JP5546763B2 - ナノワイヤに基づく透明導電体 - Google Patents
ナノワイヤに基づく透明導電体 Download PDFInfo
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- JP5546763B2 JP5546763B2 JP2008526300A JP2008526300A JP5546763B2 JP 5546763 B2 JP5546763 B2 JP 5546763B2 JP 2008526300 A JP2008526300 A JP 2008526300A JP 2008526300 A JP2008526300 A JP 2008526300A JP 5546763 B2 JP5546763 B2 JP 5546763B2
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- conductive layer
- conductive
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Images
Classifications
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
- H01L31/02164—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers, cold shields for infrared detectors
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- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
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Description
透明導電体は、高透過率の絶縁表面または基板上に被覆される導電性薄膜を言及する。透明導電体は、表面伝導率を有する一方で、合理的な光透過性を保持するように製造されてもよい。そのような表面導電性の透明導電体は、平面液晶ディスプレー、タッチパネル、エレクトロルミネセント素子、および薄膜光電池において透明電極として、帯電防止層として、ならびに電磁波遮へい層として広く使用される。
図1は、直径d1で割られる長さL1に相当当するアスペクト比を有するナノワイヤー2を示す。適切なナノワイヤーは、一般的に、10から100,000の範囲のアスペクト比を有する。アスペクト比が大きいと、より効果的な導電網が形成可能になると共に、高透明性のためにワイヤーの全体密度が低くなることから、透明導電体層を得るために有利になる。すなわち、高アスペクト比を有する導電性ナノワイヤーが使用される場合、導電網を達成するナノワイヤーの密度は、導電網が実質的に透明になるように十分低くなることが可能である。
I=I0e−ax
として定義され、
ここで、I0は、層の第一の側面上の入射光であり、Iは、層の第二の側面上の照明レベルであり、e−axは、透明度要因である。透明度要因において、aは吸収係数であり、xは層の厚さである。1に近いが1未満の透明度要因を有する層は、実質的に透明であると考えられる。
例示されるように、図10Aは、基板14上に被覆される導電層12を備える透明導電体10を示す。導電層12は、複数の金属ナノワイヤー16を備える。金属ナノワイヤーは、導電網を形成する。
上述のように、導電層は、マトリクスにより優れた物理的および機械的特徴を有する。これらの特徴は、透明導電体構造に追加の層を導入することによってさらに向上可能である。したがって、その他の実施形態において、反射防止層、防眩層、接着層、障壁層、および硬質被膜などの一つ以上の層を備える多層の透明導電体が記載される。
その他の実施形態において、透明導電体は、上記の障壁層に加えて、またはそれの代わりに腐食防止剤を備えてもよい。異なる腐食防止剤により、異なる機序に基づいて、金属ナノワイヤーに保護が提供されてもよい。
特定の実施形態において、本明細書で記載される透明導電体は、シート被覆および高スループットウェブ被覆をはじめとするさまざまな被覆方法によって、作製可能である。その他の実施形態において、積層方法が使用可能である。有利には、本明細書に記載される作製プロセスは、金属酸化物皮膜の現在の作製とは対称的に、真空蒸着を必要としない。代わりに、作製プロセスは、従来の溶解処理器具を使用して実行可能である。さらに、作製プロセスは、透明導電体の直接的なパターンに適合する。
特定の実施形態において、本明細書に記載される透明導電体を作製する方法は、複数の金属ナノワイヤーを基板上に蒸着するステップであって、その金属ナノワイヤーが流体で分散されるステップと、その流体を乾燥させて金属ナノワイヤー網層を基板上に形成ステップとを含む。
シート被覆は、いかなる基板上、具体的には剛性基板に導電層を被覆することに適している。
ウェブ被覆は、高速(高スループット)被覆用途のために、繊維産業および製糸業において用いられてきた。それは、透明導電体作製の蒸着(被覆)プロセスと一致する。有利には、ウェブ被覆は、従来の器具を使用し、完全に自動化可能であるため、透明導電体の作製のコストを大幅に削減する。具体的には、ウェブ被覆によって、均一かつ再生可能な導電層が柔軟性を有する基板に生産される。プロセス工程は、完全に統合したラインまたは別々の動作として連続的に作動可能である。
その多用途性をよそに、「リール間」プロセスは、ガラスなどの剛性基板と適合しない。剛性基板は、シート被覆によって被覆可能であり、コンベヤーベルト上で運ばれることが可能であるが、一般的に、端部欠けおよび/または均一性の欠如が認められる。さらに、シート被覆は、スループットプロセスがより低く、生産コストを大幅に増加させる可能性がある。
上述のとおり、パターン化される導電層は、パターンに応じてプレポリマー被覆を選択的に硬化することによって形成可能である。硬化プロセスは、光分解または熱によって実行可能である。図18は、導電層が光によってパターン化される実施形態を示す。より具体的には、金属ナノワイヤーの網層114は、本明細書に記載される方法(例えば、図13A〜13D)に準じて基板14に蒸着される。基板14は、柔軟性を有するドナー基板をはじめとするいかなる基板でもよいことが理解されたい。
(銀ナノワイヤーの合成)
銀ナノワイヤーは、例えば、Y.Sun、B.Gates、B.Mayers、&Y.Xia,“Crystalline silver nanowires by soft solution processing”、Nanoletters、 (2002)、2(2)165〜168に記載される「ポリオール」方法の後、ポリビニルピロリドン(PVP)の存在下で、エチレングリコールに溶解される硫酸銀の還元によって合成された。Cambrios Technologies Corporationの名における米国仮出願第60/815,627号に記載される修正されたポリオール方法によって、従来の「ポリオール」方法よりも、さらに均一の銀ナノワイヤーがより高い収率で生産される。この出願は、参照することによってその全体が本明細書に組み込まれる。
(透明導電体の調製)
5μm厚さのAutoflex EBG5ポリエチレンテレフタレート(PET)膜が、基板として使用された。PET基板は、光学的に透明の絶縁体である。PET基板の光透過性およびヘイズが表1に示される。別途記載のない限り、光透過性は、ASTM D1003における手法を使用して測定された。
(促進H2S腐食試験)
硫化水素(H2S)などの硫化物は、既知の腐食剤である。金属ナノワイヤー(例えば、銀)の電気的特性は、大気硫化物の存在下で潜在的に影響を受ける可能性がある。有利には、透明導電体のマトリクスは、ガス透過障壁としての役割を果たす。これにより、ある程度、大気H2Sがマトリクス中に埋め込まれる金属ナノワイヤーに接触することを防止される。金属ナノワイヤーの長期的安定は、本明細書に記載されるマトリクスに一つ以上の腐食防止剤を混入することによってさらに得ることができる。
(腐食防止剤の混入)
導電膜の以下のサンプルが調製された。PET基板が各サンプルに使用された。特定のサンプルにおいて、ベンゾトリアゾール、ジチオチアジアゾール、およびアクロレインを含む腐食防止剤が、導電膜の調製中に混入された。
(金属ナノワイヤー網層の加圧処理)
表2は、基板上の銀ナノワイヤーの網層(または「網層」)の表面に加圧する二つの試行の結果を示す。
(導電層の光パターン化)
図25Aは、ナノワイヤーベースの透明導電膜を直接パターン化する一方法を示す。本例において、銀ナノワイヤー網層(「網層」)600は、初めに、例2に記載の方法に準じてガラス基板604に形成された。二つのホルダー610が、マトリクス形成の範囲614を形作るためにガラス基板604上に置かれた。プレポリマーの混合を含む光硬化型マトリクス材618は、範囲614内の網層600上に被覆された。マスク620は、ホルダー610上に置かれた。マスク620は、約500μm幅の多くの暗線624を有するスライドガラスであった。次に、マトリクス材は、Dymax 5000ランプ下で90秒間照射された。マトリクス材は、光に暴露された領域が硬化し、暗線でマスクされた領域は液体のままであった。
