CN203653686U - Film-coating device used for winding-type sputtering three-layer medium film - Google Patents
Film-coating device used for winding-type sputtering three-layer medium film Download PDFInfo
- Publication number
- CN203653686U CN203653686U CN201420031586.3U CN201420031586U CN203653686U CN 203653686 U CN203653686 U CN 203653686U CN 201420031586 U CN201420031586 U CN 201420031586U CN 203653686 U CN203653686 U CN 203653686U
- Authority
- CN
- China
- Prior art keywords
- negative electrode
- film
- vacuum chamber
- cathode
- cold roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model relates to a film-coating device used for a winding-type sputtering three-layer medium film. The film-coating device comprises a cold roller, a primary motor for driving the cold roller, a vacuum cavity covering the cold roller, an unwinding mechanism, a winding mechanism and five cathode small chambers, wherein three of the five cathode small chambers are same in structure and are dual-target cathode small chambers; cathode targets in the dual-target cathode small chambers are two cathode sputtering targets; the two cathode small chambers at the two sides among the five cathode small chambers are single-target cathode small chambers; cathode targets of the single-target cathode small chambers are cathode sputtering targets. After the structure is adopted, the film-coating device disclosed by the utility model adopts the same atmosphere for sputtering a middle medium film in the three-layer medium film by utilizing the middle three dual-target cathode small chambers, so that film-forming time of the middle medium film is prolonged, and the sputtering target distance of the dual-target cathodes is more precise.
Description
Technical field
This novel vacuum coating film equipment that relates to, refers in particular to a kind of film coating apparatus that is applied in spirally wound sputter three layer dielectrics.
Background technology
In anticathode spattering filming device, winding-type vacuum coater can be produced continuously with it and significantly improve the efficiency of film forming, but, in existing winding-type vacuum coater, be used for the installation limited amount of spatter film forming negative electrode cell for each, the sputtering time of each negative electrode cell and sputtering atmosphere are difficult to accurate control, the poor stability of film forming, mostly can only produce one deck or two layer medium film, and sputter three layer dielectrics continuously, because the spatter film forming time of the deielectric-coating in the middle of three layer dielectrics is longer, film forming atmosphere is all different from the atmosphere of upper and lower two layer medium film, existing winding-type vacuum coater synchronously rotates, the spatter film forming time of single negative electrode cell is obviously inadequate, the atmosphere of each negative electrode cell is also easily interfered mutually,
In addition, existing winding-type vacuum coater often needs with cleaning device, heating unit, unreel with rolling-up mechanism and support the use formation production line, can cause like this equipment many, take the large problem in the place of production;
In view of this, how to design a kind of only with single vacuum coating film equipment and film coating method just continuously sputter three layer dielectrics become and have technical problem to be solved.
Summary of the invention
This novel object is exactly a kind of film coating apparatus that is applied in spirally wound sputter three layer dielectrics providing for the deficiencies in the prior art part.
For achieving the above object, this novel technical scheme is:
A kind of film coating apparatus for spirally wound sputter three layer dielectrics, include: cold roller, drive the main motor of cold roller, envelope the vacuum chamber of cold roller, unreeling structure, rolling-up mechanism and five negative electrode cells, wherein, unreeling structure, rolling-up mechanism and five negative electrode cells are all built in vacuum chamber, the circumferential surface that unreeling structure is walked around cold roller by material film is transferred to rolling-up mechanism and realizes three's synchronous interaction, the part that described vacuum chamber envelopes cold roller is circular cylindrical cavity, five negative electrode cells are spaced on the inwall of described circular cylindrical cavity and to the overhanging chamber convex closure that convexes into, described negative electrode cell includes negative electrode target body, water-cooled tube, air supply mechanism, vacuum device, gas isolating plate, the material film that negative electrode target body correspondence on cold roller is arranged in negative electrode cell, water-cooled tube is distributed in the sidewall of negative electrode cell, air supply mechanism is communicated in corresponding negative electrode cell by outside tonifying Qi unit, vacuum device is communicated in negative electrode cell by outside evacuator, gas isolating plate is disposed between two adjacent negative electrode cells, the identical pair target cathode cells that are of three of centres negative electrode cell structure in described five negative electrode cells, negative electrode target body in two target cathode cells is two cathode sputtering targets, two negative electrode cell structure of the both sides in five negative electrode cells are identical is single target cathode cell, and the negative electrode target body of single target cathode cell is a cathode sputtering target.
