CN107824392A - Applying device and coating method - Google Patents
Applying device and coating method Download PDFInfo
- Publication number
- CN107824392A CN107824392A CN201710826731.5A CN201710826731A CN107824392A CN 107824392 A CN107824392 A CN 107824392A CN 201710826731 A CN201710826731 A CN 201710826731A CN 107824392 A CN107824392 A CN 107824392A
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- substrate
- nozzle
- coating
- carrying
- floats
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
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- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The present invention relates to a kind of applying device and coating method, shortens the pitch time of coating processing, and coating liquid is stably coated on into substrate.The applying device has：Float portion, so that the state of the interarea of substrate upward, makes substrate floating；Trucking department, the substrate that will be floated by floating portion, carried with board carrying speed to defined carrying direction；Nozzle, coating liquid is sprayed to the interarea for the substrate carried by trucking department, to be coated；And move portion, make the nozzle for spraying coating liquid, with the nozzle translational speed less than board carrying speed, moved to direction is carried.
Description
Technical field
The present invention relates to a kind of coating technology, while make substrate with its interarea upward come in the state of floating, with
Defined board carrying speed carries the substrate to direction is carried, while the interarea coating liquid coating to substrate.
Background technology
In the manufacturing process of the electronic units such as semiconductor device, liquid crystal display device etc., applied using to the surface of substrate
Apply the applying device of coating liquid.As such applying device, it is known that following device, i.e. blowing gas to the back side of substrate
In the state of making the substrate floating, while carry the substrate, while from be fixed in advance the gap nozzle of assigned position to this
The surface of substrate sprays coating liquid (equivalent to " interarea of substrate " of the present invention), so as to almost whole coating of substrates coating liquid
(with reference to Japanese Patent No. 5346643).
In the applying device of said structure, due to being fixed with gap nozzle, therefore coating speed is by the carrying speed of substrate
Degree limitation.Therefore, required pitch time is handled in order to shorten coating, such as the transporting velocity of raising substrate is effective, but
It is, if merely improving the transporting velocity of substrate, because substrate moves relative to gap nozzle at high speed, therefore from narrow
Stitch nozzle coating liquid supply can have little time carry out and it is insufficient, may substrate surface occur coating liquid scarce liquid, from
And it is difficult to coating liquid being stably coated on substrate.
The content of the invention
The present invention is to propose in view of the above problems, its object is to provide a kind of coating technology, can shorten coating
The pitch time of processing, and coating liquid can be stably coated on substrate.
The mode of the present invention is a kind of applying device, it is characterised in that is had：Float portion, so that the interarea of substrate
State upward, makes substrate floating；Trucking department, the substrate that will be floated by floating portion, with board carrying speed as defined in
Direction is carried to carry；Nozzle, coating liquid is sprayed to the interarea for the substrate carried by trucking department, to be coated；It is and mobile
Portion, make the nozzle for spraying coating liquid, with the nozzle translational speed less than board carrying speed, moved along direction is carried.
In addition, the other modes of the present invention are a kind of coating methods, while making substrate be floated upward with its interarea
In the state of rising, with defined board carrying speed along carrying direction carrying substrate, while to the interarea coating liquid coating of substrate,
The coating method is characterised by, while coating liquid is sprayed from nozzle to the interarea of substrate, while making nozzle to be removed less than substrate
The nozzle translational speed of running speed degree, moved along direction is carried.
As described above, according to the present invention, while to board carrying direction carrying substrate, while coating liquid is sprayed from nozzle,
Carry out the interarea coating liquid coating to substrate.Therefore, it is possible to the transporting velocity by improving substrate, to shorten the beat of coating processing
Time.If so only improving the transporting velocity of substrate, as described above, substrate improves relative to the translational speed of nozzle, apply
Applying speed can be excessive.As a result, it may occur however that the scarce liquid of coating liquid.
On the other hand, in the present invention, the carrying with substrate concurrently, makes the nozzle for spraying coating liquid, to be removed less than substrate
The nozzle translational speed of running speed degree, direction movement is carried to substrate identical.Therefore, even if improving board carrying speed,
Also can be while suppressing translational speed of the substrate relative to nozzle, i.e. it is excessive to suppress the coating speed of applying device, while to base
The interarea coating liquid coating of plate.The scarce liquid of coating liquid is prevented therefore, it is possible to one side, while shortening the pitch time of coating processing.
Brief description of the drawings
Figure 1A is the figure for an embodiment for showing the applying device of the present invention.
Figure 1B is from top view obtained from Figure 1A dismounting applying mechanisms.
Fig. 2 is the block diagram for showing the controlling organization for the applying device shown in control figure 1A.
Fig. 3 A are the top views for floating mechanism.
Fig. 3 B are to schematically illustrate the side view for floating the relation between mechanism and applying mechanism.
