WO2011116563A1 - Vacuum vapor deposition apparatus - Google Patents

Vacuum vapor deposition apparatus Download PDF

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Publication number
WO2011116563A1
WO2011116563A1 PCT/CN2010/074951 CN2010074951W WO2011116563A1 WO 2011116563 A1 WO2011116563 A1 WO 2011116563A1 CN 2010074951 W CN2010074951 W CN 2010074951W WO 2011116563 A1 WO2011116563 A1 WO 2011116563A1
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WO
WIPO (PCT)
Prior art keywords
vacuum
cavity
transmission
evaporation
sub
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PCT/CN2010/074951
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French (fr)
Chinese (zh)
Inventor
杨明生
王曼媛
刘惠森
范继良
王勇
张华�
Original Assignee
东莞宏威数码机械有限公司
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Publication of WO2011116563A1 publication Critical patent/WO2011116563A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Definitions

  • the present invention relates to an auxiliary device in the organic light emitting diode production industry, and more particularly to a vacuum evaporation device for coating a substrate in the organic light emitting diode industry. Background technique
  • the 0LED display is a new product in the digital products
  • 0LED is the organic light-emitting diode (Organic light-emitting diode) (organic light-emitting diode (Organic light-emitting diode), because of the characteristics of light and thin, power saving, so in the display of digital products It has been widely used and has a large market potential.
  • OLED organic light-emitting diode
  • the application of OLED in the world is focused on flat panel displays, because 0LED is the only technology that can be compared with TFT-LCD in application, and is currently all display technologies.
  • the only display technology that can make large-size, high-brightness, high-resolution soft screen can be as thick as paper; but 0LEI) display (organic light-emitting display) and traditional TFT-LCD display (liquid crystal) The display) is different, it does not require a backlight, it uses a very thin coating of organic material and a glass substrate. When there is current, these organic materials will illuminate, and the OLED display can be made lighter and thinner. The viewing angle is larger and can save significant power. Accordingly, all devices that manufacture devices in the OLED industry must ensure OLEDs. Accuracy requirements, wherein, in the sector of the OLED device in the vacuum vapor deposition of the vapor deposition apparatus that is required to use one device of the device during manufacture 0LEI) in the industry.
  • a more common method is to deposit one or more layers of a film on the surface of the component by a "vapor deposition process".
  • the so-called “evaporation treatment” is mainly through an evaporation chamber for performing evaporation, and a group for providing evaporation.
  • a vacuum system with a vacuum and a system of vacuum power transmission systems for transporting glass substrates.
  • the vapor deposition material is placed in the evaporation boat in the evaporation chamber, and the evaporation boat is connected to the external power source.
  • the heat generated by the resistance effect of the evaporation boat is heated, and the evaporation material in the evaporation boat is heated until the melting point of the evaporation material is close to generate vapor, and the vapor evaporated, that is, :
  • the material of the vapor deposition material can be deposited on the surface of the substrate not far from the evaporation source to complete the coating of the 0LEI) device.
  • the known technical solution is to continuously rotate the substrate to be plated, and the rotation of the substrate may involve the alignment problem of the mask plate, thereby making the structural design of the vapor deposition processing device relatively complicated. And the film thickness uniformity is also difficult to effectively guarantee.
  • the thickness uniformity of the film layer is improved relative to the dot evaporation technique, but the conventional wire evaporation technology known in the prior art needs to be moved for loading in order to improve the precision of the vapor deposition film layer.
  • the evaporation boat of the evaporation source further needs additional configuration, for example: the sliding rail of the evaporation source, etc., so the wire evaporation device is bulky, and the cost of the wire evaporation device is increased, and the construction cost of the clean room is also occupied. .
  • An object of the present invention is to provide a vacuum vapor deposition apparatus which is simple in structure and can effectively improve coating precision.
  • the technical solution of the present invention is: Providing a vacuum evaporation device suitable for the evaporation process of a substrate in the organic light emitting diode industry, characterized in that the vacuum evaporation device comprises a transmission mechanism and steaming Plating mechanism>sensing control device and vacuum mechanism, the transmission mechanism includes a main cavity, The gate, the transmission component and the driver, the main cavity has a hollow structure, the two sides of the main cavity are respectively opposite to each other, and the two gates are respectively installed at the two gates, and the bottom of the main cavity is also opened.
  • the evaporation mechanism includes a sub-cavity, a baffle, a power assembly, an evaporation boat, and at least one evaporation source, wherein the sub-cavity has a hollow structure, and the evaporation boat is installed In the sub-chamber, the evaporation source is placed in the evaporation boat, and the sub-cavity is opposite to the connection port of the main cavity, and the baffle is mounted on the interface.
  • the baffle and the hollow structure of the sub-cavity form a sub-sealing cavity, the baffle and the main cavity Hollow knot Forming a main sealing cavity, the driver driving the baffle to open or close; when the baffle is opened, the main sealing cavity and the sub-sealing cavity are in communication with each other; when the baffle is closed, The main sealing cavity and the auxiliary sealing cavity are sealed independently of each other;
  • the sensing control device comprises a sensor and a controller electrically connected to the sensor, the sensor is installed in the main cavity, the control
  • the vacuum mechanism includes a rough pumping pipe, a vacuum pump and a gate valve, one end of the rough pumping pipe is in communication with the sub-cavity, and the other end of the rough pumping pipe is The vacuum pump is connected, and the crucible is installed between the vacuum pump and the sub-cavity.
  • the vacuum evaporation apparatus of the present invention comprises an evaporation mechanism, a transmission mechanism sensor and a vacuum mechanism.
  • the overall structure is simple and compact, which reduces the manufacturing and running costs of the vacuum evaporation apparatus to some extent.
  • the vacuum evaporation device can automatically control the temperature of the evaporation boat and control the operation speed of the transmission assembly, thereby controlling the coating degree of the vacuum evaporation device on the substrate, and effectively controlling the film thickness of the substrate.
  • the present invention is applicable to a vacuum evaporation device for vapor deposition process of a substrate in the organic light emitting diode industry, which is not only simple and compact in structure, but also capable of fully automatic monitoring of the vapor deposition film thickness of the substrate, thereby effectively improving the precision of the plating film and improving the vacuum evaporation.
  • Plating process efficiency and coating qualityong is not only simple and compact in structure, but also capable of fully automatic monitoring of the vapor deposition film thickness of the substrate, thereby effectively improving the precision of the plating film and improving the vacuum evaporation.
  • the vacuum evaporation apparatus further includes a damper mechanism, and the damper mechanism is coupled to the vacuum pump.
  • the damper mechanism in the vacuum evaporation device includes a spring and a bellows, and the spring and the bellows are both installed between the gate valve and the vacuum pump.
  • the shock absorbing mechanism with the spring and the bellows facilitates placing the vacuum evaporation device in a stable working environment, thereby improving the quality of the vapor deposited film layer and improving the overall vacuum evaporation. The service life of the device.
  • the vacuum evaporation apparatus of the present invention further comprises a vacuum gauge adapted to detect a vacuum state of the vacuum evaporation apparatus.
  • the vacuum gauge can detect the vacuum state of the vacuum evaporation apparatus at any time and convert it into real-time vacuum related data to instantly adjust the vacuum parameters.
  • the transmission assembly includes an input member, a transmission member, and a rack, the input member is coupled to the transmission member, and the transmission member is pivotally coupled to the rack, the tooth
  • the strip carries and transports the substrate.
  • the transmission component includes a first transmission shaft, a plurality of bevel gears, a plurality of second transmission shafts, and a transmission gear, the first transmission shaft is pivotally connected to the input member, and the bevel gear is pivotally connected to Each of the bevel gears is coupled to the end of each of the second transmission shafts, and the other end of each of the second transmission shafts is coupled to the transmission gear.
  • a transmission gear is pivotally coupled to the rack.
  • the vacuum evaporation apparatus of the present invention further includes a magnetic fluid that connects the driver to the input member.
  • the senor in the vacuum evaporation apparatus of the present invention is a crystal oscillation sensor.
  • the evaporation source includes a main evaporation source and a plurality of secondary evaporation sources, and the secondary evaporation source is located at a periphery of the main evaporation source, and the setting is such that the vacuum evaporation of the present invention is performed.
  • the evaporation of the substrate by the device is more uniform and the quality is higher.
  • the senor is located above the gate.
