CN102084435A - 金属糊料和油墨 - Google Patents

金属糊料和油墨 Download PDF

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CN102084435A
CN102084435A CN2009801259256A CN200980125925A CN102084435A CN 102084435 A CN102084435 A CN 102084435A CN 2009801259256 A CN2009801259256 A CN 2009801259256A CN 200980125925 A CN200980125925 A CN 200980125925A CN 102084435 A CN102084435 A CN 102084435A
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metal
thickener
sintering
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curing
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CN102084435B (zh
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M·杨
D·M·让德西尔
Z·雅尼弗
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Ishihara Chemical Co Ltd
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Applied Nanotech Holdings Inc
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Abstract

本发明揭示一种金属组合物,其包含溶剂和多个分散在溶剂中的金属纳米颗粒,对所述金属组合物进行配制,使得该金属组合物在基材上固化后能提供电阻率等于或小于约5x10-4Ω·cm的金属导体。电组件的电部件可通过金属导体互连,所述金属导体通过在基材上固化所述金属组合物而形成。可将包含金属纳米颗粒的金属组合物沉积在基材上并固化。金属组合物可在固化之前或之后与金属线接触,固定到固化的金属组合物上。

Description

金属糊料和油墨
相关申请的交叉引用
本申请要求Roundhill等的美国临时申请第61/077,711号和Roundhill等的美国临时申请第61/081,539号的优先权,其全部内容通过引用纳入本文。
技术领域
本申请涉及可用于形成导电性提高的金属导体的金属糊料和油墨。
背景技术
金属糊料如金属油墨可由金属纳米颗粒、液体载剂、分散剂和其它添加剂配制。可引入添加剂来改变物理性质,例如粘度、润湿性和在所选择基材上的接触角。与油墨相比(例如小于约5000cP),糊料的较高粘度(例如约10,000cP到约60,000cP)有助于金属纳米颗粒持久稳定地分散。金属油墨或糊料的应用可基于多种因素,包括印刷方法和基材。低粘度(例如小于约20cP,或者在约10cP到约20cP之间)的油墨可以进行喷墨印刷或气溶胶印刷。糊料的粘度太高,难以进行喷墨印刷,可以通过适用于较高粘度的丝网印刷或其它方法进行施涂。
