CN109518154A - Superconducting strip cushion double-sided coating device - Google Patents

Superconducting strip cushion double-sided coating device Download PDF

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Publication number
CN109518154A
CN109518154A CN201910038625.XA CN201910038625A CN109518154A CN 109518154 A CN109518154 A CN 109518154A CN 201910038625 A CN201910038625 A CN 201910038625A CN 109518154 A CN109518154 A CN 109518154A
Authority
CN
China
Prior art keywords
directive wheel
disk
base band
sputtering chamber
wheel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910038625.XA
Other languages
Chinese (zh)
Inventor
鲁玉明
豆文芝
蔡传兵
汪洋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHANGHAI CREATIVE SUPERCONDUCTOR TECHNOLOGIES Co Ltd
Original Assignee
SHANGHAI CREATIVE SUPERCONDUCTOR TECHNOLOGIES Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHANGHAI CREATIVE SUPERCONDUCTOR TECHNOLOGIES Co Ltd filed Critical SHANGHAI CREATIVE SUPERCONDUCTOR TECHNOLOGIES Co Ltd
Priority to CN201910038625.XA priority Critical patent/CN109518154A/en
Publication of CN109518154A publication Critical patent/CN109518154A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention relates to a kind of superconducting strip cushion double-sided coating devices.It is secondary around low with existing production efficiency and the technical issues of friction leave scratch can be generated to metal base band and film surface mainly to solve secondary film coating.A kind of technical solution of the present invention are as follows: superconducting strip cushion double-sided coating device, disk and closed reel are unreeled including horizontal spacing setting, in the side for unreeling disk, directive wheel a and directive wheel b is set, directive wheel a and directive wheel b is setting up and down and in same axis, directive wheel c is equipped in the left side for unreeling disk, directive wheel c with unreel directive wheel b below disk in the same horizontal line, directive wheel d is equipped in the top of directive wheel c, directive wheel c and directive wheel d are on the same axis, directive wheel e is equipped in the horizontal direction of directive wheel d, same axis is equipped with directive wheel f below directive wheel e, the directive wheel f and directive wheel g on the outside of closed reel is in the same horizontal line, base band enters closed reel from the above-mentioned each directive wheel of disk output process is unreeled, front coating apparatus is equipped on the left of the base band on directive wheel c and directive wheel d, Reverse side coating apparatus is equipped on the left of the base band on directive wheel e and directive wheel f.

