CN103301998B - Apparatus for coating - Google Patents
Apparatus for coating Download PDFInfo
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- CN103301998B CN103301998B CN201310066873.8A CN201310066873A CN103301998B CN 103301998 B CN103301998 B CN 103301998B CN 201310066873 A CN201310066873 A CN 201310066873A CN 103301998 B CN103301998 B CN 103301998B
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- nozzle
- base component
- substrate
- track
- width
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
- B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides a kind of apparatus for coating, and the substrate to being conveyed is coated, the certainty of measurement of the height and position at the width both ends of the nozzle measured by sensor by the raising of simple structure, the apparatus for coating, including：Conveying mechanism portion（2）, by substrate（W）Conveyed to the conveying direction of level；Coating mechanism portion（3）, including nozzle（30）, the nozzle is more long in the direction of the width and corresponding with the substrate for being conveyed；Sensor（7）, the width both ends of the nozzle are measured to adjust the posture of nozzle with respect to the horizontal plane（35）Height and position；Wherein, conveying mechanism portion includes：Track（21）, extend to conveying direction；Base component（23）, moved along the track；Adsorbing mechanism（25）, it is equipped on the base component, the width both ends of supporting substrate in conveying substrate（E）, sensor and adsorbing mechanism are together equipped on base component.
Description
Technical field
The present invention relates to by coating solution in the apparatus for coating on the substrate for being conveyed.
Background technology
Using being formed with pixel, circuit pattern etc. on the flat-panel monitors such as liquid crystal display, solar panel etc.
Substrate, such substrate is the photoetching technique that is carried out by using such as painting erosion resistant agent liquid (coating fluid) to be manufactured.
In addition, as by coating solution substrate device, it has been disclosed that have following apparatus for coating, the device includes：
Platform, for substrate level to be fixed；Nozzle, is internally formed with thin sealing long in the direction of the width；According to the coating
Device, coating fluid is discharged while by making nozzle be moved to horizontal direction the substrate on platform from thin sealing, thereby, it is possible to
The coated film formed by coating fluid is formed on the surface of the substrate.In addition, from thin sealing discharge coating fluid when, substrate and nozzle are (thin
Sealing) between the gap in short transverse is provided with state, therefore, in order to adjust the value in the gap, nozzle is according to can rise
The mode of drop is constituted.
(make to be coated operation by such apparatus for coating, and improving the quality of the coated film formed on substrate
Uniform film thickness), it is necessary to by nozzle and substrate (horizontal plane) in parallel, and make gap between nozzle and substrate in the direction of the width
It is constant.Therefore, Fen Do set sensor Shang the position corresponding with the width both ends of nozzle of the end of platform.And
And, make nozzle that the top of these sensors is moved to horizontal direction, the width two of nozzle is obtained by these sensors
The difference of the height of end, and the postures such as its inclination are adjusted by lifting nozzle according to the difference in height.Thereby, it is possible to make at nozzle
In horizontality, and make the clearance constant between nozzle and substrate.
In this way, Bian takes the apparatus for coating of the mode that nozzle is moved in platform upward horizon direction, it is not necessary to set other dresses
Put, be easier to be provided for adjust the sensor of nozzle posture, but it is oscilaltion and substrate to level side that Bian takes nozzle
To the mode for being conveyed apparatus for coating when, it is impossible to the structure of direct Bian the sensors.
Prior art literature
Patent document
JP 2005-244155 publications (reference picture 2) of patent document 1
The content of the invention
Therefore, when Bian takes the apparatus for coating of the mode that substrate is conveyed to horizontal direction, as shown in Figure 6, it is contemplated that under
State structure：The arm 93 extended to the end 92 of the width of nozzle 91 from pillar 90 is set, is installed in the front end of the arm 93 and passed
Sensor 94, wherein, pillar 90 is formed as the guide for lifting the lifting body 95 for being provided with nozzle 91.But, now in the presence of such as
Under problem, arm 93 grows, also, for clean the unit (not shown) of (initialization) nozzle 91 moved to nozzle 91 and close to
During nozzle 91, a part and the arm 93 of the unit are interfered, thus in order to avoid there is such situation, it is necessary to arm 93 or
Person's unit does exquisite in shape, so that structure becomes complicated.
If the shape to arm 93 or unit does exquisite, sensor 94 can be arranged on the width of nozzle 91
End 92 underface, but in order to ensure the certainty of measurement high based on sensor 94, arm 93 must just possess high rigidity.
But, if making its sectional area become big to improve the rigidity of arm 93, the dry Wataru of arm 93 and unit just becomes further tight
Weight.In contrast, arm 93 is made to attenuate in order to prevention unit and arm 93 are interfered, then the rigidity decline of arm 93, so as to passing
The support of sensor 94 becomes unstable and is difficult to correct measurement.
It is therefore an object of the present invention to, in the apparatus for coating being coated to the substrate for being conveyed, by simple knot
Structure come improve with sensor measure nozzle width two ends height and position certainty of measurement.
(1) apparatus for coating of the invention, it is characterised in that including：Conveying mechanism portion, substrate is conveyed to horizontal direction；
Coating mechanism portion, including nozzle and lifting drive division, coating fluid is discharged relative to the substrate from the nozzle, wherein, it is described
Nozzle is set in long way on the width of the level perpendicular with the conveying direction, and has relative to the substrate for being conveyed
There is a gap of short transverse and corresponding, the lifting drive division makes the nozzle lift in the height direction；Sensor, in order to
The posture of the regulation nozzle with respect to the horizontal plane, measures the height and position at the width both ends of the nozzle, wherein,
The conveying mechanism portion includes：Track, is arranged on the width both sides of the substrate for being conveyed, and prolongs to the conveying direction
Stretch；Base component, moves along the track；Supporting part, is equipped on the base component, when the substrate is conveyed,
The width both ends of the substrate are supported, the sensor is together equipped on the base component with the supporting part.
According to the present invention, in order to substrate is conveyed by conveying mechanism portion to the conveying direction of level, track is relative to water
The dimensional accuracy of plane is high, also, carries the chi of the base component also relative to horizontal plane of the supporting part for supporting the substrate
Very little high precision, and accurately moved along track with the state of holding level.Therefore, such base is equipped on by sensor
On base member, thus relative to the installation site also high precision of the sensor of horizontal plane, and can be high-precision by the sensor
The height and position at the width both ends of degree ground measurement nozzle.In addition, supporting part is that the substrate is supported in conveying substrate
The device at width both ends, therefore supporting part and carry the base component of the supporting part and be located at width with substrate
On the corresponding position in both ends.In addition, by carrying sensor on the base component on such position, thus,
Need not be such as prior art it is long-armed, sensor can be set on the position corresponding with the width both ends of nozzle,
So as to the structure for setting sensor becomes simple.
(2) it is further preferred, that the base component includes making the base component relative to the upper surface of the track
The suspension mechanism portion of suspension, by the suspension mechanism portion, the base component is moved relative to the track with the state for suspending,
Now, base component can be moved successfully along track.
(3) and, it is preferred that apparatus for coating described in (2) is measuring the nozzle by the sensor
Width both ends height and position when, be equipped on the base component the sensor be located at the nozzle just
In the state of lower section, the suspension by the base component in the suspension mechanism portion is released, thus sit the base component
Fall within the track.
Now, as previously described, with respect to the horizontal plane dimensional accuracy is high for track, also, base component is also relative to level
Face dimensional accuracy is high, therefore, it is seated on track by making such base component, thus it is equipped on the biography on the base component
Sensor can be located at the underface of nozzle with respect to the horizontal plane dimensional accuracy state high.Therefore, in this condition, sensor
By measuring the height and position at the width both ends of nozzle, thus, it is possible to improve certainty of measurement.
(4) it is preferably, the suspension mechanism portion is made up of ejection section, by the ejection section relative to the track
Upper surface gas injection suspends making the base component.
Now, suspended by the way that base component can be made from ejection section gas injection, also, by stopping the injection come energy
The suspension is enough released, these switchings are easy.
(5) it is further preferred, that in the apparatus for coating described in (4), the base component is being seated into institute
State when on track, the stream for making the gas for residuing in the ejection section outwards discharge is connected in the ejection section.
Even to be stopped from the injection of the gas of ejection section by control device so that base component is seated on track,
But if air is residued in air jet part, then base component part is in the state for suspending, it is impossible to make base portion
Part is seated on track, but, according to the stream, it is prevented from such defect.As a result, measured by the sensor every time
During the height and position at the width two ends of the nozzle, the height and position of base component can be made to keep constant (being able to ensure that
Repeatability).
According to the present invention, because sensor is equipped on dimensional accuracy with respect to the horizontal plane base component high, therefore,
The height and position at the width both ends of nozzle can be accurately measured by the sensor.In addition, by by sensor
It is equipped on base component, thus, it is not necessary to which such as prior art is long-armed, and sensor can be arranged on the width side with nozzle
To on the corresponding position in both ends, the structure for setting sensor becomes simple.