但是,一些金属糊料或油墨需要在惰性气氛中,在较高的温度下加热,该条件对于一些应用如挠性电子器件(例如具有聚合物基材)是不合适的。另外,一些金属糊料或油墨包含一种或多种高沸点液体组分。当含有高沸点组分的金属糊料或油墨通过在空气中缓慢热烧结处理而固化时,这些高沸点组分会形成非挥发性产物而留在固化的导体中。在惰性气氛中进行的热烧结过程也会发生热分解,产生非挥发性产物,使导体受污染,具有较高的电阻率。在一些情况中,来自液体载剂的有机残余物使导体和基材之间的粘附作用下降,降低了金属导体的品质。
附图简要说明
图1是说明金属组合物的制备过程的流程图。
图2是说明通过包括光烧结(photosintering)的工艺形成金属导体的方法的流程图。
图3说明通过热烧结和光烧结形成的铜导体的电阻率与加工温度的关系。
图4说明具有芯片的组件,所述芯片通过由金属组合物制备的印刷导体互相连接。
图5说明具有芯片的组件,所述芯片通过由金属组合物制备的印刷导体形成的通孔互相连接。
图6说明固定在经过光烧结的金属凸起上的导线。
图7是说明形成光烧结金属凸起的步骤的流程图。
图8说明固定在经过光烧结的金属凸起之间的金属线。
图9A-9F显示将铜线固定到经过光烧结的铜凸起上的各阶段的照片。
图10说明经过光烧结的柔顺性金属凸起。
发明详述
为低温加工配制的金属组合物(例如油墨和糊料)适合用在制造印刷电子器件中,适合作为导电粘合剂,或者适合用在其它应用中,包括各种电学部件和电路(例如电极和互连)的制造和组装。金属组合物包括在适合光烧结的光学透明的载剂中的金属纳米颗粒(例如铜、镍、银、金、铝、钴、钼、锌等)。这些组合物中的纳米颗粒可依据尺寸和钝化涂层加以选择,组合物经适当配制后,可用于精确印刷。印刷组合物中的纳米颗粒可以在不影响塑料基材的温度下固化(例如光烧结、热烧结或光烧结加热烧结)为整体金属膜或线。
文中所述的金属组合物经过调配,所生成的固化导体所含有的来自液体载剂的有机残余物的量减少。金属组合物可以采用光烧结方法进行烧结(例如,小于约5msec,小于约2msec,或者小于约1msec),产生金属导体。在此光烧结方法中,高强度光脉冲(例如,约50,000,100,000,或150,00勒克斯或更高)被组合物中的金属纳米颗粒吸收,然后转化为热量。因此,金属组合物经历短的高热脉冲,使有机组分在经历热氧化或分解之前快速蒸发。金属组合物(例如糊料和油墨)的这种光烧结产生具有高电导率的导体,这种高电导率可以在较低的温度下形成,并且该导体具有比只采用热烧结过程得到的产品更低的电阻率。
在一些实施方式中,文中所述的金属组合物经过配制,能够在聚合物基材上进行光烧结和/或热烧结(例如,在空气或合成气体(forming gas)中),得到电阻率降低的导体。例如,由文中所述的铜糊料制备的铜导体的电阻率在约1x10-3Ω·cm到约1x10-6Ω·cm之间。也就是说,铜导体的电阻率可以小于约1x10-3Ω·cm,小于约1x10-4Ω·cm,小于约1x10-5Ω·cm,或者大于约1x10-6Ω·cm。
图1显示了用于形成高电导率(低电阻率)导体的金属组合物的制备过程的一个实施方式。制备过程100可以在惰性气氛中进行。在步骤102中,制备所需量(例如体积)的液体载剂。液体载剂可包括例如芳香化合物,脂族酮和醇,酯,以及它们的任意组合。如果载剂包含不止一种组分,则这些组分可以混合在一起。在步骤104中,向载剂中加入一种或多种分散剂,搅动(例如搅拌、摇晃、混合、超声处理等)混合物,使其达到均匀。分散剂可包括例如短链聚合胺、醇、磺酸盐、磷酸盐以及它们的任意组合。在步骤106中,向载剂中加入一定量的金属纳米颗粒(例如,以纳米粉末的形式),以获得所需的铜加载量。在一些实施方式中,纳米粉末可为组合物的约30重量%至约70重量%,或者约50重量%至约80重量%。然后,搅动该非均匀混合物,形成糊料。在步骤108中,可对糊料进行超声处理,形成均匀的分散体。该超声处理可通过在低能量下进行较短的时间来完成(例如短于约10分钟,约2-8分钟,或者约5分钟)。超声浴的液体可以冷却(例如,冷却到约0℃)。