(光硬化型配合)
例6に記載されるマトリクス材は、アクリレート単量体(または本明細書に定義されるプレポリマー)、多官能アクリレート単量体(またはプレポリマー)、および少なくとも一つの光開始剤を混合することによって配合可能である。いかなるアクリレート単量体またはプレポリマーも使用可能であり、例えば、エポキシアクリレート、より具体的には、2−エチルヘキシルアクリレート、2−フェノキシエチルアクリレート、ラウリルアクリレート、メタクリル酸塩、および同様なものが挙げられる。いかなる多官能アクリレート単量体(またはプレポリマー)も、架橋高分子網目の形成を促進するために使用可能である。例として、リン酸トリメチロールトリアクリレート(TMPTA)、トリプロピレングリコールジアクリレート、ビスフェノール-Aジアクリレート、プロポキシ化(3)リン酸トリメチロールトリアクリレート、ジペンタエリスリトールペンタ−アクリレートが挙げられる。いかなる光開始剤、例えばケトンベースの開始剤も使用可能である。特定の例として、Ciba Irgacure754、Ciba Irgacure184などのフェニルケトン、α−ヒドロキシケトン、グリオキシル酸、ベンゾフェノン、α−アミノケトン、および同様なものが挙げられる。より具体的には、即硬化配合が、60%〜70%の2−エチルヘキシルアクリレート、15%〜30%のリン酸トリメチロールトリアクリレート、および約5%のCiba lrgacure754を混合することによって調合可能である。
配合1
75% 2−エチルヘキシルアクリレート、
20% リン酸トリメチロールトリアクリレート(TMPTA)、
1% 接着促進剤(GE Silquest A1100)、
0.1% 酸化防止剤(Ciba Irgonox 101 Off)、および
4% 光開始剤(Ciba lrgacure 754)
配合2
73.9% 2−エチルヘキシルアクリレート、
20% リン酸トリメチロールトリアクリレート(TMPTA)、
1% 接着促進剤(GE Silquest A1100)、
0.05% 酸化防止剤(Ciba Irgonox 1010ff)、および
5% 光開始剤(Ciba Irgacure 754)
配合3
73.1% トリプロピレングリコールジアクリレート(TPGDA)
22.0% リン酸トリメチロールトリアクリレート(TMPTA)
4.9% 光開始剤(Ciba Irgacure 754)
0.03% 酸化防止剤(4−メトキシフェノール)
配合4
68% 2−エチルヘキシルアクリレート、
20% リン酸トリメチロールトリアクリレート(TMPTA)、
1% 接着促進剤(GE Silquest A1100)、
0.1% 酸化防止剤(Ciba Irgonox 1010ff)および
5% 光開始剤I(Ciba Irgacure 754)
5% 共開始剤(Sartomer CN373)
1% 光開始剤II(Ciba Irgacure OXE01)
例8
(ナノワイヤー分散)
ナノワイヤー分散またはインキは、約0.08%wt.のHPMC、約0.36%wt.の銀ナノワイヤー、約0.005%wt.のZonyl(登録商標)FSO−100、および約99.555%wt.の水を混合することによって配合された。初期工程として、HPMC原液が調合された。ナノワイヤー分散の所望の全容積の約3/8に等しい水量がビーカーに入れられ、80℃から85℃の範囲まで加熱板上で加熱された。0.5%wt.のHPMC溶液を生成するのに十分なHPMCが水に添加され、加熱板の電源が切られた。HPMCおよび水の混合液は、HPMCを分散するために撹拌された。全水量のうちの残りは、氷で冷やされ、加熱されたHPMC溶液に添加されて、高RPMで約20分間撹拌された。HPMC溶液は、40μm/70μm(絶対的/標準的)のCuno Betapureフィルターで濾され、溶解されなかったゲルおよび粒子が除去された。次に、Zonyl(登録商標)FSO−100原液が調合された。より具体的には、10gのZonyl(登録商標)FSO100が、92.61mLの水に添加され、Zonyl(登録商標)FSO100が完全に溶解するまで加熱された。最終インキ組成における約0.08%wt.のHPMC溶液を生成するのに必要なHPMC原液量が容器に入れられた。最終インキ組成における約99.555%wt.の水溶液を生成するのに必要なDI水量が添加された。溶液は約15分間撹拌されて、最終インキ組成における約0.36%Agナノワイヤー溶液を生成するのに必要な銀ナノワイヤーの量が添加された。最後に、約0.005%wt.のZonyl(登録商標)FSO−100を生成するために必要な、Zonyl(登録商標)FSO−100原液量が添加された。
