CN103435056B - 二氧化硅 - Google Patents

二氧化硅 Download PDF

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Publication number
CN103435056B
CN103435056B CN201310331814.9A CN201310331814A CN103435056B CN 103435056 B CN103435056 B CN 103435056B CN 201310331814 A CN201310331814 A CN 201310331814A CN 103435056 B CN103435056 B CN 103435056B
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China
Prior art keywords
tackiness agent
silicon
acid
reaction
primary air
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CN201310331814.9A
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English (en)
Chinese (zh)
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CN103435056A (zh
Inventor
J·迈尔
M·肖尔茨
P·布克尔
A·希勒
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Evonik Operations GmbH
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Evonik Degussa GmbH
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Publication of CN103435056A publication Critical patent/CN103435056A/zh
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/11Powder tap density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/22Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/10Process efficiency
    • Y02P20/129Energy recovery, e.g. by cogeneration, H2recovery or pressure recovery turbines
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • Y10T428/2993Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995Silane, siloxane or silicone coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
CN201310331814.9A 2008-03-04 2009-02-10 二氧化硅 Active CN103435056B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008000499A DE102008000499A1 (de) 2008-03-04 2008-03-04 Kieselsäure sowie Epoxidharze
DE102008000499.5 2008-03-04
CN2009801073736A CN101959796B (zh) 2008-03-04 2009-02-10 二氧化硅和环氧树脂

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN2009801073736A Division CN101959796B (zh) 2008-03-04 2009-02-10 二氧化硅和环氧树脂

Publications (2)

Publication Number Publication Date
CN103435056A CN103435056A (zh) 2013-12-11
CN103435056B true CN103435056B (zh) 2015-12-02

Family

ID=40740192

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201310331814.9A Active CN103435056B (zh) 2008-03-04 2009-02-10 二氧化硅
CN2009801073736A Active CN101959796B (zh) 2008-03-04 2009-02-10 二氧化硅和环氧树脂

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2009801073736A Active CN101959796B (zh) 2008-03-04 2009-02-10 二氧化硅和环氧树脂

Country Status (7)

Country Link
US (1) US8480846B2 (https=)
EP (2) EP2268575B1 (https=)
JP (1) JP5583032B2 (https=)
CN (2) CN103435056B (https=)
DE (1) DE102008000499A1 (https=)
TW (1) TWI455883B (https=)
WO (1) WO2009109442A2 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102040804B (zh) * 2010-11-19 2013-02-13 明基材料有限公司 环氧树脂组成物
JP5643623B2 (ja) * 2010-12-02 2014-12-17 デクセリアルズ株式会社 異方性導電材料及びその製造方法
JP6443041B2 (ja) * 2014-12-26 2018-12-26 三菱マテリアル株式会社 シリカゾル分散液及びシリカ多孔質膜形成用組成物
CN104830259B (zh) * 2015-04-21 2018-05-15 长兴铁鹰电气有限公司 一种铅酸蓄电池极柱密封胶及其制备方法
JP6796253B2 (ja) * 2016-04-04 2020-12-09 日立金属株式会社 接着フィルム及びフラット配線材
DE102017203998A1 (de) 2017-03-10 2017-06-01 Wacker Chemie Ag Verfahren zur Herstellung von pyrogener Kieselsäure
CN106978103A (zh) 2017-04-07 2017-07-25 德山化工(浙江)有限公司 硅油处理热解法二氧化硅、其制备方法及应用
DE112019000531T5 (de) * 2018-01-25 2020-10-22 Cabot Corporation Wässrige hydrophobe Siliciumdioxiddispersionen
EP3813972A4 (en) 2018-06-15 2022-03-23 W. R. Grace & Co.-Conn Defoamer active, manufacturing method thereof, and defoaming formulation
JP7527770B2 (ja) * 2018-11-29 2024-08-05 キヤノン株式会社 硬化性シリコーンゴム混合物、電子写真用部材、および電子写真画像形成装置
WO2021035383A1 (en) * 2019-08-23 2021-03-04 Evonik Specialty Chemicals (Shanghai) Co., Ltd. Thermal conductive filler and preparation method thereof
WO2021079791A1 (ja) * 2019-10-21 2021-04-29 Jfeスチール株式会社 絶縁被膜付き電磁鋼板
EP3954743A1 (de) 2020-08-12 2022-02-16 Evonik Operations GmbH Verwendung von siliziumdioxid zur verbesserung der leitfähigkeit von beschichtungen
JP2022185980A (ja) * 2021-06-03 2022-12-15 日本アエロジル株式会社 表面改質無機酸化物粉末及びその製造方法
JP2022185978A (ja) * 2021-06-03 2022-12-15 日本アエロジル株式会社 表面改質無機酸化物粉末及びその製造方法
CN116285475A (zh) * 2023-02-13 2023-06-23 青岛中邦新材料科技有限公司 一种疏水二氧化硅及其制备方法
CN115974089B (zh) * 2023-02-17 2023-10-20 江苏海格新材料有限公司 一种活性硅微粉的生产方法
WO2024236144A1 (en) * 2023-05-18 2024-11-21 Ams-Osram International Gmbh Modified siloxanes, method for modifying siloxanes and their use

