CN108277468B - A kind of magnetron sputtering optical coating apparatus and film plating process with vacuum machine arm - Google Patents
A kind of magnetron sputtering optical coating apparatus and film plating process with vacuum machine arm Download PDFInfo
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- CN108277468B CN108277468B CN201810158684.6A CN201810158684A CN108277468B CN 108277468 B CN108277468 B CN 108277468B CN 201810158684 A CN201810158684 A CN 201810158684A CN 108277468 B CN108277468 B CN 108277468B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of magnetron sputtering optical coating apparatus and film plating process with vacuum machine arm, the equipment includes vacuum film coating chamber, vacuum machine arm room, magnetron sputtering target assembly, vertical rotating drum, and the interface connecting with vacuum machine arm room is provided on vacuum film coating chamber side wall.Vertical rotating drum is rotated around vertical axis, is provided centrally with seal box.Multiple groups magnetic controlled sputtering target is arranged on the vacuum film coating chamber side wall of vertical rotating drum periphery.Vacuum machine arm is provided with vacuum machine arm in room, horizontal and vertical mobile under vacuum conditions.Film plating process includes vacuumizing to filming equipment, rotation vertical rotating drum reaches the revolving speed of setting, start radio-frequency ion source, it is alternately coated with the film layer of two kinds of materials by technique requirement, further includes using vacuum machine arm the substrate equipped with substrate being loaded upper to vertical rotating drum and removing the substrate after plated film from vertical rotating drum.
Description
Technical field
The invention belongs to vacuum equipment fields, set more particularly to a kind of magnetron sputtering optical coating with vacuum machine arm
It is standby and applied to optics and the magnetron sputtering optical coating method of field of electronic devices.
Background technique
Currently, the plated film main equipment high to thickness requirement such as optics is mainly vacuum vapor plating, with electronics such as mobile phones
The development of equipment had not only required the control precision of membrane system high, but also has required production capacity big, at low cost.Also occurs magnetron sputtering light in the market
Filming equipment and magnetron sputtering optical coating method are learned, what is used substantially is all the filming equipment river applied to decoration or tool and mould
Film plating process, or all do not needed accurately applied to solar energy or display device functionality magnetic control sputtered film, all these films
Film thickness is controlled, and coating is few；It due to being applied to the magnetron sputtering optical coating of optics and field of electronic devices, is revolved in high speed
Turn lower accurate control plating multilayer film, highest needs to plate hundreds of tunics, and the light by controlling different wave length passes through or reflects, and reaches
Optics purpose；It can be coated with optical thin film in spite of technology proposition, but all there are two large problems, first is to be unable to monitor and control
Coating film thickness can only indirectly control film thickness by controlling the time；Second can only use oxide target material, the oxidation of direct plating metal
Object, such target plating membrane efficiency is extremely low, is not suitable with large-scale production；Therefore it needs to develop to be suitble to the electronic apparatus applications such as mobile phone
Magnetron sputtering optical coating apparatus and vacuum magnetron sputtering coating film method applied to optical field.
The prior art, vacuum magnetron sputtering coating film equipment are all single chambers, require to destroy vacuum, so not only shadow every time
Yield is rung, when due to amplification gas, the surface of magnetic controlled sputtering target can adsorb vapor and oxidation reaction occurs, and cause magnetic controlled sputtering target
Pollution, seriously affect the performance of product and the consistency of product；The present invention, which devises, thus does not destroy vacuum completion handling base
The magnetron sputtering optical coating apparatus with vacuum machine arm of piece and the method for realizing continuous coating；In order to improve coating film thickness
Control precision, the present invention is also provided with crystal oscillator film thickness measurement device.
