TW267260B - - Google Patents

Info

Publication number
TW267260B
TW267260B TW083111799A TW83111799A TW267260B TW 267260 B TW267260 B TW 267260B TW 083111799 A TW083111799 A TW 083111799A TW 83111799 A TW83111799 A TW 83111799A TW 267260 B TW267260 B TW 267260B
Authority
TW
Taiwan
Application number
TW083111799A
Original Assignee
Tif Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP35182393A external-priority patent/JP3461886B2/ja
Priority claimed from JP25753794A external-priority patent/JPH0897373A/ja
Application filed by Tif Kk filed Critical Tif Kk
Application granted granted Critical
Publication of TW267260B publication Critical patent/TW267260B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/01—Frequency selective two-port networks
    • H03H7/0115—Frequency selective two-port networks comprising only inductors and capacitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
    • H03H2001/0021—Constructional details
    • H03H2001/0064—Constructional details comprising semiconductor material
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
    • H03H2001/0021—Constructional details
    • H03H2001/0078—Constructional details comprising spiral inductor on a substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
TW083111799A 1993-12-29 1994-12-17 TW267260B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35182393A JP3461886B2 (ja) 1993-12-29 1993-12-29 Ｌｃ素子，半導体装置及びｌｃ素子の製造方法
JP25753794A JPH0897373A (ja) 1994-09-27 1994-09-27 Ｌｃ素子，半導体装置及びｌｃ素子の製造方法

Publications (1)

Publication Number Publication Date
TW267260B true TW267260B (zh) 1996-01-01

Family

ID=26543252

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083111799A TW267260B (zh) 1993-12-29 1994-12-17

Country Status (6)

Country Link
US (1) US5705963A (zh)
EP (1) EP0661805B1 (zh)
KR (1) KR100315267B1 (zh)
DE (1) DE69417199T2 (zh)
FI (1) FI116008B (zh)
TW (1) TW267260B (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6008713A (en) * 1996-02-29 1999-12-28 Texas Instruments Incorporated Monolithic inductor
JP3942264B2 (ja) * 1998-03-11 2007-07-11 富士通株式会社 半導体基板上に形成されるインダクタンス素子
JPH11317621A (ja) 1998-05-07 1999-11-16 Tif:Kk Ｌｃ発振器
US6310393B1 (en) * 1998-10-09 2001-10-30 Matsushita Electric Industrial Co., Ltd. Electric circuit and package for semiconductor
FR2792775B1 (fr) * 1999-04-20 2001-11-23 France Telecom Dispositif de circuit integre comprenant une inductance a haut coefficient de qualite
KR100424952B1 (ko) * 1999-05-18 2004-03-31 니이가타 세이미쯔 가부시키가이샤 Ｌｃ발진기
US6133079A (en) * 1999-07-22 2000-10-17 Chartered Semiconductor Manufacturing Ltd. Method for reducing substrate capacitive coupling of a thin film inductor by reverse P/N junctions
JP2001044754A (ja) * 1999-07-26 2001-02-16 Niigata Seimitsu Kk Ｌｃ発振器
GB2353139B (en) * 1999-08-12 2001-08-29 United Microelectronics Corp Inductor and method of manufacturing the same
GB2361123A (en) 2000-04-04 2001-10-10 Nokia Mobile Phones Ltd Polyphase filters in silicon integrated circuit technology
US6441442B1 (en) * 2000-05-30 2002-08-27 Programmable Silicon Solutions Integrated inductive circuits
EP1160842A3 (en) * 2000-05-30 2003-09-17 Programmable Silicon Solutions Integrated radio frequency circuits
US6917095B1 (en) 2000-05-30 2005-07-12 Altera Corporation Integrated radio frequency circuits
JP4256575B2 (ja) * 2000-08-15 2009-04-22 パナソニック株式会社 バイアホールを備えた高周波受動回路および高周波増幅器
FR2851078A1 (fr) * 2003-02-07 2004-08-13 St Microelectronics Sa Inductance integree et circuit electronique l'incorporant
US7288417B2 (en) * 2005-01-06 2007-10-30 International Business Machines Corporation On-chip signal transformer for ground noise isolation
US8129817B2 (en) * 2008-12-31 2012-03-06 Taiwan Semiconductor Manufacturing Co., Ltd. Reducing high-frequency signal loss in substrates
US8546907B2 (en) * 2009-04-15 2013-10-01 Taiwan Semiconductor Manufacturing Company, Ltd. Enhanced transmission lines for radio frequency applications
US9698214B1 (en) * 2016-03-31 2017-07-04 Taiwan Semiconductor Manufacturing Co., Ltd. Capacitor structure of integrated circuit chip and method of fabricating the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3022472A (en) * 1958-01-22 1962-02-20 Bell Telephone Labor Inc Variable equalizer employing semiconductive element
US3258723A (en) * 1962-01-30 1966-06-28 Osafune ia
US3328600A (en) * 1964-02-06 1967-06-27 Halliburton Co Solid-state relay for mark-space system employing oscillator intercoupling input andoutput filters providing signal isolation and interference-free output
US3778643A (en) * 1972-05-18 1973-12-11 Gen Motors Corp A solid state variable delay line using reversed biased pn junctions
JPS60225449A (ja) * 1984-04-24 1985-11-09 Sumitomo Electric Ind Ltd 半導体集積回路パツケ−ジ
FR2567325B1 (fr) * 1984-07-03 1986-11-14 Thomson Csf Element a capacite variable, commandable par une tension continue
US5023578A (en) * 1987-08-11 1991-06-11 Murata Manufacturing Co., Ltd. Filter array having a plurality of capacitance elements
JP3280019B2 (ja) * 1989-10-26 2002-04-30 新潟精密株式会社 Ｌｃノイズフィルタ
US5420553A (en) * 1991-01-16 1995-05-30 Murata Manufacturing Co., Ltd. Noise filter
US5283462A (en) * 1991-11-04 1994-02-01 Motorola, Inc. Integrated distributed inductive-capacitive network
TW275152B (zh) * 1993-11-01 1996-05-01 Ikeda Takeshi
US5497028A (en) * 1993-11-10 1996-03-05 Ikeda; Takeshi LC element and semiconductor device having a signal transmission line and LC element manufacturing method

Also Published As

Publication number Publication date
FI116008B (fi) 2005-08-31
FI946026A (fi) 1995-06-30
EP0661805B1 (en) 1999-03-17
KR950021507A (ko) 1995-07-26
FI946026A0 (fi) 1994-12-22
DE69417199D1 (de) 1999-04-22
US5705963A (en) 1998-01-06
EP0661805A1 (en) 1995-07-05
KR100315267B1 (ko) 2002-04-24
DE69417199T2 (de) 1999-11-25

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