CN106637140B - 一种纳米镀膜设备行星回转货架装置 - Google Patents

一种纳米镀膜设备行星回转货架装置 Download PDF

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CN106637140B
CN106637140B CN201611076982.8A CN201611076982A CN106637140B CN 106637140 B CN106637140 B CN 106637140B CN 201611076982 A CN201611076982 A CN 201611076982A CN 106637140 B CN106637140 B CN 106637140B
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宗坚
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Jiangsu Favored Nanotechnology Co Ltd
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Abstract

本发明一种纳米镀膜设备行星回转货架装置，属于真空镀膜技术领域。该装置中，腔室顶部连接抽气口，腔室中心轴位置安装有中空管，中空管上端连接到抽气口，腔室底部安装有旋转电机，旋转电机上安装有行星回转货架；所述行星回转货架中，旋转轴与旋转电机连接，旋转轴与中空管同轴，旋转轴上固定设置旋转置物架，旋转置物架上对称设置有至少两根行星旋转轴，行星转转轴上设置至少一层置物台，置物台上放置待处理的工件。本发明的有益效果：镀膜过程中行星回转货架公转和自转持续双重旋转，避免出现因各区域化学单体气体密度不均匀造成固定区域的工件涂层厚度不均匀现象。同时，行星回转货架转动也有利于将进入腔室内的化学单体气体充分混合均匀。

Description

一种纳米镀膜设备行星回转货架装置
技术领域
本发明属于真空镀膜技术领域，特别涉及一种纳米镀膜设备行星回转货架装置。
背景技术
等离子镀膜作为提升材料表面性能有效方法被广泛应用于航空航天、汽车制造、机械重工和五金工具制造等领域。在等离子镀膜过程中，需要将镀膜设备腔室内空气抽出维持低压力状态，同时需要通入工艺气体和化学单体气体用于反应生成聚合物涂层。由于整个等离子镀膜过程中需要持续抽气，且抽气口、进气口、加料口位置是固定的，因此化学单体气体有向抽气口方向扩散的趋势，导致化学单体气体在加料口区域和扩散方向区域的密度相对较大。这就出现了这些区域放置的被镀膜工件表面聚合物涂层厚度较厚而其他区域涂层厚度较薄现象，造成批量生产的质量不一致。
发明内容
本发明的目的是克服上述不足，提供一种纳米镀膜设备行星回转货架装置。
本发明为实现上述目的所采用的技术方案是：一种纳米镀膜设备行星回转货架装置，其特征在于：包括腔室，所述腔室顶部连接抽气口，抽气口连接真空泵，进气阀通过进气管路与腔室连接，加料阀通过加料管路与腔室连接，射频电源通过导线与腔室内电极连接，腔室中心轴位置安装有中空管，中空管上开有通孔，所述中空管上端连接到抽气口，所述腔室底部安装有旋转电机，旋转电机上安装有行星回转货架；
所述行星回转货架包括旋转轴、旋转置物架，所述旋转轴与旋转电机连接，旋转轴与中空管同轴，旋转轴上固定设置旋转置物架，旋转置物架上对称设置有至少两根行星旋转轴，所述行星转转轴上设置至少一层置物台，所述行星旋转轴垂直于旋转置物架且可自转，置物台上放置待处理的工件。
所述行星旋转轴为2-8根，所述置物台为1-10层。
所述腔室的容积为50～3000L，材质为铝合金或不锈钢材质。
所述真空泵的功率为3-50KW，抽速600-1200m3/h。
所述旋转电机的功率为30-3000W，射频电源功率为50-1500W。
本发明具有的有益效果：
(1)镀膜过程中工件不仅围绕中心的旋转轴公转，而且还绕行星旋转轴自转，该持续双重的旋转，避免出现因各区域化学单体气体密度不均匀造成固定区域的工件涂层厚度不均匀现象。同时，旋转置物架的转动也有利于将进入腔室内的化学单体气体充分混合均匀。
(2)中心轴位置的中空管上的通孔，可以使进入腔室内的化学单体气体形成沿每层置物台径向往通孔位置扩散的趋势，使得从腔壁到中空管区域化学单体密度更加均匀。
附图说明
图1为一种纳米镀膜设备行星回转货架装置的结构示意图。
图中：1、真空泵，2、抽气口，3、腔室，4、进气阀，5、加料阀，6、行星旋转轴，7、工件，8、置物台，9、旋转电机，10中空管，11、旋转置物架，12、射频电源。
具体实施例
下面结合附图和具体实施方式对本发明作进一步说明。
实施例1
如图1所示，一种纳米镀膜设备行星回转货架装置，包括腔室，所述腔室3顶部连接抽气口2，抽气口连接真空泵1，进气阀4通过进气管路与腔室3连接，加料阀5通过加料管路与腔室3连接，射频电源12通过导线与腔室3内电极连接，腔室中心轴位置安装有中空管10，中空管上开有通孔，所述中空管上端连接到抽气口，所述腔室底部安装有旋转电机9，旋转电机上安装有行星回转货架；
所述行星回转货架包括旋转轴、旋转置物架11，所述旋转轴与旋转电机连接，旋转轴与中空管同轴，旋转轴上固定设置旋转置物架11，旋转置物架上对称设置有行星旋转轴6，所述行星转转轴上设置置物台8，所述行星旋转轴垂直于旋转置物架且可自转，置物台上放置待处理的工件7。
行星旋转轴为2根，置物台为1层。
腔室3的腔容积为50L，材质为铝合金。
真空泵1的功率为3KW，抽速600m3/h。
旋转电机6的功率为30W，射频电源功率为50W。
本发明的工作过程如下：首先将待镀膜工件7放置于镀膜设备腔室3内的置物台8上，真空泵1从抽气口将腔室3内空气抽出使腔室3内压力降低，压力低于1Pa，然后通过进气阀4从进气口向腔室内通入工艺气体，再通过加料阀5从加料口向腔室内添加化学单体气体，旋转电机9带动旋转轴旋转，同时行星旋转轴6带动置物台自转，由射频电源12放电，引发化学单体气体发生聚合并沉积在工件7表面形成聚合物涂层。
实施例2
本实施例的一种纳米镀膜设备行星回转货架装置的各部分结构与连接关系均与实施例1中相同，不同的技术参数为：
行星旋转轴为4根，置物台为3层。
腔室3的容积为600L，材质为铝合金。
真空泵1的功率为10KW，抽速700m3/h。
旋转电机6的功率为400W，射频电源功率为600W。
实施例3
本实施例中所述的一种纳米镀膜设备行星回转货架装置的各部分结构与连接关系均与实施例1中相同，不同的技术参数为：
行星旋转轴为4根，置物台为5层。
腔室3的腔容积为1200L，材质为不锈钢。
真空泵1的功率为20KW，抽速900m3/h。
旋转电机6的功率为800W，射频电源功率为900W。
实施例4
本实施例中所述的一种纳米镀膜设备行星回转货架装置的各部分结构与连接关系均与实施例1中相同，不同的技术参数为：
行星旋转轴为6根，置物台为8层。
腔室3的腔容积为2200L，材质为不锈钢。
真空泵1的功率为40KW，抽速1100m3/h。
旋转电机6的功率为1800W，射频电源功率为1200W。
实施例5
本实施例中所述的一种纳米镀膜设备行星回转货架装置的各部分结构与连接关系均与实施例1中相同，不同的技术参数为：
行星旋转轴为8根，置物台为10层。
腔室3的腔容积为3000L，材质为不锈钢。
真空泵1的功率为50KW，抽速1200m3/h。
旋转电机6的功率为3000W，射频电源功率为1500W。

