CN1021996C - 半导体存储设备 - Google Patents

半导体存储设备 Download PDF

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Publication number
CN1021996C
CN1021996C CN90106625A CN90106625A CN1021996C CN 1021996 C CN1021996 C CN 1021996C CN 90106625 A CN90106625 A CN 90106625A CN 90106625 A CN90106625 A CN 90106625A CN 1021996 C CN1021996 C CN 1021996C
Authority
CN
China
Prior art keywords
lines
word
word line
word lines
memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN90106625A
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English (en)
Chinese (zh)
Other versions
CN1052966A (zh
Inventor
赵秀仁
徐东一
闵东宣
金暎来
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of CN1052966A publication Critical patent/CN1052966A/zh
Application granted granted Critical
Publication of CN1021996C publication Critical patent/CN1021996C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/06—Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/063—Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C8/00—Arrangements for selecting an address in a digital store
    • G11C8/14—Word line organisation; Word line lay-out
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/423—Shielding layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
    • H10W20/43—Layouts of interconnections
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/495—Capacitive arrangements or effects of, or between wiring layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Dram (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Static Random-Access Memory (AREA)
  • Techniques For Improving Reliability Of Storages (AREA)
CN90106625A 1989-12-29 1990-07-31 半导体存储设备 Expired - Fee Related CN1021996C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20108/89 1989-12-29
KR1019890020108A KR920010344B1 (ko) 1989-12-29 1989-12-29 반도체 메모리 어레이의 구성방법

Publications (2)

Publication Number Publication Date
CN1052966A CN1052966A (zh) 1991-07-10
CN1021996C true CN1021996C (zh) 1993-09-01

Family

ID=19294149

Family Applications (1)

Application Number Title Priority Date Filing Date
CN90106625A Expired - Fee Related CN1021996C (zh) 1989-12-29 1990-07-31 半导体存储设备

Country Status (8)

Country Link
US (1) US5097441A (https=)
JP (1) JPH0792998B2 (https=)
KR (1) KR920010344B1 (https=)
CN (1) CN1021996C (https=)
DE (1) DE4009836C2 (https=)
FR (1) FR2656725B1 (https=)
GB (1) GB2239558B (https=)
IT (1) IT1241520B (https=)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0713864B2 (ja) * 1989-09-27 1995-02-15 東芝マイクロエレクトロニクス株式会社 半導体記憶装置
GB2246001B (en) * 1990-04-11 1994-06-15 Digital Equipment Corp Array architecture for high speed cache memory
JPH04271086A (ja) * 1991-02-27 1992-09-28 Nec Corp 半導体集積回路
KR940008722B1 (ko) * 1991-12-04 1994-09-26 삼성전자 주식회사 반도체 메모리 장치의 워드라인 드라이버 배열방법
JP3158017B2 (ja) * 1994-08-15 2001-04-23 インターナショナル・ビジネス・マシーンズ・コーポレ−ション 相互結線配列および相互結線配列用の導線を形成する方法
KR0172376B1 (ko) * 1995-12-06 1999-03-30 김광호 서브워드라인 드라이버 구조를 가지는 반도체 메모리장치
US5793383A (en) * 1996-05-31 1998-08-11 Townsend And Townsend And Crew Llp Shared bootstrap circuit
US6034879A (en) * 1998-02-19 2000-03-07 University Of Pittsburgh Twisted line techniques for multi-gigabit dynamic random access memories
JP2000340766A (ja) * 1999-05-31 2000-12-08 Fujitsu Ltd 半導体記憶装置
US7259464B1 (en) * 2000-05-09 2007-08-21 Micron Technology, Inc. Vertical twist scheme for high-density DRAMs
CA2342496A1 (en) 2001-03-30 2002-09-30 Atmos Corporation Twisted wordline straps
US6567329B2 (en) * 2001-08-28 2003-05-20 Intel Corporation Multiple word-line accessing and accessor
KR100541818B1 (ko) * 2003-12-18 2006-01-10 삼성전자주식회사 반도체 메모리 장치의 라인 배치구조
KR100825525B1 (ko) * 2004-07-28 2008-04-25 가부시끼가이샤 도시바 반도체 집적 회로 장치
JP4564299B2 (ja) 2004-07-28 2010-10-20 株式会社東芝 半導体集積回路装置
US7110319B2 (en) * 2004-08-27 2006-09-19 Micron Technology, Inc. Memory devices having reduced coupling noise between wordlines
JP4058045B2 (ja) * 2005-01-05 2008-03-05 株式会社東芝 半導体記憶装置
US20090154215A1 (en) * 2007-12-14 2009-06-18 Spansion Llc Reducing noise and disturbance between memory storage elements using angled wordlines
JP5612803B2 (ja) * 2007-12-25 2014-10-22 ピーエスフォー ルクスコ エスエイアールエルＰＳ４ Ｌｕｘｃｏ Ｓ．ａ．ｒ．ｌ． 半導体記憶装置
US7830221B2 (en) * 2008-01-25 2010-11-09 Micron Technology, Inc. Coupling cancellation scheme
US11308383B2 (en) 2016-05-17 2022-04-19 Silicon Storage Technology, Inc. Deep learning neural network classifier using non-volatile memory array
CN106097960B (zh) * 2016-06-16 2018-09-14 武汉华星光电技术有限公司 一种双边驱动装置及平板显示器
CN107622779B (zh) * 2017-10-30 2024-03-26 长鑫存储技术有限公司 一种存储阵列块及半导体存储器
US11087207B2 (en) 2018-03-14 2021-08-10 Silicon Storage Technology, Inc. Decoders for analog neural memory in deep learning artificial neural network
US10803943B2 (en) 2017-11-29 2020-10-13 Silicon Storage Technology, Inc. Neural network classifier using array of four-gate non-volatile memory cells
US10748630B2 (en) 2017-11-29 2020-08-18 Silicon Storage Technology, Inc. High precision and highly efficient tuning mechanisms and algorithms for analog neuromorphic memory in artificial neural networks
US10438636B2 (en) * 2017-12-07 2019-10-08 Advanced Micro Devices, Inc. Capacitive structure for memory write assist
US11893478B2 (en) 2019-01-18 2024-02-06 Silicon Storage Technology, Inc. Programmable output blocks for analog neural memory in a deep learning artificial neural network
US11500442B2 (en) 2019-01-18 2022-11-15 Silicon Storage Technology, Inc. System for converting neuron current into neuron current-based time pulses in an analog neural memory in a deep learning artificial neural network
US11270763B2 (en) 2019-01-18 2022-03-08 Silicon Storage Technology, Inc. Neural network classifier using array of three-gate non-volatile memory cells
US11023559B2 (en) 2019-01-25 2021-06-01 Microsemi Soc Corp. Apparatus and method for combining analog neural net with FPGA routing in a monolithic integrated circuit
US10720217B1 (en) 2019-01-29 2020-07-21 Silicon Storage Technology, Inc. Memory device and method for varying program state separation based upon frequency of use
US11423979B2 (en) 2019-04-29 2022-08-23 Silicon Storage Technology, Inc. Decoding system and physical layout for analog neural memory in deep learning artificial neural network

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57208691A (en) * 1981-06-15 1982-12-21 Mitsubishi Electric Corp Semiconductor memory
JPS6059677B2 (ja) * 1981-08-19 1985-12-26 富士通株式会社 半導体記憶装置
JPS59124092A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd メモリ装置
US4729119A (en) * 1984-05-21 1988-03-01 General Computer Corporation Apparatus and methods for processing data through a random access memory system
US4733374A (en) * 1985-03-30 1988-03-22 Kabushiki Kaisha Toshiba Dynamic semiconductor memory device
CA1305255C (en) * 1986-08-25 1992-07-14 Joseph Lebowitz Marching interconnecting lines in semiconductor integrated circuits
JPS63153792A (ja) * 1986-12-17 1988-06-27 Sharp Corp 半導体メモリ装置
JPS63255898A (ja) * 1987-04-14 1988-10-24 Mitsubishi Electric Corp 半導体記憶装置
JPH06105550B2 (ja) * 1987-07-08 1994-12-21 三菱電機株式会社 半導体記憶装置
JP2547615B2 (ja) * 1988-06-16 1996-10-23 三菱電機株式会社 読出専用半導体記憶装置および半導体記憶装置
JPH0713858B2 (ja) * 1988-08-30 1995-02-15 三菱電機株式会社 半導体記憶装置
JPH0713864B2 (ja) * 1989-09-27 1995-02-15 東芝マイクロエレクトロニクス株式会社 半導体記憶装置

Also Published As

Publication number Publication date
FR2656725A1 (https=) 1991-07-05
GB9006756D0 (en) 1990-05-23
US5097441A (en) 1992-03-17
KR920010344B1 (ko) 1992-11-27
CN1052966A (zh) 1991-07-10
JPH03203085A (ja) 1991-09-04
IT9048185A0 (it) 1990-07-31
KR910013266A (ko) 1991-08-08
GB2239558A (en) 1991-07-03
JPH0792998B2 (ja) 1995-10-09
FR2656725B1 (https=) 1994-11-04
IT9048185A1 (it) 1992-01-31
DE4009836A1 (de) 1991-07-11
DE4009836C2 (de) 1994-01-27
GB2239558B (en) 1993-08-18
IT1241520B (it) 1994-01-17

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C15 Extension of patent right duration from 15 to 20 years for appl. with date before 31.12.1992 and still valid on 11.12.2001 (patent law change 1993)
OR01 Other related matters
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 19930901

Termination date: 20090831