CN103301998A - Coating device - Google Patents
Coating device Download PDFInfo
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- CN103301998A CN103301998A CN2013100668738A CN201310066873A CN103301998A CN 103301998 A CN103301998 A CN 103301998A CN 2013100668738 A CN2013100668738 A CN 2013100668738A CN 201310066873 A CN201310066873 A CN 201310066873A CN 103301998 A CN103301998 A CN 103301998A
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- base component
- nozzle
- substrate
- width
- sensor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C13/00—Means for manipulating or holding work, e.g. for separate articles
- B05C13/02—Means for manipulating or holding work, e.g. for separate articles for particular articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
- B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides a coating device which coats a substrate to be conveyed and improves measurement precision at the height positions of two ends in the width direction of a nozzle which is measured by a sensor. The coating device comprises the following components: a conveying mechanism part (2) which conveys a substrate (W) in a horizontal conveying direction; a coating mechanism part (3) which comprises a nozzle (30) that is longer in the width direction and corresponds with the conveyed substrate; and a sensor (7) which measures the height positions of the two ends (35) of the nozzle in the width direction for adjusting the gesture of the nozzle relative to a horizontal surface; wherein, the conveying mechanism part comprises the following components: a rail (21) which extends in the conveying direction; a base component (23) which moves along the rail; and an absorption mechanism (25) which is carried on the base component and supports two ends (E) of the substrate when the substrate is conveyed, wherein the sensor and the absorption mechanism are carried on the base component together.
Description
Technical field
The present invention relates to coating fluid is coated apparatus for coating on the substrate that is transferred.
Background technology
Using the substrate that is formed with pixel, circuit pattern etc., such substrate at the flat-panel monitors such as liquid crystal display, solar panel etc. is to make by the photoetching technique of utilizing painting erosion resistant agent liquid (coating fluid) for example to carry out.
In addition, the device as coating fluid being coated on substrate has disclosed following apparatus for coating, and this device comprises: platform is used for the substrate level is fixed; Nozzle is formed with long finedraw mouth in inside on width; According to this apparatus for coating, discharge coating fluid from the finedraw mouth when substrate on the platform being made nozzle move to horizontal direction, thus, can form the coated film that is formed by coating fluid at substrate surface.In addition, when discharging coating fluid from the finedraw mouth, be in the state in the gap that is provided with short transverse between substrate and the nozzle (finedraw mouth), therefore, in order to regulate the value in this gap, nozzle consists of according to liftable mode.
In order to be coated with operation by such apparatus for coating, and improve the quality (making uniform film thickness) of the coated film that forms on the substrate, nozzle need to be parallel with substrate (horizontal plane), and make the gap between nozzle and the substrate constant on width.For this reason, on the position corresponding with the width both ends of nozzle, the end of platform, sensor is set respectively.And, make nozzle move to the top of these sensors to horizontal direction, obtain height poor at the width both ends of nozzle by these sensors, and regulate the postures such as its inclination by the lifting nozzle according to this difference in height.Thus, can make nozzle be in level, and make the clearance constant between nozzle and the substrate.
So, take the apparatus for coating of the mode that nozzle moves in platform upward horizon direction, do not need to arrange other device, than the sensor that is easier to be provided for regulating the nozzle posture, but during the apparatus for coating of the mode that to take nozzle be oscilaltion and substrate is transferred to horizontal direction, can't directly adopt the structure of the sensor.
The prior art document
Patent documentation
Patent documentation 1 JP 2005-244155 communique (with reference to Fig. 2)
Summary of the invention
Therefore, when taking the apparatus for coating of mode that substrate is carried to horizontal direction, as shown in Figure 6, can expect following structure: the arm 93 that extend the end 92 of 91 width is set from pillar 90 to nozzle, front end sensor installation 94 at this arm 93, wherein, pillar 90 forms the guide that makes lifting body 95 liftings that nozzle 91 is installed.But, there is following problem this moment, arm 93 is long, and, the unit (not shown) that is used for cleaning (initializations) nozzle 91 moves and during close to nozzle 91, the part of this unit and arm 93 interfere to nozzle 91, so for fear of the such situation of generation, need to be exquisite to doing in shape of arm 93 or unit, thus the structure complicated.
If the shape of arm 93 or unit is done exquisite, then sensor 94 can be arranged on nozzle 91 width end 92 under, but in order to ensure the high certainty of measurement based on sensor 94, arm 93 just must possess high rigidity.But if make its sectional area become large for the rigidity that improves arm 93, then the interference of arm 93 and unit just becomes further serious.In contrast, for anti-stop element with arm 93 interferes and arm 93 is attenuated, then the rigidity of arm 93 descends, thereby the support of sensor 94 is become unstable and is difficult to carry out correct measurement.
Therefore, the objective of the invention is, in the apparatus for coating that the substrate that is transferred is coated with, improve certainty of measurement with the height and position at the width two ends of the nozzle of sensor measurement by simple structure.
(1) apparatus for coating of the present invention is characterized in that, comprising: conveying mechanism section, carry substrate to horizontal direction; Coating mechanism section, comprise nozzle and lifting drive division, discharge coating fluid with respect to described substrate from described nozzle, wherein, described nozzle is being in long way setting on the width of vertical level with described throughput direction, and the gap that has short transverse with respect to the substrate that is transferred is and corresponding, and described lifting drive division makes the lifting on short transverse of described nozzle; Sensor in order to regulate the posture of described nozzle with respect to the horizontal plane, is measured the height and position at the width both ends of described nozzle, wherein, described conveying mechanism section comprises: track is arranged on the width both sides of the substrate that is transferred, and extends to described throughput direction; Base component is along described rail moving; The support portion is equipped on the described base component, when carrying described substrate, supports the width both ends of described substrate, and described sensor and described support portion together are equipped on the described base component.
According to the present invention, for substrate is carried to the throughput direction of level by conveying mechanism section, track dimensional accuracy with respect to the horizontal plane is high, and, also with respect to the horizontal plane dimensional accuracy is high carry to be used for to support the base component of support portion of this substrate, and with under the state that keeps level accurately along rail moving.Therefore, be equipped on such base component by sensor, also precision is high with respect to the horizontal plane the installation site of sensor thus, and by this sensor height and position at the width both ends of gaging nozzle accurately.In addition, the support portion is the device that supports the width both ends of this substrate when conveying substrate, so support portion and the base component that carries this support portion are positioned on the position corresponding with the width both ends of substrate.In addition, by carrying sensor being positioned at so locational base component, thus, do not need long-armed such as prior art, can sensor be set in the position corresponding with the width both ends of nozzle, thereby the structure that sensor is set becomes simple.
(2) in addition, preferably, described base component comprises the suspension mechanism section that makes described base component suspension with respect to the upper surface of described track, by this suspension mechanism section, described base component moves with the state that suspends with respect to described track, at this moment, base component can successfully move along track.
(3) and, preferably, the apparatus for coating of record is when the height and position at the width both ends of passing through the described nozzle of described sensor measurement in described (2), the described sensor that is equipped on described base component be positioned at described nozzle under state under, remove the suspension by the described base component of described suspension mechanism section, described base component is seated on the described track.
At this moment, as previously described, track with respect to the horizontal plane dimensional accuracy is high, and, also with respect to the horizontal plane dimensional accuracy is high for base component, therefore, be seated on the track by making such base component, be equipped on thus sensor on this base component can be positioned at the state that with respect to the horizontal plane dimensional accuracy is high nozzle under.Therefore, under this state, sensor can improve certainty of measurement thus by the height and position at the width both ends of gaging nozzle.
(4) preferably, described suspension mechanism section is made of injection section, with respect to the upper surface gas jet of described track described base component is suspended by described injection section.
