CN105555423A - 用于基材辐射处理设备的气流装置 - Google Patents
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Abstract
本发明涉及基材的辐射处理设备,它在腔室内在用于装设待处理基材的基材座上包括至少一个辐射源,并且该腔室包括用于在该腔室内维持气流的机构,其包括具有至少一个气体入口和至少一个气体出口的气体流动机构,其特征是,该气体流动机构设置在该基材座下方的区域内且如此构成,经至少一个气体入口流入的气体首先环绕基材座流动,随后它直接和/或在流经所述至少一个辐射源之后经气体出口又离开该腔室。
Description
本发明涉及用电磁射线辐射基材的设备,所述电磁射线例如是红外线(IR射线)用于干燥基材,和/或是紫外线(UV射线)用于交联紫外固化漆。
这样的设备例如用作上漆设备的组成部分。在这种上漆设备中,在第一步骤中一般清理基材表面。这例如可以借助空气压力和/或用于表面离子化的手段来完成,或者借助给表面施以流态介质(如水或含水或含乙醇或含溶剂的溶液)或者固体(如喷射物料)或CO2,或者将基材浸泡在含水或含乙醇或含溶剂的溶液中且或许在波(如超声波或微波)的作用下。
在用流态介质清理的情况下,可能为了随后干燥,已采用红外热辐射。
随后,在第二步骤中例如借助喷涂油漆分散液来施加真正的漆层。接着是以下步骤,此时所述已上漆的基材被烘干。这可借助在环境空气中的加热和/或借助施以红外线(IR)在例如50℃至80℃下进行。此时,通常存在于油漆分散液内的溶剂基本上被蒸发。在当今很流行的紫外固化漆(即可用紫外线交联的油漆)的情况下,所述固化在溶剂蒸发之后的步骤中进行。根据应用场合,在这些加工步骤中采用红外灯和/或紫外灯。在本说明书中,借助IR射线的干燥加工过程和/或借助UV射线的交联加工过程被统称为辐射处理。
为了阻止溶剂自由挥发到环境或工作环境中,这样的加工过程根据现有技术在处理腔室内进行。此时应该保证出现稳定的气体交换,以便例如在基材环境中保持低的溶剂浓度,并借此也加速干燥过程和/或交联过程。
根据现有技术,如图1示意所示,在封闭腔室1内执行辐射处理。此时在腔室1的上部设有辐射源9、9‘、9“,在下部安置有待装载基材的基材座11、11‘。作为基材座在图1中示出两个轴,它们能装设有待辐射的部件。将辐射源9、9‘、9“安放在基材座11、11‘下面也是可行的,但一般要避免这样安放,以便不要冒着辐射源9、9‘、9“被从基材上滴落的油漆残余弄脏的风险。
根据现有技术,在腔室顶壁处设有流入区域7,通过该流入区域,从入口3送入的气体例如空气流入腔室。该气体根据现有技术流经辐射源9、9‘、9“且随后流经基材11、11‘,流入腔室的下区域中,气体在下区域中经出口5被吸出腔室1。因为根据现有技术的这种布置,流动和重力合作,从而脏东西如灰尘和还有溶剂被有效抽吸走。在图1中,由箭头示意性示出气流及其方向。
但在这种根据现有技术的布置中的缺点是,在基材旁边流过的气流首先须流过辐射源。辐射源在工作中一般是灼热的,这导致气流不可控地变热。就是说,基材座11、11‘要接受这样的气流,其不具有规定的温度且在此情况下可能在基材座宽度范围内甚至出现温度梯度。但是,干燥和或交联的过程明显受到所存在的温度的影响。因此,不定的温度条件快速地导致不可控的工作过程。尤其在出现温度梯度时,在此出现不一致性。所述问题还如此变得尖锐,即,该辐射源本身一般不是温度稳定的。在初始阶段,辐射源是相当冷的,而它在长时间工作之后明显变热。虽然该问题可以通过在辐射源处的确切冷却措施来减轻。但这样的措施牵扯到显著的技术成本且因而是昂贵的。
根据上述内容,人们希望提供一种辐射处理设备,借此缓解且最好完全克服现有技术的上述问题。
因此,本发明所基于的任务是提供这样的设备。
根据本发明,通过根据权利要求1的设备来解决上述问题。从属权利要求是本发明的优选实施方式。根据本发明,原则上如此解决所述问题,即在该腔室内形成气流,该气流在进入腔室之后直接在基材旁流过。因为气流之前未在或许散发热的辐射源旁流过,故气流温度是妥善限定的且也可按照简单方式被调节到期望的稳定值。
现在,结合附图来具体举例描述本发明及其有利的实施方式。
图1示出根据现有技术的基材辐射处理设备。
图2示出根据本发明的第一实施方式的基材辐射处理设备。
图3示出根据本发明的第二实施方式的基材辐射处理设备。
图4示出根据本发明的第三实施方式的基材辐射处理设备。
