CN202658221U - Magnetron sputtering target of magnetron sputtering coating machine - Google Patents
Magnetron sputtering target of magnetron sputtering coating machine Download PDFInfo
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- CN202658221U CN202658221U CN 201220236421 CN201220236421U CN202658221U CN 202658221 U CN202658221 U CN 202658221U CN 201220236421 CN201220236421 CN 201220236421 CN 201220236421 U CN201220236421 U CN 201220236421U CN 202658221 U CN202658221 U CN 202658221U
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Abstract
The utility model relates to the technical field of vacuum coating, in particular to a magnetron sputtering target of a magnetron sputtering coating machine. The target comprises a target head and a target material, wherein the target head is provided with a rotatable, hollow and cylindrical shell and a target core; one end of the target core is fixed, and the other end of the target core penetrates through the shell and stretches into the middle in the target material; magnetic blocks are distributed at the periphery of a part of the target core, which stretches into the target material; one end of the target material is axially connected with the shell of the target head through a flange, so that inner cavities of the target material and the shell are communicated to form a sealed cavity; a cooling channel is arranged in the target core; an inlet of the cooling channel is externally connected with cooling liquid; an outlet of the cooling channel is positioned at one end of the target core, which stretches into the target material, and communicated with the sealed cavity; and the sealed cavity is provided with an outlet. The shell rotates to drive the target material to rotate, and a cooling structure is arranged, so that sputtering uniformity is high, the target is timely cooled, has a simple, scientific and reasonable structure and is low in investment cost, and a coating effect is improved.
Description
Technical field
The utility model relates to technical field of vacuum plating, especially the magnetron sputtering target of magnetron sputtering coater.
Background technology
Have subsequently the physical vapor deposition (PVD) technology, mainly be under vacuum environment, to carry out surface treatment, physical vapor deposition itself is divided into three kinds: vacuum vapor plating, vacuum sputtering coating and vacuum ion membrane plating, develop quite soon over past ten years, become one of current state-of-the-art surface treatment mode.It is to realize that rete is attached to workpiece surface that vacuum plating is produced, with the workpiece surface characteristic that need to obtain.Vacuum sputtering coating is to utilize target generation sputter, makes the sputter thing be attached to workpiece surface and forms rete, namely reaches plated film; Magnetron sputtering coater is common vacuum sputtering coating equipment, yet, in the magnetron sputtering target that arranges thereon, target is relative with the target core motionless, and the magnetic patch on the target core distributes and to be difficult to relatively evenly, and is difficult to guarantee that the magnetic of different magnetic patch is consistent, so that magneticstrength is variant in producing, sputter is inhomogeneous, affects coating quality, thereby preferential treatment improves.Again, owing to can produce high temperature in the magnetron sputtering process, and prior art fails effectively to lower the temperature, and causes the magnetic control effect to reduce, and is unfavorable for producing.
Summary of the invention
The purpose of this utility model is to overcome the defective of prior art, provides a kind of simple in structure, scientific and reasonable, can make sputter even, and can effectively to the target cooling, promote the magnetron sputtering target of the magnetron sputtering coater of coating effects.
For achieving the above object, the utility model adopts following technical scheme:
A kind of magnetron sputtering target of magnetron sputtering coater, include target head and target, the target head has shell and the target core of rotating hollow tube-shape, and target core one end is fixed, the other end passes shell and stretches out and penetrates middle part in the target, and in the part peripheral distribution that penetrates target of target core magnetic patch is arranged; Shell is by electric motor driving; The enclosure axis of one end of described target by flange and target head is to being engaged togather.
Described target forms the annular seal space that is communicated with just making the target inner chamber after the shell of target head is connected with the shell inner cavity of target head, and the target core is arranged in annular seal space; The inside of described target core also is provided with the cooling channel, the external cooling fluid of the entrance of cooling channel; And the outlet of cooling channel is positioned at an end termination that penetrates target of target core, the outlet communication seals chamber of cooling channel, and annular seal space is provided with outlet.
The outlet of described annular seal space is arranged on the permanent seat of target core, and permanent seat is provided with the port that port axially docks shell.