Summary of the invention
The invention is realized by the following technical scheme:
A kind of magnetron sputtering optical coating apparatus with vacuum machine arm includes vacuum film coating chamber, vacuum machine arm room, magnetic
Control sputter target assemblies, vertical rotating drum.Vacuum film coating chamber is vertical and cylindrical structure, and upper and lower ends are provided with upper cover plate and lower cover
There are side enabling in plate, side, and the interface connecting with vacuum machine arm room is additionally provided on the side wall of vertical and cylindrical.Described is vertical
Formula going barrel is located in vacuum coating room, rotates around vertical axis, and vertical rotating drum is provided centrally with seal box, seal box it is upper
Portion is connected with rotary shaft, and rotary shaft passes through atmosphere and vacuum of the bearing support on the upper cover plate of vacuum film coating chamber, in seal box
Coating chamber isolation；Magnetron sputtering target assembly is arranged on the side wall of the vacuum film coating chamber of vertical rotating drum periphery, the magnetic control
Sputter target assemblies are 2 groups or more.Vacuum machine arm room is provided with vacuum pump set, for vacuumizing to vacuum machine arm room, true
The junction of empty coating chamber and vacuum machine arm room is provided with vacuum separation valve door, is provided with vacuum machine in vacuum machine arm room
Tool arm, vacuum machine arm horizontally and vertically move under vacuum conditions, need the substrate of the substrate of plated film to be loaded for will be equipped with
Onto vertical rotating drum, and the substrate after plated film is removed from vertical rotating drum and is put on frame substrate.
The vacuum machine arm is perpendicular comprising substrate vehicle, substrate vehicle mobile device, substrate vehicle horizontal drive mechanism, substrate vehicle
Straight driving mechanism.Substrate vehicle is mounted on the horizontal guide rail of substrate vehicle mobile device, in the driving of substrate vehicle horizontal drive mechanism
Lower edge horizontal guide rail it is mobile, realize reciprocating motion of the substrate vehicle between vacuum machine arm room and vacuum film coating chamber.Vacuum machine
It is provided in tool arm room and is vertically directed column, substrate vehicle mobile device, which is mounted on, to be vertically directed on column, in the vertical driving machine of substrate vehicle
Structure driving lower edge is vertically directed column and moves back and forth vertically；The power of substrate vehicle horizontal drive mechanism and substrate vehicle upright driving mechanism
Device is all disposed within outside vacuum machine arm room.
It is provided with mobile bar in the power device of the substrate vehicle horizontal drive mechanism, mobile bar is drawn by sealing device
Enter in vacuum machine arm room, the inner end of mobile bar is connected by vertical connecting rod with substrate vehicle.Substrate vehicle mobile device vertical shift
When, substrate vehicle slides on vertical connecting rod.
Frame substrate is arranged in frame substrate mobile device, as frame substrate mobile device is mobile.
It is provided with film thickness measuring instrument in the seal box, the biography for film thickness measuring is provided on vertical rotating drum
Sensor component, sensor module pass through the flange being arranged on sealing tank wall and are connected with seal box；Sensor module includes flange
Seal assembly, cooling tube, small rotary shaft, rotating electric machine, crystal-vibration-chip rotating disk and crystal-vibration-chip pedestal；Distinguish at the both ends of small rotary shaft
It is connected with crystal-vibration-chip rotating disk and rotating electric machine, rotating electric machine is arranged in seal box.Vacuum film coating chamber upper cover plate and under
2 or more vacuum molecular pumps are all respectively arranged on cover board.
Fixing seal case is additionally provided in vacuum coating room, fixing seal case is supported on the Vacuum Deposition of vertical rotating drum lower section
On the lower cover plate of film room, connecting tube is provided on fixing seal case, the lower cover plate that one end of connecting tube passes through vacuum film coating chamber draws
To outside vacuum coating room.
The side of the vacuum film coating chamber is provided with radio-frequency ion source on opening the door, and the radio-frequency ion source has 2.
Magnetron sputtering target assembly is 4 groups, is arranged on the side wall of the vertical and cylindrical of vacuum film coating chamber；Every group of magnetron sputtering
Target assembly includes 2 cylindrical magnetron sputtering rotary targets, and the rotating device of cylindrical magnetron sputtering rotary target is arranged in vacuum film coating chamber
It is external.
The side of the vacuum film coating chamber is additionally provided with the second magnetron sputtering target assembly, the second magnetic controlled sputtering target group on opening the door
Part is 2 groups.