Fig. 4 is the side view of the applying device shown in Figure 1A.
Fig. 5 is the flow chart for showing the coating processing performed by the applying device shown in Figure 1A.
Fig. 6 is the timing diagram for the running-active status for showing each portion of device.
Fig. 7 A to Fig. 7 D are the figures of the position relationship in each portion in each stage for showing coating processing.
Wherein, description of reference numerals is as follows：
1 applying device
3 float mechanism (floating portion)
3A upstreams float unit (upstream floats portion)
3B centers float unit (precision floats portion)
3C downstreams float unit (downstream floats portion)
4 carrying mechanisms (trucking department)
9 control units
511 gap nozzles
511a ejiction openings
518 travel mechanisms (move portion)
Vn nozzle translational speeds
Vw board carrying speed
W substrates
Wf surfaces (interarea of substrate)
X carries direction
Embodiment
Figure 1A is the figure for an embodiment for showing the applying device of the present invention, is the vertical view from above vertical
Figure, in addition, Figure 1B is from top view obtained from Figure 1A dismounting applying mechanisms.In addition, Fig. 2 is to show the painting shown in control figure 1A
The block diagram of the controlling organization of coating apparatus.In addition, in each figure in Figure 1A, Figure 1B and subsequently illustrated, for each portion of clear and definite device
Configuration relation, using substrate W carrying direction as " X-direction ", by Figure 1A, Figure 1B level from left-hand side towards right-hand side
Direction is referred to as " +X direction ", and its opposite direction is referred to as into " -X direction ".In addition, in the horizontal direction Y orthogonal with X-direction, will
The face side of device is referred to as " -Y direction ", and the rear side of device is referred to as into " +Y direction ".In addition, by vertical Z
Top is referred to as " +Z direction ", and the lower section in vertical Z is referred to as into " -Z direction ".
Applying device 1 is a kind of narrow-gap type coating machine, receive by roller formula conveyer 100 carry Lai flat-hand position square
Shape substrate W, to substrate W surface Wf coating liquid coatings.In the applying device 1, provided with the phase of roller formula conveyer 100
Adjacent transfer mechanism 2.The transfer mechanism 2 receives substrate W from roller formula conveyer 100, floats mechanism 3 to transfer load to.
Floating mechanism 3 has three float unit 3A~3C.As shown in Figure 1B, these float unit 3A~3C is along substrate
W carrying direction X arrangements.Specifically, in most upstream side, i.e., -X direction side, floated provided with the upstream adjacent with transfer mechanism 2
Rise unit 3A, in most downstream side, i.e., +X direction side, provided with downstream float unit 3C.In addition, in upstream float unit 3A with
Between swimming float unit 3C, provided with central float unit 3B.
Fig. 3 A are the top views for floating mechanism, and Fig. 3 B are to schematically illustrate the relation floated between mechanism and applying mechanism
Side view.In addition, in the drawings, schematically illustrate central float unit 3B entirety and upstream float unit 3A and under
Swim a float unit 3C part.
It is the squit hole 31 of substantial amounts of air at one for upstream float unit 3A and downstream float unit 3C
The entire surface of the table top 32 of tabular disperses to form with rectangular.Moreover, by providing compressed air to each squit hole 31, by each
Squit hole 31 sprays compressed air and caused gas pressure, floats substrate W.Thus, in upstream float unit 3A and downstream
Float unit 3C, substrate W only float defined levitation height from the table top 32, such as only float 10~500 microns.In addition,
In order to supply compressed air to each squit hole 31, such as the structure described in Japanese Patent No. 5346643 can be used.
Though in addition, eliminate diagram in Fig. 3 A and Fig. 3 B, for the float unit 3C of downstream, except the spray
Portal beyond 31, also with multiple lifter pins and lifter pin elevating mechanism.Multiple lifter pins are arranged to, through squit hole 31
Hole, it is opposite with substrate W whole back side Wb at a prescribed interval.Moreover, the lifter pin liter of the lower section by being located at table top 32
Descending mechanism, lifting driving is carried out to lifter pin in vertical (Z-direction).That is, when declining, the top of lifter pin is to than under
The table top 32 for swimming float unit 3C more declines by -Z direction side, and when rising, the top of lifter pin, which rises to, to be used for substrate W
It is transferred to the position of shifting mechanical arm (diagram is omitted).Supported by the lifter pin after so rising and lift substrate W following table
Face, therefore substrate W from downstream float unit 3C table top 32 rise.Thereby, it is possible to unloaded by shifting mechanical arm from applying device 1
Substrate W.
