CN204982042U - Rotary target of magnetron sputtering coated glass machine - Google Patents
Rotary target of magnetron sputtering coated glass machine Download PDFInfo
- Publication number
- CN204982042U CN204982042U CN201520587323.5U CN201520587323U CN204982042U CN 204982042 U CN204982042 U CN 204982042U CN 201520587323 U CN201520587323 U CN 201520587323U CN 204982042 U CN204982042 U CN 204982042U
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- target
- cooling channel
- copper
- magnetron sputtering
- glass machine
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Abstract
The utility model discloses a rotary target of vacuum magnetron sputter coating machine, its characterized in that has set gradually target head, target core, sealed chamber, drive arrangement, flange, copper target, auxiliary loop, magnetic path, cooling channel. Preferably, the export setting in sealed chamber is in the upper end in sealed chamber, just through control valve control. The partial periphery that penetrates copper target of target core is still overlapped and is equipped with the auxiliary loop, and the external diameter of auxiliary loop is less than the cooling channel internal diameter that is in in the copper target. Target core periphery evenly distributed is pressed to the magnetic path, and adopts the mutual spaced of high magnetism and low magnetic phase to distribute. Copper target is hollow structure, and inside is equipped with cooling channel, and cooling channel's coolant liquid import sets up in target head department, and the coolant outlet setting is in the rear end of copper target. The utility model discloses the beneficial effect who has: it is rotatory through the target core to make the sputter more even, and be equipped with cooling channel cooling structure, promote the coating film effect, this simple structure, economic benefits is higher.
Description
Technical field
The utility model relate to a kind of can by the rotary target of the magnetron sputtering film glass machine of Magnetic Control.
Background technology
Vacuum vapor plating, vacuum sputtering coating and vacuum ion membrane plating, develop quite fast nearly ten years, become one of current state-of-the-art surface treatment mode.It is realize rete to be attached to workpiece surface that vacuum plating is produced, to obtain the workpiece surface characteristic of needs.Vacuum sputtering coating utilizes target to sputter, and makes sputtering thing be attached to workpiece surface and form rete, namely reach plated film, magnetron sputtering coater is common vacuum sputtering coating equipment, but by the magnetron sputtering target arranged thereon, target is relative with target core motionless, and the magnetic patch distribution on target core is difficult to relatively uniform, and be difficult to ensure that the magnetic of different magnetic patch is consistent, make magneticstrength in production variant, sputter uneven, affect coating quality, thus give preferential treatment to improvement.Owing to can produce high temperature in magnetron sputtering process, and prior art could not effectively be lowered the temperature, and causes magnetic control effect to reduce, and is unfavorable for producing.
Utility model content
The purpose of this utility model is to make up the deficiencies in the prior art, provides a kind of rotary target of magnetron sputtering film glass machine.
In order to reach the purpose of this utility model, technical scheme is as follows:
A rotary target for vacuum magnetron sputtering coating film glass machine, is characterized in that, is disposed with target head, target core, entrance of cooling water, annular seal space, drive unit, joint flange, copper target, subring, magnetic patch, cooling channel, cooling water outlet.
Preferably, the outlet of described annular seal space is arranged on the upper end of annular seal space, and is controlled by control valve.
Preferably, the portion perimeter penetrating copper target of described target core is also arranged with subring, and the external diameter of subring is less than the cooling channel internal diameter be in copper target.
Preferably, described magnetic patch is uniformly distributed by target core periphery, and adopts high magnetic and the spaced distribution of low magnetic.
Preferably, described copper target is hollow structure, and inside is provided with cooling channel, and the entrance of cooling water of cooling channel is arranged on target head place, and cooling water outlet is arranged on the rear end of copper target.
The beneficial effect that the utility model has:
Drive the inner target core be provided with to rotate by drive unit, and be provided with the cooperation of magnetic patch and copper target, thus make sputtering evenly, and be provided with cooling channel cooling structure, in time to target cooling, promote coating effects, this structure is simple, design science is reasonable, and cost of investment is low, and economic benefit is higher.And can promote the utilization ratio of magnetic control rotatable sputtering target, the utilization ratio of rotary target material reaches 80%, also can extend the work-ing life of magnetic control rotatable sputtering target, and rotary target can use 180 days.The homogeneity of magnetic control rotatable sputtering target can be regulated again, reach stability high, and solve the electric discharge phenomena of coated product.
Accompanying drawing explanation
Fig. 1 is the structural representation of the rotary target of the utility model magnetron sputtering film glass machine.
Embodiment
Below in conjunction with embodiment, the utility model is further described, but protection domain of the present utility model is not only confined to embodiment.
As shown in Figure 1, a rotary target for vacuum magnetron sputtering coating film glass machine, is disposed with target head 1, target core 2, entrance of cooling water 3, annular seal space 4, drive unit 5, joint flange 6, copper target 7, subring 8, magnetic patch 9, cooling channel 10, cooling water outlet 11.
The outlet of annular seal space 4 is arranged on the upper end of annular seal space 4, and is controlled by control valve, and control valve is arranged on the middle and upper part of annular seal space 4, can reduce control like this.Target core 2) the portion perimeter penetrating copper target 7 be also arranged with subring 8, the external diameter of subring 8 is less than cooling channel 10 internal diameter be in copper target 7.Magnetic patch 9 is uniformly distributed by target core 2 periphery, and adopts high magnetic and the spaced distribution of low magnetic.Copper target 7 is hollow structure, and inside is provided with cooling channel 10, and the entrance of cooling water 3 of cooling channel 10 is arranged on target head 1 place, and cooling water outlet 11 is arranged on the rear end of copper target 7.
Last it is noted that above embodiment only in order to illustrate the utility model and and technical scheme described by unrestricted the utility model, therefore, although this specification sheets has been described in detail the utility model with reference to each above-mentioned embodiment, but, those of ordinary skill in the art is to be understood that, still can modify to the utility model or equivalent replacement, and all do not depart from technical scheme and the improvement thereof of spirit and scope of the present utility model, it all should be encompassed in right of the present utility model.
Claims (5)
1. the rotary target of a vacuum magnetron sputtering coating film glass machine, it is characterized in that, be disposed with target head (1), target core (2), entrance of cooling water (3), annular seal space (4), drive unit (5), joint flange (6), copper target (7), subring (8), magnetic patch (9), cooling channel (10), cooling water outlet (11).
2. the rotary target of magnetron sputtering film glass machine according to claim 1, is characterized in that, the outlet of described annular seal space (4) is arranged on the upper end of annular seal space (4), and is controlled by control valve.
3. the rotary target of magnetron sputtering film glass machine according to claim 2, it is characterized in that, the portion perimeter penetrating copper target (7) of described target core (2) is also arranged with subring (8), and the external diameter of subring (8) is less than cooling channel (10) internal diameter be in copper target (7).
4. the rotary target of magnetron sputtering film glass machine according to claim 1, is characterized in that, described magnetic patch (9) is uniformly distributed by target core (2) periphery, and adopts high magnetic and the spaced distribution of low magnetic.
5. the rotary target of magnetron sputtering film glass machine according to claim 1, it is characterized in that, described copper target (7) is hollow structure, inside is provided with cooling channel (10), the entrance of cooling water (3) of cooling channel (10) is arranged on target head (1) place, and cooling water outlet (11) is arranged on the rear end of copper target (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520587323.5U CN204982042U (en) | 2015-08-06 | 2015-08-06 | Rotary target of magnetron sputtering coated glass machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520587323.5U CN204982042U (en) | 2015-08-06 | 2015-08-06 | Rotary target of magnetron sputtering coated glass machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204982042U true CN204982042U (en) | 2016-01-20 |
Family
ID=55116426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520587323.5U Expired - Fee Related CN204982042U (en) | 2015-08-06 | 2015-08-06 | Rotary target of magnetron sputtering coated glass machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204982042U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106947950A (en) * | 2017-04-28 | 2017-07-14 | 中山市博顿光电科技有限公司 | A kind of utilization rate high new target system and its application method |
| CN109576668A (en) * | 2018-11-09 | 2019-04-05 | 中国科学院金属研究所 | A kind of efficient magnetron sputtering plating dedicated unit of the long tubing of multistation |
| CN111334770A (en) * | 2020-04-07 | 2020-06-26 | 中国科学院近代物理研究所 | Inner wall coating device of arc bending accelerator and magnetron sputtering coating method thereof |
| CN115110051A (en) * | 2022-07-12 | 2022-09-27 | 江西贵得科技有限公司 | Coating film rotating target core structure |
-
2015
- 2015-08-06 CN CN201520587323.5U patent/CN204982042U/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106947950A (en) * | 2017-04-28 | 2017-07-14 | 中山市博顿光电科技有限公司 | A kind of utilization rate high new target system and its application method |
| CN109576668A (en) * | 2018-11-09 | 2019-04-05 | 中国科学院金属研究所 | A kind of efficient magnetron sputtering plating dedicated unit of the long tubing of multistation |
| CN111334770A (en) * | 2020-04-07 | 2020-06-26 | 中国科学院近代物理研究所 | Inner wall coating device of arc bending accelerator and magnetron sputtering coating method thereof |
| CN115110051A (en) * | 2022-07-12 | 2022-09-27 | 江西贵得科技有限公司 | Coating film rotating target core structure |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160120 Termination date: 20160806 |