In described vacuum chamber, be also provided with ion source pre-treatment mechanism, ion source pre-treatment mechanism is two, be separately positioned between unreeling structure and cold roller and between cold roller and rolling-up mechanism, ion source pre-treatment mechanism includes the vacuum chamber for cleaning, this vacuum chamber is matrix cavity volume, the material film corresponding to opening on vacuum chamber top; The bottom of vacuum chamber is provided with the vacuum mechanism for vacuumizing, in vacuum chamber, be fixed with insulated support, on insulated support, be provided with the qi-emitting hole that is used to provide clean air, on insulated support, be also interval with respectively two electrodes, two electrodes are electrically connected with outside high pressure intermediate frequency power supply by supply lead separately respectively.
In described vacuum chamber, be also provided with the heating unit for material film is heated, heating unit is two, is respectively the front heating unit of exit end that is arranged on unreeling structure and the post heating device that is arranged on the entrance end of rolling-up mechanism.
The invention still further relates to a kind of film coating method for spirally wound sputter three layer dielectrics, include following steps,
Step 1, vacuumizes vacuum chamber, and unreeling structure, cold roller, rolling-up mechanism three be synchronous to rotate and make material film be transferred to rolling-up mechanism from the reeled circumferential surface of cold roller of unreeling structure;
Step 2, material film, in transmitting procedure, first preheats material film by front heating unit, through ion source pre-treatment mechanism, material film is being carried out to pre-treatment, to remove substrate surface foreign matter, improve quality of forming film, increase settled layer at suprabasil sticking power;
Step 3, when previous single target cathode cell on material film sputter the first layer deielectric-coating, in previous single target cathode cell by vacuumizing, form after tonifying Qi and be used for the first atmosphere of sputter the first layer deielectric-coating;
Step 4, during through three two target cathode cells on material film sputter second layer deielectric-coating continuously, in each pair of target cathode cell all by vacuumizing, form after tonifying Qi and be used for the second atmosphere of sputter second layer deielectric-coating;
Step 5, in the time of a single target cathode cell later on material film sputter the 3rd layer dielectric, in a rear single target cathode cell by vacuumizing, form after tonifying Qi and be used for the 3rd atmosphere of sputter the 3rd layer dielectric;
Step 6, the material film after an ion source pre-treatment mechanism is later to plated film carries out pre-treatment, through post heating device the material film after to plated film heat after by rolling-up mechanism rolling.
Adopt after above-mentioned film coating apparatus, this novel having the following advantages: the mode that these novel five negative electrode cells of employing are arranged, three two target cathode cells in the middle of utilizing adopt identical atmosphere to carry out sputter to the intermediate dielectric film of three layer dielectrics, extend the film formation time of intermediate dielectric film, the sputtering target of two target cathodes is apart from more accurate, like this, guarantee that the sputtering target of three two target cathode cells is apart from consistent, vacuumizing and making-up air device of each negative electrode cell, the atmosphere that can guarantee three two target cathode cells is consistent, and division board can be isolated the atmosphere of each negative electrode cell mutually, three two target cathode cell plating sputter same layer deielectric-coating of guarantee like this, in addition, basis is novel is all integrated into same equipment with filming equipment by washing unit, rolling-up mechanism, unreeling structure and heating unit, has substituted traditional production line, has saved and has taken up room.As from the foregoing, this is novel has feature of sputter three layer dielectrics continuously, simultaneously filming equipment compact construction of the present invention, take up room little.
Brief description of the drawings
Fig. 1 is this novel texture principle schematic.
Fig. 2 is this Novel ion source pre-treatment mechanism schematic diagram.