如果超声处理时间过长或者超声能量过高,则气穴现象可能导致局部过热到不能接受的高温,引起金属纳米颗粒的聚集或团聚。在超声处理过程中冷却金属糊料(例如,冷却到约0℃)有助于抑制金属纳米颗粒发生聚集或团聚。金属纳米颗粒的聚集或团聚可能导致在烧结步骤中形成较大的粒度,并且降低性能。对于铜纳米颗粒而言,聚集是非常麻烦的问题,因为可能形成铜-铜化学键。这些铜-铜键不会因为随后的机械作用而断裂。在步骤110中,可加入添加剂并与糊料混合,这些添加剂经过选择,以调节粘度、润湿性或接触角之类的性质。添加剂可以是共价化合物、离子化合物或它们的任意组合。
按照图1所述制备的金属糊料可通过光烧结过程成形为导体(例如,导电膜)。例如,可以通过下拉法将金属糊料涂布到基材(例如可购自杜邦公司(DuPont)的KAPTON聚酰亚胺膜)上。光烧结过程可包括预干燥步骤,然后通过闪光将金属纳米颗粒光烧结为例如金属膜。例如,涂层可以在空气中,在约100℃干燥约60分钟。该步骤促进挥发性组分从印刷糊料上去除。如果任由挥发性组分留在糊料中,则光烧结步骤中的快速蒸发可能导致金属纳米颗粒被从基材上吹散。在干燥后,干燥糊料的电阻率可以例如高达100Ω·cm。在一些实施方式中,可使用较高的温度,在真空下进行干燥步骤或者在红外或微波辐射下进行加热,从而缩短干燥时间。对于不含挥发性液体组分的铜糊料,可以省略干燥步骤,从而缩短加工时间。
干燥的糊料可以在合成气体或空气中固化。例如,干燥的糊料可以在最多含有约10体积%氢气的氮气混合物(例如含有约3体积%-5体积%氢气的氮气)中,在约350℃热烧结约60分钟。对于含有约20纳米到约200纳米的纳米颗粒的铜糊料而言,热烧结的膜的电阻率约为3x10-4Ω·cm。合成气体可将干燥糊料中的铜氧化物还原为铜。例如,合成气体中的氢气组分与铜氧化物反应形成铜和水,如下所示:
CuO+H2→Cu+H2O
Cu2O+H2→2Cu+H2O。
水蒸气可随合成气体被带走。
热烧结的金属组合物可在合成气体或空气中进行光烧结,以降低其电阻率。光烧结包括使金属组合物经受闪光。闪光的强度(通过电压量度)和时间(通过脉冲宽度量度)可加以选择,以减少从基材上吹散的金属颗粒的量,降低所得导体的电阻率,以及提高所得导体对基材的粘附性。在一个例子中,当热烧结的铜导体在空气中光烧结后,导体的厚度约为1微米,导体的电阻率约为2x10-5Ω·cm。
金属糊料可以在空气或惰性气氛中干燥。金属糊料或干燥的金属糊料可以热固化,形成金属导体。热烧结的导体可进行光烧结,以降低导体的电阻率。在一些情况中,干燥的金属糊料可以在未经历热烧结的情况下进行光烧结。图2显示由金属组合物形成低电阻率导体的方法200。在步骤202中,将金属糊料施涂到基材上。在步骤204中,可对基材进行加热(例如,在烘箱中,在约100℃加热约60分钟),以干燥糊料。在步骤206中,可对干燥的糊料进行热烧结。
在一个例子中,热烧结可包括以下步骤。在室温下,将带干燥的金属糊料的基材放入石英管中。对该石英管进行抽气(例如,至约100毫托)。将该石英管加热(例如,至约350℃),并用合成气体(例如混有约4体积%氢气的氮气)吹扫,直到温度稳定。经过涂布的基材可在350℃加热约60分钟。在停止提供合成气体和关闭加热器后,用惰性气体(例如氮气)吹扫该石英管,以冷却基材(例如,冷却到100℃以下)。将带热烧结的导体的基材从石英管中取出。
在步骤208中,可对干燥的或热烧结的金属糊料进行光烧结。可使用高压闪光氙气灯进行光烧结。可在小于约100℃的温度(例如环境温度或约20℃)完成光烧结,以得到电阻率降低且对基材的粘附性提高的导体。通过参考引入本文的美国专利申请公开第2008/0286488号描述了光烧结方法。
光烧结和热烧结的比较如表1所示。
表1.光烧结和热烧结的比较
Figure BPA00001287503500061
铜糊料ANI-1和ANI-2的配方如表2所示。
表2.铜糊料配方
Figure BPA00001287503500071
图3显示表1的铜导体的电阻率(Ω·cm)与烧结温度的关系。点300表明通过在合成气体环境中热烧结铜糊料ANI-1形成的导体的电阻率约为3x10-4Ω·cm。点302表明通过在合成气体环境中热烧结铜糊料ANI-1(点300),然后在空气中在约20℃光烧结(1.2msec,1200V)形成的导电膜的电阻率为2x10-5Ω·cm。因此,光烧结步骤将电阻率降低了约1个数量级。
点304、306和308表明通过在空气中,在约100℃、约200℃和约300℃热烧结铜糊料ANI-1形成的导电膜的电阻率约为4.5x103Ω·cm。点310表明通过在空气中热烧结铜糊料ANI-1(点304、306和308),然后在空气中在约20℃光烧结(1.2msec,1200V)形成的导电膜的电阻率约为2x10-4Ω·cm。因此,光烧结步骤将电阻率降低了7个数量级以上。
点312、314和316表明在合成气体(含有4体积%H2的N2)中,分别在300℃、350℃、500℃热烧结ANI-2糊料(纳米颗粒尺寸为200纳米,无添加剂或分散剂)形成的导电膜的电阻率分别为约4x102Ω·cm、约2x102Ω·cm和约2x10-4Ω·cm。因此,图3表明在一定的温度(例如在一些情况中的约400℃)以下,可使用光烧结来获得比单独使用热烧结更低的电阻率。
在一些实施方式中,干燥的金属糊料可以在无中间热烧结步骤的情况下进行光烧结。这是有利的,因为基材可能被较高的热烧结温度破坏。因为光烧结方法中涉及低温(例如低于100℃),可使用光烧结方法由金属糊料和油墨
在包含聚乙烯、聚酯、阻燃剂4等聚合物的基材上形成电阻率在10-5Ω·cm数量级或更低的导体(使用或不使用合成气体环境),而不破坏基材。
可使用金属组合物(例如糊料或油墨)制备印刷电路板上的互连。图4显示具有由光烧结的金属糊料形成的印刷金属互连402的组件400。组件400可包括具有两个或更多个芯片406的基材404(例如硅、陶瓷或挠性有机基材,例如聚酰亚胺、聚酯、液晶聚合物等)。各芯片406可具有一个或多个与其它芯片引线408连接的金属引线408。因为光烧结步骤可在低温下进行,所以金属互连402可与芯片引线408直接连接,为组装到基材404上的芯片406之间提供互连。
图5显示组件500,其中由光烧结的金属组合物(例如糊料或油墨)形成的互连402用于填充芯片金属引线408和金属互连402之间的通孔502。基材404(例如硅、陶瓷或挠性有机基材,例如聚酰亚胺、聚酯、液晶聚合物等)可包括两个或多个设置在其上的芯片406,每个芯片具有一个或多个金属引线408。可将保形涂料506印刷到基材401上,以覆盖芯片406。可打钻形成至金属芯片引线408的通孔502,并用导电铜糊料填充该通孔。然后,可将铜互连402印刷到通孔502的顶部,从而连接芯片引线408。该过程可反复进行,以制造多层电路。
可制备高铜负载量(例如约50重量%至约80重量%)的高粘度铜糊料(例如约10,000cP至约60,000cP),从而可以印刷粗线。低电阻率的粗线可以携带许多电子器件所需的高电流密度。可将铜糊料印刷为图4和5中的互连特征402的所需形式,或者使用铜糊料填充图5中的通孔502。可根据不同的互连尺寸或不同的通孔直径和深度调节铜糊料的粘度和润湿特征。
文中所述的金属糊料可用于制备多层互连,以缩短互连长度,降低电阻。因此,可形成重量较轻、实际占用空间较小、噪声较小和电信号损失较低的高密度互连,从而获得改进的芯片与芯片之间的连接。使用文中所述的金属糊料还可省去导线的粘结处理,从而提高为芯片与板之间的互连所作的电路设计的性能和可靠性,并且消除由于使用无铅焊料可能引起的锡须生长(以及随后短路)的风险。通过使用可直接沉积(例如丝网印刷)和光烧结的金属糊料,简化了多层板的制造,并降低了制造成本。