  • Figure i is a schematic view showing the structure of a vacuum evaporation apparatus of the present invention. detailed description
  • the present invention provides a vacuum evaporation apparatus, the vacuum evaporation apparatus junction
  • the structure is simple and compact, and can effectively improve the precision of the coating, and is suitable for the evaporation process of the substrate in the organic light emitting diode industry.
  • the structure of the present invention will be described below with reference to the drawings.
  • FIG. 1 is a schematic view showing the structure of a vacuum evaporation apparatus of the present invention.
  • the vacuum evaporation device is used for vapor-depositing a film on a substrate in an organic light-emitting diode industry, and the vacuum evaporation device 1 includes: a vaporization mechanism of a transmission mechanism, a sensing control device, and a vacuum mechanism portion.
  • the structure and the overall structure are compact.
  • the transport mechanism includes a main cavity 14 gate, a transmission assembly 143, and a driver (not shown).
  • the main cavity 141 has a hollow structure, and two sides of the main cavity are respectively opposite to each other with a gate (not shown), and the two gates are respectively installed at the two gates, and the bottom of the main cavity 141 A connection port 145 is also provided, and the transmission component 43 is connected between the two gates.
  • Two of the doors are mounted on the main cavity 141.
  • the shutter includes an entrance gate 1421 and a gate 1422 which are respectively mounted on opposite sides of the main cavity 141.
  • the driver is coupled to the inlet gate 1421, the outlet gate 1422, the transmission assembly 143, and the power assembly 133, and drives the inlet gate 1421, the outlet gate 1422, the transmission assembly, and the power assembly 133 accordingly.
  • the driver is connected to the gate and the transmission component 143. Specifically, the driver drives the inlet gate 1421 and the outlet gate 1422 to open or close relative to the main cavity 141;
  • the drive unit drives the transport assembly to transport the substrate 144; when the driver drives the power assembly 133 to control the baffle 132 to be in an open state relative to the sub-cavity 131, the main cavity 141 is coupled to the sub-cavity 131 through.
  • the transmission assembly 143 includes a magnetic fluid (not shown) input member 1431, a transmission member, and a rack 1432.
  • the transmission component includes a first transmission shaft 1433, six bevel gears 1434, six second transmission shafts 1435, and six transmission gears 1436.
  • the magnetic fluid is connected to and controlled by the driver, the magnetic fluid is connected to and controls the input member 1431, the input member 1431 is coupled to the first transmission shaft 1433, and the six bevel gears 1434 Pivotly connected to the first transmission shaft 1433, specifically, six bevel gears 1434 are respectively pivotally connected to the first transmission shaft 1433 at even intervals, each of the male gears 14 34 and each of the One end of the second transmission shaft 1435 is connected, the other end of each of the second transmission shafts 1435 is connected to the transmission gear 1436, the transmission gear 1436 is coupled with the rack 1432, and the transmission Gears 1436 are also pivotally coupled to the rack 1432 at even intervals.
  • the racks 1432 carry and transport the substrate 144. It should be noted that bevel gears, The second transmission shaft and the transmission gear are correspondingly connected in a matching form, and the number of the three is not limited to the number in the embodiment, depending on the shape and size of the substrate to be transported,
  • the vapor deposition mechanism includes a sub-chamber 13 JU baffle 132, a power assembly 133, an evaporation boat 135, and an evaporation source.
  • the sub-cavity 131 has a hollow structure
  • the evaporation boat 135 is installed in the sub-cavity i3 i
  • the evaporation source is placed in the evaporation boat 135 .
  • the evaporation source includes a primary evaporation source 1341 and two secondary evaporation sources 1342, both of which are located at a central location of the secondary cavity 131. Two of the secondary evaporation sources 1342 are located in a peripheral region of the primary evaporation source 1341.
  • two of the secondary evaporation sources 1342 are located on both sides of the primary evaporation source 1341, and are disposed symmetrically, the secondary cavity
  • the body 131 is opposite to the connecting port 145 of the main cavity 141 and is provided with a pair of interfaces 1311.
  • the baffle 132 is mounted between the port 145 and the pair of interfaces 1311.
  • the baffle 132 and the hollow structure of the sub-cavity 131 form a sub-sealing cavity
  • the baffle 132 and the hollow structure of the main cavity 141 form a main sealing cavity.
  • the evaporation source is located in the secondary sealing cavity, the power component 133 is connected to the baffle 132, and the power component 133 controls the baffle 132 to open or close relative to the sub cavity 131. status.
  • the driver drives the baffle 132 to open or close; when the baffle 132 is opened, the main sealing cavity and the sub-sealing cavity communicate with each other, the main evaporation source 1341 and the secondary evaporation source 1342: performing an evaporation process on the substrate 144; when the baffle 132 is closed, the main sealing cavity and the sub-sealing cavity are sealed independently of each other.
  • the secondary evaporation source may be three or more than three, depending on the specific situation.
  • a vacuum evaporation apparatus i of the present invention includes a sensing control apparatus.
  • the sensing control apparatus includes a sensor 12 and a controller (not shown) electrically connected to the sensor.
  • the sensor 12 is a crystal oscillating sensor and is mounted in the main cavity 141.
  • the controller electrically connects the evaporation boat 135 and the transmission assembly.
  • the setting of the sensor 12 can automatically control the temperature of the evaporation boat 135, thereby controlling the temperature of the evaporation source and controlling the operating speed of the transmission assembly, thereby controlling the degree of coating of the substrate 144 by the vacuum evaporation device i, and effectively controlling the coating thickness of the substrate 144.
  • the working environment of the vacuum evaporation apparatus 1 of the present invention is a vacuum state, and therefore the vacuum evaporation apparatus includes a vacuum mechanism.
  • the vacuum evaporation apparatus 1 includes a roughing pipe 151, a vacuum pump 152, and a valve 153.
  • the vacuum evaporation apparatus 1 further includes a shock absorbing mechanism, and the reduction
  • the shock mechanism includes a spring 161 and a bellows 162, and the shock absorbing mechanism is coupled to the vacuum pump 152.
  • the bellows 162 is connected to the vacuum pump 152 and communicates with the vacuum pump 152, and the bellows 162 is mounted in contact between the gate valve 153 and the vacuum pump 152.
  • a spring 161 is disposed around the vacuum pump 152, and a spring 161 is connected to the gate valve 153, and the other end is connected to the vacuum pump 152.
  • One end of the rough pumping pipe 151 is in communication with the sub-cavity 131, and the other end of the rough pumping pipe 151 is connected to the vacuum pump 152.
  • the gate valve 153 is mounted on the vacuum pump 152 and the sub-cavity. Between body 131.
  • the arrangement of the shock absorbing mechanism having the spring i61 and the bellows 162 reduces the vibration of the vacuum mechanism, facilitating placing the vacuum vapor deposition device i in a stable state. Working environment, thereby improving the quality of the vapor deposited film layer and improving the service life of the overall vacuum evaporation device 1
  • the vacuum evaporation apparatus 1 further includes a vacuum gauge 17.
  • the vacuum gauge 17 is disposed on the sensor 12, and the vacuum gauge 17 is adapted to detect the vacuum evaporation apparatus. 1 vacuum state.
  • the vacuum gauge 17 can detect the vacuum state of the vacuum evaporation apparatus 1 at any time and convert it into real-time vacuum related data, so as to adjust the vacuum parameter of the vacuum evaporation apparatus 1 in time to adjust the appropriate vacuum state,
  • the driver drives the inlet door 1421 to be opened relative to the main cavity while the power main member 33 is in the drive.
  • the baffle 132 mounted on the sub-cavity 131 is also in an open state with respect to the sub-cavity 131.
  • the main cavity 141 and the sub-chamber 31 are connected through the connection port 145 and the pair interface 1311.
  • the main evaporation source 1341 and the secondary evaporation source 1342 are always in an evaporation state in the evaporation boat 135 having a constant heat.
  • the driver is transmitted to the i-input part M3 i through the external force of the magnetic fluid, and the input part 1431 drives the first transmission shaft 1433 connected thereto to rotate, and then the first transmission shaft 1433 drives the six bevel gears distributedly connected thereto. 434 rotates at the same time, the bevel gear 1434 synchronously drives the corresponding second transmission shaft 1435 to rotate, and then the second rotation gear 1435 drives the rack 1432 to move, and the rack 1432 finally drives the carrier for steaming thereon.
  • the plated substrate 144 moves. During the movement of the substrate 144, the primary evaporation source 1341 and the secondary evaporation source 1342 vaporize the organic material onto the base 144.