Embodiment
As shown in Figure 1-2, a kind of film coating apparatus for spirally wound sputter three layer dielectrics, include: cold roller 10, drive the main motor 20 of cold roller 10, envelope the vacuum chamber 30 of cold roller 10, unreeling structure 40, rolling-up mechanism 50 and five negative electrode cells 60, wherein, unreeling structure 40, rolling-up mechanism 50 and five negative electrode cells 60 are all built in vacuum chamber 30, the circumferential surface that unreeling structure 40 is walked around cold roller 10 by material film 70 is transferred to rolling-up mechanism 40 and realizes three's synchronous interaction, the part that described vacuum chamber 30 envelopes cold roller 10 is circular cylindrical cavity 31, five negative electrode cells 60 are spaced on the inwall of described circular cylindrical cavity 31 and to the overhanging chamber convex closure 32 that convexes into, described negative electrode cell 60 includes negative electrode target body, water-cooled tube 62, air supply mechanism 63, vacuum device 64, gas isolating plate 65, the material film 70 that negative electrode target body correspondence on cold roller 10 is arranged in negative electrode cell 60, water-cooled tube 62 is distributed in the sidewall of negative electrode cell 60, air supply mechanism 63 is communicated in corresponding negative electrode cell 60 by outside tonifying Qi unit, vacuum device 64 is communicated in negative electrode cell 60 by outside evacuator, gas isolating plate 65 is disposed between two adjacent negative electrode cells 60, the identical pair target cathode cells that are of three of centres negative electrode cell structure in described five negative electrode cells 60, negative electrode target body in two target cathode cells is two cathode sputtering targets 611, two negative electrode cell structure of the both sides in five negative electrode cells are identical is single target cathode cell, and the negative electrode target body of single target cathode cell is a cathode sputtering target 612.
In described vacuum chamber 30, be also provided with ion source pre-treatment mechanism 80, ion source pre-treatment mechanism 80 is two, be separately positioned between unreeling structure 40 and cold roller 10 and between cold roller 10 and rolling-up mechanism 50, ion source pre-treatment mechanism 80 includes the vacuum chamber 81 for cleaning, this vacuum chamber 81 is matrix cavity volume, the material film 70 corresponding to opening on vacuum chamber 81 tops; The bottom of vacuum chamber 81 is provided with the vacuum mechanism 82 for vacuumizing, in vacuum chamber 81, be fixed with insulated support 83, on insulated support 83, be provided with the qi-emitting hole 84 that is used to provide clean air, on insulated support 83, being also interval with respectively 84, two electrodes 84 of two electrodes is electrically connected with outside high pressure intermediate frequency power supply by supply lead 85 separately respectively.
In described vacuum chamber 30, be also provided with the heating unit for material film 70 is heated, heating unit is two, is respectively the front heating unit 91 of exit end that is arranged on unreeling structure 40 and the post heating device 92 that is arranged on the entrance end of rolling-up mechanism 50.
A kind of film coating method for spirally wound sputter three layer dielectrics that this is novel, includes following steps,
Step 1, vacuumizes vacuum chamber 31, and unreeling structure 40, cold roller 10, rolling-up mechanism 50 threes be synchronous to rotate and make material film 70 be transferred to rolling-up mechanism 50 from the reeled circumferential surface of cold roller 10 of unreeling structure 40;
Step 2, material film 70, in transmitting procedure, first preheats material film 70 by front heating unit 91, through ion source pre-treatment mechanism 80, material film 70 is being carried out to pre-treatment, to remove substrate surface foreign matter, improve quality of forming film, increase settled layer at suprabasil sticking power;
Step 3, when previous single target cathode cell a on material film 70 sputter the first layer deielectric-coating, in previous single target cathode cell a by vacuumizing, form after tonifying Qi and be used for the first atmosphere of sputter the first layer deielectric-coating;
Step 4, during through three two target cathode cell b, c, d on material film 70 sputter second layer deielectric-coating continuously, in each pair of target cathode cell all by vacuumizing, form after tonifying Qi and be used for the second atmosphere of sputter second layer deielectric-coating;
Step 5, in the time of a single target cathode cell e later on material film sputter the 3rd layer dielectric, in a rear single target cathode cell by vacuumizing, form after tonifying Qi and be used for the 3rd atmosphere of sputter the 3rd layer dielectric;
Step 6, carries out pre-treatment through an ion source pre-treatment mechanism 80 later to the material film 70 after plated film, after the material film 70 after plated film being heated through post heating device 92 by rolling-up mechanism 50 rollings.
As from the foregoing, this is novel has feature of sputter three layer dielectrics continuously, simultaneously this novel filming equipment compact construction, take up room little.
Above operational version is only this novel embodiment, not as this novel protection domain of restriction.For the described conversion various simple in structure of this novel claim all within this novel protected scope.