Brief description of the drawings
Fig. 1 is the stereogram of the schematic configuration for representing apparatus for coating of the invention；
Fig. 2 is the figure of track, mobile unit, floating platform and nozzle from terms of conveying direction；
Fig. 3 is the figure for illustrating supply air flow circuit and exhaust air flow circuit；
Fig. 4 is the figure for illustrating sensor；
Fig. 5 is the figure for illustrating to reset mechanism；
Fig. 6 is the figure for illustrating existing apparatus for coating.
Drawing reference numeral explanation
1 apparatus for coating
2 conveying mechanism portions
3 coating mechanism portions
4 control devices
7 sensors
16 exhaust streams
21 tracks
21a upper surfaces
22 mobile units
23 base components
25 adsorbing mechanisms (supporting part)
26 ejection sections (suspension mechanism portion)
30 nozzles
32 lifting drive divisions
35 ends
E ends
W substrates
Specific embodiment
Below, embodiments of the present invention are described with reference to the drawings.
Fig. 1 is the stereogram of the schematic configuration for representing apparatus for coating 1 of the invention.The apparatus for coating 1 is in conveying
The laminal substrate W coating liquid coating fluids such as liquid or resist liquid apparatus for coating, including：Conveying mechanism portion
2, substrate W is conveyed to horizontal feed direction；Coating mechanism portion 3, with nozzle 30, from the nozzle 30 to by the conveying mechanism
The substrate W discharge coating fluids that portion 2 is conveyed.Further, the apparatus for coating 1 includes control device 4, and the control device 4 is by calculating
Mechanism is into the action for controlling conveying mechanism portion 2 and coating mechanism portion 3.The apparatus for coating 1 is substrate W relative in solid
The nozzle 30 of state is determined to the device of horizontal direction mode of movement.In addition, in the present embodiment, by the conveying direction of substrate W
Used as X-direction, the horizontal direction (Y-direction) perpendicular with the X-direction is used as width.Also, it is in X-direction and Y-direction
Vertical Z-direction is used as short transverse.
The conveying mechanism portion 2 of present embodiment includes：Floating platform 20, by making from upper surface gas injection (air)
Substrate W suspends；Track 21, is arranged on the width both sides of the floating platform 20；Mobile unit 22, support is flat by suspending
Platform 20 suspend substrate W width end E and moved horizontally along track 21.Further, since track 21 is arranged on width side
To on both sides, therefore, mobile unit 22 is also disposed on width both sides.
Floating platform 20 is divided into some, including the multiple platform units being arranged side by side to conveying direction.Suspend
Left and right directions size of the width size of unit 20 than substrate W is small, and the width end E of substrate W is in from floating platform
20 states for protruding.The air mass flow (injection intensity) of injection is controlled by control device 4, and makes substrate W by the control
Suspended with the posture of horizontality.The upper surface 20a of the floating platform 20 will turn into the base for being adjusted operation in rear explanation
Quasi- face HO (reference picture 4), therefore, floating platform 20 is accurately set, so that upper surface 20a turns into horizontal plane.
Track 21 is extended to conveying direction with rectilinear form, and is arranged on the width both sides of the substrate W for being conveyed.
In addition, track 21 is that rectangle, its upper surface are that horizontal mode is accurately set according to cross section.
Mobile unit 22 includes：Base component 23, moves along track 21；Drive device, moves the base component 23；
Supporting part, is equipped on base component 23, and substrate W supporting substrate W when being conveyed width end E.In addition, this implementation
The drive device of mode include linear motor 24, also, present embodiment supporting part by absorption suspend substrate W width side
Constituted to the adsorbing mechanism 25 below the E of end.
Adsorbing mechanism 25 is adsorbed below the end E of the substrate W for being transported to the upstream side of floating platform 20 and suspending, and
In the case of keeping the adsorbed state, the base component 23 of the adsorbing mechanism 25 is carried according to the control of control device 4 and is passed through
Linear motor 24 is moved to downstream.Thus, substrate W is conveyed to horizontal direction by straight line.In addition, adsorbing mechanism 25 is respectively provided with
On the left and right sides of floating platform 20, and along the end E of substrate W sides, there is the side of predetermined distance according to fore-and-aft direction
Formula is provided with many (being in the present embodiment three).Many adsorbing mechanisms 25 of side are all equipped on identical base component
On 23, and moved as overall.
Fig. 2 is the figure of track 21 from terms of conveying direction, mobile unit 22, floating platform 20 and nozzle 30.As above
Described, the cross section of track 21 is rectangle, also, base component 23 includes the upside parallel with the upper surface 21a of the track 21
The side member 12,13 that part 11 and the width both sides from the upper side member 11 extend downwardly, and with for track
The 21 top cross sectional shape that side and width both sides surround from it.
In addition, base component 23 includes making the base component in a non-contact manner relative to the upper surface 21a of track 21
The 23 suspension mechanism portions for suspending, are relative to 21a injections air (pressure above track 21 in the suspension mechanism portion of present embodiment
Contracting air) air jet part 26.Air jet part 26 is installed on upper side member 11, in the present embodiment in width
On be provided with two.In addition, multiple air jet parts 26 have also been arranged side by side in the conveying direction.Air jet part 26 is under it
Portion has mattress 27, sprays compressed air to the upper surface 21 of track 21 in the mattress 27, and the mattress 27 is in from upper
The state that surface 21a suspends slightly, i.e., in non-contacting state.In addition, mattress 27 can by such as Porous carbon, ceramics,
Sintering metal etc. is constituted.The emitted dose of suspension amount, the i.e. compressed air is controlled by control device 4.By these air
Ejection section 26, base component 23 can be moved with the state for suspending relative to track 21 along track 21.
In addition, as shown in figure 3, except the pump 17 being connected with as the supply source of compressed air is connected on air jet part 26
And outside the supply that compressed air is supplied to mattress 27 is with air flow circuit 15, be also associated with the (air of air jet part 26
Pad 27) in residual discharging air outward (to atmosphere opening) exhaust air flow circuit 16.Also, in all air jet parts
Valve 17 is provided with the stream of 26 pump side (upstream side), can select what is be connected with the air jet part 26 by the valve 17
Supply any air flow circuit in air flow circuit 16 with air flow circuit 15 and exhaust.The selection (switching of valve 17) is by control
Device processed 4 sends control signal to realize to valve 17.During in order to be coated operation and conveying substrate W, supply air is selected
Stream 15, the situation of selection exhaust air flow circuit 16 is described later, in the regulation posture of nozzle 30 with respect to the horizontal plane
When select exhaust air flow circuit 16.
Coating mechanism portion 3 is illustrated according to Fig. 1.As previously described, coating mechanism portion 3 has spray long in the direction of the width
Mouth 30.Nozzle 30 is installed on lifting body 34 long in the direction of the width.In nozzle 30, on the width of almost total length
Thin sealing 31, and thin sealing 31 are formed with front end (lower end) upper shed of nozzle 30.Coating fluid is supplied to nozzle 30, and
Coating fluid is discharged from thin sealing 31 while conveying substrate W, thereby, it is possible to the width side of the almost total length relative to substrate W
Upward applied coating solution.Also, the front end of nozzle 30 is relative in the gap with short transverse relative to the substrate W for being conveyed
The state answered.
Conveying mechanism portion 2 and coating mechanism portion 3 according to more than, substrate W are advised in being suspended from the upper surface of floating platform 20
Determine the state of height, and in this condition, the lower surface of the width end E of substrate W is adsorbed by adsorbing mechanism 25.Take
The base component 23 for carrying the adsorbing mechanism 25 is moved horizontally along track 21, and thus substrate W is conveyed to horizontal direction, defeated at this
Send in way, discharge coating fluid from nozzle 30 relative to substrate W upper surfaces and form coated film.
In addition, being provided with pillar 33 on width both sides as the part in coating mechanism portion 3, nozzle 30 is installed
Lifting body 34 be set in the way of between pillar 33,33.Pillar 33 has the width two of support lifting body 34
Also there is the function as the vertically guide of induction lifting body 34 while the function of end.Also, coating mechanism
Portion 3 includes the lifting drive division 32 for making lifting body 34 be lifted to short transverse along pillar 33.Lifting drive division 32 is respectively provided with
On the pillar 33 of both sides, and the back and forth movement cylinder by making the width end by lifting body 34 independently move up and down
Constitute.In addition, the lifting drive division 32 can be acted according to the control signal for carrying out self-control device 4, if width side
Acted simultaneously to the lifting drive division 32 of both sides, then nozzle 30 can be made to be moved in parallel to short transverse, in addition, can lead to
Cross the posture (regulation operation) that the lifting drive division 32 of only side is acted to adjust nozzle 30.For example, nozzle 30 is relative
When horizontal plane, the inclination can be eliminated by adjusting operation.
Can enter to be about to coating operations of the coating solution on substrate W by the apparatus for coating 1 with above structure, but
It is to improve the quality (making uniform film thickness) of the coated film formed on substrate W with coating fluid, it is preferred that the phase of nozzle 30
Upper surface (horizontal plane) for substrate W is parallel, and the gap of nozzle 30 and substrate W is constant in the direction of the width.
