CN108097530B - 一种平面靶材背面金属化设备及方法 - Google Patents
一种平面靶材背面金属化设备及方法 Download PDFInfo
- Publication number
- CN108097530B CN108097530B CN201810054995.8A CN201810054995A CN108097530B CN 108097530 B CN108097530 B CN 108097530B CN 201810054995 A CN201810054995 A CN 201810054995A CN 108097530 B CN108097530 B CN 108097530B
- Authority
- CN
- China
- Prior art keywords
- temperature
- push rod
- target
- numerical control
- planar target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 19
- 238000001465 metallisation Methods 0.000 title claims description 15
- 229910052738 indium Inorganic materials 0.000 claims abstract description 48
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 47
- 230000005540 biological transmission Effects 0.000 claims abstract description 35
- 238000000576 coating method Methods 0.000 claims abstract description 33
- 239000011248 coating agent Substances 0.000 claims abstract description 30
- 238000010438 heat treatment Methods 0.000 claims description 23
- 238000010924 continuous production Methods 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 7
- 238000009434 installation Methods 0.000 abstract description 16
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 3
- 239000013077 target material Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating Apparatus (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810054995.8A CN108097530B (zh) | 2018-01-19 | 2018-01-19 | 一种平面靶材背面金属化设备及方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201810054995.8A CN108097530B (zh) | 2018-01-19 | 2018-01-19 | 一种平面靶材背面金属化设备及方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108097530A CN108097530A (zh) | 2018-06-01 |
CN108097530B true CN108097530B (zh) | 2023-12-29 |
Family
ID=62219456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201810054995.8A Active CN108097530B (zh) | 2018-01-19 | 2018-01-19 | 一种平面靶材背面金属化设备及方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108097530B (zh) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1407879A1 (ru) * | 1986-07-07 | 1988-07-07 | Проектно-Конструкторский Технологический Институт Всесоюзного Промышленного Объединения Угольной Промышленности | Конвейер механизированной переменно-поточной линии |
JPH01140360U (zh) * | 1988-03-18 | 1989-09-26 | ||
JPH07299403A (ja) * | 1994-05-02 | 1995-11-14 | Canon Inc | 塗布装置およびこれを用いて製造された画像形成装置 |
US6209706B1 (en) * | 1999-02-26 | 2001-04-03 | G. Robert Tod, Jr. | Article grouping and transferring system |
JP2005339897A (ja) * | 2004-05-25 | 2005-12-08 | Toshiba Corp | 画像表示装置の製造方法および封着材充填装置 |
WO2006038538A1 (ja) * | 2004-10-01 | 2006-04-13 | Mitsui Mining & Smelting Co., Ltd. | スパッタリングターゲット用ターゲット材の製造方法 |
WO2010106432A2 (en) * | 2009-03-20 | 2010-09-23 | Applied Materials, Inc. | Deposition apparatus with high temperature rotatable target and method of operating thereof |
KR101728304B1 (ko) * | 2016-11-11 | 2017-04-19 | 정춘기 | 가구용 하이그로시 판넬 코팅방법 및 상기 코팅방법을 위한 코팅장치 |
WO2017195311A1 (ja) * | 2016-05-12 | 2017-11-16 | 株式会社広築 | 円筒形スパッタリングターゲット材の焼成装置及び焼成方法 |
CN207981539U (zh) * | 2018-01-19 | 2018-10-19 | 广西晶联光电材料有限责任公司 | 一种平面靶材背面金属化设备 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006110667A2 (en) * | 2005-04-11 | 2006-10-19 | Intematix Corporation | Biased target ion beam deposition (btibd) for the production of combinatorial materials libraries |
US20070289864A1 (en) * | 2006-06-15 | 2007-12-20 | Zhifei Ye | Large Area Sputtering Target |