在一些情况中,由金属糊料或油墨形成的导电凸起可用于形成集成电路和其它电子电路之间的界面。图6显示一种电子器件600,其中基材404支承集成电路406。集成电路406与形成在基材404上的金属凸起602电连接。金属凸起602通过导线604与集成电路406连接。在一些实施方式中,金属凸起602由铜糊料或油墨形成,导线604是铜线。
图7显示形成图6中的组件的方法700。在步骤702中,使用根据油墨或糊料的性质(例如粘度)所选择的方法,将金属油墨或糊料的液滴沉积在基材上。基材可以是聚合物,例如聚酰亚胺。在步骤704中,将一部分导线(例如导线末端)插入液滴中。在步骤706中,液滴602固化(例如热烧结、光烧结,等等)。导线的另一部分(例如另一端)可例如固定到集成电路上。光烧结促进金属氧化物的消除(例如通过将铜氧化物还原为铜),以及金属纳米颗粒熔合成大块金属膜。在烧结步骤后,将导线安装到固体金属凸起中,在导线和附着了该金属凸起的基材之间形成电连接。
图8显示器件800,其包括沉积在基材404上并经过光烧结的由金属油墨或糊料形成的导电的线路或垫802。导电的线路或垫的厚度例如约为0.1微米。基材404可包括聚合物材料,例如KAPTON
Figure BPA00001287503500091
。带状粘结线804位于光烧结的铜垫802上。粘结线804的直径可以例如约为25微米。将金属油墨或糊料的液滴(例如直径约40-60微米)806沉积在导电垫/粘结线的接合处808,焙烧(例如在100℃焙烧30分钟)以干燥液滴。然后对液滴进行光烧结,通过导线接合处808测量电阻。
图9A-9F是就图8所述的方法中各阶段的照片。图9A和9C显示光烧结之前插入铜液滴806中的铜线804。图9B和9D-F显示光烧结之后的铜凸起900。
在一些情况中,如图10所示,金属凸起可以是柔顺性的。可通过将柔顺性聚合物材料1002沉积在基材404上来形成柔顺性凸起1000。然后,将金属油墨或糊料1004沉积在聚合物材料1002上。将导线插入金属油墨或糊料1004中,液滴固化(例如光烧结),从而将导线固定到固化的金属导体上。该过程可以在低于100℃的温度下进行。
由于诸多因素,当金属凸起是由例如铜而非金形成时,制造成本降低。
首先,通过选择的印刷技术可以精确地定位铜液滴(例如铜油墨可以喷墨印刷)。其次,因为铜凸起可以在低于100℃的温度下固化(例如光烧结),所以不存在基材被高温处理破坏的可能,可使用的基材范围更广。再有,因为铜凸起可以在低温下固化,所以烧结可以在空气环境中(而非惰性环境中)进行,并且在粘合芯片垫与导电凸起的过程中,金属发生氧化的可能性也最低。
应理解,虽然已经结合发明详述描述了本发明,但是上面的详述旨在说明而非限制本发明的范围,该范围由所附权利要求的范围限定。其它方面、益处和修改落在所附权利要求的范围内。

Claims (30)

1.一种金属糊料,其包含溶剂和多个分散在溶剂中的金属纳米颗粒,其中,对所述金属糊料进行配制,使得所述金属糊料固化后产生电阻率等于或小于约5x10-4Ω·cm的金属导体。
2.如权利要求1所述的金属糊料,其特征在于,所述金属纳米颗粒包含铜。
3.如权利要求1所述的金属糊料,其特征在于,所述固化包括热烧结。
4.如权利要求3所述的金属糊料,其特征在于,所述固化包括在包含氢气和氮气的合成气体中进行热烧结。
5.如权利要求1所述的金属糊料,其特征在于,所述固化包括光烧结。
6.如权利要求5所述的金属糊料,其特征在于,所述固化包括在空气中,在环境温度下进行光烧结。
7.如权利要求5所述的金属糊料,其特征在于,所述光烧结之前先进行所述金属糊料的热烧结。
