CN111719122A - Target - Google Patents

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Publication number
CN111719122A
CN111719122A CN201910218002.0A CN201910218002A CN111719122A CN 111719122 A CN111719122 A CN 111719122A CN 201910218002 A CN201910218002 A CN 201910218002A CN 111719122 A CN111719122 A CN 111719122A
Authority
CN
China
Prior art keywords
target
mounting column
gear
supporting body
column
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910218002.0A
Other languages
Chinese (zh)
Inventor
钱铁威
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Taiwei Accelerator Co ltd
Original Assignee
Guangdong Taiwei Accelerator Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Taiwei Accelerator Co ltd filed Critical Guangdong Taiwei Accelerator Co ltd
Priority to CN201910218002.0A priority Critical patent/CN111719122A/en
Priority to PCT/CN2019/079855 priority patent/WO2020186545A1/en
Publication of CN111719122A publication Critical patent/CN111719122A/en
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention provides a target which comprises a tubular target body, a tubular supporting body and an installation column, wherein the supporting body is sleeved on the installation column, the target body is sleeved on the supporting body, a cooling cavity is arranged in the supporting body, a cooling liquid inlet and a cooling liquid outlet are arranged on the supporting body, the cooling liquid inlet and the cooling liquid outlet are respectively communicated with the cooling cavity, the target body can rotate around the central axis of the target body, and the target body can move along the direction of the central axis of the target body.

Description

Target
Technical Field
The present invention relates to a target.
Background
A target is understood to mean the material being sputtered in a cathode sputtering system. Most sputtering targets used in the past are so-called planar targets which are configured in a circular or rectangular manner. However, planar targets have the following disadvantages: only about 30% to 40% of the material constituting the planar target is effectively sputtered, and its effective utilization rate is low and its service life is short.
Disclosure of Invention
In view of the problems noted in the background art, the present invention provides a target which is generally tubular and capable of rotating and moving, and in which a cooling structure is provided, thereby improving the utilization rate of the target and prolonging the service life thereof.
The technical scheme of the invention is realized as follows:
the utility model provides a target, includes tubular target body, tubular supporting body and erection column, the supporting body cover is established on the erection column, the target body cover is established on the supporting body, the inside of supporting body be equipped with the cooling cavity, the supporting body on be equipped with coolant liquid import and coolant liquid export, coolant liquid import and coolant liquid export respectively with cooling cavity intercommunication setting.
The invention is further configured such that the target body is rotatable about its central axis.
The invention is further provided that the supporting body is fixedly connected with the mounting column, and the mounting column is connected with a first driving device for driving the mounting column to rotate.
The invention is further provided that the supporting body is rotatably connected with the mounting column, and the invention also comprises a driving mechanism for driving the supporting body to rotate.
The invention is further provided that the driving mechanism comprises a first gear, a second gear and a second driving device, wherein the first gear is coaxial with the bearing body and is in linkage arrangement, the second gear is meshed with the first gear, and the second driving device is connected with the second gear and is used for driving the second gear to rotate.
The invention is further provided that the target body can move along the direction of the central axis thereof.
The invention is further provided that the supporting body is fixedly connected with the mounting column, and the mounting column is connected with a first traction mechanism for drawing the mounting column to move along the axis direction.
The invention is further provided that the bearing body and the mounting column form sliding connection in the axis direction of the mounting column, and the invention further comprises a second traction mechanism, wherein the second traction mechanism is connected with the bearing body and is used for drawing the bearing body to slide on the mounting column.
The utility model provides a target, includes tubular target body and erection column, the target body cover is established on the erection column, the target body can rotate around its central axis, the target body can remove along its central axis direction.
The invention has the beneficial effects that:
the target provided by the invention is tubular in structure, when in use, the surface of the target can obtain more uniform etching effect by adjusting the autorotation and the up-and-down movement of the tubular target, the etching area can basically cover the whole surface of the target by adjusting the position of the target body, and the cooling structure is arranged on the bearing body, so that the heat generated during etching can be cooled quickly, the utilization rate of the target material is improved, and the service life of the target material is prolonged.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic structural view of the present invention;
FIG. 3 is a schematic structural view of the present invention;
FIG. 4 is a schematic structural view of the present invention;
FIG. 5 is a schematic structural view of the present invention;
fig. 6 is a schematic structural diagram of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention is described below with reference to fig. 1-6:
as shown in fig. 1: the utility model provides a target, includes tubular target body 1, tubular supporting body 2 and erection column 3, 2 covers of supporting body are established on erection column 3, and 1 covers of target body are established on supporting body 2, the inside of supporting body 2 be equipped with the cooling cavity, supporting body 2 on be equipped with coolant liquid import 21 and coolant liquid export 22, coolant liquid import 21 and coolant liquid export 22 respectively with the setting of cooling cavity intercommunication.
Wherein, the target body 1 can rotate around the central axis thereof.
As shown in fig. 2, the supporting body 2 is fixedly connected to the mounting column 3, a first driving device 4 for driving the mounting column 3 to rotate is connected to the mounting column 3, and the first driving device 4 may be a motor. During the in-service use, erection column 3 is connected with the support body of equipment, and the motor is also installed in suitable position on the support body.
As shown in fig. 3, the supporting body 2 is rotatably connected to the mounting column 3, the supporting body 2 is connected to the mounting column 3 through a bearing, and the driving mechanism drives the supporting body 2 to rotate.
As shown in fig. 3, the driving mechanism includes a first gear 5, a second gear 6, and a second driving device 7 (motor), the first gear 5 is coaxial with the carrier 2 and is linked with the carrier, the second gear 6 is engaged with the first gear 5, and the second driving device 7 is connected with the second gear 6 for driving the second gear 6 to rotate. During the in-service use, erection column 3 is connected with the support body of equipment, and the motor is also installed in suitable position on the support body.
Wherein the target body 1 can move along the central axis direction thereof.
As shown in fig. 4, the supporting body 2 is fixedly connected with the mounting column 3, the mounting column 3 is connected with a first traction mechanism 8 which can pull the mounting column to move along the axis direction, the first traction mechanism 8 can be an air cylinder, when in actual use, the mounting column 3 is connected with a frame body of the equipment, and the air cylinder is also mounted at a proper position on the frame body. The cylinder can also fix the traction moving position of the mounting column.
As shown in fig. 5, the supporting body 2 and the mounting column 3 are connected in a sliding manner in the axial direction of the mounting column 3, and the device further comprises a second traction mechanism 9 (air cylinder), wherein the second traction mechanism 9 is connected with the supporting body 2 and is used for drawing the supporting body 2 to slide on the mounting column 3. During the in-service use, erection column 3 is connected with the support body of equipment, and the cylinder is also installed in suitable position on the support body.
As shown in fig. 6, a target comprises a tubular target body 1 and a mounting column 3, the target body 1 is sleeved on the mounting column 3, the target body 1 can rotate around the central axis thereof, and the target body 1 can move along the central axis thereof. The rotation and up-and-down movement of the target 1 adopt the corresponding technical solutions mentioned above.
The invention has the beneficial effects that:
the target provided by the invention is tubular in structure, when in use, the surface of the target can obtain more uniform etching effect by adjusting the autorotation and the up-and-down movement of the tubular target, the etching area can basically cover the whole surface of the target by adjusting the position of the target body 1, and the cooling structure is arranged on the bearing body 2, so that the heat generated during etching can be cooled quickly, the utilization rate of the target material is improved, and the service life of the target material is prolonged.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (9)

