TWI655407B - Crystal oscillating film thickness meter - Google Patents
Crystal oscillating film thickness meter Download PDFInfo
- Publication number
- TWI655407B TWI655407B TW104111253A TW104111253A TWI655407B TW I655407 B TWI655407 B TW I655407B TW 104111253 A TW104111253 A TW 104111253A TW 104111253 A TW104111253 A TW 104111253A TW I655407 B TWI655407 B TW I655407B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- vapor deposition
- crystal
- film thickness
- organic material
- Prior art date
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 130
- 239000011368 organic material Substances 0.000 claims abstract description 93
- 238000007740 vapor deposition Methods 0.000 claims abstract description 59
- 239000000463 material Substances 0.000 claims abstract description 56
- 238000001704 evaporation Methods 0.000 claims abstract description 42
- 230000008020 evaporation Effects 0.000 claims abstract description 42
- 230000010355 oscillation Effects 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims abstract description 6
- 238000000151 deposition Methods 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 208
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 13
- 239000010409 thin film Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 5
- 230000003534 oscillatory effect Effects 0.000 claims description 5
- 238000005019 vapor deposition process Methods 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000005336 cracking Methods 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Acoustics & Sound (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014101254A JP6223275B2 (ja) | 2014-05-15 | 2014-05-15 | 水晶発振式膜厚計 |
| JP2014-101254 | 2014-05-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201608207A TW201608207A (zh) | 2016-03-01 |
| TWI655407B true TWI655407B (zh) | 2019-04-01 |
Family
ID=54572765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104111253A TWI655407B (zh) | 2014-05-15 | 2015-04-08 | Crystal oscillating film thickness meter |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6223275B2 (https=) |
| KR (1) | KR101918805B1 (https=) |
| CN (1) | CN105091804B (https=) |
| TW (1) | TWI655407B (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6448279B2 (ja) * | 2014-09-30 | 2019-01-09 | キヤノントッキ株式会社 | 真空蒸着装置 |
| CN106092002A (zh) * | 2016-06-07 | 2016-11-09 | 应达利电子股份有限公司 | 用于成膜厚度监测的石英晶体谐振器、监测仪及监测方法 |
| JP6564745B2 (ja) * | 2016-09-06 | 2019-08-21 | 株式会社アルバック | 膜厚センサ |
| CN112556612A (zh) * | 2017-06-28 | 2021-03-26 | 株式会社爱发科 | 用于石英晶体振荡式薄膜厚度监视器的传感器头 |
| KR101870581B1 (ko) * | 2017-09-29 | 2018-06-22 | 캐논 톡키 가부시키가이샤 | 수정진동자의 수명 판정방법, 막두께 측정장치, 성막방법, 성막장치, 및 전자 디바이스 제조방법 |
| KR20200014100A (ko) * | 2018-07-31 | 2020-02-10 | 캐논 톡키 가부시키가이샤 | 증발 레이트 측정 장치, 증발 레이트 측정 장치의 제어 방법, 성막 장치, 성막 방법 및 전자 디바이스의 제조방법 |
| JP7253352B2 (ja) | 2018-10-22 | 2023-04-06 | キヤノントッキ株式会社 | 成膜装置、下地膜形成方法、および成膜方法 |
| CN110257791B (zh) * | 2019-04-29 | 2021-07-20 | 昆山国显光电有限公司 | 速率监控装置、蒸镀设备及蒸镀方法 |
| JP7834456B2 (ja) * | 2021-11-12 | 2026-03-24 | キヤノントッキ株式会社 | 成膜量測定装置の制御装置、成膜装置、成膜量測定方法、成膜方法、及び電子デバイスの製造方法 |
| CN115216735B (zh) * | 2022-06-09 | 2023-07-25 | 广西自贸区睿显科技有限公司 | 一种oled生产过程中石英晶振片沉积监测装置及方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050085152A1 (en) * | 2000-11-29 | 2005-04-21 | Idemitsu Kosan Co., Ltd. | Organic electroluminescence element and production method thereof |
| JP2006078302A (ja) * | 2004-09-09 | 2006-03-23 | Ulvac Japan Ltd | 膜厚監視方法および膜厚監視装置 |
| EP1898203A1 (en) * | 2005-06-30 | 2008-03-12 | Ulvac, Inc. | Measuring method and instrument employing crystal oscillator |
| JP2009120924A (ja) * | 2007-11-19 | 2009-06-04 | Ulvac Japan Ltd | 成膜装置、薄膜形成方法 |
| TW201413029A (zh) * | 2012-09-28 | 2014-04-01 | Hitachi High Tech Corp | 水晶振盪式膜厚監視器用感測頭 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04131708A (ja) * | 1990-09-25 | 1992-05-06 | Nippon Sheet Glass Co Ltd | 膜厚モニター |
| JP3483749B2 (ja) * | 1997-11-28 | 2004-01-06 | 株式会社アルバック | 圧電結晶発振式膜厚計 |
| JP2005345143A (ja) * | 2004-05-31 | 2005-12-15 | National Institute Of Advanced Industrial & Technology | 発振式質量膜厚計 |
| JP2007171028A (ja) * | 2005-12-22 | 2007-07-05 | Nippon Seiki Co Ltd | 蒸着膜厚測定方法及びその装置 |
| JP2007305439A (ja) | 2006-05-12 | 2007-11-22 | Canon Inc | 有機電界発光表示装置の製造方法 |
| CN201414116Y (zh) * | 2009-05-11 | 2010-02-24 | 金华市创捷电子有限公司 | 石英晶体谐振器镀银电极 |
| JP5936394B2 (ja) * | 2012-03-14 | 2016-06-22 | 日立造船株式会社 | 蒸着装置 |
| JP2014070969A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | レートセンサ及びリニアソース並びに蒸着装置 |
| CN203112920U (zh) * | 2013-03-26 | 2013-08-07 | 京东方科技集团股份有限公司 | 薄膜厚度传感器和蒸镀设备 |
-
2014
- 2014-05-15 JP JP2014101254A patent/JP6223275B2/ja active Active
-
2015
- 2015-04-08 TW TW104111253A patent/TWI655407B/zh active
- 2015-05-08 KR KR1020150064396A patent/KR101918805B1/ko active Active
- 2015-05-14 CN CN201510244172.8A patent/CN105091804B/zh active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050085152A1 (en) * | 2000-11-29 | 2005-04-21 | Idemitsu Kosan Co., Ltd. | Organic electroluminescence element and production method thereof |
| JP2006078302A (ja) * | 2004-09-09 | 2006-03-23 | Ulvac Japan Ltd | 膜厚監視方法および膜厚監視装置 |
| EP1898203A1 (en) * | 2005-06-30 | 2008-03-12 | Ulvac, Inc. | Measuring method and instrument employing crystal oscillator |
| JP2009120924A (ja) * | 2007-11-19 | 2009-06-04 | Ulvac Japan Ltd | 成膜装置、薄膜形成方法 |
| TW201413029A (zh) * | 2012-09-28 | 2014-04-01 | Hitachi High Tech Corp | 水晶振盪式膜厚監視器用感測頭 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105091804B (zh) | 2019-06-07 |
| KR20150131975A (ko) | 2015-11-25 |
| CN105091804A (zh) | 2015-11-25 |
| TW201608207A (zh) | 2016-03-01 |
| JP2015219053A (ja) | 2015-12-07 |
| JP6223275B2 (ja) | 2017-11-01 |
| KR101918805B1 (ko) | 2018-11-14 |
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