At this moment, suspend by come to make base component from injection section gas jet, and, can remove this suspension by stopping this injections, these switch easy.
(5) in addition, preferably, in described (4) in the apparatus for coating of record, when being seated described base component on the described track, make residue in described injection section gas outwards the stream of discharging be connected in the described injection section.
Even will stop from the injection of the gas of injection section so that base component is seated on the track by control device, if but air residual is in air injection section, then the base component parts still are in the state of suspension, base component is seated on the track, but, according to this stream, can prevent such defective.As a result, during the height and position at the width two ends by the described nozzle of described sensor measurement, can make the height and position of base component keep constant (can guarantee repeatability) at every turn.
According to the present invention, because sensor is equipped on the high base component of with respect to the horizontal plane dimensional accuracy, therefore, by this sensor height and position at the width both ends of gaging nozzle accurately.In addition, by sensor is equipped on the base component, thus, do not need long-armed such as prior art, can be with sensor setting on the position corresponding with the width both ends of nozzle, the structure that is used for arranging sensor become simple.
Description of drawings
Fig. 1 is the stereogram of the summary formation of expression apparatus for coating of the present invention;
Fig. 2 is for seeing the figure of track, mobile unit, floating platform and nozzle from throughput direction;
Fig. 3 supplies with the figure that uses air flow circuit with air flow circuit and exhaust for explanation;
Fig. 4 is the figure of explanation sensor;
Fig. 5 is the figure of explanation reset mechanism;
Fig. 6 is the figure of the existing apparatus for coating of explanation.
The drawing reference numeral explanation
1 apparatus for coating
2 conveying mechanism sections
3 coating mechanism sections
4 control device
7 sensors
16 exhaust streams
21 tracks
The 21a upper surface
22 mobile units
23 base components
25 adsorbing mechanisms (support portion)
26 injection sections (suspension mechanism section)
30 nozzles
32 lifting drive divisions
35 ends
The E end
The W substrate
The specific embodiment
Below, the accompanying drawings embodiments of the present invention.
Fig. 1 is the stereogram of the summary formation of expression apparatus for coating 1 of the present invention.This apparatus for coating 1 is for the apparatus for coating of the liquid coating fluid such as the laminal substrate W coating liquid in carrying or resist liquid, comprising: conveying mechanism section 2, carry substrate W to the horizontal feed direction; Coating mechanism section 3 has nozzle 30, discharges coating fluid from this nozzle 30 to the substrate W that is transferred by this conveying mechanism section 2.Further, this apparatus for coating 1 comprises control device 4, and this control device 4 is made of computer, is used for the action of control conveying mechanism section 2 and coating mechanism section 3.This apparatus for coating 1 is that substrate W is with respect to the device of the nozzle 30 that is in stationary state to the horizontal direction mode of movement.In addition, in the present embodiment, the throughput direction of substrate W as directions X, is vertical horizontal direction (Y-direction) as width with this directions X.And, be vertical Z direction as short transverse with directions X and Y-direction.
The conveying mechanism section 2 of present embodiment comprises: floating platform 20 suspends by make substrate W from upper surface gas jet (air); Track 21 is arranged on the width both sides of this floating platform 20; Mobile unit 22, support moves horizontally along track 21 by the width end E of the substrate W of floating platform 20 suspensions.In addition, because track 21 is arranged on the width both sides, therefore, mobile unit 22 also is arranged on the width both sides.
Floating platform 20 is divided into a plurality of parts, comprises a plurality of platforms unit that is arranged side by side to throughput direction.The width size of floating unit 20 is less than the left and right directions size of substrate W, and the width end E of substrate W is the state of giving prominence to from floating platform 20.The air mass flow (injection intensity) of spraying is controlled by control device 4, and by this control substrate W is suspended with the posture of level.The datum level H0(that regulates operation that the upper surface 20a of this floating platform 20 will become in rear explanation is with reference to Fig. 4), therefore, floating platform 20 is set accurately, so that this upper surface 20a becomes horizontal plane.
