CN102623496A - 矩阵型mos场效应晶体管 - Google Patents
矩阵型mos场效应晶体管 Download PDFInfo
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- CN102623496A CN102623496A CN201110037139XA CN201110037139A CN102623496A CN 102623496 A CN102623496 A CN 102623496A CN 201110037139X A CN201110037139X A CN 201110037139XA CN 201110037139 A CN201110037139 A CN 201110037139A CN 102623496 A CN102623496 A CN 102623496A
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- drain terminal
- effect transistor
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Priority Applications (1)
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CN201110037139.XA CN102623496B (zh) | 2011-01-27 | 2011-01-27 | 矩阵型mos场效应晶体管 |
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CN201110037139.XA CN102623496B (zh) | 2011-01-27 | 2011-01-27 | 矩阵型mos场效应晶体管 |
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CN102623496A true CN102623496A (zh) | 2012-08-01 |
CN102623496B CN102623496B (zh) | 2014-11-05 |
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CN201110037139.XA Active CN102623496B (zh) | 2011-01-27 | 2011-01-27 | 矩阵型mos场效应晶体管 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109390396A (zh) * | 2013-08-21 | 2019-02-26 | 晶元光电股份有限公司 | 高电子迁移率晶体管 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6404013B1 (en) * | 2000-06-30 | 2002-06-11 | United Microelectronics Corp. | Array-type layout for silicon on insulator (SOI) transistor |
CN1571164A (zh) * | 2003-04-18 | 2005-01-26 | 三星电子株式会社 | 具有网型栅极电极的mos晶体管 |
US6930005B2 (en) * | 2003-12-02 | 2005-08-16 | Texas Instruments Incorporated | Low cost fabrication method for high voltage, high drain current MOS transistor |
CN1658399A (zh) * | 2003-10-22 | 2005-08-24 | 马维尔国际贸易有限公司 | 高效晶体管结构 |
CN1700464A (zh) * | 2004-05-18 | 2005-11-23 | 联华电子股份有限公司 | 具有低触发电压特性的静电放电保护组件结构 |
US7045456B2 (en) * | 2003-12-22 | 2006-05-16 | Texas Instruments Incorporated | MOS transistor gates with thin lower metal silicide and methods for making the same |
CN1777997A (zh) * | 2002-05-10 | 2006-05-24 | 通用半导体公司 | 几何形状允许频繁体接触的mosfet器件 |
CN1866506A (zh) * | 2005-05-18 | 2006-11-22 | 株式会社东芝 | 半导体器件 |
US20080006847A1 (en) * | 2006-06-20 | 2008-01-10 | Peter Grombach | Semiconductor protective structure for electrostatic discharge |
CN101266930A (zh) * | 2008-04-11 | 2008-09-17 | 北京大学 | 一种横向双扩散场效应晶体管的制备方法 |
CN101405867A (zh) * | 2002-09-29 | 2009-04-08 | 先进模拟科技公司 | 一种模块化双极-cmos-dmos模拟集成电路和功率晶体管技术 |
CN101490843A (zh) * | 2006-05-08 | 2009-07-22 | 马维尔国际贸易有限公司 | 高效晶体管结构 |
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2011
- 2011-01-27 CN CN201110037139.XA patent/CN102623496B/zh active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6404013B1 (en) * | 2000-06-30 | 2002-06-11 | United Microelectronics Corp. | Array-type layout for silicon on insulator (SOI) transistor |
CN1777997A (zh) * | 2002-05-10 | 2006-05-24 | 通用半导体公司 | 几何形状允许频繁体接触的mosfet器件 |
CN101405867A (zh) * | 2002-09-29 | 2009-04-08 | 先进模拟科技公司 | 一种模块化双极-cmos-dmos模拟集成电路和功率晶体管技术 |
CN1571164A (zh) * | 2003-04-18 | 2005-01-26 | 三星电子株式会社 | 具有网型栅极电极的mos晶体管 |
CN1658399A (zh) * | 2003-10-22 | 2005-08-24 | 马维尔国际贸易有限公司 | 高效晶体管结构 |
US6930005B2 (en) * | 2003-12-02 | 2005-08-16 | Texas Instruments Incorporated | Low cost fabrication method for high voltage, high drain current MOS transistor |
US7045456B2 (en) * | 2003-12-22 | 2006-05-16 | Texas Instruments Incorporated | MOS transistor gates with thin lower metal silicide and methods for making the same |
CN1700464A (zh) * | 2004-05-18 | 2005-11-23 | 联华电子股份有限公司 | 具有低触发电压特性的静电放电保护组件结构 |
CN1866506A (zh) * | 2005-05-18 | 2006-11-22 | 株式会社东芝 | 半导体器件 |
CN101490843A (zh) * | 2006-05-08 | 2009-07-22 | 马维尔国际贸易有限公司 | 高效晶体管结构 |
US20080006847A1 (en) * | 2006-06-20 | 2008-01-10 | Peter Grombach | Semiconductor protective structure for electrostatic discharge |
CN101266930A (zh) * | 2008-04-11 | 2008-09-17 | 北京大学 | 一种横向双扩散场效应晶体管的制备方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109390396A (zh) * | 2013-08-21 | 2019-02-26 | 晶元光电股份有限公司 | 高电子迁移率晶体管 |
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Publication number | Publication date |
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CN102623496B (zh) | 2014-11-05 |
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Effective date of registration: 20140411 Address after: 214028 Wuxi provincial high tech Industrial Development Zone, Hanjiang Road, No. 5, Jiangsu, China Applicant after: Wuxi CSMC Semiconductor Co., Ltd. Address before: 214028 Wuxi provincial high tech Industrial Development Zone, Hanjiang Road, No. 5, Jiangsu, China Applicant before: Wuxi CSMC Semiconductor Co., Ltd. Applicant before: Wuxi Huarun Shanghua Technology Co., Ltd. |
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Effective date of registration: 20171127 Address after: 214028 Xinzhou Road, Wuxi national hi tech Industrial Development Zone, Jiangsu, China, No. 8 Patentee after: Wuxi Huarun Shanghua Technology Co., Ltd. Address before: 214028 Wuxi provincial high tech Industrial Development Zone, Hanjiang Road, No. 5, Jiangsu, China Patentee before: Wuxi CSMC Semiconductor Co., Ltd. |
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