CN104674182B - A kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side - Google Patents
A kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side Download PDFInfo
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- CN104674182B CN104674182B CN201510068222.1A CN201510068222A CN104674182B CN 104674182 B CN104674182 B CN 104674182B CN 201510068222 A CN201510068222 A CN 201510068222A CN 104674182 B CN104674182 B CN 104674182B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
The invention discloses a kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side, belong to vacuum coating equipment field.The coater of the present invention includes vacuum chamber, uncoiling mechanism, chill roll, rolling-up mechanism, negative electrode cell, turns round and change target assembly and deviation correcting device, respectively arranges one group of deviation correcting device at uncoiling mechanism and rolling-up mechanism；The bottom located at chill roll for the target assembly is changed in negative electrode cell and revolution, and chill roll, negative electrode cell and revolution are changed target assembly and be on same axis；Revolution is changed target assembly and is included support, rotary disk, the pole target stand plate being uniformly distributed on rotary disk；Pole target stand plate rotates to the lower section of negative electrode cell, and protruding by target core embed the little interior of negative electrode；Uncoiling mechanism and rolling-up mechanism drive base band to move back and forth.The present invention can change cathode target in the case of not opening plated film vacuum chamber in time, and realizes being coated with of stratified film using base material reciprocating motion, and every tunic is all individually coated with, and is easy to parameters of film control；Compact equipment, takes up an area space little.
Description
Technical field
A kind of a kind of the present invention relates to vacuum coating equipment, more particularly, it relates to one side reciprocal continuous coating magnetron sputtering
Winding film coating machine.
Background technology
Vacuum winding coating technique is exactly in coiled strip base material in the indoor method such as thermal evaporation or magnetron sputtering of passing through of vacuum
The technology that one layer or multilamellar have the thin film of certain function is prepared on surface.Vacuum winding filming equipment mainly has following characteristics：
One, plated base material are flexible parent metal, that is, having can be windability；Two, coating process has seriality, that is, in a work week
In phase, plated film is carried out continuously；Three, coating process is carried out in high vacuum environment.Winding film coating machine is unreeling and was winding
Cheng Zhong, substrate surface is coated with thin film, and the structure of plated film is exactly the work department of vacuum winding filming equipment, and it is located at the receipts of base material
Between unreeling, the operation principle of work department can be thermal resistance evaporation, induction evaporation mode, electron beam evaporation, magnetron sputtering or its
Any one in its vacuum coating method.The work process of magnetron sputtering is that electronics accelerates to fly to base material in the presence of electric field
Collide with sputter gas argon during thin film, ionize out substantial amounts of argon ion and electronics, electronics flies to base film, here
During constantly collide with ar atmo, produce more ar atmos and electronics；Argon ion accelerates to bombard in the presence of electric field
Target, sputters substantial amounts of target atom, is deposited on base film surface filming in neutral target atom (or molecule).
Flexible parent metal is widely used in the middle of organic semiconductors technologies, transparency electrode and touch screen.Recently as to soft
The developing rapidly of magnetron sputtering technique itself in the widespread demand of property base coated film material and flexible parent metal, various high-performance opticals
Film is coated with successfully in large area flexible substrate.Simply, easily transport, can conveniently cut because flexible parent metal has continuous production
The advantages such as arbitrary shape, flexible parcel are become to be always important directions of magnetron sputtering technique development.Therefore, thin in plastics
Adopt winding film plating mode plating functional membrane on film more, and the preferable functional membrane of function will be plated on a plastic film, such as in polyester film
The upper plating preferable low-reflection film of function (low-E film), minimum double silver structural membrane are also required to plate more than 9 layers of film layer, if plating can
See that light transmission rate is more than 85%, resistance and is less than 1 Ω/m2Electromagnetic shielding film (EMI film), then to plate four silver medal structural membrane, that is, 17 layers
Film layer.Plate each layer and will configure a set of negative electrode and target core, and traditional winding film coating machine rolls monoblock type plated film using single, that is, exist
A chilling roller is laid in one plated film vacuum interior, and 2～3 negative electrodes, target core and releasing coil mechanism, rolling-up mechanism, due to structure
Limitation reason is it is impossible to just can plate more than 4 layers differences in arrange up to more than 4 groups of negative electrode of circumference it is impossible to adapt to coating
The film layer of function, even if laying two chilling rollers, 4～6 negative electrodes and target core a plated film interior, 17 negative electrodes of also can not arranging any more
And target position.For reaching the purpose having plated 17 tunics, design in a traditional way, need at least 3 chilling rollers, water flowing, the pipeline of energising
Many, the gas discharge quantity of generation is big, is unfavorable for vacuum pump economical operation, therefore traditional coater does not just adapt to a coating
More than 4 layers of plated film can be plated, can not produce that film layer is many, better function functional plastic film layer.Generally multiple poles target
Also exist between machining state each negative electrode cell in the state of arrangement process gas each other seepage (5%～
20%) plated film that processing obtains, is made not reach the requirement of technique.