Adsorbing mechanism 25 absorption is transported to the upstream side of floating platform 20 and below the end E of the substrate W that suspends, and in the situation that keep this adsorbed state, the base component 23 that carries this adsorbing mechanism 25 moves to the downstream according to the control of control device 4 and by linear motor 24.Thus, substrate W is carried by straight line to horizontal direction.In addition, adsorbing mechanism 25 is separately positioned on the left and right sides of floating platform 20, and along the end E of substrate W one side, the mode that has predetermined distance according to fore-and-aft direction is provided with many (being three in the present embodiment).Many the adsorbing mechanisms 25 of one side all are equipped on the identical base component 23, and move as a whole.
Fig. 2 is the figure of track 21, mobile unit 22, floating platform 20 and the nozzle 30 seen from throughput direction.As previously described, the cross section of track 21 is rectangle, and, base component 23 comprises the upper side member parallel with the upper surface 21a of this track 21 11 and from the width both sides of this upper side member 11 to the side member 12,13 of downward-extension, and has for the top of track 21 cross sectional shape that surrounds of side and width both sides from it.
In addition, base component 23 comprises the suspension mechanism section that in non-contacting mode this base component 23 is suspended with respect to the upper surface 21a of track 21, the suspension mechanism section of present embodiment be with respect to track 21 above the air injection section 26 of 21a injection air (compressed air).Air injection section 26 is installed on the upper side member 11, is provided with two at width in the present embodiment.In addition, on throughput direction, also be arranged side by side a plurality of air injection section 26.Air injection section 26 has mattress 27 in its underpart, spray compressed air from these mattress 27 interior upper surfaces 21 to track 21, and this mattress 27 is the state that slightly suspends from upper surface 21a, namely is non-contacting state.In addition, mattress 27 can be made of such as Porous carbon, pottery, sintering metal etc.This suspension amount, namely compressed-air actuated emitted dose is to control by control device 4.By these air injection sections 26, base component 23 can move along track 21 with the state that suspends with respect to track 21.
In addition, as shown in Figure 3, in the air injection section 26 except the supply that is connected with that pump 17 as compressed-air actuated supply source connects and compressed air is supplied with to mattress 27 with the air flow circuit 15, also be connected with air sprayed the 26(of section mattress 27) in the exhaust of outwards discharging (to atmosphere opening) of residual air with air flow circuit 16.And, be provided with valve 17 at the stream of pump one side (upstream side) of all air injection sections 26, can select by this valve 17 supply that is connected with this air injection section 26 with air flow circuit 15 and exhaust with the arbitrary air flow circuit in the air flow circuit 16.This selection (switching of valve 17) is to transmit control signal to realize to valve 17 by control device 4., select to supply with air flow circuit 15 during conveying substrate W in order to be coated with operation, select exhaust with the situation of air flow circuit 16 explanation to be arranged in the back, when nozzle 30 posture of regulating with respect to the horizontal plane, select exhaust air flow circuit 16.
According to Fig. 1 coating mechanism section 3 is described.As previously described, coating mechanism section 3 has long nozzle 30 on width.Nozzle 30 is installed on the width on the long lifting body 34.In nozzle 30, be formed with finedraw mouth 31 at the width of total length almost, and finedraw mouth 31 is in front end (lower end) upper shed of nozzle 30.Supply with coating fluids to nozzle 30, and in conveying substrate W, discharge coating fluids from finedraw mouth 31, thus, can be coated with coating fluid on the width with respect to the almost total length of substrate W.And the front end of nozzle 30 is gap with short transverse and corresponding state with respect to the substrate W that is transferred.
According to above conveying mechanism section 2 and coating mechanism section 3, substrate W is from the state of the upper surface suspension specified altitude of floating platform 20, and under this state, the lower surface of the width end E of substrate W is adsorbed by adsorbing mechanism 25.The base component 23 that carries this adsorbing mechanism 25 moves horizontally along track 21, and substrate W is transferred to horizontal direction thus, carries in the way at this, discharges coating fluid and forms coated film from nozzle 30 with respect to substrate W upper surface.
