CN105358489B - 含有阳离子表面活性剂的废水的处理方法及处理装置 - Google Patents
含有阳离子表面活性剂的废水的处理方法及处理装置 Download PDFInfo
- Publication number
- CN105358489B CN105358489B CN201480032673.3A CN201480032673A CN105358489B CN 105358489 B CN105358489 B CN 105358489B CN 201480032673 A CN201480032673 A CN 201480032673A CN 105358489 B CN105358489 B CN 105358489B
- Authority
- CN
- China
- Prior art keywords
- reverse osmosis
- osmosis membrane
- waste water
- water
- cationic surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002351 wastewater Substances 0.000 title claims abstract description 61
- 239000003093 cationic surfactant Substances 0.000 title claims abstract description 46
- 238000003672 processing method Methods 0.000 title claims description 12
- 239000012528 membrane Substances 0.000 claims abstract description 125
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 83
- 238000000926 separation method Methods 0.000 claims abstract description 74
- 238000000034 method Methods 0.000 claims abstract description 29
- 230000005540 biological transmission Effects 0.000 claims abstract description 25
- 238000001223 reverse osmosis Methods 0.000 claims description 137
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 34
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- 238000009738 saturating Methods 0.000 claims 2
- 230000007774 longterm Effects 0.000 abstract description 3
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 150000001768 cations Chemical class 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 13
- 230000003213 activating effect Effects 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 238000007667 floating Methods 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000004760 aramid Substances 0.000 description 3
- 229920003235 aromatic polyamide Polymers 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical class [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 241000282320 Panthera leo Species 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000005345 coagulation Methods 0.000 description 2
- 230000015271 coagulation Effects 0.000 description 2
- 238000011033 desalting Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011835 investigation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- FRXSZNDVFUDTIR-UHFFFAOYSA-N 6-methoxy-1,2,3,4-tetrahydroquinoline Chemical compound N1CCCC2=CC(OC)=CC=C21 FRXSZNDVFUDTIR-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000003899 bactericide agent Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000001149 cognitive effect Effects 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- -1 iron chloride Chemical compound 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- BJAARRARQJZURR-UHFFFAOYSA-N trimethylazanium;hydroxide Chemical compound O.CN(C)C BJAARRARQJZURR-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/04—Feed pretreatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
- B01D61/026—Reverse osmosis; Hyperfiltration comprising multiple reverse osmosis steps
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/66—Treatment of water, waste water, or sewage by neutralisation; pH adjustment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2311/00—Details relating to membrane separation process operations and control
- B01D2311/04—Specific process operations in the feed stream; Feed pretreatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2311/00—Details relating to membrane separation process operations and control
- B01D2311/26—Further operations combined with membrane separation processes
- B01D2311/2626—Absorption or adsorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2317/00—Membrane module arrangements within a plant or an apparatus
- B01D2317/02—Elements in series
- B01D2317/025—Permeate series
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/301—Detergents, surfactants
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/06—Controlling or monitoring parameters in water treatment pH
