CN1110096C - Ｌｃ元件，半导体装置及ｌｃ元件的制作方法 - Google Patents

Ｌｃ元件，半导体装置及ｌｃ元件的制作方法 Download PDF

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Publication number
CN1110096C
CN1110096C CN94114815A CN94114815A CN1110096C CN 1110096 C CN1110096 C CN 1110096C CN 94114815 A CN94114815 A CN 94114815A CN 94114815 A CN94114815 A CN 94114815A CN 1110096 C CN1110096 C CN 1110096C
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CN
China
Prior art keywords
mentioned
gate electrode
channel
electrode
input
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN94114815A
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English (en)
Chinese (zh)
Other versions
CN1110028A (zh
Inventor
池田毅
中西努
冈本明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NSC Co Ltd
Original Assignee
Nigata Semitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP34147693A external-priority patent/JP3597879B2/ja
Priority claimed from JP13363994A external-priority patent/JP3474636B2/ja
Application filed by Nigata Semitsu Co Ltd filed Critical Nigata Semitsu Co Ltd
Publication of CN1110028A publication Critical patent/CN1110028A/zh
Application granted granted Critical
Publication of CN1110096C publication Critical patent/CN1110096C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/01—Frequency selective two-port networks
    • H03H7/0115—Frequency selective two-port networks comprising only inductors and capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/40—Resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
    • H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
    • H03B5/18—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising distributed inductance and capacitance
    • H03B5/1841—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising distributed inductance and capacitance the frequency-determining element being a strip line resonator
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/01—Frequency selective two-port networks
    • H03H7/0123—Frequency selective two-port networks comprising distributed impedance elements together with lumped impedance elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/20—Inductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
    • H03H2001/0021—Constructional details
    • H03H2001/0064—Constructional details comprising semiconductor material
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
    • H03H2001/0021—Constructional details
    • H03H2001/0071—Constructional details comprising zig-zag inductor
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
    • H03H2001/0021—Constructional details
    • H03H2001/0078—Constructional details comprising spiral inductor on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Filters And Equalizers (AREA)
CN94114815A 1993-07-26 1994-07-25 Ｌｃ元件，半导体装置及ｌｃ元件的制作方法 Expired - Fee Related CN1110096C (zh)

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP203623/1993 1993-07-26
JP20362393 1993-07-26
JP203623/93 1993-07-26
JP294282/93 1993-10-29
JP29428293 1993-10-29
JP294282/1993 1993-10-29
JP341476/1993 1993-12-10
JP341476/93 1993-12-10
JP34147693A JP3597879B2 (ja) 1993-10-29 1993-12-10 Ｌｃ素子，半導体装置
JP133639/1994 1994-05-24
JP13363994A JP3474636B2 (ja) 1993-07-26 1994-05-24 Ｌｃ素子，半導体装置及びｌｃ素子の製造方法
JP133639/94 1994-05-24

Publications (2)

Publication Number Publication Date
CN1110028A CN1110028A (zh) 1995-10-11
CN1110096C true CN1110096C (zh) 2003-05-28

Family

ID=27471773

Family Applications (1)

Application Number Title Priority Date Filing Date
CN94114815A Expired - Fee Related CN1110096C (zh) 1993-07-26 1994-07-25 Ｌｃ元件，半导体装置及ｌｃ元件的制作方法

Country Status (7)