To in cathodic sputtering film formation device, winding-type vacuum coater significantly improves so that it can continuously produce
The efficiency of film forming, however, be used for the peace of spatter film forming negative electrode cell for each in existing winding-type vacuum coater
Dress limited amount, the sputtering time of each negative electrode cell and sputtering atmosphere are difficult to accurately control, and the stability of film forming is poor, mostly only
One layer or two layer medium film can be produced, and cannot continuously sputter three layer dielectrics, because the deielectric-coating in the middle of three layer dielectrics
The spatter film forming time is longer, and film forming atmosphere is all different from the atmosphere of upper and lower two layer medium film, and existing take-up type vacuum plated film sets
Standby synchronous axial system, the spatter film forming time of single negative electrode cell is substantially inadequate, and the atmosphere of each negative electrode cell is also easily mutual
Interfere；In addition, existing winding-type vacuum coater generally require with cleaning device, heater, unreel and rolling-up mechanism
Support the use formation production line, so can cause the problem that equipment is many, the occupancy place of production is big.
In view of this, how to design and a kind of only just can continuously sputter multilayer functional membrane with single vacuum coating equipment and become
There is technical problem to be solved.
Content of the invention
1. invent technical problem to be solved
It is an object of the invention to overcoming the above-mentioned deficiency of prior art, a kind of one side reciprocal continuous coating magnetic control is provided to splash
Penetrate winding film coating machine, using technical scheme, can be timely as needed in the case of not opening plated film vacuum chamber
Change cathode target, and moved back and forth using base material and realize being coated with of stratified film, simplify electrical control gear and program, every layer
Film all can individually be coated with, and is easy to the control of parameters of film, improves plated film precision；Meanwhile, compact equipment, takes up an area space
Little, it is particularly suitable for Scientific Research in University Laboratory or small lot batch manufacture.
2. technical scheme
For reaching above-mentioned purpose, the technical scheme that the present invention provides is：
A kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention, including vacuum chamber, is sequentially arranged in very
Uncoiling mechanism in empty room, chill roll, rolling-up mechanism and negative electrode cell, also include revolution and change target assembly and deviation correcting device, described
Uncoiling mechanism and rolling-up mechanism at be each provided with one group for changing the reversing roller in base band direction, described uncoiling mechanism with change
One group of deviation correcting device is respectively set between roller, between rolling-up mechanism and reversing roller；Described negative electrode cell upper and lower surface opening, and
Located at the bottom of chill roll, the bottom located at negative electrode cell for the target assembly is changed in described revolution to described negative electrode cell, and chill roll,
Negative electrode cell and revolution are changed target assembly and are on same axis；Described revolution is changed target assembly and is included support, passes through slew gear
The rotary disk that is connected on support, by radial expansion mechanism be uniformly distributed on rotary disk two or more for
The pole target stand plate of target core is installed；Described pole target stand plate rotates to the lower section of negative electrode cell, and protruding will target core embed the moon
Minimum interior；Described uncoiling mechanism and rolling-up mechanism drive base band to realize moving back and forth.