A kind of magnetron sputtering optical coating method with vacuum machine arm, the optical coating method includes: (1) need to
It wants the substrate of plated film to be loaded onto substrate, substrate is installed on frame substrate, open the magnetron sputtering optics with vacuum machine arm
Frame substrate is put into frame substrate mobile device by the feeding gate of filming equipment, is taken out very after shutting feeding gate to vacuum machine arm room
The empty vacuum degree to setting；(2) vacuum separation valve door between vacuum film coating chamber and vacuum machine arm room is opened, vacuum machine is passed through
Substrate after plated film on vertical rotating drum is taken off and is put on frame substrate by arm, and the uncoated substrate on frame substrate is installed
Onto vertical rotating drum, vacuum separation valve door is closed later；(3) rotation vertical rotating drum reaches the revolving speed of setting；(4) starting is penetrated
Frequency ion source；(5) the intermediate frequency cylindrical magnetron sputtering rotary target for starting the first material, carries out the first sputtering of materials plated film；(6)
The intermediate frequency cylindrical magnetron sputtering rotary target for the first material having been turned on is closed, the intermediate frequency cylinder magnetic control of second of material of starting splashes
It penetrates rotary target and carries out second of sputtering of materials plated film；(7) film layer of both the above material is alternately coated with by technique requirement；(8) it closes
Intermediate frequency cylindrical magnetron sputtering rotation target power supply is closed, closes radio-frequency ion source later.Then it is repeated periodically the step of (1) to (8)
Suddenly, continous way production is realized.
Vacuum machine arm drives vertically comprising substrate vehicle, substrate vehicle mobile device, substrate vehicle horizontal drive mechanism, substrate vehicle
Mechanism；Substrate vehicle is mounted on the horizontal guide rail of substrate vehicle mobile device, under the driving of substrate vehicle horizontal drive mechanism along
Horizontal guide rail is mobile, realizes that substrate vehicle moves back and forth between vacuum machine arm room and vacuum film coating chamber；In vacuum machine arm room
It is provided with and is vertically directed column, substrate vehicle mobile device, which is mounted on, to be vertically directed on column, under the driving of substrate vehicle upright driving mechanism
It is moved back and forth vertically along column is vertically directed, drives the upper movement along the vertical direction of substrate vehicle.
In (2) step, being put into the substrate on vertical rotating drum by vacuum machine arm is to include on frame substrate: starting
Substrate vehicle is moved to vacuum film coating chamber, starts substrate vehicle upright driving mechanism drive substrate vehicle by substrate vehicle horizontal drive mechanism
Mobile device drives substrate vehicle to move up and down and removes substrate from vertical rotating drum, restarts substrate vehicle horizontal drive mechanism,
Substrate vehicle is moved to vacuum machine arm room from vacuum film coating chamber, restarts substrate vehicle upright driving mechanism later and passes through substrate vehicle
Substrate is sent on frame substrate.
In (2) step, it is to include that substrate uncoated on frame substrate, which is installed on vertical rotating drum: starting substrate vehicle
Substrate is put on substrate vehicle by upright driving mechanism and frame substrate mobile device；Start substrate vehicle horizontal drive mechanism and substrate vehicle
Upright driving mechanism places a substrate on vertical rotating drum.
In (4) step, when starting radio-frequency ion source, first the flow of adjustment argon gas and oxygen or nitrogen reaches first and sets
Definite value carries out surface clean to substrate, adjusts the flow of argon gas and oxygen or nitrogen again later to the second setting value, make coating
Reaction oxidation or nitridation completely.
The intermediate frequency cylindrical magnetron sputtering rotary target for starting the first material (can be the materials such as niobium or titanium) first is coated with
A kind of film layer of material；The intermediate frequency cylindrical magnetron sputtering rotary target for closing the first material later contains second of material opening
Expect that the intermediate frequency cylindrical magnetron sputtering rotary target baffle of (can be the materials such as silicon, aluminium) plates the film layer of second of material；Replace later
It plates both materials and forms assembly of thin films.The thickness of monofilm adds up to 3-60 layers in 100-300nm in 5-50nm, overall thickness.
The crystal-vibration-chip of measurement coating film thickness is also equipped on the side of vertical rotating drum；When plated film, crystal-vibration-chip and substrate
It is rotated synchronously with vertical rotating drum, the coating film thickness state modulator coating film thickness provided according to crystal-vibration-chip.Or the root in plated film
Coating film thickness is controlled according to plated film time.
The crystal-vibration-chip and crystalline substance of measurement coating film thickness are also equipped on the side for the vertical rotating drum for being equipped with film-coating workpiece
Shake piece pedestal.
The substrate and crystal-vibration-chip for being mounted on the side of vertical rotating drum are splashed near intermediate frequency cylindrical magnetron sputtering rotary target
Plated film is penetrated, radio-frequency ion source is rotated to and nearby reacts generation compound film layer with reactive ion.