Thus, for example nozzle 30 is taken off from lifting body 34 when being changed, should enter and exercise the nozzle 30 after changing
Posture is in horizontal regulation operation.So, in order to adjust the posture of nozzle 30 with respect to the horizontal plane, as shown in Fig. 2 being coated with
Device 1 includes the sensor 7 of the height and position of the width end 35 for detecting nozzle 30.Also, the sensor 7 and suction
Random structure 25 is together equipped on base component 23.In addition, base component 23 is arranged on width both sides, and thus, sensing
Device 7 is also disposed on width both sides, both sides these sensors 7,7 configuration extend to width it is same always
On line (imaginary line).In addition, on each base component 23 of width both sides, sensor 7 is with adsorbing mechanism 25 with conveying
The mode that rectilinear form is arranged side-by-side on direction is carried.
Because sensor 7 is equipped on base component 23, therefore the lower section of nozzle 30 is moved to by making base component 23
To make sensor 7 to be located at the underface of nozzle 30 in position.In addition, the position of base component 23 be by control device 4 come
It is managed, by the control of control device 4, sensor 7 can be made to be located in the position directly below of nozzle 30.
As shown in figure 4, the sensor 7 of present embodiment is touch sensor, including the width of nozzle 30 can be touched
Spend the contact shoe 8 of the lower surface of direction end 35 and for measuring the height and position of 8 front end from datum level HO to contact shoe
Measuring instrument 9, the lower surface of the end 35 of nozzle 30 is touched by making the front end of contact shoe 8, can be measured from base with measuring instrument 9
Height hs of the quasi- face HO to the lower surface of the end 35 of nozzle 30.In addition, in the present embodiment, datum level HO is floating platform
20 upper surface 20a.
Also, measured based on sensor 7,30 end 35 from datum level HO to nozzle on width both sides
The height value h of lower surface, and its measured value is exported to control device 4.Control device 4 can obtain height according to the measured value
The difference of h is spent, and can enter to exercise nozzle 30 in horizontal regulation operation according to the difference.
In addition, can be when the width end 35 that nozzle 30 is measured by sensor 7 to carry out the regulation operation
Height and position when, included by base component 23 air jet part 26 (reference picture 2) injection compressed air and make base portion
Part 23 is in the state for suspending relative to track 21, but, in the present embodiment, in order to be adjusted operation, control device 4 leads to
Control is crossed so that stopping when being equipped on the sensor 7 of base component 23 positioned at the state of the position directly below of nozzle 30 all from sky
The injection of the compressed air in gas jet portion 26.As previously described, it is in from track 21 for spraying the mattress 27 of compressed air
The state that upper surface 21a suspends slightly, by the upper surface for stopping the injection of compressed air, air jet part 26 and track 21
21a is in the state (state being released from suspending) for contacting.That is, in order to be adjusted operation, the base component 23 of suspension is made
In the state for being seated track 21.
Jin mono- Walk, while stopping the supply to the compressed air of all air jet parts 26, control device 4 is to valve 17
(reference picture 3) sends control signal and carries out the switching of stream, and all air jet parts 26 is flowed with exhaust by control
Road 16 connects.Thus, base component 23 is seated when on track 21, can will residue in the air of all air jet parts 26
Outwards discharge is (to atmosphere opening).
Stop making base component 23 from the injection of the compressed air of air jet part 26 even by control device 4
It is seated on track 21, but if air is residued in air jet part 26 (mattress 27), then base component 23 is still in outstanding
Floating state, therefore base component 23 cannot be made reliably to be seated on track 21.Now, the regulation operation is carried out every time
When, it is impossible to its repeatability cannot ensure in specific height and position to make base component 23, as a result, measured value occurs error.
But, in the present embodiment, the compressed air of air jet part 26 can will be residued in by exhaust air
Stream 16 therefore, it is possible to make base component 23 reliably be seated on track 21, also, is carried out described every time to outside drain
The state can be reliably reproduced during regulation operation.In addition, compressed air by exhaust with air flow circuit 16 to outside drain, by
This, base component 23 can be promptly seated on track 21.Therefore, can promptly be measured with sensor 7.
As described above, in the apparatus for coating of present embodiment, in order to substrate W is conveyed to the conveying direction of level, rail
The dimensional accuracy with respect to the horizontal plane of road 21 is high and is accurately set, in addition, carrying the adsorbing mechanism for supporting substrate W
25 base component 23 is high and to keep the state of level accurately along track 21 also relative to the dimensional accuracy of horizontal plane
It is mobile.Also, by carrying sensor 7 on such base component 23, thus relative to the installation of the sensor 7 of horizontal plane
The precision of position is also high, and the height and position at the width both ends 35 of nozzle 30 can be measured by the sensor 7.For example,
Whenever operation is adjusted, the position of sensor 7 with respect to the horizontal plane can reproduce, thus, it is possible to improve certainty of measurement.