图5示意性示出包括本发明辐射处理设备的上漆设备的可能布局。
图2示出根据本发明的第一实施方式的设备。示出了腔室201,在该腔室内设有辐射源9、9‘、9“和待辐射的基材11、11‘。在该腔室内,在下方在基材11、11‘附近设有气体入口203。根据本实施方式,在腔室顶壁区域内设有气体出口205,其上游可设有顶部腔室207。现在,在设备运行中,气体在进入腔室之后先在基材11、11‘旁流过,随后其流经该辐射源9、9‘、9“并经过可选的顶部腔室207通过气体出口205流出。通过这种方式,在基材11、11‘旁流过的气体的温度被妥善限定,且工艺可在精确预定的稳定温度条件下进行。有利的是,在腔室边缘区域处设有多个凹部209,其可以起到集尘器作用。
图3示出本发明的第二有利实施方式。在这里,腔室301(包括设于基材11、11‘上方的辐射源9、9‘、9“)不仅在基材11、11‘下方通过在腔室下部区域内的第一入口303接受气流,而且在辐射源9、9‘、9“上方通过在腔室上部区域内的第二入口305接受气流。最好在腔室的一半高度处设置出口311、311‘,所述出口最好对称布置。两股气流在此实施方式中(如图用箭头所示)大致在一半高度处交汇,即在辐射源9、9‘、9“和基材11、11‘之间交汇,并且经过侧设的出口311、311‘逸出腔室内部。本发明的这个特别优选的实施方式尤其有以下优点:气流所携带的灰尘颗粒趋于被送往腔室边缘。如果在那里还设有可起到集尘器作用的凹部309,则存在于该腔室内的灰尘或许主要被送向出口311、311‘,但中途从气流中沉淀出,主要集中在该集尘器内。根据一个特别优选的实施方式,在凹部309内分别设有一个可取出的容器313,从而灰尘可集中在该容器内且可以通过取出并倒空该容器被简单除去。当然,这样的容器也可以被有利地用在本发明的其它实施方式中。
这里公开了一种基材的辐射处理设备,它在腔室内在用于装设待处理基材的基材座上方包括至少一个辐射源,该腔室包括用于在腔室内维持气流的机构,其具有至少一个气体入口和至少一个气体出口,其特征是,所述至少一个气体入口如此设置在基材座的区域内,即,经所述至少一个气体入口流入的气体首先流经该基材座,随后它直接和/或在流经所述至少一个辐射源之后经该气体出口又离开该腔室。
在该设备中,该气体出口可以如此设置在所述至少一个辐射源的区域内,即,所述气体在流经该基材座之后流经所述至少一个辐射源,随后经气体出口离开该腔室。
气体出口可以设置在基材座和至少一个辐射源之间的高度上。
在所述至少一个辐射源的区域内,可以如此设有第二气体入口,即通过第二气体入口流入的气体首先流经所述至少一个辐射源,随后遇到从基材座流来的气体并随之经气体出口流出该腔室。
在下腔室壁上可以如此设有凹部,即,流动在凹部区域中减少并且凹部与此相应地发挥了集尘器的作用。
可以在所述凹部内设置可取出的容器。
根据本发明的尤其优选的第三实施方式如图4所示。在这里,腔室401(其具有设于基材11、11‘上方的辐射源9、9‘、9“)在基材11、11‘的下方通过在腔室下部区域内的入口421、421‘接受气流。一股或多股气体流经该基材11、11‘,并且一部分经过在该腔室下部区域内的气体出口423,一部分经过在该腔室的上部区域内的气体出口405流出。根据本实施方式,气体输入装置和/或气体输出装置421、421‘或423按如下方式包括就尺寸而言在流动方向上缩小、但后续在流动方向上又扩宽的流道:即,基本至少在该气体流动机构处存在层流,因而不会因为紊流而出现沉积(例如灰尘和污垢)。该流道在本实施方式的一个特别优选的变型中由可成形的板材如金属板形成。它们如图4中所示分别呈双壁状,其中,所述两个壁通过一道如20毫米的缝隙S相互间隔地构成。该缝隙决定了绝热,之所以这是尤其有利的,是因为在该腔室内因为在干燥时所采用的灼热空气而肯定会出现100℃或更高的温度。所述气体经过气体输入装置421、421‘的圆形开口21、21‘流入并且一部分经过气体输出装置423的圆形开口23流出。
根据第三变型的一个优选实施方式,若干独立的气体流动机构在上部具有凸起,该凸起允许各两个气体流动机构借助例如夹子轨道或盖板30、30‘结合在一起,由此例如也允许在此区域内维持层流。
尤其是,本发明公开了一种基材的辐射处理设备401,它在腔室内在用于装设待处理基材的基材座11、11‘上包括至少一个辐射源9、9‘、9“,该腔室包括用于在该腔室内维持气流的机构,其具有包括至少一个气体入口421、421‘和至少一个气体出口423、405的气体流动机构,其中,该气体流动机构设置在该基材座11、11‘下方的区域内且如此构成,即,气体入口421、421‘和气体出口423、405包括下述构件:“其在流向上形成缩小的、且进一步在下游又扩宽的流道”,由此一来,在设备运行时基本上至少在该气体流动机构处存在层流且因而不会因为紊流而出现沉积。
辐射处理设备401的构成流道的构件最好由可塑形的板、最好是金属板形成。
在上部区域中的形成该流道的构件中的至少两个最好借助轨道、夹子和或盖板30、30‘结合在一起,由此允许简单的安装和或拆卸。
形成该流道的构件最好至少是双壁的,其中,所述至少两个壁是间隔的,由此形成绝热的缝隙S。
Claims (4)
1.一种基材的辐射处理设备(401),它在腔室内在用于装设待处理基材的基材座(11,11‘)上方包括至少一个辐射源(9,9‘,9“),该腔室包括用于在该腔室内维持气流的机构,其具有包括至少一个气体入口(421,421‘)和至少一个气体出口(423,405)的气体流动机构,
其特征是,
该气体流动机构设置在该基材座(11,11‘)下方的区域内且如下构成:气体入口(421,421‘)和气体出口(423,405)包括下列构件:所述构件形成在流向上缩小的、且进一步在下游又扩宽的流道,由此在该设备运行时基本上至少在该气体流动机构处存在层流且因而不会因为紊流而出现沉积。
2.根据权利要求1的设备,其特征是,形成该流道的所述构件由可成形的板、最好是金属板形成。
3.根据权利要求2的设备,其特征是,形成该流道的所述构件中的至少两个在上部区域(30,30‘)内借助轨道、夹子和或盖板被结合起来,由此实现简单的安装和或拆卸。
4.根据权利要求3的设备,其特征是,形成该流道的所述构件至少是双壁的,其中,所述至少两个壁相互间隔,由此形成绝热缝隙(S)。
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DE201310015580 DE102013015580A1 (de) | 2013-09-20 | 2013-09-20 | Gasstromvorrichtung für Anlage zur Strahlungsbehandlung von Substraten |
DE102013015580.0 | 2013-09-20 | ||
PCT/EP2014/002406 WO2015039732A1 (de) | 2013-09-20 | 2014-09-05 | Gasstromvorrichtung für anlage zur strahlungsbehandlung von substraten |
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HUE043144T2 (hu) | 2019-08-28 |
RU2670926C2 (ru) | 2018-10-25 |
WO2015039732A1 (de) | 2015-03-26 |
DE102013015580A1 (de) | 2015-03-26 |
EP3046686A1 (de) | 2016-07-27 |
MX369668B (es) | 2019-11-14 |
ES2712992T3 (es) | 2019-05-17 |
KR20160075518A (ko) | 2016-06-29 |
US10245616B2 (en) | 2019-04-02 |
MX2016003237A (es) | 2016-10-28 |
EP3046686B1 (de) | 2018-11-07 |
PT3046686T (pt) | 2019-02-12 |
CA2924785A1 (en) | 2015-03-26 |
CN105555423B (zh) | 2017-11-21 |
JP2016538163A (ja) | 2016-12-08 |
RU2016115042A (ru) | 2017-10-25 |
US20160214138A1 (en) | 2016-07-28 |
PL3046686T3 (pl) | 2019-04-30 |
JP6492089B2 (ja) | 2019-03-27 |
RU2670926C9 (ru) | 2018-12-13 |
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