Further, described support is additionally provided with the axial stretching mechanism along rotary disk axial stretching, for returning
Rotating disk moves to outside vacuum chamber.
Further, described axial stretching mechanism is provided with three section cartridge type guide rails.
Further, described deviation correcting device is ultrasound wave deviation-rectifying system or the Photoelectric Error Correction System.
Further, it is additionally provided with pretreating device between described uncoiling mechanism and chill roll, described pre-treatment
Device includes ion source pretreatment mechanism and cold well coil pipe deep cooling mechanism, and described ion source pretreatment mechanism is arranged at uncoiler
Between structure and chill roll, for cleaning the dirt on base band surface；Described cold well coil pipe deep cooling mechanism near uncoiling mechanism,
For a large amount of steam to release in base band pretreatment process for the condensation.
Further, described negative electrode cell is provided with coldplate, air supply mechanism and atmosphere division board, described atmosphere
Division board is arranged at the both sides of negative electrode cell, and described coldplate is arranged on the side wall of negative electrode cell, and is distributed on coldplate
There is cooling water pipe, described air supply mechanism is located at the little interior of negative electrode, and is connected with the QI invigorating unit outside vacuum chamber, described
The little interior of negative electrode is additionally provided with vacuum device, and this vacuum device is connected with the molecular pump outside vacuum chamber.
3. beneficial effect
The technical scheme being provided using the present invention, compared with existing known technology, has following remarkable result：
(1) a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine, its uncoiling mechanism and the reversing roller of the present invention
Between, one group of deviation correcting device is respectively set between rolling-up mechanism and reversing roller, it is possible to achieve back and forth continuously moving of base band, make base band
Winding neat in edge, reach plating multilayer film processing purpose；Target assembly is changed using revolution simultaneously, do not opening plated film vacuum chamber
In the case of can change cathode target as needed in time, realize continuously being coated with of multilayer functional membrane, simplify electrical control dress
Put and program, every layer function film all can individually be coated with, and is easy to the state modulator of functional film layer, improves plated film precision；
(2) a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention, its support is additionally provided with edge and returns
The axial stretching mechanism of rotating disk axial stretching, for rotary disk is moved to outside vacuum chamber, can be after the completion of a plated film
Carry out outside vacuum chamber changing target, simple to operation；
(3) a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention, its axial stretching mechanism sets
There are three section cartridge type guide rails it is ensured that axial stretching mechanism has enough rigidity it is ensured that larger distance can be stretched out；
(4) a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention, its deviation correcting device is ultrasound wave
Deviation-rectifying system or the Photoelectric Error Correction System, correction controls precisely, and error is little；
(5) a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention, its pretreating device include from
Component pretreatment mechanism and cold well coil pipe deep cooling mechanism, ion source pretreatment mechanism is arranged between uncoiling mechanism and chill roll,
For cleaning the dirt on base band surface；Cold well coil pipe deep cooling mechanism near uncoiling mechanism, for condensation to base band pre-treatment
During release a large amount of steam；Pretreating device is surface-treated neat and tidy it is ensured that plated film crudy to base band.
Brief description
Fig. 1 is a kind of principle schematic of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention；
Fig. 2 changes the principle schematic diagram. of target assembly for the revolution in the present invention；
Fig. 3 is the structural representation of the negative electrode cell in the present invention.
Label declaration in schematic diagram：
1st, vacuum chamber；2nd, uncoiling mechanism；3rd, base band；4th, deviation correcting device；5th, reversing roller；6th, pretreating device；7th, chill roll；
8th, rolling-up mechanism；9th, target assembly is changed in revolution；10th, negative electrode cell；11st, target core；12nd, air inlet electromagnetic valve；13rd, it is evacuated electromagnetic valve；14、
Roughing vacuum pump unit；15th, cyropump；16th, molecular pump extraction valve；17th, molecular pump；18th, backing pump pumping electromagnetic valve；19th, backing pump；
901st, support；902nd, axial stretching mechanism；903rd, rotary disk；904th, radial expansion mechanism；905th, pole target stand plate；1001st, atmosphere
Division board；1002nd, air supply mechanism；1003rd, coldplate；1004th, cooling water pipe.