In addition, be provided with pillar 33 as the part of coating mechanism section 3 in the width both sides, the lifting body 34 of nozzle 30 be installed to be set up across the mode between the pillar 33,33.Pillar 33 also has when having the function at width both ends of supporting elevation body 34 as the function of the guide of direction induction lifting body 34 up and down.And coating mechanism section 3 comprises makes the lifting drive division 32 of lifting body 34 along pillar 33 to the short transverse lifting.Lifting drive division 32 is separately positioned on the pillar 33 of both sides, and the back and forth movement cylinder that is moved up and down independently by the width end that makes lifting body 34 consists of.In addition, this lifting drive division 32 can move according to the control signal of coming self-control device 4, if the lifting drive division 32 of width both sides moves simultaneously, then can make nozzle 30 to the short transverse parallel, in addition, can move to regulate by the lifting drive division 32 that only has a side posture (adjusting operation) of nozzle 30.For example, when nozzle 30 is inclined relative to horizontal, can eliminate this inclination by regulating operation.
Can carry out coating fluid is coated on coating operation on the substrate W by the apparatus for coating 1 with above structure, but in order to improve the quality (making uniform film thickness) of the coated film that forms at this substrate W with coating fluid, preferably, nozzle 30 is parallel with respect to the upper surface (horizontal plane) of substrate W, and the gap of nozzle 30 and substrate W is constant on width.
Therefore, for example nozzle 30 is taken off when changing from lifting body 34, should be made the posture of the nozzle 30 after the replacing be the adjusting operation of level.So, in order to regulate the posture of nozzle 30 with respect to the horizontal plane, as shown in Figure 2, apparatus for coating 1 comprises the sensor 7 for detection of the height and position of the width end 35 of nozzle 30.And this sensor 7 together is equipped on the base component 23 with adsorbing mechanism 25.In addition, base component 23 is arranged on the width both sides, and thus, sensor 7 also is arranged on the width both sides, and these sensors 7,7 in both sides are configured on the same straight line (imaginary line) that extends to width.In addition, on each base component 23 of width both sides, sensor 7 is carried in the mode of rectilinear form on throughput direction and row arrangement with adsorbing mechanism 25.
Because sensor 7 is equipped on the base component 23, therefore by the lower position that makes base component 23 move to nozzle 30 can make sensor 7 be positioned at nozzle 30 under.In addition, the position of base component 23 is to manage by control device 4, by the control of control device 4, can make sensor 7 be positioned at nozzle 30 under on the position.
As shown in Figure 4, the sensor 7 of present embodiment is touch sensor, comprise the width end 35 that can touch nozzle 30 the lower surface contact shoe 8 and be used for to measure from datum level H0 to contact shoe the measuring instrument 9 of the height and position of 8 front end, touch the lower surface of the end 35 of nozzle 30 by the front end that makes contact shoe 8, can measure from datum level H0 to nozzle the height h of the lower surface of 30 end 35 with measuring instrument 9.In addition, in the present embodiment, datum level H0 is the upper surface 20a of floating platform 20.
And, on the width both sides measured based on sensor 7, from datum level H0 to nozzle the height value h of the lower surface of 30 end 35, and its measured value exported on the control device 4.Control device 4 can be obtained the poor of height h according to this measured value, and can make nozzle 30 be the adjusting operation of level according to this difference.
In addition, in order to carry out this adjusting operation, in the time of can being the height and position when the width end 35 by sensor 7 gaging nozzles 30, from the included air injection 26(of section of base component 23 with reference to Fig. 2) spray compressed air and make base component 23 be the state of suspension with respect to track 21, but, in the present embodiment, in order to regulate operation, control device 4 by control so that be equipped on the sensor 7 of base component 23 be positioned at nozzle 30 under stop all from the compressed-air actuated injection of air injection section 26 during the state of position.As previously described, be used for spraying compressed-air actuated mattress 27 and be the state that slightly suspends from the upper surface 21a of track 21, by stopping compressed-air actuated injection, air injection section 26 is the state (being in the state that suspends and be disengaged) that contacts with the upper surface 21a of track 21.That is, in order to regulate operation, make the base component 23 of suspension be the state that is seated track 21.
