CN106154749B - 喷砂用感光性树脂组合物及喷砂处理方法 - Google Patents

喷砂用感光性树脂组合物及喷砂处理方法 Download PDF

Info

Publication number
CN106154749B
CN106154749B CN201610311217.3A CN201610311217A CN106154749B CN 106154749 B CN106154749 B CN 106154749B CN 201610311217 A CN201610311217 A CN 201610311217A CN 106154749 B CN106154749 B CN 106154749B
Authority
CN
China
Prior art keywords
acrylate
meth
compound
photosensitive resin
sandblasting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201610311217.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN106154749A (zh
Inventor
入泽宗利
后闲宽彦
梶谷邦人
丰田裕二
中川邦弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Paper Mills Ltd
Original Assignee
Mitsubishi Paper Mills Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Publication of CN106154749A publication Critical patent/CN106154749A/zh
Application granted granted Critical
Publication of CN106154749B publication Critical patent/CN106154749B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/10—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for compacting surfaces, e.g. shot-peening
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Surface Treatment Of Glass (AREA)
CN201610311217.3A 2015-05-12 2016-05-12 喷砂用感光性树脂组合物及喷砂处理方法 Active CN106154749B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015097114 2015-05-12
JP2015-097114 2015-05-12
JP2016001465 2016-01-07
JP2016-001465 2016-01-07

Publications (2)

Publication Number Publication Date
CN106154749A CN106154749A (zh) 2016-11-23
CN106154749B true CN106154749B (zh) 2021-10-12

Family

ID=57352812

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610311217.3A Active CN106154749B (zh) 2015-05-12 2016-05-12 喷砂用感光性树脂组合物及喷砂处理方法

Country Status (4)

Country Link
JP (1) JP6684147B2 (ko)
KR (1) KR102640456B1 (ko)
CN (1) CN106154749B (ko)
TW (1) TWI687769B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020106581A (ja) * 2018-12-26 2020-07-09 三菱製紙株式会社 サンドブラスト用感光性樹脂構成体
TW202200631A (zh) 2020-06-05 2022-01-01 日商三菱製紙股份有限公司 噴砂用感光性樹脂組成物及噴砂用感光性薄膜
JP2024070237A (ja) * 2022-11-10 2024-05-22 住友化学株式会社 硬化性樹脂組成物及び膜

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1800980A (zh) * 2006-01-11 2006-07-12 彩虹集团电子股份有限公司 一种耐喷砂的乳剂型感光性树脂
CN101151580A (zh) * 2005-03-31 2008-03-26 昭和电工株式会社 用于阻焊剂的阻燃组合物及其固化产品
CN102314086A (zh) * 2010-06-21 2012-01-11 新日铁化学株式会社 黑色阻剂用感光性树脂组合物及滤色器遮光膜
CN102640220A (zh) * 2009-12-02 2012-08-15 日本化药株式会社 光盘用紫外线固化型树脂组合物及其固化物
CN103597407A (zh) * 2011-07-11 2014-02-19 富士胶片株式会社 感光性组合物
CN104470962A (zh) * 2012-07-13 2015-03-25 日本化药株式会社 碱显影型树脂、使用该树脂的感光性树脂组合物