On the other hand, central float unit 3B is formed as following, is floated to have than upstream float unit 3A with downstream
Rise unit 3C it is higher float precision.That is, central float unit 3B has the table top 33 of the tabular of rectangle.It is provided with the table top 33
Rectangular multiple holes are dispersed into, the gap ratio in the multiple hole is located at upstream float unit 3A and downstream float unit 3C spray
Portal 31 spacing it is narrower.In addition, at central float unit 3B. with upstream float unit 3A and downstream float unit 3C differently
In, the hole of half plays the squit hole 34a of compressed air effect, and a remaining half bore plays suction hole 34b effect.That is,
Compressed air is sprayed from squit hole 34a towards substrate W back side Wb, so as to the sky between table top 33 and substrate W back side Wb
Between SP (Fig. 3 B) be sent into compressed air；On the other hand, air is attracted from space S P via suction hole 34b.By so to described
Space S P carries out the ejection and attraction of air, in the space S P, the air stream of the compressed air sprayed from each squit hole 34a,
After being spread to horizontal direction, attracted by the suction hole 34b adjacent with squit hole 34a, thus, make to spread in the space S P
Air layer (pressed gas layer) pressure balance it is more stable, being capable of in high precision and stably control base board W levitation height.
In addition, in order to supply compressed air to each squit hole 34a and attract air from suction hole 34b, such as Japan can be used specially
Structure described in profit the 5346643rd.
In addition, in squit hole 34a and suction hole 34b arrangement architecture from other angles as above, can
It is defined as with following structure.That is, central float unit 3B floats with two kinds arranges 35a, 35b, described two to float row
The banding of 35a, 35b to extend along the orthogonal horizontal direction Y of the carrying direction X with substrate W, makes a substrate W part stable
Ground floats.Float row 35a by squit hole 34a, suction hole 34b, squit hole 34a ..., suction hole 34b and squit hole 34a, with
The order arranges form along the Y direction.On the other hand, row 35b is floated by suction hole 34b, squit hole 34a, suction hole
34b ..., squit hole 34a and suction hole 34b, arranged and formed along the Y direction with the order.Also, by these float row 35a,
35b is alternately arranged and obtains central float unit 3B along the X direction.Due to respectively float row 35a, 35b Y-direction size with
Substrate W Y-direction size is identical, or the Y-direction size slightly larger than substrate W, therefore can make substrate W stable in the Y direction
Ground floats.In contrast, the X-direction size for respectively floating row 35a, 35b is significantly less than substrate W X-direction size, thus it is difficult
Individually to make substrate W stably float in the X direction.Therefore, during the region for making substrate W stably float in the X direction is
Entreat float unit 3B central portion region.Therefore, such as it is discussed below, in the present embodiment, gap nozzle 511 will be made in X side
The scope (hereinafter referred to as " nozzle moving range ") moved up is limited to central float unit 3B central portion region.It is specific and
Speech, as shown in the dotted line in Fig. 3 A, float row 35a in second from the number of-X sides and second from the number of+X sides floats
The sandwiched nozzle movings range of 35b are arranged, gap nozzle 511 can move.
In applying device 1, in order to which the substrate W in the state floated by float unit 3A~3C is being carried into direction X
On intermittently carry, provided with carrying mechanism 4.Below, one side reference picture 1A, Figure 1B and Fig. 4, while explanation carrying mechanism 4
Structure.
Fig. 4 is the side view of the applying device shown in Figure 1A.Carrying mechanism 4 has following function, i.e. while attracting and protecting
The both side ends for being floated mechanism 3 and supporting the Y-direction of substrate W for float state are held, while keeping making using floating mechanism 3
In the case that state that substrate W floats is constant, along carrying direction X carrying substrates W.As shown in Figure 1B, carrying mechanism 4, which has, uses
Substrate W multiple clamp portions 41 are kept in absorption.Here, it is respectively arranged with a clamp portion in +Y direction side and -Y direction side
41, i.e. two clamp portions 41 altogether are provided with, wherein, the clamp portion 41 is that two clamper component 41a are arranged in the X direction
Form, and two clamper component 41a can be moved freely integratedly in the X direction, but can also be by each clamper component 41a
As clamp portion 41.In the present embodiment, two described clamp portions 41 are symmetrical (symmetrical in+Y sides and-Y sides)
Structure, adsorbed respectively in the left and right sides and keep substrate W.In addition, carrying mechanism 4 has handling gripper walking guide rail 42, conveying clamp
Have linear motor 43, handling gripper linear scale 44, fixture lift cylinder 45.Clamp portion 41 can pass through fixture lift cylinder 45
Action lifted.Therefore, fixture lift cylinder is made according to the holding instruction from the control unit 9 overall for control device
45 operating, thus, make clamp portion 41 rise support and adsorb holding+Y sides ,-Y sides substrate W both ends lower surface.