Description

Superconducting strip cushion double-sided coating device
Technical field
The present invention relates to the coating apparatus of band, in particular to a kind of superconducting strip cushion double-sided coating device.
Background technique
Superconduction coating process is the enterprising row buffering layer plated film of metal base band after a polish at present, plates several layers of oxidation films Layer improves the growth conditions of lower road technique superconducting layer.For normal production, at the polishing of our advanced row metal bands Reason, this is two-sided electrochemical polish technology.But when arriving subsequent handling, the preparation of the plated film and superconducting layer of buffer layer is all single side Production, is also the performance of only single side including final product.
If preparation can be synchronized from the back side of base band, the product of same thickness possesses two-sided buffer layer and surpasses After conducting shell, double promotion is also had in performance.If double-sided coating is carried out to the metal base band after polishing, by existing Equipment certainly will there was only a kind of method: be exactly normal first plating one side, carry out after completing reversely around band, film surface around inside Portion, the back side outwardly, carry out second of plated film again after completing.In our current process flows, multiple can be to gold around band Belong to base band and film surface generates friction and leaves the irreversible destruction such as scratch, and it is non-repeatedly to prepare the efficiency for production It is often low.
Summary of the invention
The object of the present invention is to provide a kind of superconducting strip cushion double-sided coating devices, and it is secondary mainly to solve secondary film coating Around low with existing production efficiency and the technical issues of friction leave scratch can be generated to metal base band and film surface.
Technical solution of the present invention are as follows: a kind of superconducting strip cushion double-sided coating device, putting including horizontal spacing setting Reel and closed reel, unreel disk side setting directive wheel a and directive wheel b, directive wheel a and directive wheel b it is setting up and down and Same axis is equipped with directive wheel c in the left side for unreeling disk, directive wheel c with unreel directive wheel b below disk in same horizontal line On, directive wheel d, directive wheel c and directive wheel d are equipped on the same axis in the top of directive wheel c, in the level side of directive wheel d To directive wheel e is equipped with, same axis is equipped with directive wheel f below directive wheel e, and directive wheel f exists with the directive wheel g on the outside of closed reel In same horizontal line, base band enters closed reel from the above-mentioned each directive wheel of disk output process is unreeled, in directive wheel c and directive wheel d On base band on the left of be equipped with front coating apparatus, on the left of the base band on directive wheel e and directive wheel f be equipped with reverse side coating apparatus.
Directive wheel c and directive wheel d is arranged in sputtering chamber a, and front coating apparatus is fixed on sputtering chamber a inner wall, guiding It takes turns e and directive wheel f to be arranged in sputtering chamber b, reverse side coating apparatus is fixed on sputtering chamber b inner wall, sputtering chamber a and sputtering chamber b Upper end is located in adapter cavity by adapter cavity connection by the base band of directive wheel d and directive wheel e.
The beneficial effects of the present invention are: point two chambers successively carry out base band by the way of once preparing double-sided coating The plated film on two sides.The efficiency of double-sided coating is substantially increased, and reduces multiple coiling bring risk, unit cost Superconducting tape, which just has, has double superconductivity.
Detailed description of the invention
Fig. 1 is schematic structural view of the invention.
Fig. 2 is plated film base band of the present invention XRD test result figure end to end.
Fig. 3 is plated film base band roughness result figure of the present invention.
In figure: 1- unreels disk, 2- closed reel, 3- directive wheel a, 4- directive wheel b, 5- directive wheel c, 6- directive wheel d, 7- guiding Wheel e, 8- directive wheel f, 9- directive wheel g, 10- base band, the front 11- coating apparatus, 12- reverse side coating apparatus, 13- sputtering chamber a, 14- sputtering chamber b, 15- adapter cavity.
Specific embodiment
Referring to Fig.1, a kind of superconducting strip cushion double-sided coating device unreels disk 1 and receipts including horizontal spacing setting Reel 2, it is setting up and down and same in side setting the directive wheel a3 and directive wheel b4, directive wheel a3 and directive wheel b4 for unreeling disk 1 One axis is equipped with directive wheel c5 in the left side for unreeling disk 1, directive wheel c5 with unreel directive wheel b4 below disk in same level On line, directive wheel d6, directive wheel c5 and directive wheel d6 are equipped on the same axis in the top of directive wheel c5, directive wheel d6's Horizontal direction is equipped with directive wheel e7, and same axis is equipped with directive wheel f8,2 outside directive wheel f8 and closed reel below directive wheel e7 Directive wheel g9 in the same horizontal line, base band 10 enters closed reel 2 by above-mentioned each directive wheel from unreeling the output of disk 1, Front coating apparatus 11(Chinese Academy of Sciences Shenyang scientific instrument share is equipped on the left of base band 10 on directive wheel c5 and directive wheel d6 Co., Ltd), reverse side coating apparatus 12(Chinese Academy of Sciences Shenyang is equipped on the left of the base band 10 on directive wheel e7 and directive wheel f8 Scientific instrument limited liability company).
Directive wheel c5 and directive wheel d6 is arranged in sputtering chamber a13, and front coating apparatus 11 is fixed on sputtering chamber a13 inner wall On, directive wheel e7 and directive wheel f8 are arranged in sputtering chamber b14, and reverse side coating apparatus 12 is fixed on sputtering chamber b14 inner wall, is splashed Chamber a13 and the upper end sputtering chamber b14 are penetrated by 15 connection of adapter cavity, is located at transition by the base band 10 of directive wheel d6 and directive wheel e7 In chamber 15.
When work, base band 10 is from disk 1 is unreeled, and approach sputtering chamber a13 carries out first time front plated film, using transition Chamber 15 reaches sputtering chamber b14, carries out second of back side coating film, is eventually returned in closed reel 2.Once just complete tow sides plating Film.
XRD test result is shown in Fig. 2 to the long band plated film base band in 1000 obtained end to end, test condition: LMO(46.10)-omg, FWHM=3.3.Roughness 1.7nm is shown in Fig. 3, test condition: 9.5*9.5 μm.

Claims (2)

