DE102011004532A1 - Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen - Google Patents

Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen Download PDF

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Publication number
DE102011004532A1
DE102011004532A1 DE102011004532A DE102011004532A DE102011004532A1 DE 102011004532 A1 DE102011004532 A1 DE 102011004532A1 DE 102011004532 A DE102011004532 A DE 102011004532A DE 102011004532 A DE102011004532 A DE 102011004532A DE 102011004532 A1 DE102011004532 A1 DE 102011004532A1
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DE
Germany
Prior art keywords
ppm
purity silica
content
silica granules
particle size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102011004532A
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German (de)
English (en)
Inventor
Dr. Panz Christian
Guido Titz
Sven Müller
Markus RUF
Bodo Frings
Hartwig Rauleder
Dr. Behnisch Jürgen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Evonik Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa GmbH filed Critical Evonik Degussa GmbH
Priority to DE102011004532A priority Critical patent/DE102011004532A1/de
Priority to RU2013142832/03A priority patent/RU2602859C2/ru
Priority to CN201810913825.0A priority patent/CN108658451A/zh
Priority to PL12704510T priority patent/PL2678280T3/pl
Priority to US14/000,954 priority patent/US20140072803A1/en
Priority to CA2827899A priority patent/CA2827899C/en
Priority to PCT/EP2012/052251 priority patent/WO2012113655A1/de
Priority to KR1020137024272A priority patent/KR101911566B1/ko
Priority to EP12704510.2A priority patent/EP2678280B1/de
Priority to ES12704510.2T priority patent/ES2628382T3/es
Priority to JP2013554843A priority patent/JP5897043B2/ja
Priority to CN2012800100352A priority patent/CN103402933A/zh
Priority to TW101105523A priority patent/TWI557073B/zh
Publication of DE102011004532A1 publication Critical patent/DE102011004532A1/de
Priority to US15/295,899 priority patent/US20170066654A1/en
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C01B33/128—Preparation of silica of undetermined type by acidic treatment of aqueous silicate solutions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/008—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in molecular form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/16—Pore diameter
    • C01P2006/17—Pore diameter distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
DE102011004532A 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen Withdrawn DE102011004532A1 (de)

Priority Applications (14)

Application Number Priority Date Filing Date Title
DE102011004532A DE102011004532A1 (de) 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen
KR1020137024272A KR101911566B1 (ko) 2011-02-22 2012-02-10 석영 유리 응용분야를 위한 고순도 이산화규소 과립 및 상기 과립의 제조 방법
EP12704510.2A EP2678280B1 (de) 2011-02-22 2012-02-10 Herstellungsverfahren eines hochreinen siliciumdioxidgranulats für quarzglasanwendungen
PL12704510T PL2678280T3 (pl) 2011-02-22 2012-02-10 Sposób wytwarzania granulatu dwutlenku krzemu o wysokiej czystości do zastosowań szkła kwarcowego
US14/000,954 US20140072803A1 (en) 2011-02-22 2012-02-10 High-purity silicon dioxide granules for quartz glass applications and method for producing said granules
CA2827899A CA2827899C (en) 2011-02-22 2012-02-10 High-purity silicon dioxide granules for quartz glass applications and method for producing said granules
PCT/EP2012/052251 WO2012113655A1 (de) 2011-02-22 2012-02-10 Hochreines siliciumdioxidgranulat für quarzglasanwendungen sowie dessen herstellungsverfahren
RU2013142832/03A RU2602859C2 (ru) 2011-02-22 2012-02-10 Высокочистый гранулированный диоксид кремния для применения в областях использования кварцевого стекла и способ получения такого гранулированного диоксида кремния
CN201810913825.0A CN108658451A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法
ES12704510.2T ES2628382T3 (es) 2011-02-22 2012-02-10 Procedimiento de obtención de un granulado de dióxido de silicio altamente puro para aplicaciones de vidrio de cuarzo
JP2013554843A JP5897043B2 (ja) 2011-02-22 2012-02-10 石英ガラス適用のための高純度シリカ顆粒並びにその製造法
CN2012800100352A CN103402933A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法
TW101105523A TWI557073B (zh) 2011-02-22 2012-02-20 供石英玻璃應用之高純度矽石顆粒
US15/295,899 US20170066654A1 (en) 2011-02-22 2016-10-17 High-purity silicon dioxide granules for quartz glass applications and method for producing said granules

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011004532A DE102011004532A1 (de) 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen

Publications (1)

Publication Number Publication Date
DE102011004532A1 true DE102011004532A1 (de) 2012-08-23

Family

ID=45688164

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102011004532A Withdrawn DE102011004532A1 (de) 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen

Country Status (12)

