CN1078108C - 对板件或圆盘进行涂漆或涂膜的装置 - Google Patents

对板件或圆盘进行涂漆或涂膜的装置 Download PDF

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CN1078108C
CN1078108C CN94102023A CN94102023A CN1078108C CN 1078108 C CN1078108 C CN 1078108C CN 94102023 A CN94102023 A CN 94102023A CN 94102023 A CN94102023 A CN 94102023A CN 1078108 C CN1078108 C CN 1078108C
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E·穆尔弗里德
A·库贝比克
T·杰里什
K·阿皮希
J·施策克里什
M·卡里斯
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Hama Technology Ape Lianghe
Singulus Technologies AG
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Abstract

在一个通过一个充装着涂布介质的毛细间隙(24)来对板件(17)或圆盘进行涂漆或涂膜的装置中，板件(17)以其待涂漆表面朝下地通过毛细间隙(24)，从而通过毛细作用在板件(17)上积附一层薄的涂层。

Description

对板件或圆盘进行涂漆或涂膜的方法和装置
本发明涉及一种借助于一个缩窄成呈毛细作用的敞口的槽来对板件或圆盘、特别是液晶显示器制造中的玻璃板、进行涂漆或涂膜的装置。
在薄涂层技术领域中、特别在制造液晶显示屏、制造用于半导体生产、半导体基片或陶瓷基片等等的掩膜时，常常碰到这样的任务：在矩形的或圆形的板件上设置一层均匀的漆或其它诸如滤色剂或者特殊保护层的起先是液态的介质。PCT/DE93/00392公开了一种改进这种涂漆与涂布过程的装置。使用这样装置可改善特别是矩形板件上的漆层厚度的均匀性，同时还可减少漆的消耗量。此外，在涂布时毋须转动待涂布的板件，从而也节约了为此而设的机械费用。
本发明的目的在于提供一种用涂膜液体的薄涂层顺畅地对板件或圆盘进行涂漆或涂膜的方法和装置。根据上述准则对PCT/DE/00392描述的类型的、用于对板件进行涂漆与涂布的装置作进一步的改进并同时将结构简化。
实现本发明的目的的技术解决方案在于，一种用液态涂布介质对扁平基片进行涂漆或涂膜的方法，包括下列步骤：
提供具有上端和下端的毛细槽；
将液态涂布介质供给该下端；
将未涂膜扁平基片固定在夹持装置上，使其待涂膜的表面朝下；
经过该毛细槽的上端，直线输送该待涂膜表面；
在所述直线输送步骤中，保持所述基片与所述上端成很小的间距而不与之接触；
在所述直线输送步骤中，通过毛细作用并通过粘附作用在所述待涂膜的所述表面上积附一层薄的液态涂布介质的涂层。
本发明的装置具有毛细间隙，间隙充装有液态涂布介质，板件在跟间隙成很小的间距的情况下以其待涂漆或涂布的表面朝下缓慢地通过间隙，通过毛细作用与粘附作用在板件上积附一层薄的涂层。板件以其待涂漆的面朝下被导引通过槽，该槽设计成起毛细作用并从而使漆自动地并以特别均匀的速度供应。毛细作用是通过构成一个宽度小于0.5毫米的狭窄间隙来达致的。通过毛细作用，漆或其它涂布液克服了重力作用自动地以恒定速度向上升高并突出毛细间隙的上端。在间隙上方，漆流成窄线接触到待涂布的板件表面并积附在其上形成漆层。
通过两块垂直设置的、相互平行的薄板浸入充装在敞口的槽内的涂布液中并且其间间距可以无级地调节来产生毛细作用是有利的。这样，在两块板之间就能够在槽的整个长度上形成一个具有最适合产生毛细作用的宽度的间隙。因此毛细间隙的几何形状可与各种不同类型的待涂布的板件配合。
待涂漆或待涂布的板件以跟间隙的上端相距一个很小的距离、例如小于0.2毫米的距离以均匀和缓慢的速度通过间隙的上端被证明是特别有利的。这样，漆就会紧接在从毛细间隙的上端出来后接触上板件表面。漆通过粘附作用牢固地保持在板件表面上并跟板件一起离开间隙的上端。这就使由于毛细作用随着向上运动的后继的漆从间隙抽出并且根据板件的运动速度来以限定的漆层厚度积附在板件上。此外，通过漆对板件表面的粘附作用，不存在漆在离开间隙后向侧面流动从而被坏漆层厚度均匀性的危险。
两板之间的间隙在每次涂漆过程后扩宽到2毫米至3毫米的宽度是特别有利的。这样就阻止了漆在涂漆过程以外的时间里有不希望有的自动升高(毛细作用)。经已证明，漆较长时间留在毛细间隙里会使其性能发生变化，对涂漆的效果起坏的作用。如果把间隙扩宽到2毫米至3毫米，留在间隙内的漆的性能就会保持不变。
将两块板之间的间隙在紧接涂漆过程开始之前缩窄至毛细宽度是有利的。这样，处在两块板之间的漆首先自动地向上移动，直至突出间隙上端并与已就位的待涂布的板件表面接触。因此涂漆过程就通过如前所述的在此时已形成毛细间隙内的毛细作用、板件的运动和粘附作用来实现。
本发明的另一有利的结构在于，不再需要将待涂漆的板件接对角线方向并向上翘起一个小角度来向涂漆槽导引。此外，也不需要在槽(间隙)上方形成弯月形液面，这样也就可以不用通过一个补偿容器来进行漆的补给。
为使本发明的装置全自动化运转，可分别在进料和卸料端放置自动上料装置和自动卸料装置。本发明的装置也可以设置成使板件夹持装置固定不动，而使涂布槽成为活动部份。
通过下面描述的和附图中所示的实施例阐明本发明的细节和其它有利的结构，但这些实施例绝不能理解成对本发明的限制。在附图中，
图1是本发明的涂漆与涂膜装置的结构的前视图；
图2是在涂布过程开始时通过图1所示的具有毛细间隙的槽的横截面图。
图1示出了本发明的涂膜装置10的第一个实施例。槽12和直线输送装置15的支柱13、14均固定在机座11上。直线输送装置15的运动部份面朝下。为待涂漆板件17而设的可转动的夹持装置16固定在上述运动部份上。该板件17例如是一块待涂漆的玻璃板，涂漆后用以制作掩模或液晶显示屏。板件17例如通过真空固定吸附在夹持装置16上。为此，夹持装置16上具有相应的、图中未示出的真空孔。在本发明的范畴内也可应用其它的、专业人员熟悉的夹持装置。
槽12以横截面形式示出在图1中，并以放大比例示出在图2中。槽12中的空腔18部份地充装有漆料，有两块薄板19和20从上面浸入漆液中。板19在33处跟槽12的上缘固定地连接，因而板19是不能动的。而板20则通过一个合适的装置跟一个直线运动装置22相连，通过该装置可沿在图2中以标号23标示的箭头方向往复运动。因此，在板19与20之间的宽度可以无级调节。
为了取得最佳的涂漆或涂布效果，所用的涂布液必须具有规定的温度并且必须很洁净。因此所用的涂布液从贮液箱28往槽12输送时须经过一个温度控制装置29和一个过滤器30。涂布液输送也可以通过在贮液箱中产生超压(气垫)来实现，或通过适当地布置贮液箱的位置、使涂布液通过高度差向槽输送。还有可能使用专业人员公知的其它输送液体手段。
在一个全自动化型式的涂布装置中，在标号31所标示的部位装有一个自动上料装置，并在标号32所标示的部位装有一个自动卸料装置。上料装置31从设在一个确定的地点的料库中取出待涂漆的板件17，并把它导往夹持装置16。卸料装置从夹持装置16接过板件17，并把它运送到设在另一个确定的地点的另一个料库中。
涂漆和涂膜装置的工作方式
首先将板件17自动地或手动地固定在夹持装置16上。还可以通过转动夹持装置16来对该位置进行修正。夹持装置此时处于图1中以标号31标示的位置附近。在板件17在正确的位置固定在夹持装置16上之后，直线输送装置15沿标号26标示的箭头方向、即朝槽12的方向运动。
板件17从侧面被导引到间隙24的上缘。一当板件17的前缘25到达间隙24的正上方，在槽12中的板20即朝向板19移动，直至在两块板之间形成合适的毛细间隙宽度为止。由于间隙变窄，小量的液体突出间隙24压到板件17的待涂布的表面的前缘上，从此开始了涂布过程。此时，板件17通过直线输送装置15沿着箭头26的方向以均匀的速度往前移动，与此同时，一层薄的液体层通过粘附作用积附在板件表面上。所需的液流通过间隙24内的毛细作用得到补给。
一当板件17的后缘27越过了间隙24，涂布过程就终结。然后，基于前面所述的原因，在下一个涂布过程开始之前，两块板19与20之间的间距拉开到2至3毫米。板件17继续向前移动到标号32所示的位置，在该位置上被自动地或手动地从夹持装置16取下。