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1405084A (zh) * 2001-09-13 2003-03-26 瓦克化学有限公司 低硅醇硅石
EP1433749A1 (de) * 2002-12-20 2004-06-30 Wacker-Chemie GmbH Wasserbenetzbare silylierte Metalloxide
EP1681266A2 (de) * 2005-01-12 2006-07-19 Degussa AG Pyrogen hergestellte Siliciumdioxidpulver und dieses Pulver enthaltende Silikondichtmasse

Family Cites Families (20)

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GB932753A (en) * 1959-10-12 1963-07-31 Ici Ltd Improvements in or relating to fillers and pigments by treatment with dihydrocarbyl polysiloxane
DE1567454A1 (de) * 1966-03-10 1970-08-06 Degussa Verfahren zur Herstellung stabiler hochprozentiger Dispersionen von pyrogen gewonnener Kieselsaeure
US3592679A (en) * 1969-05-29 1971-07-13 Cabot Corp Surface treatment of polymeric materials
JPS6136338A (ja) * 1984-07-27 1986-02-21 Mitsubishi Chem Ind Ltd 疎水性の酸化物微粉体及び該酸化物から成る揺変付与剤
US4852965A (en) * 1987-02-27 1989-08-01 American Telephone And Telegraph Company At&T Bell Laboratories Composite service and distribution communications media
US5285513A (en) * 1992-11-30 1994-02-08 At&T Bell Laboratories Optical fiber cable provided with stabilized waterblocking material
US5543487A (en) * 1994-01-19 1996-08-06 The United States Of America As Represented By The Secretary Of Agriculture Hydroxymethylated resorcinol coupling agent and method for bonding wood
DE4402370A1 (de) 1994-01-27 1995-08-03 Degussa Silanisierte Kieselsäuren
DE10138490A1 (de) 2001-08-04 2003-02-13 Degussa Hydrophobe Fällungskieselsäure mit hohem Weißgrad und extrem niedriger Feuchtigkeitsaufnahme
DE10222153B4 (de) * 2002-05-17 2018-11-22 Evonik Degussa Gmbh 2-Komponenten-Mischsysteme
US6645341B1 (en) * 2002-08-06 2003-11-11 National Starch And Chemical Investment Holding Corporation Two part epoxide adhesive with improved strength
DE10239424A1 (de) 2002-08-28 2004-03-11 Degussa Ag Kieselsäuren
AU2003286153A1 (en) * 2002-12-18 2004-07-09 Degussa Ag Structurally modified silica
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DE10326049A1 (de) * 2003-06-10 2004-12-30 Degussa Ag Flammenhydrolytisch hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung
JP2005154222A (ja) * 2003-11-27 2005-06-16 Tokuyama Corp 微粒子状シリカ
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CN1405084A (zh) * 2001-09-13 2003-03-26 瓦克化学有限公司 低硅醇硅石
EP1433749A1 (de) * 2002-12-20 2004-06-30 Wacker-Chemie GmbH Wasserbenetzbare silylierte Metalloxide
EP1681266A2 (de) * 2005-01-12 2006-07-19 Degussa AG Pyrogen hergestellte Siliciumdioxidpulver und dieses Pulver enthaltende Silikondichtmasse

Also Published As

Publication number Publication date
DE102008000499A1 (de) 2009-09-10
WO2009109442A3 (en) 2010-08-05
EP2268575B1 (en) 2013-04-03
EP2433905B1 (en) 2016-08-17
EP2433905A2 (en) 2012-03-28
CN101959796A (zh) 2011-01-26
EP2433905A3 (en) 2012-05-30
TW201000400A (en) 2010-01-01
CN101959796B (zh) 2013-09-04
EP2268575A2 (en) 2011-01-05
CN103435056A (zh) 2013-12-11
US20100286311A1 (en) 2010-11-11
TWI455883B (zh) 2014-10-11
WO2009109442A2 (en) 2009-09-11
JP5583032B2 (ja) 2014-09-03
JP2011516373A (ja) 2011-05-26
US8480846B2 (en) 2013-07-09

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Address after: Essen, Germany

Patentee after: Evonik Operations Limited

Address before: Essen, Germany

Patentee before: EVONIK DEGUSSA GmbH

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