Country Link
US (2) US5500552A (enExample)
EP (1) EP0637842B1 (enExample)
KR (1) KR100299714B1 (enExample)
CN (1) CN1110096C (enExample)
DE (1) DE69430091T2 (enExample)
FI (1) FI114054B (enExample)
TW (1) TW250591B (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2301706A (en) * 1995-06-01 1996-12-11 Plessey Semiconductors Ltd Intergrated inductor arrangement
US5831331A (en) * 1996-11-22 1998-11-03 Philips Electronics North America Corporation Self-shielding inductor for multi-layer semiconductor integrated circuits
US6885275B1 (en) * 1998-11-12 2005-04-26 Broadcom Corporation Multi-track integrated spiral inductor
GB2353139B (en) * 1999-08-12 2001-08-29 United Microelectronics Corp Inductor and method of manufacturing the same
DE10232642B4 (de) * 2002-07-18 2006-11-23 Infineon Technologies Ag Integrierte Transformatoranordnung
US7230316B2 (en) * 2002-12-27 2007-06-12 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having transferred integrated circuit
JP2004228188A (ja) * 2003-01-21 2004-08-12 Renesas Technology Corp 半導体装置
US7425485B2 (en) * 2005-09-30 2008-09-16 Freescale Semiconductor, Inc. Method for forming microelectronic assembly
US20080251275A1 (en) * 2007-04-12 2008-10-16 Ralph Morrison Decoupling Transmission Line
US8212155B1 (en) * 2007-06-26 2012-07-03 Wright Peter V Integrated passive device
KR20090061974A (ko) * 2007-12-12 2009-06-17 한국전자통신연구원 동작 주파수가 가변되는 자기장 강화 장치
JP2010080926A (ja) * 2008-08-29 2010-04-08 Toshiba Lighting & Technology Corp Ｌｅｄ点灯装置および照明器具
KR102072803B1 (ko) * 2013-04-12 2020-02-04 삼성디스플레이 주식회사 박막 반도체 장치 및 유기 발광 표시 장치
US9461222B1 (en) * 2015-06-30 2016-10-04 Epistar Corporation Light-emitting element and the light-emitting module thereof
US11164694B2 (en) * 2019-09-27 2021-11-02 Apple Inc. Low-spurious electric-field inductor design
US11735519B2 (en) * 2021-06-24 2023-08-22 Xilinx, Inc. In-package passive inductive element for reflection mitigation

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3504430A (en) * 1966-06-27 1970-04-07 Hitachi Ltd Method of making semiconductor devices having insulating films
GB2103012A (en) * 1981-07-03 1983-02-09 Clarion Co Ltd Variable capacitor
JPS594144A (ja) * 1982-06-30 1984-01-10 Fujitsu Ltd 半導体装置
US4619001A (en) * 1983-08-02 1986-10-21 Matsushita Electric Industrial Co., Ltd. Tuning systems on dielectric substrates
US4737830A (en) * 1986-01-08 1988-04-12 Advanced Micro Devices, Inc. Integrated circuit structure having compensating means for self-inductance effects
US4720467A (en) * 1986-09-29 1988-01-19 International Business Machines Corporation Method of forming a capacitor-transistor integrated circuit
US4819047A (en) * 1987-05-15 1989-04-04 Advanced Micro Devices, Inc. Protection system for CMOS integrated circuits
JP2732089B2 (ja) * 1988-10-14 1998-03-25 ローム株式会社 集積回路のコンデンサ形成方法
US5136357A (en) * 1989-06-26 1992-08-04 Micron Technology, Inc. Low-noise, area-efficient, high-frequency clock signal distribution line structure
JP3280019B2 (ja) * 1989-10-26 2002-04-30 新潟精密株式会社 Ｌｃノイズフィルタ
JPH03190302A (ja) * 1989-12-19 1991-08-20 Mitsubishi Electric Corp 電界効果トランジスタを使用した共振回路
US5227659A (en) * 1990-06-08 1993-07-13 Trustees Of Boston University Integrated circuit inductor
JPH04326607A (ja) * 1991-04-26 1992-11-16 Sumitomo Electric Ind Ltd 発振回路
JP3045573B2 (ja) * 1991-08-19 2000-05-29 北川工業株式会社 電子部品、コンデンサおよび３端子ノイズフィルタの製造方法
US5431987A (en) * 1992-11-04 1995-07-11 Susumu Okamura Noise filter
US5370766A (en) * 1993-08-16 1994-12-06 California Micro Devices Methods for fabrication of thin film inductors, inductor networks and integration with other passive and active devices

Also Published As

Publication number Publication date
EP0637842A1 (en) 1995-02-08
FI943504A7 (fi) 1995-01-27
KR100299714B1 (ko) 2001-10-22
FI114054B (fi) 2004-07-30
DE69430091T2 (de) 2002-10-31
US5500552A (en) 1996-03-19
EP0637842B1 (en) 2002-03-13
US5846845A (en) 1998-12-08
FI943504A0 (fi) 1994-07-26
CN1110028A (zh) 1995-10-11
KR950004609A (ko) 1995-02-18
TW250591B (enExample) 1995-07-01
DE69430091D1 (de) 2002-04-18

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C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
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Owner name: NEW PRECISION CO., LTD.

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Effective date: 20010629

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Address after: Niigata County, Japan

Applicant after: Niigata Seimitsu Co., Ltd.

Address before: Tokyo, Japan

Applicant before: T I F Ltd

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GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee