CN103402933A - 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法 - Google Patents

用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法 Download PDF

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Publication number
CN103402933A
CN103402933A CN2012800100352A CN201280010035A CN103402933A CN 103402933 A CN103402933 A CN 103402933A CN 2012800100352 A CN2012800100352 A CN 2012800100352A CN 201280010035 A CN201280010035 A CN 201280010035A CN 103402933 A CN103402933 A CN 103402933A
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CN
China
Prior art keywords
described methods
value
silicon dioxide
content
purity silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2012800100352A
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English (en)
Chinese (zh)
Inventor
C·潘茨
G·蒂茨
S·米勒
M·鲁夫
B·弗林斯
H·劳勒德尔
J·贝尼施
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Evonik Operations GmbH
Original Assignee
Evonik Degussa GmbH
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Filing date
Publication date
Application filed by Evonik Degussa GmbH filed Critical Evonik Degussa GmbH
Priority to CN201810913825.0A priority Critical patent/CN108658451A/zh
Publication of CN103402933A publication Critical patent/CN103402933A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/126—Preparation of silica of undetermined type
    • C01B33/128—Preparation of silica of undetermined type by acidic treatment of aqueous silicate solutions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1095—Thermal after-treatment of beads, e.g. tempering, crystallisation, annealing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/02—Pretreated ingredients
    • C03C1/022—Purification of silica sand or other minerals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/008—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in molecular form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/14—Pore volume
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/16—Pore diameter
    • C01P2006/17—Pore diameter distribution
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Silicon Compounds (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
CN2012800100352A 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法 Pending CN103402933A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810913825.0A CN108658451A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011004532A DE102011004532A1 (de) 2011-02-22 2011-02-22 Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen
DE102011004532.5 2011-02-22
PCT/EP2012/052251 WO2012113655A1 (de) 2011-02-22 2012-02-10 Hochreines siliciumdioxidgranulat für quarzglasanwendungen sowie dessen herstellungsverfahren

Related Child Applications (1)

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CN201810913825.0A Division CN108658451A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法

Publications (1)

Publication Number Publication Date
CN103402933A true CN103402933A (zh) 2013-11-20

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CN2012800100352A Pending CN103402933A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法
CN201810913825.0A Pending CN108658451A (zh) 2011-02-22 2012-02-10 用于石英玻璃应用的高纯度二氧化硅颗粒及制备所述颗粒的方法

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Country Status (12)

Country Link
US (2) US20140072803A1 (enExample)
EP (1) EP2678280B1 (enExample)
JP (1) JP5897043B2 (enExample)
KR (1) KR101911566B1 (enExample)
CN (2) CN103402933A (enExample)
CA (1) CA2827899C (enExample)
DE (1) DE102011004532A1 (enExample)
ES (1) ES2628382T3 (enExample)
PL (1) PL2678280T3 (enExample)
RU (1) RU2602859C2 (enExample)
TW (1) TWI557073B (enExample)
WO (1) WO2012113655A1 (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104860322A (zh) * 2015-05-07 2015-08-26 中国海洋石油总公司 一种低钠离子含量高纯硅溶胶的制备方法
CN108698888A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
CN108698887A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
US11053152B2 (en) 2015-12-18 2021-07-06 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silicon dioxide in the preparation of quartz glass
CN113104855A (zh) * 2021-04-30 2021-07-13 武汉大学 球形二氧化硅的制备方法
US11236002B2 (en) 2015-12-18 2022-02-01 Heraeus Quarzglas Gmbh & Co. Kg Preparation of an opaque quartz glass body
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
US11708290B2 (en) 2015-12-18 2023-07-25 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2827886A1 (en) 2011-02-22 2012-08-30 Evonik Degussa Gmbh Process for preparing aqueous colloidal silica sols of high purity from alkali metal silicate solutions
CN108698890A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 利用在熔融烘箱中的露点监测制备石英玻璃体
CN108698892A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 从二氧化硅颗粒制备石英玻璃体
KR20180095880A (ko) 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 합성 석영 유리 결정립의 제조
JP7390198B2 (ja) * 2019-01-28 2023-12-01 三井金属鉱業株式会社 ガラス粒子、それを用いた導電性組成物及びガラス粒子の製造方法
CN111943215B (zh) * 2019-05-14 2022-02-22 中天科技精密材料有限公司 石英粉的制备方法
RU2723623C1 (ru) * 2019-12-30 2020-06-16 Общество с ограниченной ответственностью "Инжиниринговый химико-технологический центр" (ООО "ИХТЦ") Способ получения кускового силикагеля
CN111976485B (zh) * 2020-08-17 2022-01-11 宿州竹梦光学科技有限公司 一种汽车中控触屏ag玻璃
CN113880098B (zh) * 2021-11-17 2022-12-09 江苏海格新材料有限公司 一种高纯球形硅微粉的生产方法

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CA2732596A1 (en) * 2008-08-01 2010-02-04 Evonik Degussa Gmbh Novel precipitated silicic acids for support applications
WO2010037702A1 (de) * 2008-09-30 2010-04-08 Evonik Degussa Gmbh Verfahren zur herstellung von hochreinem sio2 aus silikatlösungen

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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104860322A (zh) * 2015-05-07 2015-08-26 中国海洋石油总公司 一种低钠离子含量高纯硅溶胶的制备方法
CN108698888A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
CN108698887A (zh) * 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
US11053152B2 (en) 2015-12-18 2021-07-06 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silicon dioxide in the preparation of quartz glass
CN108698887B (zh) * 2015-12-18 2022-01-21 贺利氏石英玻璃有限两合公司 由均质石英玻璃制得的玻璃纤维和预成形品
US11236002B2 (en) 2015-12-18 2022-02-01 Heraeus Quarzglas Gmbh & Co. Kg Preparation of an opaque quartz glass body
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
US11708290B2 (en) 2015-12-18 2023-07-25 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
CN113104855A (zh) * 2021-04-30 2021-07-13 武汉大学 球形二氧化硅的制备方法
CN113104855B (zh) * 2021-04-30 2022-03-15 武汉大学 球形二氧化硅的制备方法

Also Published As

Publication number Publication date
DE102011004532A1 (de) 2012-08-23
JP5897043B2 (ja) 2016-03-30
KR101911566B1 (ko) 2018-10-24
CN108658451A (zh) 2018-10-16
CA2827899C (en) 2018-06-12
US20140072803A1 (en) 2014-03-13
RU2013142832A (ru) 2015-03-27
KR20140022380A (ko) 2014-02-24
EP2678280B1 (de) 2017-05-03
US20170066654A1 (en) 2017-03-09
RU2602859C2 (ru) 2016-11-20
WO2012113655A1 (de) 2012-08-30
ES2628382T3 (es) 2017-08-02
EP2678280A1 (de) 2014-01-01
TWI557073B (zh) 2016-11-11
CA2827899A1 (en) 2012-08-30
JP2014514229A (ja) 2014-06-19
PL2678280T3 (pl) 2017-10-31
TW201247540A (en) 2012-12-01

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Application publication date: 20131120