Claims (69)
- 透明導電体であって、
柔軟性を有する基板と、
該基板上の導電層
を備え、該導電層が、複数の金属ナノワイヤーを含み、該導電層が、10〜1000Ω/□の抵抗率および85%より高い光透過率を有し、該導電層がマトリクスを含み、
該透明導電体の表面の第一の領域が導電性であり、該透明導電体の表面の第二の領域が非導電性であるように、該導電層はパターン化されており、
該金属ナノワイヤーは、複数のナノワイヤー交差点を含む導電網を形成し、該複数のナノワイヤー交差点の少なくとも一部のうち、交差するワイヤーの少なくとも一つは平坦な交差部分を有する、
透明導電体。 - 前記金属ナノワイヤーは、銀ナノワイヤーである、請求項1に記載の透明導電体。
- 各ナノワイヤーは100を越えるアスペクト比を有する、請求項1に記載の透明導電体。
- 前記透明導電体は表面導電性である、請求項1に記載の透明導電体。
- 前記マトリクスは光学的に透明である、請求項1に記載の透明導電体。
- 前記マトリクス材は、ポリウレタン、ポリアクリル酸、シリコーン、ポリアクリレート、ポリシラン、ポリエステル、ポリ塩化ビニル、ポリスチレン、ポリオレフィン、フッ素重合体、ポリアミド、ポリイミド、ポリノルボルネン、アクリロニトリル−ブタジエン−スチレン共重合体、あるいはその共重合体または混合物である、請求項4に記載の透明導電体。
- 前記マトリクス材は無機材料である、請求項4に記載の透明導電体。
- 各金属ナノワイヤーまたは前記複数の金属ナノワイヤーの一部は、前記マトリクスの表面上から突出する少なくとも一つの区分を含む、請求項1に記載の透明導電体。
- 前記基板は、ポリアクリレート、ポリオレフィン、ポリ塩化ビニル、フッ素重合体、ポリアミド、ポリイミド、ポリスルホン、シリコーン、ガラス樹脂、ポリエーテルエーテルケトン、ポリノルボルネン、ポリエステル、ポリビニル、アクリロニトリル−ブタジエン−スチレン共重合体、またはポリカーボネート、あるいはこれらの物質の共重合体または混合物または積層である、請求項1に記載の透明導電体。
- 一つ以上の反射防止層、防眩層、接着層、障壁、硬質被膜、または保護膜をさらに備える、請求項1に記載の透明導電体。
- 前記導電層上に配置される反射防止層と、前記導電層と前記基板との間に配置される接着層とを備える、請求項10に記載の透明導電体。
- 前記導電層上の硬質被膜と、前記導電層と前記基板との間に配置される障壁層と、前記基板下の反射防止層とを備える、請求項10に記載の透明導電体。
- 前記導電層上に配置される反射防止層、防眩、および障壁層と、前記導電層と前記基板との間に配置される接着層と、前記基板下の反射防止層とを備える、請求項10に記載の透明導電体。
- 一つ以上の腐食防止剤をさらに含み、該一つ以上の腐食防止剤が、窒素含有有機化合物または硫黄含有有機化合物である、請求項1に記載の透明導電体。
- 前記一つ以上の腐食防止剤は一つ以上の容器に収容され、気相で放出されることができる、請求項14に記載の透明導電体。
- 前記腐食防止剤は、ベンゾトリアゾール、トリルトリアゾール、ブチルベンジルトリアゾール、ジチオチアジアゾール、アルキルジチオチアジアゾールおよびアルキルチオール、2−アミノピリミジン、5,6−ジメチルベンゾイミダゾール、2−アミノ−5−メルカプト−1,3,4−チアジアゾール、2−メルカプトピリミジン、2−メルカプトベンゾオキサゾール、2−メルカプトベンゾチアゾール、または2−メルカプトベンゾイミダゾールである、請求項14に記載の透明導電体。
- 前記腐食防止剤は、ベンゾトリアゾール、ジチオチアジアゾール、またはアルキルジチオチアジアゾールである、請求項15に記載の透明導電体。
- 前記腐食防止剤はH2S捕捉剤である、請求項14に記載の透明導電体。
- 前記腐食防止剤は、アクロレイン、グリオキサル、トリアジン、またはn-クロロコハク酸イミドである、請求項18に記載の透明導電体。
- 透明導電体を作製する方法であって、
複数の金属ナノワイヤーを柔軟性を有する基板の表面上に蒸着するステップであって、該金属ナノワイヤーは液体に分散されるステップと、
該液体を乾燥させることによって、金属ナノワイヤー網層を該基板上に形成するステップであって、該金属ナノワイヤー網層が、10〜1000Ω/□の抵抗率および85%より高い光透過率を有するステップと、