1. a kind of superconducting strip cushion double-sided coating device unreels disk and closed reel, feature including horizontal spacing setting It is: it is setting up and down in the side setting directive wheel a and directive wheel b, directive wheel a and directive wheel b that unreel disk and in same axis, The left side for unreeling disk is equipped with directive wheel c, directive wheel c with unreel directive wheel b below disk in the same horizontal line, in directive wheel The top of c is equipped with directive wheel d, directive wheel c and directive wheel d on the same axis, is equipped with directive wheel in the horizontal direction of directive wheel d Same axis is equipped with directive wheel f, directive wheel f and the directive wheel g on the outside of closed reel in same horizontal line below e, directive wheel e On, base band enters closed reel from the above-mentioned each directive wheel of disk output process is unreeled, and the base band on directive wheel c and directive wheel d is left Side is equipped with front coating apparatus, and reverse side coating apparatus is equipped on the left of the base band on directive wheel e and directive wheel f.
2. superconducting strip cushion double-sided coating device according to claim 1, it is characterized in that: directive wheel c and directive wheel d It is arranged in sputtering chamber a, front coating apparatus is fixed on sputtering chamber a inner wall, and directive wheel e and directive wheel f are arranged in sputtering chamber b Interior, reverse side coating apparatus is fixed on sputtering chamber b inner wall, and sputtering chamber a and the upper end sputtering chamber b are by adapter cavity connection, by leading It is located in adapter cavity to the base band of wheel d and directive wheel e.
CN201910038625.XA 2019-01-16 2019-01-16 Superconducting strip cushion double-sided coating device Pending CN109518154A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910038625.XA CN109518154A (en) 2019-01-16 2019-01-16 Superconducting strip cushion double-sided coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910038625.XA CN109518154A (en) 2019-01-16 2019-01-16 Superconducting strip cushion double-sided coating device

Publications (1)

Publication Number Publication Date
CN109518154A true CN109518154A (en) 2019-03-26

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111029032A (en) * 2019-11-18 2020-04-17 西部超导材料科技股份有限公司 Method for improving surface quality of NbTi superconducting wire

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1327081A (en) * 2001-05-29 2001-12-19 深圳市坦达尼真空表面技术有限公司 Vacuum evaporation coating method and equipment for organic foamed material
CN1851040A (en) * 2006-05-25 2006-10-25 电子科技大学 Continuous preparation method of dual-face superconducting strip cushion
KR100998851B1 (en) * 2010-05-27 2010-12-08 한국기계연구원 An method of forming buffer layers for superconducting tape
CN102255040A (en) * 2011-04-13 2011-11-23 电子科技大学 Continuous preparation method of double-sided superconducting strip buffer layer
CN103741121A (en) * 2013-12-24 2014-04-23 北京北印东源新材料科技有限公司 Double-sided coating device for soft base material
CN104611680A (en) * 2015-02-09 2015-05-13 常州工学院 Magnetron sputtering winding plating equipment capable of rapid target exchanging and double-sided reciprocating continuous high-efficient plating
CN104674180A (en) * 2015-02-09 2015-06-03 常州工学院 Quick target-exchange double-sided reciprocating continuous-coating magnetron sputtering winding coating machine
CN105702379A (en) * 2016-02-24 2016-06-22 上海上创超导科技有限公司 High-temperature superconductor tape serialization rapid heating device
CN108149214A (en) * 2018-02-05 2018-06-12 苏州新材料研究所有限公司 High production capacity film deposition apparatus and film batch production method
CN209508401U (en) * 2019-01-16 2019-10-18 上海上创超导科技有限公司 Superconducting strip cushion double-sided coating device

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1327081A (en) * 2001-05-29 2001-12-19 深圳市坦达尼真空表面技术有限公司 Vacuum evaporation coating method and equipment for organic foamed material
CN1851040A (en) * 2006-05-25 2006-10-25 电子科技大学 Continuous preparation method of dual-face superconducting strip cushion
KR100998851B1 (en) * 2010-05-27 2010-12-08 한국기계연구원 An method of forming buffer layers for superconducting tape
CN102255040A (en) * 2011-04-13 2011-11-23 电子科技大学 Continuous preparation method of double-sided superconducting strip buffer layer
CN103741121A (en) * 2013-12-24 2014-04-23 北京北印东源新材料科技有限公司 Double-sided coating device for soft base material
CN104611680A (en) * 2015-02-09 2015-05-13 常州工学院 Magnetron sputtering winding plating equipment capable of rapid target exchanging and double-sided reciprocating continuous high-efficient plating
CN104674180A (en) * 2015-02-09 2015-06-03 常州工学院 Quick target-exchange double-sided reciprocating continuous-coating magnetron sputtering winding coating machine
CN105702379A (en) * 2016-02-24 2016-06-22 上海上创超导科技有限公司 High-temperature superconductor tape serialization rapid heating device
CN108149214A (en) * 2018-02-05 2018-06-12 苏州新材料研究所有限公司 High production capacity film deposition apparatus and film batch production method
CN209508401U (en) * 2019-01-16 2019-10-18 上海上创超导科技有限公司 Superconducting strip cushion double-sided coating device

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111029032A (en) * 2019-11-18 2020-04-17 西部超导材料科技股份有限公司 Method for improving surface quality of NbTi superconducting wire
CN111029032B (en) * 2019-11-18 2021-07-06 西部超导材料科技股份有限公司 Method for improving surface quality of NbTi superconducting wire

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Application publication date: 20190326