IN2014DN08119A - - Google Patents
Info
- Publication number
- IN2014DN08119A IN2014DN08119A IN8119DEN2014A IN2014DN08119A IN 2014DN08119 A IN2014DN08119 A IN 2014DN08119A IN 8119DEN2014 A IN8119DEN2014 A IN 8119DEN2014A IN 2014DN08119 A IN2014DN08119 A IN 2014DN08119A
- Authority
- IN
- India
- Prior art keywords
- mass
- latex
- butadiene
- precipitate
- chloro
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
- C08F236/18—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L11/00—Compositions of homopolymers or copolymers of chloroprene
- C08L11/02—Latex
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
- C08C1/00—Treatment of rubber latex
- C08C1/14—Coagulation
- C08C1/15—Coagulation characterised by the coagulants used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F136/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F136/02—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F136/04—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F136/14—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F136/16—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
- C08F136/18—Homopolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F36/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F36/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F36/04—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F36/14—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F36/16—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
- C08F36/18—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen containing chlorine
Abstract
Provided are: a polychloroprene latex in which rubber aggregability is improved and with which it is possible to obtain a film having excellent strength by dip-molding; a polychloroprene latex composition; and a molded article. This polychloroprene latex obtained by polymerizing 2-chloro- 1,3-butadiene alone or by polymerizing raw-material monomers including at least 2- chloro -1,3 -butadiene and 2,3-dichloro -1,3 -butadiene has a precipitation rate calculated according to mathematical formula (I) of 5- 40%. In mathematical formula (I): A is the mass (g) of a dried product of a precipitate obtained by adding, dropwise over a period of two minutes, 50 ml of a saturated aqueous solution at 23°C of calcium hydroxide to 50 g of a latex adjusted so as to have a solids concentration of 45-65 mass% and a liquid temperature of 23°C, filtering and collecting the produced precipitate with a 80-mesh metal screen, and drying the precipitate at 1 10°C for 3 hours; B is the mass (50 g) of the latex before the dropwise addition; and C is the solids concentration (mass%) of the latex before the dropwise addition.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012046073 | 2012-03-02 | ||
PCT/JP2013/055755 WO2013129676A1 (en) | 2012-03-02 | 2013-03-01 | Polychloroprene latex, polychloroprene latex composition, and molded article |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2014DN08119A true IN2014DN08119A (en) | 2015-05-01 |
Family
ID=49082862
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN8119DEN2014 IN2014DN08119A (en) | 2012-03-02 | 2013-03-01 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9296849B2 (en) |
EP (1) | EP2824121B1 (en) |
JP (1) | JP6130352B2 (en) |
CN (1) | CN104144954B (en) |
IN (1) | IN2014DN08119A (en) |
MX (1) | MX2014010525A (en) |
MY (1) | MY166865A (en) |
PL (1) | PL2824121T3 (en) |
WO (1) | WO2013129676A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10377893B2 (en) * | 2013-07-16 | 2019-08-13 | Skinprotect Corporation Sdn Bhd | Elastomeric film-forming compositions and articles made from the elastomeric film |
JP5923129B2 (en) * | 2014-03-26 | 2016-05-24 | デンカ株式会社 | Polychloroprene latex, polychloroprene latex composition and immersion molded article |
EP3284781B1 (en) * | 2015-04-16 | 2020-10-28 | Showa Denko K.K. | Composition for rubber and use thereof |
CN107383511A (en) * | 2017-08-24 | 2017-11-24 | 安徽松泰包装材料有限公司 | A kind of corrosion resistance covers membrane material |
WO2020137297A1 (en) * | 2018-12-27 | 2020-07-02 | 昭和電工株式会社 | Chloroprene polymer latex and method for producing same |
