CN110747445A - Film coating equipment and film coating method - Google Patents

Film coating equipment and film coating method Download PDF

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Publication number
CN110747445A
CN110747445A CN201810812461.7A CN201810812461A CN110747445A CN 110747445 A CN110747445 A CN 110747445A CN 201810812461 A CN201810812461 A CN 201810812461A CN 110747445 A CN110747445 A CN 110747445A
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China
Prior art keywords
winding
substrate
coating
control unit
winding devices
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Pending
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CN201810812461.7A
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Chinese (zh)
Inventor
陈立国
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Hongyi Technology Co.,Ltd.
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Beijing Apollo Ding Rong Solar Technology Co Ltd
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Application filed by Beijing Apollo Ding Rong Solar Technology Co Ltd filed Critical Beijing Apollo Ding Rong Solar Technology Co Ltd
Priority to CN201810812461.7A priority Critical patent/CN110747445A/en
Priority to PCT/CN2019/097341 priority patent/WO2020020179A1/en
Publication of CN110747445A publication Critical patent/CN110747445A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

The application discloses a coating device and a coating method, and belongs to the technical field of coating. The coating equipment comprises: control unit, coating film cavity, correspond two at least take-up device of a coating film cavity, wherein: at least two winding devices respectively complete the winding of the substrate; the control unit controls the at least two winding devices to alternately enter a film coating cavity so as to coat the film on the substrate. The coating device solves the problems that the exposure time of the coating cavity in the atmospheric environment is long, the time required by the coating cavity for vacuumizing is long, the duration required by the coating cavity for vacuumizing is reduced, the coating efficiency is improved, and the coating device is used for coating equipment.

Description

Film coating equipment and film coating method
Technical Field
The invention relates to the technical field of film coating, in particular to film coating equipment and a film coating method.
Background
The coating process usually requires a controllable and relatively stable environment, and the vacuum environment has the characteristics of controllability and stability, so that the coating equipment is widely applied to the coating process.
The coating equipment comprises a winding device and a coating cavity. For example, when coating one of the substrates, a worker needs to mount the substrate on a winding device, put the winding device carrying the substrate into a coating chamber, control the coating chamber to be vacuumized, and coat the substrate after vacuumization. After the substrate is coated, the worker needs to move the winding device carrying the substrate out of the coating cavity and take the coated substrate off the winding device. Then, the above steps can be repeated to coat other substrates. It should be noted that before the winding device carrying one substrate is moved out of the coating cavity, the coating cavity is usually opened, and in the process of installing the next substrate on the winding device and placing the winding device carrying the next substrate into the coating cavity, the coating cavity is continuously in an open state; after the winding device carrying the next substrate enters the coating cavity, the coating cavity is closed.
Because the installation time of the substrate on the winding device is usually long, if the coating cavity is opened before the substrate is installed, the exposure time of the coating cavity in the atmospheric environment is long, and further, after the substrate enters the coating cavity, the time required for vacuumizing the coating cavity is long, and the coating efficiency and the product quality are affected.
Disclosure of Invention
The application provides a coating device and a using method thereof, which can solve the problem that the time required for vacuumizing a coating cavity is long, and the technical scheme is as follows:
in one aspect, there is provided a plating apparatus including: control unit, coating film cavity, correspond two at least take-up device of a coating film cavity, wherein:
the at least two winding devices respectively complete the winding of the substrate;
the control unit controls the at least two winding devices to alternately enter the coating cavity so as to coat the substrate.
Optionally, the control unit is configured to control the at least two winding devices to sequentially perform the following steps: after one of the at least two winding devices finishes winding one substrate, the control unit controls one of the at least two winding devices to enter the coating cavity so as to coat the one substrate;
after the coating of the substrate is finished, the control unit controls one of the at least two winding devices to move out of the coating cavity;
controlling the other of the at least two winding devices which finish winding the other substrate to enter the coating cavity so as to coat the other substrate;
and after the other substrate is coated, the control unit controls the other of the at least two winding devices to move out of the coating cavity.
Optionally, the coating apparatus further includes a conveying device, a winding position and a loading/unloading position are provided on the conveying device, the control unit controls the at least two winding devices to move between the loading/unloading position and the winding position, the winding device completes winding of the substrate at the winding position, and the winding device enters and moves out of the coating chamber at the loading/unloading position.
Optionally, the conveying device comprises: at least one guide rail, on which the at least two winding devices are movably arranged.
Optionally, the number of the guide rails is one, the guide rails are located on one side of the coating cavity, the at least two winding devices are sequentially arranged on the guide rails, the guide rails are provided with one loading and unloading position and two winding positions, and the two winding positions are respectively arranged on two sides of the loading and unloading position.
Optionally, the number of the guide rails is one, the guide rails are in an open ring shape, the at least two winding devices are sequentially arranged on the guide rails, the loading and unloading positions are respectively arranged at two end portions of the guide rails, and the winding positions are arranged at any position of the guide rails.
Optionally, the number of the guide rails is multiple, one of the at least two winding devices is movably disposed on each of the guide rails, and one of the loading and unloading positions and one of the winding positions are disposed on each of the guide rails.
Optionally, the control unit is further configured to control the at least two winding devices to wind the substrate.
On the other hand, a film coating method is provided, and the film coating method comprises the following steps:
the at least two winding devices respectively complete the winding of the substrate;
the control unit controls the at least two winding devices to alternately enter the film coating cavity so as to coat the film on the substrate.
Optionally, the controlling unit controls the at least two winding devices to alternately enter the film coating cavity to coat the substrate, and specifically includes:
after one of the at least two winding devices finishes winding one substrate, the control unit controls one of the at least two winding devices to enter the coating cavity so as to coat the one substrate;
after the coating of the substrate is finished, the control unit controls one of the at least two winding devices to move out of the coating cavity;
controlling the other of the at least two winding devices which finish winding the other substrate to enter a film coating cavity so as to coat the other substrate;
after the other substrate is coated, the control unit controls the other of the at least two winding devices to move out of the coating cavity;
and the at least two winding devices sequentially execute the steps until the film coating is finished.
The beneficial effect that technical scheme that this application provided brought includes at least:
in the coating equipment provided by the embodiment of the invention, the control unit can control at least two winding devices to alternately enter one coating cavity so as to coat the substrate. Therefore, after the control unit controls one winding device to enter the coating cavity, the other winding device can complete the winding of the substrate in advance. After the control unit controls the winding device to move out of the coating cavity, the other winding device can be immediately conveyed into the coating cavity. Therefore, the time of the coating cavity in an open state can be greatly reduced, the exposure time of the coating cavity in the atmospheric environment is reduced, the time required for vacuumizing the coating cavity is further reduced, and the coating efficiency and the product quality are improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a first coating apparatus provided in an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a second coating apparatus provided in an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a third coating apparatus provided in an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a fourth coating apparatus provided in the embodiment of the present invention;
FIG. 5 is a schematic structural diagram of a fifth coating apparatus according to an embodiment of the present invention;
FIG. 6 is a schematic structural diagram of a winding device according to an embodiment of the present invention;
FIG. 7 is a flow chart of a coating method according to an embodiment of the present invention;
fig. 8 is a flowchart of another coating method according to an embodiment of the present invention.
Detailed Description
To make the objects, technical solutions and advantages of the present application more clear, embodiments of the present application will be described in further detail below with reference to the accompanying drawings.
The film has been widely used because of its many features such as less material used, light weight and easy surface processing. The substrate is typically coated with a coating apparatus to form a thin film on the substrate.
Fig. 1 is a schematic structural diagram of a first film coating apparatus provided in an embodiment of the present invention, and as shown in fig. 1, the film coating apparatus 0 may include: a control unit 03, a coating chamber 01, and at least two winding devices (such as a winding device 021 and a winding device 022) corresponding to one coating chamber.
It should be noted that, in fig. 1, the coating apparatus 0 includes two winding devices as an example, optionally, the number of the winding devices in the coating apparatus 0 may also be other values, such as 3, 4, or 5, and the embodiment of the present invention does not limit this.
At least two winding devices respectively complete the winding of the substrate (not shown in fig. 1); the control unit 03 controls at least two winding devices to alternately enter one coating cavity 01 so as to coat the substrate.
In summary, the coating apparatus provided in the embodiment of the invention includes a coating chamber, at least two winding devices, and a control unit, and the control unit can control the at least two winding devices to alternately enter the coating chamber, so as to coat a substrate on the winding devices. Therefore, after the control unit controls one winding device to enter the coating cavity, the other winding device can complete the winding of the substrate in advance. After the control unit controls the winding device to move out of the coating cavity, the control unit can immediately control the other winding device to enter the coating cavity. Therefore, the time length of the coating cavity in the open state can be greatly reduced, the exposure time of the coating cavity in the atmospheric environment is reduced, the time length of the coating cavity required for vacuumizing is reduced, and the coating efficiency and the product quality are improved.
It should be noted that the coating apparatus 0 may include at least one coating cavity 01, and in fig. 1, only one coating cavity 01 is illustrated as the example of the coating apparatus 0, and optionally, the coating apparatus 0 may further include a plurality of coating cavities 01, that is, the coating apparatus includes a plurality of coating cavities, and at least two winding devices corresponding to one coating cavity are controlled by the control unit in a unified manner, which is not limited in the embodiment of the present invention.
In the embodiment of the present invention, after one of the at least two winding devices (e.g., the winding device 021) finishes winding one substrate, the control unit 03 controls the winding device to enter the coating chamber 01 to coat the one substrate; after the coating of the substrate is completed, the control unit 03 controls one of the at least two winding devices (e.g., the winding device 021) to move out of the coating chamber 01. The control unit 03 controls the other of the at least two winding devices (such as the winding device 022) which finishes winding the other substrate to enter the coating chamber 01 so as to coat the other substrate; after the other substrate is coated, the control unit 03 may control the other of the at least two winding devices (e.g., the winding device 022) to move out of the coating chamber 01.
Optionally, the coating chamber 01 may include: the door body 012 can move in a direction X3 close to the chamber 011, or the door body 012 can move in a direction X2 away from the chamber 011. Optionally, the coating cavity 01 may further include: the telescopic structure 013, telescopic structure 013 connect cavity 011 and door body 012, and control unit 03 is used for through the flexible structure 013 control stretch out and draw back to drive door body 012 and remove. For example, when the telescopic structure 013 is stretched, the door body 012 moves away from the chamber 011 by the telescopic structure 013; when the telescopic structure 013 is contracted, the door body 012 moves close to the chamber 011 by the telescopic structure 013.
Further, the chamber 011 may include: chamber body 0111, coating by vaporization structure 0112 and air exhaust structure 0113. The evaporation structure 0112 is disposed in the chamber body 0111 and configured to evaporate a substrate entering the chamber body 0111, and the evaporation mode may be a chemical vapor deposition mode or a physical vapor deposition mode, which is not limited in the embodiments of the present invention. Air exhaust structure 0113 can be located outside chamber body 0111, and communicates with chamber body 0111 for carry out the evacuation to chamber body 0111. The control unit 03 can be used for controlling the air exhaust structure 0113 to vacuumize the cavity body 0111 and controlling the evaporation structure 0112 to evaporate the substrate.
Optionally, the coating apparatus may further include: a conveying device (not shown in fig. 1) which can be provided with a winding position where the winding device completes the winding of the substrate and a loading and unloading position where the winding device enters the coating chamber 01 and moves out of the coating chamber 01. The control unit 03 can control the movement of at least two winding devices between the loading and unloading position and the winding position.
Optionally, the conveying device may include: at least one guide rail 04, at least two winding devices are movably arranged on the at least one guide rail 04. For example, the bottom of each winding device may be provided with a pulley, and the winding device may be moved on the guide rail by the pulley. Both the winding position and the loading and unloading position can be located on the guide rail 04.
Before controlling at least two winding devices to alternately enter the coating cavity 01, the control unit 03 can also be used for controlling the door body 012 to move along the direction X2 away from the cavity 011, so as to separate the door body 012 and the cavity 011. The conveying device may further include: the control unit 03 can also move the winding device from the loading and unloading position to a position between the door body 012 and the chamber 011 through the lifting device (not shown in fig. 1) after the winding device reaches the loading and unloading position, so as to clamp the winding device in the door 012. After that, the control unit 03 can also control the door 012 to move along the direction X3 close to the chamber 011 with the winding device, so as to send the winding device into the chamber 011. At this time, the cavity 011 is buckled with the door body 012, the coating cavity 01 is in a closed state, and the control unit 03 can control the coating cavity 01 to coat the substrate on the winding device.
After the substrate on the winding device is coated, the control unit 03 can control the winding device to move out of the coating chamber 01. When the winding device is controlled to move out of the coating chamber 01, the control unit 03 can control the door 012 to drive the winding device to move along the direction X2 away from the chamber 011, and move the winding device to the loading/unloading position in combination with the lifting device, and then can control the winding device to move from the loading/unloading position to the winding position to rewind a new substrate after unloading the coated substrate.
It should be noted that at least one guide rail in the coating device can have various implementations, and several implementations of the guide rail 04 will be exemplified below.
A first implementation manner of the guide rail may be as shown in fig. 1, and the number of the guide rail 04 may be one, and the guide rail 04 is located at one side of the coating chamber 01. In the embodiment of the present invention, the guide rail 04 is located at the side where the air exhaust structure 0113 in the film coating cavity 01 is located, optionally, the guide rail 04 may also be located at another side (for example, the opposite side to the side where the air exhaust structure 0113 is located) in the film coating cavity 01, which is not limited in the embodiment of the present invention. Alternatively, the extending direction of the guide rail 04 may be parallel to the direction X2 or the direction X3 in which the door 012 moves, and all the winding devices in the coating apparatus 0 may be arranged on the guide rail 04 in sequence.
For example, the at least two winding devices may be a winding device 021 and a winding device 022, one loading and unloading position and two winding positions may be disposed on the guide rail, and the two winding positions are disposed at both sides of the loading and unloading position, respectively, and the two winding devices may wind the substrate at the two winding positions, respectively.
After a winding device 021 winds a substrate at a winding position, the control unit 03 can control the winding device 021 to move from the winding position to the loading and unloading position, so that the winding device 021 is conveyed into the chamber 011 through the door body 012 and the lifting device, and the substrate on the winding device 021 is coated. After the coating of the substrate on the winding device 021 is finished, the winding device 021 can be moved out of the chamber to a loading and unloading position through the door 012 and the lifting device, and the winding device 021 is controlled to move to a winding position of the winding substrate again to unload the substrate.