Claims (10)

1.一种用液态涂布介质对扁平基片进行涂漆或涂膜的方法，包括下列步骤：
提供具有上端和下端的毛细槽；
将液态涂布介质供给该下端；
将未涂膜扁平基片固定在夹持装置上，使其待涂膜的表面朝下；
经过该毛细槽的上端，直线输送该待涂膜表面；
在所述直线输送步骤中，保持所述基片与所述上端成很小的间距而不与之接触；
在所述直线输送步骤中，通过毛细作用并通过粘附作用在所述待涂膜的所述表面上积附一层薄的液态涂布介质的涂层。
2.如权利要求1所述的方法，其特征在于，在所述直线输送步骤中，待涂膜表面与所述毛细槽上端的间距保持为小于0.2毫米。
3.如权利要求1所述的方法，其特征在于，所述毛细槽由两块浸入在包含液态涂布介质的槽内的平行板构成。
4.如权利要求1所述的方法，其特征在于，所述毛细槽保持为宽度小于0.5毫米。
5.如权利要求1所述的方法，其特征在于，包括调整所述毛细槽宽度的步骤。
6.如权利要求5所述的方法，其特征在于，包括在每一涂布过程之后打开毛细槽的步骤。
7.如权利要求5所述的方法，其特征在于，包括在开始一个涂漆或涂膜过程之前减小毛细槽宽度至预定值而迫使小量液态涂布介质被压出毛细槽顶部的步骤，这样开始该涂漆或涂膜过程。
8.如权利要求1所述的方法，其特征在于，在所述涂膜过程之前待涂膜的基片被自动上料，并在该涂膜过程之后自动卸料。
9.执行上述任一权利要求所述的方法的涂膜装置。
10.根据上述权利要求1-8中任一项所述方法的用途，用于生产液晶显示器监视器，半导体制造中的掩模，半导体基片，圆盘或陶瓷基片。
CN94102023A 1993-05-05 1994-03-02 对板件或圆盘进行涂漆或涂膜的装置 Expired - Lifetime CN1078108C (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE9300392 1993-05-05
DE93/00392 1993-08-26
PCT/DE1993/000777 WO1994025177A1 (de) 1993-05-05 1993-08-26 Vorrichtung zur belackung oder beschichtung von platten oder scheiben
DE93/00777 1993-08-26