Specific embodiment
For further appreciating that present disclosure, in conjunction with accompanying drawing, the present invention is described in detail.
In conjunction with shown in Fig. 1, a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention, including executing plating
The vacuum chamber 1 of film work, the peripheral hardware pump group that coating process condition is provided, detection and the detection control system controlling plated film machining state
System；Wherein, it is provided with uncoiling mechanism 2, chill roll 7, rolling-up mechanism 8, negative electrode cell 10 in vacuum chamber 1, turn round and change target assembly 9 and
It is each provided with one group of reversing roller 5 for changing base band 3 direction, uncoiler at deviation correcting device 4, uncoiling mechanism 2 and rolling-up mechanism 8
Between structure 2 and reversing roller 5, between rolling-up mechanism 8 and reversing roller 5, respectively one group of deviation correcting device 4 is set, negative electrode cell 10 is located at cooling
The bottom of roller 7, the bottom located at negative electrode cell 10 for the target assembly 9 is changed in revolution, and chill roll 7, negative electrode cell 10 and time conversion target dress
Put 9 to be on same axis, be additionally provided with pretreating device 6 between uncoiling mechanism 2 and chill roll 7.Peripheral hardware pump group includes slightly
Take out pump assembly 14, cyropump 15 and molecule pump group, roughing vacuum pump unit 14 is connected with as shown in Figure 1 for supplying to process chamber
Air inlet electromagnetic valve 12 and the pumping electromagnetic valve 13 gas in vacuum chamber 1 quickly extracted out for control；Cyropump 15 is mainly used
In quick to pretreatment process in vacuum chamber 1 in the steam that produces cool down, cooperation roughing vacuum pump unit 14 and molecule pump group make
Reach capacity in vacuum chamber 1 vacuum state；Molecule pump group includes molecular pump extraction valve 16, molecular pump 17, backing pump pumping electromagnetism
Valve 18 and backing pump 19, after backing pump 19, backing pump pumping electromagnetic valve 18, molecular pump 17 and molecular pump extraction valve 16 are sequentially connected
It is connected with vacuum chamber 1, be mainly used in realization and be rapidly achieved end vacuum state.Detecting and controlling system includes gas analyser, true
Empty meter, gas flowmeter, optical fiber inductive probe, tension control system and computer, gas analyser in negative electrode cell 10,
For analyzing gas componant and content in negative electrode cell 10；Vacuometer in vacuum chamber 1, for measuring in vacuum chamber 1
Air pressure；Gas flowmeter on the admission line of negative electrode cell 10, for controlling the air inflow of negative electrode cell 10；Optical fiber senses
Probe stretches in negative electrode cell 10, is collected and surveyed online for the metal oxide gas out to target as sputter；Tension force
Control system located at uncoiling mechanism 2, chill roll 7, rolling-up mechanism 8 and on the jockey pulley in base band 3, for controlling flexible base
With 3 even running；Gas analyser, vacuometer, gas flowmeter are connected respectively at computer with optical fiber inductive probe, are used for
Each technological parameter is calculated and is controlled.
A kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present invention is it is intended to what execution plated film was worked is true
Empty room 1 internal structure improves, and changes target assembly 9 using revolution, can be according to need in the case of not opening plated film vacuum chamber
To change cathode target in time, and using winding and to unreel two groups of deviation correcting devices 4 and realize base band 3 and move back and forth, thus realizing multilamellar
Continuously being coated with of film layer, simplifies electrical control gear and program, every layer function film is all individually coated with, and is easy to coating process parameter
Control, improve plated film precision；Meanwhile, compact equipment, occupation of land space is little, is particularly suitable for Scientific Research in University Laboratory or small quantities of
Amount produces.
With reference to embodiment, the invention will be further described.