  • the vacuum mechanism maintains the main cavity 141 and the sub-cavity 131 in a proper vacuum state, and the vacuum gauge 17 detects the vacuum at any time.
  • the vacuum state of the vapor deposition apparatus 1 is converted into real-time vacuum-related data, and the vacuum parameters of the vacuum evaporation apparatus i are immediately adjusted to adjust an appropriate vacuum state.
  • the vacuum evaporation apparatus 1 of the present invention is further provided with a sensor 12, which can automatically control the temperature of the main evaporation source 1341 and the secondary evaporation source 1342 and control the operation speed of the transmission component during the evaporation process, thereby controlling the vacuum evaporation
  • the degree of plating of the substrate 144 by the device 1 effectively controls the thickness of the deposited film of the substrate 144.
  • the driver drives the gate 1422 to be in an open state relative to the main cavity 141, and the rack 1432 carries the substrate 144 away from the main cavity 141.
  • the vacuum evaporation apparatus of the present invention comprises a vapor deposition mechanism transmission mechanism, a sensor and a vacuum mechanism.
  • the overall structure is simple and compact, which reduces the manufacturing and running costs of the vacuum evaporation apparatus to some extent.
  • the vacuum evaporation apparatus employs a sensor, the temperature of the evaporation boat can be automatically controlled and the operation speed of the transmission unit can be controlled, thereby controlling the degree of coating of the substrate by the vacuum evaporation apparatus, and effectively controlling the film thickness of the substrate.
  • the present invention is applicable to a vacuum evaporation apparatus for a vapor deposition process of a substrate in the organic light emitting diode industry, which is not only simple and compact in structure, but also capable of fully realizing the thickness of the vapor deposition film of the substrate, and effectively improving the precision of the coating from 3 ⁇ 4.
  • the efficiency of the evaporation process and the quality of the coating is applicable to a vacuum evaporation apparatus for a vapor deposition process of a substrate in the organic light emitting diode industry, which is not only simple and compact in structure, but also capable of fully realizing the thickness of the vapor deposition film of the substrate, and effectively improving the precision of the coating from 3 ⁇ 4.

Abstract

A vacuum vapor deposition apparatus (1) comprising a transmission mechanism, a vapor deposition mechanism, a sensor controller and a vacuum mechanism. The transmission mechanism comprises a main chamber (141), shutters, a transmission assembly (143) and a driver, wherein shutter gates, on which the shutters are installed, are set on both sides of the main chamber (141); a connection opening (145) is set on the bottom of the main chamber (141); the driver is connected with the shutters and the transmission assembly (143) and drives the substrate plate (144) to travel on the transmission assembly (143). The vapor deposition mechanism comprises a sub-chamber (131), a shield (132), a power assembly (133), evaporation boats (135) and vapor sources, wherein the evaporation boats (135), in which the vapor sources are disposed, are mounted in the sub-chamber (131); an abutting opening (1311) is set at the place the sub-chamber (131) faces the connection opening (145) of the main chamber (141); and the shield (132) is set between the connection opening (145) and the abutting opening (1311). The sensor controller comprises a sensor (12) and a controller, the controller is electrically connected with the transmission assembly (143) and the evaporation boat (135). The vacuum mechanism comprises preliminary-vacuumizing tubes (151), a vacuum pump (152) and gate valves (153), the preliminary-vacuumizing tubes (151) are in communication with the sub-chamber (131) and connected with the vacuum pump (152).

Description

真空蒸镀装置 技术领域  Vacuum evaporation device
本发明涉及一种有机发光二极管生产行业中的辅助设备,尤其涉及一种有 机发光二极管行业中对基板进行镀膜的真空蒸镀装置。 背景技术  The present invention relates to an auxiliary device in the organic light emitting diode production industry, and more particularly to a vacuum evaporation device for coating a substrate in the organic light emitting diode industry. Background technique
随着经济的不断发展、 科技的不断进步和世界能源的日益减少, 人们在生 产中越来越重视能源的节约及利用效率,使得人与自然和谐发展以满足中国新 型的工业化道路要求。  With the continuous development of the economy, the continuous advancement of science and technology, and the decreasing energy of the world, people pay more and more attention to energy conservation and utilization efficiency in production, which makes people and nature develop harmoniously to meet the requirements of China's new industrialization road.
在数码产品的显示产业中, 企业为了节约能源、 降低生产成本, 都加大投 资研发力度, 不断地追求节能的新产品。 其中, 0LED显示屏就是数码产品中的 一种新产品, 0LED即有机发光二极管 ( Organ i c L i ght-Em i t t Ing Di ode ), 因 为具备轻薄、 省电等特性, 因此在数码产品的显示屏上得到了广泛应用, 并且 具有较大的市场潜力, 目前世界上对 OLED的应用都聚焦在平板显示器上, 因 为 0LED是唯一在应用上能和 TFT-LCD相提并论的技术, 且是目前所有显示技 术中, 唯一可制作大尺寸、 高亮度、 高分辨率软屏的显示技术, 可以傲成和纸 张一样的厚度; 但 0LEI)显示屏(有机发光显示屏) 与传统的 TFT-LCD显示屏 (液晶显示屏)并不同, 其无需背光灯, 采用非常薄的有机材料涂层和玻璃基 片, 当有电流通过时, 这些有机材料就会发光, 而且 OLED显示屏可以做得更 轻更薄, 可视角度更大, 并且能够显著节省电能, 相应地, 制造 0LED行业中 器件的所有设备必须保证 OLED器件的精度要求, 其中, 对真空状态下的 OLED 行业中器件进行蒸镀的蒸镀处理装置即是制造 0LEI)行业中的器件过程中需要 使用的设备之一。  In the display industry of digital products, in order to save energy and reduce production costs, enterprises have increased investment in research and development and are constantly pursuing energy-saving new products. Among them, the 0LED display is a new product in the digital products, 0LED is the organic light-emitting diode (Organic light-emitting diode) (organic light-emitting diode (Organic light-emitting diode), because of the characteristics of light and thin, power saving, so in the display of digital products It has been widely used and has a large market potential. At present, the application of OLED in the world is focused on flat panel displays, because 0LED is the only technology that can be compared with TFT-LCD in application, and is currently all display technologies. Among them, the only display technology that can make large-size, high-brightness, high-resolution soft screen can be as thick as paper; but 0LEI) display (organic light-emitting display) and traditional TFT-LCD display (liquid crystal) The display) is different, it does not require a backlight, it uses a very thin coating of organic material and a glass substrate. When there is current, these organic materials will illuminate, and the OLED display can be made lighter and thinner. The viewing angle is larger and can save significant power. Accordingly, all devices that manufacture devices in the OLED industry must ensure OLEDs. Accuracy requirements, wherein, in the sector of the OLED device in the vacuum vapor deposition of the vapor deposition apparatus that is required to use one device of the device during manufacture 0LEI) in the industry.
目前, 在 OLED制造领域中, 为了对其制造的元器件赋予某种特性, 较常 使用的方式是采用 "蒸镀处理" 工序在元器件表面沉积一层或多层薄膜。 所谓 "蒸镀处理"主要是通过一个用以执行蒸镀的蒸镀室 ,一组用以提供蒸镀所需 真空度的真空系统、及一组用以传输玻璃基片的真空动力传输系统等系统所组 成。 在蒸镀室内将蒸镀材料设置于蒸发舟内, 且蒸发舟与外界的电源相接。 当 适当的电源流通至蒸发舟内后, 蒸发舟因电阻效应所产生的热, 加热蒸发舟内 的蒸镀材料,一直到接近蒸镀材料的熔点使其产生蒸气,蒸镀出来的蒸气, 即: 蒸镀材料分子, 能够在离蒸发源上方不远处的基板表面上进行薄膜沉积, 从而 完成 0LEI)器件的镀膜。 At present, in the field of OLED manufacturing, in order to impart certain characteristics to the components to be manufactured, a more common method is to deposit one or more layers of a film on the surface of the component by a "vapor deposition process". The so-called "evaporation treatment" is mainly through an evaporation chamber for performing evaporation, and a group for providing evaporation. A vacuum system with a vacuum and a system of vacuum power transmission systems for transporting glass substrates. The vapor deposition material is placed in the evaporation boat in the evaporation chamber, and the evaporation boat is connected to the external power source. When the appropriate power source flows into the evaporation boat, the heat generated by the resistance effect of the evaporation boat is heated, and the evaporation material in the evaporation boat is heated until the melting point of the evaporation material is close to generate vapor, and the vapor evaporated, that is, : The material of the vapor deposition material can be deposited on the surface of the substrate not far from the evaporation source to complete the coating of the 0LEI) device.