1. A target, characterized by: including tubular target body, tubular supporting body and erection column, the supporting body cover is established on the erection column, the target body cover is established on the supporting body, the inside of supporting body be equipped with the cooling cavity, the supporting body on be equipped with coolant liquid import and coolant liquid export, coolant liquid import and coolant liquid export respectively with the setting of cooling cavity intercommunication.
2. A target according to claim 1, wherein: the target body can rotate around the central axis thereof.
3. A target according to claim 2, wherein: the bearing body is fixedly connected with the mounting column, and a first driving device for driving the mounting column to rotate is connected to the mounting column.
4. A target according to claim 2, wherein: the bearing body and the mounting column are rotatably connected, and the bearing device also comprises a driving mechanism for driving the bearing body to rotate.
5. A target according to claim 4, wherein: the driving mechanism comprises a first gear, a second gear and a second driving device, the first gear is coaxial with the bearing body and is in linkage arrangement, the second gear is meshed with the first gear, and the second driving device is connected with the second gear and is used for driving the second gear to rotate.
6. A target according to any one of claims 1 to 5, wherein: the target body can move along the direction of the central axis of the target body.
7. A target according to claim 6, wherein: the bearing body is fixedly connected with the mounting column, and a first traction mechanism for drawing the mounting column to move along the axis direction of the mounting column is connected to the mounting column.
8. A target according to claim 6, wherein: the bearing body and the mounting column form sliding connection in the axis direction of the mounting column, and the mounting column further comprises a second traction mechanism, and the second traction mechanism is connected with the bearing body and used for drawing the bearing body to slide on the mounting column.
9. A target, characterized by: including tubular target body and erection column, the target body cover is established on the erection column, the target body can rotate around its central axis, the target body can remove along its central axis direction.
CN201910218002.0A 2019-03-21 2019-03-21 Target Pending CN111719122A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201910218002.0A CN111719122A (en) 2019-03-21 2019-03-21 Target
PCT/CN2019/079855 WO2020186545A1 (en) 2019-03-21 2019-03-27 Target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910218002.0A CN111719122A (en) 2019-03-21 2019-03-21 Target

Publications (1)

Publication Number Publication Date
CN111719122A true CN111719122A (en) 2020-09-29

Family

ID=72518960

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910218002.0A Pending CN111719122A (en) 2019-03-21 2019-03-21 Target

Country Status (2)

Country Link
CN (1) CN111719122A (en)
WO (1) WO2020186545A1 (en)