Further, after the one winding device 021 enters the chamber 011, the control unit 03 can control the other winding device 022 to finish winding another substrate at the other winding position 022, and after the one winding device 021 is moved out of the chamber 011 to the one winding position, can control the other winding device 022 to move from the other winding position to the loading and unloading position and move to the chamber 011 for coating the substrate. After the coating of the substrate on the other winding device 022 is completed, the winding device 022 may be moved out of the chamber 011 to the loading/unloading position by the door 012 and the lifting device, and the substrate may be unloaded by controlling the winding device 022 to move to another winding position again.
A second implementation manner of the guide rails may be as shown in fig. 2, where the number of the guide rails 04 is two, and the two guide rails 04 may be respectively disposed on two sides of the coating cavity (e.g., the side where the air exhaust structure 0113 is located in the coating cavity and the opposite side of the side). And the extending direction of each guide rail 04 may be parallel to the direction X2 or the direction X3 in which the door body moves.
Illustratively, the at least two winding devices may be a winding device 021 and a winding device 022, and each guide rail 04 may be provided with one winding position, one handling position, and one winding device, and the winding device winds the substrate at the winding position.
After the winding device 021 on one guide rail 04 winds the substrate at one winding position, the control unit 03 can control the winding device 021 to move to a loading and unloading position on the one guide rail 04 so as to control the winding device 021 to enter the chamber 011 through the door body 012 and the lifting device, so as to coat the substrate on the winding device 021. After the coating of the substrate on the winding device 021 is finished, the winding device 021 can be moved out of the chamber 011 to a loading and unloading position on the one guide rail 04 through the door body 012 and the lifting device, and the winding device 021 is controlled to move to the winding position on the one guide rail 04 again so as to unload the substrate.
Further, after the one winding device 021 enters the chamber 011, the control unit 03 can control the other winding device 022 on the other guide rail 04 to wind the substrate, and after the one winding device 021 is moved out of the chamber 011 to the winding position, can control the other winding device 022 to move on the other guide rail to another loading and unloading position and move to the chamber 011 for coating the substrate. After the coating of the substrate on the other winding device 022 is completed, the winding device 022 may be moved out of the chamber 011 to the loading/unloading position by the door 012 and the lifting device, and the winding device 022 may be controlled to move to another winding position on the other guide rail 04 again to unload the substrate.
As shown in fig. 3, the number of the guide rails 04 in the coating apparatus 0 is one, the guide rails 04 are in an open ring shape, and the door 012 is close to the opening of the guide rails 04. All the winding devices in the coating equipment can be arranged on the guide rail in sequence. The ring shape may be a circular ring shape, an elliptical ring shape, or a rectangular ring shape, and embodiments of the present invention are not limited herein.
For example, the at least two winding devices may be a winding device 021 and a winding device 022, both end portions of the guide rail 04 may be respectively provided with a loading and unloading position, and a winding position is provided at an arbitrary position of the guide rail.
After a winding device 021 winds a substrate, the control unit 03 controls the winding device 021 to move to a loading and unloading position of one end of the guide rail 04, so that the winding device 021 is controlled to enter the chamber 011 through the door 012 and the lifting device, and the substrate on the winding device 021 is coated. After the coating of the substrate on the winding device 021 is finished, the winding device 021 can be moved out of the chamber to the loading and unloading position at the other end of the guide rail 04 through the door 012 and the lifting device, and the winding device 021 is controlled to move on the guide rail 04 to the winding position to unload the substrate.
Further, after the one winding device 021 enters the chamber 011, the control unit 03 may control the other winding device 022 to finish the winding of the substrate at the winding position. Before the one winding device 021 moves out of the chamber 011 to the loading and unloading position of the other end part of the guide rail 04, the other winding device 022 can be controlled to move on the guide rail 04 from the winding position to the loading and unloading position of the one end part of the guide rail 04 to wait, and after the one winding device 021 moves out of the chamber 011 to the loading and unloading position of the other end part of the guide rail 04, the other winding device 022 can be controlled to move into the chamber 011 by the door body 012 and the lifting device to perform the film coating of the substrate. After the coating of the substrate on the other winding device 022 is completed, the winding device 022 may be moved out of the chamber 011 to the loading/unloading position by the door 012 and the lifting device, and the winding device 022 may be controlled to move to the loading/unloading position of the other end of the guide rail 04 again, and the winding device 022 may be controlled to move to the winding position on the guide rail 04 to unload the substrate.
It should be noted that the winding device moves to the loading and unloading position of one end portion of the guide rail or the loading and unloading position of the other end portion of the guide rail before entering the chamber 011, which is not limited herein, as long as at least two winding devices are ensured to smoothly perform the coating.
