JP2015219053A - 水晶発振式膜厚計 - Google Patents
水晶発振式膜厚計 Download PDFInfo
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- JP2015219053A JP2015219053A JP2014101254A JP2014101254A JP2015219053A JP 2015219053 A JP2015219053 A JP 2015219053A JP 2014101254 A JP2014101254 A JP 2014101254A JP 2014101254 A JP2014101254 A JP 2014101254A JP 2015219053 A JP2015219053 A JP 2015219053A
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- vapor deposition
- film
- organic material
- film thickness
- crystal
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- 230000010355 oscillation Effects 0.000 title claims abstract description 38
- 239000010453 quartz Substances 0.000 title claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 11
- 239000010408 film Substances 0.000 claims abstract description 208
- 239000013078 crystal Substances 0.000 claims abstract description 108
- 238000007740 vapor deposition Methods 0.000 claims abstract description 90
- 239000011368 organic material Substances 0.000 claims abstract description 87
- 239000000463 material Substances 0.000 claims abstract description 62
- 238000000151 deposition Methods 0.000 claims abstract description 20
- 238000001704 evaporation Methods 0.000 claims abstract description 17
- 230000008020 evaporation Effects 0.000 claims abstract description 17
- 239000010409 thin film Substances 0.000 claims abstract description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims abstract description 6
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 3
- 238000000034 method Methods 0.000 description 6
- 238000005336 cracking Methods 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- 238000005019 vapor deposition process Methods 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Engineering & Computer Science (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Acoustics & Sound (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Abstract
Description
M 水晶発振式膜厚計
1 真空槽
2 蒸発源
3 基板
4 水晶振動子
5 電極膜
6 有機材料下地膜
Claims (5)
- 真空槽内で蒸発源から蒸発させた蒸着材料を基板表面に堆積させて薄膜を形成する真空蒸着装置における膜厚制御用の水晶発振式膜厚計において、前記蒸着材料とは異なる少なくとも一つ以上の炭素原子を含む有機物から構成される有機材料を、水晶振動子の蒸着面側の電極膜上に予め蒸着により被覆して有機材料下地膜を形成し、この有機材料下地膜上に前記蒸着材料を蒸着させてこの蒸着材料の膜厚若しくは蒸着速度を計測するように構成したことを特徴とする水晶発振式膜厚計。
- 前記有機材料下地膜を形成する前記有機材料は、前記基板表面への蒸着工程で用いる前記蒸着材料よりも蒸着膜密度が大きいことを特徴とする請求項1記載の水晶発振式膜厚計。
- 前記水晶振動子の表面と裏面に形成される前記電極膜は、A1を含む複数の金属から形成されることを特徴とする請求項1,2のいずれか1項に記載の水晶発振式膜厚計。
- 前記水晶振動子は、表面若しくは裏面が凸状となる曲面で中央部より端部が薄い形状に設定したことを特徴とする請求項1〜3のいずれか1項に記載の水晶発振式膜厚計。
- 前記基板表面への蒸着工程で用いる前記蒸着材料は、有機ELデバイスを製造するための有機材料であることを特徴とする請求項1〜4のいずれか1項に記載の水晶発振式膜厚計。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014101254A JP6223275B2 (ja) | 2014-05-15 | 2014-05-15 | 水晶発振式膜厚計 |
TW104111253A TWI655407B (zh) | 2014-05-15 | 2015-04-08 | Crystal oscillating film thickness meter |
KR1020150064396A KR101918805B1 (ko) | 2014-05-15 | 2015-05-08 | 수정 발진식 막두께 계기 |
CN201510244172.8A CN105091804B (zh) | 2014-05-15 | 2015-05-14 | 石英振荡式膜厚计 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014101254A JP6223275B2 (ja) | 2014-05-15 | 2014-05-15 | 水晶発振式膜厚計 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015219053A true JP2015219053A (ja) | 2015-12-07 |
JP2015219053A5 JP2015219053A5 (ja) | 2017-06-22 |
JP6223275B2 JP6223275B2 (ja) | 2017-11-01 |
Family
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JP2014101254A Active JP6223275B2 (ja) | 2014-05-15 | 2014-05-15 | 水晶発振式膜厚計 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6223275B2 (ja) |
KR (1) | KR101918805B1 (ja) |
CN (1) | CN105091804B (ja) |
TW (1) | TWI655407B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016069694A (ja) * | 2014-09-30 | 2016-05-09 | キヤノントッキ株式会社 | 真空蒸着装置 |
CN109596959A (zh) * | 2017-09-29 | 2019-04-09 | 佳能特机株式会社 | 晶体振荡器的寿命判定方法、膜厚测定装置、成膜方法、成膜装置以及电子器件制造方法 |
KR20200045392A (ko) | 2018-10-22 | 2020-05-04 | 캐논 톡키 가부시키가이샤 | 하지막 형성 장치, 성막 장치, 하지막 형성 방법 및 성막 방법 |
CN115216735A (zh) * | 2022-06-09 | 2022-10-21 | 广西自贸区睿显科技有限公司 | 一种oled生产过程中石英晶振片沉积监测装置及方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106092002A (zh) * | 2016-06-07 | 2016-11-09 | 应达利电子股份有限公司 | 用于成膜厚度监测的石英晶体谐振器、监测仪及监测方法 |
JP6564745B2 (ja) * | 2016-09-06 | 2019-08-21 | 株式会社アルバック | 膜厚センサ |
CN110192081B (zh) * | 2017-06-28 | 2021-01-08 | 株式会社爱发科 | 用于石英晶体振荡式薄膜厚度监视器的传感器头 |
KR20200014100A (ko) * | 2018-07-31 | 2020-02-10 | 캐논 톡키 가부시키가이샤 | 증발 레이트 측정 장치, 증발 레이트 측정 장치의 제어 방법, 성막 장치, 성막 방법 및 전자 디바이스의 제조방법 |
CN110257791B (zh) * | 2019-04-29 | 2021-07-20 | 昆山国显光电有限公司 | 速率监控装置、蒸镀设备及蒸镀方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04131708A (ja) * | 1990-09-25 | 1992-05-06 | Nippon Sheet Glass Co Ltd | 膜厚モニター |
JPH11160057A (ja) * | 1997-11-28 | 1999-06-18 | Ulvac Corp | 圧電結晶発振式膜厚計 |
JP2005345143A (ja) * | 2004-05-31 | 2005-12-15 | National Institute Of Advanced Industrial & Technology | 発振式質量膜厚計 |
JP2014070969A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | レートセンサ及びリニアソース並びに蒸着装置 |
Family Cites Families (10)
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US6828045B1 (en) * | 2003-06-13 | 2004-12-07 | Idemitsu Kosan Co., Ltd. | Organic electroluminescence element and production method thereof |
JP4388443B2 (ja) * | 2004-09-09 | 2009-12-24 | 株式会社アルバック | 膜厚監視方法および膜厚監視装置 |
JP4669749B2 (ja) * | 2005-06-30 | 2011-04-13 | 株式会社アルバック | 水晶振動子を用いた測定方法及び測定装置 |
JP2007171028A (ja) * | 2005-12-22 | 2007-07-05 | Nippon Seiki Co Ltd | 蒸着膜厚測定方法及びその装置 |
JP2007305439A (ja) | 2006-05-12 | 2007-11-22 | Canon Inc | 有機電界発光表示装置の製造方法 |
JP4974858B2 (ja) * | 2007-11-19 | 2012-07-11 | 株式会社アルバック | 成膜装置、薄膜形成方法 |
CN201414116Y (zh) * | 2009-05-11 | 2010-02-24 | 金华市创捷电子有限公司 | 石英晶体谐振器镀银电极 |
JP5936394B2 (ja) * | 2012-03-14 | 2016-06-22 | 日立造船株式会社 | 蒸着装置 |
JP2014070243A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | 水晶発振式膜厚モニタ用センサヘッド |
CN203112920U (zh) * | 2013-03-26 | 2013-08-07 | 京东方科技集团股份有限公司 | 薄膜厚度传感器和蒸镀设备 |
-
2014
- 2014-05-15 JP JP2014101254A patent/JP6223275B2/ja active Active
-
2015
- 2015-04-08 TW TW104111253A patent/TWI655407B/zh active
- 2015-05-08 KR KR1020150064396A patent/KR101918805B1/ko active IP Right Grant
- 2015-05-14 CN CN201510244172.8A patent/CN105091804B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04131708A (ja) * | 1990-09-25 | 1992-05-06 | Nippon Sheet Glass Co Ltd | 膜厚モニター |
JPH11160057A (ja) * | 1997-11-28 | 1999-06-18 | Ulvac Corp | 圧電結晶発振式膜厚計 |
JP2005345143A (ja) * | 2004-05-31 | 2005-12-15 | National Institute Of Advanced Industrial & Technology | 発振式質量膜厚計 |
JP2014070969A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | レートセンサ及びリニアソース並びに蒸着装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016069694A (ja) * | 2014-09-30 | 2016-05-09 | キヤノントッキ株式会社 | 真空蒸着装置 |
CN109596959A (zh) * | 2017-09-29 | 2019-04-09 | 佳能特机株式会社 | 晶体振荡器的寿命判定方法、膜厚测定装置、成膜方法、成膜装置以及电子器件制造方法 |
JP2019065391A (ja) * | 2017-09-29 | 2019-04-25 | キヤノントッキ株式会社 | 水晶振動子の寿命判定方法、膜厚測定装置、成膜方法、成膜装置、及び電子デバイス製造方法 |
CN109596959B (zh) * | 2017-09-29 | 2021-03-30 | 佳能特机株式会社 | 晶体振荡器的寿命判定方法、膜厚测定装置、成膜方法、成膜装置以及电子器件制造方法 |
KR20200045392A (ko) | 2018-10-22 | 2020-05-04 | 캐논 톡키 가부시키가이샤 | 하지막 형성 장치, 성막 장치, 하지막 형성 방법 및 성막 방법 |
CN115216735A (zh) * | 2022-06-09 | 2022-10-21 | 广西自贸区睿显科技有限公司 | 一种oled生产过程中石英晶振片沉积监测装置及方法 |
CN115216735B (zh) * | 2022-06-09 | 2023-07-25 | 广西自贸区睿显科技有限公司 | 一种oled生产过程中石英晶振片沉积监测装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
CN105091804B (zh) | 2019-06-07 |
KR101918805B1 (ko) | 2018-11-14 |
JP6223275B2 (ja) | 2017-11-01 |
CN105091804A (zh) | 2015-11-25 |
TW201608207A (zh) | 2016-03-01 |
KR20150131975A (ko) | 2015-11-25 |
TWI655407B (zh) | 2019-04-01 |
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