CN201890924U - Plasma vacuum ceramic coating device - Google Patents
Plasma vacuum ceramic coating device Download PDFInfo
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- CN201890924U CN201890924U CN2010206290503U CN201020629050U CN201890924U CN 201890924 U CN201890924 U CN 201890924U CN 2010206290503 U CN2010206290503 U CN 2010206290503U CN 201020629050 U CN201020629050 U CN 201020629050U CN 201890924 U CN201890924 U CN 201890924U
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- plasma
- vacuum chamber
- vacuum
- evaporation source
- coating apparatus
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Abstract
The utility model relates to a coating device, in particular to a plasma vacuum ceramic coating device. The plasma vacuum ceramic coating device comprises a vacuum chamber device, a coated part working device and a plasma source, wherein the vacuum chamber device comprises a vacuum chamber, a vacuum pump connected with the vacuum chamber and an air inlet positioned on the vacuum chamber; the coated part working device comprises a rotating device, a coated part frame positioned on the rotating device, a working power supply for coating a film and evaporation sources connected with the working power supply; and at least two evaporation sources are provided. Compared with the prior art, in the plasma vacuum ceramic coating device, the phenomenon that plasmas are uniformly distributed around a coated part is realized, and uniform thickness of a coated film layer on the coated part is guaranteed.
Description
Technical field
The utility model relates to a kind of film coating apparatus, is specially a kind of plasma vacuum ceramic film coating apparatus.
Background technology
The plasma film coating apparatus of prior art has advantages such as simple to operate, reliable, that production cost is lower, but it is used for the following defective of ceramic coating existence: be difficult to obtain simultaneously multiple different film 1.; The difference of the physico-chemical property of 2 different metals such as the difference of vaporization temperature, the ionization potential difference makes stability and the homogeneity of different ions on same surfacing be difficult to control, the sedimentation velocity difference of different ions spot occurs on the plating piece surface easily, is difficult to guarantee the quality of plated film.
The utility model content
In order to overcome the deficiencies in the prior art, the purpose of this utility model is to provide a kind of plasma vacuum ceramic film coating apparatus to solve the problem that coatings mass discrepancy, coating quality are difficult to guarantee.
For achieving the above object, the utility model adopts following technical scheme:
A kind of plasma vacuum ceramic film coating apparatus, it comprises vacuum chamber device, plating piece equipment, evaporation source and plasma source, wherein said vacuum chamber device comprises vacuum chamber, the vacuum pump that links to each other with vacuum chamber, and be positioned at inlet mouth on the vacuum chamber; Described plating piece equipment has comprised wheelwork, has been positioned at the plated part rack on the wheelwork; Evaporation source electrode and insulating part that described evaporation source comprises working power, is connected with working power, described evaporation source are at least two.
Wheelwork described in the utility model has comprised rotating shaft and has been positioned at the rotating disk that is driven by rotating shaft in the rotating shaft.
Plated part rack described in the utility model comprises main part and several suspension members, and described suspension member is distributed on the main part, and described main part is connected with dial rotation, main part along with dial rotation the time himself also in the rotation that does not stop, to realize plating piece even plated film all over the body.
Plated part rack described in the utility model is along the rotating disk circumferential distribution, and the distance between each plated part rack can be adjusted according to the volume size of plating piece.
Evaporation source is positioned at the inboard of plating piece in the utility model preferred embodiment, and other evaporation source is positioned at the outside of plating piece, and is even with the thickness that guarantees the coatings on the plating piece.
The used plasma source of the utility model is a cathodic electricity camber plasma emissive source.
The utility model is than prior art, and its beneficial effect is: the utility model plasma source around plural at least evaporation source is arranged, guaranteed plasma body be evenly distributed on plating piece around; In the preferred scheme of the utility model, an evaporation source is positioned at the inboard of plated part rack, other evaporation source is positioned at the outside of plated part rack, make plasma body uniform distribution around plating piece, guaranteed that the coatings thickness on the plating piece is even, effectively prevented by the plasma-deposited speed of plasma source emission inconsistent and cause the plating piece surface phenomenon of spot to occur.
Below in conjunction with the drawings and specific embodiments the utility model is described in further details.
Description of drawings
Fig. 1 is the utility model structural representation.
Embodiment
As shown in Figure 1, plasma vacuum ceramic film coating apparatus of the present utility model, it comprises vacuum chamber device, plating piece equipment, evaporation source and plasma source, wherein said vacuum chamber device comprises vacuum chamber 11, the vacuum pump 12 that links to each other with vacuum chamber, and be positioned at inlet mouth 13 on the vacuum chamber; Described plating piece equipment has comprised wheelwork, has been positioned at the plated part rack on the wheelwork; Evaporation source electrode 32 and insulating part 33 that described evaporation source comprises working power 31, is connected with working power, described evaporation source is at least two.
In the embodiment of the present utility model, described wheelwork comprises rotating shaft 22 and rotating disk 21, and the body frame 23 in the described plated part rack is positioned at the edge of rotating disk and changes 21 with rotating disk and is dynamically connected.During work plating piece is placed on the suspension member 24 in the plated part rack, drive rotating shaft 22 and rotating disk 21 rotations with power set, plated part rack also moves in a circle around rotating shaft 22 simultaneously, and plated part rack is rotatably connected on the rotating disk 21, plated part rack self also gyrates on rotating disk, by plating piece 22 rotations and the rotation of himself around the shaft, guarantee that plasma body uniform distribution around plating piece has guaranteed that promptly the thickness of coatings on plating piece is even.
In the preferred scheme of the utility model, evaporation source comprises working power 31, evaporation source electrode 32 and insulating part 33, preferred evaporation source has two at least, one of them is positioned at the plated part rack inboard, being positioned at outside the plated part rack in addition, in the work, plasma source emission plasma body, under the effect of a plurality of evaporation sources, the sedimentation velocity that prevents plasma body is inconsistent and spot appears in plating piece surface that cause, guarantee the evenly attractive in appearance of plated film, especially when needs plated different types of film on same plating piece, it is extremely important that this feature just seems.
The used plasma source 41 of the utility model is a cathodic electricity camber plasma emissive source.
Claims (6)
1. plasma vacuum ceramic film coating apparatus, it is characterized in that: it comprises vacuum chamber device, plating piece equipment, evaporation source and plasma source, wherein said vacuum chamber device comprises vacuum chamber, the vacuum pump that links to each other with vacuum chamber, and be positioned at inlet mouth on the vacuum chamber; Described plating piece equipment has comprised wheelwork, has been positioned at the plated part rack on the wheelwork; Evaporation source electrode and insulating part that described evaporation source comprises working power, is connected with working power, described evaporation source are at least two.
2. plasma vacuum ceramic film coating apparatus according to claim 1 is characterized in that: described wheelwork has comprised rotating shaft and has been positioned at the rotating disk that is driven by rotating shaft in the rotating shaft.
3. plasma vacuum ceramic film coating apparatus according to claim 1, it is characterized in that: described plated part rack comprises main part and several suspension members, described suspension member is distributed on the main part, and described main part is connected with dial rotation, and main part himself also rotates along with dial rotation the time.
4. plasma vacuum ceramic film coating apparatus according to claim 1 is characterized in that: described plated part rack is along the rotating disk circumferential distribution, and the distance between each plated part rack can be adjusted according to the volume size of plating piece.
5. plasma vacuum ceramic film coating apparatus according to claim 1, it is characterized in that: one of them evaporation source is positioned at the inboard of plating piece, and other evaporation source is positioned at the outside of plating piece.
6. plasma vacuum ceramic film coating apparatus according to claim 1 is characterized in that: used plasma source is a cold cathode arc type plasma emissive source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206290503U CN201890924U (en) | 2010-11-26 | 2010-11-26 | Plasma vacuum ceramic coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010206290503U CN201890924U (en) | 2010-11-26 | 2010-11-26 | Plasma vacuum ceramic coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201890924U true CN201890924U (en) | 2011-07-06 |
Family
ID=44220401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010206290503U Expired - Fee Related CN201890924U (en) | 2010-11-26 | 2010-11-26 | Plasma vacuum ceramic coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201890924U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104674193A (en) * | 2015-02-04 | 2015-06-03 | 李学英 | Sheet preparation method and equipment |
| CN105965921A (en) * | 2016-06-30 | 2016-09-28 | 泰马克精密铸造（苏州）有限公司 | Plasma surface treatment device of annular side peripheral face of polypropylene product |
| CN111218661A (en) * | 2019-12-31 | 2020-06-02 | 四川荣塑管业集团有限责任公司 | Vacuum coating machine |
-
2010
- 2010-11-26 CN CN2010206290503U patent/CN201890924U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104674193A (en) * | 2015-02-04 | 2015-06-03 | 李学英 | Sheet preparation method and equipment |
| CN104674193B (en) * | 2015-02-04 | 2019-05-03 | 李学英 | A kind of preparation of sections method and apparatus |
| CN105965921A (en) * | 2016-06-30 | 2016-09-28 | 泰马克精密铸造（苏州）有限公司 | Plasma surface treatment device of annular side peripheral face of polypropylene product |
| CN105965921B (en) * | 2016-06-30 | 2018-08-17 | 泰马克精密铸造（苏州）有限公司 | The plasma surface processing device of polypropylene product annular lateral circle surface |
| CN111218661A (en) * | 2019-12-31 | 2020-06-02 | 四川荣塑管业集团有限责任公司 | Vacuum coating machine |
| CN111218661B (en) * | 2019-12-31 | 2022-04-29 | 四川荣塑管业集团有限责任公司 | Vacuum coating machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110706 Termination date: 20121126 |