A fourth implementation of the guide rail can be shown in fig. 4, where the number of the guide rails 04 is plural, each guide rail is movably provided with a winding device, and each guide rail is provided with a loading and unloading position and a winding position. Illustratively, the number of the guide rails 04 is two, and the two guide rails are all arranged on one side of the coating cavity 01. Fig. 4 illustrates an example where the two guide rails are located on the side where the air-extracting structure 0113 is located in the film-coating cavity, alternatively, the two guide rails may also be located on other sides (e.g., the opposite side to the side where the air-extracting structure is located) of the film-coating cavity, which is not limited in this embodiment of the present invention. The extending direction of each guide rail 04 may be perpendicular to the direction X2 or the direction X3 in which the door body moves, and is not limited herein. Alternatively, a winding device may be provided on each guide rail.
For example, the at least two winding devices may be a winding device 021 and a winding device 022, and after one winding device 021 winds the substrate, the control unit 03 may control the winding device to move on a guide rail 04 where the winding device is located from a winding position to a loading and unloading position, so as to control the winding device 021 to enter the chamber 011 through the door body 012 and the lifting device to coat the substrate on the winding device 021. After the coating of the substrate on the winding device 021 is finished, the winding device 021 can be moved out of the chamber 011 to the loading and unloading position through the door body 012 and the lifting device, and the winding device is controlled to move to the winding position of the winding device for winding the substrate again so as to unload the substrate.
Further, after the one winding device 021 enters the chamber 011, the control unit 03 can control another winding device 022 to wind the substrate, and after the one winding device 021 moves out of the chamber 011 to the winding position, can control the another winding device 022 to move on another guide rail 04 where the another winding device 021 is located to the loading and unloading position on the guide rail 04, and move to the chamber 011 for coating the substrate. After the coating of the substrate on the other winding device 022 is completed, the winding device 022 may be moved out of the chamber 011 to the loading/unloading position by the door 012 and the lifting device, and the winding device 022 may be controlled to move to the winding position on the other guide rail 04 again to unload the substrate.
A fifth implementation manner of the guide rails may be as shown in fig. 5, and on the basis of fig. 4, a plurality of guide rails may also be distributed on two sides of the coating cavity, such as the side where the air exhaust structure 0113 in the coating cavity is located and the opposite side thereof. It should be noted that, as for the process of controlling the plurality of winding devices (such as the winding device 021 and the winding device 022) in fig. 5 to alternately enter the chamber 011, reference may be made to the process of controlling the plurality of winding devices in fig. 4 to alternately enter the chamber 011, and the description of the embodiment of the present invention is not repeated herein.
In the above several guide rail implementations, the extending direction of the guide rail may be parallel to the direction X2 or X3 in which the door body moves, or perpendicular to the direction X2 or X3 in which the door body moves, that is, the extending direction of the guide rail forms an angle of 0 degree or 90 degrees with the direction X2 or X3 in which the door body moves. Optionally, an included angle between the extending direction of the guide rail and the moving direction X2 or X3 of the door body may also be not 0 degree or 90 degrees, for example, the included angle may be 1 degree, and the like, which is not limited in the embodiment of the present invention.
In addition, the winding position on the guide rail may be one or more, that is, the winding device may wind the substrate at one or more winding positions on the guide rail, which is not limited in the embodiment of the present invention. The plurality of winding devices may sequentially wind the substrate according to the winding manner, and optionally, the plurality of winding devices may completely wind the substrate before entering the cavity, which is not limited in the embodiment of the present invention. The guide rail in the conveying device may also be replaced by other structures that can control the movement of the winding device, for example, the guide rail may be replaced by a suspension, which is not limited in the embodiment of the present invention.
Alternatively, the structures of all the winding devices in the coating apparatus may be the same, and the structure of one of the winding devices will be explained below.
Fig. 6 is a schematic structural diagram of a winding device according to an embodiment of the present invention, and with reference to fig. 6 and any one of fig. 1 to 5, the winding device may include: support Z1, rolling structure Z2, unreeling structure Z3 and roller Z4. The winding structure Z2, the unreeling structure Z3 and the roller passing Z4 are all arranged on a support Z1, the substrate A is in a roll shape and is sleeved on the unreeling structure Z3, and one end of the substrate A passes through the roller passing Z4 and is wound on the winding structure Z2; the control unit 03 is used for controlling the winding structure Z2 to wind the substrate a when the coating cavity 01 coats the substrate a.
It should be noted that, when the substrate a is wound by the winding structure Z2, the substrate a continues to be wound onto the winding structure Z2 under the action of the winding structure Z2, and at this time, the unwinding structure Z3 unwinds the substrate, that is, the substrate is continuously separated from the unwinding structure Z3. For example, the winding structure Z2, the unwinding structure Z3 and the roller Z4 may be cylindrical, and the winding structure Z2 may actively wind the substrate a by rotating around its axis; when the substrate a is wound by the winding structure Z2, the unwinding structure Z2 and the passing roller Z4 may also actively rotate around their axes, and optionally, the unwinding structure Z2 and the passing roller Z4 may also not actively rotate, but passively rotate under the driving of the winding structure Z2, which is not limited in the embodiment of the present invention.
