CN104144954B - 聚氯丁二烯胶乳、聚氯丁二烯胶乳组合物以及成型品 - Google Patents

聚氯丁二烯胶乳、聚氯丁二烯胶乳组合物以及成型品 Download PDF

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Publication number
CN104144954B
CN104144954B CN201380012252.XA CN201380012252A CN104144954B CN 104144954 B CN104144954 B CN 104144954B CN 201380012252 A CN201380012252 A CN 201380012252A CN 104144954 B CN104144954 B CN 104144954B
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polychloroprene latex
mass
parts
latex
polychloroprene
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Chinese (zh)
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CN104144954A (zh
Inventor
大塚秀仁
砂田洁
望月健二
白岩亨
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Denka Co Ltd
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Denka Co Ltd
Denki Kagaku Kogyo KK
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C08F236/18—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L11/00—Compositions of homopolymers or copolymers of chloroprene
    • C08L11/02—Latex
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C1/00—Treatment of rubber latex
    • C08C1/14—Coagulation
    • C08C1/15—Coagulation characterised by the coagulants used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F136/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F136/02—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F136/04—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F136/14—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F136/16—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C08F136/18—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F36/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F36/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F36/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F36/14—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F36/16—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • C08F36/18—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Moulding By Coating Moulds (AREA)
CN201380012252.XA 2012-03-02 2013-03-01 聚氯丁二烯胶乳、聚氯丁二烯胶乳组合物以及成型品 Active CN104144954B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012046073 2012-03-02
JP2012-046073 2012-03-02
PCT/JP2013/055755 WO2013129676A1 (ja) 2012-03-02 2013-03-01 ポリクロロプレンラテックス、ポリクロロプレンラテックス組成物及び成形品

Publications (2)

Publication Number Publication Date
CN104144954A CN104144954A (zh) 2014-11-12
CN104144954B true CN104144954B (zh) 2017-07-25

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Country Status (9)

Country Link
US (1) US9296849B2 (enExample)
EP (1) EP2824121B1 (enExample)
JP (1) JP6130352B2 (enExample)
CN (1) CN104144954B (enExample)
IN (1) IN2014DN08119A (enExample)
MX (1) MX2014010525A (enExample)
MY (1) MY166865A (enExample)
PL (1) PL2824121T3 (enExample)
WO (1) WO2013129676A1 (enExample)

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US10377893B2 (en) * 2013-07-16 2019-08-13 Skinprotect Corporation Sdn Bhd Elastomeric film-forming compositions and articles made from the elastomeric film
JP5923129B2 (ja) * 2014-03-26 2016-05-24 デンカ株式会社 ポリクロロプレンラテックス、ポリクロロプレンラテックス組成物及び浸漬成形体
KR101911303B1 (ko) * 2015-04-16 2018-10-24 쇼와 덴코 가부시키가이샤 고무용 조성물 및 그 용도
CN107383511A (zh) * 2017-08-24 2017-11-24 安徽松泰包装材料有限公司 一种耐腐蚀性覆盖膜材料
JP7367702B2 (ja) * 2018-12-27 2023-10-24 株式会社レゾナック クロロプレン重合体ラテックス及びその製造方法
CN113260666B (zh) * 2019-01-10 2023-06-20 株式会社力森诺科 异戊二烯系聚合物胶乳组合物
US12331137B2 (en) * 2019-05-31 2025-06-17 Resonac Corporation Method for producing purified chloroprene-based-polymer latex
EP4050046B1 (en) * 2019-10-25 2026-03-18 Resonac Corporation Chloroprene copolymer latex and production method therefor
US12662588B2 (en) 2020-01-06 2026-06-23 Resonac Corporation Composition including chloroprene polymer, molded body, and method for producing molded body
EP4130080B1 (en) 2020-03-26 2025-07-30 Denka Company Limited Chloroprene-based block copolymer, latex, latex composition, and rubber composition
EP4130079B1 (en) * 2020-03-26 2025-01-22 Denka Company Limited Chloroprene-based block copolymer latex
WO2023127858A1 (ja) * 2021-12-27 2023-07-06 株式会社レゾナック 硫黄変性ポリクロロプレンラテックス組成物およびその製造方法並びにゴム成形物および浸漬製品

