CN109416457B - 光学装置、曝光装置及物品的制造方法 - Google Patents

光学装置、曝光装置及物品的制造方法 Download PDF

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Publication number
CN109416457B
CN109416457B CN201780040473.6A CN201780040473A CN109416457B CN 109416457 B CN109416457 B CN 109416457B CN 201780040473 A CN201780040473 A CN 201780040473A CN 109416457 B CN109416457 B CN 109416457B
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CN
China
Prior art keywords
optical device
permanent magnet
mirror
shape
optical
Prior art date
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Expired - Fee Related
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CN201780040473.6A
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English (en)
Chinese (zh)
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CN109416457A (zh
Inventor
柴田雄吾
长野浩平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN109416457A publication Critical patent/CN109416457A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
CN201780040473.6A 2016-07-06 2017-06-16 光学装置、曝光装置及物品的制造方法 Expired - Fee Related CN109416457B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016-134000 2016-07-06
JP2016134000A JP6929024B2 (ja) 2016-07-06 2016-07-06 光学装置、露光装置及び物品の製造方法
PCT/JP2017/022311 WO2018008364A1 (ja) 2016-07-06 2017-06-16 光学装置、露光装置及び物品の製造方法

Publications (2)

Publication Number Publication Date
CN109416457A CN109416457A (zh) 2019-03-01
CN109416457B true CN109416457B (zh) 2021-09-17

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CN201780040473.6A Expired - Fee Related CN109416457B (zh) 2016-07-06 2017-06-16 光学装置、曝光装置及物品的制造方法

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Country Link
JP (1) JP6929024B2 (enExample)
KR (1) KR102165797B1 (enExample)
CN (1) CN109416457B (enExample)
WO (1) WO2018008364A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109932804B (zh) * 2019-03-04 2021-06-01 杭州电子科技大学 一种小口径轻型反射镜的柔性记忆合金支撑装置
JP2022022912A (ja) * 2020-07-10 2022-02-07 キヤノン株式会社 露光装置および物品製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法
CN104516212A (zh) * 2013-09-30 2015-04-15 佳能株式会社 光学装置、投影光学系统、曝光装置及物品的制造方法
CN104749764A (zh) * 2013-12-25 2015-07-01 佳能株式会社 光学装置、投影光学系统、曝光装置和制造物品的方法
JP2016092366A (ja) * 2014-11-11 2016-05-23 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02101402A (ja) 1988-10-11 1990-04-13 Omron Tateisi Electron Co 反射鏡装置
US6840638B2 (en) * 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP2008310925A (ja) * 2007-06-18 2008-12-25 Sony Corp 変形可能ミラー装置、光ピックアップ、光学ドライブ装置
FR2923301B1 (fr) * 2007-11-02 2010-09-17 Ujf Filiale Miroir deformable a raideur repartie,outil et procede pour realiser un tel miroir
FR2935054B1 (fr) * 2008-08-14 2011-01-28 Alpao Miroir deformable a actionneurs de force et raideur repartie
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
CN103891114B (zh) * 2011-10-27 2018-01-02 不列颠哥伦比亚大学 位移装置及其制造、使用和控制方法
JP5875537B2 (ja) * 2013-01-28 2016-03-02 三菱電機株式会社 形状可変鏡装置
JP2015050353A (ja) * 2013-09-02 2015-03-16 キヤノン株式会社 光学装置、投影光学系、露光装置、並びに物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015065246A (ja) * 2013-09-24 2015-04-09 キヤノン株式会社 光学装置、光学系、露光装置及び物品の製造方法
CN104516212A (zh) * 2013-09-30 2015-04-15 佳能株式会社 光学装置、投影光学系统、曝光装置及物品的制造方法
CN104749764A (zh) * 2013-12-25 2015-07-01 佳能株式会社 光学装置、投影光学系统、曝光装置和制造物品的方法
JP2016092366A (ja) * 2014-11-11 2016-05-23 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法

Also Published As

Publication number Publication date
CN109416457A (zh) 2019-03-01
KR102165797B1 (ko) 2020-10-14
KR20190020139A (ko) 2019-02-27
WO2018008364A1 (ja) 2018-01-11
JP2018005068A (ja) 2018-01-11
JP6929024B2 (ja) 2021-09-01

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