Optionally, with continuing to combine fig. 6 and any one of fig. 1 to 5, the winding device may further include: the inspection structure Z5, the substrate a may be in the form of a strip, one end of the substrate a passes through the roller Z4 and the inspection structure Z5 and is wound on the winding structure Z2. It should be noted that the winding device may include one pass roller Z4 or multiple pass rollers Z4, and in the embodiment of the present invention, the winding device includes two pass rollers Z4 as an example; the roller Z4 and the detecting structure Z5 in the winding device may be sequentially arranged between the unwinding structure Z3 and the winding structure Z2, and in the embodiment of the present invention, the detecting structure Z5 is located between two rollers Z4 as an example.
The detection structure Z5 can be used to detect whether the winding direction B of the substrate a is parallel to the length direction C of the substrate a; the control unit 03 may be further configured to control at least one of the winding structure Z2 and the unwinding structure Z3 to move along the width direction D of the substrate a when the winding direction B of the substrate a is not parallel to the length direction C of the substrate a, so as to adjust the relative positions of the two ends of the substrate a in the width direction D of the substrate a, and thus adjust the winding direction B of the substrate a.
Optionally, the substrate in the embodiment of the present invention may include: metal films (e.g., copper foil, aluminum foil, stainless steel foil, and alloy film) and non-metal films (e.g., polyethylene terephthalate film, polyethylene film, polyamide film, and various composite films). The film layer formed on the substrate in the embodiment of the present invention may include: photovoltaic films, flexible display films, or high barrier films, and the like.
In summary, in the coating apparatus provided in the embodiment of the present invention, the coating apparatus includes a coating chamber, at least two winding devices, and a control unit, and the control unit can control the at least two winding devices to alternately enter the coating chamber, so as to coat a substrate on the winding devices. Specifically, after the control unit controls one winding device to enter the coating cavity, the other winding device can complete the winding of the substrate in advance. After the control unit controls the winding device to move out of the coating cavity, the control unit can immediately control the other winding device to enter the coating cavity. Therefore, the time length of the coating cavity in the open state can be greatly reduced, the exposure time of the coating cavity in the atmospheric environment is reduced, the time length of the coating cavity required for vacuumizing is reduced, and the coating efficiency and the product quality are improved.
Fig. 7 is a flowchart of a coating method according to an embodiment of the present invention, and the coating apparatus 0 shown in any one of fig. 1 to 5 is adopted, as shown in fig. 7, the coating method may include:
and 701, completing the winding of the substrate by at least two winding devices respectively.
And 702, controlling at least two winding devices to alternately enter a coating cavity so as to coat the substrate.
In summary, the coating method provided by the embodiment of the invention employs the coating apparatus including the coating chamber, at least two winding devices and the control unit, and the control unit can control the at least two winding devices to alternately enter the coating chamber to coat the substrate on the winding devices. Further, after the control unit controls one winding device to enter the coating cavity, the other winding device can complete the winding of the substrate in advance. After the control unit controls the winding device to move out of the coating cavity, the control unit can immediately control the other winding device to enter the coating cavity. Therefore, the time length of the coating cavity in the open state can be greatly reduced, the exposure time of the coating cavity in the atmospheric environment is reduced, the time length of the coating cavity required for vacuumizing is reduced, and the coating efficiency and the product quality are improved.
Fig. 8 is a flowchart illustrating a process of controlling a winding device to alternately enter a coating chamber according to an embodiment of the present invention, as shown in fig. 8, step 702 may include:
7021, after one of the at least two winding devices finishes winding one substrate, the control unit controls one of the at least two winding devices to enter the film coating cavity so as to coat one substrate.
For example, the substrate may be in a roll shape, and when the substrate is loaded on the winding device, the substrate may be firstly sleeved on the unwinding structure in the winding device, and then, one end of the substrate is wound on the winding structure through a roller, so that the substrate is supported between the unwinding structure and the winding structure (i.e. the tension of the substrate is pre-controlled). Alternatively, one end of the substrate may be wound on the winding structure two to five turns.
The winding structure, the unwinding structure and the roller can be columnar, and the winding structure can actively rotate around the shaft of the winding structure so as to wind the substrate; when the substrate is rolled by the rolling structure, the unwinding structure and the passing roller can also actively rotate around the axes thereof, and optionally, the unwinding structure and the passing roller can also passively rotate under the driving of the rolling structure instead of actively rotating.
Alternatively, the winding of the substrate by the winding device may be controlled by the control unit, or the winding of the substrate by the winding device may be controlled manually, which is not limited by the embodiment of the present invention.
It should be noted that, before the control unit controls the at least two winding devices to alternately enter the film coating cavity, the control unit needs to control the door body to move in a direction away from the cavity, so that the door body is separated from the cavity.