Embodiment
As shown in figure 1, a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present embodiment, including vacuum chamber
1st, it is sequentially arranged in uncoiling mechanism 2 in vacuum chamber 1, chill roll 7, rolling-up mechanism 8, the negative electrode cell 10 of upper and lower surface opening, return
Conversion target assembly 9 and deviation correcting device 4, are each provided with one group for changing base band 3 direction at uncoiling mechanism 2 and rolling-up mechanism 8
, located at the both sides of vacuum chamber 1, chill roll 7 is located at uncoiling mechanism 2 and rolling-up mechanism 8 for reversing roller 5, uncoiling mechanism 2 and rolling-up mechanism 8
Between on downward position, that is, uncoiling mechanism 2, rolling-up mechanism 8 and chill roll 7 are generally within three tops of an isosceles triangle
On point, advantageously reduce device space occupancy, compact conformation, rationally make use of the confined space in vacuum chamber 1；Base band 3
Two ends wrap around uncoiling mechanism 2, on rolling-up mechanism 8, the middle part of base band 3 bypasses the circumference table of chill roll 7 through reversing roller 5
Face, realizes the synchronous interaction of uncoiling mechanism 2, chill roll 7 and rolling-up mechanism 8 three, meanwhile, when plated film is processed, to chill roll 7
In be passed through -15～-20 DEG C of coolant, for reducing high temperature produced by plated film it is ensured that coating quality, after plated film terminates,
Chill roll 7 can be made to be quickly returning to room temperature state；Each between uncoiling mechanism 2 and reversing roller 5, between rolling-up mechanism 8 and reversing roller 5
One group of deviation correcting device 4 is set, and uncoiling mechanism 2 and rolling-up mechanism 8 are respectively provided with winding and unreel function, winding and unreel reciprocal
In motion, two groups of deviation correcting devices 4 may insure base band 3 winding neat in edge, ensures that base band 3 is reciprocating stable
Property；Negative electrode cell 10 is located at the bottom of chill roll 7, and negative electrode cell 10 is fixed on the circle corresponding with chill roll 7 circumferential surface
On the side wall of cylindrical chamber, the bottom located at negative electrode cell 10 for the target assembly 9 is changed in revolution, and chill roll 7, negative electrode cell 10 and revolution
Change target assembly 9 to be on same axis, target assembly 9 is changed in revolution can be by way of revolution, in the feelings not opening plated film vacuum chamber 1
Cathode target can be changed in time as needed under condition it is achieved that the function of multilayer film is continuously plated on base band 3, overcome existing plating
Need evacuation again when film machine changes target outside vacuum chamber 1, waste the deficiency of plenty of time and the energy.As shown in Fig. 2 this reality
Apply example and give the principle schematic diagram. that target assembly 9 is changed in a kind of revolution, this revolution is changed target assembly 9 and included being fixed on vacuum chamber 1
The support 901 of bottom, the rotary disk 903 being connected to by slew gear on support 901, by radial expansion mechanism 904 uniform
It is distributed in the two or more pole target stand plates 905 for installing target core 11 on rotary disk 903；Additionally, in order to one
Easily carry out the replacing of target core 11 after the completion of secondary plated film, the axial direction along rotary disk 903 axial stretching is additionally provided with support 901
Rotary disk 903 is stretched out vacuum chamber 1 together with pole target stand plate 905 thereon by axial stretching mechanism 902, no by telescoping mechanism 902
The replacing that vacuum chamber 1 can be carried out target core 11 need to be entered, simple to operation；Specifically in the present embodiment, pole target stand plate 905
It is evenly arranged with 4, after once changing target, at least can continuously plate more than 4 layers of functional membrane, and the target core 11 on pole target stand plate 905 is adopted
With flange connection, facilitate the disassembling, assembling and replacing of target core 11；Above-mentioned slew gear is motor, can drive rotary disk
903 do determine angle rotation, easy to control, accurate positioning；Axial stretching mechanism 902 include three section cartridge type guide rails and telescopic cylinder or
Oil cylinder or electric pushrod, in view of process environments requirement is higher in vacuum chamber 1, therefore preferably electric pushrod is preferable, and three section cartridge types are led
One end of rail is fixed on rotary disk 903, and the other end is on support 901；Guaranteed using three section cartridge type guide rails in the present embodiment
Axial stretching mechanism 902 has enough rigidity it is ensured that larger distance can be stretched out；Radial expansion mechanism 904 is also electricity
Dynamic push rod, each pole target stand plate 905 is controlled flexible by an electric pushrod.Pole target stand plate 905 rotates to negative electrode cell 10
Lower section, and stretched out in embedded negative electrode cell 10 by the pushing and withstanding effect of radial expansion mechanism 904, realize technique plated film；In conjunction with opening
Volume mechanism 2 and rolling-up mechanism 8 reciprocating operation, drive base band 3 move back and forth, thus realize base band 3 one side back and forth continuously plating many
Layer function film.
A kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present embodiment, deviation correcting device 4 entangles for ultrasound wave
System or the Photoelectric Error Correction System partially, specifically, for transparent base band 3, such as polyester film etc., being rectified a deviation using ultrasound wave is
System, for opaque base band 3, such as metallic film etc., using the Photoelectric Error Correction System or ultrasound wave deviation-rectifying system.Above-mentioned
The deviating correcting principle of ultrasound wave deviation-rectifying system or the Photoelectric Error Correction System is prior art, and here just repeats no more.As shown in figure 3, it is cloudy
Coldplate 1003, air supply mechanism 1002 and atmosphere division board 1001 are additionally provided with minimum room 10, gas isolating plate 1001 is arranged at
The both sides of negative electrode cell 10, coldplate 1003 is arranged on the outer wall of negative electrode cell 10, and cooling is distributed with coldplate 1003
Water pipe 1004, air supply mechanism 1002 is in negative electrode cell 10, and is connected with outside QI invigorating unit, in negative electrode cell 10 also
It is provided with vacuum device, and this vacuum device is connected with outside molecular pump.
Additionally, a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present embodiment, uncoiling mechanism 2 with cold
But it is additionally provided with pretreating device 6 between roller 7, this pretreating device 6 includes ion source pretreatment mechanism and cold well coil pipe deep cooling
Mechanism, ion source pretreatment mechanism is arranged between uncoiling mechanism 2 and chill roll 7, for cleaning the dirt on base band 3 surface；Cold
Well coil pipe deep cooling mechanism is provided close on vacuum chamber 1 inwall of uncoiling mechanism 2 downside, by the use of liquid nitrogen as cold-producing medium, can be 3
Environment temperature is made to drop to subzero 120 DEG C about in～5 minutes, for a large amount of water to release in base band 3 pretreatment process for the condensation
Vapour, and coordinate pumped vacuum systems to improve vacuum.In addition, for the ease of observing the working condition in vacuum chamber 1, in vacuum chamber 1
On be further opened with watch window.
A kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine of the present embodiment, during processing, by the base band 3 of rolling
It is set on uncoiling mechanism 2, the one end drawing base band 3 bypasses reversing roller 5 and chill roll 7 respectively as shown in Figure 1, and is fixed on receipts
In volume mechanism 8；The target core 11 being coated with needed for film layer is installed on corresponding pole target stand plate 905；Closing vacuum chamber 1, using outer
If pump group carries out evacuation to vacuum chamber 1, realize process conditions needed for plated film；During plated film, uncoiling mechanism 2 and rolling-up mechanism 8 are same
Step unreels and winds, and chill roll 7 synchronous interaction, realizes winding film plating simultaneously；(i.e. tunic after the completion of uncoiling mechanism 2 unreels
Layer has plated), radial expansion mechanism 904 shrinks, and pole target stand plate 905 exits in negative electrode cell 10, and slew gear is according to pre-
The programme-control rotary disk 903 first setting turns an angle, and changes another target core 11, and utilizes radial expansion mechanism 904
The pole target stand plate 905 fixing this target core 11 is ejected in embedded negative electrode cell 10, completes once to change target；After the completion of changing target, uncoiling
Mechanism 2 and rolling-up mechanism 8 start to rotate backward, i.e. the exchange function of uncoiling mechanism 2 and rolling-up mechanism 8, and chill roll 7 is also synchronous to be joined
Dynamic, realize being coated with of the second tunic；Repeat the above steps, are changed as a example target assembly 9 by the revolution with four groups of target cores 11, at least may be used
So that 4 tunic layers to be continuously coated with the one side of base band 3；After the completion of the target that revolution is changed on target assembly 9 is all coated with, shut down,
Using axial stretching mechanism 902, rotary disk 903 is released vacuum chamber 1, carry out changing target core 11 outside vacuum chamber 1.Due to opening
It is respectively provided with one group of deviation correcting device 4 at volume mechanism 2 and rolling-up mechanism 8, therefore can realize back and forth continuously moving of base band 3, reach
The processing purpose of plating multilayer film；Change target assembly 9 using revolution and realize fast quick change target in vacuum chamber 1, save change the target time and
Eliminate the repetition vacuum pumping repeatedly changed needed for target, time-saving energy-saving；Due to every layer of film layer in the base band 3 in the present invention all
For being individually coated with, the technological parameter being therefore directed to every layer of plated film all can individually control, the thickness of every tunic can with precise control, and
Be not in that interfere by process gas seepage produced by plated film simultaneously for traditional multiple cathode target, the high precision of plated film；Additionally, adopting
The structure of the present invention, the structure of magnetic-control sputtering coiling film coating machine is substantially simplified, electric control system that need not be complicated and journey
Sequence, greatly reduces occupation area of equipment, reduces device fabrication cost, is particularly suitable for Scientific Research in University Laboratory or small lot life
Produce.
Below schematically the present invention and embodiments thereof are described, this description does not have restricted, institute in accompanying drawing
Show is also one of embodiments of the present invention, and actual structure is not limited thereto.So, if the common skill of this area
Art personnel enlightened by it, in the case of without departing from the invention objective, without creatively designing and this technical scheme
Similar frame mode and embodiment, all should belong to protection scope of the present invention.
Claims (6)
1. the reciprocal continuous coating magnetic-control sputtering coiling film coating machine of a kind of one side, including vacuum chamber（1）, be sequentially arranged in vacuum chamber（1）
Interior uncoiling mechanism（2）, chill roll（7）, rolling-up mechanism（8）With negative electrode cell（10）It is characterised in that：Also include back conversion target
Device（9）And deviation correcting device（4）, described uncoiling mechanism（2）And rolling-up mechanism（8）Place is each provided with one group and is used for changing base band
（3）The reversing roller in direction（5）, described uncoiling mechanism（2）With reversing roller（5）Between, rolling-up mechanism（8）With reversing roller（5）It
Between one group of deviation correcting device is respectively set（4）；Described negative electrode cell（10）Upper and lower surface opening, and described negative electrode cell（10）If
In chill roll（7）Bottom, described revolution changes target assembly（9）Located at negative electrode cell（10）Bottom, and chill roll（7）, cloudy
Minimum room（10）Change target assembly with revolution（9）It is on same axis；Target assembly is changed in described revolution（9）Including support（901）、
Support is connected to by slew gear（901）On rotary disk（903）, pass through radial expansion mechanism（904）It is uniformly distributed in back
Rotating disk（903）On plural for installing target core（11）Pole target stand plate（905）；Described pole target stand plate（905）Rotation
Go to negative electrode cell（10）Lower section, and protruding by target core（11）Embedded negative electrode cell（10）Interior；Described uncoiling mechanism
（2）And rolling-up mechanism（8）Drive base band（3）Realize moving back and forth.
2. a kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side according to claim 1 it is characterised in that：Institute
The support stated（901）On be additionally provided with along rotary disk（903）The axial stretching mechanism of axial stretching（902）, for by rotary disk
（903）Move to vacuum chamber（1）Outside.
3. a kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side according to claim 2 it is characterised in that：Institute
The axial stretching mechanism stating（902）It is provided with three section cartridge type guide rails.
4. a kind of one side reciprocal continuous coating magnetic-control sputtering coiling film coating machine according to claim 1 or 2 or 3, its feature
It is：Described deviation correcting device（4）For ultrasound wave deviation-rectifying system or the Photoelectric Error Correction System.
