CN101768726B - Continuous winding magnetic control sputtering vacuum coating device - Google Patents
Continuous winding magnetic control sputtering vacuum coating device Download PDFInfo
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- CN101768726B CN101768726B CN 200810241896 CN200810241896A CN101768726B CN 101768726 B CN101768726 B CN 101768726B CN 200810241896 CN200810241896 CN 200810241896 CN 200810241896 A CN200810241896 A CN 200810241896A CN 101768726 B CN101768726 B CN 101768726B
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Abstract
The invention belongs to continuous coating device for solar selective absorption coating in plate-type solar apparatus, in particular relates to a continuous winding magnetic control sputtering vacuum coating device. The continuous winding magnetic control sputtering vacuum coating device comprises an unwinding chamber, a winding chamber, tension controlling chambers, a pre-processing chamber and craft chambers; the unwinding chamber and the winding chamber are respectively arranged at the head and tail ends of the device and respectively connected with a tension controlling chamber; the tension controlling chamber at one end of the unwinding chamber is connected with the pre-processing chamber; at least one craft chamber is arranged between the pre-processing chamber and the tension controlling chamber at one end of the winding chamber; one end of unwinding chamber, one end of winding chamber, two ends of tension controlling chambers, two ends of pre-processing chamber, and two ends of craft chambers are provided with flange plates of the same dimension, the unwinding chamber, the winding chamber, the tension controlling chambers, the pre-processing chamber and the craft chambers are connected into an integral by the flange plates. The invention provides a special coating device for long-term continuous solar selective absorption coating, and the device has the advantages of high production efficiency, stable quality and outstanding film performance.
Description
[0002] technical field
The invention belongs to the continuous coating device of the solar selectively absorbing coating in the plate-type solar, belong to solar energy heat utilization field, especially can continue uninterruptedly on metal coil tape, to be coated with the production equipment special of selectivity plated film coating.
[0004] background technology
[0005] solar water heater is exactly the radiant heat energy that absorbs the sun, and heating cold water offers the energy-efficient equipment that people use in life, production.It is a maturation and product of the future the most the most in China's solar thermal utilization.The New-type water heater product of environmental protection, safe, energy-conservation, health is provided for the common people.The solar water heater that I cross a few years ago mainly is to be main with solar vacuum-tube water heater, but uses in the small-sized independent solar water heater that uses solar vacuum-tube aqueous vapor the time.Continuous progress along with the sun power utilization; Some large-scale solar water heaters adopt the flat solar water heater more now; Because what the thermal-arrest plate in this solar water heater adopted all is metal sheet; Aspect sturdy and durable, have significant advantage, can reach basically with fabrication and have identical work-ing life.And the selective coating on thermal-arrest plate wherein surface be coated with quality and performance, be the gordian technique of the whole solar facilities performance of decision.Through inquiry to Chinese patent; A kind of solar selectively absorbing coating continuous coating apparatus is disclosed in the Chinese patent 200420077793.6; Be to be employed in before each chamber in this device; Perhaps between two chambers an independently vacuum excessive device is set during continuous coating, can reaches being coated with continuously of individual components like this.But above-mentioned equipment is in the process of being coated with, and workpiece gets in the vacuum excessive device after the vacuum environment that all can come off after each plated film, and workpiece changes in temperature and vacuum condition in the process owing to being coated with at twice like this, influences the quality of plated film easily.Above-mentioned in addition continuous coating apparatus is the continuous coating apparatus of individual components, also can't realize carrying out the production of long-time continuous plated film for the metal band of rolling.Popularize and expansion along with what China's plate-type solar equipment was used.It is high to be badly in need of a kind of production efficiency in the industry, and the highly stable novel film coating apparatus of quality product.Above-mentioned problem long-term existence does not obtain a very effective technical solution so far in the industry.