Claims (3)
1. the film coating apparatus for spirally wound sputter three layer dielectrics, it is characterized in that: include: cold roller, drive the main motor of cold roller, envelope the vacuum chamber of cold roller, unreeling structure, rolling-up mechanism and five negative electrode cells, wherein, unreeling structure, rolling-up mechanism and five negative electrode cells are all built in vacuum chamber, the circumferential surface that unreeling structure is walked around cold roller by material film is transferred to rolling-up mechanism and realizes three's synchronous interaction, the part that described vacuum chamber envelopes cold roller is circular cylindrical cavity, five negative electrode cells are spaced on the inwall of described circular cylindrical cavity and to the overhanging chamber convex closure that convexes into, described negative electrode cell includes negative electrode target body, water-cooled tube, air supply mechanism, vacuum device, gas isolating plate, the material film that negative electrode target body correspondence on cold roller is arranged in negative electrode cell, water-cooled tube is distributed in the sidewall of negative electrode cell, air supply mechanism is communicated in corresponding negative electrode cell by outside tonifying Qi unit, vacuum device is communicated in negative electrode cell by outside evacuator, gas isolating plate is disposed between two adjacent negative electrode cells, the identical pair target cathode cells that are of three of centres negative electrode cell structure in described five negative electrode cells, negative electrode target body in two target cathode cells is two cathode sputtering targets, two negative electrode cell structure of the both sides in five negative electrode cells are identical is single target cathode cell, and the negative electrode target body of single target cathode cell is a cathode sputtering target.
2. a kind of film coating apparatus for spirally wound sputter three layer dielectrics according to claim 1, it is characterized in that: in described vacuum chamber, be also provided with ion source pre-treatment mechanism, ion source pre-treatment mechanism is two, be separately positioned between unreeling structure and cold roller and between cold roller and rolling-up mechanism, ion source pre-treatment mechanism includes the vacuum chamber for cleaning, this vacuum chamber is matrix cavity volume, the material film corresponding to opening on vacuum chamber top; The bottom of vacuum chamber is provided with the vacuum mechanism for vacuumizing, in vacuum chamber, be fixed with insulated support, on insulated support, be provided with the qi-emitting hole that is used to provide clean air, on insulated support, be also interval with respectively two electrodes, two electrodes are electrically connected with outside high pressure intermediate frequency power supply by supply lead separately respectively.
3. a kind of film coating apparatus for spirally wound sputter three layer dielectrics according to claim 2, it is characterized in that: in described vacuum chamber, be also provided with the heating unit for material film is heated, heating unit is two, is respectively the front heating unit of exit end that is arranged on unreeling structure and the post heating device that is arranged on the entrance end of rolling-up mechanism.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420031586.3U CN203653686U (en) | 2014-01-20 | 2014-01-20 | Film-coating device used for winding-type sputtering three-layer medium film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420031586.3U CN203653686U (en) | 2014-01-20 | 2014-01-20 | Film-coating device used for winding-type sputtering three-layer medium film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203653686U true CN203653686U (en) | 2014-06-18 |
Family
ID=50920098
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420031586.3U Expired - Fee Related CN203653686U (en) | 2014-01-20 | 2014-01-20 | Film-coating device used for winding-type sputtering three-layer medium film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203653686U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103805955A (en) * | 2014-01-20 | 2014-05-21 | 深圳市金凯新瑞光电有限公司 | Coating device and coating method for winding type sputtering three-layer dielectric film |
| CN104611682A (en) * | 2015-02-09 | 2015-05-13 | 常州工学院 | Magnetron sputtering winding plating equipment capable of double-sided reciprocating continuous high-efficient plating |
| CN104674182A (en) * | 2015-02-09 | 2015-06-03 | 常州工学院 | Magnetron sputtering winding coating machine capable of continuously coating in single-sided reciprocated way |
