus, and coating method therefor |
| CN113502459A (en) * | 2021-07-08 | 2021-10-15 | 江西柔顺科技有限公司 | Double-sided magnetron sputtering vacuum coating machine and vacuum coating method thereof |
| CN114752913A (en) * | 2022-05-05 | 2022-07-15 | 温岭市倍福机械设备制造有限公司 | Reciprocating type double-sided high vacuum winding coating machine |
| CN114752913B (en) * | 2022-05-05 | 2023-11-28 | 温岭市倍福机械设备制造有限公司 | Reciprocating double-sided high-vacuum winding film plating machine |
| CN117778978A (en) * | 2024-01-06 | 2024-03-29 | 山东高特威尔电子科技有限公司 | Method for manufacturing ceramic substrate based on magnetron sputtering technology |
| CN117778978B (en) * | 2024-01-06 | 2024-10-11 | 山东高特威尔电子科技有限公司 | Method for manufacturing ceramic substrate based on magnetron sputtering technology |
| CN118360578A (en) * | 2024-06-19 | 2024-07-19 | 成都国泰真空设备有限公司 | Magnetron sputtering vacuum coating equipment |
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Effective date of registration: 20190312 Address after: 213000 No. 16 Gangxi Avenue, Changzhou City, Jiangsu Province Patentee after: Changzhou Lemeng Pressure Vessel Co., Ltd. Address before: 213022 Wushan Road, Xinbei District, Changzhou, Jiangsu Province, No. 1 Patentee before: Changzhou Polytechnic College |