Further, when stopping the compressed-air actuated supply to all air injection sections 26, control device 4 to valve 17(with reference to Fig. 3) transmit control signal and carry out the switching of stream, and by control all air injection sections 26 are connected with stream 16 with exhaust.Thus, when making base component 23 be seated on the track 21, the air that residues in all air injection sections 26 outwards can be discharged (to atmosphere opening).
Even stop from the compressed-air actuated injection of air injection section 26 by control device 4 and base component 23 is seated on the track 21, if but air residual is in the air injection 26(of section mattress 27) in, then base component 23 still is the state of suspension, therefore base component 23 is seated on the track 21 reliably.At this moment, when carrying out described adjusting operation, can't make base component 23 be in specific height and position and its repeatability can't be guaranteed, result, measured value generation error at every turn.
But, in the present embodiment, can use air flow circuit 16 to outside drain by exhaust the compressed air that residues in air injection section 26, therefore, base component 23 is seated on the track 21 reliably, and, this state can be reproduced reliably when carrying out described adjusting operation at every turn.In addition, compressed air uses air flow circuit 16 to outside drain by exhaust, and thus, base component 23 can promptly be seated on the track 21.Therefore, can promptly measure with sensor 7.
As mentioned above, in the apparatus for coating of present embodiment, for substrate W is carried to the throughput direction of level, track 21 dimensional accuracy with respect to the horizontal plane is high and accurately be set up, in addition, also with respect to the horizontal plane dimensional accuracy is high and move along track 21 accurately with the state of maintenance level carry to be used for to support the base component 23 of adsorbing mechanism 25 of this substrate W.And by carrying sensors 7 at such base component 23, with respect to the horizontal plane the precision of installation site of sensor 7 is also high thus, by this sensor 7 can gaging nozzle 30 the height and position at width both ends 35.For example, when regulating operation, the position of sensor 7 with respect to the horizontal plane can be reproduced, and can improve certainty of measurement thus.
Further, be equipped on when adsorbing mechanism 25 on the base component 23 is conveying substrate W and support the width both ends E(of this substrate W with reference to Fig. 1) mechanism, therefore, this adsorbing mechanism 25 is positioned on the position corresponding with the width both ends E of substrate W with the base component 23 that carries this adsorbing mechanism 25.And, by being equipped on, sensor 7 is positioned on so locational base component 23, thus, do not need to arrange existing long arm as shown in Figure 6, sensor 7 can be arranged on the position corresponding with the width both ends 35 of nozzle 30, the structure that is used for arranging sensor 7 becomes simple.
Further, in the present embodiment, in order to regulate operation, the sensor 7 that is equipped on base component 23 be positioned at nozzle 30 under stop from the compressed-air actuated injection of air injection section 26 base component 23 being seated on the track 21 during the state of 30 positions.Therefore, as previously described, the dimensional accuracy that track 21 with respect to the horizontal plane consists of is high, and, carry to be used for the dimensional accuracy that the base component 23 of the adsorbing mechanism 25 of supporting substrate W also with respect to the horizontal plane consists of high, therefore, be seated on the track 21 in position under the nozzle 30 by making such base component 23, be equipped on thus the sensor 7 of this base component 23 can be with dimensional accuracy with respect to the horizontal plane high state be positioned at nozzle 30 under.Therefore, under this state, the height and position at the width both ends 35 by sensor 7 gaging nozzles 30 can improve its certainty of measurement thus.