业内熟知的 0LED器件的蒸镀方法中, 常用的有 "点蒸镀"、 "线蒸镀"、 "有 机气相沉积(Organ i c vapor Phase Depos i t ion; OVPD) " 以及 "扫描式沉积 制程(Depos i t ion Scan Proces s; DSP) " , 其中比较成熟的镀膜技术是 "点蒸 镀" 和 "线蒸镀"。 现有的点蒸镀技术由于在蒸镀过程中, 蒸气的方向差別较 大, 因而容易造成膜层厚度均勾性变差。 如要提高膜层厚度均勾性, 已知的技 术方案是不断旋转待镀基板, 而基板的旋转又会涉及到掩模板的对位问题, 从 而使得蒸镀处理装置的结构设计变得相对复杂,且膜层厚度均 性也难有效保 证。 而对于线蒸镀技术而言, 其相对于点蒸镀技术对膜层厚度均匀性会有一定 的提高,但是已知的传统线蒸镀技术为了提升蒸镀膜层的精密性需要移动用于 装载蒸发源的蒸发舟, 进一步的需要额外配置, 例如: 蒸发源移动的滑轨等, 因此线蒸镀装置体积较大, 在增加线蒸镀装置成本的同时, 也占用了无尘室的 建造成本。  Among the well-known evaporation methods of OLED devices in the industry, "point evaporation", "line evaporation", "organic vapor phase depos it ion (OVPD)" and "scanning deposition process (Depos) are commonly used. It ion Scan Proces s; DSP) " , of which the more mature coating technology is "dot evaporation" and "line evaporation". The existing spot evaporation technique is likely to cause a difference in the thickness of the film layer due to a large difference in the direction of the vapor during the vapor deposition process. In order to improve the thickness of the film layer, the known technical solution is to continuously rotate the substrate to be plated, and the rotation of the substrate may involve the alignment problem of the mask plate, thereby making the structural design of the vapor deposition processing device relatively complicated. And the film thickness uniformity is also difficult to effectively guarantee. For the wire evaporation technology, the thickness uniformity of the film layer is improved relative to the dot evaporation technique, but the conventional wire evaporation technology known in the prior art needs to be moved for loading in order to improve the precision of the vapor deposition film layer. The evaporation boat of the evaporation source further needs additional configuration, for example: the sliding rail of the evaporation source, etc., so the wire evaporation device is bulky, and the cost of the wire evaporation device is increased, and the construction cost of the clean room is also occupied. .
因此, 亟待一种结构精简, 可提高镀膜精密度的真空蒸镀装置, 以克服上 述缺陷。 发明内容  Therefore, there is a need for a vacuum evaporation apparatus which is simple in structure and can improve the precision of coating to overcome the above drawbacks. Summary of the invention
本发明的目的在于提供一种真空蒸镀装置,所述真空蒸镀装置结构简单紧 凑, 且能够有效提高镀膜精密度。  SUMMARY OF THE INVENTION An object of the present invention is to provide a vacuum vapor deposition apparatus which is simple in structure and can effectively improve coating precision.
为实现上述 Θ的, 本发明的技术方案为: 提供一种真空蒸镀装置, 适用于 有机发光二极管行业中基板的蒸镀工艺, 其特征在于, 所述真空蒸镀装置包括 传输 '机构、蒸镀机构>传感控制装置以及.真空机构,所述传输机构包括主腔体、 闸门, 传输组件以及驱动器, 所述主腔体呈中空结构, 所述主腔体两側分别正 对开设有闸口, 两闸门分別安装于两所述闸口处, 所述主腔体的底部还开设有 连接口, 所述传输組件连接于两所述闸口之间, 所述驱动器与所述闸门及所述 传输组件连接, 所迷驱动器驱动所迷闸门相对所述闸口的打开或关闭 , 所述驱 动器驱动所述基板在所述传输组件上移动; 所述蒸镀机构包括副腔体、 挡板、 动力组件、 蒸发舟以及至少一个蒸发源, 所迷副腔体呈中空结构, 所述蒸发舟 安装于所述副腔体内, 所述蒸发源放置于所述蒸发舟内, 所述副腔体正对所述 主腔体的所述连接口处开设有对接口,所述挡板安装于所述连接口与所述对接 口之间, 且所述挡板与所述动力组件连接, 所述挡板与所述副腔体的中空结构 形成副密封空腔, 所述挡板与所述主腔体的中空结构形成主密封空腔, 所述驱 动器驱动所述挡板打开或关闭; 当所述挡板打开, 所述主密封空腔与所述副密 封空腔相互连通; 当所述挡板关闭, 所述主密封空腔与所迷副密封空腔相互独 立密封; 所述传感控制装置包括传感器及与所述.传感器电连接的控制器, 所述 传感器安装于所述主腔体内, 所述控制器与所述传输组件及蒸发舟电连接; 所 述真空机构包括粗抽管道. 真空泵以及闸阀, 所述粗抽管道的一端与所述副腔 体连通, 所述粗抽管道的另一端与所述真空泵相连接, 所述闱阔安装在所述真 空泵与所述副腔体之间。 In order to achieve the above, the technical solution of the present invention is: Providing a vacuum evaporation device suitable for the evaporation process of a substrate in the organic light emitting diode industry, characterized in that the vacuum evaporation device comprises a transmission mechanism and steaming Plating mechanism>sensing control device and vacuum mechanism, the transmission mechanism includes a main cavity, The gate, the transmission component and the driver, the main cavity has a hollow structure, the two sides of the main cavity are respectively opposite to each other, and the two gates are respectively installed at the two gates, and the bottom of the main cavity is also opened. a connection port, the transmission component is connected between the two gates, the driver is connected to the gate and the transmission component, and the driver drives the opening or closing of the gate relative to the gate, the driver Driving the substrate to move on the transport assembly; the evaporation mechanism includes a sub-cavity, a baffle, a power assembly, an evaporation boat, and at least one evaporation source, wherein the sub-cavity has a hollow structure, and the evaporation boat is installed In the sub-chamber, the evaporation source is placed in the evaporation boat, and the sub-cavity is opposite to the connection port of the main cavity, and the baffle is mounted on the interface. Between the connection port and the pair of interfaces, and the baffle is connected to the power component, the baffle and the hollow structure of the sub-cavity form a sub-sealing cavity, the baffle and the main cavity Hollow knot Forming a main sealing cavity, the driver driving the baffle to open or close; when the baffle is opened, the main sealing cavity and the sub-sealing cavity are in communication with each other; when the baffle is closed, The main sealing cavity and the auxiliary sealing cavity are sealed independently of each other; the sensing control device comprises a sensor and a controller electrically connected to the sensor, the sensor is installed in the main cavity, the control The vacuum mechanism includes a rough pumping pipe, a vacuum pump and a gate valve, one end of the rough pumping pipe is in communication with the sub-cavity, and the other end of the rough pumping pipe is The vacuum pump is connected, and the crucible is installed between the vacuum pump and the sub-cavity.
本发明与现有技术相比, 本发明的真空蒸镀装置包括蒸镀机构、 传输机 构 传感器以及真空机构 4部分, 整体结构简单紧凑, 一定程度上降低了真空 蒸镀装置的制造与运行成本。 此外, 所述真空蒸镀装置由于采用了传感器, 可 以自动控制蒸发舟的温度以及控制传输组件的运行'速度、 从而控制该真空蒸镀 装置对基板的镀膜程度, 有效地控制基板的膜厚, 因此, 本发明适用于有机发 光二极管行业中基板的蒸镀工艺的真空蒸镀装置, 其不仅结构简单紧凑, 而且 能够实现全自动监控基板的蒸镀膜厚, 从而有效提高镀膜精密度、 提高真空蒸 镀工艺的效率以及镀膜质量„  Compared with the prior art, the vacuum evaporation apparatus of the present invention comprises an evaporation mechanism, a transmission mechanism sensor and a vacuum mechanism. The overall structure is simple and compact, which reduces the manufacturing and running costs of the vacuum evaporation apparatus to some extent. In addition, the vacuum evaporation device can automatically control the temperature of the evaporation boat and control the operation speed of the transmission assembly, thereby controlling the coating degree of the vacuum evaporation device on the substrate, and effectively controlling the film thickness of the substrate. Therefore, the present invention is applicable to a vacuum evaporation device for vapor deposition process of a substrate in the organic light emitting diode industry, which is not only simple and compact in structure, but also capable of fully automatic monitoring of the vapor deposition film thickness of the substrate, thereby effectively improving the precision of the plating film and improving the vacuum evaporation. Plating process efficiency and coating quality „
在本发明的一个实施例中, 所述真空蒸镀装置还包括减震机构, 所述减震 机构与所述真空泵相连接。 可选地, 所述真空蒸镀装置中的所述减震机构包括 弹簧和波纹管, 所述弹簧和所述波紋管均安装在所述闸阀与所述真空泵之间。 当所述真空泵工作时、具有弹簧和波纹管的减震机构有利于将所述真空蒸镀装 置置于一个稳定的工作坏境, 从而提高了蒸镀膜层的质量, 并提高了整体真空 蒸镀装置的使用寿命。 In an embodiment of the invention, the vacuum evaporation apparatus further includes a damper mechanism, and the damper mechanism is coupled to the vacuum pump. Optionally, the damper mechanism in the vacuum evaporation device includes a spring and a bellows, and the spring and the bellows are both installed between the gate valve and the vacuum pump. When the vacuum pump is in operation, the shock absorbing mechanism with the spring and the bellows facilitates placing the vacuum evaporation device in a stable working environment, thereby improving the quality of the vapor deposited film layer and improving the overall vacuum evaporation. The service life of the device.
较佳地, 本发明真空蒸镀装置还包括真空规, 所述真空规适用于检测所述 真空蒸镀装置的真空状态。所述真空规可依在任何时间检测真空蒸镀装置的真 空状态, 将其转换为实时的真空相关数据, 以便即时调整真空参数。  Preferably, the vacuum evaporation apparatus of the present invention further comprises a vacuum gauge adapted to detect a vacuum state of the vacuum evaporation apparatus. The vacuum gauge can detect the vacuum state of the vacuum evaporation apparatus at any time and convert it into real-time vacuum related data to instantly adjust the vacuum parameters.
在本发明的另一个实施例中, 所述传输组件包括输入部件、 传动部件以及 齿条, 所述输入部件连接所述传动部件, 所述,传动部件枢接于所述齿条, 所述 齿条承载并传送所述基板。 较佳地, 所述传动部件包括第一传动轴、数个锥齿 轮、 数个第二传动轴以及传动齿轮, 所述第一传动轴枢接于所述输入部件, 所 述锥齿轮枢接于所述第一传动铀上,每一所述锥齿轮与每一所述第二传动轴的 —端相连接, 每一所述第二传动轴的另一端与所述传动齿轮相连接, 所述传动 齿轮与所述齿条相枢接。 所述传输组件结构简单紧凑, 有利于节省本发明真空 蒸镀装置的成本。  In another embodiment of the present invention, the transmission assembly includes an input member, a transmission member, and a rack, the input member is coupled to the transmission member, and the transmission member is pivotally coupled to the rack, the tooth The strip carries and transports the substrate. Preferably, the transmission component includes a first transmission shaft, a plurality of bevel gears, a plurality of second transmission shafts, and a transmission gear, the first transmission shaft is pivotally connected to the input member, and the bevel gear is pivotally connected to Each of the bevel gears is coupled to the end of each of the second transmission shafts, and the other end of each of the second transmission shafts is coupled to the transmission gear. A transmission gear is pivotally coupled to the rack. The transmission assembly is simple and compact in structure, which is advantageous in saving the cost of the vacuum evaporation apparatus of the present invention.
可选地, 本发明真空蒸镀装置还包括磁流体, 所述磁流体连接所述驱动器 与所述输入部件。  Optionally, the vacuum evaporation apparatus of the present invention further includes a magnetic fluid that connects the driver to the input member.
较佳地, 本发明真空蒸镀装置中的所述传感器是晶体振荡传感器。  Preferably, the sensor in the vacuum evaporation apparatus of the present invention is a crystal oscillation sensor.
较佳地,本发明真空蒸镀装置中所述蒸发源包括一主蒸发源和数个副蒸发 源, 所述副蒸发源位于所述主蒸发源的周边,, 该设置使得本发明真空蒸镀装置 实施的对基板的蒸镀更加均匀, 质量更高。  Preferably, in the vacuum evaporation apparatus of the present invention, the evaporation source includes a main evaporation source and a plurality of secondary evaporation sources, and the secondary evaporation source is located at a periphery of the main evaporation source, and the setting is such that the vacuum evaporation of the present invention is performed. The evaporation of the substrate by the device is more uniform and the quality is higher.
较佳地, 本发明真空蒸镀装置中所述传感器位于所述闸口上方。 i 图说明  Preferably, in the vacuum evaporation apparatus of the present invention, the sensor is located above the gate. i diagram description
图 i是本发明真空蒸镀装置的结构示意图。 具体实施方式  Figure i is a schematic view showing the structure of a vacuum evaporation apparatus of the present invention. detailed description
现在参考酎图详细描述本发明的实施例, 附图中类似的元件标号代表类似 的元件。 如上所述, 本发明 在提供一种真空蒸镀装置, 所述真空蒸镀装置结 构简单紧凑, 且能够有效提高镀膜精密度, 并适用于有机发光二极管行业中基 板的蒸镀工艺。 下面結合酎图, 说明本发明的结构。 Embodiments of the present invention will now be described in detail with reference to the drawings, As described above, the present invention provides a vacuum evaporation apparatus, the vacuum evaporation apparatus junction The structure is simple and compact, and can effectively improve the precision of the coating, and is suitable for the evaporation process of the substrate in the organic light emitting diode industry. The structure of the present invention will be described below with reference to the drawings.
图 1是本发明真空蒸镀装置的结构示意图。 参考图 1 ,所述真空蒸镀装置, 为有机发光二级管行业中在基板上蒸镀膜之用, 所述真空蒸镀装置 1包括: 传 输机构 蒸镀机构、 传感控制装置以及真空机构 部分结构, 整体结构筒单紧 凑。  BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the structure of a vacuum evaporation apparatus of the present invention. Referring to FIG. 1 , the vacuum evaporation device is used for vapor-depositing a film on a substrate in an organic light-emitting diode industry, and the vacuum evaporation device 1 includes: a vaporization mechanism of a transmission mechanism, a sensing control device, and a vacuum mechanism portion. The structure and the overall structure are compact.