該金属ナノワイヤー網層上にマトリクス材を蒸着するステップと、
マトリクスを形成するために、該マトリクス材を硬化するステップであって、そこに埋め込まれる該マトリクスおよび該金属ナノワイヤーは、導電層を形成するステップと、
を含み、
該透明導電体の表面の第一の領域が導電性であり、該透明導電体の表面の第二の領域が非導電性であるように、該導電層はパターン化され、
該金属ナノワイヤーは、複数のナノワイヤー交差点を含む導電網を形成し、該複数のナノワイヤー交差点の少なくとも一部のうち、交差するワイヤーの少なくとも一つは平坦な交差部分を有する、
方法。 - 前記金属ナノワイヤーは銀ナノワイヤーである、請求項20に記載の方法。
- 前記液体は、カルボキシメチルセルロース、2−ヒドロキシエチルセルロース、ヒドロキシプロピルメチルセルロース、メチルセルロース、ポリビニルアルコール、トリプロピレングリコール、およびキサンタンゴムから選択される添加剤をさらに含む、請求項20に記載の方法。
- 前記金属ナノワイヤーを蒸着する前に、前記基板の前記表面を事前処理するステップをさらに含む、請求項20に記載の方法。
- 前記基板の前記表面を事前処理するステップは、少なくとも一つの前処理領域および少なくとも一つの未処理領域を含むパターンを生成する、請求項23に記載の方法。
- 前記金属ナノワイヤー網層は、前記前処理領域上にのみ形成される、請求項24に記載の方法。
- 前記表面を前処理するステップは、前記基板の前記表面上の中間層を蒸着するステップ、プラズマ処理、紫外オゾン処理、またはコロナ放電を含む、請求項23に記載の方法。
- 前記金属ナノワイヤー網層の形成に続いて、該金属ナノワイヤー網層を後処理するステップにより前記透明導電体の導電性を向上させるステップをさらに含む、請求項20に記載の方法。
- 圧力、熱、紫外線またはその組み合わせを前記金属ナノワイヤー網層に加えるステップを含む、請求項27に記載の方法。
- 前記導電層の導電表面を提供するために、前記複数の金属ナノワイヤーの一部のうちの各々の少なくとも一区分が、前記マトリクスの表面上から突出するようにするステップ、
をさらに含む、請求項20に記載の方法。 - 前記マトリクス材は溶媒に分散される高分子を含む、請求項20に記載の方法。
- 硬化するステップは、前記溶媒を蒸発させるステップを含む、請求項20に記載の方法。
- 前記マトリクス材はプレポリマーを含む、請求項20に記載の方法。
- 前記プレポリマーは光硬化型である、請求項32に記載の方法。
- 前記プレポリマーは熱硬化型である、請求項32に記載の方法。
- 前記マトリクス材はパターンに応じて蒸着され、前記金属ナノワイヤー網層の被覆領域および非被覆領域を提供し、前記被覆領域はパターン化マトリクスに硬化する、請求項20に記載の方法。
- 前記非被覆領域における前記金属ナノワイヤーを除去するステップをさらに含む、請求項35に記載の方法。
- 前記マトリクス材は、前記パターンに応じて前記基板上に印刷される、請求項35に記載の方法。
- 硬化するステップは、硬化領域および非硬化領域を形成するために、パターンに応じて前記マトリクス材を選択的に硬化するステップを含む、請求項20に記載の方法。
- 前記非硬化領域における前記マトリクス材および前記金属ナノワイヤーを除去するステップをさらに含む、請求項38に記載の方法。
- 前記硬化領域はパターン化される導電層を形成する、請求項38に記載の方法。
- 前記基板は、移動経路に沿ってリールを回転させることによって駆動され、前記金属ナノワイヤーは、前記移動経路に沿って第一の蒸着機構で蒸着され、前記マトリクス材は、前記移動経路に沿って第二の蒸着機構で蒸着される、請求項20に記載の方法。
- 前記基板はコンベヤーベルト上に配置される、請求項41に記載の方法。
- 前記移動経路に沿ってパターン化機構で前記マトリクス材を硬化するステップをさらに含む、請求項41に記載の方法。
- 硬化するステップは、前記マトリクス材を光照射に連続的に暴露するステップを含む、請求項43に記載の方法。
- 前記光照射は、パターンに応じて前記マトリクス材に投影される、請求項44に記載の方法。
- 硬化するステップは、断熱マスクを使用して、パターンに応じて前記マトリクス材層を加熱するステップを含む、請求項43に記載の方法。
- 前記マトリクス材は、硬化領域および非硬化領域にパターン化される、請求項43に記載の方法。
- 前記非硬化領域における前記マトリクス材および前記金属ナノワイヤーを除去するステップをさらに含む、請求項47に記載の方法。
- 前記基板は柔軟性を有するドナー基板である、請求項20に記載の方法。
- 前記柔軟性を有するドナー基板は、剥離層で被覆される、請求項49に記載の方法。
- 前記柔軟性を有するドナー基板から前記導電層を剥離するステップと、前記導電層を選択の基板に適用するステップをさらに含む、請求項49に記載の方法。
- 前記導電層は、前記柔軟性を有するドナー基板から剥離される前にパターン化される、請求項51に記載の方法。
- 前記選択の基板は、少なくとも一つの加熱領域および少なくとも一つの非加熱領域を備え、前記導電層は、前記非加熱領域と結合するよりも、前記加熱領域をよりしっかりと結合する、請求項51に記載の方法。
- 前記非加熱領域における前記導電層のみを除去するステップをさらに含む、請求項53に記載の方法。
- 前記導電層は、パターンに応じて前記導電層に圧力を加えることによって前記選択の基板に適用され、前記導電層は、非加圧領域よりも加圧領域とよりしっかりと結合する、請求項51に記載の方法。
- 前記非加圧領域上の前記導電層のみを除去するステップをさらに含む、請求項55に記載の方法。
- 積層構造物であって、
柔軟性を有するドナー基板と、
複数の金属ナノワイヤーに埋め込まれるマトリクスを含む導電層と、
を含み、該導電層が、10〜1000Ω/□の抵抗率および85%より高い光透過率を有し、
該透明導電体の表面の第一の領域が導電性であり、該透明導電体の表面の第二の領域が非導電性であるように、該導電層はパターン化されており、
該金属ナノワイヤーは、複数のナノワイヤー交差点を含む導電網を形成し、該複数のナノワイヤー交差点の少なくとも一部のうち、交差するワイヤーの少なくとも一つは平坦な交差部分を有する、
積層構造物。 - 前記柔軟性を有するドナー基板と前記導電層との間に配置される剥離層であって、前記導電層から剥離可能である剥離層をさらに備える、請求項57の記載の積層構造物。
- 前記導電層上に配置される接着層をさらに備える、請求項57に記載の積層構造物。
- 前記柔軟性を有するドナー基板と前記導電層との間に配置されるオーバーコート層であって、前記導電層に接触するオーバーコート層をさらに備える、請求項57に記載の積層構造物。
- 前記オーバーコートは、硬質被膜、保護膜、反射防止層、防眩層、障壁層、またはその組み合わせである、請求項60に記載の積層構造物。
- 少なくとも一つの請求項1に記載の透明導電体を備える、表示装置。
- 前記金属ナノワイヤーは前記マトリクスに埋め込まれている、請求項62に記載の表示装置。
- 前記金属ナノワイヤーは銀ナノワイヤーである、請求項62に記載の表示装置。
- 前記マトリクスは光学的に透明な高分子である、請求項63に記載の表示装置。
- 前記透明導電体は腐食防止剤をさらに含み、該腐食防止剤が、窒素含有有機化合物または硫黄含有有機化合物である、請求項62に記載の表示装置。
- 前記腐食防止剤は、ベンゾトリアゾール、トリルトリアゾール、ブチルベンジルトリアゾール、ジチオチアジアゾール、アルキルジチオチアジアゾールおよびアルキルチオール、2−アミノピリミジン、5,6−ジメチルベンゾイミダゾール、2−アミノ−5−メルカプト−1,3,4−チアジアゾール、2−メルカプトピリミジン、2−メルカプトベンゾオキサゾール、2−メルカプトベンゾチアゾール、または2−メルカプトベンゾイミダゾールである、請求項66に記載の表示装置。
- 前記腐食防止剤は、アクロレイン、グリオキサル、トリアジン、またはn−クロロコハク酸イミドである、請求項66に記載の表示装置。
- 前記表示装置は、タッチスクリーン、液晶ディスプレー、またはフラットパネルディスプレイである、請求項62に記載の表示装置。
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KR20190020527A (ko) * | 2017-08-21 | 2019-03-04 | 금오공과대학교 산학협력단 | 패턴이 형성된 플렉서블 투명전극의 제조방법 |
KR102005262B1 (ko) | 2017-08-21 | 2019-07-31 | 금오공과대학교 산학협력단 | 패턴이 형성된 플렉서블 투명전극의 제조방법 |
US11532787B2 (en) | 2018-03-16 | 2022-12-20 | Kabushiki Kaisha Toshiba | Process and apparatus for producing transparent electrode |
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