CN105938296B - 抗蚀剂组合物和干膜 - Google Patents

抗蚀剂组合物和干膜 Download PDF

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Publication number
CN105938296B
CN105938296B CN201610125297.3A CN201610125297A CN105938296B CN 105938296 B CN105938296 B CN 105938296B CN 201610125297 A CN201610125297 A CN 201610125297A CN 105938296 B CN105938296 B CN 105938296B
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China
Prior art keywords
resin
alkali
meth
resist composition
group
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CN201610125297.3A
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Chinese (zh)
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CN105938296A (zh
Inventor
西尾一则
宫泽俊春
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Taiyo Holdings Co Ltd
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Taiyo Ink Mfg Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Structural Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Architecture (AREA)
  • Epoxy Resins (AREA)
CN201610125297.3A 2015-03-04 2016-03-04 抗蚀剂组合物和干膜 Active CN105938296B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015042812A JP6697222B2 (ja) 2015-03-04 2015-03-04 エッチングレジスト組成物およびドライフィルム
JP2015-042812 2015-03-04

Publications (2)

Publication Number Publication Date
CN105938296A CN105938296A (zh) 2016-09-14
CN105938296B true CN105938296B (zh) 2021-02-19

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ID=56844826

Family Applications (1)

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CN201610125297.3A Active CN105938296B (zh) 2015-03-04 2016-03-04 抗蚀剂组合物和干膜

Country Status (4)

Country Link
JP (1) JP6697222B2 (ja)
KR (1) KR102541613B1 (ja)
CN (1) CN105938296B (ja)
TW (1) TWI698712B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108983550A (zh) * 2018-08-03 2018-12-11 广东泰亚达光电有限公司 一种水溶性感光干膜及其制备方法
CN113227010A (zh) * 2018-12-21 2021-08-06 太阳油墨制造株式会社 耐氢氟酸性抗蚀剂组合物和使用其得到的基材加工品
CN114874658A (zh) * 2021-12-03 2022-08-09 佛山市西伦化工有限公司 一种抗蚀刻的uv油墨及其制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4689568B2 (ja) 2005-10-05 2011-05-25 関西ペイント株式会社 ガラスエッチング用紫外線硬化型レジスト組成物及びガラスエッチング処理方法
WO2008001722A1 (fr) * 2006-06-27 2008-01-03 Nippon Kayaku Kabushiki Kaisha Composition durcissable par rayons énergétiques actifs à des fins optiques, et résine à indice de réfraction élevé
JP2010015025A (ja) * 2008-07-04 2010-01-21 Adeka Corp 特定の光重合開始剤を含有する感光性組成物
CN102089710B (zh) * 2008-07-16 2016-12-07 日产化学工业株式会社 正型抗蚀剂组合物以及微透镜的制造方法
KR20130018229A (ko) * 2010-03-26 2013-02-20 스미또모 베이크라이트 가부시키가이샤 감광성 수지 조성물 및 수광 장치
TWI424268B (zh) * 2010-08-26 2014-01-21 Taiyo Ink Suzhou Co Ltd An alkaline developing type photosensitive resin composition
CN103765314B (zh) * 2011-08-30 2018-02-16 旭硝子株式会社 负型感光性树脂组合物、分隔壁以及光学元件
JP2013117669A (ja) * 2011-12-05 2013-06-13 Hitachi Chemical Co Ltd 感光性樹脂組成物、並びにこれを用いた感光性フィルム、レジストパターンの形成方法及びプリント配線板
KR101900636B1 (ko) * 2012-09-18 2018-09-19 아사히 가세이 이-매터리얼즈 가부시키가이샤 감광성 수지 조성물
JP5514355B2 (ja) * 2012-09-28 2014-06-04 太陽インキ製造株式会社 光硬化性樹脂組成物、プリント配線板、及び光硬化性樹脂組成物の製造方法
JP5632978B1 (ja) * 2013-06-28 2014-11-26 太陽インキ製造株式会社 光硬化性組成物およびその硬化物
JP5660690B2 (ja) * 2013-08-02 2015-01-28 太陽ホールディングス株式会社 感光性樹脂組成物及びその硬化物

Also Published As

Publication number Publication date
JP2016161875A (ja) 2016-09-05
JP6697222B2 (ja) 2020-05-20
KR20160108160A (ko) 2016-09-19
CN105938296A (zh) 2016-09-14
TWI698712B (zh) 2020-07-11
KR102541613B1 (ko) 2023-06-09
TW201642037A (zh) 2016-12-01

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Effective date of registration: 20230606

Address after: Saitama Prefecture, Japan

Patentee after: TAIYO HOLDINGS Co.,Ltd.

Address before: Saitama Prefecture, Japan

Patentee before: TAIYO INK MFG. Co.,Ltd.

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