The control unit may control the winding device to move to the loading and unloading position after one winding device completes winding one substrate. The control unit can then move the winding device from the loading and unloading position into the chamber via the door and the lifting device. At the moment, the cavity is buckled with the door body, the coating cavity is in a closed state, and the control unit can control the coating cavity to coat the substrate on the winding device.
Optionally, when the coating cavity is controlled to coat a substrate, the winding structure can be controlled by the control unit to wind the substrate, so that the evaporation structure can coat films on all positions on the substrate.
7022, after the coating of one substrate is finished, the control unit controls one of the at least two winding devices to move out of the coating cavity.
After a substrate wound on one winding device is coated, the control unit can control the door body to move towards the direction far away from the chamber so as to drive the winding device to move out of the chamber, move to the loading and unloading position and further move to the winding position.
Step 7023, the control unit controls another of the at least two winding devices that finish winding another substrate to enter the coating chamber, so as to coat another substrate.
It should be noted that after one winding device winds the substrate and enters the coating chamber, another winding device may start winding another substrate, or the other winding device may wind another substrate in advance before one winding device enters the coating chamber. That is, it is not necessary to wait for one winding device to move out of the coating chamber, and another substrate can be wound on another winding device in advance to prepare for evaporation of another substrate. After one winding device moves out of the coating cavity, the control unit can control the other winding device to immediately enter the coating cavity so as to coat the other substrate wound on the other winding device.
7024, after the other substrate is coated, the control unit controls the other of the at least two winding devices to move out of the coating cavity.
After the coating of the other substrate wound on the other winding device is finished, the control unit can control the door body to move in the direction away from the chamber so as to drive the other winding device to move out of the chamber, move to the loading and unloading position and further move to the winding position.
7025, at least two winding devices sequentially execute the above steps until the film coating is finished.
It should be noted that, in the embodiment of the present invention, only two winding devices are controlled to alternately enter the film coating cavity as an example, optionally, if more winding devices need to be controlled to alternately enter the film coating cavity, the above steps (step 7021 to step 7024) may be sequentially performed to control more winding devices to alternately enter the film coating cavity, which is not described herein again.
In summary, the coating apparatus adopted in the coating method provided by the embodiment of the invention includes a coating cavity, at least two winding devices, and a control unit, and the control unit can control the at least two winding devices to alternately enter the coating cavity, so as to coat the substrate on the winding devices. Further, after the control unit controls one winding device to enter the coating cavity, the other winding device can complete the winding of the substrate in advance. After the control unit controls the winding device to move out of the coating cavity, the control unit can immediately control the other winding device to enter the coating cavity. Therefore, the time length of the coating cavity in the open state can be greatly reduced, the exposure time of the coating cavity in the atmospheric environment is reduced, the time length of the coating cavity required for vacuumizing is reduced, and the coating efficiency and the product quality are improved.
It should be noted that, the method embodiment provided in the embodiment of the present invention can be mutually referred to a corresponding apparatus embodiment, and the embodiment of the present invention does not limit this. The sequence of the steps of the method embodiments provided by the embodiments of the present invention can be appropriately adjusted, and the steps can be correspondingly increased or decreased according to the situation, and any method that can be easily conceived by those skilled in the art within the technical scope disclosed by the present invention shall be covered by the protection scope of the present invention, and therefore, the detailed description thereof shall not be repeated.
The above description is only exemplary of the present application and should not be taken as limiting, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.

Claims (10)

1. A plating apparatus, characterized by comprising: control unit, coating film cavity, correspond two at least take-up device of a coating film cavity, wherein:
the at least two winding devices respectively complete the winding of the substrate;
the control unit controls the at least two winding devices to alternately enter the coating cavity so as to coat the substrate.
2. The plating apparatus according to claim 1, wherein the control unit is configured to control the at least two winding devices to sequentially perform:
after one of the at least two winding devices finishes winding one substrate, the control unit controls one of the at least two winding devices to enter the coating cavity so as to coat the one substrate;
after the coating of the substrate is finished, the control unit controls one of the at least two winding devices to move out of the coating cavity;
the control unit controls the other of the at least two winding devices which finish winding the other substrate to enter the film coating cavity so as to coat the other substrate;
and after the other substrate is coated, the control unit controls the other of the at least two winding devices to move out of the coating cavity.
3. The plating apparatus according to claim 1 or 2, further comprising a transport device provided with a winding position and a loading/unloading position, wherein the control unit controls the at least two winding devices to move between the loading/unloading position and the winding position, wherein the winding devices complete winding of the substrate, and wherein the winding devices enter and exit the plating chamber at the loading/unloading position.
4. The plating apparatus according to claim 3, wherein the conveying device comprises: at least one guide rail, on which the at least two winding devices are movably arranged.
5. The plating device according to claim 4, wherein the number of the guide rail is one, the guide rail is located on one side of the plating chamber, the at least two winding devices are arranged in sequence on the guide rail, one loading and unloading position and two winding positions are arranged on the guide rail, and the two winding positions are respectively arranged on two sides of the loading and unloading position.
