CN107614739B - 圆柱形溅射靶材的焙烧装置以及焙烧方法 - Google Patents

圆柱形溅射靶材的焙烧装置以及焙烧方法 Download PDF

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Publication number
CN107614739B
CN107614739B CN201680002852.1A CN201680002852A CN107614739B CN 107614739 B CN107614739 B CN 107614739B CN 201680002852 A CN201680002852 A CN 201680002852A CN 107614739 B CN107614739 B CN 107614739B
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Prior art keywords
furnace
sputtering target
baking
cylindrical sputtering
roasting
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English (en)
Chinese (zh)
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CN107614739A (zh
Inventor
久保田善明
森冈稔裕
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Hiroki Corp
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Hiroki Corp
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B1/00—Shaft or like vertical or substantially vertical furnaces
    • F27B1/005—Shaft or like vertical or substantially vertical furnaces wherein no smelting of the charge occurs, e.g. calcining or sintering furnaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B1/00—Shaft or like vertical or substantially vertical furnaces
    • F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B1/12—Shells or casings; Supports therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B1/00—Shaft or like vertical or substantially vertical furnaces
    • F27B1/10—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B1/20—Arrangements of devices for charging
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D3/00—Charging; Discharging; Manipulation of charge
    • F27D3/12—Travelling or movable supports or containers for the charge

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Furnace Details (AREA)
  • Resistance Heating (AREA)
  • Furnace Charging Or Discharging (AREA)
CN201680002852.1A 2016-05-12 2016-05-12 圆柱形溅射靶材的焙烧装置以及焙烧方法 Active CN107614739B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2016/064097 WO2017195311A1 (ja) 2016-05-12 2016-05-12 円筒形スパッタリングターゲット材の焼成装置及び焼成方法

Publications (2)

Publication Number Publication Date
CN107614739A CN107614739A (zh) 2018-01-19
CN107614739B true CN107614739B (zh) 2020-08-14

Family

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CN201680002852.1A Active CN107614739B (zh) 2016-05-12 2016-05-12 圆柱形溅射靶材的焙烧装置以及焙烧方法

Country Status (5)

Country Link
JP (1) JP6198363B1 (ko)
KR (1) KR101892877B1 (ko)
CN (1) CN107614739B (ko)
TW (1) TWI636227B (ko)
WO (1) WO2017195311A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108097530B (zh) * 2018-01-19 2023-12-29 广西晶联光电材料有限责任公司 一种平面靶材背面金属化设备及方法
CN109706285B (zh) * 2018-11-29 2020-07-31 沧州中铁装备制造材料有限公司 冶炼炉转接炉用的底部防飞溅的收集座装置
CN111485218B (zh) * 2020-04-22 2022-06-17 广东生波尔光电技术有限公司 特种工件辅助镀膜的自动控制系统
CN114107929A (zh) * 2021-11-29 2022-03-01 青岛科技大学 一种可预热溅射靶材的旋靶管装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222004A (ja) * 1986-03-20 1987-09-30 Tohoku Metal Ind Ltd 希土類合金粉末を含む高密度焼結体の製造方法
US5094787A (en) * 1990-01-08 1992-03-10 Nippon Mining Co., Ltd. Method of manufacturing ito sputtering target
CN1984855A (zh) * 2004-10-01 2007-06-20 三井金属矿业株式会社 溅射靶用靶材的制造方法
JP2008120653A (ja) * 2006-11-15 2008-05-29 Denso Corp セラミックハニカム成形体の焼成用載置台
CN202101556U (zh) * 2011-04-20 2012-01-04 韶关市欧莱高新材料有限公司 一种提高旋转陶瓷靶烧结变形的垫板
JP2012126587A (ja) * 2010-12-13 2012-07-05 Sumitomo Metal Mining Co Ltd 円筒形スパッタリングターゲット用酸化物焼結体およびその製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3212391B2 (ja) * 1992-11-24 2001-09-25 旭テック株式会社 熱処理炉
JP4031578B2 (ja) * 1998-06-04 2008-01-09 日本特殊陶業株式会社 有底円筒状セラミックス焼結体の製造方法
KR19990034769U (ko) * 1999-04-10 1999-09-06 최인선 원적외선방출원석가열로
JP4748071B2 (ja) * 2007-01-26 2011-08-17 東ソー株式会社 セラミックス焼結体の製造方法
KR20100069353A (ko) * 2008-12-16 2010-06-24 주식회사 테라세미콘 히터
KR100903551B1 (ko) * 2009-01-05 2009-06-23 세원셀론텍(주) 소둔로 및 그를 사용한 소둔처리시스템
TWM384987U (en) * 2009-12-11 2010-07-21 Lih Chern Technologies Co Ltd High-temperature batch-type atmosphere sintering furnace

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62222004A (ja) * 1986-03-20 1987-09-30 Tohoku Metal Ind Ltd 希土類合金粉末を含む高密度焼結体の製造方法
US5094787A (en) * 1990-01-08 1992-03-10 Nippon Mining Co., Ltd. Method of manufacturing ito sputtering target
CN1984855A (zh) * 2004-10-01 2007-06-20 三井金属矿业株式会社 溅射靶用靶材的制造方法
JP2008120653A (ja) * 2006-11-15 2008-05-29 Denso Corp セラミックハニカム成形体の焼成用載置台
JP2012126587A (ja) * 2010-12-13 2012-07-05 Sumitomo Metal Mining Co Ltd 円筒形スパッタリングターゲット用酸化物焼結体およびその製造方法
CN202101556U (zh) * 2011-04-20 2012-01-04 韶关市欧莱高新材料有限公司 一种提高旋转陶瓷靶烧结变形的垫板

Also Published As

Publication number Publication date
KR20170138986A (ko) 2017-12-18
WO2017195311A1 (ja) 2017-11-16
CN107614739A (zh) 2018-01-19
JPWO2017195311A1 (ja) 2018-05-24
KR101892877B1 (ko) 2018-08-28
TW201740068A (zh) 2017-11-16
JP6198363B1 (ja) 2017-09-20
TWI636227B (zh) 2018-09-21

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