The part periphery that penetrates target of described target core also is arranged with subring, and the external diameter of subring is less than footpath within the annular seal space that is in the target.
Described magnetic patch evenly distributes by the semicircumference of target core periphery.
The shell rotation of the utility model design target head also drives the target rotation, and be provided with the structure that cools, thereby makes sputter more even, in time to the target cooling, promotes coating effects, obtains more excellent product.
A utility model again advantage is simple in structure, and scientific and reasonable, cost of investment is low, and Maintenance and Repair are very convenient, installs, easy to use, has greatly improved operation ratio and the operability of equipment.
Description of drawings:
Accompanying drawing 1 is preferred embodiment structural representation of the present utility model;
Embodiment:
Below in conjunction with accompanying drawing the utility model is further specified:
Consult shown in Fig. 1,2, the magnetron sputtering target of a kind of magnetron sputtering coater described in the utility model, include target head 1 and target 2, target head 1 has shell 11 and the target core 12 of rotating hollow tube-shape, target core 12 1 ends are fixed on the permanent seat 7, the other end passes shell 11 and stretches out and penetrates target 2 interior middle parts, and in the part peripheral distribution that penetrates target 2 of target core 12 magnetic patch 3 is arranged; The termination of the part that penetrates target 2 of target core 12 is positioned on the bench insulator of target 2 ends; Shell 11 is driven by motor 6; One end of described target 2 axially is engaged togather by the shell 11 of flange 4 with the target head.Described target 2 forms the annular seal space 5 that is communicated with just making target 2 inner chambers after the shell 11 of target head is connected with shell 11 inner chambers of target head, and target core 12 is arranged in annular seal space 5; The inside of described target core 12 also is provided with cooling channel 121, the entrance 1211 external cooling fluids of cooling channel 121; And the outlet 1212 of cooling channel 121 is positioned at an end termination that penetrates target 2 of target core 12, the outlet 1212 communication seals chambeies 5 of cooling channel 121, and annular seal space 5 is provided with outlet 51; The outlet 51 of annular seal space is arranged on the permanent seat 7 of target core 12, and permanent seat 7 is provided with the port that port axially docks shell 11.
During enforcement, drive shell 11 rotations of target heads 1 by motor 6, can realize by geartransmission, drive target 2 during shell 11 rotation, make the magnetic patch 3 on the target core 12, make thus sputter coating more even.And the entrance 1211 of cooling channel 121 connects water coolant by joint, make water coolant enter 12 internal flows of target core, 121 outlet 1212 flows to annular seal space 5 from the cooling channel again, outlet 51 outputs from annular seal space circulate again, realize that thus water coolant in time takes away the heat that can produce in the magnetron sputtering process, reach to the target cooling, promote coating effects, obtain more excellent product.
In the present embodiment, the part periphery that penetrates target 2 of target core 12 also is arranged with subring 8, the external diameter of subring 8 is less than footpath within the annular seal space 5 that is in the target 2, subring 8 has auxiliary positioning, prevent that target 2 rotation from rocking, guarantee the spacing between magnetic patch 3 and the target 2, obtain stable magnetic control effect.
Certainly, above diagram is preferred embodiment of the present utility model only, is not to limit practical range of the present utility model with this, therefore every principle according to the utility model is done the equivalence variation or modified, and all should be covered by in the protection domain of the present utility model.
Claims (5)
1. the magnetron sputtering target of a magnetron sputtering coater, include target head (1) and target (2), it is characterized in that: target head (1) has shell (11) and the target core (12) of rotating hollow tube-shape, target core (12) one ends are fixed, the other end passes shell (11) and stretches out and penetrates middle part in the target (2), and in the part peripheral distribution that penetrates target (2) of target core (12) magnetic patch (3) is arranged; Shell (11) is driven by motor (6); One end of described target (2) axially is engaged togather by the shell (11) of flange (4) with the target head.
2. the magnetron sputtering target of a kind of magnetron sputtering coater according to claim 1, it is characterized in that: described target (2) forms the annular seal space (5) that is communicated with just making target (2) inner chamber after the shell (11) of target head is connected with shell (11) inner chamber of target head, and target core (12) is arranged in annular seal space (5); The inside of described target core (12) also is provided with cooling channel (121), the external cooling fluid of entrance (1211) of cooling channel (121); And the outlet (1212) of cooling channel (121) is positioned at an end termination that penetrates target (2) of target core (12), outlet (1212) the communication seals chamber (5) of cooling channel (121), and annular seal space (5) is provided with outlet (51).
3. the magnetron sputtering target of a kind of magnetron sputtering coater according to claim 2, it is characterized in that: the outlet (51) of described annular seal space (5) is arranged on the permanent seat (7) of target core (12), and permanent seat (7) is provided with the port that port axially docks shell (11).
4. the magnetron sputtering target of a kind of magnetron sputtering coater according to claim 1, it is characterized in that: the part periphery that penetrates target (2) of target core (12) also is arranged with subring (8), and the external diameter of subring (8) is less than footpath within the annular seal space (5) that is in the target (2).
5. the magnetron sputtering target of a kind of magnetron sputtering coater according to claim 1, it is characterized in that: described magnetic patch (3) evenly distributes by the semicircumference of target core (12) periphery.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220236421 CN202658221U (en) | 2012-05-24 | 2012-05-24 | Magnetron sputtering target of magnetron sputtering coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220236421 CN202658221U (en) | 2012-05-24 | 2012-05-24 | Magnetron sputtering target of magnetron sputtering coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202658221U true CN202658221U (en) | 2013-01-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220236421 Expired - Fee Related CN202658221U (en) | 2012-05-24 | 2012-05-24 | Magnetron sputtering target of magnetron sputtering coating machine |
Country Status (1)
| Country | Link |
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| CN (1) | CN202658221U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2501345A (en) * | 2012-01-13 | 2013-10-23 | Gencoa Ltd | Hollow target holder used within magnetron sputtering |
| CN110344014A (en) * | 2019-08-20 | 2019-10-18 | 贵州商学院 | A kind of rotary target of magnetron sputtering coater |
| CN111719122A (en) * | 2019-03-21 | 2020-09-29 | 广东太微加速器有限公司 | Target |
| CN112553586A (en) * | 2020-12-16 | 2021-03-26 | 松山湖材料实验室 | Fine outer diameter magnetron rotating cathode and method for increasing deposition rate |
| CN115110051A (en) * | 2022-07-12 | 2022-09-27 | 江西贵得科技有限公司 | Coating film rotating target core structure |
-
2012
- 2012-05-24 CN CN 201220236421 patent/CN202658221U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2501345A (en) * | 2012-01-13 | 2013-10-23 | Gencoa Ltd | Hollow target holder used within magnetron sputtering |
| GB2501345B (en) * | 2012-01-13 | 2016-06-22 | Gencoa Ltd | In-Vacuum rotational device |
| CN111719122A (en) * | 2019-03-21 | 2020-09-29 | 广东太微加速器有限公司 | Target |
| CN110344014A (en) * | 2019-08-20 | 2019-10-18 | 贵州商学院 | A kind of rotary target of magnetron sputtering coater |
| CN110344014B (en) * | 2019-08-20 | 2021-07-23 | 贵州商学院 | Rotary target of magnetron sputtering coating machine |
| CN112553586A (en) * | 2020-12-16 | 2021-03-26 | 松山湖材料实验室 | Fine outer diameter magnetron rotating cathode and method for increasing deposition rate |
| CN115110051A (en) * | 2022-07-12 | 2022-09-27 | 江西贵得科技有限公司 | Coating film rotating target core structure |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20180503 Address after: 523000 fast track road in the eastern part of deep pit Industrial Zone, Dongguan, Guangdong. Patentee after: Guangdong Bao Bao Intelligent Equipment Technology Co., Ltd. Address before: 523000 fast track road in the eastern part of deep pit Industrial Zone, Dongguan, Guangdong. Patentee before: Guangdong Youtong Industry Co., Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130109 Termination date: 20180524 |