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Publication number Priority date Publication date Assignee Title
US5445721A (en) * 1994-08-25 1995-08-29 The Boc Group, Inc. Rotatable magnetron including a replacement target structure
CN2292095Y (en) * 1996-04-05 1998-09-23 永胜诚信工贸公司 Column shaped plane type magnetic controlled sputter target
JPH1129866A (en) * 1997-07-11 1999-02-02 Fujitsu Ltd Sputtering device
CN1541282A (en) * 2001-08-13 2004-10-27 �����ʩ���عɷݹ�˾ Sputter target
CN1564645A (en) * 2004-04-20 2005-01-12 中国科学院物理研究所 Solid rotary target driven by cooled liquid
CN2873800Y (en) * 2005-09-13 2007-02-28 北京实力源科技开发有限责任公司 Target device
JP2008001920A (en) * 2006-06-20 2008-01-10 National Institute Of Advanced Industrial & Technology Target holder and target holding method
CN101576551A (en) * 2009-06-04 2009-11-11 山东电力研究院 Target plate device used for steam blowing pipe
US20100155226A1 (en) * 2007-06-08 2010-06-24 John Madocks Rotatable magnetron sputtering with axially movable target electrode tube
CN201545907U (en) * 2009-11-17 2010-08-11 深圳市振恒昌实业有限公司 Novel target tube rotary magnetic control splashing cylindrical target
CN101994093A (en) * 2009-08-14 2011-03-30 鸿富锦精密工业（深圳）有限公司 Magnetron sputtering device
CN102127740A (en) * 2010-01-19 2011-07-20 鸿富锦精密工业（深圳）有限公司 Sputtering device
CN202347087U (en) * 2011-10-10 2012-07-25 苏州丰裕机械工程有限公司 Rotary magnetic control cylindrical target
DE102011004450A1 (en) * 2011-02-21 2012-08-23 Von Ardenne Anlagentechnik Gmbh Magnetron sputtering device comprises a hollow target and a magnet assembly arranged in the target, where the target and the magnet assembly are held in a holding unit and the magnet assembly is secured at a mechanism
CN202658221U (en) * 2012-05-24 2013-01-09 广东友通工业有限公司 Magnetron sputtering target of magnetron sputtering coating machine
US20130228452A1 (en) * 2010-11-17 2013-09-05 Soleras Advanced Coatings Bvba Soft sputtering magnetron system
CN103620082A (en) * 2011-04-29 2014-03-05 普莱克斯S.T.技术有限公司 Method of forming a cylindrical sputter target assembly
EP2746424A1 (en) * 2012-12-21 2014-06-25 Sulzer Metaplas GmbH Evaporation source
CN103938171A (en) * 2014-04-12 2014-07-23 合肥工业大学 Device and method for improving sputtering cathode target utilization rate and coating uniformity
CN203794978U (en) * 2014-04-12 2014-08-27 合肥工业大学 Device for improving sputtering cathode target material utilization rate and coating uniformity
CN204281850U (en) * 2014-12-03 2015-04-22 深圳市莱恩顿纳米技术有限公司 A kind of novel cylinder magnetically controlled DC sputtering target
CN104818460A (en) * 2014-10-28 2015-08-05 苏州求是真空电子有限公司 Rotating planar target for efficiently cooling
CN204982042U (en) * 2015-08-06 2016-01-20 咸宁南玻节能玻璃有限公司 Rotary target of magnetron sputtering coated glass machine
CZ2015837A3 (en) * 2015-11-27 2017-03-01 Shm, S. R. O. A cylindrical cathode for applying layers by the PVD method
US20170207071A1 (en) * 2014-07-09 2017-07-20 Soleras Advanced Coatings Bvba Sputter Device with Moving Target
WO2017128928A1 (en) * 2016-01-26 2017-08-03 京东方科技集团股份有限公司 Coating device with moving target and coating method
CN107179384A (en) * 2017-05-15 2017-09-19 中国科学院近代物理研究所 A kind of various target desorption efficiency test device
CN206819968U (en) * 2017-07-04 2017-12-29 东华理工大学 The generating means of laser splash ion gun
CN206877966U (en) * 2017-07-04 2018-01-12 东华理工大学 Improved ion source generating means
CN107771224A (en) * 2015-03-18 2018-03-06 尤米科尔公司 The method for forming rotary sputtering target
CN207305028U (en) * 2017-05-26 2018-05-01 山东新华医疗器械股份有限公司 New target structure for S-band resident wave accelerating pipe
CN207752964U (en) * 2018-02-01 2018-08-21 合肥美亚光电技术股份有限公司 A kind of laser splash ion source
CN108624856A (en) * 2018-07-05 2018-10-09 包头稀土研究院 Target material assembly
CN208362457U (en) * 2018-06-22 2019-01-11 新奥科技发展有限公司 A kind of ion source and coating apparatus
CN109267022A (en) * 2018-12-15 2019-01-25 湖南玉丰真空科学技术有限公司 A kind of target cooling device
CN109338310A (en) * 2018-11-26 2019-02-15 上海子创镀膜技术有限公司 One kind being used for multi-arc ion plating equipment circular flat multi sphere target assembly
CN209619439U (en) * 2019-03-21 2019-11-12 北京中百源国际科技创新研究有限公司 Target
CN111155062A (en) * 2019-12-31 2020-05-15 中山市博顿光电科技有限公司 Target rotating structure, target mounting structure and ion source sputtering system
CN111719123A (en) * 2019-03-21 2020-09-29 广东太微加速器有限公司 Combined target

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CN1053712C (en) * 1997-04-30 2000-06-21 浙江大学 Rotary target column type magnetic controlled sputtering device
DE10213049A1 (en) * 2002-03-22 2003-10-02 Dieter Wurczinger Rotatable tubular cathode
CN201209166Y (en) * 2008-06-06 2009-03-18 王佰忠 Improved magnet sputtering cylinder target
CN201614407U (en) * 2009-12-25 2010-10-27 甘国工 Magnetic fluid sealing and rotating target for magnetic control sputtering of vacuum coating
JP6734746B2 (en) * 2016-09-26 2020-08-05 三井金属鉱業株式会社 Manufacturing method of cylindrical sputtering target