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0349572A (ja) 1989-07-13 1991-03-04 Shicoh Eng Co Ltd 磁気エンコーダ一体型超音波サーボモータ
KR100539141B1 (ko) * 1997-02-13 2005-12-26 코닌클리즈케 디에스엠 엔.브이. 광경화성 수지 조성물
JP3846958B2 (ja) 1997-03-03 2006-11-15 旭化成エレクトロニクス株式会社 サンドブラスト用感光性樹脂組成物及びその用途
CN1529833A (zh) * 2001-05-15 2004-09-15 昭和电工株式会社 光敏着色组合物、使用该组合物的滤色器及其生产方法
KR100521999B1 (ko) 2002-09-03 2005-10-18 주식회사 코오롱 샌드블래스트 레지스트용 감광성수지 조성물
JP2005024893A (ja) * 2003-07-02 2005-01-27 Hitachi Chem Co Ltd 感光性樹脂組成物及びその用途
JP2006023369A (ja) * 2004-07-06 2006-01-26 Asahi Kasei Electronics Co Ltd サンドブラスト用感光性樹脂積層体
JP4586918B2 (ja) * 2006-03-08 2010-11-24 東亞合成株式会社 活性エネルギー線硬化型組成物及びその製造方法
KR101142631B1 (ko) * 2007-12-14 2012-05-10 코오롱인더스트리 주식회사 샌드블라스트 레지스트용 감광성 수지 조성물 및 드라이필름 포토레지스트
JP5455362B2 (ja) * 2008-12-25 2014-03-26 チェイル インダストリーズ インコーポレイテッド 粘着剤組成物およびこれを用いた光学部材
CN104950579B (zh) * 2010-05-20 2020-10-27 日立化成工业株式会社 感光性树脂组合物、感光性薄膜、肋图案的形成方法、中空构造及其形成方法以及电子零件
JP5650945B2 (ja) 2010-07-27 2015-01-07 三菱製紙株式会社 サンドブラスト用感光性フィルム
JP5731994B2 (ja) 2012-01-27 2015-06-10 三菱製紙株式会社 サンドブラスト処理
JPWO2014200028A1 (ja) * 2013-06-14 2017-02-23 日立化成株式会社 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101151580A (zh) * 2005-03-31 2008-03-26 昭和电工株式会社 用于阻焊剂的阻燃组合物及其固化产品
CN1800980A (zh) * 2006-01-11 2006-07-12 彩虹集团电子股份有限公司 一种耐喷砂的乳剂型感光性树脂
CN102640220A (zh) * 2009-12-02 2012-08-15 日本化药株式会社 光盘用紫外线固化型树脂组合物及其固化物
CN102314086A (zh) * 2010-06-21 2012-01-11 新日铁化学株式会社 黑色阻剂用感光性树脂组合物及滤色器遮光膜
CN103597407A (zh) * 2011-07-11 2014-02-19 富士胶片株式会社 感光性组合物
CN104470962A (zh) * 2012-07-13 2015-03-25 日本化药株式会社 碱显影型树脂、使用该树脂的感光性树脂组合物

Also Published As

Publication number Publication date
TW201704867A (zh) 2017-02-01
CN106154749A (zh) 2016-11-23
TWI687769B (zh) 2020-03-11
KR102640456B1 (ko) 2024-02-23
JP6684147B2 (ja) 2020-04-22
JP2017126053A (ja) 2017-07-20
KR20160133362A (ko) 2016-11-22

Similar Documents

Publication Publication Date Title
CN106154749B (zh) 喷砂用感光性树脂组合物及喷砂处理方法
JP5650945B2 (ja) サンドブラスト用感光性フィルム
JP4159094B2 (ja) 感光性樹脂組成物およびこれを用いた感光性ドライフィルム
WO2014200028A1 (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
JP2019196444A (ja) 硬化性樹脂組成物、ドライフィルム、硬化物および電子部品
TW202006470A (zh) 感光性樹脂組成物、蝕刻方法，以及樹脂構造體之製造方法
JP2021017004A (ja) サンドブラスト用感光性フィルム
JP5731994B2 (ja) サンドブラスト処理
WO2021246382A1 (ja) サンドブラスト用感光性樹脂組成物及びサンドブラスト用感光性フィルム
CN211698583U (zh) 喷砂用感光性树脂结构体
JP3236461U (ja) サンドブラスト用感光性樹脂構成体
JP2020134694A (ja) サンドブラスト用感光性樹脂組成物及びサンドブラスト処理
JP5782162B2 (ja) サンドブラスト用感光性フィルム
WO2014119562A1 (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
WO2018179259A1 (ja) 感光性樹脂組成物、それを用いたドライフィルム、プリント配線板、及び、プリント配線板の製造方法
JP6275627B2 (ja) めっき用感光性樹脂組成物
JP2015001591A (ja) 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法
JP2023148940A (ja) サンドブラスト用感光性フィルム
JP2023127135A (ja) サンドブラスト用感光性樹脂組成物およびドライフィルム
JP2023120948A (ja) 剥離方法
KR20060107840A (ko) 감광성 수지조성물, 이것을 이용한 감광성 엘리먼트,레지스트 패턴의 제조방법 및 프린트 배선판의 제조방법
JP6018664B2 (ja) サンドブラスト用感光性フィルム
WO2020130155A1 (ja) フッ酸耐性レジスト組成物、およびこれを用いて得られた基材加工品
JP2023059827A (ja) 感光性樹脂組成物及びめっき方法
JP3105438B2 (ja) フォトレジスト組成物

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant