CN104081281A - 感光性树脂组合物和使用了该组合物的感光性元件、间隔物的形成方法以及间隔物 - Google Patents
感光性树脂组合物和使用了该组合物的感光性元件、间隔物的形成方法以及间隔物 Download PDFInfo
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- CN104081281A CN104081281A CN201380007111.9A CN201380007111A CN104081281A CN 104081281 A CN104081281 A CN 104081281A CN 201380007111 A CN201380007111 A CN 201380007111A CN 104081281 A CN104081281 A CN 104081281A
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- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002916 oxazoles Chemical class 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- OSFBJERFMQCEQY-UHFFFAOYSA-N propylidene Chemical group [CH]CC OSFBJERFMQCEQY-UHFFFAOYSA-N 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 235000013599 spices Nutrition 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
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- JNELGWHKGNBSMD-UHFFFAOYSA-N xanthone powder Natural products C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 JNELGWHKGNBSMD-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2012-020777 | 2012-02-02 | ||
JP2012020777 | 2012-02-02 | ||
PCT/JP2013/052069 WO2013115262A1 (fr) | 2012-02-02 | 2013-01-30 | Composition de résine photosensible, élément photosensible utilisant celle-ci, procédé de formation d'entretoise, et entretoise |
Publications (1)
Publication Number | Publication Date |
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CN104081281A true CN104081281A (zh) | 2014-10-01 |
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CN201380007111.9A Pending CN104081281A (zh) | 2012-02-02 | 2013-01-30 | 感光性树脂组合物和使用了该组合物的感光性元件、间隔物的形成方法以及间隔物 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5924350B2 (fr) |
CN (1) | CN104081281A (fr) |
TW (1) | TWI545400B (fr) |
WO (1) | WO2013115262A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106796375A (zh) * | 2014-11-10 | 2017-05-31 | 大日本印刷株式会社 | 柱状形成物用树脂组合物、附有柱状形成物的基板的制造方法和附有柱状形成物的基板 |
CN111133344A (zh) * | 2017-09-26 | 2020-05-08 | 大阪有机化学工业株式会社 | 光间隔体形成用感光性树脂组合物、光间隔体的形成方法、带光间隔体的基板、及滤色器 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015152676A (ja) * | 2014-02-12 | 2015-08-24 | 日立化成株式会社 | 視野角拡大パターン形成材料と、その視野角拡大パターンの形成方法及びそれに用いる感光性エレメント |
CN107077068B (zh) * | 2014-11-17 | 2021-03-12 | 昭和电工材料株式会社 | 感光性树脂组合物、感光性元件、抗蚀图案的形成方法和印刷配线板的制造方法 |
WO2016084855A1 (fr) * | 2014-11-26 | 2016-06-02 | 日立化成株式会社 | Composition de résine photosensible, élément photosensible, article durci, dispositif à semi-conducteurs, procédé de formation de motif de réserve, et procédé de fabrication de matériau de base de circuit |
CN106687864B (zh) | 2014-11-26 | 2020-07-03 | 日立化成株式会社 | 感光性树脂组合物、感光性元件、固化物、半导体装置、抗蚀图案的形成方法及电路基材的制造方法 |
JP6976069B2 (ja) * | 2017-03-29 | 2021-12-01 | 株式会社日本触媒 | 硬化性樹脂組成物及びその用途 |
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JPH08146213A (ja) * | 1994-11-18 | 1996-06-07 | Nippon Kayaku Co Ltd | 昇華性染料染色用基板及びその染色法 |