WO2009025258A1 (ja) * | 2007-08-20 | 2009-02-26 | Ulvac, Inc. | スパッタリング方法及びスパッタリング装置 |
US9611542B2 (en) * | 2015-05-01 | 2017-04-04 | Linco Technology Co., Ltd. | Film deposition system having a substrate carrier and a cooling device |
-
2018
- 2018-01-19 CN CN201810054995.8A patent/CN108097530B/zh active Active
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1407879A1 (ru) * | 1986-07-07 | 1988-07-07 | Проектно-Конструкторский Технологический Институт Всесоюзного Промышленного Объединения Угольной Промышленности | Конвейер механизированной переменно-поточной линии |
JPH01140360U (zh) * | 1988-03-18 | 1989-09-26 | ||
JPH07299403A (ja) * | 1994-05-02 | 1995-11-14 | Canon Inc | 塗布装置およびこれを用いて製造された画像形成装置 |
US6209706B1 (en) * | 1999-02-26 | 2001-04-03 | G. Robert Tod, Jr. | Article grouping and transferring system |
JP2005339897A (ja) * | 2004-05-25 | 2005-12-08 | Toshiba Corp | 画像表示装置の製造方法および封着材充填装置 |
WO2006038538A1 (ja) * | 2004-10-01 | 2006-04-13 | Mitsui Mining & Smelting Co., Ltd. | スパッタリングターゲット用ターゲット材の製造方法 |
CN1984855A (zh) * | 2004-10-01 | 2007-06-20 | 三井金属矿业株式会社 | 溅射靶用靶材的制造方法 |
WO2010106432A2 (en) * | 2009-03-20 | 2010-09-23 | Applied Materials, Inc. | Deposition apparatus with high temperature rotatable target and method of operating thereof |
WO2017195311A1 (ja) * | 2016-05-12 | 2017-11-16 | 株式会社広築 | 円筒形スパッタリングターゲット材の焼成装置及び焼成方法 |
KR101728304B1 (ko) * | 2016-11-11 | 2017-04-19 | 정춘기 | 가구용 하이그로시 판넬 코팅방법 및 상기 코팅방법을 위한 코팅장치 |
CN207981539U (zh) * | 2018-01-19 | 2018-10-19 | 广西晶联光电材料有限责任公司 | 一种平面靶材背面金属化设备 |
Also Published As
Publication number | Publication date |
---|---|
CN108097530A (zh) | 2018-06-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW201904894A (zh) | 曲面玻璃熱成型設備及其方法 | |
CN108097530B (zh) | 一种平面靶材背面金属化设备及方法 | |
CN107234429A (zh) | 一种散热片电动装置及工艺 | |
CN107825095A (zh) | 换热器组装生产线 | |
CN103447646A (zh) | 无专用工装实现软基片电路板与金属基体的焊接方法 | |
CN205439039U (zh) | 汽车内饰材料全自动平板加热生产线 | |
US3283987A (en) | Automatic machine for bending and soldering terminal leads to circuit modules | |
CN117225660A (zh) | 一种计算机线路板散热胶的多角度涂覆装置及其使用方法 | |
CN218226724U (zh) | 一种带孔圆管寻位机构 | |
CN207981539U (zh) | 一种平面靶材背面金属化设备 | |
CN215546884U (zh) | 一种多工位的气动执行器装夹装置 | |
CN111495704B (zh) | 一种用于电机转子流水线的自动刷防锈漆装置 | |
CN114888417A (zh) | 一种小微带高精度感应焊接方法 | |
CN109252127B (zh) | 一种板材热喷涂用装夹装置及工作方法 | |
CN210537058U (zh) | 一种波峰焊可调节治具 | |
CN110126252B (zh) | 一种自动化生产设备 | |
CN203221004U (zh) | 一种用于电极表面涂覆玻璃的自动涂层设备 | |
CN209239652U (zh) | 一种用于降低薄板形材料离子束抛光时热应力的装置 | |
CN110965037A (zh) | 一种能够快速降温的镀膜机及其使用方法 | |
CN214109366U (zh) | 一种半导体制冷片引线焊接装置 | |
CN221544748U (zh) | 一种3d窄带滤光片溅射镀膜用对夹式夹具 | |
CN221531715U (zh) | 一种缸套加热线 | |
CN217647314U (zh) | 一种热铆接成型生产装置 | |
CN218545255U (zh) | 一种具有均匀加热功能的箱式炉 | |
CN203711664U (zh) | 快速自动抽管胀管机 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240719 Address after: Room 307, 3rd Floor, Guanya International Star City, No. 100 Guting Avenue, Yanghe Industrial New Area, Liuzhou City, Guangxi Zhuang Autonomous Region, 545000 Patentee after: GUANGXI CRYSTAL UNION PHOTOELECTRIC MATERIALS Co.,Ltd. Country or region after: China Patentee after: Fenglianke Optoelectronics (Luoyang) Co.,Ltd. Address before: 545616 No.222, office building No.2, Liudong standard workshop, No.2, Shuiwan Road, Liudong New District, Liuzhou City, Guangxi Zhuang Autonomous Region Patentee before: GUANGXI CRYSTAL UNION PHOTOELECTRIC MATERIALS Co.,Ltd. Country or region before: China |
|
TR01 | Transfer of patent right |