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Water Treatment By Sorption (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-138915 | 2013-07-02 | ||
| JP2013138915A JP5700080B2 (ja) | 2013-07-02 | 2013-07-02 | カチオン界面活性剤含有排水の処理方法及び処理装置 |
| PCT/JP2014/066629 WO2015002014A1 (ja) | 2013-07-02 | 2014-06-24 | カチオン界面活性剤含有排水の処理方法及び処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105358489A CN105358489A (zh) | 2016-02-24 |
| CN105358489B true CN105358489B (zh) | 2017-08-08 |
Family
ID=52143593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480032673.3A Active CN105358489B (zh) | 2013-07-02 | 2014-06-24 | 含有阳离子表面活性剂的废水的处理方法及处理装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20160368801A1 (ko) |
| JP (1) | JP5700080B2 (ko) |
| KR (1) | KR102203037B1 (ko) |
| CN (1) | CN105358489B (ko) |
| SG (1) | SG11201510718UA (ko) |
| TW (1) | TWI593636B (ko) |
| WO (1) | WO2015002014A1 (ko) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10981819B2 (en) * | 2018-06-28 | 2021-04-20 | Fluent Technologies, Llc | Variable pulsed ionic waste stream reclamation system and method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1950302A (zh) * | 2004-04-23 | 2007-04-18 | 永久水有限公司 | 从水中去除污染物的方法和装置 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1478345A (en) * | 1974-04-10 | 1977-06-29 | Ebara Infilco | Process for purifying water containing suspended matter |
| JPS5850487A (ja) * | 1981-09-21 | 1983-03-24 | Brother Ind Ltd | 被検出物体の検出装置 |
| US4574049B1 (en) * | 1984-06-04 | 1999-02-02 | Ionpure Filter Us Inc | Reverse osmosis system |
| JPH062277B2 (ja) * | 1985-08-15 | 1994-01-12 | 栗田工業株式会社 | 高純度水の製造装置 |
| AU617290B3 (en) * | 1991-05-27 | 1991-10-04 | Hoefer, Dawn Annette | Process for removing silica from aqueous liquors |
| JP3278918B2 (ja) * | 1992-08-21 | 2002-04-30 | 栗田工業株式会社 | 脱塩方法 |
| JP3376639B2 (ja) * | 1993-05-27 | 2003-02-10 | 栗田工業株式会社 | 半導体洗浄排水からの純水回収方法 |
| JP3862816B2 (ja) * | 1997-06-18 | 2006-12-27 | 日東電工株式会社 | 逆浸透膜分離方法 |
| JP3575271B2 (ja) * | 1998-03-06 | 2004-10-13 | 栗田工業株式会社 | 純水の製造方法 |
| JP2000015257A (ja) * | 1998-07-06 | 2000-01-18 | Kurita Water Ind Ltd | 高純度水の製造装置および方法 |
| JP2001205267A (ja) * | 2000-01-24 | 2001-07-31 | Japan Organo Co Ltd | ２段逆浸透膜処理装置および方法 |
| JP2003071252A (ja) * | 2001-09-06 | 2003-03-11 | Nitto Denko Corp | 多段式逆浸透処理方法 |
| JP4519487B2 (ja) * | 2003-03-06 | 2010-08-04 | 株式会社トクヤマ | 洗浄用組成物 |
| US6929748B2 (en) * | 2003-03-28 | 2005-08-16 | Chemitreat Pte Ltd | Apparatus and method for continuous electrodeionization |
| JP2005246158A (ja) * | 2004-03-02 | 2005-09-15 | Kobelco Eco-Solutions Co Ltd | 海水の淡水化処理法および装置 |
| JP4813810B2 (ja) * | 2005-03-11 | 2011-11-09 | 日本錬水株式会社 | 界面活性剤を含有する排水の処理方法、および排水処理システム |
| BRPI0806375A2 (pt) * | 2007-01-19 | 2011-09-13 | Purolite Company | método para purificar água, método para tratar água contendo sìlica dissolvida e sistema de tratamento de água |
| JP5813280B2 (ja) * | 2008-03-19 | 2015-11-17 | 富士フイルム株式会社 | 半導体デバイス用洗浄液、および洗浄方法 |
-
2013
- 2013-07-02 JP JP2013138915A patent/JP5700080B2/ja active Active
-
2014
- 2014-06-24 CN CN201480032673.3A patent/CN105358489B/zh active Active
- 2014-06-24 WO PCT/JP2014/066629 patent/WO2015002014A1/ja active Application Filing
- 2014-06-24 SG SG11201510718UA patent/SG11201510718UA/en unknown
- 2014-06-24 KR KR1020157036964A patent/KR102203037B1/ko active IP Right Grant
- 2014-06-24 US US14/901,847 patent/US20160368801A1/en not_active Abandoned
- 2014-06-30 TW TW103122490A patent/TWI593636B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1950302A (zh) * | 2004-04-23 | 2007-04-18 | 永久水有限公司 | 从水中去除污染物的方法和装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015009230A (ja) | 2015-01-19 |
| WO2015002014A1 (ja) | 2015-01-08 |
| TW201509827A (zh) | 2015-03-16 |
| TWI593636B (zh) | 2017-08-01 |
| SG11201510718UA (en) | 2016-01-28 |
| KR20160025527A (ko) | 2016-03-08 |
| KR102203037B1 (ko) | 2021-01-13 |
| US20160368801A1 (en) | 2016-12-22 |
| CN105358489A (zh) | 2016-02-24 |
| JP5700080B2 (ja) | 2015-04-15 |
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