CN1945428A (zh) * | 2005-10-05 | 2007-04-11 | 旭化成电子材料元件株式会社 | 感光性树脂组合物及其层压体 |
CN101116034A (zh) * | 2005-01-17 | 2008-01-30 | 东亚合成株式会社 | 活性能量射线固化型组合物 |
CN101121825A (zh) * | 2006-08-11 | 2008-02-13 | 住友化学株式会社 | 可聚合树脂组合物 |
JP2010107755A (ja) * | 2008-10-30 | 2010-05-13 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
CN103460131A (zh) * | 2011-03-30 | 2013-12-18 | 日立化成株式会社 | 感光性树脂组合物、使用了其的感光性元件、图像显示装置的隔壁的形成方法及图像显示装置的制造方法 |
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JP4144342B2 (ja) * | 2002-12-11 | 2008-09-03 | 日立化成工業株式会社 | 感光性樹脂組成物、感光性エレメント及び積層基材 |
JP2004198853A (ja) * | 2002-12-19 | 2004-07-15 | Chisso Corp | 光硬化性樹脂組成物 |
TW200745749A (en) * | 2006-02-21 | 2007-12-16 | Hitachi Chemical Co Ltd | Photosensitive resin composition, method for forming resist pattern, method for manufacturing printed wiring board, and method for producing substrate for plasma display panel |
JP4816917B2 (ja) * | 2006-03-17 | 2011-11-16 | Jsr株式会社 | 感放射線性樹脂組成物、液晶表示パネル用スペーサー、液晶表示パネル用スペーサーの形成方法、および液晶表示パネル |
JP5023878B2 (ja) * | 2006-08-11 | 2012-09-12 | 住友化学株式会社 | 重合性樹脂組成物 |
JP5051365B2 (ja) * | 2006-08-24 | 2012-10-17 | Jsr株式会社 | 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル |
JP4992534B2 (ja) * | 2007-04-27 | 2012-08-08 | 三菱化学株式会社 | 光重合性組成物 |
-
2013
- 2013-01-30 WO PCT/JP2013/052069 patent/WO2013115262A1/fr active Application Filing
- 2013-01-30 JP JP2013556469A patent/JP5924350B2/ja not_active Expired - Fee Related
- 2013-01-30 CN CN201380007111.9A patent/CN104081281A/zh active Pending
- 2013-01-31 TW TW102103784A patent/TWI545400B/zh not_active IP Right Cessation
Patent Citations (6)
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JPH08146213A (ja) * | 1994-11-18 | 1996-06-07 | Nippon Kayaku Co Ltd | 昇華性染料染色用基板及びその染色法 |
CN101116034A (zh) * | 2005-01-17 | 2008-01-30 | 东亚合成株式会社 | 活性能量射线固化型组合物 |
CN1945428A (zh) * | 2005-10-05 | 2007-04-11 | 旭化成电子材料元件株式会社 | 感光性树脂组合物及其层压体 |
CN101121825A (zh) * | 2006-08-11 | 2008-02-13 | 住友化学株式会社 | 可聚合树脂组合物 |
JP2010107755A (ja) * | 2008-10-30 | 2010-05-13 | Sumitomo Chemical Co Ltd | 感光性樹脂組成物 |
CN103460131A (zh) * | 2011-03-30 | 2013-12-18 | 日立化成株式会社 | 感光性树脂组合物、使用了其的感光性元件、图像显示装置的隔壁的形成方法及图像显示装置的制造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106796375A (zh) * | 2014-11-10 | 2017-05-31 | 大日本印刷株式会社 | 柱状形成物用树脂组合物、附有柱状形成物的基板的制造方法和附有柱状形成物的基板 |
CN106796375B (zh) * | 2014-11-10 | 2020-07-31 | 大日本印刷株式会社 | 柱状形成物用树脂组合物、附有柱状形成物的基板的制造方法和附有柱状形成物的基板 |
CN111133344A (zh) * | 2017-09-26 | 2020-05-08 | 大阪有机化学工业株式会社 | 光间隔体形成用感光性树脂组合物、光间隔体的形成方法、带光间隔体的基板、及滤色器 |
Also Published As
Publication number | Publication date |
---|---|
JP5924350B2 (ja) | 2016-05-25 |
JPWO2013115262A1 (ja) | 2015-05-11 |
TWI545400B (zh) | 2016-08-11 |
TW201339756A (zh) | 2013-10-01 |
WO2013115262A1 (fr) | 2013-08-08 |
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