5. a kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side according to claim 4 it is characterised in that：Institute
The uncoiling mechanism stated（2）With chill roll（7）Between be additionally provided with pretreating device（6）, described pretreating device（6）Including from
Component pretreatment mechanism and cold well coil pipe deep cooling mechanism, described ion source pretreatment mechanism is arranged at uncoiling mechanism（2）With cold
But roller（7）Between, for cleaning base band（3）The dirt on surface；Described cold well coil pipe deep cooling mechanism is located at uncoiling mechanism（2）Attached
Closely, for condensation to base band（3）A large amount of steam of release in pretreatment process.
6. a kind of reciprocal continuous coating magnetic-control sputtering coiling film coating machine of one side according to claim 5 it is characterised in that：Institute
The negative electrode cell stated（10）It is provided with coldplate（1003）, air supply mechanism（1002）With atmosphere division board（1001）, described gas
Atmosphere division board（1001）It is arranged at negative electrode cell（10）Both sides, described coldplate（1003）It is arranged at negative electrode cell（10）'s
On the wall of side, and coldplate（1003）On cooling water pipe is distributed with（1004）, described air supply mechanism（1002）Located at negative electrode cell
（10）Interior, and and vacuum chamber（1）Outside QI invigorating unit is connected, described negative electrode cell（10）Inside it is additionally provided with evacuator
Structure, and this vacuum device and vacuum chamber（1）Outside molecular pump is connected.
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| CN104674182B true CN104674182B (en) | 2017-03-08 |
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| CN106435516B (en) * | 2016-10-27 | 2020-04-21 | 无锡光润真空科技有限公司 | Magnetic control evaporation multifunctional winding film coating machine |
| CN110846892A (en) * | 2019-12-05 | 2020-02-28 | 浙江工业大学 | Winding type fiber film coating device in magnetron sputtering |
| CN114086147B (en) * | 2021-11-19 | 2024-01-26 | 合肥中隐新材料有限公司 | Winding type vacuum coating equipment for preparing photonic crystal film |
| CN115584473A (en) * | 2022-11-02 | 2023-01-10 | 广东振华科技股份有限公司 | Double-sided electron beam evaporation winding coating device and using method thereof |
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| JP2006249471A (en) * | 2005-03-09 | 2006-09-21 | Fuji Photo Film Co Ltd | Film deposition method |
| CN101191195A (en) * | 2006-11-21 | 2008-06-04 | 甘国工 | Magnetic-control sputtering coiling film coating machine |
| CN102994963A (en) * | 2012-04-18 | 2013-03-27 | 深圳市金凯新瑞光电有限公司 | Continuous winding sputter coating machine |
| CN203653686U (en) * | 2014-01-20 | 2014-06-18 | 深圳市金凯新瑞光电有限公司 | Film-coating device used for winding-type sputtering three-layer medium film |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20080029386A1 (en) * | 2006-08-01 | 2008-02-07 | Dorfman Benjamin F | Method and apparatus for trans-zone sputtering |
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| JP2006249471A (en) * | 2005-03-09 | 2006-09-21 | Fuji Photo Film Co Ltd | Film deposition method |
| CN101191195A (en) * | 2006-11-21 | 2008-06-04 | 甘国工 | Magnetic-control sputtering coiling film coating machine |
| CN102994963A (en) * | 2012-04-18 | 2013-03-27 | 深圳市金凯新瑞光电有限公司 | Continuous winding sputter coating machine |
| CN203653686U (en) * | 2014-01-20 | 2014-06-18 | 深圳市金凯新瑞光电有限公司 | Film-coating device used for winding-type sputtering three-layer medium film |
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Effective date of registration: 20171109 Address after: 213102, No. 333 East Changhong Road, Changzhou Town, Wujin District, Jiangsu, China Patentee after: LINGTONG EXHIBITION SYSTEM CO., LTD. Address before: 213022 Wushan Road, Xinbei District, Jiangsu, China, No. 1, No. Patentee before: Changzhou Polytechnic College |