[0006] summary of the invention
Main purpose of the present invention provides a kind of special-purpose filming equipment that continues to be coated with solar selective coat for a long time, and this equipment has the production efficiency height, the advantage that steady quality and film performance are excellent.
In order to reach above-mentioned technical purpose; The technical solution that the present invention adopts comprises following technology contents: a kind of continuous winding magnetic control sputtering vacuum coating device; Comprise and unreel chamber, rolling chamber, tension control chamber, pretreatment chamber, chamber composition; Unreel chamber and rolling chamber and lay respectively at the head and end of equipment; Unreeling the chamber is connected with a tension control chamber respectively with the rolling chamber; The tension control chamber that unreels chamber one end is connected with pretreatment chamber; Be provided with at least one chamber between the tension control chamber of pretreatment chamber and rolling chamber one end, the two ends of an above-mentioned end that unreels chamber, rolling chamber and tension control chamber, pretreatment chamber, chamber are provided with the ring flange of same size, and to connect the above-mentioned chamber, rolling chamber, tension control chamber, pretreatment chamber, chamber of unreeling successively through ring flange be one; The described chamber, tension control chamber, pretreatment chamber, chamber, rolling chamber of unreeling is Vakuumkammer, and described unreeling is equipped with the roller that transmission is used in chamber, tension control chamber, pretreatment chamber, chamber, the rolling chamber.
Described unreeling is provided with the cryogenic absorption trap in the chamber, general cryogenic absorption trap is set to-120 ℃ of cryogenic trap, the center be provided with placement by the roller of plated film band, unreel indoor chamber and be connected with vacuum system such as DP equal vacuum pump.
Described rolling chamber is provided with the wind-up roll of placing band equally, and the indoor chamber of rolling is connected with vacuum system such as DP equal vacuum pump.
Inner chamber is connected with vacuum system such as DP equal vacuum pump in described two tension control chambers, and is horizontally disposed with the trilateral tenslator that is made up of three rollers in its inner chamber.
Be provided with ion source in the described pretreatment chamber, connect vacuum system such as molecular pump equal vacuum pump in its cavity.
Be provided with one group of intermediate frequency target in the described chamber, wherein be provided with three rollers, the intermediate frequency target is arranged around the home roll at middle part; So that target material evenly is splashed to ribbon of material surface to be plated when doing magnetron sputtering, the home roll at middle part is a water cooled rolls, is convenient to regulate the needed equilibrium temperature of coating process through water-cooled; Chamber is divided into two cavitys up and down, separates with division board, connects independent vacuum system (like the molecular pump system) respectively; Vacuumize respectively, and control different vacuum tightness, prevent that the reactant gases of chamber is gone here and there mutually up and down; Described one group of intermediate frequency target mainly is to adjust according to product technology, and the thin thickness of the rete that is coated with if desired so only uses an intermediate frequency target just can satisfy the requirement of process for plating; If the thickness of the rete that is coated with is thicker, two three even more intermediate frequency target need be set then.
Described chamber is more than one, can be according to the different processes requirement, and plating trilamellar membrane or four tunics are example with four chamber plating trilamellar membranes, one group of intermediate frequency target in first chamber is the stainless steel target, the splash-proofing sputtering metal transition layer, regulating vacuum tightness is 10
-4Pa, voltage 480V is to improve strip surface bonding force to be plated and corrosion resistance; One group of intermediate frequency target in second chamber is the aluminium target, and logical nitrogen carries out reactive sputtering, and the sputtering chamber internal gas pressure remains on 0.5Pa--1 * 10
-1Pa, voltage 400V; One group of intermediate frequency target in the 3rd chamber is the aluminium target also, and air pressure remains on 0.5 * 10
-1The logical equally nitrogen of Pa, voltage 380V carries out reactive sputtering, through controlling the rete that the 3rd air pressure different with second Room obtains the different metallic volume ratio, thus the film that acquisition has certain spectral response curve, this rete has the selectivity absorptive character to visible light; One group of intermediate frequency target in the 4th chamber is used the aluminium target, and logical oxygen carries out reactive sputtering, second and trilamellar membrane on plating one deck antireflective coating, this rete also has preservative activity simultaneously, improves the weathering resistance of rete.