6. The plating apparatus according to claim 4, wherein the number of the guide rail is one, the guide rail has an open ring shape, the at least two winding devices are sequentially arranged on the guide rail, the attaching and detaching positions are provided at both ends of the guide rail, respectively, and the winding position is provided at an arbitrary position of the guide rail.
7. The plating apparatus according to claim 4, wherein the number of the guide rails is plural, one of the at least two winding devices is movably provided on each of the guide rails, and one of the loading and unloading positions and one of the winding positions are provided on each of the guide rails.
8. The plating apparatus according to claim 1, wherein the control unit is further configured to control the at least two winding devices to wind the substrate.
9. A plating method characterized by using the plating apparatus according to any one of claims 1 to 8, the plating method comprising:
the at least two winding devices respectively complete the winding of the substrate;
the control unit controls the at least two winding devices to alternately enter the film coating cavity so as to coat the film on the substrate.
10. The coating method according to claim 9, wherein the control unit controls the at least two winding devices to alternately enter the coating chamber to coat the substrate, and specifically comprises:
after one of the at least two winding devices finishes winding one substrate, the control unit controls one of the at least two winding devices to enter the coating cavity so as to coat the one substrate;
after the coating of the substrate is finished, the control unit controls one of the at least two winding devices to move out of the coating cavity;
controlling the other of the at least two winding devices which finish winding the other substrate to enter a film coating cavity so as to coat the other substrate;
after the other substrate is coated, the control unit controls the other of the at least two winding devices to move out of the coating cavity;
and the at least two winding devices sequentially execute the steps until the film coating is finished.
CN201810812461.7A 2018-07-23 2018-07-23 Film coating equipment and film coating method Pending CN110747445A (en)

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PCT/CN2019/097341 WO2020020179A1 (en) 2018-07-23 2019-07-23 Coating apparatus and coating method

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103935081A (en) * 2014-02-26 2014-07-23 东莞市万丰纳米材料有限公司 Permeable material with inorganic sterilization effect, and preparation method thereof
CN104651799A (en) * 2015-03-09 2015-05-27 常州工学院 Automatic flexible substrate double-side continuous coiling magnetron sputtering coating production line
CN204954176U (en) * 2015-07-21 2016-01-13 超快激光(天津)机械设备有限公司 Laser cutting machine's material platform manual switching device
CN105826427A (en) * 2016-03-29 2016-08-03 无锡奥特维科技股份有限公司 Welding strip processing device and method
CN106086808A (en) * 2016-08-02 2016-11-09 南京金盛达镀膜科技有限公司 A kind of devices of coiled vacuum coating machine and coating process
CN106241400A (en) * 2016-08-31 2016-12-21 江苏华宇印涂设备集团有限公司 The double feed control method of charger
CN209162185U (en) * 2018-07-23 2019-07-26 北京铂阳顶荣光伏科技有限公司 Filming equipment

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101343726B (en) * 2007-07-09 2010-11-03 殷志强 Solar energy thermal-collecting tube continuous automatic sputtering film coating method and device
JP2010280943A (en) * 2009-06-04 2010-12-16 Sony Corp Vapor deposition apparatus and vapor deposition method
CN103668074A (en) * 2012-09-04 2014-03-26 深圳市特艺实业有限公司 Vacuum film-plating device having three-section shell and alternate plating piece turners
KR20140053625A (en) * 2012-10-26 2014-05-08 삼성디스플레이 주식회사 Apparatus of depositing organic material
JP2016053202A (en) * 2014-09-04 2016-04-14 東京エレクトロン株式会社 Processing unit
CN107254673B (en) * 2017-06-12 2019-07-19 京东方科技集团股份有限公司 The evaporation coating method of deposition system and deposition system
CN109457218A (en) * 2018-12-10 2019-03-12 上海大学 Face evaporation source evaporation coating device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103935081A (en) * 2014-02-26 2014-07-23 东莞市万丰纳米材料有限公司 Permeable material with inorganic sterilization effect, and preparation method thereof
CN104651799A (en) * 2015-03-09 2015-05-27 常州工学院 Automatic flexible substrate double-side continuous coiling magnetron sputtering coating production line
CN204954176U (en) * 2015-07-21 2016-01-13 超快激光(天津)机械设备有限公司 Laser cutting machine's material platform manual switching device
CN105826427A (en) * 2016-03-29 2016-08-03 无锡奥特维科技股份有限公司 Welding strip processing device and method
CN106086808A (en) * 2016-08-02 2016-11-09 南京金盛达镀膜科技有限公司 A kind of devices of coiled vacuum coating machine and coating process
CN106241400A (en) * 2016-08-31 2016-12-21 江苏华宇印涂设备集团有限公司 The double feed control method of charger
CN209162185U (en) * 2018-07-23 2019-07-26 北京铂阳顶荣光伏科技有限公司 Filming equipment

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