CN102543639B - 用于带电粒子束系统的环境单元 - Google Patents
用于带电粒子束系统的环境单元 Download PDFInfo
- Publication number
- CN102543639B CN102543639B CN201110349835.4A CN201110349835A CN102543639B CN 102543639 B CN102543639 B CN 102543639B CN 201110349835 A CN201110349835 A CN 201110349835A CN 102543639 B CN102543639 B CN 102543639B
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- sample
- charged particle
- particle beam
- beam system
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- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/024—Moving components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2001—Maintaining constant desired temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2002—Controlling environment of sample
- H01J2237/2003—Environmental cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/942,201 US9679741B2 (en) | 2010-11-09 | 2010-11-09 | Environmental cell for charged particle beam system |
| US12/942201 | 2010-11-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102543639A CN102543639A (zh) | 2012-07-04 |
| CN102543639B true CN102543639B (zh) | 2017-03-01 |
Family
ID=44905712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110349835.4A Expired - Fee Related CN102543639B (zh) | 2010-11-09 | 2011-11-08 | 用于带电粒子束系统的环境单元 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9679741B2 (enExample) |
| EP (2) | EP2450935B1 (enExample) |
| JP (2) | JP5839935B2 (enExample) |
| CN (1) | CN102543639B (enExample) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5352262B2 (ja) | 2009-02-06 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US8853078B2 (en) * | 2011-01-30 | 2014-10-07 | Fei Company | Method of depositing material |
| EP2557584A1 (en) * | 2011-08-10 | 2013-02-13 | Fei Company | Charged-particle microscopy imaging method |
| EP2631929A1 (en) | 2012-02-27 | 2013-08-28 | FEI Company | A holder assembly for cooperating with an environmental cell and an electron microscope |
| JP6169334B2 (ja) * | 2012-07-27 | 2017-07-26 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡および電子顕微鏡用試料保持装置 |
| EP2880675A4 (en) * | 2012-07-30 | 2016-03-30 | Fei Co | ELECTRONIC MICROSCOPE GAS INJECTION SYSTEM WITH ENVIRONMENTAL SCAN (SEM) |
| JP6051014B2 (ja) * | 2012-10-29 | 2016-12-21 | 株式会社日立ハイテクノロジーズ | 試料格納用容器、荷電粒子線装置、及び画像取得方法 |
| US9123506B2 (en) * | 2013-06-10 | 2015-09-01 | Fei Company | Electron beam-induced etching |
| CN104076476B (zh) * | 2014-07-11 | 2016-02-03 | 东南大学 | 一种光学透镜的超洁净真空密封方法 |
| US9349564B2 (en) | 2014-07-17 | 2016-05-24 | Fei Company | Charged-particle lens that transmits emissions from sample |
| KR101563495B1 (ko) * | 2014-07-31 | 2015-10-27 | 한국에너지기술연구원 | 광-전자적 측정 시에 샘플의 온도를 제어하는 장치 및 이를 이용한 태양전지 측정 장치 |
| US9449805B2 (en) * | 2014-09-23 | 2016-09-20 | Agilent Technologies Inc. | Isolation of charged particle optics from vacuum chamber deformations |
| CN105764228B (zh) * | 2014-12-19 | 2018-04-24 | 中国科学院空间科学与应用研究中心 | 一种空间中性原子探测仪器的定标系统及方法 |
| US9799490B2 (en) * | 2015-03-31 | 2017-10-24 | Fei Company | Charged particle beam processing using process gas and cooled surface |
| US9905391B2 (en) * | 2015-04-29 | 2018-02-27 | Kla-Tencor Corporation | System and method for imaging a sample with an electron beam with a filtered energy spread |
| US9633816B2 (en) * | 2015-05-18 | 2017-04-25 | Fei Company | Electron beam microscope with improved imaging gas and method of use |
| EP3157041A1 (en) * | 2015-10-13 | 2017-04-19 | FEI Company | Investigation of high-temperature specimens in a charged particle microscope |
| DE112016005577B4 (de) * | 2016-01-29 | 2021-09-16 | Hitachi High-Tech Corporation | Ladungsträgerstrahlvorrichtung und Verfahren zur Einstellung ihrer optischen Achse |
| TWI594288B (zh) * | 2016-03-14 | 2017-08-01 | 台灣電鏡儀器股份有限公司 | 電子顯微鏡 |
| WO2017183168A1 (ja) * | 2016-04-22 | 2017-10-26 | 株式会社 日立ハイテクノロジーズ | 荷電粒子顕微鏡および試料撮像方法 |
| CN106783493B (zh) * | 2016-12-01 | 2018-07-10 | 聚束科技（北京）有限公司 | 一种真空气氛处理装置、样品观测系统及方法 |
| GB201622206D0 (en) * | 2016-12-23 | 2017-02-08 | Univ Of Dundee See Pulcea Ltd Univ Of Huddersfield | Mobile material analyser |
| US11239051B2 (en) * | 2017-02-13 | 2022-02-01 | Hitachi High-Tech Corporation | Charged particle beam device |
| JP6929760B2 (ja) * | 2017-11-07 | 2021-09-01 | キヤノン株式会社 | 電子線検出素子、電子顕微鏡、透過型電子顕微鏡 |
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| CN101545874A (zh) * | 2008-03-28 | 2009-09-30 | Fei公司 | 用于粒子光学设备的环境室 |
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| EP2450935A2 (en) | 2012-05-09 |
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| US20120112062A1 (en) | 2012-05-10 |
| EP2450935B1 (en) | 2014-01-08 |
| EP2450935A3 (en) | 2013-01-23 |
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