参考图 1 , 所述传输机构包括主腔体 14 闸门, 传输组件 143以及驱动 器(图未示)。 所述主腔体 141呈中空结构, 所述主腔体两側分别正对开设有 闸口 (图未示), 两所述闸门分别安装于两所述闸口处, 所述主腔体 141 的底 部还开设有连接口 145 , 所述传输组件】43连接亍两所述闸口之间。 两个所述 门安装于所迷主腔体 141上, 所迷闸门包括进闸 Π 1421和出闸门 1422, 其 分別安装于所述主腔体 141相对的两側。所述驱动器与所述进闸门 1421、 出闸 门 1422、传输组件 143以及所述动力组件 133相连接,并相应地驱动所述进闸 门 1421、 出闸门 1422、传输组件以及所述动力组件 133。 所述驱动器与所述闸 门及所述传输组件 143连接, 具体地 , 所述驱动器驱动所述进闸门 1421和所 述出闸门 1422相对于所迷主腔体 141呈开启或者闭合的状态; 所述驱动器驱 动所述传输组件传送所述基板 144; 当驱动器驱动所述动力组件 133控制挡板 132相对所述副腔体 131呈开启状态时, 所述主腔体 141与所述副腔体 131相 连通。 所述传输组件 143包括磁流体 (图未示) 输入部件 1431、 传动部件以 及齿条 1432。 所述传动部件包括第一传动轴 1433、 六个锥齿轮 1434、 六个第 二传动轴 1435以及六个传动齿轮 1436。 所述磁流体连接所述驱动器并受其控 制, 所述磁流体连接并控制所述输入部件 1431 , 所述输入部件 1431与所述第 一传动軸 1433相柩接,六个所述锥齿轮 1434枢接于所述第一传动轴 1433上, 具体地, 六个锥齿轮 1434分别呈均匀间隔地枢接于所述第一传动轴 1433上, 每一所述雄齿轮 1434与每一所述第二传动轴 1435的一端相连接,每一所述第 二传动轴 1435的另一端与所述传动齿轮 1436相连接, 所述传动齿轮 1436与 所述齿条 1432相柩接,且所述传动齿轮 1436亦呈均匀间隔地枢接于所述齿条 1432上. 所述齿条 1432承载并传送所述基板 144。 需要说明的是, 锥齿轮、 第二传动轴以及传动齿轮三者成匹配形式相对应连接,三者的数量并不局限于 本实施例中的数量, 其视所传送的基板的形状与大小而定,, Referring to FIG. 1, the transport mechanism includes a main cavity 14 gate, a transmission assembly 143, and a driver (not shown). The main cavity 141 has a hollow structure, and two sides of the main cavity are respectively opposite to each other with a gate (not shown), and the two gates are respectively installed at the two gates, and the bottom of the main cavity 141 A connection port 145 is also provided, and the transmission component 43 is connected between the two gates. Two of the doors are mounted on the main cavity 141. The shutter includes an entrance gate 1421 and a gate 1422 which are respectively mounted on opposite sides of the main cavity 141. The driver is coupled to the inlet gate 1421, the outlet gate 1422, the transmission assembly 143, and the power assembly 133, and drives the inlet gate 1421, the outlet gate 1422, the transmission assembly, and the power assembly 133 accordingly. The driver is connected to the gate and the transmission component 143. Specifically, the driver drives the inlet gate 1421 and the outlet gate 1422 to open or close relative to the main cavity 141; The drive unit drives the transport assembly to transport the substrate 144; when the driver drives the power assembly 133 to control the baffle 132 to be in an open state relative to the sub-cavity 131, the main cavity 141 is coupled to the sub-cavity 131 through. The transmission assembly 143 includes a magnetic fluid (not shown) input member 1431, a transmission member, and a rack 1432. The transmission component includes a first transmission shaft 1433, six bevel gears 1434, six second transmission shafts 1435, and six transmission gears 1436. The magnetic fluid is connected to and controlled by the driver, the magnetic fluid is connected to and controls the input member 1431, the input member 1431 is coupled to the first transmission shaft 1433, and the six bevel gears 1434 Pivotly connected to the first transmission shaft 1433, specifically, six bevel gears 1434 are respectively pivotally connected to the first transmission shaft 1433 at even intervals, each of the male gears 14 34 and each of the One end of the second transmission shaft 1435 is connected, the other end of each of the second transmission shafts 1435 is connected to the transmission gear 1436, the transmission gear 1436 is coupled with the rack 1432, and the transmission Gears 1436 are also pivotally coupled to the rack 1432 at even intervals. The racks 1432 carry and transport the substrate 144. It should be noted that bevel gears, The second transmission shaft and the transmission gear are correspondingly connected in a matching form, and the number of the three is not limited to the number in the embodiment, depending on the shape and size of the substrate to be transported,
参考图 1, 所迷蒸镀机构包括副腔体 13 JU 挡板 132、 动力组件 133 , 蒸发 舟 135以及蒸发源。 在本实施例中, 所述副腔体 131呈中空结构, 所述蒸发舟 135安装于所述副腔体 i3 i内, 所述蒸发源放置于所述蒸发舟 135内。 所述蒸 发源包括一个主蒸发源 1341和两个副蒸发源 1342, 所述蒸发源和所述蒸发舟 135均位于所述副腔体 131的中央位置。两个所述副蒸发源 1342位于所述主蒸 发源 1341的周边区域,特定地,两个所述副蒸发源 1342位于所述主蒸发源 1341 的两边,且相对称设置,,所述副腔体 131正对所述主腔体 141的所述连接口 145 处开设有对接口 1311,所述挡板 132安装于所述连接 145口与所述对接口 1311 之间。 所述挡板 132与所述副腔体 131的中空结构形成副密封空腔, 所述挡板 132与所述主腔体 141的中空结构形成主密封空腔。 所述蒸发源位于所述副密 封空腔内, 所述动力组件 133与所述挡板 132相连接, 所述动力组件 133控制 所述挡板 132相对于所述副腔体 131呈开启或者关闭状态。 详细地, 所述驱动 器驱动所述挡板 132打开或关闭; 当所述挡板 132打开, 所述主密封空腔与所 述副密封空腔相互连通, 所述主蒸发源 1341和副蒸发源 1342对所述基板 144 实施蒸镀工艺; 当所述挡板 132关闭, 所述主密封空腔与所述副密封空腔相互 独立密封。 需要说明的是, 所述副蒸发源可为三个或者三个以上的数量, 视具 体情况而定。  Referring to Figure 1, the vapor deposition mechanism includes a sub-chamber 13 JU baffle 132, a power assembly 133, an evaporation boat 135, and an evaporation source. In this embodiment, the sub-cavity 131 has a hollow structure, the evaporation boat 135 is installed in the sub-cavity i3 i , and the evaporation source is placed in the evaporation boat 135 . The evaporation source includes a primary evaporation source 1341 and two secondary evaporation sources 1342, both of which are located at a central location of the secondary cavity 131. Two of the secondary evaporation sources 1342 are located in a peripheral region of the primary evaporation source 1341. Specifically, two of the secondary evaporation sources 1342 are located on both sides of the primary evaporation source 1341, and are disposed symmetrically, the secondary cavity The body 131 is opposite to the connecting port 145 of the main cavity 141 and is provided with a pair of interfaces 1311. The baffle 132 is mounted between the port 145 and the pair of interfaces 1311. The baffle 132 and the hollow structure of the sub-cavity 131 form a sub-sealing cavity, and the baffle 132 and the hollow structure of the main cavity 141 form a main sealing cavity. The evaporation source is located in the secondary sealing cavity, the power component 133 is connected to the baffle 132, and the power component 133 controls the baffle 132 to open or close relative to the sub cavity 131. status. In detail, the driver drives the baffle 132 to open or close; when the baffle 132 is opened, the main sealing cavity and the sub-sealing cavity communicate with each other, the main evaporation source 1341 and the secondary evaporation source 1342: performing an evaporation process on the substrate 144; when the baffle 132 is closed, the main sealing cavity and the sub-sealing cavity are sealed independently of each other. It should be noted that the secondary evaporation source may be three or more than three, depending on the specific situation.
参考图 1 , 本发明真空蒸镀装置 i包括传感控制装置, 在本实施例中, 所 述传感控制装置包括传感器 12及与所述传感器电连接的控制器(图未示)。 所 述/^感器 12是晶体抵荡传感器, 并安装于所述主腔体 141 内。 所述控制器电 连接所述蒸发舟 135以及所述传输组件。 传感器 12的设置可以自动控制蒸发 舟 135的温度, 从而控制蒸发源的温度以及控制传输组件的运行速度, 进而控 制该真空蒸镀装置 i对基板 144的镀膜程度,有效地控制基板 144的镀膜厚度。  Referring to Fig. 1, a vacuum evaporation apparatus i of the present invention includes a sensing control apparatus. In the present embodiment, the sensing control apparatus includes a sensor 12 and a controller (not shown) electrically connected to the sensor. The sensor 12 is a crystal oscillating sensor and is mounted in the main cavity 141. The controller electrically connects the evaporation boat 135 and the transmission assembly. The setting of the sensor 12 can automatically control the temperature of the evaporation boat 135, thereby controlling the temperature of the evaporation source and controlling the operating speed of the transmission assembly, thereby controlling the degree of coating of the substrate 144 by the vacuum evaporation device i, and effectively controlling the coating thickness of the substrate 144. .
本发明真空蒸镀装置 1的工作环境为真空状态, 因此所述真空蒸镀装置 包括真空机构。 参考图 1, 所述真空蒸镀装置 1包括粗抽管道 151、真空泵 152 以及闹阀 153。 在本实施例中, 所述真空蒸镀装置 1还包括减震机构, 所述减 震机构包括弹簧 161和波纹管 162, 所述减震机构与所述真空泵 152相连接。 具体地,所述波纹管 162正对所述真空泵 152连接并与所述真空泵 152相连通, 且所迷波纹管 162抵触安装在所述闸阀 153与所述真空泵 152之间。 弹簧 161 设置于所述真空泵 152的周边, 且弹簧 161—端连接所述闸阀 153, 其另一端 连接所述真空泵 152。 所述粗抽管道 151的一端与所述副腔体 131连通, 所述 粗抽管道 151的另一端与所述真空泵 152相连接 ·,所述闸阀 153安装在所述真 空泵 152与所述副腔体 131之间。 当所述真空泵 152与所述粗抽管道 151工作 时, 具有弹簧 i61和波纹管 162的减震机构的设置减少了真空机构的震动, 有 利于将所述真空蒸镀装置 i置于一个稳定的工作环境,从而提高了蒸镀膜层的 质量, 并提高了整体真空蒸镀装置 1的使用寿命 The working environment of the vacuum evaporation apparatus 1 of the present invention is a vacuum state, and therefore the vacuum evaporation apparatus includes a vacuum mechanism. Referring to FIG. 1, the vacuum evaporation apparatus 1 includes a roughing pipe 151, a vacuum pump 152, and a valve 153. In this embodiment, the vacuum evaporation apparatus 1 further includes a shock absorbing mechanism, and the reduction The shock mechanism includes a spring 161 and a bellows 162, and the shock absorbing mechanism is coupled to the vacuum pump 152. Specifically, the bellows 162 is connected to the vacuum pump 152 and communicates with the vacuum pump 152, and the bellows 162 is mounted in contact between the gate valve 153 and the vacuum pump 152. A spring 161 is disposed around the vacuum pump 152, and a spring 161 is connected to the gate valve 153, and the other end is connected to the vacuum pump 152. One end of the rough pumping pipe 151 is in communication with the sub-cavity 131, and the other end of the rough pumping pipe 151 is connected to the vacuum pump 152. The gate valve 153 is mounted on the vacuum pump 152 and the sub-cavity. Between body 131. When the vacuum pump 152 is operated with the rough pumping pipe 151, the arrangement of the shock absorbing mechanism having the spring i61 and the bellows 162 reduces the vibration of the vacuum mechanism, facilitating placing the vacuum vapor deposition device i in a stable state. Working environment, thereby improving the quality of the vapor deposited film layer and improving the service life of the overall vacuum evaporation device 1
参考图 1, 所述真空蒸镀装置 1还包括真空规 17, 在本实施例中, 所述真 空规 17设置于所述传感器 12上, 所述真空规 17适用于检测所述真空蒸镀装 置 1的真空状态。 所述真空规 17可依在任何时间检测真空蒸镀装置 1的真空 状态, 将其转换为实时的真空相关数据, 以便即时调整真空蒸镀装置 1的真空 参数以调节适当的真空状态,,  Referring to FIG. 1, the vacuum evaporation apparatus 1 further includes a vacuum gauge 17. In the embodiment, the vacuum gauge 17 is disposed on the sensor 12, and the vacuum gauge 17 is adapted to detect the vacuum evaporation apparatus. 1 vacuum state. The vacuum gauge 17 can detect the vacuum state of the vacuum evaporation apparatus 1 at any time and convert it into real-time vacuum related data, so as to adjust the vacuum parameter of the vacuum evaporation apparatus 1 in time to adjust the appropriate vacuum state,
以下将结合附图, 对本发明真空蒸镀装置的工作原理做详细的说明: 参考图】,首先所述驱动器驅动进间门 1421相对于主腔体 开启状态 同时, 动力主件】 33在驱动器的驱动下, 带动安装于副腔体 131上的挡板 132 亦相对于所述副腔体 131处于开启状态, 此时, 主腔体 141与副腔体】31通过 连接口 145和对接口 1311相连通, 且主蒸发源 1341和副蒸发源 1342在具有 —定热度的蒸发舟 135内一直处于蒸发状态。 继而, 驱动器通过磁流体外部动 力传输至 i 入部件 M3 i, 该输入部件 1431 带动连接其上的第一传动轴 1433 转动, 而后, 该第一传动轴 1433带动分布连接其上的六个锥齿轮】434同时转 动, 锥齿轮 1434分別同步地带动相对应的第二传动轴 1435转动, 接着, 该第 二转动齿轮 1435带动齿条 1432,移动, 该齿条 1432最后带动承载其上的用于 蒸镀的基板 144移动。 在基板 144移动的过程中, 主蒸发源 1341和副蒸发源 1342将有机材料蒸镀于基本 144上。 在此过程中, 真空机构将主腔体 141与副 腔体 131维持在合适的真空状态, 并通过所述真空规 17在任何时间检测真空 蒸镀装置 1的真空状态, 将其转换为实时的真空相关数据, 即时调整真空蒸镀 装置 i的真空参数以调节适当的真空状态。 并且, 本发明真空蒸镀装置 1还设 置有传感器 12,传感器 12在蒸镀过程中可自动控制主蒸发源 1341和副蒸发源 1342的温度以及控制传输组件的运行速度,从而控制该真空蒸镀装置 1对基板 144的镀膜程度,有效地控制基板 144的所蒸镀的镀膜厚度。最后, 当基板 144 达到镀膜预定的镀膜程度, 驱动器驱动出闸门 1422相对于主腔体 141处于开 启状态, 齿条 1432承载基板 144离开主腔体 141。 至此, 本发明真空蒸镀装置 1的蒸镀工艺结束。 The working principle of the vacuum evaporation apparatus of the present invention will be described in detail below with reference to the accompanying drawings: Referring to the drawings, first, the driver drives the inlet door 1421 to be opened relative to the main cavity while the power main member 33 is in the drive. Under the driving, the baffle 132 mounted on the sub-cavity 131 is also in an open state with respect to the sub-cavity 131. At this time, the main cavity 141 and the sub-chamber 31 are connected through the connection port 145 and the pair interface 1311. The main evaporation source 1341 and the secondary evaporation source 1342 are always in an evaporation state in the evaporation boat 135 having a constant heat. Then, the driver is transmitted to the i-input part M3 i through the external force of the magnetic fluid, and the input part 1431 drives the first transmission shaft 1433 connected thereto to rotate, and then the first transmission shaft 1433 drives the six bevel gears distributedly connected thereto. 434 rotates at the same time, the bevel gear 1434 synchronously drives the corresponding second transmission shaft 1435 to rotate, and then the second rotation gear 1435 drives the rack 1432 to move, and the rack 1432 finally drives the carrier for steaming thereon. The plated substrate 144 moves. During the movement of the substrate 144, the primary evaporation source 1341 and the secondary evaporation source 1342 vaporize the organic material onto the base 144. In this process, the vacuum mechanism maintains the main cavity 141 and the sub-cavity 131 in a proper vacuum state, and the vacuum gauge 17 detects the vacuum at any time. The vacuum state of the vapor deposition apparatus 1 is converted into real-time vacuum-related data, and the vacuum parameters of the vacuum evaporation apparatus i are immediately adjusted to adjust an appropriate vacuum state. Moreover, the vacuum evaporation apparatus 1 of the present invention is further provided with a sensor 12, which can automatically control the temperature of the main evaporation source 1341 and the secondary evaporation source 1342 and control the operation speed of the transmission component during the evaporation process, thereby controlling the vacuum evaporation The degree of plating of the substrate 144 by the device 1 effectively controls the thickness of the deposited film of the substrate 144. Finally, when the substrate 144 reaches a predetermined degree of coating of the coating, the driver drives the gate 1422 to be in an open state relative to the main cavity 141, and the rack 1432 carries the substrate 144 away from the main cavity 141. Thus far, the vapor deposition process of the vacuum evaporation apparatus 1 of the present invention is completed.
本发明与现有技术相比,本发明的真空蒸镀装置包括蒸镀机构 传输机构、 传感器以及真空机构 4部分, 整体结构简单紧凑, 一定程度上降低了真空蒸镀 装置的制造与运行成本。 此外, 所述真空蒸镀装置由于采用了传感器, 可以自 动控制蒸发舟的温度以及控制传输组件的运行速度,从而控制该真空蒸镀装置 对基板的镀膜程度, 有效地控制基板的膜厚。 因此, 本发明适用于有机发光二 极管行业中基板的蒸 4$工艺的真空蒸镀装置, 其不仅结构简单紧凑, 而且能够 实现全自动监控基板的蒸镀膜厚, 从¾有效提高镀膜精密度 提高真空蒸镀工 艺的效率以及镀膜质量„  Compared with the prior art, the vacuum evaporation apparatus of the present invention comprises a vapor deposition mechanism transmission mechanism, a sensor and a vacuum mechanism. The overall structure is simple and compact, which reduces the manufacturing and running costs of the vacuum evaporation apparatus to some extent. Further, since the vacuum evaporation apparatus employs a sensor, the temperature of the evaporation boat can be automatically controlled and the operation speed of the transmission unit can be controlled, thereby controlling the degree of coating of the substrate by the vacuum evaporation apparatus, and effectively controlling the film thickness of the substrate. Therefore, the present invention is applicable to a vacuum evaporation apparatus for a vapor deposition process of a substrate in the organic light emitting diode industry, which is not only simple and compact in structure, but also capable of fully realizing the thickness of the vapor deposition film of the substrate, and effectively improving the precision of the coating from 3⁄4. The efficiency of the evaporation process and the quality of the coating
以上所揭露的仅为本发明的较佳实 而已, 当然不能以此来限定本发明之 权利范围, 因此依本发明申请专利范围所作的等同变化, 仍属于本发明所涵盖 的范围。  The above disclosure is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, and the equivalent changes made by the scope of the present invention remain within the scope of the present invention.