In addition, handling gripper walking guide rail 42 is extended along the X direction on the base station 10 of applying device 1, according to from control unit 9
Carrying instruction operate handling gripper linear motor 43, clamp portion 41 is being carried along handling gripper walking guide rail 42
Back and forth driven on the X of direction.Thus, the substrate W kept by clamp portion 41 is carried on direction X is carried.In addition, in this implementation
In mode, the position for the substrate W for carrying direction X can be detected by handling gripper linear scale 44, control unit 9 is based on conveying clamp
Have the testing result of linear scale 44, control is driven to handling gripper linear motor 43.
Using above-mentioned carrying mechanism 4, by substrate W with substrate W surface Wf towards the state above vertical, i.e., it is so-called
Face-up (face up) state, carried along direction X is carried, but in order to which coating liquid is coated on into base in the carrying
Plate W surface Wf, provided with applying mechanism 5.As shown in Figure 1A and Fig. 2, applying mechanism 5 has：Nozzle unit 51, can be relative to
Base station 10 moves along direction X is carried；The standby unit 52 of nozzle cleaning, the upstream of the nozzle unit 51 on direction X is carried
Side (Figure 1A left-hand side), is fixed on base station 10；Coating liquid feeding unit 58, coating liquid (reference picture is supplied to nozzle unit 51
2)。
As shown in figure 4, nozzle unit 51 has：Gap nozzle 511, its mode opposite with substrate W surface Wf, along
Y-direction is extended；Nozzle support member 512, it supports gap nozzle 511；Lifting unit 513, have in the Y direction than carrying
The structure of mechanism 4 more outward symmetrical (symmetrical in+Y sides and-Y sides).In this embodiment, a pair of liftings are utilized
Portion 513 makes gap nozzle 511 be lifted on vertical Z via nozzle support member 512, so as to adjust with substrate W's
The distance between surface Wf, i.e., coating gap.Specifically, each lifting unit 513 has：Cylindrical component 514；Ball screw
515, with the state extended parallel to along vertical Z, it is installed on cylindrical component 514；Rotation motor 516, is connected to ball
The upper end of screw rod 515；Support 517, screwed togather with ball screw 515.Then, make according to the rotation instruction from control unit 9
When rotation motor 516 operates, ball screw 515 rotates, and support 517 lifts according to the rotation amount on vertical Z.So
The +Y direction side of composition and the support 517 of -Y direction side, are separately installed with the both ends of nozzle support member 512, pass through nozzle
Supporting member 512 is liftably supported.
In addition, as shown in figure 4, each lifting unit 513 is carried out using the travel mechanism 518 of applying mechanism 5 on direction X is carried
Move back and forth.As shown in figure 4, the travel mechanism 518 has base portion 518a, the walking guide rail for supporting lifting unit 513 from below
518b and linear motor 518c.As shown in Figure 1A, Figure 1B, walking guide rail 518b on the base station 10 of applying device 1 along the X direction
It is extended, operates linear motor 518c according to the move from control unit 9, thus make lifting unit 513 along walking
Guide rail 518b is moved back and forth on direction X is carried, so as to be positioned at gap nozzle 511 together with lifting unit 513
Maintain position and ejection position.Here, " maintenance position " refers to, carries out including preparation ejection in the standby unit 52 of nozzle cleaning
The position of maintenance action, " ejection position " refers to, sprayed to substrate W the position of the action of coating liquid, i.e. center floats list
The position of first 3B surface.
In addition, making gap nozzle 511, from when maintaining position to be moved to ejection position, gap nozzle 511 is located at the spray
The upstream-most position (the coating starting position PS being discussed below) of mouth moving range.In addition, it is being coated as described later
During processing, travel mechanism 518 makes gap nozzle 511 be moved to +X direction according to the nozzle move of control unit 9,
While coating processing to a substrate W terminates, gap nozzle 511 is set to stop at the most downstream position of the nozzle moving range
Put (the coating end position PE being discussed below).Moreover, after coating processing terminates, travel mechanism 518 and lifting unit 513 cooperate with
Action, position is maintained to make gap nozzle 511 be moved to from ejection position.In this way, in the present embodiment, gap nozzle 511
While maintaining position, ejection position (the coating starting position PS of nozzle moving range) and ejection position, (nozzle moves model
The coating end position PE enclosed) between cyclically move, while be repeated coating processing.
State of the gap nozzle 511 with ejiction opening 511a downward, it is installed on the bottom of nozzle support member 512.
Therefore, it is possible to the control carried out by control unit 9 to rotation motor 516, lift gap nozzle 511, to make ejiction opening 511a
Close to the surface Wf for the substrate W for being handled upside down the carrying of mechanism 4, or separate upward on the contrary.That is, according to rotation motor 516
Drive control applies gap to adjust.
In addition, the output based on levitation height detection sensor described later (reference 53 in Fig. 3 B), control unit 9 are controlled
Rotation motor 516 processed, thus, it is possible to accurately adjust the interval between substrate W surface Wf and ejiction opening 511a.Moreover,
Ejiction opening 511a is close in the state of substrate W surface Wf, from coating liquid feeding unit 58 by coating liquid force feed to gap nozzle
When 511, the coating liquid is sprayed from ejiction opening 511a to substrate W surface Wf.In addition, in gap nozzle 511, it is provided with for protecting
Protect protection component (the reference 6B1 in Fig. 3 B), the levitation height detection sensor (reference in Fig. 3 B of nozzle tip
And vibrating sensor (the reference 6B2 in Fig. 3 B) 53).
The standby unit 52 of nozzle cleaning is from the top for the gap nozzle 511 that coating liquid has been supplied to substrate W surface Wf
Portion, resist liquid is cleaned to the device removed, by the cleaning treatment, the ejiction opening 511a of gap nozzle 511 is adjusted to applicable
In the state of ensuing coating processing.As shown in Fig. 3 B and Fig. 4, the standby unit 52 of the nozzle cleaning has cleaning standby unit
524, it is described cleaning standby unit 524 be mainly made up of roller 521, cleaning unit 522, roller groove 523 etc., come carry out nozzle cleaning and
Preparation sprays.In the cleaning standby unit 524, the ejiction opening 511a for having carried out the gap nozzle 511 after coating is handled is carried out clear
Wash.In addition, in the state of outer peripheral face of the gap nozzle 511 close to roller 521 is made, from coating liquid as defined in ejiction opening 511a ejections
When, the liquid that coating liquid is formed in ejiction opening 511a accumulates (preparation spray action).If so in ejiction opening 511a adequate reliefs
Accumulate into liquid, then the coating processing after can accurately carrying out.In this way, the ejiction opening 511a of gap nozzle 511 is entered
Row initialization, it is ready for ensuing coating processing.In addition, horse is rotated according to the rotation order-driven roller from control unit 9
Up to (diagram is omitted), rotate roller 521.In addition, be attached to for the coating liquid of roller 521, when roller 521 rotates, roller 521
Lower end be impregnated in the cleaning fluid of the storage in the roller groove 523, thus remove the coating liquid for being attached to roller 521.
As described above, in the present embodiment, make gap nozzle 511 close to substrate W surface Wf to be coated processing,
If therefore surface Wf has foreign matter, the collision between foreign matter and gap nozzle 511 may damage gap nozzle 511.If in addition,
The position of gap nozzle 511 is set to produce error because of the collision, then the coating processing after can not continuing.Therefore, exist
In present embodiment, in order to detect foreign matter existing for the surface Wf in substrate W, provided with two kinds of foreign matter detection mechanisms 6A, 6B.
Foreign matter detection mechanism 6A, the upstream side of the gap nozzle 511 for being arranged at applying mechanism on direction X is carried, with
Cordless detects the foreign matter, and foreign matter detection mechanism 6A has light-projecting portion 6A1 and light accepting part 6A2.As shown in Figure 1B,
Light-projecting portion 6A1 and light accepting part 6A2 is configured in a manner of clamping central float unit 3B from outside in the Y direction.Light-projecting portion 6A1 and
Light accepting part 6A2 is separately mounted to the upper of the supporting member (diagram is omitted) erected from the upper surface of base station 10 along vertical Z
End, adjust light-projecting portion 6A1 and light accepting part 6A2 height and position.Specifically, as shown in Figure 3 B, light-projecting portion 6A1 and light
Portion 6A2 is configured to, and is passed through from the laser of light-projecting portion 6A1 irradiations on substrate W surface Wf to inject light accepting part 6A2.Also, light projector
Portion 6A1 irradiates laser towards light accepting part 6A2.On the other hand, light accepting part 6A2 receives the laser that light-projecting portion 6A1 is irradiated, and measurement should
Light income exports to control unit 9.Then, control unit 9 carries out foreign bodies detection based on the light income.
Another foreign matter detection mechanism 6B detects the foreign matter with the way of contact, in present embodiment, is installed on coating machine
The gap nozzle 511 of structure 5.Foreign matter detection mechanism 6B has：Component 6B1 is protected, the ejiction opening 511a's on direction X is carried is upper
Side is swum, is installed on gap nozzle 511；Vibrating sensor 6B2, detect the vibration of gap nozzle 511.Protection component 6B1 be in order to
The board member protected the nozzle tip of gap nozzle 511 and be extended along horizontal direction Y, plate face and substrate W surface Wf
It is orthogonal.Therefore, in the position directly below carrying substrate W of nozzle unit 51, in the case of foreign matter being present on substrate W, structure is protected
The breakage of gap nozzle 511 caused by the nozzle tip and abnormal contact of part 6B1 suppression gap nozzles 511.In addition, exist
In the case of foreign matter, component 6B1 and abnormal contact are protected and protection component 6B1 vibrates, and be delivered to gap nozzle
511.Vibrating sensor 6B2 detects the vibration to be exported to control unit 9.Then, control unit 9 carries out foreign matter inspection based on the vibration
Survey.In addition, in gap nozzle 511, in addition to the foreign matter detection mechanism 6B, levitation height detection sensor 53 is additionally provided with,
The levitation height detection sensor 53 than protection component 6B1 earlier into substrate W upper area position, with non-contact
Mode detects substrate W levitation height.By the levitation height detection sensor 53, the substrate W floated and center can be determined
Separating distance between the upper surface of float unit 3B table top 33, the detected value can be based on, slit is adjusted by control unit 9
The position that nozzle 511 declines.In addition, optical sensor, ultrasonic sensor etc. can be used, it is used as levitation height inspection
Survey sensor 53.
In this way, in the present embodiment, two kinds of foreign matter detection mechanisms 6A, 6B can be set, to carry out foreign matter inspection exactly
Survey.Moreover, when carrying out foreign bodies detection, control unit 9 forcibly stops substrate W carrying, so as to prevent gap nozzle in advance
511 breakage and substrate W damage etc..
As described above, control unit 9 has the function in each portion of device of control applying device 1.It is provided with the control unit 9：
CPU (central processing unit) 91, performs processing routine set in advance, to control the action in each portion；Memory 92, for store and
Preserve the processing routine performed by CPU91, the data generated in processing etc.；Display part 93, as needed, by the carry out shape of processing
Condition, foreign bodies detection etc. report user.Moreover, in applying device 1, CPU91 carries out as follows according to processing routine to each portion of device
Control, is thus coated processing.
Fig. 5 is the flow chart for showing the coating processing that the applying device shown in Figure 1A performs.In addition, Fig. 6 is to show device
The timing diagram of the running-active status in each portion.Further, Fig. 7 A to Fig. 7 D are the positions in each portion in each stage for showing coating processing
The figure of relation.Coating processing shown in Fig. 5 is, after untreated substrate W is received from roller formula conveyer 100, while to+X
Direction carries out floating carrying to substrate W, is applied while spraying coating liquid to substrate W surface Wf from gap nozzle 511 to be formed
Coating.CPU91 performs the processing routine that prestores to control each portion, so as to carry out the coating processing.
After coating instruction is provided to control unit 9, transfer mechanism 2 receives substrate W from roller formula conveyer 100, transfers load to
Float unit 3A (step S101).In addition, control unit 9 obtains the various information for the relevant coating processing that coating instruction is included,
That is, the coating such as substrate size, board carrying speed condition, based on these information, the gap nozzle 511 of computing nozzle moving range
Translational speed (hereinafter referred to as " nozzle translational speed ") reasonable value (step S102).Because in the present embodiment,
As described later, to +X direction carrying substrate W, on the other hand, make gap nozzle 511 to +X direction with the carrying speed less than substrate W
The nozzle translational speed of (hereinafter referred to as " board carrying speed ") is spent, is moved in nozzle moving range, so as in substrate W table
Face Wf almost coating liquid coating in entire surface.That is, because, employ in the present embodiment it is following in the prior art
Unexistent unique technology, i.e. make substrate W and gap nozzle 511 be moved to identical +X direction, and while moved with substrate
Dynamic speed is compared, and the relative velocity for suppressing substrate W and gap nozzle 511 is coating speed, while being coated processing.In addition,
For the details of the nozzle translational speed set in step S102, will be described in detail below.
In next step S103, carry out preparing ejection in the standby unit 52 of nozzle cleaning.The preparation spray be, make it is narrow
Stitch nozzle 511 close in the state of the outer peripheral face of roller 521, from ejiction opening 511a spray as defined in coating liquid action, thus, such as
Shown in Fig. 7 A, the liquid that coating liquid is formed in ejiction opening 511a accumulates LD.If so it is formed uniformly liquid in ejiction opening 511a
Accumulate LD, then the coating processing after can accurately carrying out.So as to be carried out just to the ejiction opening 511a of gap nozzle 511
Beginningization, terminate the preparation of ensuing coating processing.
Then, acted according to the move from control unit 9, lifting unit 513 and travel mechanism 518, to make
Gap nozzle 511 makes ejiction opening 511a (Fig. 3 B) towards positioning (step S104) below vertical to coating starting position PS movements.
In addition, with the movement of gap nozzle 511 simultaneously, or before and after the movement of gap nozzle 511, according to from control unit 9
Carrying instruction, carrying mechanism 4 make substrate W to +X direction carry, the region that should initially apply in substrate W surface Wf
During positioned at coating starting position PS, stop carrying substrate (step S105).So as to as shown in Figure 7 B, when gap nozzle 511 and base
At the end of the positioning all that plate W is carried out to coating starting position PS, as shown in Fig. 6 and Fig. 7 B to Fig. 7 D, processing (step is coated
Rapid S106).In addition, with coating processing concurrently, transfer mechanism 2 receives next substrate W from roller formula conveyer 100, transfers load to
Float unit 3A (step S107), prepare next coating processing.
(at the time of t1 in Fig. 6) is carved at the beginning of coating is handled, as shown in Figure 7 B, gap nozzle 511 and substrate W positioning
In coating starting position PS, board carrying speed and nozzle translational speed are zero, and gap nozzle 511 is located at substrate W surface
Wf position directly above.In addition, make gap nozzle 511 close to substrate W using lifting unit 513.(slit sprays in coating gap now
The distance between ejiction opening 511a and substrate W surface Wf of mouth 511) it is value GP1, so make the close shapes of ejiction opening 551a
Under state, within the stipulated time (moment t1~t2), control unit 9 controls coating liquid feeding unit 58, to the force feed of gap nozzle 511
The coating liquid of ormal weight, so as to form fluid passage B (liquid on substrate W accumulates).
Then, in subsequent time t2, start to +X direction carrying substrate W, and gap nozzle 511 starts to move to +X direction
It is dynamic.In addition, the value in coating gap brings up to GP2 from GP1, and to the force feed coating liquid of gap nozzle 511, from ejiction opening 511a with
Spray volume M1 mode is averagely sprayed in unit interval, sprays the coating liquid to substrate W surface Wf.
In the present embodiment, preset nozzle translational speed Vn in step S102 and be less than board carrying speed Vw, will
Substrate W to +X direction relative to the relative velocity V of gap nozzle 511 (=Vw-Vn), to carry.Therefore, as seen in figure 7 c, with
The process of time, the one side of gap nozzle 511 is moved to +X direction, is applied while being formed with relative velocity V in substrate W surface Wf
Coating CL.I.e., in the present embodiment, coating speed is less than board carrying speed Vw.
Then, in due in t3, coating liquid stops spraying, and substrate W carrying and the shifting of gap nozzle 511
It is dynamic also to stop together.As illustrated in fig. 7d, now, the region that should finally apply in substrate W surface Wf and gap nozzle 511
Positioned at coating end position PE, coating processing terminates.In this way, in the present embodiment, even if with faster board carrying speed
Vw carrying substrate W, it can also be moved by making gap nozzle 511 be moved to +X direction with nozzle smaller than board carrying speed Vw
Speed so much dynamic speed Vn, coating liquid is coated on to substrate W surface Wf.That is, in the step S102, that can carry out
The mode of coating processing, based on coating conditional operation nozzle translational speed Vn.
Fig. 5 is returned, goes on to say the action of applying device 1.As described above, at the end of coating processing (step S106),
Gap nozzle 511 moves (step S108) from coating end position PE to the standby unit 52 of nozzle cleaning.On the other hand, it is coated with
Overlay CL substrate W is taken out of (step S109) as following.That is, after substrate W is carried to downstream float unit 3C,
Lifter pin (diagram is omitted) is set to increase, so as to lift substrate W from downstream float unit 3C table top 32.Further, by transfer
Manipulator (diagram is omitted) takes out of substrate W from applying device 1.
Here, using transfer mechanism 2 by next untreatment base W transfer load to float unit 3A come it is standby when (step
It is "Yes" in S110), whether the coating condition of the substrate W in step S111 confirms that this is standby is carried out from the coating condition of last time
On the basis of change, a series of above-mentioned processing are repeated.That is, (it is in step S111 in the case of coating condition change
"Yes"), return to step S102, on the other hand, in the case where coating condition does not change (being "No" in step S111), return
Step S103, above-mentioned processing is repeated.
As described above, in the present embodiment, as shown in Fig. 6, Fig. 7 C and Fig. 7 D, make the one side of gap nozzle 511 with small
In board carrying speed Vw nozzle translational speed Vn, to board carrying direction, i.e., +X direction identical direction move, one
While it is coated processing.Therefore, it is even if also small with fast speed carrying substrate W, the coating speed (=Vw-Vn) of applying device 1
In board carrying speed Vw, therefore a problem that can avoid occurring lacking liquid, shorten pitch time.
Here, being clearly described action effect, reference picture 6, the embodiment party is illustrated by the contrast with prior art
The advantage of formula.As shown in the single dotted broken line in Fig. 6 the superiors' curve map, gap nozzle 511 is being fixed with the prior art,
In order to prevent the generation of above-mentioned unfavorable condition, it has to which the substrate being set smaller than board carrying speed in present embodiment is removed
Running speed degree Vw speed Vw0, therefore it is not avoided that pitch time is elongated.It is in addition, even if board carrying of the prior art is fast
Degree be set as with the board carrying speed Vw identical values in present embodiment, but in order to prevent lack liquid a problem that send out
It is raw, as shown in Fig. 6 single dotted broken line from top in the 3rd curve map, it has to which coating gap is being set smaller than into this
In the state of the coating clearance G P0 of coating clearance G P2 in embodiment, high speed carrying substrate W, so as to produce gap nozzle
511 and substrate W exposure risk becomes the problem of big.In addition, as shown in the single dotted broken line in Fig. 6 orlop curve map, also examine
Consider by the way that the spray volume of the coating liquid averagely sprayed in the unit interval is increased into the amount M0 more than amount M1, to tackle scarce liquid etc. no
Good situation, but the consumption quantitative change of coating liquid can be made big, so as to produce the other problemses that operating cost uprises.On the other hand, according to this
Embodiment, above mentioned problem will not occur, processing can be coated stably and with short pitch time.In addition, this implementation
The applying device 1 of mode, the usage amount of coating liquid can be reduced, it is largely effective in terms of environmental protection.
In this way, in the present embodiment, substrate W surface Wf is equivalent to " interarea of substrate " of the invention.In addition, float
Mechanism 3 and float unit 3A~3C be respectively equivalent to the present invention " floating portion ", " upstream floats portion ", " precision floats portion " with
And one of " downstream floats portion ".In addition, carrying mechanism 4 and travel mechanism 518 are respectively equivalent to " trucking department " of the present invention
And one of " move portion ".In addition, " carrying direction " of the +X direction equivalent to the present invention.
In addition, the present invention is not limited to described embodiment, can be carried out in the case of without departing from the spirit above-mentioned
Various changes beyond content.For example, in the above-described embodiment, nozzle moving range is set as the dotted line institute such as Fig. 3 A
Show, but nozzle moving range is not limited to this, may be set in part more in the inner part.
In addition, in the above-described embodiment, whenever the change of the condition of coating, based on coating conditional operation nozzle translational speed
(step S102), but can also following manner form, i.e. nozzle translational speed is obtained in advance to each substrate W and is stored in control
In portion 9 processed, nozzle translational speed is set to each substrate W without carrying out operational process.
The present invention can be applied to following coating technology comprehensively, i.e. make substrate by interarea upward in a manner of float
In the state of rising, the substrate is carried with defined board carrying speed along direction is carried, and apply to the interarea of the substrate
Apply coating liquid.
Claims (4)
- A kind of 1. applying device, it is characterised in thatHave：Float portion, so that the state of the interarea of substrate upward, makes the substrate floating；Trucking department, by by the substrate for floating portion and floating, carried with board carrying speed along defined direction of carrying；Nozzle, coating liquid is sprayed to the interarea for the substrate carried by the trucking department, to be coated；AndMove portion, make the nozzle for spraying the coating liquid, to move speed less than the nozzle of the board carrying speed Degree, moved along the carrying direction.
- 2. applying device according to claim 1, it is characterised in thatIt is described to float portion and have：Precision floats portion,Upstream floats portion, in the upstream side in the carrying direction, floats portion with the precision and is disposed adjacent,Downstream floats portion, in the downstream in the carrying direction, floats portion with the precision and is disposed adjacent；Float portion using the upstream and what the downstream floated that portion floats the substrate floats precision, less than utilizing the precision Float that portion floats the substrate floats precision；The move portion is while the nozzle and the precision is floated portion opposite, while moving the nozzle.
- 3. applying device according to claim 2, it is characterised in thatThe move portion while make the nozzle float on the carrying direction with the precision portion central portion it is opposite, on one side Move the nozzle.
- 4. a kind of coating method, while making substrate in the state of floating, be removed with its interarea with defined substrate upward Running speed degree carries the substrate along direction is carried, while to the interarea coating liquid coating of the substrate, the feature of the coating method It is,While the coating liquid is sprayed from nozzle to the interarea of the substrate, while making the nozzle with less than the board carrying The nozzle translational speed of speed, moved along the carrying direction.
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| JP2016180155A JP2018043200A (en) | 2016-09-15 | 2016-09-15 | Coating applicator and application method |
| JP2016-180155 | 2016-09-15 |
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| CN110676192A (en) * | 2018-07-03 | 2020-01-10 | 株式会社斯库林集团 | Substrate processing apparatus and substrate processing method |
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| JP6831406B2 (en) * | 2019-02-08 | 2021-02-17 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating device and coating method |
| JP6896008B2 (en) * | 2019-03-19 | 2021-06-30 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing equipment and substrate processing method |
| JP7301385B2 (en) | 2020-10-23 | 2023-07-03 | 株式会社井元製作所 | coating machine |
| JP7316331B2 (en) * | 2021-09-02 | 2023-07-27 | 株式会社Ｓｃｒｅｅｎホールディングス | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
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