Claims (5)

1.一种纳米镀膜设备行星回转货架装置，其特征在于：包括腔室，所述腔室(3)顶部连接抽气口(2)，抽气口连接真空泵(1)，进气阀(4)通过进气管路与腔室(3)连接，加料阀(5)通过加料管路与腔室(3)连接，射频电源(12)通过导线与腔室(3)内电极连接，腔室中心轴位置安装有中空管(10)，中空管上开有通孔，所述中空管上端连接到抽气口，所述腔室底部安装有旋转电机(9)，旋转电机上安装有行星回转货架；
所述行星回转货架包括旋转轴、旋转置物架(11)，所述旋转轴与旋转电机连接，旋转轴与中空管同轴，旋转轴上固定设置旋转置物架(11)，旋转置物架上对称设置有至少两根行星旋转轴(6)，所述行星转转轴上设置至少一层置物台(8)，所述行星旋转轴垂直于旋转置物架且可自转，置物台上放置待处理的工件(7)。
2.根据权利要求1所述的一种纳米镀膜设备行星回转货架装置，其特征在于：所述行星旋转轴为2-8根，所述置物台为1-10层。
3.根据权利要求1所述的一种纳米镀膜设备行星回转货架装置，其特征在于：所述腔室(3)的容积为50～3000L，材质为铝合金或不锈钢材质。
4.根据权利要求1所述的一种纳米镀膜设备行星回转货架装置，其特征在于：所述真空泵(1)的功率为3-50k W，抽速600-1200m3/h。
5.根据权利要求1所述的一种纳米镀膜设备行星回转货架装置，其特征在于：所述旋转电机(6)的功率为30-3000W，射频电源功率为50-1500W。
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