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Publication number Priority date Publication date Assignee Title
US5445721A (en) * 1994-08-25 1995-08-29 The Boc Group, Inc. Rotatable magnetron including a replacement target structure
CN2292095Y (en) * 1996-04-05 1998-09-23 永胜诚信工贸公司 Column shaped plane type magnetic controlled sputter target
JPH1129866A (en) * 1997-07-11 1999-02-02 Fujitsu Ltd Sputtering device
CN1541282A (en) * 2001-08-13 2004-10-27 �����ʩ���عɷݹ�˾ Sputter target
CN1564645A (en) * 2004-04-20 2005-01-12 中国科学院物理研究所 Solid rotary target driven by cooled liquid
CN2873800Y (en) * 2005-09-13 2007-02-28 北京实力源科技开发有限责任公司 Target device
JP2008001920A (en) * 2006-06-20 2008-01-10 National Institute Of Advanced Industrial & Technology Target holder and target holding method
US20100155226A1 (en) * 2007-06-08 2010-06-24 John Madocks Rotatable magnetron sputtering with axially movable target electrode tube
CN101576551A (en) * 2009-06-04 2009-11-11 山东电力研究院 Target plate device used for steam blowing pipe
CN101994093A (en) * 2009-08-14 2011-03-30 鸿富锦精密工业（深圳）有限公司 Magnetron sputtering device
CN201545907U (en) * 2009-11-17 2010-08-11 深圳市振恒昌实业有限公司 Novel target tube rotary magnetic control splashing cylindrical target
CN102127740A (en) * 2010-01-19 2011-07-20 鸿富锦精密工业（深圳）有限公司 Sputtering device
US20130228452A1 (en) * 2010-11-17 2013-09-05 Soleras Advanced Coatings Bvba Soft sputtering magnetron system
DE102011004450A1 (en) * 2011-02-21 2012-08-23 Von Ardenne Anlagentechnik Gmbh Magnetron sputtering device comprises a hollow target and a magnet assembly arranged in the target, where the target and the magnet assembly are held in a holding unit and the magnet assembly is secured at a mechanism
CN103620082A (en) * 2011-04-29 2014-03-05 普莱克斯S.T.技术有限公司 Method of forming a cylindrical sputter target assembly
CN202347087U (en) * 2011-10-10 2012-07-25 苏州丰裕机械工程有限公司 Rotary magnetic control cylindrical target
CN202658221U (en) * 2012-05-24 2013-01-09 广东友通工业有限公司 Magnetron sputtering target of magnetron sputtering coating machine
EP2746424A1 (en) * 2012-12-21 2014-06-25 Sulzer Metaplas GmbH Evaporation source
CN103938171A (en) * 2014-04-12 2014-07-23 合肥工业大学 Device and method for improving sputtering cathode target utilization rate and coating uniformity
CN203794978U (en) * 2014-04-12 2014-08-27 合肥工业大学 Device for improving sputtering cathode target material utilization rate and coating uniformity
US20170207071A1 (en) * 2014-07-09 2017-07-20 Soleras Advanced Coatings Bvba Sputter Device with Moving Target
CN104818460A (en) * 2014-10-28 2015-08-05 苏州求是真空电子有限公司 Rotating planar target for efficiently cooling
CN204281850U (en) * 2014-12-03 2015-04-22 深圳市莱恩顿纳米技术有限公司 A kind of novel cylinder magnetically controlled DC sputtering target
CN107771224A (en) * 2015-03-18 2018-03-06 尤米科尔公司 The method for forming rotary sputtering target
CN204982042U (en) * 2015-08-06 2016-01-20 咸宁南玻节能玻璃有限公司 Rotary target of magnetron sputtering coated glass machine
CZ2015837A3 (en) * 2015-11-27 2017-03-01 Shm, S. R. O. A cylindrical cathode for applying layers by the PVD method
WO2017128928A1 (en) * 2016-01-26 2017-08-03 京东方科技集团股份有限公司 Coating device with moving target and coating method
CN107179384A (en) * 2017-05-15 2017-09-19 中国科学院近代物理研究所 A kind of various target desorption efficiency test device
CN207305028U (en) * 2017-05-26 2018-05-01 山东新华医疗器械股份有限公司 New target structure for S-band resident wave accelerating pipe
CN206819968U (en) * 2017-07-04 2017-12-29 东华理工大学 The generating means of laser splash ion gun
CN206877966U (en) * 2017-07-04 2018-01-12 东华理工大学 Improved ion source generating means
CN207752964U (en) * 2018-02-01 2018-08-21 合肥美亚光电技术股份有限公司 A kind of laser splash ion source
CN208362457U (en) * 2018-06-22 2019-01-11 新奥科技发展有限公司 A kind of ion source and coating apparatus
CN108624856A (en) * 2018-07-05 2018-10-09 包头稀土研究院 Target material assembly
CN109338310A (en) * 2018-11-26 2019-02-15 上海子创镀膜技术有限公司 One kind being used for multi-arc ion plating equipment circular flat multi sphere target assembly
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