| CN104775102A (en) * | 2015-05-04 | 2015-07-15 | 上海产业技术研究院 | Vacuum coating system combining reel-to-reel magnetron sputtering cathode and columnar multi-arc source |
| CN114086147A (en) * | 2021-11-19 | 2022-02-25 | 合肥中隐新材料有限公司 | Winding type vacuum coating equipment for preparing photonic crystal film |
-
2014
- 2014-01-20 CN CN201420031586.3U patent/CN203653686U/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103805955A (en) * | 2014-01-20 | 2014-05-21 | 深圳市金凯新瑞光电有限公司 | Coating device and coating method for winding type sputtering three-layer dielectric film |
| CN103805955B (en) * | 2014-01-20 | 2016-03-02 | 深圳市金凯新瑞光电股份有限公司 | A kind of film coating method sputtering three layer dielectrics for spirally wound |
| CN104611682A (en) * | 2015-02-09 | 2015-05-13 | 常州工学院 | Magnetron sputtering winding plating equipment capable of double-sided reciprocating continuous high-efficient plating |
| CN104674182A (en) * | 2015-02-09 | 2015-06-03 | 常州工学院 | Magnetron sputtering winding coating machine capable of continuously coating in single-sided reciprocated way |
| CN104674182B (en) * | 2015-02-09 | 2017-03-08 | 常州工学院 | A kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side |
| CN104775102A (en) * | 2015-05-04 | 2015-07-15 | 上海产业技术研究院 | Vacuum coating system combining reel-to-reel magnetron sputtering cathode and columnar multi-arc source |
| CN114086147A (en) * | 2021-11-19 | 2022-02-25 | 合肥中隐新材料有限公司 | Winding type vacuum coating equipment for preparing photonic crystal film |
| CN114086147B (en) * | 2021-11-19 | 2024-01-26 | 合肥中隐新材料有限公司 | Winding type vacuum coating equipment for preparing photonic crystal film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203653686U (en) | Film-coating device used for winding-type sputtering three-layer medium film | |
| CN103805955B (en) | A kind of film coating method sputtering three layer dielectrics for spirally wound | |
| CN106299237B (en) | Self-supporting pole piece and preparation method thereof, battery and its battery core | |
| CN104362385B (en) | Method for preparing winding cell of lithium ion battery | |
| CN105349961A (en) | Multi-roller and multi-chamber coiling film coating device | |
| CN204385288U (en) | Flexible parent metal magnetic-control sputtering coiling film coating machine | |
| CN104775102B (en) | The vacuum coating system that volume to volume magnetic control sputtering cathode is combined with column multi-arc source | |
| CN100485838C (en) | High speed winding multi-layer capacity film coater | |
| CN205803586U (en) | A kind of multifunctional single Double-face continuous winding magnetic-controlled sputtering coating equipment | |
| CN202610311U (en) | Vacuum coater used for capacitor diaphragm | |
| CN203411601U (en) | Partitioned multi-target magnetron sputtering equipment | |
| CN102230152A (en) | Horizontal film plating machine of flat plate heat collecting strip | |
| CN202157113U (en) | Magnetic-control sputtering coating device | |
| CN202926118U (en) | Energy-saving multi-layer vacuum sheet glass capable of changing colors under action of energization | |
| CN206134844U (en) | Self -supporting pole piece, battery and electricity core thereof | |
| CN205488335U (en) | A spray type coating system for lithium cell | |
| CN205646031U (en) | Monomer electrode subassembly arranges bonding device | |
| CN201890924U (en) | Plasma vacuum ceramic coating device | |
| CN105296953A (en) | Film coating device for solar heat absorption films | |
| CN114561627A (en) | Roll-to-roll vacuum coating production line | |
| CN205295449U (en) | Vacuum coating equipment of thermal -arrest membrane | |
| CN203582958U (en) | Ion source cleaner used in coating equipment | |
| CN204825033U (en) | Vacuum sputtering machine | |
| CN102230164A (en) | Metal strip continuous winding vacuum film plating equipment with building block type structure | |
| CN204991484U (en) | Honeycomb electrode capacitance ware |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: SHENZHEN GOLDENKEN OPTIC ELECTRONICS CO., LTD. Free format text: FORMER NAME: SHENZHEN GOLDENKEN OPTIC ELECTRONICS CO., LTD. |
|
| CP03 | Change of name, title or address |
Address after: 518106 Guangdong province Shenzhen Guangming New District Office of Gongming potato field Po community gold hirun Industrial Park first building, building fourth, building tenth, building third a layer and top layer Patentee after: Jin Kaixinrui Photoelectric Co., Ltd. of Shenzhen Address before: 518157 Guangdong province Shenzhen Guangming New District Gongming Xihuan Road Gold hirun Industrial Park building F Patentee before: Shenzhen Goldenken Electronics Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140618 Termination date: 20170120 |