Claims

利 要 求 Demand
1. 一种真空蒸镀装置,适用于有机发光二极管行业中基板的蒸镀工艺,其 特征在于, 所述真空蒸镀装置包括: A vacuum evaporation apparatus suitable for an evaporation process of a substrate in the organic light emitting diode industry, characterized in that the vacuum evaporation apparatus comprises:
传输机构, 所述传输机构包括主腔体、 阔 π, 传输组件以及驱动器, 所述 主腔体呈中空结构, 所迷主腔体两倒分别正对开设有闸口 , 两闸门分別安装于 两所述闸口处, 所述主腔体的底部还开设有连接口 , 所述传输组件连接于两所 述闸口之间, 所述驱动器与所述闸门及所述传输組件连接, 所述.驱动器驱动所 述闸 Π相对所述闸口的打开或关闭 ,所述驱动器驱动所述基板在所述传输组件 上移动;  a transmission mechanism, the transmission mechanism comprises a main cavity, a width π, a transmission component and a driver, wherein the main cavity has a hollow structure, and the main cavity is respectively opposite to each other with a gate, and the two gates are respectively installed in the two At the gate, the bottom of the main cavity is further provided with a connection port, the transmission component is connected between the two gates, and the driver is connected with the gate and the transmission component, the drive drive station The opening or closing of the gate relative to the gate, the driver driving the substrate to move on the transmission assembly;
蒸镀机构, 所述蒸镀机构包括副腔体、 挡板、 动力組件、 蒸发舟以及至少 一个蒸发源, 所述副腔体呈中空结构, 所述蒸发.舟安装于所述副腔体内, 所述 蒸发源放置亍所述蒸发舟内,所述副腔体正对所述主腔体的所述连接口处开设 有对接口, 所述挡板安装于所述连接口与所述对接口之间, 且所述挡板与所述 动力组件连接, 所述挡板与所述副腔体的中空結构形成副密封空腔, 所述挡板 与所述主腔体的中空结构形成主密封空腔,所述驱动器驱动所述挡板打开或关 闭; 当所述挡板打开, 所述主密封空腔与所述副密封空腔相互连通; 当所述挡 板关闭, 所述主密封空腔与所迷副密封空腔相互独立密封;  An evaporation mechanism, the vapor deposition mechanism includes a sub-cavity, a baffle, a power assembly, an evaporation boat, and at least one evaporation source, wherein the sub-cavity has a hollow structure, and the evaporation vessel is installed in the sub-cavity The evaporation source is placed in the evaporation boat, and the auxiliary cavity is provided with a pair of interfaces at the connection port of the main cavity, and the baffle is mounted on the connection port and the pair of interfaces Between the baffle and the power assembly, the baffle and the hollow structure of the sub-cavity form a sub-sealing cavity, and the baffle forms a main seal with the hollow structure of the main cavity a cavity, the driver driving the baffle to open or close; when the baffle is opened, the main sealing cavity and the sub-sealing cavity are in communication with each other; when the baffle is closed, the main seal is empty The cavity and the auxiliary sealing cavity are sealed independently of each other;
传感控制装置,所述传感控制装置包括传感器及与所述.传感器电连接的控 制器, 所述传感器安装亍所述主腔体内, 所述控制器与所述传输組件及蒸发舟 电连接; 以.及  a sensing control device, comprising: a sensor and a controller electrically connected to the sensor, the sensor being installed in the main cavity, the controller being electrically connected to the transmission component and the evaporation boat ; as well as
真空机构, 所述真空机构包括粗抽管道、 真空泵以及闸阀, 所述粗抽管道 的一端与所述副腔体连通, 所述粗抽管道的另一端与所述真空泵相连接, 所述 闸阀安装在所述真空泵与所述副腔体之间。  a vacuum mechanism, the vacuum mechanism includes a rough pumping pipe, a vacuum pump, and a gate valve, one end of the rough pumping pipe is in communication with the auxiliary cavity, and the other end of the rough pumping pipe is connected to the vacuum pump, and the gate valve is installed Between the vacuum pump and the secondary cavity.
2。 如权利要求 1所述的真空蒸镀装置, 其特征在于,还包括减震机构, 所 述减震机构与所述真空泵相连接。 2. A vacuum evaporation apparatus according to claim 1, further comprising a damper mechanism, said damper mechanism being coupled to said vacuum pump.
3. 如权利要求 2所述的真空蒸镀装置,其特征在于,所述减震机构包括弹 簧和波紋管, 所述弹簧和所述波紋管均安装在所述闸阀与所述真空泵之间。 3. The vacuum evaporation apparatus according to claim 2, wherein the damper mechanism comprises a spring and a bellows, and the spring and the bellows are both installed between the gate valve and the vacuum pump.
4. 如权利要求 i所述的真空蒸镀装置, 其特征在于,还包括真空规, 所述 真空规适用于检测所述真空蒸镀装置的真空状态。 4. The vacuum evaporation apparatus according to claim 1, further comprising a vacuum gauge adapted to detect a vacuum state of the vacuum evaporation apparatus.
5. 如权利要求 1所述的真空蒸镀装置,其特征在于,所述传输组件包括输 入部件、 传动部件以及齿条, 所述输入部件连接所述传动部件, 所述传动部件 柩接于所述齿条, 所述齿条承载并传送所述基板。 5. The vacuum evaporation apparatus according to claim 1, wherein said transmission assembly comprises an input member, a transmission member, and a rack, said input member being coupled to said transmission member, said transmission member being coupled to said transmission member A rack that carries and transports the substrate.
6. 如权利要求 5所述的真空蒸镀装置,其特征在于,所述传动部件包括第 一传动轴、 数个锥齿轮、 数个第二传动轴以及传动齿轮, 所述第一传动轴抠接 于所述输入部件, 所述锥齿轮枢接于所述第一传动轴上, 每一所述锥齿轮与每 一所迷第二传动轴的一端相连接,每一所述第二传动轴的另一端与所述传动齿 轮相连接, 所述传动齿轮与所述齿条相枢接。 6. The vacuum evaporation apparatus according to claim 5, wherein the transmission member comprises a first transmission shaft, a plurality of bevel gears, a plurality of second transmission shafts, and a transmission gear, and the first transmission shaft 抠Connected to the input member, the bevel gear is pivotally connected to the first transmission shaft, and each of the bevel gears is connected to one end of each of the second transmission shafts, and each of the second transmission shafts The other end is connected to the transmission gear, and the transmission gear is pivotally connected to the rack.
7. 如权利要求 5所述的真空蒸镀装置, 其特征在于,还包括磁流体, 所述 磁流体连接所述驱动器与所述输入部件。 7. The vacuum evaporation apparatus according to claim 5, further comprising a magnetic fluid, the magnetic fluid connecting the driver and the input member.
8.如权利要求 1所述的真空蒸镀装置,其特征在于,所述蒸发源包括一主 蒸发源和数个副蒸发源, 所述副蒸发源位于所述主蒸发源的周边。 The vacuum evaporation apparatus according to claim 1, wherein said evaporation source comprises a primary evaporation source and a plurality of secondary evaporation sources, said secondary evaporation source being located at a periphery of said primary evaporation source.
9. 如权利要求 1所述的真空蒸镀装置,其特征在于,所述传感器是晶体振 荡传感器。 9. The vacuum evaporation apparatus according to claim 1, wherein the sensor is a crystal oscillation sensor.
10. 如权利要求 1所述的真空蒸镀装置, 其特征在于, 所述,传感器位于所 述闲口上方。 10. The vacuum evaporation apparatus according to claim 1, wherein said sensor is located above said idle.
PCT/CN2010/074951 2010-03-23 2010-07-03 Vacuum vapor deposition apparatus WO2011116563A1 (en)

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