CN1084549C - Lc元件、半导体器件及lc元件的制作方法 - Google Patents
Lc元件、半导体器件及lc元件的制作方法 Download PDFInfo
- Publication number
- CN1084549C CN1084549C CN94113747A CN94113747A CN1084549C CN 1084549 C CN1084549 C CN 1084549C CN 94113747 A CN94113747 A CN 94113747A CN 94113747 A CN94113747 A CN 94113747A CN 1084549 C CN1084549 C CN 1084549C
- Authority
- CN
- China
- Prior art keywords
- electrode
- electrodes
- junction layer
- inductor
- inductor electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 61
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 239000003990 capacitor Substances 0.000 claims abstract description 66
- 230000002441 reversible effect Effects 0.000 claims abstract description 49
- 238000000034 method Methods 0.000 claims description 47
- 230000008054 signal transmission Effects 0.000 claims description 22
- 230000004048 modification Effects 0.000 description 29
- 238000012986 modification Methods 0.000 description 29
- 230000008569 process Effects 0.000 description 20
- 239000004020 conductor Substances 0.000 description 16
- 230000002829 reductive effect Effects 0.000 description 10
- 230000008901 benefit Effects 0.000 description 9
- 230000008859 change Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 238000002955 isolation Methods 0.000 description 9
- 238000005530 etching Methods 0.000 description 8
- 239000007791 liquid phase Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000003321 amplification Effects 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 5
- 238000003199 nucleic acid amplification method Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/01—Frequency selective two-port networks
- H03H7/0115—Frequency selective two-port networks comprising only inductors and capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
- H03H2001/0021—Constructional details
- H03H2001/0064—Constructional details comprising semiconductor material
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
- H03H2001/0021—Constructional details
- H03H2001/0078—Constructional details comprising spiral inductor on a substrate
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Integrated Circuits (AREA)
- Filters And Equalizers (AREA)
- Coils Or Transformers For Communication (AREA)
Abstract
Description
Claims (17)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29611693A JP3373267B2 (ja) | 1993-11-01 | 1993-11-01 | Lc素子及び半導体装置 |
JP296116/93 | 1993-11-01 | ||
JP31730793A JPH07147383A (ja) | 1993-11-24 | 1993-11-24 | Lc素子,半導体装置及びlc素子の製造方法 |
JP317307/93 | 1993-11-24 | ||
JP34642993A JP3290276B2 (ja) | 1993-12-22 | 1993-12-22 | Lc素子,半導体装置及びlc素子の製造方法 |
JP346429/93 | 1993-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1106592A CN1106592A (zh) | 1995-08-09 |
CN1084549C true CN1084549C (zh) | 2002-05-08 |
Family
ID=27338032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN94113747A Expired - Fee Related CN1084549C (zh) | 1993-11-01 | 1994-11-01 | Lc元件、半导体器件及lc元件的制作方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5557138A (zh) |
EP (1) | EP0653837B1 (zh) |
KR (1) | KR100320001B1 (zh) |
CN (1) | CN1084549C (zh) |
DE (1) | DE69423568T2 (zh) |
FI (1) | FI113910B (zh) |
TW (1) | TW275152B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW267260B (zh) * | 1993-12-29 | 1996-01-01 | Tif Kk | |
US5936299A (en) * | 1997-03-13 | 1999-08-10 | International Business Machines Corporation | Substrate contact for integrated spiral inductors |
US6005281A (en) * | 1997-05-07 | 1999-12-21 | Advanced Micro Devices, Inc. | Apparatus for the non-contact manipulation of a semiconductor die |
JP4080582B2 (ja) * | 1997-12-22 | 2008-04-23 | 株式会社東芝 | 半導体集積回路装置 |
US5952893A (en) * | 1998-03-06 | 1999-09-14 | International Business Machines Corporation | Integrated circuit inductors for use with electronic oscillators |
US6885275B1 (en) * | 1998-11-12 | 2005-04-26 | Broadcom Corporation | Multi-track integrated spiral inductor |
GB2353139B (en) * | 1999-08-12 | 2001-08-29 | United Microelectronics Corp | Inductor and method of manufacturing the same |
JP4256575B2 (ja) * | 2000-08-15 | 2009-04-22 | パナソニック株式会社 | バイアホールを備えた高周波受動回路および高周波増幅器 |
US7037820B2 (en) * | 2004-01-30 | 2006-05-02 | Agere Systems Inc. | Cross-fill pattern for metal fill levels, power supply filtering, and analog circuit shielding |
US7425485B2 (en) * | 2005-09-30 | 2008-09-16 | Freescale Semiconductor, Inc. | Method for forming microelectronic assembly |
US7724484B2 (en) * | 2006-12-29 | 2010-05-25 | Cobham Defense Electronic Systems Corporation | Ultra broadband 10-W CW integrated limiter |
JP5366932B2 (ja) * | 2007-05-08 | 2013-12-11 | スキャニメトリクス,インコーポレイテッド | 超高速信号送受信 |
CN101707478B (zh) * | 2009-11-24 | 2012-05-16 | 南京航空航天大学 | 一种滤波电容器寄生电感的消除装置 |
US9793039B1 (en) * | 2011-05-04 | 2017-10-17 | The Board Of Trustees Of The University Of Alabama | Carbon nanotube-based integrated power inductor for on-chip switching power converters |
US9590514B1 (en) | 2013-03-15 | 2017-03-07 | The Board Of Trustees Of The University Of Alabama, For And On Behalf Of The University Of Alabama | Carbon nanotube-based integrated power converters |
CN103825074B (zh) * | 2014-01-24 | 2015-12-23 | 浙江纺织服装职业技术学院 | 一种频率和带宽可调的射频滤波器 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3022472A (en) * | 1958-01-22 | 1962-02-20 | Bell Telephone Labor Inc | Variable equalizer employing semiconductive element |
US3778643A (en) * | 1972-05-18 | 1973-12-11 | Gen Motors Corp | A solid state variable delay line using reversed biased pn junctions |
JPS629661A (ja) * | 1985-07-05 | 1987-01-17 | Nec Corp | モノリシック集積回路装置 |
JPS62244160A (ja) * | 1986-04-17 | 1987-10-24 | Mitsubishi Electric Corp | 半導体装置 |
JPS6348855A (ja) * | 1986-08-19 | 1988-03-01 | Mitsubishi Electric Corp | モノリシツク化マイクロ波集積回路 |
JPS63140560A (ja) * | 1986-12-02 | 1988-06-13 | Mitsubishi Electric Corp | 半導体モノリシツクバイアス給電回路 |
JPS63276264A (ja) * | 1987-05-08 | 1988-11-14 | Mitsubishi Electric Corp | モノリシツク化マイクロ波集積回路 |
JPH01223758A (ja) * | 1988-03-02 | 1989-09-06 | Mitsubishi Electric Corp | モノリシックマイクロ波集積回路 |
US5111169A (en) * | 1989-03-23 | 1992-05-05 | Takeshi Ikeda | Lc noise filter |
JPH0377360A (ja) * | 1989-08-18 | 1991-04-02 | Mitsubishi Electric Corp | 半導体装置 |
JP3280019B2 (ja) * | 1989-10-26 | 2002-04-30 | 新潟精密株式会社 | Lcノイズフィルタ |
US5326986A (en) * | 1991-03-05 | 1994-07-05 | University Of Houston - University Park | Parallel N-junction superconducting interferometer with enhanced flux-to-voltage transfer function |
US5258626A (en) * | 1992-06-22 | 1993-11-02 | The United States Of America As Represented By The Secretary Of The Air Force | Superconducting optically reconfigurable electrical device |
-
1994
- 1994-08-09 TW TW083107265A patent/TW275152B/zh active
- 1994-10-26 US US08/329,520 patent/US5557138A/en not_active Expired - Lifetime
- 1994-10-27 FI FI945061A patent/FI113910B/fi not_active IP Right Cessation
- 1994-10-31 KR KR1019940028119A patent/KR100320001B1/ko not_active IP Right Cessation
- 1994-10-31 DE DE69423568T patent/DE69423568T2/de not_active Expired - Fee Related
- 1994-10-31 EP EP94117177A patent/EP0653837B1/en not_active Expired - Lifetime
- 1994-11-01 CN CN94113747A patent/CN1084549C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FI113910B (fi) | 2004-06-30 |
CN1106592A (zh) | 1995-08-09 |
DE69423568D1 (de) | 2000-04-27 |
EP0653837A1 (en) | 1995-05-17 |
KR950015834A (ko) | 1995-06-17 |
US5557138A (en) | 1996-09-17 |
EP0653837B1 (en) | 2000-03-22 |
TW275152B (zh) | 1996-05-01 |
DE69423568T2 (de) | 2000-11-16 |
FI945061A0 (fi) | 1994-10-27 |
FI945061A (fi) | 1995-05-02 |
KR100320001B1 (ko) | 2002-04-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Free format text: FORMER OWNER: GANG VILLAGE Effective date: 20050916 Owner name: NEW PRECISION CO., LTD. Free format text: FORMER OWNER: CHI TIANYI |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20050916 Address after: Niigata County, Japan Patentee after: Niigata Seimitsu Co., Ltd. Address before: Tokyo, Japan, Japan Co-patentee before: Gang Cunjin Patentee before: Chi Tianyi |
|
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |