KR101918805B1 - 수정 발진식 막두께 계기 - Google Patents

수정 발진식 막두께 계기 Download PDF

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Publication number
KR101918805B1
KR101918805B1 KR1020150064396A KR20150064396A KR101918805B1 KR 101918805 B1 KR101918805 B1 KR 101918805B1 KR 1020150064396 A KR1020150064396 A KR 1020150064396A KR 20150064396 A KR20150064396 A KR 20150064396A KR 101918805 B1 KR101918805 B1 KR 101918805B1
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South Korea
Prior art keywords
film
organic material
deposition
film thickness
quartz
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Korean (ko)
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KR20150131975A (ko
Inventor
미유키 다지마
히로유키 다무라
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캐논 톡키 가부시키가이샤
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    • H01L22/12—
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
    • G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
    • G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
    • G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/02—Analysing fluids
    • G01N29/022—Fluid sensors based on microsensors, e.g. quartz crystal-microbalance [QCM], surface acoustic wave [SAW] devices, tuning forks, cantilevers, flexural plate wave [FPW] devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N5/00—Analysing materials by weighing, e.g. weighing small particles separated from a gas or liquid
    • H01L21/203—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Acoustics & Sound (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020150064396A 2014-05-15 2015-05-08 수정 발진식 막두께 계기 Active KR101918805B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014101254A JP6223275B2 (ja) 2014-05-15 2014-05-15 水晶発振式膜厚計
JPJP-P-2014-101254 2014-05-15

Publications (2)

Publication Number Publication Date
KR20150131975A KR20150131975A (ko) 2015-11-25
KR101918805B1 true KR101918805B1 (ko) 2018-11-14

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KR1020150064396A Active KR101918805B1 (ko) 2014-05-15 2015-05-08 수정 발진식 막두께 계기

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JP (1) JP6223275B2 (https=)
KR (1) KR101918805B1 (https=)
CN (1) CN105091804B (https=)
TW (1) TWI655407B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6448279B2 (ja) * 2014-09-30 2019-01-09 キヤノントッキ株式会社 真空蒸着装置
CN106092002A (zh) * 2016-06-07 2016-11-09 应达利电子股份有限公司 用于成膜厚度监测的石英晶体谐振器、监测仪及监测方法
JP6564745B2 (ja) * 2016-09-06 2019-08-21 株式会社アルバック 膜厚センサ
CN112556612A (zh) * 2017-06-28 2021-03-26 株式会社爱发科 用于石英晶体振荡式薄膜厚度监视器的传感器头
KR101870581B1 (ko) * 2017-09-29 2018-06-22 캐논 톡키 가부시키가이샤 수정진동자의 수명 판정방법, 막두께 측정장치, 성막방법, 성막장치, 및 전자 디바이스 제조방법
KR20200014100A (ko) * 2018-07-31 2020-02-10 캐논 톡키 가부시키가이샤 증발 레이트 측정 장치, 증발 레이트 측정 장치의 제어 방법, 성막 장치, 성막 방법 및 전자 디바이스의 제조방법
JP7253352B2 (ja) 2018-10-22 2023-04-06 キヤノントッキ株式会社 成膜装置、下地膜形成方法、および成膜方法
CN110257791B (zh) * 2019-04-29 2021-07-20 昆山国显光电有限公司 速率监控装置、蒸镀设备及蒸镀方法
JP7834456B2 (ja) * 2021-11-12 2026-03-24 キヤノントッキ株式会社 成膜量測定装置の制御装置、成膜装置、成膜量測定方法、成膜方法、及び電子デバイスの製造方法
CN115216735B (zh) * 2022-06-09 2023-07-25 广西自贸区睿显科技有限公司 一种oled生产过程中石英晶振片沉积监测装置及方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007305439A (ja) 2006-05-12 2007-11-22 Canon Inc 有機電界発光表示装置の製造方法

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
JPH04131708A (ja) * 1990-09-25 1992-05-06 Nippon Sheet Glass Co Ltd 膜厚モニター
JP3483749B2 (ja) * 1997-11-28 2004-01-06 株式会社アルバック 圧電結晶発振式膜厚計
US6828045B1 (en) * 2003-06-13 2004-12-07 Idemitsu Kosan Co., Ltd. Organic electroluminescence element and production method thereof
JP2005345143A (ja) * 2004-05-31 2005-12-15 National Institute Of Advanced Industrial & Technology 発振式質量膜厚計
JP4388443B2 (ja) * 2004-09-09 2009-12-24 株式会社アルバック 膜厚監視方法および膜厚監視装置
JP4669749B2 (ja) * 2005-06-30 2011-04-13 株式会社アルバック 水晶振動子を用いた測定方法及び測定装置
JP2007171028A (ja) * 2005-12-22 2007-07-05 Nippon Seiki Co Ltd 蒸着膜厚測定方法及びその装置
JP4974858B2 (ja) * 2007-11-19 2012-07-11 株式会社アルバック 成膜装置、薄膜形成方法
CN201414116Y (zh) * 2009-05-11 2010-02-24 金华市创捷电子有限公司 石英晶体谐振器镀银电极
JP5936394B2 (ja) * 2012-03-14 2016-06-22 日立造船株式会社 蒸着装置
JP2014070969A (ja) * 2012-09-28 2014-04-21 Hitachi High-Technologies Corp レートセンサ及びリニアソース並びに蒸着装置
JP2014070243A (ja) * 2012-09-28 2014-04-21 Hitachi High-Technologies Corp 水晶発振式膜厚モニタ用センサヘッド
CN203112920U (zh) * 2013-03-26 2013-08-07 京东方科技集团股份有限公司 薄膜厚度传感器和蒸镀设备

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007305439A (ja) 2006-05-12 2007-11-22 Canon Inc 有機電界発光表示装置の製造方法

Also Published As

Publication number Publication date
CN105091804B (zh) 2019-06-07
KR20150131975A (ko) 2015-11-25
CN105091804A (zh) 2015-11-25
TW201608207A (zh) 2016-03-01
JP2015219053A (ja) 2015-12-07
TWI655407B (zh) 2019-04-01
JP6223275B2 (ja) 2017-11-01

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