Beneficial effects of the present invention:
1. increasing vacuum machine arm room, realizes and substrate is attached on vertical rotating drum under vacuum conditions, solve vacuum
Pollution of the atmosphere to magnetic controlled sputtering target, improves coating process stability when coating chamber amplifies gas.
2. the vacuum machine arm of special designing is suitble to fast move under vacuum conditions, the loading and unloading time is short, intelligent control.
3. the film thickness measurement device of special designing solves optically coated online precise measurement and control；
4. solving the reactive sputtering technology of metal oxide by setting radio-frequency ion source, being efficiently coated with multiple layer metal
Sull realizes the optical interference film of various wavelength.
5. reducing pollution of the atmosphere to vacuum film coating chamber using the vacuum separation valve door loading and unloading of special designing.
Detailed description of the invention
Fig. 1 is the main view of present device.
Fig. 2 is the top view of present device.
Fig. 3 is the A-B-C direction view of present device.
Specific embodiment
With reference to the accompanying drawing, illustrate magnetron sputtering optical coating apparatus and magnetron sputtering optical coating involved in the present invention
Method.
As shown in Figures 1 to 3, a kind of magnetron sputtering optical coating apparatus with vacuum machine arm, comprising vacuum film coating chamber 3,
Vacuum machine arm room 30, magnetron sputtering target assembly 19, vertical rotating drum 1；Vacuum film coating chamber 3 is vertical and cylindrical structure, up and down
Both ends are provided with upper cover plate 24 and lower cover plate 26, and there is side enabling 22 in side；Be additionally provided on the side wall of vertical and cylindrical with very
The interface that empty robotic chamber 30 connects；Vertical rotating drum 1 is located in vacuum film coating chamber 3, rotates around vertical axis, vertical rotating drum
1 is provided centrally with seal box 10, and the top of seal box 10 is connected with rotary shaft 5, rotary shaft 5 is supported on vacuum by bearing 4
On the upper cover plate 24 of coating chamber 3；There is hole at the center of rotary shaft 5, and cooling water pipe 8 is connected in hole；Atmosphere in seal box 10 and true
Empty coating chamber 3 is isolated, and film thickness measuring instrument 9 is provided in seal box 10；Magnetron sputtering target assembly 19 is arranged in vertical rotating
On the side wall of the vacuum film coating chamber 3 of 1 periphery of drum, magnetron sputtering target assembly 19 is 2 groups or more, this figure show 4 groups, is distributed in true
The two sides of empty separation valve door 2, two groups of left side are metal silicon target, and two groups of right side is metal niobium target, can also change metal titanium targets into；Often
Group magnetron sputtering target assembly all includes two magnetron sputtering rotary targets；Magnetron sputtering rotary target is vertical structure, and two magnetic controls splash
The distance of rotary target central axis is penetrated in 150-280mm.
Vacuum machine arm room 30 is provided with vacuum pump set, for vacuumizing to vacuum machine arm room 30, in vacuum film coating chamber 3
The junction of vacuum machine arm room 30 is provided with vacuum separation valve door 2, is provided with vacuum machine in vacuum machine arm room 30
Arm, vacuum machine arm drive vertically comprising substrate vehicle 35, substrate vehicle mobile device 41, substrate vehicle horizontal drive mechanism 36, substrate vehicle
Motivation structure 42, frame substrate 32, frame substrate mobile device 31, substrate vehicle 35 are mounted on the horizontal guide rail 40 of substrate vehicle mobile device 41
On, in substrate vehicle horizontal drive machine, 36 driving lower edge horizontal guide rail 40 it is mobile, realize substrate vehicle 35 in vacuum machine arm room
It is moved back and forth between 30 and vacuum film coating chamber 3；It is provided in vacuum machine arm room 3 and is vertically directed column 39, substrate vehicle mobile device
41 are mounted on and are vertically directed on column 39, drive lower edge to be vertically directed the vertical reciprocal fortune of column 39 in substrate vehicle upright driving mechanism 42
It is dynamic；The power device of substrate vehicle horizontal drive mechanism 36 and substrate vehicle upright driving mechanism 42 is all disposed within vacuum machine arm room 3
Outside.Vacuum machine arm horizontally and vertically moves under vacuum conditions, for being loaded the substrate 43 that film plating substrate is housed to vertical
On going barrel 1 and the substrate after plated film is removed from going barrel and is put on frame substrate 32.
Mobile bar 37 is provided on the power of substrate vehicle horizontal drive mechanism, mobile bar 37 passes through mobile rod seal apparatus 38
It introduces in vacuum machine arm room 3, the inner end of mobile bar 37 is connected by vertical connecting rod 34 with substrate vehicle 35；Substrate vehicle mobile device
When 41 vertical shift, substrate vehicle 35 slides on vertical connecting rod 34；Substrate vehicle 35 enters vacuum machine arm by feeding gate 33
In room 30；The frame substrate 32 is arranged in frame substrate mobile device 31, as frame substrate mobile device 31 is mobile.
Film thickness measuring sensor module 11 is arranged on vertical rotating drum 1.
In one embodiment of the invention, film thickness measuring sensor module 11 include crystal-vibration-chip, crystal-vibration-chip pedestal 13,
Cooling tube；Crystal-vibration-chip is mounted on crystal-vibration-chip pedestal 13, and crystal-vibration-chip pedestal 13 is mounted in the outer rim of vertical rotating drum 1, cooling
One end of pipe is connected with crystal-vibration-chip pedestal 13, and the other end introduces in the seal box 10 of vertical rotating drum 1, and flowing is connected in cooling tube
Cooling medium, for cooling down crystal-vibration-chip pedestal 13, to improve measurement accuracy；Sensor module also includes signal conductor, signal
One end of conducting wire is connected with crystal-vibration-chip pedestal 13, the other end introduce vertical rotating drum closed case 10 in measuring instrumentss phase
Even.
In another embodiment of the invention, film thickness measuring sensor module 11 includes flange assembly, cooling tube, small
Rotary shaft 12, crystal-vibration-chip pedestal 13, rotating disk 14；One end of cooling tube is connected with crystal-vibration-chip pedestal 13, and the other end passes through flange
Component is introduced into seal box 10；Rotating disk 14 is mounted on crystal-vibration-chip pedestal 13 to be connected with small rotary shaft 12.
2 vacuum molecular pumps are all respectively arranged on the upper cover plate 24 and lower cover plate 26 of vacuum film coating chamber；Vacuum coating
Radio-frequency ion source 16 is additionally provided in the side enabling 22 of room 3；Radio-frequency ion source 16 includes radio frequency induction copper tube coil 15, quartzy glass
Glass plate 17, sealing flange 18；Quartz glass plate 17 is mounted on isolated vacuum on sealing flange 18, and radio frequency induction copper tube coil 15 is set
It sets in the outside of quartz glass plate 17, radio frequency induction copper tube coil 15 is connected with radio-frequency power supply.
Vacuum separation valve door 2 is additionally provided in the vertical cylinder of vacuum film coating chamber 3；In the two sides of vacuum separation valve door 2
It is both provided with magnetron sputtering target assembly 19；Magnetron sputtering target assembly 19 is additionally provided with rotary magnet device 21, magnetron sputtering rotation
Rotary magnet device 21 in target is rotated along axis rotation angle in 0-120 ° of range, or within the scope of 0-45 °.
Fixing seal case 27 is additionally provided in vacuum film coating chamber 3, fixing seal case 27 is supported on vertical by bracket 28
On the lower cover plate 26 of the vacuum film coating chamber of the lower section of going barrel 1, in the atmosphere and vacuum film coating chamber 3 in fixing seal case 27 atmosphere every
From there are also the lower cover plates that pipeline passes through vacuum film coating chamber 3.
Each magnetron sputtering target assembly includes 2 intermediate frequency cylindrical magnetron sputtering rotary targets；The rotation of intermediate frequency cylindrical magnetron sputtering
The rotating device for turning target is arranged in vacuum coating outdoor.