Country Link
US (2) US20140072803A1 (enExample)
EP (1) EP2678280B1 (enExample)
JP (1) JP5897043B2 (enExample)
KR (1) KR101911566B1 (enExample)
CN (2) CN108658451A (enExample)
CA (1) CA2827899C (enExample)
DE (1) DE102011004532A1 (enExample)
ES (1) ES2628382T3 (enExample)
PL (1) PL2678280T3 (enExample)
RU (1) RU2602859C2 (enExample)
TW (1) TWI557073B (enExample)
WO (1) WO2012113655A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012113650A2 (de) 2011-02-22 2012-08-30 Evonik Degussa Gmbh Verfahren zur herstellung wässriger kolloidaler silikasole hoher reinheit aus alkalimetallsilikatlösungen
CN104860322B (zh) * 2015-05-07 2017-09-26 中海油天津化工研究设计院有限公司 一种低钠离子含量高纯硅溶胶的制备方法
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
WO2017103123A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
US10730780B2 (en) 2015-12-18 2020-08-04 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
TWI840318B (zh) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
CN108698883A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 石英玻璃制备中的二氧化硅的喷雾造粒
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
CN108698887B (zh) * 2015-12-18 2022-01-21 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
WO2017103131A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur
US10618833B2 (en) 2015-12-18 2020-04-14 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a synthetic quartz glass grain
JP7390198B2 (ja) * 2019-01-28 2023-12-01 三井金属鉱業株式会社 ガラス粒子、それを用いた導電性組成物及びガラス粒子の製造方法
CN111943215B (zh) * 2019-05-14 2022-02-22 中天科技精密材料有限公司 石英粉的制备方法
RU2723623C1 (ru) * 2019-12-30 2020-06-16 Общество с ограниченной ответственностью "Инжиниринговый химико-технологический центр" (ООО "ИХТЦ") Способ получения кускового силикагеля
CN111976485B (zh) * 2020-08-17 2022-01-11 宿州竹梦光学科技有限公司 一种汽车中控触屏ag玻璃
CN113104855B (zh) * 2021-04-30 2022-03-15 武汉大学 球形二氧化硅的制备方法
CN113880098B (zh) * 2021-11-17 2022-12-09 江苏海格新材料有限公司 一种高纯球形硅微粉的生产方法

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Publication number Priority date Publication date Assignee Title
US3459522A (en) 1963-07-08 1969-08-05 Corning Glass Works Method of treating a porous,high silica content glass
US4042361A (en) 1976-04-26 1977-08-16 Corning Glass Works Method of densifying metal oxides
WO1991013040A1 (en) 1990-03-02 1991-09-05 Cabot Corporation Process for making non-porous, micron-sized high purity silica
DE69109026T2 (de) 1990-09-07 1995-12-07 Mitsubishi Chem Corp Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand.
DE19601415A1 (de) 1995-02-04 1996-08-08 Degussa Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
EP1258456A1 (en) 2001-05-18 2002-11-20 Degussa AG Silica glass formation process
EP1283195A1 (en) 2001-08-01 2003-02-12 Novara Technology S.R.L. Sol-gel process for the production of optical fiber preforms
EP1717202A1 (en) 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials

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JP2001192225A (ja) * 1999-12-28 2001-07-17 Watanabe Shoko:Kk 石英ガラスの製造方法
DE10058616A1 (de) * 2000-11-25 2002-05-29 Degussa Fällungskieselsäuren mit hoher Struktur
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
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EP2331464A1 (de) * 2008-09-30 2011-06-15 Evonik Degussa GmbH Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen
JP2012504102A (ja) * 2008-09-30 2012-02-16 エボニック デグサ ゲーエムベーハー シリカート溶液からの高純度ＳｉＯ２の製造方法
CN101844770A (zh) * 2010-04-27 2010-09-29 中国神华能源股份有限公司 一种利用粉煤灰提铝残渣制备白炭黑的方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3459522A (en) 1963-07-08 1969-08-05 Corning Glass Works Method of treating a porous,high silica content glass
US4042361A (en) 1976-04-26 1977-08-16 Corning Glass Works Method of densifying metal oxides
WO1991013040A1 (en) 1990-03-02 1991-09-05 Cabot Corporation Process for making non-porous, micron-sized high purity silica
DE69109026T2 (de) 1990-09-07 1995-12-07 Mitsubishi Chem Corp Silica-Glas Pulver und Verfahren seiner Herstellung und daraus hergestellter Silica-Glasgegenstand.
DE19601415A1 (de) 1995-02-04 1996-08-08 Degussa Granulate auf Basis von pyrogen hergestelltem Siliciumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
EP1258456A1 (en) 2001-05-18 2002-11-20 Degussa AG Silica glass formation process
EP1283195A1 (en) 2001-08-01 2003-02-12 Novara Technology S.R.L. Sol-gel process for the production of optical fiber preforms
EP1717202A1 (en) 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ISO 9277

Also Published As

Publication number Publication date
EP2678280A1 (de) 2014-01-01
TWI557073B (zh) 2016-11-11
ES2628382T3 (es) 2017-08-02
JP2014514229A (ja) 2014-06-19
US20140072803A1 (en) 2014-03-13
CN108658451A (zh) 2018-10-16
RU2013142832A (ru) 2015-03-27
PL2678280T3 (pl) 2017-10-31
KR20140022380A (ko) 2014-02-24
CA2827899A1 (en) 2012-08-30
WO2012113655A1 (de) 2012-08-30
RU2602859C2 (ru) 2016-11-20
TW201247540A (en) 2012-12-01
CA2827899C (en) 2018-06-12
US20170066654A1 (en) 2017-03-09
EP2678280B1 (de) 2017-05-03
KR101911566B1 (ko) 2018-10-24
CN103402933A (zh) 2013-11-20
JP5897043B2 (ja) 2016-03-30

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