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CN1106716A CN1106716A (zh) 1995-08-16
CN1078108C true CN1078108C (zh) 2002-01-23

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JP (1) JP2777057B2 (zh)
KR (1) KR0153355B1 (zh)
CN (1) CN1078108C (zh)
AT (1) ATE173657T1 (zh)
CA (1) CA2157033C (zh)
DE (2) DE59309164D1 (zh)
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EP0972575B1 (de) * 1994-12-22 2002-11-27 Steag HamaTech AG Vorrichtung zur Belackung oder Beschichtung eines Substrats
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
DE59913661D1 (de) 1998-12-17 2006-08-24 Guardian Industries Vorrichtung und Verfahren zum Beschichten eines ebenen Substrates
JP4481688B2 (ja) * 2003-04-10 2010-06-16 Ｈｏｙａ株式会社 基板処理装置，塗布装置、塗布方法、及び、フォトマスクの製造方法
JP2005051220A (ja) * 2003-07-17 2005-02-24 Hoya Corp レジスト膜付基板の製造方法
US7332034B2 (en) 2003-11-21 2008-02-19 Seiko Epson Corporation Coating apparatus and coating method using the same
DE102004044576B4 (de) * 2004-09-13 2007-09-27 Schott Ag Verfahren und Vorrichtung zur Flüssigbeschichtung und deren Verwendung
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
CN101834069B (zh) * 2010-04-07 2012-06-27 燕山大学 染料敏化半导体双膜片方法
CN103567109B (zh) * 2012-07-26 2015-12-16 耐落螺丝(昆山)有限公司 螺丝上胶装置及上胶方法
KR20140069677A (ko) * 2012-11-29 2014-06-10 삼성디스플레이 주식회사 기판 프린팅 장치 및 기판 프린팅 방법
US10875036B2 (en) * 2016-01-22 2020-12-29 Shoda Techtron Corp. End face coating apparatus
CN106935534B (zh) * 2017-04-28 2019-11-05 京东方科技集团股份有限公司 封装装置及显示面板封装方法

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US4370356A (en) * 1981-05-20 1983-01-25 Integrated Technologies, Inc. Method of meniscus coating
US4563976A (en) * 1982-08-23 1986-01-14 Siemens Aktiengesellschaft Device for manufacturing large-surface, tape-shaped silicon bodies for solar cells
SU1736626A1 (ru) * 1990-02-14 1992-05-30 Казанский Научно-Исследовательский Технологический И Проектный Институт Химико-Фотографической Промышленности Экструзионное поливное устройство

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US2046596A (en) * 1932-01-13 1936-07-07 Patent Button Co Apparatus for uniformly coating flat surfaces
US4370356A (en) * 1981-05-20 1983-01-25 Integrated Technologies, Inc. Method of meniscus coating
US4563976A (en) * 1982-08-23 1986-01-14 Siemens Aktiengesellschaft Device for manufacturing large-surface, tape-shaped silicon bodies for solar cells
SU1736626A1 (ru) * 1990-02-14 1992-05-30 Казанский Научно-Исследовательский Технологический И Проектный Институт Химико-Фотографической Промышленности Экструзионное поливное устройство

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CN1106716A (zh) 1995-08-16
EP0701487A1 (de) 1996-03-20
JP2777057B2 (ja) 1998-07-16
CA2157033C (en) 2003-06-17
EP0701487B1 (de) 1998-11-25
SG52700A1 (en) 1998-09-28
DE59309164D1 (de) 1999-01-07
FI955214A (fi) 1995-11-01
CA2157033A1 (en) 1994-11-10
ATE173657T1 (de) 1998-12-15
FI108522B (fi) 2002-02-15
WO1994025177A1 (de) 1994-11-10
FI955214A0 (fi) 1995-11-01
JPH06343908A (ja) 1994-12-20
KR960701706A (ko) 1996-03-28
MY108987A (en) 1996-11-30
KR0153355B1 (ko) 1998-11-16
DE4397349D2 (de) 1996-11-14

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