CN203754797U - Vacuum evaporation coating device - Google Patents
Vacuum evaporation coating device Download PDFInfo
- Publication number
- CN203754797U CN203754797U CN201320746064.7U CN201320746064U CN203754797U CN 203754797 U CN203754797 U CN 203754797U CN 201320746064 U CN201320746064 U CN 201320746064U CN 203754797 U CN203754797 U CN 203754797U
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- CN
- China
- Prior art keywords
- substrate
- vacuum chamber
- coating device
- cooling
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007738 vacuum evaporation Methods 0.000 title claims abstract description 22
- 238000000576 coating method Methods 0.000 title abstract description 12
- 239000011248 coating agent Substances 0.000 title abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000001816 cooling Methods 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 21
- 239000007789 gas Substances 0.000 claims abstract description 16
- 238000001704 evaporation Methods 0.000 claims abstract description 15
- 230000008020 evaporation Effects 0.000 claims abstract description 15
- 239000000112 cooling gas Substances 0.000 claims abstract description 8
- 239000007888 film coating Substances 0.000 claims description 19
- 238000009501 film coating Methods 0.000 claims description 19
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000001307 helium Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- 230000017525 heat dissipation Effects 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 13
- 229910052711 selenium Inorganic materials 0.000 description 13
- 239000011669 selenium Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 230000019771 cognition Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a vacuum evaporation coating device. The vacuum evaporation coating device comprises a vacuum chamber, wherein the vacuum chamber is internally provided with an evaporation source and a substrate, the to-be-coated surface of the substrate is arranged above the evaporation source, the substrate is fixedly arranged on a metal plate which can horizontally do reciprocating motion; a cooling air inlet is formed at the top of the vacuum chamber, one side of the cooling air inlet is connected to a cooling gas source by virtue of a regulating valve and the other side of the cooling air inlet is extended into the vacuum chamber and is provided with a gas guide device. According to the vacuum evaporation coating device disclosed by the utility model, since the substrate is fixed on the metal plate which can horizontally do reciprocating motion, the uniformity of the coating is ensured, the damage of the substrate due to uneven heat dissipation or over-rapid cooling speed is effectively avoided, and the qualified rate of products is improved; by virtue of forming the cooling air inlet at the top of the vacuum chamber and adopting a gas cooling manner, the mechanical structure in the vacuum chamber is further simplified, and the temperature of the metal plate behind the substrate, namely the surface temperature of the substrate, can be monitored in real time.
Description
Technical field
The utility model relates to a kind of film coating apparatus, relates in particular to a kind of vacuum evaporation film coating device.
Background technology
Coating equipment is mainly by entering (going out) material chamber, coating chamber, linear selenium vaporizing-source system, cooling water system, vacuum system and composition of the control system.As the carrier (substrate) of selenium film, can be cylinder drum or thin plate.Amorphous selenium coating thin film generally uses pure selenium to do the raw material of evaporation use, and selenium belongs to oxygen family element in the periodic table of chemical element, and the fusing point of selenium is 217 DEG C, and boiling point is 684.9 DEG C; Selenium has photovoltaic effect performance, and amorphous selenium film exists as important Transfer Medium in the copying equipments such as picture, documentation and Mapping System.For example, the toner cartridge of duplicating machine, the amorphous selenium photodiode array assembly of DR flat panel detector etc.
The substrate of evaporation amorphous selenium film is generally glass, the allowable temperature scope of substrate is within the scope of 50-80 DEG C, the too high meeting of substrate temperature makes amorphous selenium change crystal selenium into, can affect the bonding strength of film and the stress relief of substrate and substrate temperature is too low, just become so how to control substrate temperature when plated film well the important factor that affects amorphous selenium film quality.
Traditional temperature control method is to be generally distributed with water-cooled tube or cooling water sandwich at vacuum chamber outside surface, internal vacuum chamber is installed the well heater for toasting, the two,, in conjunction with the temperature of controlling substrate, can not lower temperature when substrate temperature is too high in time, and conforming product rate is unstable.
Utility model content
Technical problem to be solved in the utility model is to provide a kind of vacuum evaporation film coating device, can ensure the homogeneity of plated film, the inhomogeneous or cooling too fast damaged substrate problem causing of effectively avoiding dispelling the heat, improves conforming product rate, and simple in structure, be easy to apply.
The utility model is to solve the problems of the technologies described above the technical scheme adopting to be to provide a kind of vacuum evaporation film coating device, comprise vacuum chamber, in described vacuum chamber, be provided with evaporation source and substrate, the plated one side of described substrate is on evaporation source, wherein, described substrate be fixed on can the metal sheet of horizontal reciprocating movement on.
Above-mentioned vacuum evaporation film coating device, wherein, the top of described vacuum chamber offers cooling atmosphere entrance, and a side of described cooling atmosphere entrance is connected with cooling gas source of the gas by variable valve, and opposite side stretches into vacuum chamber and is provided with gas operated device.
Above-mentioned vacuum evaporation film coating device, wherein, described cooling gas source of the gas is argon gas or helium.
Above-mentioned vacuum evaporation film coating device, wherein, the both sides of described cooling atmosphere entrance are provided with molecular pump.
Above-mentioned vacuum evaporation film coating device, wherein, is provided with flexible baffle between described metal sheet and vacuum chamber, and described flexible baffle is distributed in the both sides of molecular pump.
Above-mentioned vacuum evaporation film coating device, wherein, described metal plate is provided with radiating groove to the surface of cooling atmosphere inlet side.
The utility model contrast prior art has following beneficial effect: the vacuum evaporation film coating device that the utility model provides, by substrate be fixed on can the metal sheet of horizontal reciprocating movement on, thereby ensure the homogeneity of plated film, inhomogeneous or the cooling too fast damaged substrate that causes of effectively avoiding dispelling the heat, improves conforming product rate.In addition, the utility model is offered cooling atmosphere entrance at the top of vacuum chamber, adopt gas-cooled mode, further simplify physical construction in vacuum chamber, temperature by Real-Time Monitoring substrate metal sheet is behind the surface temperature of substrate, adjust cooling atmosphere flow, avoid better because of the inhomogeneous or cooling too fast damaged substrate that causes of dispelling the heat, improve conforming product rate.
Brief description of the drawings
Fig. 1 is the utility model vacuum evaporation film coating device structural representation.
In figure:
1 vacuum chamber 2 evaporation source 3 substrates
Cooling atmosphere entrance 6 variable valve of 4 metal sheet 5
7 molecular pump 8 flexible baffles
Embodiment
Below in conjunction with drawings and Examples, the utility model will be further described.
Fig. 1 is the utility model vacuum evaporation film coating device structural representation.
Refer to Fig. 1, the vacuum evaporation film coating device that the utility model provides comprises vacuum chamber 1, is provided with evaporation source 2 and substrate 3 in described vacuum chamber 1, and the plated one side of described substrate 3 is on evaporation source 2, wherein, described substrate 3 be fixed on can the metal sheet 4 of horizontal reciprocating movement on.
The vacuum evaporation film coating device that the utility model provides, the plated one side of substrate 3 is on evaporation source 2, substrate 3 is fixed on metal sheet 4 and forms substrate transmission mechanism, the material of metal sheet 4 can be the material of copper or other dispel the heat good and heatproofs, physical dimension is greater than substrate 3 itself, to prevent that evaporated material from crossing metal sheet and polluting other component; Substrate 3 moves reciprocatingly in the horizontal direction with metal sheet 4, ensures the homogeneity of the plated film of substrate surface.
The vacuum evaporation film coating device that the utility model provides, the top of vacuum chamber 1 arranges a cooling atmosphere entrance 5, one side of described cooling atmosphere entrance 5 is connected with cooling gas source of the gas by variable valve 6, and opposite side stretches in vacuum chamber 1 and is provided with gas operated device (not shown).Cooling gas source of the gas can be argon gas or helium.Metal sheet 4 can arrange radiating groove (not shown) in the face of the surface of cooling atmosphere entrance 5 one sides, be convenient to cooling atmosphere by time take away rapidly the heat of metal sheet.In evaporation coating process, cold gas cognition continues to pass into vacuum chamber 1 and blows on substrate metal sheet 4 radiating grooves behind, and when the size of gas flow and the area of substrate, substrate evaporation coating, temperature speed how many and temperature variation all has relation.