Jin mono- Walk, the adsorbing mechanism 25 being equipped on base component 23 supports the width side of the substrate W when being conveying substrate W
To the mechanism of both ends E (reference picture 1), therefore, the adsorbing mechanism 25 is located at the base component 23 for carrying the adsorbing mechanism 25
On the position corresponding with the width both ends E of substrate W.Also, it is equipped on positioned at such position by by sensor 7
On base component 23 on, thus, it is not necessary to existing arm long as shown in Figure 6 is set, sensor 7 can be arranged on
The position corresponding with the width both ends 35 of nozzle 30, the structure for setting sensor 7 becomes simple.
Further, in the present embodiment, in order to be adjusted operation, the sensor 7 for being equipped on base component 23 is located at
Stop the injection from the compressed air of air jet part 26 during the state of the position of underface 30 of nozzle 30, sit base component 23
Fall within track 21.Therefore, as previously described, the dimensional accuracy that track 21 is with respect to the horizontal plane constituted is high, also, carries and be used for
The base component 23 of the adsorbing mechanism 25 of supporting substrate W is high also relative to the dimensional accuracy that horizontal plane is constituted, therefore, by making this
The base component 23 of sample is seated on track 21 in the position directly below of nozzle 30, is thus equipped on the sensing of the base component 23
Device 7 can be located at the underface of nozzle 30 with the state high of dimensional accuracy with respect to the horizontal plane.Therefore, in this condition, lead to
The height and position at the width both ends 35 of the measurement nozzle 30 of sensor 7 is crossed, thus, it is possible to improve its certainty of measurement.
In addition, the absorption of adsorbing mechanism 25 keeps the width both ends E of substrate W, but when being coated operation, nozzle
30 width end 35 is located at the top of the end E of substrate W.Therefore, if by by sensor 7 with adsorbing mechanism
25 configuration mode in the conveying direction side by side be equipped on base component 23 make the base component 23 moved along track 21 and
Sensor 7 is located at the underface of nozzle 30, then sensor 7 can be located at relative with the end 35 of the width of nozzle 30
On the position answered.Accordingly, it is capable to enough sensors 7 start to measure the height and position of nozzle 30 rapidly.
In addition, in fig. 4, the horizontal plane that will specify as datum level HO, according to the end for being capable of accurate measurement nozzle 30
The measuring instrument 9 of the mode setting sensor 7 of the height and position of 35 lower surface, but it is necessary to the setting again to tackle
The situation of consideration, the apparatus for coating 1 of present embodiment includes resetting mechanism.
As shown in figure 5, the replacement mechanism includes being arranged on reference component 40 on datum level HO and by the reference component 40
The reciprocating cylinder (not shown) of the assigned position being transported on datum level HO.In the present embodiment, datum level HO is outstanding
The upper surface 21a of floating platform 20.Reciprocating cylinder has the structure for carrying out linear telescopic action, if the reciprocating cylinder
Uphold, then reference component 40 is placed on the upper surface 20a of floating platform 20, if reciprocating cylinder shortens, by base
Quasi-component 40 retreats to retreating position.The retreating position is the position that reference component 40 does not constitute obstacle when operation etc. is coated
Put.
If the bottom surface 41 of reference component 40 is placed in the upper surface 20a of floating platform 20, the part of bottom surface 41 from
The width end of floating platform 20 protrudes, and can make the bottom surface of the front end of the contact shoe 8 of sensor 7 and the part of the protrusion
41 contacts.The bottom surface 41 of reference component 40 is horizontal plane, can make the upper surface 20a of the front end of contact shoe 8 and floating platform 20
It is highly consistent.Also, in the state of making its highly consistent, measuring instrument 9 resets the origin of sensor 7.Thus, passing
In sensor 7, the upper surface 20a of floating platform 20 is reset to datum level HO.As a result, needing to reset sensor 7
In the case of (measuring instrument 9), its operation can be rapidly carried out by resetting mechanism.
In addition, apparatus for coating of the invention is not limited to the mode of diagram, can be within the scope of the invention other
The apparatus for coating of mode.For example, the floating platform 20 of present embodiment is carried out on the situation for making substrate W suspend with air
Illustrate, but be not limited thereto, it is possible to use ultrasonic wave.In addition, the conveying of substrate W can also be in addition to suspension conveying
Other manner.In addition, sensor 7 is contact but it is also possible to be contactless.Further, as the end E of supporting substrate W
Supporting part, illustrate based on air attract adsorbing mechanism 25 but it is also possible to be other mode.
Further, in said embodiment, on suspension mechanism portion be spray air air jet part 26, by sky
Gas is illustrated the situation that base component 23 suspends, it is also possible to use other gases such as the nitrogen outside air.
In addition, base component 23 is contactless, i.e. relative to the composition of track 21, the composition in suspension mechanism portion is except base
Outside the composition of gas injection, it is also possible that such as magnetic suspension, supersonic wave suspended, electrostatic suspension etc..
In addition, in said embodiment, on making base component 23 be seated when on track 21, by exhaust air
The situation that stream 16 (reference picture 3) will residue in the discharging air outward (to atmosphere opening) of air jet part 26 is said
It is bright, but, in order that base component 23 is further promptly seated on track 21, it is empty that forced discharge (not shown) can be set
The suction device of the air in gas jet portion 26 (mattress 27).As suction device, it is possible to use pump, air blower etc., by this
A little suction devices are connected on exhaust air flow circuit 16 just can be with.Now, can be made by the negative pressure of suction device generation
Air jet part 26 (mattress 27) is adsorbed on track 21.
Or, in order that base component 23 is promptly located, base component 23 (at least one part) can be made into magnetic
Gonosome, such as in-built electrical magnet in track 21 makes base component 23 be adsorbed on track 21 by the magnetic force of the electromagnet.
Further, as other devices for making base component 23 promptly be located, can also be following composition, i.e. logical
The parts such as the reciprocating cylinders such as telescopic cylinder or the arm that is driven by motor are crossed, is applied to rail relative to base component 23
The external force in the direction of the upper surface 21a in road 21, base component 23 is urged on track 21.
Claims (3)
1. a kind of apparatus for coating, it is characterised in that including：
Conveying mechanism portion, substrate is conveyed to the conveying direction of level；
Coating mechanism portion, including nozzle and lifting drive division, coating fluid is discharged relative to the substrate from the nozzle, wherein,
The nozzle is set in long way on the width of the level perpendicular with the conveying direction, and relative to the base for being conveyed
Plate has a gap of short transverse and corresponding, and the lifting drive division makes the nozzle lift in the height direction；
Sensor, in order to adjust the posture of the nozzle with respect to the horizontal plane, measures the width both ends of the nozzle
Height and position,
Wherein, the conveying mechanism portion includes：
Track, is arranged on the width both sides of the substrate for being conveyed, and extends to the conveying direction；
Base component, moves along the track；
Supporting part, is equipped on the base component, when the substrate is conveyed, supports the width two ends of the substrate
Portion,
The sensor is together equipped on the base component with the supporting part,
The base component includes making the suspension mechanism portion of the base component suspension relative to the upper surface of the track, passes through
The suspension mechanism portion, the base component is moved relative to the track with the state for suspending,
When the height and position at width both ends of the nozzle is measured by the sensor, the pedestal is being equipped on
The sensor of part is located in the state of the underface of the nozzle, is released by the pedestal in the suspension mechanism portion
The suspension of part, thus makes the base component be seated on the track.
2. apparatus for coating according to claim 1, it is characterised in that the suspension mechanism portion is made up of ejection section, is passed through
The ejection section makes the base component suspend relative to the upper surface gas injection of the track.