8.如权利要求7所述的金属糊料,其特征在于,所述金属糊料的热烧结在合成气体中进行。
9.如权利要求1所述的金属糊料,其特征在于,所述固化在等于或低于约350℃的温度下进行。
10.如权利要求1所述的金属糊料,其特征在于,所述金属糊料在聚合物基材上固化。
11.如权利要求1所述的金属糊料,其特征在于,所述金属纳米颗粒的平均直径约为50纳米到200纳米。
12.一种制备金属导体的方法,所述方法包括固化金属糊料以提供金属导体,其中,所述金属导体的电阻率等于或小于约5x10-4Ω·cm。
13.如权利要求12所述的方法,其特征在于,所述金属糊料包含铜纳米颗粒。
14.如权利要求12所述的方法,其特征在于,所述固化包括在合成气体中进行热烧结。
15.如权利要求14所述的方法,其特征在于,所述合成气体包含氢气和氮气。
16.如权利要求12所述的方法,其特征在于,所述固化包括光烧结。
17.如权利要求16所述的方法,其特征在于,所述固化包括在空气中,在环境温度下进行光烧结。
18.如权利要求16所述的方法,其特征在于,所述方法还包括在光烧结之前热烧结金属糊料。
19.如权利要求16所述的方法,其特征在于,所述方法还包括在光烧结之前,在合成气体中热烧结金属糊料。
20.如权利要求12所述的方法,其特征在于,所述固化在等于或低于约350℃的温度下进行。
21.一种电组件,其包括通过金属导体互连的第一和第二电部件,所述金属导体包含固化的金属糊料或油墨,其中,所述金属导体的电阻率等于或小于约5x10-4Ω·cm。
22.如权利要求21所述的电组件,其特征在于,所述金属糊料或油墨包含铜纳米颗粒。
23.如权利要求21所述的电组件,其特征在于,所述固化的金属糊料或油墨包含热烧结的金属糊料或油墨。
24.如权利要求21所述的电组件,其特征在于,所述固化的金属糊料或油墨包含光烧结的金属糊料或油墨。
25.如权利要求21所述的电组件,其特征在于,所述金属导体的电阻率等于或小于约2x10-5Ω·cm。
26.如权利要求21所述的电组件,其特征在于,所述金属导体直接接触所述第一和第二电部件。
27.如权利要求21所述的电组件,其特征在于,所述金属导体通过填充了热烧结或光烧结的金属糊料的通孔与所述第一和第二电部件连接。
28.一种将导线固定到导体上的方法,所述方法包括:
将金属组合物液滴沉积到基材上,所述金属组合物包含金属纳米颗粒;
将金属线的一部分插入所述液滴中;
烧结所述金属组合物;和
将导线固定到固化的金属组合物上。
29.如权利要求28所述的方法,其特征在于,所述金属线的一部分在金属组合物烧结之后插入所述金属组合物中。
30.如权利要求28所述的方法,其特征在于,所述金属纳米颗粒包含铜。
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TWI606460B (zh) 2017-11-21
EP2301043A4 (en) 2011-07-27
WO2010003056A1 (en) 2010-01-07
KR101610790B1 (ko) 2016-04-12
US20100000762A1 (en) 2010-01-07
CN104812175A (zh) 2015-07-29
KR20110053221A (ko) 2011-05-19
TW201015587A (en) 2010-04-16
EP2301043A1 (en) 2011-03-30
CN102084435B (zh) 2015-04-29
EP2301043B1 (en) 2017-03-08
JP6337249B2 (ja) 2018-06-06

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