In addition, the vacuum evaporation film coating device that the utility model provides, two molecular pumps 7 that pumping speed is higher can be installed in the both sides of described cooling atmosphere entrance 5, enter the cooling gas of vacuum chamber 1 by after metal-plate radiating groove, should be able to be taken out by two molecular pumps rapidly; In addition, between the region that two molecular pumps 7 form and metal sheet 4, flexible baffle 8 is installed, as rubber baffle, makes this space form a negative pressuren zone, operating pressure in the time of evaporation coating in whole vacuum chamber 1 there will not be the rapid drawdown equipressure that rises sharply to change, and guarantees that coating process continues to carry out.
Although the utility model discloses as above with preferred embodiment; so it is not in order to limit the utility model; any those skilled in the art; not departing from spirit and scope of the present utility model; when doing a little amendment and perfect, therefore protection domain of the present utility model is worked as with being as the criterion that claims were defined.
Claims (2)
1. a vacuum evaporation film coating device, comprise vacuum chamber (1), in described vacuum chamber (1), be provided with evaporation source (2) and substrate (3), the plated one side of described substrate (3) is on evaporation source (2), it is characterized in that, described substrate (3) be fixed on can the metal sheet (4) of horizontal reciprocating movement on, the top of described vacuum chamber (1) offers cooling atmosphere entrance (5), one side of described cooling atmosphere entrance (5) is connected with cooling gas source of the gas by variable valve (6), opposite side stretches into vacuum chamber (1) and is provided with gas operated device, the both sides of described cooling atmosphere entrance (5) are provided with molecular pump (7), between described metal sheet (4) and vacuum chamber (1), be provided with flexible baffle (8), described flexible baffle (8) is distributed in the both sides of molecular pump (7), the surface that described metal sheet (4) is faced cooling atmosphere entrance (5) one sides is provided with radiating groove.
2. vacuum evaporation film coating device as claimed in claim 1, is characterized in that, described cooling gas source of the gas is argon gas or helium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320746064.7U CN203754797U (en) | 2013-11-22 | 2013-11-22 | Vacuum evaporation coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320746064.7U CN203754797U (en) | 2013-11-22 | 2013-11-22 | Vacuum evaporation coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203754797U true CN203754797U (en) | 2014-08-06 |
Family
ID=51250096
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320746064.7U Expired - Fee Related CN203754797U (en) | 2013-11-22 | 2013-11-22 | Vacuum evaporation coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203754797U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108793136A (en) * | 2017-05-02 | 2018-11-13 | 上海奇谋能源技术开发有限公司 | A kind of method producing graphene and the device for realizing this method |
| CN111424238A (en) * | 2020-03-30 | 2020-07-17 | 超晶科技（北京）有限公司 | Thermal evaporation equipment for realizing low-temperature coating and low-melting-point film material |
| CN113463021A (en) * | 2021-06-30 | 2021-10-01 | 武汉华星光电半导体显示技术有限公司 | Cooling device and cooling method thereof |
-
2013
- 2013-11-22 CN CN201320746064.7U patent/CN203754797U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108793136A (en) * | 2017-05-02 | 2018-11-13 | 上海奇谋能源技术开发有限公司 | A kind of method producing graphene and the device for realizing this method |
| CN111424238A (en) * | 2020-03-30 | 2020-07-17 | 超晶科技（北京）有限公司 | Thermal evaporation equipment for realizing low-temperature coating and low-melting-point film material |
| CN113463021A (en) * | 2021-06-30 | 2021-10-01 | 武汉华星光电半导体显示技术有限公司 | Cooling device and cooling method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140806 |