3. apparatus for coating according to claim 2, it is characterised in that be seated on the track by the base component
When, the stream for making the gas for residuing in the ejection section outwards discharge is connected in the ejection section.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-054677 | 2012-03-12 | ||
| JP2012054677A JP6023440B2 (en) | 2012-03-12 | 2012-03-12 | Coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103301998A CN103301998A (en) | 2013-09-18 |
| CN103301998B true CN103301998B (en) | 2017-06-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310066873.8A Active CN103301998B (en) | 2012-03-12 | 2013-03-04 | Apparatus for coating |
Country Status (4)
| Country | Link |
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| JP (1) | JP6023440B2 (en) |
| KR (1) | KR102018506B1 (en) |
| CN (1) | CN103301998B (en) |
| TW (1) | TWI559365B (en) |
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| CN103736631B (en) * | 2013-12-10 | 2016-08-24 | 京东方科技集团股份有限公司 | A kind of slit type coater |
| CN105964454A (en) * | 2016-07-15 | 2016-09-28 | 张凤平 | Multifunctional pressurized horizontally-moving paint spraying working table |
| CN106076734B (en) * | 2016-07-20 | 2019-07-26 | 联德精密材料（中国）股份有限公司 | Automatic dispensing device and its dispensing method |
| CN106444110B (en) * | 2016-11-17 | 2023-08-29 | 合肥京东方光电科技有限公司 | Substrate support bar and method of applying antistatic liquid |
| JP6803120B2 (en) * | 2016-11-28 | 2020-12-23 | 東レエンジニアリング株式会社 | Origin detector and coating device |
| JP2018113327A (en) * | 2017-01-11 | 2018-07-19 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing apparatus |
| KR102641446B1 (en) * | 2017-07-19 | 2024-02-28 | 주식회사 탑 엔지니어링 | Dispenser |
| CN107649975B (en) * | 2017-10-11 | 2024-02-27 | 泉州市宏铭机械开发有限公司 | Automatic polishing machine for stone tablet |
| JP6817986B2 (en) * | 2018-08-30 | 2021-01-20 | 株式会社Ｓｃｒｅｅｎホールディングス | Stage measurement jig, coating device and stage measurement method |
| KR102154492B1 (en) * | 2020-04-03 | 2020-09-10 | 박옥경 | Construction method of interior materials |
| CN112742630B (en) * | 2020-12-23 | 2021-09-14 | 深圳市言九电子科技有限公司 | Production method and production line equipment of polymer battery |
| CN113877772A (en) * | 2021-11-09 | 2022-01-04 | 怀化华晨电子科技有限公司 | A adhesive deposite device for production of electronic component circuit board |
| CN115846112B (en) * | 2022-12-23 | 2023-08-01 | 佛山市南海区佳朗卫生用品有限公司 | Glue spraying mechanism for paper diaper, glue spraying composite device and use method |
| CN117548289B (en) * | 2024-01-09 | 2024-04-02 | 宁波欧达光电有限公司 | Preparation device for electromagnetic shielding photovoltaic module |
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| JPS61116965A (en) * | 1984-11-09 | 1986-06-04 | Mitsubishi Electric Corp | Pneumatic levitation linear conveyer |
| JP3278714B2 (en) * | 1996-08-30 | 2002-04-30 | 東京エレクトロン株式会社 | Coating film forming equipment |
| JP2002200450A (en) * | 2000-12-28 | 2002-07-16 | Chugai Ro Co Ltd | Non-contact movable table coater |
| JP4091378B2 (en) * | 2002-08-28 | 2008-05-28 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP4305918B2 (en) * | 2004-01-30 | 2009-07-29 | 東京エレクトロン株式会社 | Floating substrate transfer processing equipment |
| JP4570545B2 (en) * | 2005-09-22 | 2010-10-27 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| JP4662466B2 (en) * | 2005-10-06 | 2011-03-30 | 東京エレクトロン株式会社 | Coating film forming apparatus and control method thereof |
| JP4673180B2 (en) * | 2005-10-13 | 2011-04-20 | 東京エレクトロン株式会社 | Coating apparatus and coating method |
| JP4318714B2 (en) * | 2006-11-28 | 2009-08-26 | 東京エレクトロン株式会社 | Coating device |
| KR100919407B1 (en) * | 2008-01-28 | 2009-09-29 | 주식회사 탑 엔지니어링 | Liquid crystal dispensing apparatus |
| JP2011246213A (en) * | 2010-05-24 | 2011-12-08 | Olympus Corp | Substrate conveyance device |
| JP5608469B2 (en) * | 2010-08-20 | 2014-10-15 | 東京応化工業株式会社 | Coating device |
| CN102000652B (en) * | 2010-09-10 | 2013-03-13 | 深圳市华星光电技术有限公司 | Liquid crystal coating device and liquid crystal coating method |
| JP2012071268A (en) * | 2010-09-29 | 2012-04-12 | Dainippon Screen Mfg Co Ltd | Coating apparatus and coating method |
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2012
- 2012-03-12 JP JP2012054677A patent/JP6023440B2/en active Active
-
2013
- 2013-01-07 TW TW102100474A patent/TWI559365B/en active
- 2013-02-04 KR KR1020130012368A patent/KR102018506B1/en active IP Right Grant
- 2013-03-04 CN CN201310066873.8A patent/CN103301998B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130105332A (en) | 2013-09-25 |
| JP2013191604A (en) | 2013-09-26 |
| TW201338017A (en) | 2013-09-16 |
| CN103301998A (en) | 2013-09-18 |
| KR102018506B1 (en) | 2019-09-05 |
| JP6023440B2 (en) | 2016-11-09 |
| TWI559365B (en) | 2016-11-21 |
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