Be provided with between described terminal tension control chamber and the chamber and detect the correction chamber, wherein be provided with the multiple spot continuous detecting equipment and roller and the power assembly of carrying band of solar absorptance and emittance.
The described chamber, rolling chamber, tension control chamber, pretreatment chamber, a plurality of chambers two ends of unreeling has at least an end to be provided with division board; This division board all or at least contact part uses elastic material to process; The opposed slit of a pair of division board is airtight by resilient material, this slit and band through position corresponding and band by passing through in the slit.
Because the present invention has adopted above-mentioned technical solution; Have following positive technique effect and advantage: at first the present invention is through having adopted the equipment that in the coating process process, relates to; All adopting standardized ring flange to connect, make above-mentioned production unit possess performance capable of being combined, can be that above-mentioned equipment can be changed easily like this; To satisfy various coating process process, the adaptive faculty of the increase equipment that this structure can be detailed; The present invention is used the strong roller of DP and weight capacity through the structure of cryogenic absorption trap is set in unreeling the chamber in addition, makes above-mentioned rolling copper strips or aluminium strip obtain quality in advance, for subsequent technique provides good processing condition; The present invention is through being provided with the tension control chamber at a plurality of Vakuumkammers two ends, makes the tension force of the metal band in the chamber obtain good control, makes band get into above-mentioned chamber with optimal state; Through the structure of division board is set, be the gordian technique characteristics among the present invention among the present invention in a plurality of chambers, chamber be separated into two parts up and down through being provided with of division board; And band is got in each chamber by issuing of chamber; This is to bleed at the molecular pump that uses respectively up and down of each chamber, can effectively prevent the gas gas blowby of chamber, guarantees the processing condition that form in the chamber; Adopt the chamber of this structure; Can make up and down that two chambers have different air pressure, and air pressure has only several handkerchiefs at zero point above the chamber, below air pressure have 10
-2Therefore handkerchief has the matter of two one magnitude poor, and can guarantee up and down not can gas blowby, and band passes in and out chamber from the bottom, because of the working gas on top under the effect of pressure reduction, can not scurry followingly, so also just having guaranteed between the different processes chamber, the left and right sides not can gas blowby; Among the present invention in chamber employed roller be water cooled rolls; The employing water cooled rolls can be through the temperature of control roller; Reach the effect of control strip temperature, can make it control to best equilibrium operating temperature through water cooled rolls the heat that the ion bombardment strip surface is produced like this; Be provided with at above-mentioned a plurality of chamber ends at last and detect the correction chamber; After above-mentioned band is accomplished plated film; Carry out solar absorptance and emittance immediately and detect, when detected result produces deviation, can be according to above-mentioned detected result; In time the working conditions in the adjusting process chamber or the transfer rate of band are effectively guaranteed the coating quality of band.
In a word; The present invention is through adopting above-mentioned a series of rational design; A kind of novel plating equipment that can uninterruptedly be coated with solar selective coat continuously to coil strip is provided; This equipment can combine dynamic processing condition control according to real-time quality examination to plated film, has not only significantly improved production efficiency, also makes the quality of above-mentioned plated film coating obtain very effective assurance simultaneously.
[description of drawings]
Figure 1A and Figure 1B are the structural representation of continuous coating apparatus of the present invention.
[embodiment]
Next step combines accompanying drawing that the present invention is further explained:
The present invention be directed to the specific equipment of the coating for selective absorption that is coated with on the thermal-arrest plate surface of using in the plate-type solar thermal collector; The main advantage of this equipment is a kind of continuous winding magnetic control sputtering vacuum coating device; Carrying out continuing for a long time plated film work to large-scale web-like band; Can significantly improve the production efficiency of plated film, reduce production costs and improve the excellent of coating quality.Shown in Figure 1A and Figure 1B; Comprise and unreel chamber 1, rolling chamber 2, tension control chamber 3, pretreatment chamber 4, chamber 5 composition production lines; Unreel chamber 1 and rolling chamber 2 and lay respectively at the head and end of equipment; Main function is to be used for placing and collecting sheet metal strip, and band commonly used is the copper strips or the aluminium strip of thickness at a few tenths of a mm.Unreel chamber 1 and be connected with a tension control chamber 3 respectively with rolling chamber 2, the tension control chamber 3 that unreels chamber 1 one ends is connected with pretreatment chamber 4, and pretreatment chamber 4 is an impurity of before plated film, removing strip surface, improves the sticking power of coating.Be provided with at least one chamber 5 between the tension control chamber 3 of pretreatment chamber 4 and rolling chamber 2 one ends; The quantity that these chambers 5 are provided with is relevant with formation with the material of the technology of plated film and the alternative coating that is coated with, promptly according to the number of plies of coating and the chamber 5 of process using different quantities.Mentality of designing of the present invention is to adopt modular design, so above-mentioned equipment all has unified standard flange 6 coupling ends, and so in process of production can be according to using the product coating process to carry out the equipment adjustment easily.So in an end that unreels chamber 1, rolling chamber 2 and tension control chamber 3, the two ends of pretreatment chamber 4, chamber 5 are provided with the ring flange 6 of same size; And connect the above-mentioned chamber 1, rolling chamber 2, tension control chamber 3, pretreatment chamber 4, chamber 5 that unreel successively through ring flange 6 and be one; The described chamber 1, tension control chamber 3, pretreatment chamber 4, chamber 5, rolling chamber 2 of unreeling is Vakuumkammer, and described unreeling is equipped with the roller 9 that transmission is used in chamber 1, tension control chamber 3, pretreatment chamber 4, chamber 5, the rolling chamber 2.Make up the chamber of working alone through above-mentioned a plurality of difference in functionalitys, and promptly constitutes continuous winding magnetic control sputtering vacuum coating device of the present invention.
Carry out detailed explanation to each working spaces below:
It is described that what unreel that 1 middle part, chamber installs is the roller 11 of placing band 8; It also is equipped with the cryogenic absorption trap in unreeling chamber 1; So that form the vacuum environment of the temperature of-120 degree, under such Working environment, help to adsorb the gas on the band; Thereby reduce the gas in the chamber after getting into, make to have better film coating environment in the chamber 5.In an above-mentioned side that unreels chamber 1, be provided with the lobe pump that connects through bivalve, also can use other vacuum pumps such as DP, be used to form the vacuum environment that unreels in the chamber 1.Also be connected with the drive-motor that driving roll rotates on the above-mentioned in addition roller 11, in unreeling the chamber, drive-motor can be set, and realize the process of unreeling through the pulling of the drive-motor in rolling chamber band.The exit of one of which end is provided with division board 10; This division board 10 all or at least contact part uses elastic material to process; A pair of division board 10 opposed slits are airtight by resilient material, this slit and band 8 through position corresponding and band 8 by passing through in the slit.For the throughput direction that makes band 8 in above-mentioned slit direction level, a side of the roller of placing at band 8 is provided with the roller 11 that is used to adjust band 8 directions.
Described rolling chamber 2 structures are basic identical in unreeling chamber 1 structure; Just wherein the cryogenic absorption trap need be set; Because passed through after the coating process, the band after the film forming there is no need to carry out adsorption treatment, in the rolling chamber, is provided with drive-motor and VSG in addition; This drive-motor is used for driving the roller rotation of rolling chamber 2 and driving ribbon motion; It should be noted that this motor should adjust rotating speed, because band 8 process of plating need above-mentioned band 8 have the constant LV.
Inner chamber is connected with DP in described two tension control chambers 3, and this DP is arranged on a side of tension control chamber 3, is used for making tension control chamber 3 to form vacuum environment.Its two ends are provided with and unreel the ring flange 6 of unified specifications such as chamber 2, are provided with division board 10 at least one ring flange 6.Be horizontally disposed with the triangle tenslator that constitutes by three rollers 9 in its inner chamber of tension control chamber 3.
Be provided with ion source and power supply in the described pretreatment chamber 4, Vakuumkammer and vacuumize after, in pretreatment chamber 4, feed Ar gas; Open cathodic power source, add cathode voltage 350V-500V ionization Ar gas, utilize Ar under electric field action, to obtain kinetic energy accelerating impact target surface; The target surface atom sputtering is come out and be deposited on substrate surface and realize thin film deposition; Magnetic field, target back side fixed electron increases the electronic impact probability simultaneously, improves high rate.Be provided with molecular pump in its cavity, same so that form vacuum environment at the two ends of pretreatment chamber 4, be provided with the ring flange 6 of unified specification.Ion source in the pretreatment chamber 4 and power supply operated by rotary motion are in the upper center of pretreatment chamber 4, and the center is the thicker home roll of diameter 11, and the both sides of home roll 11 are provided with the roller 9 that is used to adjust strip direction.
Be provided with one group of intermediate frequency target 12 in the described chamber 5, chamber 5 wherein is provided with three rollers, and what be arranged on the middle part is as the home roll that is coated with process groundwork face 11, and its both sides are rollers 9 of adjustment strip direction.The diameter of home roll 11 is thicker, makes its surface ratio broader, so that intermediate frequency target 12 carries out being coated with of rete.Intermediate frequency target 12 is positioned at the top of the home roll 11 at middle part; What adopt in the present invention is that correspondence is provided with one group of intermediate frequency target 12, being set to more than of intermediate frequency target 12, and the quantity that is provided with is relevant with the requirement of technology; The rete that is coated with if desired is very thick, then need use more intermediate frequency target 12.Be provided with molecular pump in its cavity.Need to prove that the roller in chamber 5 is a water cooled rolls 9.Because in coating process; Can produce heat in the time of the ion bombardment metallic surface; Carry out the temperature that water-cooled can balancing control band 8 so in roller 9, feed cold water; Because the mode of the non-stop run that the continuous winding magnetic control sputtering vacuum coating device among the present invention adopts, a plated film is at least more than 20 hours in addition, and adopting water cooled rolls 9 is necessary temperature control devices.With the two ends of the same chamber 5 in previous working spaces the standard flange 6 of unified specification is set also, its inboard is provided with division board 10, and the effect of this division board 10 mainly is the air of isolating between each chamber, places gas blowby between the chamber.
Be provided with chamber division board 10 in addition at described chamber 5 middle parts chamber 5 is separated into two air chambers up and down; This division board 10 is a writing board shape; And being two is oppositely arranged chamber 5 is separated into two individual cavity; This division board 10 all or at least contact part uses elastic material to process; A pair of division board 10 opposed slits are airtight by resilient material, and by passing through in the slit, the above-mentioned inlet that is coated with band 8 is below chamber 5 through position corresponding and band for this slit and band 8.Wherein up and down be respectively arranged with molecular pump in two cavitys, make the environment of the different vacuum tightness of formation in above-mentioned two cavitys.Requirement in the chamber 5 is up and down can not gas blowby, can not gas blowby about between each chamber 5.Through using molecular pump to form different vacuum environment in two gases at chamber about in the of 5, generally top is several handkerchiefs at zero point, is 10 below
-2-10
-3Handkerchief has the matter of two one magnitude poor, and having guaranteed in two cavitys not can gas blowby, and shown in Figure 1A and Figure 1B, band 8 passes in and out from the bottom simultaneously, because of the working gas on top under the effect of pressure reduction, can not scurry following, can gas blowby about so just having guaranteed yet.