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007106994A (ja) * 2005-09-15 2007-04-26 Showa Denko Kk クロロプレン系重合体ラテックス及びその製造方法
JP2010106073A (ja) * 2008-10-28 2010-05-13 Tosoh Corp クロロプレンラテックス及びその製造方法
JP2010126586A (ja) * 2008-11-26 2010-06-10 Tosoh Corp 加硫ゴム製造用クロロプレン重合体ラテックス及びその製造方法
WO2011004805A1 (ja) * 2009-07-06 2011-01-13 電気化学工業株式会社 ポリクロロプレンラテックス組成物及びその製造方法並びに成形体
JP2011122141A (ja) * 2009-11-10 2011-06-23 Showa Denko Kk クロロプレン系重合体ラテックス及びその製造方法

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JP3979749B2 (ja) 1999-08-10 2007-09-19 電気化学工業株式会社 クロロプレンラテックス組成物およびその製造方法
AU2003289466A1 (en) * 2002-12-19 2004-07-14 Denki Kagaku Kogyo Kabushiki Kaisha Polychloroprene latex, process for the production thereof and aqueous adhesive compositions
JP2005008859A (ja) 2003-05-22 2005-01-13 Denki Kagaku Kogyo Kk ポリクロロプレン系ラテックス組成物、接着剤、塗布剤、及びその製造方法
JP5521205B2 (ja) 2008-03-10 2014-06-11 東ソー株式会社 クロロプレンラテックス及びその製造方法
JP5262199B2 (ja) 2008-03-10 2013-08-14 東ソー株式会社 クロロプレンラテックス及びその製造法
JP5428215B2 (ja) * 2008-06-20 2014-02-26 東ソー株式会社 クロロプレンラテックス及びその製造方法
JP5663827B2 (ja) * 2008-10-28 2015-02-04 東ソー株式会社 クロロプレンラテックス及びその製造法
JP2010150420A (ja) * 2008-12-25 2010-07-08 Tosoh Corp ポリクロロプレン系ラテックス及びその製造法
CN103003314B (zh) * 2010-08-06 2016-06-01 电化株式会社 氯丁胶乳、橡胶沥青组合物及其施工方法、薄片以及防水涂膜
WO2012121113A1 (ja) 2011-03-04 2012-09-13 シャープ株式会社 電子回路基板、表示装置および配線基板
JP5867748B2 (ja) * 2011-03-10 2016-02-24 デンカ株式会社 ポリクロロプレンラテックスの化学的安定性の評価方法
JP5369135B2 (ja) 2011-04-11 2013-12-18 電気化学工業株式会社 ポリクロロプレンラテックス及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007106994A (ja) * 2005-09-15 2007-04-26 Showa Denko Kk クロロプレン系重合体ラテックス及びその製造方法
JP2010106073A (ja) * 2008-10-28 2010-05-13 Tosoh Corp クロロプレンラテックス及びその製造方法
JP2010126586A (ja) * 2008-11-26 2010-06-10 Tosoh Corp 加硫ゴム製造用クロロプレン重合体ラテックス及びその製造方法
WO2011004805A1 (ja) * 2009-07-06 2011-01-13 電気化学工業株式会社 ポリクロロプレンラテックス組成物及びその製造方法並びに成形体
JP2011122141A (ja) * 2009-11-10 2011-06-23 Showa Denko Kk クロロプレン系重合体ラテックス及びその製造方法

Also Published As

Publication number Publication date
JP6130352B2 (ja) 2017-05-17
IN2014DN08119A (enExample) 2015-05-01
MY166865A (en) 2018-07-24
EP2824121A1 (en) 2015-01-14
CN104144954A (zh) 2014-11-12
EP2824121A4 (en) 2015-10-07
WO2013129676A1 (ja) 2013-09-06
MX2014010525A (es) 2014-11-25
US9296849B2 (en) 2016-03-29
US20150152209A1 (en) 2015-06-04
JPWO2013129676A1 (ja) 2015-07-30
EP2824121B1 (en) 2018-06-20
PL2824121T3 (pl) 2018-11-30

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