In addition, adsorbing mechanism 25 absorption keep the width both ends E of substrate W, but when being coated with operation, the width end 35 of nozzle 30 is positioned at the top of the end E of this substrate W.Therefore, if by with sensor 7 with adsorbing mechanism 25 side by side configuration mode on the throughput direction be equipped on base component 23 this base component 23 is moved along track 21 make sensor 7 be positioned at nozzle 30 under, then sensor 7 can be positioned on the position corresponding with the end 35 of the width of nozzle 30.Therefore, the enough sensors 7 of energy begin rapidly the height and position of gaging nozzle 30.
In addition, in Fig. 4, with the regulation horizontal plane as datum level H0, according to the accurate measuring instrument 9 of the mode setting sensor 7 of the height and position of the lower surface of the end 35 of gaging nozzle 30, but in order to tackle the situation that this setting is rethought of being necessary, the apparatus for coating 1 of present embodiment comprises reset mechanism.
As shown in Figure 5, this reset mechanism comprises the reference component 40 that is arranged on the datum level H0 and the reciprocating motion cylinder (not shown) that this reference component 40 is transported to the assigned position on the datum level H0.In the present embodiment, datum level H0 is the upper surface 21a of floating platform 20.Move back and forth cylinder and have the structure of carrying out the linear telescopic action, upheld if should move back and forth cylinder, then reference component 40 is placed on the upper surface 20a of floating platform 20, shorten if move back and forth cylinder, then reference component 40 is kept out of the way to retreating position.This retreating position is the position that reference component 40 does not consist of obstacle when being coated with operation etc.
If the bottom surface 41 of reference component 40 loads the upper surface 20a in floating platform 20, then the part of bottom surface 41 is outstanding from the width end of floating platform 20, and the front end of the contact shoe 8 of sensor 7 is contacted with the bottom surface 41 of the part that should give prominence to.The bottom surface 41 of reference component 40 is horizontal plane, can make the height of upper surface 20a of the front end of contact shoe 8 and floating platform 20 consistent.And, making under its highly consistent state, measuring instrument 9 resets the initial point of sensor 7.Thus, in sensor 7, the upper surface 20a of floating platform 20 is reset to datum level H0.As a result, in the situation that needs reset sensor 7(measuring instrument 9), can carry out rapidly its operation by reset mechanism.
In addition, apparatus for coating of the present invention is not limited to illustrated mode, can be the apparatus for coating of alternate manner within the scope of the invention.For example, the floating platform 20 of present embodiment is to be illustrated about the situation that substrate W is suspended, but is not limited to this, can use ultrasonic wave.In addition, the conveying of substrate W can also be the alternate manner except suspension conveying.In addition, sensor 7 is contacts, but also can be contactless.Further, as the support portion of the end E of supporting substrate W, the adsorbing mechanism 25 that attracts based on air has been described, but also can has been other mode.
Further, in said embodiment, be that the air injection section 26 of injection air, the situation that base component 23 is suspended by air are illustrated about suspension mechanism section, but can also use other gases such as nitrogen outside the air.
In addition, base component 23 is contactless with respect to constituting of track 21, namely, and the formation of suspension mechanism section can also be such as magnetic suspension, supersonic wave suspended, electrostatic suspension etc. except the formation of spraying based on gas.
In addition, in said embodiment, when making base component 23 be seated on the track 21, by exhaust with air flow circuit 16(with reference to Fig. 3) air that will residue in air injection section 26 situation of outwards discharging (to atmosphere opening) is illustrated, but, for base component 23 further promptly is seated on the track 21, the not shown forced discharge air injection 26(of section mattress 27 can be set) in the suction device of air.As suction device, can use pump, air blast etc., these suction devices are connected to exhaust with just passable on the air flow circuit 16.At this moment, the negative pressure that produces by suction device can make the air injection 26(of section mattress 27) be adsorbed on the track 21.
Perhaps, promptly be located in order to make base component 23, base component 23(is its part at least) can also make magnetic, in-built electrical magnet in track 21 for example, the magnetic force by this electromagnet is adsorbed on the track 21 base component 23.
Further, as other device that base component 23 promptly is located, it can also be following formation, namely, by the reciprocating motion cylinders such as telescopic cylinder or the parts such as arm that drive by motor, apply to the external force of the direction of the upper surface 21a of track 21 with respect to base component 23, base component 23 is urged on the track 21.
Claims (5)
1. an apparatus for coating is characterized in that, comprising:
Conveying mechanism section carries substrate to the throughput direction of level;
Coating mechanism section, comprise nozzle and lifting drive division, discharge coating fluid with respect to described substrate from described nozzle, wherein, described nozzle is being in long way setting on the width of vertical level with described throughput direction, and the gap that has short transverse with respect to the substrate that is transferred is and corresponding, and described lifting drive division makes the lifting on short transverse of described nozzle;
Sensor in order to regulate the posture of described nozzle with respect to the horizontal plane, is measured the height and position at the width both ends of described nozzle,
Wherein, described conveying mechanism section comprises:
Track is arranged on the width both sides of the substrate that is transferred, and extends to described throughput direction;
Base component is along described rail moving;
The support portion is equipped on the described base component, when carrying described substrate, supports the width both ends of described substrate,
Described sensor and described support portion together are equipped on the described base component.
2. apparatus for coating according to claim 1, it is characterized in that, described base component comprises the suspension mechanism section that makes described base component suspension with respect to the upper surface of described track, and by this suspension mechanism section, described base component moves with the state that suspends with respect to described track.
3. apparatus for coating according to claim 2, it is characterized in that, when the height and position at the width both ends of passing through the described nozzle of described sensor measurement, the described sensor that is equipped on described base component be positioned at described nozzle under state under, remove the suspension by the described base component of described suspension mechanism section, described base component is seated on the described track.
4. according to claim 2 or 3 described apparatus for coating, it is characterized in that, described suspension mechanism section is made of injection section, with respect to the upper surface gas jet of described track described base component is suspended by described injection section.
5. apparatus for coating according to claim 4 is characterized in that, when being seated described base component on the described track, make residue in described injection section gas outwards the stream of discharging be connected in the described injection section.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012054677A JP6023440B2 (en) | 2012-03-12 | 2012-03-12 | Coating device |
| JP2012-054677 | 2012-03-12 |
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| Publication Number | Publication Date |
|---|---|
| CN103301998A true CN103301998A (en) | 2013-09-18 |
| CN103301998B CN103301998B (en) | 2017-06-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310066873.8A Active CN103301998B (en) | 2012-03-12 | 2013-03-04 | Apparatus for coating |
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| Country | Link |
|---|---|
| JP (1) | JP6023440B2 (en) |
| KR (1) | KR102018506B1 (en) |
| CN (1) | CN103301998B (en) |
| TW (1) | TWI559365B (en) |
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| CN105964454A (en) * | 2016-07-15 | 2016-09-28 | 张凤平 | Multifunctional pressurized horizontally-moving paint spraying working table |
| CN107649975A (en) * | 2017-10-11 | 2018-02-02 | 泉州市宏铭机械开发有限公司 | A kind of hearstone machine for automatically polishing |
| CN109277254A (en) * | 2017-07-19 | 2019-01-29 | 塔工程有限公司 | Coating machine |
| CN117548289A (en) * | 2024-01-09 | 2024-02-13 | 宁波欧达光电有限公司 | Preparation device for electromagnetic shielding photovoltaic module |
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Also Published As
| Publication number | Publication date |
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| TWI559365B (en) | 2016-11-21 |
| JP6023440B2 (en) | 2016-11-09 |
| KR102018506B1 (en) | 2019-09-05 |
| CN103301998B (en) | 2017-06-06 |
| JP2013191604A (en) | 2013-09-26 |
| KR20130105332A (en) | 2013-09-25 |
| TW201338017A (en) | 2013-09-16 |
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