The structure of a key among the present invention is exactly the setting of division board 10; Through in the chamber cavity, establishing division board 10; Division board 10 is set between the different working chamber; Can guarantee that formation is a plurality of relatively independent in whole production line, and the different individual cavity of vacuum tightness, satisfy the processing condition that are coated with demands of different in the process.
Be provided with between described terminal tension control chamber 3 and the chamber 5 and detect correction chamber 13; Wherein be provided with solar absorptance and emittance test set; Detect in the correction chamber and be provided with four rollers 9, so that make the band on its top be in horizontality, the equipment of being convenient to detects; The effect of above-mentioned detection correction chamber 13 mainly is the online detection of the band that is coated with completion being carried out solar absorptance and emittance; After above-mentioned technical indicator emission departs from, the technical parameter in the timely adjusting process chamber 5, the coating quality of assurance band 8.
It is example that employing in the present invention has four chambers.Whole continuous winding magnetic control sputtering vacuum coating device is described; All independently are provided with according to production technique each working spaces; In the present example; First is tension control chamber 3, pretreatment chamber 4, four chambers 5 for unreeling chamber 1, one side, detect correction chamber 13, tension control chamber 3, be rolling chamber 2 at last.Connect through ring flange 6 between these working spacess, between the ring flange 6 sealing-ring is set and guarantees sealing property.Two intermediate frequency targets 12 in first are respectively stainless steel intermediate frequency target and Mo intermediate frequency target, mainly are responsible for being coated with metal substrate in this chamber 5, and regulating vacuum tightness is 10
-4Pa, voltage 480V is to improve strip surface bonding force to be plated and corrosion resistance; Two intermediate frequency targets 12 in second all are set to aluminium intermediate frequency target, mainly are to do reactive sputtering with aluminium, do the logical nitrogen of aluminium sesquioxide and carry out reactive sputtering, and the sputtering chamber internal gas pressure remains on 0.5Pa--1 * 10
-1Pa, voltage 400V; Two aluminium intermediate frequency targets 12 are set in the 3rd equally, do reactive sputtering, Al, O
2,Air pressure remains on 0.5 * 10
-1The logical equally nitrogen of Pa, voltage 380V carries out reactive sputtering, through controlling the rete that the 3rd air pressure different with second Room obtains the different metallic volume ratio, thus the film that acquisition has certain spectral response curve, this rete has the selectivity absorptive character to visible light; It in the 4th aluminium intermediate frequency target.Be used to be coated with Al
3O
2The protection ceramic layer, logical oxygen carries out reactive sputtering, second with trilamellar membrane on plating one deck antireflective coating, this rete also has preservative activity simultaneously, raising rete weathering resistance.Above-mentioned equipment is fit to be coated with two kinds of film systems, first kind as top introduction, and second kind of film system interferes with absorptive-type absorbing film, is exactly the interference absorbing film with low metal volume fraction, promptly at Al
3O
2In the rete, the embedded with metal particle.
Foregoing description can only be counted as preferred embodiment.Those those of skill in the art in the art and those manufacturings or use people of the present invention through the suggestion content in this patent can not need creative work, can learn other multiple variation of the present invention.Therefore, it being understood that the above-mentioned illustrated embodiment usefulness that only presents a demonstration, it can't constitute restriction to scope of the present invention, scope of the present invention according to the principle of patent law, comprise that the claim that the principle of equivalent is explained limits.
Claims (9)
1. continuous winding magnetic control sputtering vacuum coating device; Comprise and unreel chamber, rolling chamber, tension control chamber, pretreatment chamber, chamber; It is characterized in that: unreel the head and end that chamber and rolling chamber lay respectively at equipment, unreel the chamber and be connected with a tension control chamber respectively with the rolling chamber, the tension control chamber that unreels chamber one end is connected with pretreatment chamber; Be provided with at least one chamber between the tension control chamber of pretreatment chamber and rolling chamber one end; The two ends of an above-mentioned end that unreels chamber, rolling chamber and tension control chamber, pretreatment chamber, chamber are provided with the ring flange of same size, and to connect the above-mentioned chamber, rolling chamber, tension control chamber, pretreatment chamber, chamber of unreeling successively through ring flange be one, and the described chamber, tension control chamber, pretreatment chamber, chamber, rolling chamber of unreeling is Vakuumkammer; Described unreeling is equipped with the roller that transmission is used in chamber, tension control chamber, pretreatment chamber, chamber, the rolling chamber; Described chamber middle part is provided with the chamber division board chamber is separated into two chambers up and down, and this division board is a writing board shape, and described division board is set to three; Being positioned at division board at band middle part and two division boards of band both sides cooperatively interacts; Form two by the closed slits of resilient material, this division board all or at least contact part uses the elastic material of softish to process, and the opposed slit of a pair of division board is sealed by soft resilient material; This slit and band through position corresponding and band by passing through in the slit; The above-mentioned inlet that is coated with band is below chamber, and there is flexible materials at band contact dividing plate place, prevents that rete from scratching; The described chamber, rolling chamber, tension control chamber, pretreatment chamber, a plurality of chambers two ends of unreeling has at least an end to be provided with division board; This division board all or at least contact part uses flexible elastic material to process, and the opposed slit of a pair of division board is airtight by resilient material, this slit and band through position corresponding and band by passing through in the slit.
2. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1; It is characterized in that: described unreeling is provided with the cryogenic absorption trap in the chamber, the center be provided with placement by the roller of plated film band, to unreel indoor chamber be that vacuum pump is connected with vacuum system.
3. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1 is characterized in that: described rolling chamber is provided with the wind-up roll of placing band, and the indoor chamber of rolling is that vacuum pump is connected with vacuum system.
4. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1; It is characterized in that: inner chamber connection vacuum system is that vacuum pump connects in described two tension control chambers, and is horizontally disposed with the trilateral tenslator that is made up of three rollers in its inner chamber.
5. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1 is characterized in that: be provided with ion source in the described pretreatment chamber, connecting vacuum system in its cavity is that vacuum pump connects.
6. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1; It is characterized in that: be provided with one group of intermediate frequency target in the described chamber; Wherein be provided with three rollers; The intermediate frequency target is positioned at the top of the home roll at middle part, and connecting vacuum system in its cavity is that vacuum pump connects, and the roller that is arranged on wherein is a water cooled rolls.
7. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1; It is characterized in that: described chamber is more than one; Can be according to the difference of institute's coatings, the number of adjusting process chamber satisfies the process requirements that is coated with different retes arbitrarily.
8. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 7 is characterized in that: described chamber preferably adopts four chambers, and wherein the intermediate frequency target in first chamber is respectively stainless steel target or molybdenum target; Intermediate frequency target in second chamber all is set to the aluminium target; In the 3rd chamber aluminium target is set equally; Be similarly the aluminium target in the 4th chamber.
9. a kind of continuous winding magnetic control sputtering vacuum coating device according to claim 1; It is characterized in that: be provided with between described terminal tension control chamber and the chamber and detect the correction chamber, wherein be provided with solar absorptance and emittance multiple spot continuous detecting equipment and proofread and correct the device that band wanders off and the roller of conveying band.
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| CN101086059A (en) * | 2006-06-05 | 2007-12-12 | 黄鸣 | Solar energy heat-collecting pipe vacuum magnetic-control sputtering continuous plating line system |
| CN101100742A (en) * | 2007-08-10 | 2008-01-09 | 中国印钞造币总公司 | Method for depositing magnetic film on flexible substrate |
| CN201326012Y (en) * | 2008-12-30 | 2009-10-14 | 丘仁政 | A continuous winding-type magnetron sputtering vacuum plating equipment |
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