In a kind of embodiment of magnetron sputtering optical coating method, the substrate for needing plated film is loaded to substrate by (1)
On, substrate is installed on frame substrate, the feeding gate of the magnetron sputtering optical coating apparatus with vacuum machine arm is opened, by substrate
Frame is put into frame substrate mobile device, is shut after feeding gate and is evacuated to 5 × 10 to vacuum machine arm room-2Pa；(2) it opens true
Vacuum separation valve door between empty coating chamber and vacuum machine arm room, will be after the plated film on vertical rotating drum by vacuum machine arm
Substrate is put on frame substrate, then substrate uncoated on frame substrate is installed on vertical rotating drum, closes vacuum insulation later
Valve；(3) rotation vertical rotating drum reaches 95rpm；(4) start radio-frequency ion source and open argon gas charge valve, regulation power is extremely
0.8KW opens oxygen aerating valve, regulation power to 3KW again later；(5) start the medium frequency magnetron sputtering rotation of metal niobium material
Target carries out sputter coating, and measurement thickness to 30nm stops；(6) the medium frequency magnetron sputtering rotary target for starting silicon materials, carries out metal
Silicon materials sputter coating, measurement thickness to 20nm stop；(7) two kinds of materials are alternately coated with by technique requirement, (8) close intermediate frequency magnetic
Control sputtering rotation target power supply, closes radio-frequency ion source later；(9) it opens vacuum separation valve door and carries out second of operation, it is continuous raw
It produces.
In the another embodiment of magnetron sputtering optical coating method, the substrate for needing plated film is loaded to base by (1)
On plate, substrate is installed on frame substrate, the feeding gate of the magnetron sputtering optical coating apparatus with vacuum machine arm is opened, by base
Grillage is put into frame substrate mobile device, is shut after feeding gate and is evacuated to 5 × 10 to vacuum machine arm room-2Pa；(2) it opens
Vacuum separation valve door between vacuum film coating chamber and vacuum machine arm room, will be after the plated film on vertical rotating drum by vacuum machine arm
Substrate be put on frame substrate, include moving substrate vehicle horizontal drive mechanism, substrate vehicle be moved to vacuum film coating chamber, starts base
Wooden handcart upright driving mechanism by substrate from vertical rotating drum on remove, restart substrate vehicle horizontal drive mechanism, by substrate vehicle from
Vacuum film coating chamber is moved to vacuum machine arm room, restarts substrate vehicle upright driving mechanism later and substrate is sent on frame substrate；
Substrate uncoated on frame substrate is installed on vertical rotating drum again, includes starting substrate vehicle upright driving mechanism and frame substrate
Substrate is put on substrate vehicle by mobile device；Starting substrate vehicle horizontal drive mechanism and substrate vehicle upright driving mechanism put substrate
It sets on vertical rotating drum；Vacuum separation valve door is closed later；(2) revolving speed that rotation vertical rotating drum reaches setting reaches
80rpm；(3) starting radio-frequency ion source and open argon gas charge valve, the power for adjusting two radio-frequency ion sources is all 0.9KW, it
Open oxygen aerating valve, regulation power to 4KW again afterwards；(4) start metal niobium material intermediate frequency cylindrical magnetron sputtering rotary target into
Row sputter coating, measurement thickness to 30nm stop；(5) the intermediate frequency cylindrical magnetron sputtering rotary target for starting silicon materials, carries out metal
Silicon materials sputter coating, measurement thickness to 25nm stop；(6) two kinds of materials alternately are coated with by technique requirement, overall thickness reaches
185nm ；(7) radio-frequency ion source is closed after closing intermediate frequency cylindrical magnetron sputtering rotation target power supply；(8) stop after vacuumizing, to plating
Film device inflation, opens vacuum separation valve door, workpiece is put on the frame substrate near manipulator by manipulator.
Claims (14)
1. a kind of magnetron sputtering optical coating apparatus with vacuum machine arm includes vacuum film coating chamber, vacuum machine arm room, magnetic control
Sputter target assemblies, vertical rotating drum, it is characterised in that: vacuum film coating chamber is vertical and cylindrical structure, and upper and lower ends are provided with
There are side enabling in cover board and lower cover plate, side, and the interface connecting with vacuum machine arm room is provided on the side wall of vertical and cylindrical；
Vertical rotating drum is located in vacuum coating room, rotates around vertical axis, and vertical rotating drum is provided centrally with seal box, seal box
Top is connected with rotary shaft, rotary shaft by bearing support on the upper cover plate of vacuum film coating chamber, atmosphere in seal box and true
Empty coating chamber isolation；Magnetron sputtering target assembly is arranged on the side wall of the vacuum film coating chamber of vertical rotating drum periphery, magnetron sputtering
Target assembly is 2 groups or more；Vacuum machine arm room is provided with vacuum pump set, for vacuumizing to vacuum machine arm room, in Vacuum Deposition
The junction of film room and vacuum machine arm room is provided with vacuum separation valve door, is provided with vacuum machine in vacuum machine arm room
Arm, vacuum machine arm horizontally and vertically move under vacuum conditions, for being loaded the substrate that substrate is housed to vertical rotating drum
Above and the substrate after plated film is removed from vertical rotating drum and is put on frame substrate；Vacuum machine arm includes substrate vehicle, substrate
Vehicle mobile device, substrate vehicle horizontal drive mechanism, substrate vehicle upright driving mechanism；Substrate vehicle is mounted on substrate vehicle mobile device
On horizontal guide rail, substrate vehicle horizontal drive mechanism driving lower edge horizontal guide rail it is mobile, realize substrate vehicle in vacuum machine
It is moved back and forth between arm room and vacuum film coating chamber；It is provided in vacuum machine arm room and is vertically directed column, substrate vehicle mobile device peace
Mounted in being vertically directed on column, column is vertically directed in substrate vehicle upright driving mechanism driving lower edge and is moved back and forth vertically；Substrate vehicle water
Flat driving mechanism and the power device of substrate vehicle upright driving mechanism are all disposed within outside vacuum machine arm room.
2. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: substrate vehicle
Mobile bar is provided in the power device of horizontal drive mechanism, mobile bar is introduced in vacuum machine arm room by sealing device, is moved
The inner end of lever is connected by vertical connecting rod with substrate vehicle；When substrate vehicle mobile device vertical shift, substrate vehicle is in vertical connecting rod
Upper sliding.
3. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: frame substrate
It is arranged in frame substrate mobile device, as frame substrate mobile device is mobile.
4. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: seal box
It is inside provided with film thickness measuring instrument, the sensor module for film thickness measuring, sensor group are provided on institute's vertical rotating drum
Part passes through the flange being arranged on sealing tank wall and is connected with seal box；Sensor module includes flange seal component, cooling tube, small
Rotary shaft, rotating electric machine, crystal-vibration-chip rotating disk and crystal-vibration-chip pedestal；The both ends of small rotary shaft respectively with crystal-vibration-chip rotating disk and rotation
Rotating motor is connected, and rotating electric machine is arranged in seal box.
5. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: Vacuum Deposition
Fixing seal case is additionally provided in film room, fixing seal case is supported on the lower cover plate of the vacuum film coating chamber of vertical rotating drum lower section
On, connecting tube is provided on fixing seal case, the lower cover plate that one end of connecting tube passes through vacuum film coating chamber guides to vacuum film coating chamber
Outside.
6. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: Vacuum Deposition
The side of film room is provided with radio-frequency ion source on opening the door, and the radio-frequency ion source has 2.
7. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: Vacuum Deposition
The side of film room is provided with the second magnetron sputtering target assembly on opening the door, and the second magnetron sputtering target assembly is 2 groups.
8. the magnetron sputtering optical coating apparatus according to claim 1 with vacuum machine arm, it is characterised in that: magnetic control splashes
Component of shooting at the target is 4 groups, is arranged on the side wall of the vertical and cylindrical of vacuum film coating chamber；Every group of magnetron sputtering target assembly includes 2
The rotating device of cylindrical magnetron sputtering rotary target, cylindrical magnetron sputtering rotary target is arranged in vacuum coating outdoor.
9. a kind of magnetron sputtering optical coating method with vacuum machine arm, it is characterised in that: optical coating method will comprising (1)
It needs the substrate of plated film to be loaded onto substrate, substrate is installed on frame substrate, open the magnetron sputtering light with vacuum machine arm
The feeding gate for learning filming equipment, frame substrate is put into frame substrate mobile device, is taken out after shutting feeding gate to vacuum machine arm room
The vacuum degree of vacuum extremely setting；(2) vacuum separation valve door between vacuum film coating chamber and vacuum machine arm room is opened, vacuum machine is passed through
Substrate on vertical rotating drum is put on frame substrate by tool arm, the substrate on frame substrate is installed on vertical rotating drum, later
Close vacuum separation valve door；(3) rotation vertical rotating drum reaches the revolving speed of setting；(4) start radio-frequency ion source；(5) starting the
A kind of intermediate frequency cylindrical magnetron sputtering rotary target of material, carries out the first sputtering of materials plated film；(6) the first having been turned on is closed
The intermediate frequency cylindrical magnetron sputtering rotary target of material, the intermediate frequency cylindrical magnetron sputtering rotary target for starting second of material carry out second
Sputtering of materials plated film；(7) film layer of the first material and second of material is alternately coated with by technique requirement；(8) intermediate frequency circle is closed
Column magnetron sputtering rotates target power supply, closes radio-frequency ion source later；It is repeated periodically (1) to (8) step；Vacuum machine arm packet
Vehicle containing substrate, substrate vehicle mobile device, substrate vehicle horizontal drive mechanism, substrate vehicle upright driving mechanism；Substrate vehicle is mounted on base
On the horizontal guide rail of wooden handcart mobile device, substrate vehicle horizontal drive mechanism driving lower edge horizontal guide rail it is mobile, realize base
Wooden handcart moves back and forth between vacuum machine arm room and vacuum film coating chamber；It is provided in vacuum machine arm room and is vertically directed column, base
Wooden handcart mobile device, which is mounted on, to be vertically directed on column, and it is reciprocal vertically to be vertically directed column in substrate vehicle upright driving mechanism driving lower edge
Movement drives the upper movement along the vertical direction of substrate vehicle.
10. the magnetron sputtering optical coating method according to claim 9 with vacuum machine arm, it is characterised in that: in (2)
In, it is described that the substrate on vertical rotating drum is put on frame substrate by vacuum machine arm, it is driven comprising starting substrate vehicle level
Substrate vehicle is moved to vacuum film coating chamber, starts substrate vehicle upright driving mechanism drive substrate vehicle mobile device, driven by motivation structure
Substrate vehicle is moved up and down removes substrate from vertical rotating drum, restarts substrate vehicle horizontal drive mechanism, by substrate Che Congzhen
Empty coating chamber is moved to vacuum machine arm room, restarts substrate vehicle upright driving mechanism later by substrate vehicle and substrate is sent to base
On grillage.
11. the magnetron sputtering optical coating method according to claim 9 with vacuum machine arm, it is characterised in that: in (2)
In, the substrate by frame substrate is installed on vertical rotating drum, includes starting substrate vehicle upright driving mechanism and substrate
Substrate is put on substrate vehicle by frame mobile device, starts substrate vehicle horizontal drive mechanism and substrate vehicle upright driving mechanism for substrate
It is placed on vertical rotating drum.
12. the magnetron sputtering optical coating method according to claim 9 with vacuum machine arm, it is characterised in that: in (4)
In, when starting radio-frequency ion source, the flow for adjusting argon gas and oxygen or nitrogen reaches the first setting value, carries out to substrate surface
Cleaning, adjusts the flow of argon gas and oxygen or nitrogen to the second setting value again later, makes coating complete oxidation or nitridation.
13. the magnetron sputtering optical coating method according to claim 9 with vacuum machine arm, it is characterised in that: vertical
The crystal-vibration-chip of measurement coating film thickness is also equipped on the side of formula going barrel；When plated film, crystal-vibration-chip and substrate are with vertical rotating drum
It rotates synchronously, the coating film thickness state modulator coating film thickness provided according to crystal-vibration-chip.
14. the magnetron sputtering optical coating method according to claim 9 with vacuum machine arm, it is characterised in that: plated film
When, coating film thickness is controlled according to plated film time.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2594278Y (en) * | 2003-01-13 | 2003-12-24 | 甘国工 | Continuous magnetic controlled sputtering apparatus for producing high reflective mirror |
| CN106011765A (en) * | 2016-07-12 | 2016-10-12 | 广东振华科技股份有限公司 | Magnetron sputtering vacuum coating equipment |
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| CN201437550U (en) * | 2009-06-08 | 2010-04-14 | 广东中环真空设备有限公司 | Magnetron sputtering coating equipment |
| CN202688424U (en) * | 2012-07-09 | 2013-01-23 | 北京奥依特科技有限责任公司 | Magnetically-controlled co-sputtering coating machine |
| CN103290379A (en) * | 2013-06-18 | 2013-09-11 | 合肥力恒液压系统有限公司 | Multifunctional magnetron sputtering film coating device |
| US9809876B2 (en) * | 2014-01-13 | 2017-11-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl | Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2594278Y (en) * | 2003-01-13 | 2003-12-24 | 甘国工 | Continuous magnetic controlled sputtering apparatus for producing high reflective mirror |
| CN106011765A (en) * | 2016-07-12 | 2016-10-12 | 广东振华科技股份有限公司 | Magnetron sputtering vacuum coating equipment |
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