CN108658451A - 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法 - Google Patents

用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法 Download PDF

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Publication number
CN108658451A
CN108658451A CN201810913825.0A CN201810913825A CN108658451A CN 108658451 A CN108658451 A CN 108658451A CN 201810913825 A CN201810913825 A CN 201810913825A CN 108658451 A CN108658451 A CN 108658451A
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China
Prior art keywords
method described
silica
value
less
content
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Pending
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CN201810913825.0A
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English (en)
Chinese (zh)
Inventor
C·潘茨
G·蒂茨
S·米勒
M·鲁夫
B·弗林斯
H·劳勒德尔
J·贝尼施
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Evonik Operations GmbH
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Evonik Degussa GmbH
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Publication of CN108658451A publication Critical patent/CN108658451A/zh
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C01B33/128—Preparation of silica of undetermined type by acidic treatment of aqueous silicate solutions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/008—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in molecular form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/16—Pore diameter
    • C01P2006/17—Pore diameter distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
CN201810913825.0A 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法 Pending CN108658451A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011004532A DE102011004532A1 (de) 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen
DE102011004532.5 2011-02-22
CN2012800100352A CN103402933A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法

Related Parent Applications (1)

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CN2012800100352A Division CN103402933A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法

Publications (1)

Publication Number Publication Date
CN108658451A true CN108658451A (zh) 2018-10-16

Family

ID=45688164

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CN201810913825.0A Pending CN108658451A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法
CN2012800100352A Pending CN103402933A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法

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Country Status (12)

Country Link
US (2) US20140072803A1 (enExample)
EP (1) EP2678280B1 (enExample)
JP (1) JP5897043B2 (enExample)
KR (1) KR101911566B1 (enExample)
CN (2) CN108658451A (enExample)
CA (1) CA2827899C (enExample)
DE (1) DE102011004532A1 (enExample)
ES (1) ES2628382T3 (enExample)
PL (1) PL2678280T3 (enExample)
RU (1) RU2602859C2 (enExample)
TW (1) TWI557073B (enExample)
WO (1) WO2012113655A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020228115A1 (zh) * 2019-05-14 2020-11-19 中天科技精密材料有限公司 石英粉及其制备方法

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US10065865B2 (en) 2011-02-22 2018-09-04 Evonik Degussa Gmbh Process for preparing aqueous colloidal silica sols of high purity from alkali metal silicate solutions
CN104860322B (zh) * 2015-05-07 2017-09-26 中海油天津化工研究设计院有限公司 一种低钠离子含量高纯硅溶胶的制备方法
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
KR20180095619A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 유리 제조 동안 규소 함량의 증가
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
KR20180094087A (ko) 2015-12-18 2018-08-22 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 실리카 과립으로부터 실리카 유리 제품의 제조
WO2017103153A1 (de) * 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
WO2017103131A1 (de) * 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
JP7390198B2 (ja) * 2019-01-28 2023-12-01 三井金属鉱業株式会社 ガラス粒子、それを用いた導電性組成物及びガラス粒子の製造方法
RU2723623C1 (ru) * 2019-12-30 2020-06-16 Общество с ограниченной ответственностью "Инжиниринговый химико-технологический центр" (ООО "ИХТЦ") Способ получения кускового силикагеля
CN111976485B (zh) * 2020-08-17 2022-01-11 宿州竹梦光学科技有限公司 一种汽车中控触屏ag玻璃
CN113104855B (zh) * 2021-04-30 2022-03-15 武汉大学 球形二氧化硅的制备方法
CN113880098B (zh) * 2021-11-17 2022-12-09 江苏海格新材料有限公司 一种高纯球形硅微粉的生产方法

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CN101844770A (zh) * 2010-04-27 2010-09-29 中国神华能源股份有限公司 一种利用粉煤灰提铝残渣制备白炭黑的方法

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Publication number Priority date Publication date Assignee Title
WO2020228115A1 (zh) * 2019-05-14 2020-11-19 中天科技精密材料有限公司 石英粉及其制备方法

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CN103402933A (zh) 2013-11-20
TWI557073B (zh) 2016-11-11
RU2602859C2 (ru) 2016-11-20
JP5897043B2 (ja) 2016-03-30
ES2628382T3 (es) 2017-08-02
KR101911566B1 (ko) 2018-10-24
CA2827899A1 (en) 2012-08-30
KR20140022380A (ko) 2014-02-24
DE102011004532A1 (de) 2012-08-23
EP2678280A1 (de) 2014-01-01
TW201247540A (en) 2012-12-01
CA2827899C (en) 2018-06-12
US20140072803A1 (en) 2014-03-13
US20170066654A1 (en) 2017-03-09
JP2014514229A (ja) 2014-06-19
WO2012113655A1 (de) 2012-08-30
PL2678280T3 (pl) 2017-10-31
EP2678280B1 (de) 2017-05-03
RU2013142832A (ru) 2015-03-27

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