WO2020144955A1 (en) * | 2019-01-10 | 2020-07-16 | 昭和電工株式会社 | Isoprene polymer latex composition |
US20220235151A1 (en) * | 2019-05-31 | 2022-07-28 | Showa Denko K.K. | Method for producing purified chloroprene-based-polymer latex |
JPWO2021079981A1 (en) * | 2019-10-25 | 2021-04-29 | ||
EP4089144A4 (en) * | 2020-01-06 | 2024-01-17 | Resonac Corp | Composition containing chloroprene polymer, molded body and method for producing molded body |
EP4130079A4 (en) * | 2020-03-26 | 2024-02-07 | Denka Company Ltd | Chloroprene-based block copolymer latex |
WO2023127858A1 (en) * | 2021-12-27 | 2023-07-06 | 株式会社レゾナック | Sulfur-modified-polychloroprene latex composition, production method therefor, shaped rubber object, and dip-formed product |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3979749B2 (en) * | 1999-08-10 | 2007-09-19 | 電気化学工業株式会社 | Chloroprene latex composition and method for producing the same |
AU2003289466A1 (en) * | 2002-12-19 | 2004-07-14 | Denki Kagaku Kogyo Kabushiki Kaisha | Polychloroprene latex, process for the production thereof and aqueous adhesive compositions |
JP2005008859A (en) | 2003-05-22 | 2005-01-13 | Denki Kagaku Kogyo Kk | Polychloroprene latex composition, adhesive, coating material and production method for the same composition |
JP2007106994A (en) * | 2005-09-15 | 2007-04-26 | Showa Denko Kk | Chloroprene-based polymer latex and method for producing the same |
JP5262199B2 (en) | 2008-03-10 | 2013-08-14 | 東ソー株式会社 | Chloroprene latex and process for producing the same |
JP5521205B2 (en) | 2008-03-10 | 2014-06-11 | 東ソー株式会社 | Chloroprene latex and method for producing the same |
JP5428215B2 (en) * | 2008-06-20 | 2014-02-26 | 東ソー株式会社 | Chloroprene latex and method for producing the same |
JP2010106073A (en) * | 2008-10-28 | 2010-05-13 | Tosoh Corp | Chloroprene latex and method of manufacturing the same |
JP5663827B2 (en) * | 2008-10-28 | 2015-02-04 | 東ソー株式会社 | Chloroprene latex and process for producing the same |
JP5428305B2 (en) * | 2008-11-26 | 2014-02-26 | 東ソー株式会社 | Method for producing chloroprene polymer latex for vulcanized rubber production |
JP2010150420A (en) * | 2008-12-25 | 2010-07-08 | Tosoh Corp | Polychloroprene-based latex, and method for producing the same |
CN102471543A (en) | 2009-07-06 | 2012-05-23 | 电气化学工业株式会社 | Polychloroprene latex composition, process for production of same, and products of forming thereof |
JP2011122141A (en) | 2009-11-10 | 2011-06-23 | Showa Denko Kk | Chloroprene polymer latex and method of manufacturing the same |
CN103003314B (en) * | 2010-08-06 | 2016-06-01 | 电化株式会社 | Polychloroprene latex, rubber-containing bituminous composition and construction method, thin slice and waterproof coating |
WO2012121113A1 (en) | 2011-03-04 | 2012-09-13 | シャープ株式会社 | Electronic circuit substrate, display device, and wiring substrate |
DE112012001176T5 (en) * | 2011-03-10 | 2013-12-05 | Denki Kagaku Kogyo Kabushiki Kaisha | Method for evaluating the chemical stability of polychloroprene latex |
JP5369135B2 (en) | 2011-04-11 | 2013-12-18 | 電気化学工業株式会社 | Polychloroprene latex and method for producing the same |
-
2013
- 2013-03-01 IN IN8119DEN2014 patent/IN2014DN08119A/en unknown
- 2013-03-01 WO PCT/JP2013/055755 patent/WO2013129676A1/en active Application Filing
- 2013-03-01 EP EP13755519.9A patent/EP2824121B1/en active Active
- 2013-03-01 US US14/382,478 patent/US9296849B2/en active Active
- 2013-03-01 PL PL13755519T patent/PL2824121T3/en unknown
- 2013-03-01 MY MYPI2014002543A patent/MY166865A/en unknown
- 2013-03-01 MX MX2014010525A patent/MX2014010525A/en unknown
- 2013-03-01 CN CN201380012252.XA patent/CN104144954B/en active Active
- 2013-03-01 JP JP2014502425A patent/JP6130352B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2824121B1 (en) | 2018-06-20 |
EP2824121A1 (en) | 2015-01-14 |
EP2824121A4 (en) | 2015-10-07 |
WO2013129676A1 (en) | 2013-09-06 |
JP6130352B2 (en) | 2017-05-17 |
US20150152209A1 (en) | 2015-06-04 |
MX2014010525A (en) | 2014-11-25 |
US9296849B2 (en) | 2016-03-29 |
CN104144954A (en) | 2014-11-12 |
JPWO2013129676A1 (en) | 2015-07-30 |
CN104144954B (en) | 2017-07-25 |
PL2824121T3 (en) | 2018-11-30 |
MY166865A (en) | 2018-07-24 |
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