CN105091804B - 石英振荡式膜厚计 - Google Patents
石英振荡式膜厚计 Download PDFInfo
- Publication number
- CN105091804B CN105091804B CN201510244172.8A CN201510244172A CN105091804B CN 105091804 B CN105091804 B CN 105091804B CN 201510244172 A CN201510244172 A CN 201510244172A CN 105091804 B CN105091804 B CN 105091804B
- Authority
- CN
- China
- Prior art keywords
- film thickness
- film
- quartz
- evaporation
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000010453 quartz Substances 0.000 title claims abstract description 127
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 127
- 230000010355 oscillation Effects 0.000 title claims abstract description 46
- 230000008020 evaporation Effects 0.000 claims abstract description 89
- 238000001704 evaporation Methods 0.000 claims abstract description 89
- 239000011368 organic material Substances 0.000 claims abstract description 89
- 239000000463 material Substances 0.000 claims abstract description 66
- 238000007740 vapor deposition Methods 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 claims abstract 23
- 239000010409 thin film Substances 0.000 claims abstract 2
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 238000005019 vapor deposition process Methods 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000005416 organic matter Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 3
- 238000010025 steaming Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 abstract description 7
- 238000000151 deposition Methods 0.000 abstract description 3
- 230000008021 deposition Effects 0.000 abstract description 3
- 210000002469 basement membrane Anatomy 0.000 abstract 1
- 210000004379 membrane Anatomy 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 230000006978 adaptation Effects 0.000 description 21
- 230000001360 synchronised effect Effects 0.000 description 14
- 230000000630 rising effect Effects 0.000 description 12
- 238000012544 monitoring process Methods 0.000 description 9
- 208000037656 Respiratory Sounds Diseases 0.000 description 6
- 230000006641 stabilisation Effects 0.000 description 5
- 238000011105 stabilization Methods 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004575 stone Substances 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 230000003534 oscillatory effect Effects 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Acoustics & Sound (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014101254A JP6223275B2 (ja) | 2014-05-15 | 2014-05-15 | 水晶発振式膜厚計 |
| JPJP2014-101254 | 2014-05-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105091804A CN105091804A (zh) | 2015-11-25 |
| CN105091804B true CN105091804B (zh) | 2019-06-07 |
Family
ID=54572765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510244172.8A Active CN105091804B (zh) | 2014-05-15 | 2015-05-14 | 石英振荡式膜厚计 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6223275B2 (https=) |
| KR (1) | KR101918805B1 (https=) |
| CN (1) | CN105091804B (https=) |
| TW (1) | TWI655407B (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6448279B2 (ja) * | 2014-09-30 | 2019-01-09 | キヤノントッキ株式会社 | 真空蒸着装置 |
| CN106092002A (zh) * | 2016-06-07 | 2016-11-09 | 应达利电子股份有限公司 | 用于成膜厚度监测的石英晶体谐振器、监测仪及监测方法 |
| JP6564745B2 (ja) * | 2016-09-06 | 2019-08-21 | 株式会社アルバック | 膜厚センサ |
| CN112556612A (zh) * | 2017-06-28 | 2021-03-26 | 株式会社爱发科 | 用于石英晶体振荡式薄膜厚度监视器的传感器头 |
| KR101870581B1 (ko) * | 2017-09-29 | 2018-06-22 | 캐논 톡키 가부시키가이샤 | 수정진동자의 수명 판정방법, 막두께 측정장치, 성막방법, 성막장치, 및 전자 디바이스 제조방법 |
| KR20200014100A (ko) * | 2018-07-31 | 2020-02-10 | 캐논 톡키 가부시키가이샤 | 증발 레이트 측정 장치, 증발 레이트 측정 장치의 제어 방법, 성막 장치, 성막 방법 및 전자 디바이스의 제조방법 |
| JP7253352B2 (ja) | 2018-10-22 | 2023-04-06 | キヤノントッキ株式会社 | 成膜装置、下地膜形成方法、および成膜方法 |
| CN110257791B (zh) * | 2019-04-29 | 2021-07-20 | 昆山国显光电有限公司 | 速率监控装置、蒸镀设备及蒸镀方法 |
| JP7834456B2 (ja) * | 2021-11-12 | 2026-03-24 | キヤノントッキ株式会社 | 成膜量測定装置の制御装置、成膜装置、成膜量測定方法、成膜方法、及び電子デバイスの製造方法 |
| CN115216735B (zh) * | 2022-06-09 | 2023-07-25 | 广西自贸区睿显科技有限公司 | 一种oled生产过程中石英晶振片沉积监测装置及方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04131708A (ja) * | 1990-09-25 | 1992-05-06 | Nippon Sheet Glass Co Ltd | 膜厚モニター |
| JP3483749B2 (ja) * | 1997-11-28 | 2004-01-06 | 株式会社アルバック | 圧電結晶発振式膜厚計 |
| US6828045B1 (en) * | 2003-06-13 | 2004-12-07 | Idemitsu Kosan Co., Ltd. | Organic electroluminescence element and production method thereof |
| JP2005345143A (ja) * | 2004-05-31 | 2005-12-15 | National Institute Of Advanced Industrial & Technology | 発振式質量膜厚計 |
| JP4388443B2 (ja) * | 2004-09-09 | 2009-12-24 | 株式会社アルバック | 膜厚監視方法および膜厚監視装置 |
| JP4669749B2 (ja) * | 2005-06-30 | 2011-04-13 | 株式会社アルバック | 水晶振動子を用いた測定方法及び測定装置 |
| JP2007171028A (ja) * | 2005-12-22 | 2007-07-05 | Nippon Seiki Co Ltd | 蒸着膜厚測定方法及びその装置 |
| JP2007305439A (ja) | 2006-05-12 | 2007-11-22 | Canon Inc | 有機電界発光表示装置の製造方法 |
| JP4974858B2 (ja) * | 2007-11-19 | 2012-07-11 | 株式会社アルバック | 成膜装置、薄膜形成方法 |
| CN201414116Y (zh) * | 2009-05-11 | 2010-02-24 | 金华市创捷电子有限公司 | 石英晶体谐振器镀银电极 |
| JP5936394B2 (ja) * | 2012-03-14 | 2016-06-22 | 日立造船株式会社 | 蒸着装置 |
| JP2014070969A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | レートセンサ及びリニアソース並びに蒸着装置 |
| JP2014070243A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | 水晶発振式膜厚モニタ用センサヘッド |
| CN203112920U (zh) * | 2013-03-26 | 2013-08-07 | 京东方科技集团股份有限公司 | 薄膜厚度传感器和蒸镀设备 |
-
2014
- 2014-05-15 JP JP2014101254A patent/JP6223275B2/ja active Active
-
2015
- 2015-04-08 TW TW104111253A patent/TWI655407B/zh active
- 2015-05-08 KR KR1020150064396A patent/KR101918805B1/ko active Active
- 2015-05-14 CN CN201510244172.8A patent/CN105091804B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20150131975A (ko) | 2015-11-25 |
| CN105091804A (zh) | 2015-11-25 |
| TW201608207A (zh) | 2016-03-01 |
| JP2015219053A (ja) | 2015-12-07 |
| TWI655407B (zh) | 2019-04-01 |
| JP6223275B2 (ja) | 2017-11-01 |
| KR101918805B1 (ko) | 2018-11-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105091804B (zh) | 石英振荡式膜厚计 | |
| CN105463377B (zh) | 真空蒸镀装置 | |
| CN105556840B (zh) | 振动装置及其制造方法 | |
| US20160202101A1 (en) | Sensor structures and methods of forming using three-dimensional printing techniques | |
| JP2015233042A (ja) | 圧電薄膜及びその製造方法、並びに圧電素子 | |
| JP2015219053A5 (https=) | ||
| JPWO2015108125A1 (ja) | 圧電振動子及び圧電振動装置 | |
| JP6564745B2 (ja) | 膜厚センサ | |
| CN107110694A (zh) | 振动传感器 | |
| KR102135790B1 (ko) | 진동 엘리먼트의 진동 응답 파라미터의 결정 | |
| JP6845143B2 (ja) | 水素センサ | |
| JP2013219542A (ja) | 圧電振動子 | |
| TW201229276A (en) | Film forming apparatus and film forming method | |
| US10558169B2 (en) | Method for manufacturing a micromechanical timepiece part and said micromechanical timepiece part | |
| FR3085161B1 (fr) | Procede de croissance de nanotubes de carbone en surface et dans le volume d'un substrat carbone poreux et utilisation pour preparer une electrode | |
| JP5849049B2 (ja) | 走査型プローブ用の金属探針およびその製造方法 | |
| JP5354016B2 (ja) | 穴を閉塞する方法 | |
| CN104152974B (zh) | 一种高速复合电镀金刚石线锯上砂设备 | |
| CN207265991U (zh) | 一种新型石英晶振片 | |
| CN207915231U (zh) | 一种石英片研磨盘及电极连接结构 | |
| Коваленко et al. | Research of fracture of doped titanium alloys under cavitation | |
| WO2016136475A1 (ja) | 窒化インジウム圧電薄膜及びその製造方法、並びに圧電素子 | |
| KR101388108B1 (ko) | 기판 도금 장치 | |
| TW201119223A (en) | Crystal oscillating device | |
| JP2011171902A (ja) | 圧電振動子の製造方法及び圧電振動子 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |